KR101476861B1 - 신규 제품 - Google Patents

신규 제품 Download PDF

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Publication number
KR101476861B1
KR101476861B1 KR1020097010606A KR20097010606A KR101476861B1 KR 101476861 B1 KR101476861 B1 KR 101476861B1 KR 1020097010606 A KR1020097010606 A KR 1020097010606A KR 20097010606 A KR20097010606 A KR 20097010606A KR 101476861 B1 KR101476861 B1 KR 101476861B1
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KR
South Korea
Prior art keywords
delete delete
formula
compound
plasma
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020097010606A
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English (en)
Korean (ko)
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KR20090082909A (ko
Inventor
스티븐 컬슨
Original Assignee
피2아이 리미티드
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=37546174&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR101476861(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 피2아이 리미티드 filed Critical 피2아이 리미티드
Publication of KR20090082909A publication Critical patent/KR20090082909A/ko
Application granted granted Critical
Publication of KR101476861B1 publication Critical patent/KR101476861B1/ko
Expired - Fee Related legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
    • B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F238/00—Copolymers of compounds having one or more carbon-to-carbon triple bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/12—Specific details about manufacturing devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/16—Surface properties and coatings
    • B01L2300/161—Control and use of surface tension forces, e.g. hydrophobic, hydrophilic
    • B01L2300/165—Specific details about hydrophobic, oleophobic surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Clinical Laboratory Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Hematology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Micromachines (AREA)
  • Polymerisation Methods In General (AREA)
KR1020097010606A 2006-10-28 2007-10-24 신규 제품 Expired - Fee Related KR101476861B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0621520.6A GB0621520D0 (en) 2006-10-28 2006-10-28 Novel products
GB0621520.6 2006-10-28

Publications (2)

Publication Number Publication Date
KR20090082909A KR20090082909A (ko) 2009-07-31
KR101476861B1 true KR101476861B1 (ko) 2014-12-26

Family

ID=37546174

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097010606A Expired - Fee Related KR101476861B1 (ko) 2006-10-28 2007-10-24 신규 제품

Country Status (13)

Country Link
US (2) US8945478B2 (https=)
EP (1) EP2087050A1 (https=)
JP (1) JP5583972B2 (https=)
KR (1) KR101476861B1 (https=)
CN (1) CN101611100B (https=)
AU (1) AU2007316012B2 (https=)
CA (1) CA2667226C (https=)
GB (2) GB0621520D0 (https=)
IL (1) IL198343A0 (https=)
NZ (1) NZ576483A (https=)
TW (1) TWI428409B (https=)
WO (1) WO2008053150A1 (https=)
ZA (1) ZA200902775B (https=)

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AU2003299296A1 (en) * 2002-11-29 2004-06-23 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Method and device for machining a wafer, in addition to a wafer comprising a separation layer and a support layer
WO2010013704A1 (ja) * 2008-07-29 2010-02-04 シャープ株式会社 マイクロデバイス及びマイクロチップ装置並びにこれらを用いた分析方法
US20100034704A1 (en) * 2008-08-06 2010-02-11 Honeywell International Inc. Microfluidic cartridge channel with reduced bubble formation
DE102009041132B4 (de) 2009-09-14 2014-08-14 Schott Ag Verfahren zur Herstellung einer Gleitschicht und pharmazeutisches Packmittel mit Gleitschicht
GB201000538D0 (en) * 2010-01-14 2010-03-03 P2I Ltd Liquid repellent surfaces
DE102010018981B3 (de) 2010-05-03 2011-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Verfahren zur plasmagestützten Behandlung von Innenflächen eines Hohlkörpers, Fluid-Separator sowie dessen Verwendung
EP2422887A1 (en) * 2010-08-27 2012-02-29 Oticon A/S A method of coating a surface with a water and oil repellant polymer layer
EP2457670B1 (en) * 2010-11-30 2017-06-21 Oticon A/S Method and apparatus for plasma induced coating at low pressure
DE102011009057B4 (de) 2011-01-20 2015-12-10 Schott Ag Plasma-Behandlungsvorrichtung zur Herstellung von Beschichtungen und Verfahren zur innenseitigen Plasmabehandlung von Behältern
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
EP2535105A1 (en) * 2011-06-14 2012-12-19 Corning Incorporated Systems and methods for scale-up of microreactors
US20130176691A1 (en) 2012-01-10 2013-07-11 Hzo, Inc. Masks for use in applying protective coatings to electronic assemblies, masked electronic assemblies and associated methods
JP5693515B2 (ja) 2012-01-10 2015-04-01 エイチズィーオー・インコーポレーテッド 内部耐水性被覆を備える電子デバイス
JP2013143563A (ja) 2012-01-10 2013-07-22 Hzo Inc 内部耐水性被覆を備える電子デバイスを組み立てるためのシステム
EP2828004B1 (en) 2012-03-23 2019-11-20 hZo, Inc. Apparatuses, systems and methods for applying protective coatings to electronic device assemblies
CN104380496B (zh) 2012-06-18 2017-10-13 Hzo股份有限公司 抗湿储能设备及相关方法
KR20150020574A (ko) 2012-06-18 2015-02-26 에이치제트오 인코포레이티드 완전히 조립된 전자 디바이스의 내부 표면에 보호 코팅을 제공하는 시스템 및 방법
US9894776B2 (en) 2013-01-08 2018-02-13 Hzo, Inc. System for refurbishing or remanufacturing an electronic device
US10449568B2 (en) 2013-01-08 2019-10-22 Hzo, Inc. Masking substrates for application of protective coatings
CN104994965A (zh) 2013-01-08 2015-10-21 Hzo股份有限公司 用于施涂保护性涂层的掩蔽基底
US10428455B2 (en) 2013-12-13 2019-10-01 The North Face Apparel Corp. Plasma treatments for coloration of textiles, fibers and other substrates
US11679412B2 (en) 2016-06-13 2023-06-20 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US20170358445A1 (en) 2016-06-13 2017-12-14 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
CN106958012A (zh) * 2017-05-21 2017-07-18 无锡荣坚五金工具有限公司 一种基材运动式等离子体放电制备纳米涂层的设备及方法
WO2020024048A1 (en) * 2018-07-30 2020-02-06 Sensoreal Inc. Plasma polymer films for microfluidic devices

Citations (1)

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WO2005089961A1 (en) * 2004-03-18 2005-09-29 The Secretary Of State Of Defence Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume

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Also Published As

Publication number Publication date
EP2087050A1 (en) 2009-08-12
NZ576483A (en) 2010-12-24
GB0621520D0 (en) 2006-12-06
US8945478B2 (en) 2015-02-03
US20090304549A1 (en) 2009-12-10
CN101611100B (zh) 2014-08-06
CN101611100A (zh) 2009-12-23
WO2008053150A1 (en) 2008-05-08
TWI428409B (zh) 2014-03-01
AU2007316012B2 (en) 2012-09-27
CA2667226A1 (en) 2008-05-08
JP2010508162A (ja) 2010-03-18
AU2007316012A1 (en) 2008-05-08
CA2667226C (en) 2016-09-20
ZA200902775B (en) 2010-05-26
IL198343A0 (en) 2010-02-17
GB0720344D0 (en) 2007-11-28
US20120258025A1 (en) 2012-10-11
JP5583972B2 (ja) 2014-09-03
KR20090082909A (ko) 2009-07-31
TW200833797A (en) 2008-08-16

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Not in force date: 20181220

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000