KR101435410B1 - 열 안정성 양이온 광경화성 조성물 - Google Patents

열 안정성 양이온 광경화성 조성물 Download PDF

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Publication number
KR101435410B1
KR101435410B1 KR1020097010573A KR20097010573A KR101435410B1 KR 101435410 B1 KR101435410 B1 KR 101435410B1 KR 1020097010573 A KR1020097010573 A KR 1020097010573A KR 20097010573 A KR20097010573 A KR 20097010573A KR 101435410 B1 KR101435410 B1 KR 101435410B1
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KR
South Korea
Prior art keywords
composition
phenyl
sterically hindered
stabilizer
coating
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Expired - Fee Related
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KR1020097010573A
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English (en)
Korean (ko)
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KR20090082251A (ko
Inventor
카르슈텐 린커
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시바 홀딩 인크
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Application granted granted Critical
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Assigned to 바스프 슈바이츠 아게 reassignment 바스프 슈바이츠 아게 권리의 전부이전등록 Assignors: 시바 홀딩 인크
Assigned to 바스프 에스이 reassignment 바스프 에스이 권리의 전부이전등록 Assignors: 바스프 슈바이츠 아게
Assigned to 아이지엠 그룹 비.브이. reassignment 아이지엠 그룹 비.브이. 권리의 전부이전등록 Assignors: 바스프 에스이
Expired - Fee Related legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/02—Halogenated hydrocarbons
    • C08K5/03—Halogenated hydrocarbons aromatic, e.g. C6H5-CH2-Cl
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
  • Epoxy Resins (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020097010573A 2006-10-24 2007-10-15 열 안정성 양이온 광경화성 조성물 Expired - Fee Related KR101435410B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06122783.1 2006-10-24
EP06122783 2006-10-24
PCT/EP2007/060924 WO2008049743A1 (en) 2006-10-24 2007-10-15 Thermally stable cationic photocurable compositions

Publications (2)

Publication Number Publication Date
KR20090082251A KR20090082251A (ko) 2009-07-29
KR101435410B1 true KR101435410B1 (ko) 2014-08-29

Family

ID=37846122

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097010573A Expired - Fee Related KR101435410B1 (ko) 2006-10-24 2007-10-15 열 안정성 양이온 광경화성 조성물

Country Status (7)

Country Link
US (1) US8084522B2 (https=)
EP (1) EP2076563B1 (https=)
JP (2) JP5523101B2 (https=)
KR (1) KR101435410B1 (https=)
CN (1) CN101558110B (https=)
ES (1) ES2603838T3 (https=)
WO (1) WO2008049743A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101952248B (zh) 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
CN106125509B (zh) * 2009-12-17 2019-12-17 帝斯曼知识产权资产管理有限公司 用于加成法制造的可led固化的液体树脂组合物
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
JP5684275B2 (ja) * 2010-09-24 2015-03-11 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
JP5832740B2 (ja) * 2010-11-30 2015-12-16 株式会社ダイセル 硬化性エポキシ樹脂組成物
EP2514800B2 (de) * 2011-04-21 2018-03-07 Merck Patent GmbH Verbindungen und flüssigkristallines Medium
KR102091871B1 (ko) 2012-07-26 2020-03-20 덴카 주식회사 수지 조성물
US10683414B2 (en) 2014-01-23 2020-06-16 Denka Company Limited Resin composition
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
EP3567428B1 (en) 2015-10-01 2021-06-23 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
KR101941649B1 (ko) 2017-11-24 2019-01-23 주식회사 엘지화학 편광판 및 이를 포함하는 화상 표시 장치
JP7488102B2 (ja) * 2019-05-17 2024-05-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7537913B2 (ja) * 2019-06-04 2024-08-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7689013B2 (ja) * 2020-05-15 2025-06-05 住友化学株式会社 カルボン酸塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP2023133025A (ja) * 2022-03-11 2023-09-22 株式会社松風 色調安定性に優れた歯科用光硬化性組成物
WO2025140899A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Methods for stabilizing a photoactive generator

Citations (4)

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JP2004051656A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 画像形成方法、印刷物及び記録装置
US20050165141A1 (en) * 2004-01-27 2005-07-28 Jean-Pierre Wolf Thermally stable cationic photocurable compositions
JP2006008740A (ja) 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
US20060223903A1 (en) * 2005-04-04 2006-10-05 Jie Cao Radiation-curable desiccant-filled adhesive/sealant

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DE3641014A1 (de) 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
JP2699188B2 (ja) * 1988-03-15 1998-01-19 三新化学工業株式会社 カチオン重合性組成物、重合触媒および重合方法
JPH0735917A (ja) * 1993-07-23 1995-02-07 Toray Ind Inc カラーフィルタの製造方法
DE19627469A1 (de) 1995-07-12 1997-01-16 Sanyo Chemical Ind Ltd Epoxidharzvernetzungsmittel und Ein-Komponenten-Epoxidharzzusammensetzung
TW460509B (en) 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
EP1000980B1 (en) * 1997-07-28 2004-07-07 Kaneka Corporation Curable composition
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
DE19927949A1 (de) * 1999-06-18 2000-12-21 Delo Industrieklebstoffe Gmbh Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen
SG98433A1 (en) 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
ES2329345T3 (es) 2001-07-19 2009-11-25 Lamberti Spa Sales de sulfonio como fotoiniciadores para sistemas que se pueden curar por radiacion.
GB0204467D0 (en) 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
CA2561385A1 (en) * 2004-03-30 2005-10-13 Kaneka Corporation Hardenable composition
JP4331644B2 (ja) * 2004-05-10 2009-09-16 日東電工株式会社 紫外線硬化型樹脂組成物
JP4421938B2 (ja) * 2004-05-10 2010-02-24 日東電工株式会社 紫外線硬化型樹脂組成物
JP2006124636A (ja) * 2004-06-28 2006-05-18 Konica Minolta Medical & Graphic Inc 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置
EP2028228B1 (en) * 2004-10-25 2018-12-12 IGM Group B.V. Functionalized nanoparticles
JP4644050B2 (ja) * 2005-02-04 2011-03-02 積水化学工業株式会社 光デバイスの製造方法及び光デバイス
JP2006257257A (ja) * 2005-03-17 2006-09-28 Sumitomo Chemical Co Ltd 硬化性樹脂組成物および該組成物を用いて形成される保護膜
DE602006003545D1 (de) * 2005-04-04 2008-12-18 Nat Starch Chem Invest Strahlenhärtbares, mit trockenmittel gefülltes klebe-/dichtmittel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004051656A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 画像形成方法、印刷物及び記録装置
US20050165141A1 (en) * 2004-01-27 2005-07-28 Jean-Pierre Wolf Thermally stable cationic photocurable compositions
JP2006008740A (ja) 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
US20060223903A1 (en) * 2005-04-04 2006-10-05 Jie Cao Radiation-curable desiccant-filled adhesive/sealant

Also Published As

Publication number Publication date
JP5523101B2 (ja) 2014-06-18
WO2008049743A1 (en) 2008-05-02
EP2076563B1 (en) 2016-08-17
US8084522B2 (en) 2011-12-27
CN101558110A (zh) 2009-10-14
CN101558110B (zh) 2012-06-13
ES2603838T3 (es) 2017-03-01
US20100304284A1 (en) 2010-12-02
JP2010507696A (ja) 2010-03-11
JP2013241622A (ja) 2013-12-05
KR20090082251A (ko) 2009-07-29
EP2076563A1 (en) 2009-07-08

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