KR101429326B1 - 반사방지 코팅 조성물 - Google Patents

반사방지 코팅 조성물 Download PDF

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Publication number
KR101429326B1
KR101429326B1 KR1020107027320A KR20107027320A KR101429326B1 KR 101429326 B1 KR101429326 B1 KR 101429326B1 KR 1020107027320 A KR1020107027320 A KR 1020107027320A KR 20107027320 A KR20107027320 A KR 20107027320A KR 101429326 B1 KR101429326 B1 KR 101429326B1
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South Korea
Prior art keywords
containing compound
antireflective coating
substrate
polymer
independently
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KR1020107027320A
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English (en)
Korean (ko)
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KR20110042262A (ko
Inventor
휘롱 야오
종 시앙
지엔후이 샨
샬럼 뮬런
헝펑 우
Original Assignee
에이제토 엘렉토로닉 마티리알즈 아이피 (재팬) 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3236—Heterocylic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
KR1020107027320A 2008-07-08 2009-04-29 반사방지 코팅 조성물 KR101429326B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/133,562 2008-07-08
US12/133,562 US8221965B2 (en) 2008-07-08 2008-07-08 Antireflective coating compositions
PCT/IB2009/005458 WO2010004377A1 (en) 2008-07-08 2009-04-29 Antireflective coating compositions

Publications (2)

Publication Number Publication Date
KR20110042262A KR20110042262A (ko) 2011-04-26
KR101429326B1 true KR101429326B1 (ko) 2014-08-12

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KR1020107027320A KR101429326B1 (ko) 2008-07-08 2009-04-29 반사방지 코팅 조성물

Country Status (8)

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US (1) US8221965B2 (US20100009293A1-20100114-C00040.png)
EP (1) EP2300518B1 (US20100009293A1-20100114-C00040.png)
JP (1) JP5568791B2 (US20100009293A1-20100114-C00040.png)
KR (1) KR101429326B1 (US20100009293A1-20100114-C00040.png)
CN (1) CN102056969B (US20100009293A1-20100114-C00040.png)
MY (1) MY155242A (US20100009293A1-20100114-C00040.png)
TW (1) TWI512063B (US20100009293A1-20100114-C00040.png)
WO (1) WO2010004377A1 (US20100009293A1-20100114-C00040.png)

Cited By (2)

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WO2019022404A1 (ko) * 2017-07-26 2019-01-31 에스케이이노베이션 주식회사 바닥반사 방지막 형성용 중합체 및 이를 포함하는 바닥반사 방지막 형성용 조성물
KR20190042921A (ko) * 2017-10-17 2019-04-25 에스케이이노베이션 주식회사 바닥반사방지막 형성용 중합체, 이를 포함하는 바닥반사방지막 형성용 조성물 및 이를 이용한 바닥반사방지막의 형성방법

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JP5923472B2 (ja) * 2013-09-18 2016-05-24 四国化成工業株式会社 メルカプトアルキルグリコールウリル類とその利用
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JP6492509B2 (ja) * 2014-07-28 2019-04-03 Jsr株式会社 液晶配向剤、液晶配向膜、液晶表示素子及び液晶表示素子の製造方法
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KR102264693B1 (ko) * 2018-06-11 2021-06-11 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
KR20210024461A (ko) * 2018-06-26 2021-03-05 닛산 가가쿠 가부시키가이샤 글리시딜에스테르 화합물과의 반응생성물을 포함하는 레지스트 하층막 형성 조성물
JP7408047B2 (ja) 2018-07-31 2024-01-05 日産化学株式会社 レジスト下層膜形成組成物
KR102288386B1 (ko) * 2018-09-06 2021-08-10 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법
US20240004295A1 (en) * 2020-10-07 2024-01-04 Nissan Chemical Corporation Resist underlayer film-forming composition containing a reaction product of trifunctional compound
CN116082914B (zh) * 2022-11-24 2024-04-30 厦门恒坤新材料科技股份有限公司 一种有机抗反射涂层组合物及其制备方法和图案形成方法
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WO2019022404A1 (ko) * 2017-07-26 2019-01-31 에스케이이노베이션 주식회사 바닥반사 방지막 형성용 중합체 및 이를 포함하는 바닥반사 방지막 형성용 조성물
US11435667B2 (en) 2017-07-26 2022-09-06 Sk Innovation Co., Ltd. Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same
KR20190042921A (ko) * 2017-10-17 2019-04-25 에스케이이노베이션 주식회사 바닥반사방지막 형성용 중합체, 이를 포함하는 바닥반사방지막 형성용 조성물 및 이를 이용한 바닥반사방지막의 형성방법
KR102414150B1 (ko) 2017-10-17 2022-06-29 에스케이이노베이션 주식회사 바닥반사방지막 형성용 중합체, 이를 포함하는 바닥반사방지막 형성용 조성물 및 이를 이용한 바닥반사방지막의 형성방법

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EP2300518A1 (en) 2011-03-30
EP2300518B1 (en) 2012-08-15
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WO2010004377A1 (en) 2010-01-14
MY155242A (en) 2015-09-30
JP2011527460A (ja) 2011-10-27
US8221965B2 (en) 2012-07-17
US20100009293A1 (en) 2010-01-14
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