KR101385047B1 - 고출력 엑시머 레이저 소스용 챔버 - Google Patents

고출력 엑시머 레이저 소스용 챔버 Download PDF

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KR101385047B1
KR101385047B1 KR1020087030482A KR20087030482A KR101385047B1 KR 101385047 B1 KR101385047 B1 KR 101385047B1 KR 1020087030482 A KR1020087030482 A KR 1020087030482A KR 20087030482 A KR20087030482 A KR 20087030482A KR 101385047 B1 KR101385047 B1 KR 101385047B1
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South Korea
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chamber
pressure
wall
orifice
compartment
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Korean (ko)
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KR20090016023A (ko
Inventor
토마스 디. 스테이거
윌리엄 엔. 파틀로
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/20—Liquids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020087030482A 2006-06-05 2007-05-22 고출력 엑시머 레이저 소스용 챔버 Active KR101385047B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/447,502 2006-06-05
US11/447,502 US7369596B2 (en) 2006-06-05 2006-06-05 Chamber for a high energy excimer laser source
PCT/US2007/012393 WO2007145792A2 (en) 2006-06-05 2007-05-22 Chamber for a high energy excimer laser source

Publications (2)

Publication Number Publication Date
KR20090016023A KR20090016023A (ko) 2009-02-12
KR101385047B1 true KR101385047B1 (ko) 2014-04-14

Family

ID=38790122

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087030482A Active KR101385047B1 (ko) 2006-06-05 2007-05-22 고출력 엑시머 레이저 소스용 챔버

Country Status (6)

Country Link
US (1) US7369596B2 (https=)
EP (1) EP2036169B1 (https=)
JP (1) JP5614617B2 (https=)
KR (1) KR101385047B1 (https=)
TW (1) TWI345348B (https=)
WO (1) WO2007145792A2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8031761B2 (en) * 2003-12-07 2011-10-04 Adaptive Spectrum And Signal Alignment, Inc. Adaptive margin and band control
US7564888B2 (en) * 2004-05-18 2009-07-21 Cymer, Inc. High power excimer laser with a pulse stretcher
WO2007044326A2 (en) * 2005-10-04 2007-04-19 Adaptive Spectrum And Signal Alignment, Inc. Dsl system
TW201334333A (zh) * 2011-12-20 2013-08-16 Ipg Microsystems Llc 根據電性引入使用多預照放射放電之氣體放電雷射裝置中之預照放射設備
CN103022858B (zh) * 2012-12-07 2014-09-24 华中科技大学 一种电晕预电离装置
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4719641A (en) * 1985-11-08 1988-01-12 Summit Technology, Inc. Multiple chamber laser containment system
JPH08505006A (ja) * 1992-11-13 1996-05-28 サイマー レーザー テクノロジーズ パワー・レーザー・システム
JP2000223757A (ja) * 1999-02-04 2000-08-11 Komatsu Ltd ガスレーザ
US20020196830A1 (en) * 1999-08-31 2002-12-26 Ujazdowski Richard C. Laser chamber insulator with sealed electrode feedthrough

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050083984A1 (en) * 2003-10-17 2005-04-21 Igor Bragin Laser system sealing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4719641A (en) * 1985-11-08 1988-01-12 Summit Technology, Inc. Multiple chamber laser containment system
JPH08505006A (ja) * 1992-11-13 1996-05-28 サイマー レーザー テクノロジーズ パワー・レーザー・システム
JP2000223757A (ja) * 1999-02-04 2000-08-11 Komatsu Ltd ガスレーザ
US20020196830A1 (en) * 1999-08-31 2002-12-26 Ujazdowski Richard C. Laser chamber insulator with sealed electrode feedthrough

Also Published As

Publication number Publication date
KR20090016023A (ko) 2009-02-12
TW200803089A (en) 2008-01-01
WO2007145792A3 (en) 2008-10-16
US7369596B2 (en) 2008-05-06
TWI345348B (en) 2011-07-11
JP2009540568A (ja) 2009-11-19
EP2036169A4 (en) 2011-07-06
EP2036169B1 (en) 2013-03-27
EP2036169A2 (en) 2009-03-18
WO2007145792A2 (en) 2007-12-21
US20070280323A1 (en) 2007-12-06
JP5614617B2 (ja) 2014-10-29

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