JP5614617B2 - 高エネルギー・エキシマレーザ源用のチャンバ - Google Patents

高エネルギー・エキシマレーザ源用のチャンバ Download PDF

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JP5614617B2
JP5614617B2 JP2009514301A JP2009514301A JP5614617B2 JP 5614617 B2 JP5614617 B2 JP 5614617B2 JP 2009514301 A JP2009514301 A JP 2009514301A JP 2009514301 A JP2009514301 A JP 2009514301A JP 5614617 B2 JP5614617 B2 JP 5614617B2
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JP2009540568A (ja
JP2009540568A5 (https=
Inventor
トーマス ディー ステイガー
トーマス ディー ステイガー
パートロ　ウィリアム　エヌ
ウィリアム エヌ パートロ
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サイマー リミテッド ライアビリティ カンパニー
サイマー リミテッド ライアビリティ カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/20—Liquids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP2009514301A 2006-06-05 2007-05-22 高エネルギー・エキシマレーザ源用のチャンバ Active JP5614617B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/447,502 2006-06-05
US11/447,502 US7369596B2 (en) 2006-06-05 2006-06-05 Chamber for a high energy excimer laser source
PCT/US2007/012393 WO2007145792A2 (en) 2006-06-05 2007-05-22 Chamber for a high energy excimer laser source

Publications (3)

Publication Number Publication Date
JP2009540568A JP2009540568A (ja) 2009-11-19
JP2009540568A5 JP2009540568A5 (https=) 2010-07-08
JP5614617B2 true JP5614617B2 (ja) 2014-10-29

Family

ID=38790122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009514301A Active JP5614617B2 (ja) 2006-06-05 2007-05-22 高エネルギー・エキシマレーザ源用のチャンバ

Country Status (6)

Country Link
US (1) US7369596B2 (https=)
EP (1) EP2036169B1 (https=)
JP (1) JP5614617B2 (https=)
KR (1) KR101385047B1 (https=)
TW (1) TWI345348B (https=)
WO (1) WO2007145792A2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8031761B2 (en) * 2003-12-07 2011-10-04 Adaptive Spectrum And Signal Alignment, Inc. Adaptive margin and band control
US7564888B2 (en) * 2004-05-18 2009-07-21 Cymer, Inc. High power excimer laser with a pulse stretcher
WO2007044326A2 (en) * 2005-10-04 2007-04-19 Adaptive Spectrum And Signal Alignment, Inc. Dsl system
TW201334333A (zh) * 2011-12-20 2013-08-16 Ipg Microsystems Llc 根據電性引入使用多預照放射放電之氣體放電雷射裝置中之預照放射設備
CN103022858B (zh) * 2012-12-07 2014-09-24 华中科技大学 一种电晕预电离装置
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4719641A (en) * 1985-11-08 1988-01-12 Summit Technology, Inc. Multiple chamber laser containment system
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
JP2000223757A (ja) * 1999-02-04 2000-08-11 Komatsu Ltd ガスレーザ
US6661826B2 (en) * 1999-08-31 2003-12-09 Cymer, Inc. Laser chamber insulator with sealed electrode feedthrough
US20050083984A1 (en) * 2003-10-17 2005-04-21 Igor Bragin Laser system sealing

Also Published As

Publication number Publication date
KR20090016023A (ko) 2009-02-12
TW200803089A (en) 2008-01-01
WO2007145792A3 (en) 2008-10-16
US7369596B2 (en) 2008-05-06
TWI345348B (en) 2011-07-11
JP2009540568A (ja) 2009-11-19
EP2036169A4 (en) 2011-07-06
EP2036169B1 (en) 2013-03-27
EP2036169A2 (en) 2009-03-18
KR101385047B1 (ko) 2014-04-14
WO2007145792A2 (en) 2007-12-21
US20070280323A1 (en) 2007-12-06

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