KR101267670B1 - 웨이퍼 척용 온도 센서 - Google Patents
웨이퍼 척용 온도 센서 Download PDFInfo
- Publication number
- KR101267670B1 KR101267670B1 KR1020100053856A KR20100053856A KR101267670B1 KR 101267670 B1 KR101267670 B1 KR 101267670B1 KR 1020100053856 A KR1020100053856 A KR 1020100053856A KR 20100053856 A KR20100053856 A KR 20100053856A KR 101267670 B1 KR101267670 B1 KR 101267670B1
- Authority
- KR
- South Korea
- Prior art keywords
- temperature sensor
- wafer chuck
- fixing block
- wafer
- chuck
- Prior art date
Links
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
- G01K7/18—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a linear resistance, e.g. platinum resistance thermometer
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2009-147061 | 2009-06-19 | ||
JP2009147061A JP5197505B2 (ja) | 2009-06-19 | 2009-06-19 | ウエハチャック用の温度センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100136915A KR20100136915A (ko) | 2010-12-29 |
KR101267670B1 true KR101267670B1 (ko) | 2013-05-24 |
Family
ID=43510815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020100053856A KR101267670B1 (ko) | 2009-06-19 | 2010-06-08 | 웨이퍼 척용 온도 센서 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5197505B2 (zh) |
KR (1) | KR101267670B1 (zh) |
TW (1) | TWI471538B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103277651B (zh) * | 2013-06-13 | 2016-04-06 | 新乡学院 | 一种用于高温热探测的陶瓷基座 |
JP2016161356A (ja) * | 2015-02-27 | 2016-09-05 | セイコーエプソン株式会社 | 電子部品搬送装置および電子部品検査装置 |
WO2017169032A1 (ja) * | 2016-03-28 | 2017-10-05 | 株式会社日立国際電気 | 基板処理装置、温度測定ユニット及び半導体装置の製造方法 |
CN110739657B (zh) * | 2018-07-20 | 2021-09-21 | 施耐德电器工业公司 | 用于环网柜的电缆头及环网柜 |
TWI797484B (zh) * | 2020-10-06 | 2023-04-01 | 致茂電子股份有限公司 | 晶圓吸盤檢測系統 |
JP7474678B2 (ja) | 2020-10-28 | 2024-04-25 | 東京エレクトロン株式会社 | 載置台、検査装置及び検査方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009042070A (ja) | 2007-08-09 | 2009-02-26 | Sei Hybrid Kk | 半導体製造装置用測温装置及びそれを搭載した半導体製造装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6090638U (ja) * | 1983-11-26 | 1985-06-21 | 株式会社三共合金鋳造所 | 温度測定治具 |
JPS6124628U (ja) * | 1984-07-11 | 1986-02-14 | 三菱重工業株式会社 | 熱電対取付治具 |
US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
JPH0945752A (ja) * | 1995-07-27 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3814359B2 (ja) * | 1996-03-12 | 2006-08-30 | キヤノン株式会社 | X線投影露光装置及びデバイス製造方法 |
JP2000286207A (ja) * | 1999-03-30 | 2000-10-13 | Tokyo Electron Ltd | 熱処理装置及び熱処理方法 |
JP4659328B2 (ja) * | 2002-10-21 | 2011-03-30 | 東京エレクトロン株式会社 | 被検査体を温度制御するプローブ装置 |
JP4307130B2 (ja) * | 2003-04-08 | 2009-08-05 | キヤノン株式会社 | 露光装置 |
CN101065616A (zh) * | 2004-10-14 | 2007-10-31 | 迅捷公司 | 用于晶片温度控制的方法和系统 |
-
2009
- 2009-06-19 JP JP2009147061A patent/JP5197505B2/ja active Active
-
2010
- 2010-06-08 KR KR1020100053856A patent/KR101267670B1/ko active IP Right Grant
- 2010-06-18 TW TW99119932A patent/TWI471538B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009042070A (ja) | 2007-08-09 | 2009-02-26 | Sei Hybrid Kk | 半導体製造装置用測温装置及びそれを搭載した半導体製造装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI471538B (zh) | 2015-02-01 |
TW201129787A (en) | 2011-09-01 |
JP2011002390A (ja) | 2011-01-06 |
JP5197505B2 (ja) | 2013-05-15 |
KR20100136915A (ko) | 2010-12-29 |
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