KR101228756B1 - 자외선 조사 장치 및 자외선 조사 장치의 점등 제어 방법 - Google Patents

자외선 조사 장치 및 자외선 조사 장치의 점등 제어 방법 Download PDF

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Publication number
KR101228756B1
KR101228756B1 KR1020090050300A KR20090050300A KR101228756B1 KR 101228756 B1 KR101228756 B1 KR 101228756B1 KR 1020090050300 A KR1020090050300 A KR 1020090050300A KR 20090050300 A KR20090050300 A KR 20090050300A KR 101228756 B1 KR101228756 B1 KR 101228756B1
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South Korea
Prior art keywords
lighting
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normal
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value
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KR1020090050300A
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English (en)
Korean (ko)
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KR20100010900A (ko
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마사키 나카무라
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우시오덴키 가부시키가이샤
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Publication of KR20100010900A publication Critical patent/KR20100010900A/ko
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Publication of KR101228756B1 publication Critical patent/KR101228756B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
KR1020090050300A 2008-07-23 2009-06-08 자외선 조사 장치 및 자외선 조사 장치의 점등 제어 방법 KR101228756B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-189371 2008-07-23
JP2008189371A JP5071289B2 (ja) 2008-07-23 2008-07-23 紫外線照射装置及び紫外線照射装置の点灯制御方法

Publications (2)

Publication Number Publication Date
KR20100010900A KR20100010900A (ko) 2010-02-02
KR101228756B1 true KR101228756B1 (ko) 2013-01-31

Family

ID=41595024

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090050300A KR101228756B1 (ko) 2008-07-23 2009-06-08 자외선 조사 장치 및 자외선 조사 장치의 점등 제어 방법

Country Status (4)

Country Link
JP (1) JP5071289B2 (ja)
KR (1) KR101228756B1 (ja)
CN (1) CN101636031B (ja)
TW (1) TWI398192B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011117946A1 (ja) * 2010-03-26 2011-09-29 シャープ株式会社 紫外線照射装置
CN102930334B (zh) * 2012-10-10 2013-08-14 北京凯森世纪科技发展有限公司 视频人体轮廓识别计数器
JP5700060B2 (ja) 2013-03-14 2015-04-15 ウシオ電機株式会社 光源装置
JP6659678B2 (ja) * 2014-10-16 2020-03-04 シグニファイ ホールディング ビー ヴィＳｉｇｎｉｆｙ Ｈｏｌｄｉｎｇ Ｂ．Ｖ． 供給ケーブル、無線制御機能を備えるドライバ構成及び制御方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003174000A (ja) 2001-12-06 2003-06-20 Tokyo Electron Ltd 処理方法及び処理装置
KR20070045902A (ko) * 2005-10-28 2007-05-02 우시오덴키 가부시키가이샤 엑시머 램프 및 엑시머 램프를 탑재한 자외선 조사 장치
KR100720264B1 (ko) 2003-01-17 2007-05-22 우시오덴키 가부시키가이샤 엑시머 램프 발광장치
JP2007171302A (ja) 2005-12-19 2007-07-05 Sharp Corp 光源装置、光源ユニット及び投影型画像表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4586488B2 (ja) * 2004-10-20 2010-11-24 ウシオ電機株式会社 エキシマランプ点灯装置及びエキシマランプ点灯方法
TWI344320B (en) * 2005-12-27 2011-06-21 Harison Toshiba Lighting Corp Short arc type discharge lamp operating apparatus, ultraviolet irradiation apparatus and method of ultraviolet irradiating
JP2007227071A (ja) * 2006-02-22 2007-09-06 Noritsu Koki Co Ltd プラズマ発生装置およびそれを用いるワーク処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003174000A (ja) 2001-12-06 2003-06-20 Tokyo Electron Ltd 処理方法及び処理装置
KR100720264B1 (ko) 2003-01-17 2007-05-22 우시오덴키 가부시키가이샤 엑시머 램프 발광장치
KR20070045902A (ko) * 2005-10-28 2007-05-02 우시오덴키 가부시키가이샤 엑시머 램프 및 엑시머 램프를 탑재한 자외선 조사 장치
JP2007171302A (ja) 2005-12-19 2007-07-05 Sharp Corp 光源装置、光源ユニット及び投影型画像表示装置

Also Published As

Publication number Publication date
JP2010027944A (ja) 2010-02-04
TW201006314A (en) 2010-02-01
CN101636031A (zh) 2010-01-27
KR20100010900A (ko) 2010-02-02
TWI398192B (zh) 2013-06-01
JP5071289B2 (ja) 2012-11-14
CN101636031B (zh) 2013-02-06

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