KR101154548B1 - Foams treatment apparatus - Google Patents

Abstract

The present invention is capable of continuously and reliably removing bubbles generated firstly, and secondly, physically defoaming without using defoamers, and thirdly, reusing surfaces, component surfaces, additional surfaces, avoiding increased costs, and the like. We propose a foaming device with excellent cost.
This foam processing apparatus E is used in the manufacturing process of an electronic circuit board, and is attached to the surface processing apparatus 1 which spray-processes the alkali treatment liquid B with respect to the board | substrate material A, and surface-treats. And the foam D is processed continuously and the suction part 11 and the process part 12 are included. The suction part 11 sucks the bubble D which generate | occur | produced when the photosensitive resist C melt | dissolves from the surface treatment apparatus 1 to alkali treatment liquid B. As shown in FIG. The treatment part 12 is interposed between the surface treatment apparatus 1 and the suction part 12, and separates the foam D recovered by suction into a liquid and a gas. The alkaline treatment liquid B obtained by liquefying and separating the foam D in the treatment part 12 is returned to the liquid tank 3 of the surface treatment apparatus 1 for reuse.

Description

Foam Processing Equipment {FOAMS TREATMENT APPARATUS}

The present invention relates to a foam processing apparatus. Namely, the present invention relates to a foaming apparatus used in the manufacturing process of printed wiring boards and other electronic circuit boards and for processing bubbles generated when a resist is dissolved in a developing solution or a peeling solution.

In a typical electronic circuit board manufacturing process, photosensitive resist (liquid photoresist or dry film resist) is first applied or adhered to an outer surface of a substrate material made of a copper clad laminate.

¡Æ then, a negative film of the circuit is placed and exposed, ¡æ resists other than the circuit-forming part are dissolved and removed by development. → copper foils other than the circuit-forming part are dissolved and removed by etching. Then, the resist of the circuit formation part is dissolved and removed by peeling. ¡Æ following this process, an electronic circuit is formed from the copper foil remaining on the outer surface of the substrate material, thereby producing an electronic circuit board.

By the way, as shown in the right half of FIG. 1, in the surface treatment apparatus 1, such as the image development apparatus of the image development process, the peeling apparatus of a peeling process, etc., the developing solution and the like from the spray nozzle 2 with respect to the board | substrate material A conveyed are shown. Alkali treatment liquid B, such as a peeling liquid, is sprayed.

After the surface treatment such as development or peeling, the alkaline treatment liquid B and the resist C flow down into the liquid tank 3, and are recovered and stored once. Then, the alkali treatment liquid B from which the resist C has been separated and removed by passing through the filter 4 is circulated and supplied to the spray nozzle 2 for reuse. In FIG. 1, 5 is a spray pump, 6 is a shower tube, 7 is a conveyor, 8 is a circulation pump, and 9 is a piping.

As this kind of surface treatment apparatus, what was proposed by following patent document 1 is mentioned, for example.

[Patent Document 1] Japanese Patent Laid-Open No. 2004-325502

By the way, the following subject was pointed out about this kind of conventional example.

<< first problem >>

First, in the surface treatment apparatus 1, such as a developing apparatus and a peeling apparatus, alkali treatment liquids B, such as a developing solution and a peeling liquid, are sprayed with respect to the board | substrate material A, but a resist () is applied to the alkaline treatment liquid B. Bubble C is generated when C) is dissolved (see FIG. 1).

When the foam D is supplied to the filter 4 via the liquid tank 3, the resist C becomes suspended due to the foam D, thereby separating the resist C by the filter 4, It has been pointed out that the removal becomes uncertain and thus the performance of the alkaline treatment liquid B is lowered.

Second Problem

Second, as a countermeasure against such foam D, the addition of the defoamer to the liquid tank 3 of the surface treatment apparatus 1 was performed by this.

However, this kind of defoamer (bubble breaker, defoamer) is, for example, an emulsion of ether type oil, special surfactants, other silicone oils, etc. However, when mixed with the alkaline treatment liquid B and sprayed onto the substrate material A, the film is caused to be defective in development or poor in peeling. In particular, the adverse effect to the finishing process of the board | substrate material A in the image development process became a problem.

In addition, the complexity of the treatment in the case where the defoamer was adhered to the wall of the liquid tank 3, the difficulty in the treatment in the case of being mixed into the waste liquid, and the problem that the defoamer and the cleaning agent for the treatment are expensive were also problematic.

<< third problem >>

Third, therefore, as a countermeasure against foam (D), measures to increase the supply amount of fresh liquid of alkaline treatment liquid (B) without using a defoamer and a waste liquid opening are enlarged so that foam (D) is separated from the waste liquid. Attempts have also been made to allow them to be discharged together.

However, in these countermeasures, there has been a problem of an increase in the cost burden, such as an increase in the supply amount of fresh liquid, an increase in the amount of waste liquid accompanying it, an increase in the amount of waste liquid containing foam (D), a response to environmental problems, and the like.

The bubble processing apparatus of this invention is made | formed in order to solve the subject of the said prior art in view of such a situation.

The present invention aims firstly to propose a foaming apparatus which can continuously and reliably remove foam, and secondly, no defoamer is used, and thirdly, excellent in cost.

The technical means of this invention which solves such a subject is as follows. Claim 1 is as follows.

The foam treatment apparatus of claim 1 is used in the manufacturing process of an electronic circuit board, and is attached to the surface treatment apparatus which sprays an alkali treatment liquid with respect to a board | substrate material, and surface-treats. And foam is processed continuously and a suction part and a process part are provided.

The suction unit sucks the bubbles generated when the photosensitive resist is dissolved in the alkali treatment liquid from the surface treatment apparatus. The treatment section is characterized in that the foam is disposed between the surface treatment device and the suction section and separates the foam recovered by suction into a liquid and a gas.

Claim 2 is as follows. In the bubble processing apparatus of claim 2, the entirety of the processing portion is formed in a box shape, the inside is sucked by the suction portion to be in a negative pressure state, and the separating plate is arranged up and down in multiple stages. It is installed. The bubbles, which are sucked through the inside of the processing section from the bottom and pass through, collide with each of the separation plates and are broken and separated into liquid and gas.

The alkali treatment liquid obtained by liquefaction separation by this flows down to the lower part of the said process part, is stored, and returns to the said surface treatment apparatus for reuse. The alkali gas obtained by separating the foam from the treatment section is sucked into the suction section, and is then exhausted.

Claim 3 is as follows. In the bubble processing apparatus of Claim 3, in the said processing part, the level sensor is attached to the lower part, and the bottom part is connected to the said surface treatment apparatus via a valve | bulb. The level sensor may detect that the alkaline treatment liquid is stored up to a level of a predetermined height in the lower portion of the processing unit. The valve is switched from the normally closed to the open based on the level detection of the predetermined height of the level sensor.

Therefore, it is characterized in that the alkaline treatment liquid stored in the suction portion and the negative pressure state flows out from the treatment portion and is discharged to return to the surface treatment apparatus.

Claim 4 is as follows. In the bubble processing apparatus of claim 4, the processing unit is provided with a level sensor at a lower portion thereof, and the bottom portion is sequentially connected to the surface treatment apparatus through a valve and a pump. The level sensor may detect that the alkaline treatment liquid is stored up to a level of a predetermined height under the processing unit. The pump is driven on based on the level detection of the predetermined height of the level sensor. The valve is switched from the normally closed to the open based on the suction force at the time of driving on of the pump.

Therefore, it is characterized in that the alkaline treatment liquid stored in the suction portion and the negative pressure state can be discharged from the treatment portion and discharged to return to the surface treatment apparatus.

Claim 5 is as follows. The bubble processing apparatus of claim 5 is provided in the surface treatment apparatus of claim 2, and a suction port opened to suck the generated bubble toward the processing unit and the suction unit is supported by a float. It is.

The float is floated on the liquid level of the alkali treatment liquid in the liquid tank of the surface treatment apparatus, and is maintained at a height position of opening the suction port in the bubble floating on the liquid surface in a predetermined layer thickness.

Since this invention consists of such means, it becomes as follows.

(1) In the surface treatment apparatus, an alkaline treatment liquid is sprayed on the substrate material.

(2) Then, the resist is dissolved in the alkaline treatment liquid, and bubbles are generated at that time.

(3) The generated bubbles flow off the liquid surface of the liquid tank and are recovered.

(4) So, in the foam processing apparatus of this invention, a bubble is attracted by the suction force of a suction part.

(5) The sucked foam is supplied to the treatment section to separate and liquefy into an alkaline treatment liquid.

(6) The separated alkaline treatment liquid flows down and is stored in the lower portion of the treatment section, and when the predetermined height level is reached, the valve is switched to open by detection of the level sensor or driving of the pump.

(7) Thus, the alkaline treatment liquid is returned to the surface treatment apparatus against the negative pressure state in the treatment portion by suction.

(8) Thus, according to the present invention, bubbles are continuously and reliably removed in a short time.

(9) This defoaming is performed without using a defoamer.

(10) And the obtained alkaline treatment liquid is reused. Moreover, this foam processing apparatus consists of a suction part, the process part with a built-in separator, a level sensor, a valve, a pump, etc., and its structure is simple, and addition installation is also easy.

(11) Accordingly, the present invention has the following effects.

<< first effect >>

First, the bubbles can be removed continuously and reliably. In the foam treatment apparatus of the present invention, the foam is sucked into the treatment portion to separate the alkaline treatment liquid and the alkali gas, and the alkaline treatment liquid is discharged by a combination of a level sensor, a valve, a pump, or the like, and returned to the surface treatment apparatus for reuse.

In this way, the generated bubbles can be recovered, removed and reused continuously and reliably in a short time. As in the conventional example of this kind described above, bubbles are supplied to the filter via the liquid tank, so that there is no fear that the decomposition and removal of the resist will be uncertain. The resist is separated and removed smoothly from the filter, thus maintaining the performance of the developer or the stripper.

<< second effect >>

Second, no defoamer is used. In the bubble treatment apparatus of the present invention, the bubbles are physically recovered and removed from the suction portion and the treatment portion.

As in the conventional example of this kind described above, there is no fear of adversely affecting the finishing process of the substrate material due to the use of a defoamer to cause developing defects and peeling defects. Of course, the problem of incorporation of the defoamer into the waste liquid and the problem that the defoamer or the cleaning agent are expensive do not occur.

<< third effect >>

Third, they are excellent in terms of costs. First, in the foaming apparatus of the present invention, since alkaline treatment liquids such as developer and peeling liquid obtained by separating bubbles are reused, they are excellent in cost.

In addition, the foam processing apparatus itself is made up of a suction unit, a processing unit, a level sensor, a valve, a pump, and the like, so that the configuration is simple and excellent in cost. Moreover, since it is comprised with a simple structure, it can add easily to an existing developing apparatus and a peeling apparatus, and is excellent in cost also from such a viewpoint.

Further, as in the conventional example of this kind described above, an increase in the supply amount of the fresh liquid of an alkaline treatment liquid such as a developing solution or a stripping solution, an increase in the amount of waste liquid accompanying it, an increase in the amount of waste liquid processing including bubbles, a response to environmental problems, and the like. There is no cost burden on the system.

BRIEF DESCRIPTION OF THE DRAWINGS The cross-sectional explanatory drawing of the whole front surface is provided in description of the form for inventing the foaming apparatus which concerns on this invention.
2 is an explanatory cross-sectional view of a front surface of a processing unit, for explaining the form for carrying out the invention;
Fig. 3 is a perspective view of the appearance of the processing unit, for the explanation of a form for carrying out the invention;
FIG. 4 is a cross-sectional schematic view of the main part front side, for explaining the form for carrying out the invention, and FIG. 4 (1), (2) and (3) show various mounting positions of the level sensor, and FIG. (4) shows a combination example of a valve and a pump, and FIG. 4 (5) shows a combination example of a suction port and a float.

EMBODIMENT OF THE INVENTION Hereinafter, the form for implementing this invention is demonstrated in detail.

<< about surface treatment apparatus 1 >>

As shown in FIG. 1, in the developing step or the peeling step of the electronic circuit board manufacturing process, the alkaline treatment liquid (from the spray nozzle 2 is applied to the substrate material A horizontally conveyed by the conveying roller of the conveyor 7 or the like). B) is sprayed, the substrate material (A) is surface treated, and the photosensitive resist (C) is dissolved and removed (refer to the background art section above for a manufacturing process).

That is, in the chamber 10 of the surface treatment apparatus 1, such as a developing apparatus and a peeling apparatus, peeling liquid, such as developing solution, such as sodium carbonate, and caustic soda, is sprayed as alkaline treatment liquid B with respect to the board | substrate material A.

Therefore, in the vicinity of the substrate material A, when the resist C is dissolved in the sprayed alkali treatment liquid B, bubbles D (bubbles and foams) are generated and the alkaline treatment liquid B and the substrate after use are It flows into the liquid tank 3 with the microparticles | fine-particles resist C melt | dissolved and removed from the ash A, and is collect | recovered. And the foam D is formed in the layer thickness of about 50-150 mm in height, for example, on the liquid surface of the alkali treatment liquid B containing the resist C of the liquid tank 3, and floats floating.

The surface treatment apparatus 1 is as described above.

<< Summary of this invention >>

EMBODIMENT OF THE INVENTION Hereinafter, the foaming apparatus E of this invention is demonstrated with reference to FIGS. First, the outline is described.

This foam processing apparatus E is used in the manufacturing process of an electronic circuit board, and is used for the surface processing apparatus 1, such as the developing apparatus and peeling apparatus which spray-processes the alkali treatment liquid B with respect to the board | substrate material A, and surface-treats. Is laid. And the foam D is processed continuously and the suction part 11 and the processing part 12 are provided.

The suction unit 11 sucks bubbles D generated when the resist C is dissolved in the alkaline treatment liquid B from the surface treatment apparatus 1. The processing part 12 is provided between the surface treatment apparatus 1 and the suction part 11, and separates the foam D collect | recovered by suction by liquid and gas.

The alkaline treatment liquid B obtained by liquefying and separating the foam D from the treatment unit 12 is returned to the surface treatment apparatus 1 for reuse. Alkali gas F obtained by separating the foam D from the processing unit 12 is sucked by the suction unit 11 and then exhausted.

Hereinafter, the present invention will be described in more detail.

《About suction part 11 and suction port 13》

First, the suction part 11 and the suction port 13 of the foam processing apparatus E are demonstrated with reference to FIG. The suction part 11 is provided with the blower 14. The suction side of the blower 14 is connected to the suction port 13 through the piping 15, the processing part 12, the hose 16, etc. one by one. The suction port 13, which is a shooter, is provided in the liquid tank 3 of the surface treatment apparatus 1 in an approximately inverted funnel shape at a height dimension position of, for example, about 30 mm with respect to the liquid surface.

On the other hand, the discharge side of the blower 14 is connected to the gas purification tower K via the exhaust duct 17. Alkali gas (F) obtained by separating from the bubble (D) in the processing unit (12) is sucked and discharged by the blower (14), and the alkali component is removed from the gas purification tower (K), thereby purifying air. Exhaust to the atmosphere.

The suction part 11 and the suction port 13 are comprised in this way.

<< about processing part 12 >>

Next, the processing part 12 of the foam processing apparatus E is demonstrated with reference to FIG. 2 and FIG. The whole processing part 12 is box-shaped, the inside is sucked by the suction part 11, and it becomes a negative pressure state, The inside is provided with the separating plate S in multiple stages up and down.

Thus, the bubbles D, which are sucked through the inside of the processing unit 12 from the lower side and pass through them, are broken and broken by colliding with the respective separating plates S, and separated into a liquid and a gas. It flows down the bottom of 12 and is stored.

Such a processing part 12 is explained in more detail. The processing part 12 of the example of illustration is comprised in the upper and lower parts through the flange 18 for maintenance, and the inspection window 19 is provided. The top of the processing unit 12 is connected to the blower 14 of the suction unit 11 in the pipe 15 via the flange 20, and the bottom of the processing unit 12 is connected to the inside of the liquid tank 3 through the flange 21. It is connected to the suction port 13.

In the inside of the processing part 12, in the example of illustration, the resin-separated plate S of a wave-shaped slide plate shape (for example, a net shape is possible) is provided horizontally with the vertical space | interval mutually spreading up and down several stages. . A space for passing bubbles D and alkali gas F is formed between the edge of each separation plate S and the wall surface of the processing unit 12, and each of the separation plates S also has a plurality of opening holes for passage. It is perforated and formed.

Therefore, the bubbles D sucked and recovered from the suction port 13 pass through the inside of the processing unit 12 from the bottom up, and are separated into liquid and gas by repeating the collision to each of the separating plates S in turn. .

The bubble D breaks and breaks by colliding with the unevenness of the separation plate S and liquefied into the original alkaline treatment liquid B. At the same time, the separated alkaline gas F is sucked from the top of the treatment unit 12. It is sucked to the part 11 and sent. → The obtained alkaline treatment liquid B flows down to the lower part of the treatment part 12 and is recovered. As a result, the upper portion of the processing unit 12 forming the box shape is in the state in which the alkali gas F is present in the upper portion, and the lower portion of the processing portion 12 is in the alkali treatment liquid B.

The processing part 12 is made in this way.

<< about level sensor 22, solenoid valve 23, etc. >>

Next, with reference to FIGS. 2-4, the level sensor 22 and the solenoid valve 23 which were attached to the process part 12 of the foam processing apparatus E are demonstrated.

In the processing unit 12, the level sensor 22 is attached to the lower part, and the bottom part is connected to the surface treatment apparatus 1 via the solenoid valve 23. The level sensor 22 can detect that the liquefied alkali treatment liquid B is stored in the lower part of the processing part 12 to the level of predetermined height.

The solenoid valve 23 is switched from the normally closed to the open based on the level detection of the predetermined height of the level sensor 22, whereby the alkali treatment liquid B stored even though the processing unit 12 is sucked or under a negative pressure state. It flows out from the processing part 12, it is made to return to the surface treatment apparatus 1, and discharged.

In addition, although the solenoid valve 23 is used in the example of illustration, this invention is not limited to this example of illustration, The other valve similarly controlled and functions by the level sensor 22 can also be used.

The level sensor 22 and the solenoid valve 23 are explained in more detail. As described above, the alkaline treatment liquid B separated and liquefied and flowed to the lower portion of the treatment part 12 is recovered from the drain opening 24 toward the liquid tank 3 of the surface treatment apparatus 1 through the pipe 25. It is to be discharged and returned.

However, the inside of the processing part 12 is always attracted by the suction part 11, and is in the negative pressure state. Therefore, it is impossible to discharge the alkali treatment liquid B of the lower part of the process part 12 toward the surface treatment apparatus 1 by the vacuuming effect by the negative pressure generally.

Therefore, as a countermeasure for such a negative pressure, in the illustrated example of the present invention, the solenoid valve 23 which is always closed is always provided in the vicinity of the drain opening 24 of the bottom of the processing unit 12 or in the pipe 25, and accordingly, the processing unit 12 The alkali treatment liquid (B) is once stored in the lower part of the). The alkaline treatment liquid B is higher than the installation portion of the solenoid valve 23 of the pipe 25 in the lower portion of the treatment portion 12, the drain box 26, and the lower portion of the treatment portion 12 in consultation. Once stored across.

At the bottom of the processing unit 12, a level sensor 22 capable of detecting that the alkaline treatment liquid B to be stored reaches a predetermined height level is stored in the sensor box 27 in the illustrated example, and separated. It is attached to the position lower than plate S. As the level sensor 22, the level switch which detects the position of the liquid level of the alkali treatment liquid B by an electrode system or a float system, for example is used.

When the level sensor 22 detects that the alkaline treatment liquid B has been stored up to the liquid level position of the level having a predetermined height, the solenoid valve 23 that has been waiting for the closing is switched to open based on the detection signal. As a result, the alkaline treatment liquid B flows out from the piping 25 to the liquid tank 3 against the negative pressure state in the treatment part 12 by the above-mentioned suction based on its own weight and mass, and generally evacuates. . In the illustrated example, the pipe 25 is provided with a stock tank 28 and a pump 29 interposed therebetween.

Then, the solenoid valve 25 returns to closed again. The solenoid valve 23 is intermittently switched to open at the rate of about once every 2 to 3 minutes, for example, and the alkaline treatment liquid B stored in the meantime flows out and is discharged | emitted.

The level sensor 22, the solenoid valve 23, etc. are made in this way.

<< action >>

The foam processing apparatus E of this invention is comprised as mentioned above. This results in the following.

(1) In the manufacturing process of an electronic circuit board, in the surface treatment apparatus 1, such as a developing apparatus and a peeling apparatus, alkali treatment liquid B, such as a developing solution and a peeling liquid, is sprayed with respect to the board | substrate material A (FIG. 1). See).

(2) In such a surface treatment of the substrate material A, the photosensitive resist C is dissolved and removed with the alkaline treatment liquid B, at which time bubbles D are generated.

(3) The generated bubbles D flow into the liquid tank 3 together with the used alkaline treatment liquid B or the resist C, and are recovered to form a layer on the liquid surface of the liquid tank 3.

(4) Accordingly, in the foam treatment apparatus E of the present invention, the suction port 13 sucks the bubbles D based on the suction force of the suction unit 11.

(5) The bubbles D sucked from the suction port 13 are sucked and supplied from the surface treatment apparatus 1 to the treatment unit 12, and are thus broken and destroyed by colliding with the separator S so that the original alkaline treatment liquid Separated and liquefied into (B). Alkali gas E separated at the same time is exhausted after passing through the suction part 11 (refer FIG. 1 thru | or 3).

(6) The alkali treatment liquid B liquefied by the above flows to the lower part of the process part 12, and is stored once. When the level sensor 22 detects that the level has reached a predetermined height, the solenoid valve 23 that is always closed is switched to open in seconds in the illustrated example (see FIGS. 2 and 3). Also, in another example, the check valve 30, which is always closed, is switched to open in seconds for every drive-on of the pump 31 (see FIG. 4 (4)).

(7) The alkali treatment liquid B thus stored is returned from the treatment portion 12 to the liquid tank 3 of the surface treatment apparatus 1 against the negative pressure state caused by suction and reused (see FIG. 1). .

(8) As described above, according to the foam treatment apparatus of the present invention, the bubbles D generated in the surface treatment apparatus 1 are continuously and reliably removed within a short time.

(9) This defoaming is performed physically and mechanically without using a chemical method with a defoamer.

(10) The alkali treatment liquid (B) obtained by defoaming is also provided for reuse. In addition, this foam processing apparatus E has the suction part 11, such as the blower 14, the processing part 12 incorporating the separating plate S, the level sensor 22 attached, and the solenoid valve 23. It consists of a valve, such as a check valve 30 and the pump 31, and is easy to comprise. Therefore, the additional installation to the surface treatment apparatus 1 is also easy.

`` Other examples ''

First, although the valve shown in FIGS. 1-3, for example, the solenoid valve 23 is provided in the piping 25, this invention is not limited to this illustration example. For example, it may be provided in the drain opening 24 at the bottom of the drain box 26 formed in communication with the bottom of the processing section 12 or in the drain opening 24 directly installed at the bottom of the processing section 12, although not shown in the drawing. have.

Secondly, although the level sensor 22 shown in (1) of FIG. 1 to FIG. 4 is housed and installed in the sensor box 27 provided in the opening communication at the lower part of the processing unit 12, the present invention is in such an illustrative example. It is not limited. For example, as shown in (2) and (3) of FIG. 4, it may be provided directly in the lower part of the processing part 12, or may be provided in the drain box 26 (in this case, storage of the alkaline process liquid B In the drain box 26).

Third, the alkali treatment liquid B in the liquid tank 3 may be sucked together with the foam D at the time of suction and collection of the foam D. The alkali treatment liquid B sucked in this way is once stored in the treatment part 12 together with the alkali treatment liquid B obtained from the foam D, and then returned to the liquid tank 3 for reuse.

Fourth, the same applies to the resist C, but after returning to the liquid tank 3, it is separated and removed by the filter 4 when the alkaline treatment liquid B is used.

Fifth, the discharge and return of the alkali treatment liquid B once stored in the lower part of the processing part 12 of the foam processing apparatus E to the liquid tank 3 are similar to the stock tank 28 for storage in the example shown in FIG. It is carried out via the pump 29. However, the present invention is not limited to such a pressure return method, and a free fall return method is also possible.

That is, the pressure return method is applied when the installation place of the processing unit 12 is far from the liquid tank 3 of the surface treatment apparatus 1. In the case of being close, the alkali treatment liquid B can be returned to the liquid tank 3 using only a free fall. Both methods can be used together.

Sixth, although the pipe 15, the pipe 25, the exhaust duct 17, etc. are used for pipe line formation in the example of illustration, a hose (flexible agent or a blade agent) can also be used instead.

Seventh, in the example shown in Figs. 1 to 3, the valve such as the solenoid valve 23 is opened and closed based on the detection of the level sensor 22, and the alkali treatment liquid B is returned. It is not limited to.

For example, as shown in (4) of FIG. 4, the bottom of the processing part 12 passes through a valve, such as a check valve 30 (lift Y type check valve), and the pump 31 in order, and the surface treatment apparatus 1 Is connected to the liquid tank 3).

The pump 31 is driven on through the control unit 32 based on the detection of the predetermined height level of the level sensor 22. Therefore, the valve, for example the check valve 30, is switched from the normally closed to the open based on the suction force when the pump 31 is driven on. Thereby, even if the inside of the process part 12 is suctioned and a negative pressure state, it is possible to flow out the stored alkaline process liquid B from the process part 12, and to return it to the surface treatment apparatus 1. As shown in FIG.

Further, for example, the following configuration may also be considered. In other words, the alkali treatment liquid B stored in the lower portion of the processing unit 12 is stored at a level of a predetermined height without using valves such as the level sensor 22, the solenoid valve 23, the pump 31, the check valve 30, and the like. Upon reaching, the pipe 25 may be provided with a valve (for example, a swing check valve) that always switches from closed to open based on the fluid pressure. Other operations of the valves are based on the solenoid valve 23, the check valve 30, and the like.

Eighthly, as shown in (5) of FIG. 4, a suction port provided in the surface treatment apparatus 1 and opened to suck the generated bubbles D toward the treatment portion 12 and the suction portion 11. (13) may be supported by a float (33).

The float 33 floats on the liquid surface of the alkali treatment liquid B in the liquid tank 3 of the surface treatment apparatus 1, and floats in the bubble D which floats the suction port 13 in a predetermined thickness on the liquid surface. Hold at the opening height position. The suction port 13 of the example of illustration is hold | maintained through the base board 34 by four floats 33. As shown in FIG.

There is a possibility that the liquid level may fluctuate up and down, and therefore, the bubble D floating thereon may also fluctuate up and down. Thus, by holding the suction port 13 on the float 33, the suction port 13 may be such a Following the up and down fluctuation, the opening into the bubble D is reliably maintained.

1: surface treatment device
3: liquid tank
11: suction
12: processing unit
13: suction port
22: level sensor
23: solenoid valve (valve)
30: check valve (valve)
31: pump
33: float
A: Substrate
B: alkali treatment liquid
C: resist
D: foam
E: foam processing unit
F: alkali gas
S: Separator

Claims (5)

A continuous processing apparatus for foam, which is used in a manufacturing process of an electronic circuit board and is attached to a surface treatment apparatus that sprays an alkali treatment liquid onto a substrate material and performs a surface treatment, comprising a suction unit and a treatment unit,
The suction unit sucks the bubbles generated when the photosensitive resist is dissolved in the alkali treatment liquid from the surface treatment apparatus,
The treatment unit is interposed between the surface treatment device and the suction unit, characterized in that for separating the foam recovered by suction with a liquid and gas,
The entire processing unit forms a box shape, the inside is sucked by the suction unit to be in a negative pressure state, there is provided a separator plate in the upper and lower stages,
The bubbles that are sucked through the inside of the processing unit from the bottom to the top are broken by being collided with each of the separation plates and separated into liquid and gas,
The alkaline treatment liquid obtained by liquefying by the separation of the liquid and gas flows down to the lower portion of the treatment part and is stored, and then returned to the surface treatment apparatus for reuse.
The alkali gas obtained by separating the foam from the processing unit is sucked into the suction unit, and then exhausted.
Foam processing unit.
delete The method of claim 1,
The processing unit is provided with a level sensor at the bottom, the bottom is connected to the surface treatment apparatus through a valve,
The level sensor can detect that the alkaline treatment liquid is stored in the lower portion of the processing unit up to a level of a predetermined height, the valve is switched from the normally closed to the open based on the level detection of the predetermined height of the level sensor,
Even when the processing unit is sucked or under a negative pressure, the stored alkaline treatment liquid can be flowed out of the processing unit and discharged to return to the surface treatment apparatus.
Foam processing unit.
The method of claim 1,
The processing unit is provided with a level sensor in the lower portion, the bottom portion is connected to the surface treatment apparatus through the valve and the pump in turn,
The level sensor may detect that the alkali treatment liquid is stored in the lower portion of the processing unit up to a level of a predetermined height, the pump is driven on based on the level detection of the predetermined height of the level sensor, and the valve is On the basis of the suction force when the pump is turned on, it is switched from the normal closing to the open,
Even when the processing unit is sucked or under a negative pressure, the stored alkaline treatment liquid can be flowed out of the processing unit and discharged to return to the surface treatment apparatus.
Foam processing unit.
The method of claim 1,
A suction port provided in the surface treatment apparatus and opened to suck the generated foam toward the processing portion and the suction portion, is held by the float,
The float floats on the liquid level of the alkali treatment liquid in the liquid tank of the surface treatment apparatus, and maintains the suction port at a height position opening in the bubble drifting in a predetermined thickness on the liquid surface.
Foam processing unit.

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