CN107422616A - Developer solution bogey and developing apparatus - Google Patents
Developer solution bogey and developing apparatus Download PDFInfo
- Publication number
- CN107422616A CN107422616A CN201710891143.XA CN201710891143A CN107422616A CN 107422616 A CN107422616 A CN 107422616A CN 201710891143 A CN201710891143 A CN 201710891143A CN 107422616 A CN107422616 A CN 107422616A
- Authority
- CN
- China
- Prior art keywords
- developer solution
- bubble
- casing
- detection device
- bogey
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims abstract description 65
- 239000007788 liquid Substances 0.000 claims abstract description 32
- 230000001174 ascending effect Effects 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000008367 deionised water Substances 0.000 claims abstract description 16
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 16
- 239000002699 waste material Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000007689 inspection Methods 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 238000005260 corrosion Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 description 56
- 239000011259 mixed solution Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention provides a kind of developer solution bogey, including developer solution casing, drain pipe, sewer pipe, deionized water ascending pipe, developer solution ascending pipe, bubble detection device and bubble removal device, the developer solution casing is provided with liquid outlet, waste liquid port, the drain pipe and sewer pipe respectively with liquid outlet, waste liquid port is tightly connected, the deionized water ascending pipe and developer solution ascending pipe are respectively protruding into developer solution casing, the bubble detection device is on developer solution casing, the bubble detection device is used for being detected in developer solution casing with the presence or absence of bubble, the bubble removal device is in the cavity of display liquid case body.Present invention also offers a kind of developing apparatus, including described developer solution bogey and shower nozzle, the shower nozzle is connected with drain pipe.Compared with prior art, by bubble removal device and bubble detection device, the bubble in developer solution casing is monitored and bubble is eliminated, improves the homogeneity of development.
Description
Technical field
The present invention relates to a kind of making of liquid crystal display panel, particularly a kind of developer solution bogey and developing apparatus.
Background technology
Exposure imaging technology is very important link in chip field, is to be used for preparing the micro-nano figure of accurate device now
The most frequently used gimmick of shape.Its basic functional principle is, first one layer of photoresist of substrate surface even spread in cleaning；So
Mask exposure technology is utilized afterwards, by the irradiation of ultraviolet light, the photoresist Part Traits by ultraviolet light is changed；
Finally by the cleaning of developer solution, desirable photoetching offset plate figure is remained, completes the design of micro-nano graph.
At present developing machine be the developer solution (KOH) of high concentration is mixed with deionized water (DIW) in developer solution casing it is dilute
Release, mixing rate is slow；Bubble generation is had in dilution, bubble can cause developer solution density to fluctuate, while bubble
So that liquid level virtual height, easily triggers overflow sensor, cause discharge opeing, cause the waste of developer solution；In development, retained in solution
Bubble can be collected around in shower nozzle, influence development homogeneity and development effect.
The content of the invention
For overcome the deficiencies in the prior art, the present invention provides a kind of developer solution bogey and developing apparatus, so as to eliminate
Bubble, improve the homogeneity of development.
The invention provides a kind of developer solution bogey, including developer solution casing, drain pipe, sewer pipe, deionized water
Ascending pipe, developer solution ascending pipe, bubble detection device and bubble removal device, the developer solution casing be provided with liquid outlet,
Waste liquid port, the drain pipe and sewer pipe are tightly connected with liquid outlet, waste liquid port respectively, the deionized water ascending pipe and aobvious
Shadow liquid ascending pipe is respectively protruding into developer solution casing, and the bubble detection device is on developer solution casing, the bubble detection
Device is used for being detected in developer solution casing with the presence or absence of bubble, chamber of the bubble removal device located at display liquid case body
In body.
Further, the bubble detection device includes projection source and reflection source receiver, the development liquid case
At least side side wall is transparent formation detection zone in the surrounding side wall of body, and the projection source and reflection source receiver are set
In on the side of detection zone, the projection source is projected on detection zone.
Further, the bubble removal device is ultrasonic generator.
Further, the ultrasonic generator is externally provided with the shell of acid-alkali-corrosive-resisting.
Further, the frequency of the ultrasonic generator is 30-100MHz.
Further, the shell is made up of stainless steel material.
Further, covered with the first light non-transmittable layers in its excess-three side side wall of the developer solution casing.
Further, its excess-three side side wall of the developer solution casing is transparent.
Further, the side on the developer solution casing positioned at detection zone is provided with bubble detection device accommodating cavity, described
Projection source and reflection source receiver are respectively arranged on both sides cavity adjacent with detection zone in bubble detection device accommodating cavity
On wall, the cavity wall adjacent and relative with detection zone is provided with the second light non-transmittable layers in the bubble detection device accommodating cavity.
Present invention also offers a kind of developing apparatus, including described developer solution bogey and shower nozzle, the shower nozzle
It is connected with drain pipe.
The present invention compared with prior art, by the bubble detection device on developer solution casing and in developer solution casing
Bubble removal device is set, the bubble in developer solution casing is monitored by bubble detection device, filled by bubble removal
Caused bubble after mixing the developer solution in developer solution casing and deionized water is put to be removed；So as to eliminate gas
Bubble, improve the homogeneity of development.
Brief description of the drawings
Fig. 1 is the structural representation of developing apparatus of the present invention；
Fig. 2 is the structural representation of bubble detection device of the present invention；
Fig. 3 is the controller of the present invention and the connection diagram of device.
Embodiment
The present invention is described in further detail with reference to the accompanying drawings and examples.
As shown in figure 1, the invention discloses a kind of developer solution bogey, the bogey includes developer solution casing 1, gone out
Liquid pipe 2, sewer pipe 3, deionized water ascending pipe 4, developer solution ascending pipe 5, bubble detection device 6 and bubble removal device 7, its
In：
The developer solution casing 1 is cube structure, and it is internal for filling developer solution and deionized water；In development liquid case
Body 1 is provided with liquid outlet 11, waste liquid port 12, while is additionally provided with two pores 16；The drain pipe 2 and sewer pipe 3 are respectively with going out
Liquid mouth 11, waste liquid port 12 are tightly connected, and the deionized water ascending pipe 4 and developer solution ascending pipe 5 are stretched by pore 16 respectively
Enter into the cavity of developer solution casing 1；The bubble detection device 6 is on developer solution casing 1, the bubble detection device 6
For being detected to the mixed solution in developer solution casing 1 with the presence or absence of bubble, the bubble removal device 7 is located at display liquid
In the cavity of casing 1, bubble removal device 7 be used to carrying out developer solution and deionized water mixed solution sufficiently mixing and
Remove the bubble in mixed solution.
Specifically, liquid outlet 11 and waste liquid port 12 are located at developer solution casing 1 at bottom, and such setting can make
Waste liquid is discharged cleaner；The part that deionized water ascending pipe 4 and developer solution ascending pipe 5 are stretched into developer solution casing 1 is to account for
Between deionized water ascending pipe 4 and 4th/3/4ths~five of the total length of developer solution ascending pipe 5, so that deionized water
Ascending pipe 4 and developer solution ascending pipe 5 be able to can soak mixed solution close proximity to the cavity bottom of developer solution casing 1
And do not continue to inject under conditions of pipeline, prevent liquid produces in injection from acutely rocking；Bubble removal device 7 is located at development liquid case
On the cavity bottom of body 1, the area with mixed solution submergence can be increased, the effect of mixing can be so improved and go degasification
The effect of bubble；Bubble detection device 6 is outer at the bottom of developer solution casing 1 located at developer solution casing 1, preferably located at bubble
Detection means 6 is located on bubble removal device 7.
As depicted in figs. 1 and 2, bubble detection device 6 includes projection source 61 and reflection source receiver 62, is developing
At least side side wall forms detection zone 63, the projection source 61 and reflected light to be transparent in the surrounding side wall of liquid case body 1
Source receiver 62 is on the side of detection zone 63, on light source projects to the detection zone 63 of the projection source 61, specifically, throws
The incident angle of light source 61 is penetrated between 45-60 degree, preferably 51 degree, the set location of the reflection source receiver 62 according to
Depending on the incident angle of projection source 61, it is not specifically limited herein.
The bubble detection device 6 of the present invention also includes a measuring circuit, and measuring circuit is connected with reflection source receiver 62,
Measuring circuit can use photoelectric detective circuit conventional in the prior art to realize, be not specifically limited herein；
The measuring circuit is used to obtain reflected light by reflection source receiver 62, and reflected light is detected, root
Bubble is judged whether according to result, generally, reflection source receiver 62 receives light pulse, the light pulse signal of reception
Exported after amplified, rectification and active power filtering, an amplifier is typically respectively provided with measuring circuit, herein, can also put
A threshold potential is set on big device, it is zero bubble-free is exported when not producing total reflection；And once have bubble appearance, output letter
Number, zero is not output signal here.
The operation principle of the bubble detection device 6 of the present invention is as follows：When bubble is not present in developer solution casing 1, projection
Light source 61 produces a branch of directional light directive detection zone 63, and light is inhaled after passing through detection zone 63 by mixed solution refraction and major part
Receive, reflected light is very weak, therefore reflection source receiver 62 receive to be not total reflection light, therefore measuring circuit does not send output
Signal；When bubble in mixed solution be present, total reflection, therefore detection zone are produced to air because bubble detection device 6 designs
63 are reflected light, and now reflected light is most strong, thus reflection source receiver 62 by the light of reception by measuring circuit after, it is defeated
Go out signal.
The light source of the projection source 61 can be produced by light emitting diode, preferably the light pulse of 1 kilocycle；In light-emitting diodes
The front end of pipe is provided with optical mirror slip group, and the light for making to send is directional light.
The reflection source receiver 62 can use phototriode, and the light for focusing is provided with phototriode
Learn lens set.
In the present invention, covered with the first light non-transmittable layers 13 in its excess-three side side wall of developer solution casing 1, but the present invention is unlimited
In this, its excess-three side side wall that can also be developer solution casing 1 is transparent.First light non-transmittable layers 13 are located at developer solution casing
On 1 cavity wall or on the outer wall of developer solution casing 1,
As shown in Fig. 2 the side positioned at detection zone 63 on developer solution casing 1 is provided with bubble detection device accommodating cavity 14,
The projection source 61 and reflection source receiver 62 are respectively arranged in bubble detection device accommodating cavity 14 and the phase of detection zone 63
On adjacent both sides cavity wall, set in the bubble detection device accommodating cavity 14 on the cavity wall adjacent and relative with detection zone 63
There are the second light non-transmittable layers 15, i.e., be provided with second on the cavity wall of the bubble detection device accommodating cavity 15 in addition to detection zone 63
Light non-transmittable layers 15, so as to ensure that not having unnecessary light enters in bubble detection device accommodating cavity 14, influences the effect of detection
Fruit；Specifically, reflection source receiver 62 is not specifically limited herein depending on the incident angle of projection source 61.
As shown in figure 1, bubble removal device 7 is ultrasonic generator, acid and alkali-resistance corruption is externally provided with supersonic generator
The shell 71 of erosion；The ultrasonic generator is prior art, is not specifically limited herein；Specifically, ultrasonic wave fills
The frequency put is 30-100MHz；The shell 71 is made up of stainless steel material.
Ultrasonic generator de-bubble principle is as follows：
When sound wave reaches a certain material, the mechanical energy of ultrasonic wave makes material molecule produce very big acceleration, so
Huge acceleration, the motion of liquid particle generation rapidly can be made, make bubbles burst.
Acoustic pressure acts on：When sound wave is passed through in foam, due to acoustic vibration, material molecule is set to produce compression and sparse work
With because ultrasonic wave has very big energy, the acoustic pressure for just making foam generation very big acts on.Gas is being not affected by ul-trasonic irradiation
Before, only by atmospheric pressure, after ultrasonic wave is added on foam, if acoustic vibration makes its compression, its pressure increases,
Promote lather collapse；If acoustic vibration makes molecule sparse, foam pressure swelling fracture less than atmospheric pressure.
As shown in figure 3, the also settable controller of the developer solution bogey of the present invention and power supply, controller respectively with
Power supply, bubble removal device 7, bubble detection device 6 connect, power supply be respectively bubble removal device 7, bubble detection device 6 with
And controller power supply, the controller are used to receiving output signal that the measuring circuit of bubble detection device 6 sends to control bubble
Removal device 7, bubble detection device 6 open and close.
The control principle of the controller is as follows：
When injecting deionized water and developer solution, controller opens bubble removal device 7, contributes to solution fully mixed
Close, improve the uniformity of mixed liquor；Bubble removal device 7, electricity described here are closed after the stable conductivity of mixed solution
Conductance can be obtained by conductivity meter, be not specifically limited herein, be then turned on bubble detection device 6 in mixed solution
Bubble detected, when bubbles are present, bubble detection device 6 sends output signal to controller, and controller receives this
Bubble removal device 7 is again started up after output signal and carries out de-bubble, after certain time is opened, controller closes bubble removal dress
Put 7 and be again started up bubble detection device 6, above-mentioned bubble detection and de-bubble action are repeated, until bubble is wholly absent.
As shown in figure 1, present invention also offers a kind of developing apparatus, including above-mentioned developer solution bogey and shower nozzle
8, the shower nozzle 8 is connected with drain pipe 2, pump 9 is provided between shower nozzle 8 and drain pipe 2, the developer solution bogey is above-mentioned
Detailed description has been carried out, will not be repeated here.
The present invention by developer solution bogey be used for developing apparatus in when, developer solution bogey can be not provided with controller with
And power supply, both are substituted using the control system and power supply of developing apparatus, the control principle of control principle and controller noted above
It is identical, it will not be repeated here.
The difference of control principle is that the unlatching of bubble detection device 6 sets and before mixed solution sprinkling, its
It is remaining constant.
Although the present invention has shown and described with reference to specific embodiment, it should be appreciated by those skilled in the art that：
In the case where not departing from the spirit and scope of the present invention limited by claim and its equivalent, can carry out herein form and
Various change in details.
Claims (10)
- A kind of 1. developer solution bogey, it is characterised in that：Including developer solution casing (1), drain pipe (2), sewer pipe (3), go Ionized water ascending pipe (4), developer solution ascending pipe (5), bubble detection device (6) and bubble removal device (7), the developer solution Casing (1) is provided with liquid outlet (11), waste liquid port (12), the drain pipe (2) and sewer pipe (3) respectively with liquid outlet (11), Waste liquid port (12) is tightly connected, and the deionized water ascending pipe (4) and developer solution ascending pipe (5) are respectively protruding into developer solution casing (1) in, on developer solution casing (1), the bubble detection device (6) is used for developer solution the bubble detection device (6) Casing is detected in (1) with the presence or absence of bubble, and the bubble removal device (7) is in the cavity of display liquid case body (1).
- 2. developer solution bogey according to claim 1, it is characterised in that：The bubble detection device (6) includes throwing Penetrate light source (61) and reflection source receiver (62), at least side side wall in the surrounding side wall of the developer solution casing (1) For transparent formation detection zone (63), the projection source (61) and reflection source receiver (62) are located at the one of detection zone (63) On side, the projection source (61) is projected on detection zone (63).
- 3. developer solution bogey according to claim 1 or 2, it is characterised in that：The bubble removal device (7) is super Sound wave generating device.
- 4. developer solution bogey according to claim 3, it is characterised in that：The ultrasonic generator is externally provided with resistance to The shell (71) of acid and alkali corrosion.
- 5. developer solution bogey according to claim 3, it is characterised in that：The frequency of the ultrasonic generator is 30-100MHz。
- 6. developer solution bogey according to claim 4, it is characterised in that：The shell (71) is by stainless steel material system Into.
- 7. developer solution bogey according to claim 2, it is characterised in that：Its excess-three of the developer solution casing (1) Covered with the first light non-transmittable layers (13) in the side wall of side.
- 8. developer solution bogey according to claim 2, it is characterised in that：Its excess-three of the developer solution casing (1) Side side wall is transparent.
- 9. developer solution bogey according to claim 2, it is characterised in that：Positioned at inspection on the developer solution casing (1) The side for surveying area (63) is provided with bubble detection device accommodating cavity (14), the projection source (61) and reflection source receiver (62) it is respectively arranged on both sides cavity wall adjacent with detection zone (63) in bubble detection device accommodating cavity (14), the bubble inspection Survey cavity wall adjacent and relative with detection zone (63) in device accommodating cavity (14) and be provided with the second light non-transmittable layers (15).
- A kind of 10. developing apparatus, it is characterised in that：Including the developer solution bogey as described in claim 1-9 any one And shower nozzle (8), the shower nozzle (8) are connected with drain pipe (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710891143.XA CN107422616A (en) | 2017-09-27 | 2017-09-27 | Developer solution bogey and developing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710891143.XA CN107422616A (en) | 2017-09-27 | 2017-09-27 | Developer solution bogey and developing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107422616A true CN107422616A (en) | 2017-12-01 |
Family
ID=60435900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710891143.XA Pending CN107422616A (en) | 2017-09-27 | 2017-09-27 | Developer solution bogey and developing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107422616A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108732875A (en) * | 2018-05-25 | 2018-11-02 | 深圳市华星光电技术有限公司 | Transmission device and developing machine |
| CN109489768A (en) * | 2018-11-28 | 2019-03-19 | 乔治洛德方法研究和开发液化空气有限公司 | Monitor the system and method and glass furnace of foam line position on glass melt surface |
| CN112495017A (en) * | 2020-11-10 | 2021-03-16 | 芯米(厦门)半导体设备有限公司 | Developer classifying, recycling and treating equipment |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108732875A (en) * | 2018-05-25 | 2018-11-02 | 深圳市华星光电技术有限公司 | Transmission device and developing machine |
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| CN109489768B (en) * | 2018-11-28 | 2020-07-10 | 乔治洛德方法研究和开发液化空气有限公司 | System and method for monitoring bubble boundary line position on surface of glass melt and glass kiln |
| CN112495017A (en) * | 2020-11-10 | 2021-03-16 | 芯米(厦门)半导体设备有限公司 | Developer classifying, recycling and treating equipment |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
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| PB01 | Publication | ||
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| CB02 | Change of applicant information |
Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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| CB02 | Change of applicant information | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171201 |
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| WD01 | Invention patent application deemed withdrawn after publication |