KR101130377B1 - Adhesive composition, circuit connecting material using the adhesive composition, method for connecting circuit member, and circuit connecting body - Google Patents

Abstract

The adhesive composition of this invention is used in order to adhere | attach circuit members and to electrically connect the circuit electrodes which each circuit member has, and the average particle diameter of an epoxy resin, an epoxy resin hardener, and a primary particle is 300 nm. Silicon microparticles | fine-particles which are the following are contained.

Circuit member, adhesive composition, silicon fine particles, internal stress

Description

Adhesive composition and circuit connection material using the same, the connection method of a circuit member, and a circuit connection body TECHNICAL FIELD

This invention relates to an adhesive composition, the circuit connection material using the same, the connection method of a circuit member, and the circuit connection body obtained by this.

As a method of mounting a liquid crystal drive IC on a glass panel for liquid crystal display displays, chip-on-glass (CHIP-ON-GLASS) mounting (hereinafter referred to as "COG mounting") is widely used. COG mounting is a method of bonding a liquid crystal drive IC directly onto a glass panel.

In the said COG mounting, the adhesive composition which has anisotropic conductivity is generally used as a circuit connection material. This adhesive composition contains an adhesive component and the electrically-conductive particle mix | blended as needed. The circuit connection material which consists of such an adhesive composition is arrange | positioned in the part in which the electrode on a glass panel was formed, and crimping | bonding a semiconductor element, a package, etc., such as IC and LSI on it, hold | maintains the conduction state of the facing electrodes, and adjoining electrodes Electrical connections and mechanical fastening are performed to maintain insulation.

By the way, the combination of an epoxy resin and an imidazole series hardening | curing agent is used previously as an adhesive component of an adhesive composition. In the adhesive composition which these components were mix | blended, an epoxy resin is hardened | cured by maintaining a temperature of 200 degreeC about 5 second normally, and COG mounting of an IC chip is performed.

However, in recent years, as the size and thickness of liquid crystal panels are advanced, when COG mounting is performed under the above temperature conditions using a conventional adhesive composition, internal stresses are generated due to thermal expansion and contraction caused by the temperature difference at the time of heating. There is a problem that warpage occurs in the chip or glass panel. When the temperature cycle test is performed on the warped circuit connection body, internal stress may increase and peeling may occur at the connection part of the circuit connection body.

As a means of reducing the warpage which arises in a circuit member, patent document 1 describes the adhesive film for circuit connections containing the latent hardening | curing agent containing a sulfonium salt as a hardening | curing agent of an epoxy resin. By using this adhesive film, the heating temperature at the time of mounting can be reduced to 160 degrees C or less, and the effect which can reduce the internal stress which arises in the circuit connection body of a circuit member is described (paragraph of patent document 1). See).

Patent document 1; Japanese Patent Laid-Open No. 2004-221312

[Initiation of invention]

[Problem to Solve Invention]

However, although the adhesive film of patent document 1 exhibits the outstanding effect in terms of the low temperature of heating temperature, since the special latent hardening | curing agent is used, there existed a subject that the pot life was comparatively short. Therefore, compared with the conventional imidazole series hardening | curing agent mix | blended this adhesive film, the use is limited.

This invention is made | formed in view of such a situation, and it aims at providing the adhesive composition which can fully reduce the internal stress which arises in a circuit connection body, even when the conventional imidazole series epoxy resin hardener is used, and the circuit connection material using the same. It is done.

Moreover, an object of this invention is to provide the circuit connection body with which the circuit member was connected by low connection resistance by the said circuit connection material, and the connection method of the circuit member for obtaining this.

[Means for solving the problem]

The adhesive composition of this invention is used in order to adhere | attach circuit members and to electrically connect the circuit electrodes which each circuit member has, and an epoxy resin, an epoxy resin hardening | curing agent, and a silicon particle with an average particle diameter of 300 nm or less It contains.

In the adhesive composition of the present invention, the silicon fine particles play a role of a stress relaxing agent. Therefore, even if an imidazole series hardening | curing agent is used as a hardening | curing agent of an epoxy resin, and hardening process is carried out at about 200 degreeC, in order to obtain a sufficiently long pot life, internal stress can be effectively alleviated. Therefore, the curvature of a circuit connection body and generation | occurrence | production of the peeling phenomenon in the member interface of a mounting body can fully be suppressed.

It is preferable that the adhesive composition of this invention contains a conductive particle further. According to the adhesive composition in which electroconductive particle was disperse | distributed in the adhesive component, the circuit connection body which has the outstanding connection reliability can be manufactured.

Moreover, it is preferable that the adhesive composition of this invention contains 10-40 mass% of silicone microparticles | fine-particles based on the total mass of the said adhesive composition. By containing 10-40 mass% of silicone microparticles | fine-particles in an adhesive composition, the internal stress in a circuit connection is further fully alleviated.

It is preferable that the adhesive composition of this invention is manufactured by mix | blending core-shell silicon microparticles | fine-particles which consist of the core particle which consists of silicone microparticles | fine-particles, and the material containing an acrylic resin, and has a coating layer provided so that the said core particle may be coat | covered. Since the coating layer (shell) containing an acrylic resin has high affinity with an epoxy resin, aggregation of silicon microparticles | fine-particles is suppressed and the state which silicone microparticles | fine-particles highly disperse | distributed in an adhesive component can fully be maintained. As a result, the stress relaxation effect on a circuit connection body is exhibited stably. It is preferable that core-shell type silicon microparticles | fine-particles are 40-90 mass% of content of silicon | silicone based on the total mass of the said core-shell silicon fine particles.

In the adhesive composition which concerns on this invention, it is preferable that the storage elastic modulus in 40 degreeC of the hardened | cured material obtained by heating at temperature 200 degreeC for 1 hour is 1-2 GPa. When the adhesive composition which satisfy | fills the said conditions regarding the storage elastic modulus of hardened | cured material is used for the connection of circuit members, the circuit connection body which has the outstanding connection reliability can be manufactured.

The circuit connection material of this invention consists of a film-form base material and the said adhesive composition which concerns on this invention, and has an adhesive bond layer provided on one side of a base material. According to the circuit connection material of such a structure, an adhesive bond layer can be arrange | positioned easily on a circuit member, and work efficiency can be improved. In addition, in using a circuit connection material, a film-form base material peels suitably.

The circuit connection body of this invention consists of a pair of circuit members arrange | positioned opposingly, the hardened | cured material of the said adhesive composition concerning this invention, interposed between a pair of circuit members, and the circuit electrodes which each circuit member has are electrically connected. The connection part which adhere | attaches the said circuit member so that it may be connected is provided.

In the circuit connecting body of the present invention, at least one of the pair of circuit members may be an IC chip. In the circuit connecting body, at least one surface of each of the circuit electrodes of the pair of circuit members is at least one selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum, and indium tin oxide. It may also consist of species.

In the circuit connecting body of the present invention, at least one of the contact surfaces of the pair of circuit members in contact with the connecting portion may have a portion formed of at least one or more kinds of materials selected from silicon nitride, a silicon compound, and a polyimide resin. have.

The connection method of the circuit member of this invention interposes the said adhesive composition concerning this invention between the pair of circuit members arrange | positioned opposingly, and heats and pressurizes the whole, and consists of hardened | cured material of an adhesive composition, The circuit connection body provided with a pair of circuit member and a connection part is obtained by forming the connection part which affixes circuit members so that the circuit electrodes which each circuit member has between may be electrically connected.

[Effects of the Invention]

According to the present invention, the internal stress generated in the circuit connecting body can be sufficiently reduced.

BRIEF DESCRIPTION OF THE DRAWINGS It is sectional drawing which shows one Embodiment of the circuit connection material which concerns on this invention.

2 is a cross-sectional view showing the core-shell silicon fine particles.

3 is a cross-sectional view showing a state in which a circuit connection material according to the present invention is used between circuit electrodes and the circuit electrodes are connected to each other.

4 is a process diagram showing, by a schematic cross-sectional view, one embodiment of a method for connecting a circuit member according to the present invention.

5 is a cross-sectional view showing another embodiment of the conductive particles.

6 is a cross-sectional view showing another embodiment of the circuit connection material according to the present invention.

[Description of the code]

5, 15: circuit connection material, 6, 6a, 6b: base material, 7, 8: adhesive layer, 7a: conductive particle containing layer, 7b: conductive particle free layer, 9: adhesive component, 10: core-shell silicon fine particles, 10a: Silicon fine particles, 10b: coating layer, 20A, 20B: conductive particles, 30: first circuit member, 40: second circuit member, 50a: connecting portion, 100: circuit connecting member

BEST MODE FOR CARRYING OUT THE INVENTION [

EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of this invention is described in detail, referring an accompanying drawing. In addition, in description of drawing, the same code | symbol is attached | subjected to the same element, and the overlapping description is abbreviate | omitted. In addition, for the convenience of drawing, the dimension ratio of drawing does not necessarily correspond with the thing of description.

<Circuit connection material>

First, the circuit connection material which concerns on this embodiment is demonstrated. 1 is a cross-sectional view showing the circuit connection material 5 according to the present embodiment. The circuit connection material 5 is equipped with the film-form base material 6 and the adhesive bond layer 8 provided on one side of the base material 6. The adhesive layer 8 contains the adhesive component 9 containing (a) an epoxy resin and (b) an epoxy resin curing agent, and the silicon fine particles 10a and conductive particles 20A dispersed in the adhesive component 9. It consists of an adhesive composition.

The circuit connection material 5 is manufactured by apply | coating the solution of an adhesive composition on a film-form base material 6 using a coating apparatus, hot-air drying for predetermined time, and forming the adhesive bond layer 8. By forming the adhesive layer 8 which consists of an adhesive composition, for example, compared with the case where an adhesive composition is used in paste form, COG mounting or COF mounting (chip-on-flex) of IC chips etc. In the case of use in a) implementation, the work efficiency is improved.

As the base material 6, polyethylene terephthalate (PET), polyethylene naphthalate, polyethylene isophthalate, polybutylene terephthalate, polyolefin, polyacetate, polycarbonate, polyphenylene sulfide, polyamide, ethylene-vinyl acetate airborne It is possible to use various tapes made of copolymer, polyvinyl chloride, polyvinylidene chloride, synthetic rubber system, liquid crystal polymer and the like. Above all, the material constituting the base material 6 is not limited to this. In addition, as the base material 6, a material having a corona discharge treatment, an anchor coating treatment, an antistatic treatment, or the like on a contact surface with the adhesive layer 8 can be used.

Moreover, when using the circuit connection material 5, you may coat and use a peeling treatment agent on the surface of the base material 6 so that the base material 6 may be easily peeled from the adhesive bond layer 8. As the peeling treatment agent, various peeling treatment agents such as a silicone resin, a copolymer of silicone and an organic resin, an alkyd resin, an aminoalkyd resin, a resin having a long chain alkyl group, a resin having a fluoroalkyl group, and a shellac resin can be used.

Although the thickness of the base material 6 is not restrict | limited in particular, It is preferable to set it as 4-200 micrometers in consideration of the storage of the circuit connection material 5, the convenience at the time of use, etc., and 15 in consideration of material cost and productivity. It is more preferable to set it as -75 micrometers.

Although the thickness of the adhesive bond layer 8 may be adjusted suitably according to the shape of the circuit member to connect, etc., it is preferable that it is 5-50 micrometers. If the thickness of the adhesive layer 8 is less than 5 μm, the amount of the adhesive composition filled between the circuit members tends to be insufficient. On the other hand, when it exceeds 50 micrometers, it exists in the tendency which becomes difficult to ensure the conduction between the circuit electrodes to connect.

It is preferable that the adhesive composition which forms the adhesive bond layer 8 turns into hardened | cured material which satisfy | fills the following conditions, when it heats at the temperature of 200 degreeC for 1 hour. In other words, the cured product of the adhesive composition preferably has a storage modulus of 1 to 2 GPa at 40 ° C. measured by a dynamic viscoelasticity measuring device in terms of connection reliability.

The main reason that the hardened | cured material of the adhesive composition which concerns on this embodiment can achieve the outstanding characteristic regarding storage elastic modulus contains the silicon fine particle 10a of 300 nm or less of average particle diameters of the primary particle highly disperse | distributed in the adhesive component 9 In addition, it is inferred that this silicon fine particle 10a functions because it functions as a stress relaxation agent.

(Silicone Fine Particles)

FIG. 2: is sectional drawing which shows the core-shell silicone microparticles | fine-particles which are an aspect of the silicone microparticles | fine-particles 10a before mix | blending with the adhesive component 9. In FIG. The core-shell silicon fine particle 10 shown in FIG. 2 has the silicon fine particle 10a which comprises a core particle, and the coating layer 10b which coat | covers this silicon fine particle 10a and forms a shell. The silicon fine particles 10a are dispersed in the adhesive component 9 by mixing the adhesive component 9 and the core-shell silicon fine particles 10.

The average particle diameter of the silicon fine particles 10a is 300 nm or less. When the average particle diameter exceeds 300 nm, the dispersion of the silicon fine particles 10a in the adhesive component 9 becomes nonuniform, and the adhesive composition containing this becomes poor in fluidity, and at the same time, the secondary aggregates of the silicon fine particles 10a It becomes easy to occur. It is preferable that it is 50-250 nm, and, as for the average particle diameter of the primary particle of silicone microparticles | fine-particles 10a, it is more preferable that it is 70-170 nm. If the average particle diameter is less than 50 nm, the stress relaxation effect by the silicon fine particles 10a tends to be insufficient.

The silicon fine particles 10a have an organosiloxane skeleton and are solid silicone polymers at room temperature. Preferred silicone polymers, with a _{[RR'SiO 2/2], [} RSiO 3/2] and [SiO _4/2] 1 one or polyorganosiloxane composed of two or more that are selected from siloxy group represented by Can be. Here, R is a C6 or less alkyl group, an aryl group, or a substituent which has a carbon double bond at the terminal, and R 'represents a C6 or less alkyl group or an aryl group.

If the ratio of [RSiO _3/2 ] and [SiO _4/2 ] forming a crosslinked structure increases among the units forming the silicon fine particles 10a, the hardness and elastic modulus of the silicone polymer tends to increase. As a result, the stress relaxation effect by the silicon fine particles 10a on the circuit connecting body tends to be insufficient. What is necessary is just to adjust the ratio of [RSiO _3/2 ] and / or [SiO _4/2 ] suitably in order to obtain the silicon fine particle 10a which has suitable hardness and elastic modulus.

It is preferable that it is 5-100 nm, and, as for the thickness of the coating layer 10b of the core-shell silicon fine particle 10, it is more preferable that it is 10-50 nm. If the thickness of the coating layer 10b is less than 5 nm, the dispersion of the silicon fine particles 10a in the adhesive component 9 tends to be nonuniform. On the other hand, when the thickness of the coating layer 10b exceeds 100 nm, the stress relaxation effect by the silicon fine particles 10a tends to be insufficient.

The coating layer 10b is preferably formed of an acrylic resin or a copolymer thereof. The acrylic resin is not particularly limited, and polymers of known acrylonitrile, acrylamide, acrylic acid and esters thereof, methacrylic acid and esters thereof may be mentioned. Moreover, it does not specifically limit also as a copolymer of acrylic resin, The well-known monomers generally used are mentioned. The coating layer 10b is particularly preferably formed of methyl methacrylate and / or a copolymer thereof in view of excellent compatibility with an epoxy resin, an epoxy resin curing agent, and a film-forming polymer blended as an adhesive component.

It is preferable that the content rate of silicone is 40-90 mass% on the basis of the total mass of the core-shell silicon fine particles 10, and it is more preferable that it is 50-80 mass parts. When the content rate of silicon is less than 40 mass%, there exists a tendency for the stress relaxation effect by silicon microparticles | fine-particles 10a to become inadequate. On the other hand, when the content of silicon exceeds 90% by mass, the coating of the silicon fine particles 10a by the coating layer 10b becomes uneven, and the dispersibility of the silicon fine particles 10a in the adhesive component 9 tends to be insufficient. have.

As a method for producing the core-shell silicon fine particles 10, the silicon fine particles 10a serving as cores by emulsion polymerization are synthesized as the first-stage polymerization, and as the second-stage polymerization, the silicon fine particles 10a and the acrylic monomers are synthesized. And a polymerization agent are mixed to form a coating layer 10b on the surface of the silicon fine particles 10a.

In addition, the core-shell type silicon microparticles | fine-particles 10 may be synthesize | combined by the method as mentioned above, or what is marketed can also be obtained. As available core-shell silicone microparticles | fine-particles, GENIOPERL P series (brand name, the Asahi Kasei Walker Silicone company make) is mentioned, for example.

In the preparation of the adhesive composition, the use of the core-shell silicon fine particles 10 makes it possible to more stably obtain the stress relaxation effect on the circuit connecting body as compared with the case of using the silicon fine particles not covered with the coating layer 10b. There is an advantage that the adhesive composition can be prepared. The main reason for this is estimated as follows. That is, since the coating layer 10b containing an acrylic resin has high affinity with an epoxy resin, aggregation of the core-shell silicon microparticles | fine-particles 10 is fully suppressed in the manufacturing process of an adhesive composition. As a result, it is thought that aggregation of the silicone microparticles | fine-particles 10a which form a core particle in the adhesive component 9 is suppressed, and the state in which the silicone microparticles | fine-particles 10a were highly disperse | distributed in the adhesive component 9 is fully maintained.

It is preferable that content of the silicone microparticles | fine-particles 10a contained in the adhesive composition (adhesive layer 8) of the circuit connection material 5 is 10-40 mass parts with respect to 100 mass parts of adhesive compositions, and it is 20-35 mass parts more desirable. When the content of the silicon fine particles 10a is less than 10 parts by mass, the expression of stress relaxation becomes insufficient, and there is a tendency that the decrease in curvature becomes insufficient. On the other hand, when the content of the silicon fine particles 10a exceeds 40 parts by mass, it is difficult to uniformly disperse the silicon fine particles 10a in the adhesive component 9, and the silicon fine particles 10a at the connection portion of the circuit member ) Aggregates, the conductivity is disturbed and the connection resistance value tends to increase. In addition, there exists a tendency for the fluidity | liquidity of an adhesive composition to fall, or the adhesiveness of the surface of an adhesive bond layer 8 falls.

Next, the (a) epoxy resin and (b) epoxy resin hardener contained in the adhesive component (9) are demonstrated.

(a) As an epoxy resin, bisphenol-A epoxy resin, bisphenol F-type epoxy resin, bisphenol S-type epoxy resin, phenol novolak-type epoxy resin, cresol novolak-type epoxy resin, bisphenol A novolak-type epoxy resin, bisphenol F furnace A ballac type epoxy resin, an alicyclic epoxy resin, a glycidyl ester type epoxy resin, a glycidyl amine type epoxy resin, a hydantoin type epoxy resin, an isocyanurate type epoxy resin, an aliphatic chain epoxy resin, etc. are mentioned. These epoxy resins may be halogenated or may be hydrogenated. These epoxy resins can be used individually by 1 type or in combination of 2 or more type.

(b) As an epoxy resin hardener, an amine type, a phenol type, an acid anhydride type, an imidazole type, a hydrazide type, a dicyandiamide, a boron trifluoride-amine complex, a sulfonium salt, an iodonium salt, an amine imide, etc. are mentioned. Can be. Among these, it is preferable to use an imidazole series hardening | curing agent from a sclerosis | hardenability and a usable time. 2-ethyl-4-methylimidazole, 2-methylimidazole, 1-cyanoethyl-2-phenylimidazole etc. are mentioned as an imidazole series hardening | curing agent. These can be used individually or in mixture of 2 or more types, and can also mix and use a decomposition accelerator, an inhibitor, etc. In addition, in order to achieve both a high pot life and a fast curing property at high level, it is preferable to use a latent hardening accelerator, and specifically, the addition compound of an imidazole and an epoxy resin (microcapsule or adduct type latent hardener) Etc.) is preferable.

Content of (a) epoxy resin is preferable in it being 3-50 mass% on the basis of the total mass of the adhesive component (9), and more preferable in it being 10-30 mass%. When content of (a) epoxy resin is less than 3 mass%, advancing of hardening reaction will become inadequate and it will become difficult to obtain favorable adhesive strength and connection resistance value. On the other hand, when it exceeds 50 mass%, there exists a tendency for the fluidity | liquidity of the adhesive agent component 9 to fall, or a pot life becomes short. Moreover, there exists a tendency for the connection resistance value of the connection part of a circuit connection body to become high.

(b) Content of an epoxy resin hardening | curing agent is preferable in it being 0.1-60 mass% on the basis of the total mass of the adhesive component (9), and more preferable in it being 1.0-20 mass%. (b) When content of an epoxy resin hardening | curing agent is less than 0.1 mass%, advancing of hardening reaction will become inadequate and it will become difficult to obtain favorable adhesive strength and connection resistance value. On the other hand, when it exceeds 60 mass%, there exists a tendency for the fluidity | liquidity of the adhesive component 9 to fall, or a pot life becomes short. Moreover, there exists a tendency for the connection resistance value of the connection part of a circuit connection body to become high.

The adhesive component 9 may further contain a film forming polymer. On the basis of the total mass of the adhesive component (9), the content of the film-forming polymer is preferably 2 to 80 mass%, more preferably 5 to 70 mass%, still more preferably 10 to 60 mass%. Do. Examples of the film-forming polymer include polystyrene, polyethylene, polyvinyl butyral, polyvinyl formal, polyimide, polyamide, polyester, polyvinyl chloride, polyphenylene oxide, urea resin, melamine resin, phenol resin, xylene resin, poly Isocyanate resins, phenoxy resins, polyimide resins, polyester urethane resins and the like are used.

(Conductive particles)

20 A of electroconductive particle is disperse | distributed in the adhesive component 9. Examples of the conductive particles 20A include metals such as Au, Ag, Pt, Ni, Cu, W, Sb, Sn, and solder, and particles of carbon. The average particle diameter of the conductive particles 20A is preferably 1 to 18 µm in terms of dispersibility and conductivity.

It is preferable that it is 0.1-30 volume parts with respect to 100 volume parts of adhesive components contained in the adhesive bond layer 8, and, as for the compounding ratio of 20 A of conductive particles, it is more preferable that it is 0.1-10 volume parts. This compounding ratio is suitably adjusted according to the use of an adhesive composition. When the mixing ratio of the conductive particles 20A is less than 0.1 part by volume, the connection resistance between the opposite electrodes tends to be high, and when it exceeds 30 parts by volume, a short circuit between adjacent electrodes tends to occur.

Moreover, the adhesive composition which forms the adhesive bond layer 8 may contain a filler, a softener, an accelerator, an antiaging agent, a coloring agent, a flame retardant, a thixotropic agent, a coupling agent, a melamine resin, isocyanates, etc. When it contains a filler, since improvement, such as connection reliability, is obtained, it is preferable. As a filler, it is preferable that the largest diameter is less than the particle diameter of an electroconductive particle. In addition, it is preferable that content of a filler is the range of 5 to 60 volume% on the whole basis of an adhesive composition. When it exceeds 60 volume%, there exists a tendency for the fall of connection reliability and adhesiveness to arise. Moreover, as a coupling agent, the compound containing 1 or more types chosen from the group which consists of a vinyl group, an acryl group, an amino group, an epoxy group, and an isocyanate group is preferable at the point of an adhesive improvement.

<Circuit connection body>

Next, the circuit connection body manufactured using the circuit connection material 5 is demonstrated. It is a schematic sectional drawing which shows the circuit connection body with which circuit electrodes were connected. The circuit connection body 100 shown in FIG. 3 is provided with the 1st circuit member 30 and the 2nd circuit member 40 which oppose each other, and the 1st circuit member 30 and the 2nd circuit member 40 are shown. In between, the connection part 50a which connects these is provided.

The first circuit member 30 includes a circuit board 31 and a circuit electrode 32 formed on the main surface 31a of the circuit board 31. The second circuit member 40 includes a circuit board 41 and a circuit electrode 42 formed on the main surface 41a of the circuit board 41.

As a specific example of a circuit member, chip components, such as a semiconductor chip (IC chip), a resistor chip, and a capacitor chip, etc. are mentioned. These circuit members are provided with the circuit electrode, and are generally provided with many circuit electrodes. As a specific example of another circuit member to which the said circuit member is connected, wiring boards, such as a flexible tape which has metal wiring, a flexible printed wiring board, and a glass substrate in which indium tin oxide (ITO) was deposited, are mentioned.

The main surface 31a and / or the main surface 41a may be coated with an organic insulating material such as silicon nitride, a silicon compound and a silicone resin, and a photosensitive or non-photosensitive polyimide resin. In addition, the main surface 31a and / or the main surface 41a may have a part which consists of the said material. The circuit board 31 and / or the circuit board 41 itself may be made of the above materials. The main surfaces 31a and 41a may be comprised by the said material 1 type, and may be comprised by 2 or more types. By selecting the composition of the adhesive agent component 9 suitably, the circuit boards which have the part which consists of said material can also be connected preferably.

The surface of each of the circuit electrodes 32 and 42 may be composed of one selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum and indium tin oxide (ITO), 2 It may be composed of species or more. In addition, the material of the surface of the circuit electrodes 32 and 42 may be the same or different in all the circuit electrodes.

The connection part 50a is equipped with 9A of hardened | cured material of the adhesive component 9 contained in the adhesive bond layer 8, and 20A of electroconductive particle dispersed in this. And in the circuit connection body 100, the opposing circuit electrode 32 and the circuit electrode 42 are electrically connected through 20A of electroconductive particle. In other words, the conductive particles 20A are in direct contact with both the circuit electrodes 32 and 42. For this reason, the connection resistance between the circuit electrodes 32 and 42 is fully reduced, and the favorable electrical connection between the circuit electrodes 32 and 42 is attained. On the other hand, hardened | cured material 9A has electrical insulation, and adjacent circuit electrodes ensure insulation. Therefore, the flow of electric current between the circuit electrodes 32 and 42 can be made smooth, and the function which a circuit has can fully be exhibited.

<Method for Manufacturing Circuit Connector>

Next, the manufacturing method of the circuit connection body 100 is demonstrated. 4 is a process diagram showing, by a schematic cross-sectional view, one embodiment of a method for manufacturing a circuit connecting body according to the present invention. In this embodiment, the adhesive bond layer 8 of the circuit connection material 5 is thermosetted, and finally, the circuit connection body 100 is manufactured.

First, while cutting the circuit connection material 5 to a predetermined length, the adhesive layer 8 is directed downward, and is mounted on the surface on which the circuit electrode 32 of the first circuit member 30 is formed. (FIG. 4A). At this time, the base material 6 is peeled off from the adhesive bond layer 8.

Next, it presses in the arrow A and B direction of FIG. 4B, and temporarily connects the adhesive bond layer 8 to the 1st circuit member 30 (FIG. 4C). Although the pressure in this case will not be restrict | limited in particular if it is a range which does not provide damage to a circuit member, Generally, it is preferable to set it as 0.1-3.0 MPa. Moreover, you may pressurize while heating, and heating temperature shall be temperature which the adhesive bond layer 8 does not harden substantially. It is preferable to make heating temperature into 50-100 degreeC generally. It is preferable to perform these heating and pressurization in the range for 0.1 to 10 second.

Next, as shown in FIG. 4D, the second circuit member 40 is mounted on the adhesive layer 8 with the second circuit electrode 42 facing the first circuit member 30 side. . And the whole is pressed in the arrow A and B direction of FIG.4 (d), heating the adhesive bond layer 8. FIG. The heating temperature at this time is made into the temperature at which the adhesive component 9 of the adhesive bond layer 8 can harden | cure. 120-230 degreeC is preferable, 140-210 degreeC is more preferable, and 160-200 degreeC of a heating temperature is more preferable. When heating temperature is less than 120 degreeC, hardening rate tends to become slow, and when it exceeds 230 degreeC, undesired side reaction will tend to advance easily. 0.1-30 second is preferable, as for heating time, 1-25 second is more preferable, and its 2-20 second is more preferable.

The connection part 50a is formed by hardening of the adhesive agent component 9, and the circuit connection body 100 as shown in FIG. 3 is obtained. The conditions of connection are suitably selected according to the use, adhesive composition, and circuit member to be used. In addition, when mix | blending what hardens with light as an adhesive agent component of the adhesive bond layer 8, what is necessary is just to irradiate an active light ray and an energy ray with respect to the adhesive bond layer 8 suitably. Examples of the active light include ultraviolet rays, visible rays, infrared rays, and the like. Examples of the energy rays include electron beams, X rays, γ rays, microwaves, and the like.

As mentioned above, although preferred embodiment of this invention was described, this invention is not limited to the said embodiment. The present invention can be modified in various ways without departing from the spirit of the invention.

For example, in the said embodiment, although the adhesive composition containing 20A of electroconductive particles was illustrated, depending on the shape of the circuit member to mount, etc., an adhesive composition may not contain electroconductive particle 20A. In addition, instead of the conductive particles 20A, conductive particles composed of conductive nuclear particles and a plurality of insulating particles provided on the surface of the nuclear particles may be used.

The electroconductive particle 20B shown in FIG. 5 is equipped with the electroconductive nuclear particle 1 and the some insulating particle 2 provided on the surface of this nuclear particle 1. And the nuclear particle 1 is comprised by the substrate particle 1a which comprises a center part, and the conductive layer 1b provided on the surface of this substrate particle 1a. Hereinafter, the electroconductive particle 20B is demonstrated.

As a material of the substrate particle 1a, glass, a ceramic, an organic high molecular compound, etc. are mentioned. Among these materials, deformation by heating and / or pressure (for example, glass or organic high molecular compound) is preferable. If the substrate particles 1a deform, when the conductive particles 20B are pressed by the circuit electrodes 32 and 42, the contact area with the circuit electrodes increases. In addition, irregularities on the surfaces of the circuit electrodes 32 and 42 can be absorbed. Therefore, the connection reliability between circuit electrodes is improved.

In view of the foregoing, preferred materials for forming the substrate particles 1a are, for example, acrylic resins, styrene resins, benzoguanamine resins, silicone resins, polybutadiene resins or copolymers thereof, and crosslinked thereof. will be. The substrate particles 1a may be the same or different kinds of materials between the particles, and may be used alone or in combination of two or more materials.

Although the average particle diameter of the substrate particle 1a can be suitably designed according to a use etc., it is preferable that it is 0.5-20 micrometers, It is more preferable that it is 1-10 micrometers, It is further more preferable that it is 2-5 micrometers. When conductive particles are prepared using substrate particles having an average particle diameter of less than 0.5 μm, secondary agglomeration of the particles may occur, resulting in insufficient insulation between adjacent circuit electrodes, and conductive particles may be formed using substrate particles larger than 20 μm. When manufactured, there exists a tendency for the insulation between adjacent circuit electrodes to become inadequate due to the magnitude | size.

The conductive layer 1b is a layer made of a conductive material provided to cover the surface of the substrate particle 1a. From the viewpoint of sufficiently securing the conductivity, the conductive layer 1b preferably covers the entire surface of the substrate particle 1a.

Examples of the material of the conductive layer 1b include gold, silver, platinum, nickel, copper and alloys thereof, alloys such as solder containing tin, and nonmetals having conductivity such as carbon. Since coating | covering by electroless-plating is possible with respect to the substrate particle 1a, it is preferable that the material of the conductive layer 1b is metal. Moreover, in order to obtain sufficient pot life, gold, silver, platinum, or these alloys are more preferable, and gold is still more preferable. In addition, these can be used individually by 1 type or in combination of 2 or more type.

Although the thickness of the conductive layer 1b can be suitably designed according to the material, application, etc. used for this, it is preferable that it is 50-200 nm, and it is more preferable that it is 80-150 nm. If the thickness is less than 50 nm, a sufficiently low resistance value of the connecting portion tends not to be obtained. On the other hand, the conductive layer 1b having a thickness of more than 200 nm tends to decrease manufacturing efficiency.

The conductive layer 1b can be comprised by one layer or two or more layers. In any case, the surface layer of the nucleus particle 1 is preferably composed of gold, silver, platinum, or an alloy thereof, and more preferably composed of gold, from the viewpoint of the preservation of the adhesive composition produced using the same. When the conductive layer 1b is composed of one layer made of gold, silver, platinum, or an alloy thereof (hereinafter referred to as "metal such as gold"), in order to obtain a sufficiently low resistance value of the connecting portion, the thickness is It is preferable that it is 10-200 nm.

On the other hand, when the conductive layer 1b is composed of two or more layers, the outermost layer of the conductive layer 1b is preferably made of metal such as gold, but the layer between the outermost layer and the substrate particles 1a is For example, you may comprise with the metal layer containing nickel, copper, tin, or these alloys. In this case, it is preferable that the thickness of the metal layer which consists of metals, such as gold which comprises the outermost layer of the conductive layer 1b, is 30-200 nm from the viewpoint of the storage property of an adhesive composition. Nickel, copper, tin, or their alloys sometimes generate free radicals by redox action. For this reason, when the thickness of the outermost layer which consists of metals, such as gold, is less than 30 nm, when using together with the adhesive component which has radical polymerizability, it exists in the tendency to fully prevent the influence of free radicals.

Examples of the method for forming the conductive layer 1b on the surface of the substrate particle 1a include an electroless plating treatment and a physical coating treatment. In view of the ease of formation of the conductive layer 1b, it is preferable to form the conductive layer 1b made of metal on the surface of the substrate particle 1a by electroless plating.

The insulating particle 2 is comprised by the organic high molecular compound. As an organic high molecular compound, what has thermosoftening property is preferable. Preferred materials for the insulating particles include polyethylene, ethylene-acetic acid copolymer, ethylene- (meth) acrylic copolymer, ethylene- (meth) acrylic acid copolymer, ethylene- (meth) acrylic acid ester copolymer, polyester, poly Amide, polyurethane, polystyrene, styrene-divinylbenzene copolymer, styrene-isobutylene copolymer, styrene-butadiene copolymer, styrene- (meth) acryl copolymer, ethylene-propylene copolymer, (meth) acrylic acid ester Rubber, styrene-ethylene-butylene copolymer, phenoxy resin, solid epoxy resin and the like. These may be used individually by 1 type, or may be used in combination of 2 or more type. In addition, styrene- (meth) acrylic copolymers are particularly preferred in view of dispersion, solvent resistance and heat resistance of the particle size distribution. As a manufacturing method of the insulating particle 2, a seed polymerization method etc. are mentioned.

Here, the (meth) acryl polymer means an acrylic polymer and a methacryl polymer corresponding thereto. For example, the above-mentioned "ethylene- (meth) acryl copolymer" means "ethylene-acryl copolymer" and "ethylene corresponding thereto. -Methacryl copolymer ". In addition, "(meth) acrylic acid" means "acrylic acid" and "methacrylic acid" corresponding to it.

It is preferable that the softening point of the organic high molecular compound which comprises the insulating particle 2 is more than the heating temperature at the time of the connection of circuit members. If the softening point is less than the heating temperature at the time of connection, it will be caused by excessive deformation of the insulating particles 2 at the time of connection, and there exists a tendency for favorable electrical connection not to be obtained.

Although the average particle diameter of the insulating particle 2 can be designed suitably according to a use etc., it is preferable that it is 50-500 nm, It is more preferable that it is 50-400 nm, It is further more preferable that it is 100-300 nm. If the average particle diameter is less than 50 nm, the insulation between adjacent circuits tends to be insufficient, while if the average particle diameter exceeds 500 nm, both sufficiently low initial resistance values of the connecting portions and suppression of increase in resistance over time are achieved. It tends to be difficult to do.

In addition, the circuit connection material which concerns on this invention is not limited to the single layer structure in which the single-layer adhesive bond layer 8 was formed on the base material 6 like the circuit connection material 5 in the said embodiment, The base material 6 It may be a multilayer structure in which a plurality of adhesive layers are laminated on the laminate). The circuit connection material of a multilayered structure can be manufactured by laminating | stacking the some kind of adhesive component and electroconductive particle, or these layers from which content differs. For example, a circuit connection material may be equipped with the electrically-conductive particle containing layer containing electroconductive particle, and the nonconductive particle-containing layer which does not contain the electroconductive particle provided on at least one surface of this electroconductive particle containing layer.

The circuit connection material 15 shown in FIG. 6 is equipped with the adhesive bond layer 7 of a two-layer structure, and the base materials 6a and 6b which respectively cover the outermost surface of this adhesive bond layer 7. The adhesive bond layer 7 of the circuit connection material 15 is comprised from the electrically-conductive particle containing layer 7a containing electroconductive particle, and the nonconductive particle-containing layer 7b which does not contain electroconductive particle. The circuit connection material 15 forms the electrically-conductive particle containing layer 7a on the surface of the base material 6a, and on the other hand, forms the electrically-conductive particle free layer 7b on the surface of the base material 6b, and these layers conventionally It can manufacture by joining using a well-known laminator etc. When using the circuit connection material 15, the base materials 6a and 6b are peeled suitably.

According to the circuit connection material 15, the reduction of the number of the electroconductive particle on the circuit electrode resulting from the flow of an adhesive agent component at the time of joining of circuit members can fully be suppressed. For this reason, when connecting an IC chip on a board | substrate by COG mounting or COF mounting, for example, the number of electroconductive particles on the metal bump of an IC chip can be ensured enough. In this case, the adhesive layer 7 is disposed such that the surface having the metal bumps of the IC chip and the conductive particle free layer 7b are in contact with the substrate on which the IC chip is to be mounted and the conductive particle containing layer 7a, respectively. It is preferable.

(Example 1)

The nuclear particle which has electroconductivity was manufactured as follows. That is, a crosslinked polystyrene particle (Sokugaku Co., Ltd. make, brand name: SX series, average particle diameter: 4 micrometers) is prepared as a base particle, and the Ni layer (thickness 0.08 micrometer) is provided on the surface of this particle by an electroless plating process. It was. Further, an Au layer (thickness 0.03 μm) was provided outside the Ni layer by electroless plating to obtain a nucleus particle having a conductive layer made of a Ni layer and an Au layer.

As an organic high molecular compound (insulation coating) for covering the surface of a nuclear particle, the crosslinked acrylic resin (The Soka Chemical Co., Ltd. make, brand name: MP series) was prepared. 4 g of this crosslinked acrylic resin and 20 g of nuclear particles were introduced into a hybridizer (manufactured by Naraki Seisakusho Co., Ltd., product name: NHS series) to prepare conductive particles. In addition, the processing conditions in the hybridizer were rotation speed 16000 / min, and reaction tank temperature 60 degreeC.

Next, the phenoxy resin whose glass transition temperature is 80 degreeC was synthesize | combined using bisphenol F-type epoxy resin and 9,9'-bis (4-hydroxyphenyl) fluorene. 50 g of this phenoxy resin was dissolved in a solvent to prepare a solution having a solid content of 40% by mass. As a solvent, a mixed solvent of toluene and ethyl acetate (mixed mass ratio of quantum of 1: 1) was used.

On the other hand, the core-shell silicon microparticles | fine-particles (Asahi Kasei Walker Silicone make, brand name: GENIOPERL P22) which have the physical property shown in the column of Example 1 of Table 1 were prepared (Hereinafter, the said core-shell silicon microparticles | fine-particles were referred to as "core-shell silicon microparticles | fine-particles. A "). In addition, the average particle diameter of the core particle (silicon microparticles | fine-particles) of a core-shell silicone microparticles | fine-particles was measured as follows. That is, 100 g of core-shell silicon fine particles and 300 g of bisphenol F-type epoxy resin were mixed using a homomixer to obtain a mixture of both. The average particle diameter of the core particle was calculated | required by performing the laser particle diameter analysis of the tetrahydrofuran solution containing 1 mass% of this mixture.

A liquid phase containing 25 parts by mass of core-shell silicon fine particles A, 30 parts by mass of a phenoxy resin (solids), 30 parts by mass of a bisphenol F-type epoxy resin (solids), and a microcapsule-type latent curing agent (imidazole-based curing agent) 40 mass parts (solid content) of epoxy resins were mixed and the liquid mixture was obtained. 5 volume parts of said electrically conductive particles were mix | blended with respect to 100 volume parts of this liquid mixture, and the solution of adhesive composition was obtained by stirring at the temperature of 23 degreeC.

The solution of the adhesive composition was applied and coated on the surface of the PET film (Tejin DuPont Film Co., Ltd. make, brand name: Purex, thickness: 50 micrometers) to which the surface treatment by the peeling agent (silicone resin) was given. Thereafter, this was subjected to hot air drying (for 5 minutes at 80 ° C.) to obtain a conductive particle-containing layer having a thickness of 10 μm supported by the PET film.

Moreover, it contains 30 mass parts of core-shell silicone microparticles | fine-particles A, 20 mass parts (solid content) of phenoxy resin, 40 mass parts (solid content) of bisphenol F-type epoxy resin, and a microcapsule type latent hardener (imidazole type hardening | curing agent) 40 mass parts (solid content) of the liquid epoxy resin to mix was mixed, and the solution of the adhesive composition which did not contain electroconductive particle was obtained. The solution of this adhesive composition was apply | coated and coated on the surface of PET film (Tejin DuPont Film Co., Ltd. make, brand name: Purex, thickness: 50 micrometers) to which the surface treatment by the peeling agent (silicone resin) was given. Then, this was subjected to hot air drying (for 5 minutes at 80 ° C.) to obtain a conductive particle-free layer having a thickness of 15 μm supported by the PET film.

These adhesive films were bonded together using the conventionally well-known laminator. This obtained the circuit connection material of the 2-layered structure shown in FIG.

(Manufacture of circuit connection body)

The circuit connection body was formed by connecting the ITO board | substrate (thickness 0.7mm, surface resistance <20ohm / square), and IC chip (thickness 0.55mm) using the circuit connection material manufactured as mentioned above. The IC chip was used having a bump of 2500 μm ² (50 μm × 50 μm), a pitch of 100 μm, and a gold bump of 20 μm in height. The ITO substrate used what formed ITO by vapor deposition on the surface of the glass plate of thickness 1.1mm.

The circuit connection material was interposed between an IC chip and an ITO board | substrate, and it connected using the crimping apparatus (Toray Engineering Co., Ltd. make, brand name: FC-1200). Specifically, the PET film on the conductive particle-containing layer side was first peeled off, and the circuit connection material was disposed on the ITO substrate so that the conductive particle-containing layer was in contact with the ITO substrate. Then, pressing was carried out (for 2 seconds at a temperature of 75 ° C. and a pressure of 1.0 MPa) using a pressing device. After peeling off the PET film on the conductive particle-free layer side, the IC chip was mounted so that the gold bumps contacted with the conductive particle-free layer. The circuit connecting body provided with a connection part was obtained by using quartz glass for a base, and heating and pressurizing for 5 second at the temperature of 200 degreeC, and the pressure of 80 MPa.

(Measurement of storage modulus)

The circuit connection material of the two-layered constitution manufactured in the present example was heated and cured at 200 ° C for 1 hour. The sample to be measured (width 5 mm, length 20 mm, film thickness 25 μm) was cut out from the cured product of the circuit connection material, and the storage modulus was measured as follows. That is, the dynamic viscoelasticity of the sample to be measured was measured using a dynamic viscoelasticity measuring device RASII (TA Instruments) under conditions of a temperature increase rate of 5 ° C./min, a frequency of 10 Hz, an amplitude of 3 μm, and a tension mode. And the storage elastic modulus in 40 degreeC was calculated | required from the obtained result.

(Measurement of the amount of warpage)

The amount of warpage of the ITO substrate after mounting the IC chip was measured using a non-contact laser type three-dimensional shape measuring device (Genese, trade name: LT-9000). The IC chip side was faced downward, the back surface of the ITO substrate was faced upward, and the circuit connecting body was placed on the flat stage. And the difference of the height of the center part of the back surface of an ITO board | substrate, and the location 5 mm from both ends of an IC chip in the back surface of this ITO board | substrate was measured. The difference of this height was made into the amount of curvature of a glass substrate.

(Measurement of initial connection resistance)

The initial resistance of the connection part of the circuit connection body manufactured as mentioned above was measured using the resistance measuring instrument (The product made by ADVANTIST, A brand name: digital multimeter). In addition, the measurement carried out the 1 mA electric current between electrodes.

(Evaluation of insulation between adjacent electrodes)

Insulation resistance between adjacent electrodes was measured by the following procedure using the resistance measuring instrument (The product made from ADVANTIST, A brand name: Digital Multimeter). First, a voltage of 50 V DC was applied to the connecting portion of the circuit connecting body for 1 minute. And insulation resistance was measured by the 2-terminal measuring method with respect to the connection part after voltage application. In addition, a voltmeter (the ULTRA HIGH RESISTANCE METER) made by the Advanceist, a brand name was used for application of the said voltage.

(Evaluation of Connection Reliability)

The connection reliability of the connection part of a circuit connection body was evaluated by performing a temperature cycle test. Temperature cycle test accommodates a circuit connection in a temperature cycling tank (ETAC make, brand name: NT1020), The temperature cycle of temperature-fall from -40 degreeC to 100 degreeC, temperature rise from -40 degreeC to 100 degreeC, and temperature-fall from 100 degreeC to room temperature It was performed by repeating 250 times. The holding time in -40 degreeC and 100 degreeC was all 30 minutes. The measurement of the resistance of the connection part after the temperature cycle test was performed similarly to the measurement of the initial resistance.

(Evaluation of presence or absence of interface peeling)

The circuit connection body after a temperature cycling test was observed with the digital microscope (Giens make, brand name: VH-8000), and the presence or absence of the interface peeling was evaluated. Specifically, the connection part of the circuit connection body was observed from the glass substrate side of the circuit connection body, and the presence or absence of the interface peeling on the glass substrate was confirmed.

Table 3 shows the storage modulus at −50 ° C. and 100 ° C. of the sample under test (cured product of the circuit connection material), the maximum and minimum values of the storage modulus of the sample under measurement in the range of −50 to 100 ° C., and the glass transition. The temperature is shown. Table 4 also shows the results of measurement of the amount of warpage, the connection resistance value, and the insulation resistance value of the ITO substrate.

(Example 2)

When forming the conductive particle-containing layer, instead of blending 25 parts by mass of the core-shell silicon fine particles A, 25 parts by mass of the core-shell silicon fine particles B shown in Table 1 and the core-shell type when forming the conductive particle-free layer are formed. A circuit connection material and a circuit connecting body having a two-layer structure were produced in the same manner as in Example 1 except that 30 parts by mass of the core-shell silicon fine particles B were blended instead of 30 parts by mass of the silicon fine particles A. In addition, core-shell silicon fine particle B is GENIOPERL P52 (brand name) by the Asahi Kasei Walker silicone company.

(Example 3)

When forming the conductive particle-containing layer, a circuit connecting material and a circuit connecting body having a two-layer structure were produced in the same manner as in Example 1 except that 40 parts by mass of the core-shell silicon fine particles A were blended.

(Example 4)

When forming the conductive particle-containing layer, a circuit connecting material and a circuit connecting body having a two-layer structure were produced in the same manner as in Example 2 except that 40 parts by mass of the core-shell silicon fine particles B were blended.

(Comparative Example 1)

When manufacturing the circuit connection material of a two-layered constitution, except having provided the electrically-conductive particle content layer and the electrically-conductive particle-free layer in the compounding ratio shown in Table 2, without mix | blending the core-shell silicone microparticles | fine-particles which have a crosslinked structure in each solution, it implements. In the same manner as in Example 1, a circuit connection material and a circuit connection material having a two-layer structure were manufactured.

According to the present invention, the internal stress generated in the circuit connection body can be sufficiently reduced.

Claims (23)

As an adhesive composition used in order to adhere | attach circuit members and to electrically connect the circuit electrodes which each circuit member has, With epoxy resin, Epoxy resin curing agent, Silicon fine particles with an average particle diameter of 300 nm or less &Lt; / RTI &gt; An adhesive composition prepared by mixing the core particles comprising the silicon fine particles and the core-shell silicon fine particles having a coating layer made of a material containing an acrylic resin and provided to cover the core particles. The adhesive composition according to claim 1, further comprising conductive particles. The adhesive composition of Claim 1 or 2 containing 10-40 mass% of said silicone microparticles | fine-particles based on the total mass of the said adhesive composition. delete delete The adhesive composition according to claim 1 or 2, wherein the core-shell silicon fine particles have a silicon content of 40 to 90 mass% based on the total mass of the core-shell silicon fine particles. The adhesive composition according to claim 3, wherein the core-shell silicon fine particles have a silicon content of 40 to 90 mass% based on the total mass of the core-shell silicon fine particles. The adhesive composition of Claim 1 or 2 whose hardened | cured material obtained by heating at 200 degreeC for 1 hour has a storage elastic modulus in 1 to 2 GPa in 40 degreeC. As an adhesive composition used in order to adhere | attach circuit members and to electrically connect the circuit electrodes which each circuit member has, With epoxy resin, Epoxy resin curing agent, Silicon fine particles with an average particle diameter of 300 nm or less &Lt; / RTI &gt; The cured product of the adhesive composition obtained by heating at a temperature of 200 ° C. for 1 hour has an storage modulus of 1 to 2 GPa at 40 ° C. The adhesive composition according to claim 9, further comprising conductive particles. The adhesive composition of Claim 9 or 10 which contains 10-40 mass% of said silicone microparticles | fine-particles based on the total mass of the said adhesive composition. With base material on film, The adhesive layer which consists of an adhesive composition of Claim 1 or 2 provided on one side of the said base material. Circuit connection material provided with. With base material on film, An adhesive layer composed of the adhesive composition according to claim 9 or 10 and provided on one side of the substrate. Circuit connection material provided with. A pair of opposing circuit members, The connection part which consists of hardened | cured material of the adhesive composition of Claim 1 or 2, and adhere | attaches the circuit members so that the circuit electrodes which each circuit member has may be interposed between the pair of circuit members, and are electrically connected. The circuit connection body provided with. The circuit connecting body according to claim 14, wherein at least one of the pair of circuit members is an IC chip. 15. The semiconductor device according to claim 14, wherein at least one surface of each of the circuit electrodes of the pair of circuit members is at least one selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum, and indium tin oxide. The circuit connection body comprised. 15. The method of claim 14, wherein at least one of the contact surfaces of the pair of circuit members in contact with the connecting portion has a portion formed of at least one material selected from silicon nitride, a silicon compound, and a photosensitive or non-photosensitive polyimide resin. Circuit connection. A pair of opposing circuit members, The connection part which consists of hardened | cured material of the adhesive composition of Claim 9 or 10, and adhere | attaches the circuit members so that the circuit electrodes which each circuit member has may be interposed between the pair of circuit members, and are electrically connected. The circuit connection body provided with. 19. The circuit connecting body according to claim 18, wherein at least one of the pair of circuit members is an IC chip. 19. The semiconductor device according to claim 18, wherein at least one surface of each of the circuit electrodes of the pair of circuit members is at least one selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum, and indium tin oxide. The circuit connection body comprised. 19. The method of claim 18, wherein at least one of the contact surfaces of the pair of circuit members in contact with the connecting portion has a portion formed of at least one material selected from silicon nitride, a silicon compound, and a photosensitive or non-photosensitive polyimide resin. Circuit connection. The adhesive composition of Claim 1 or 2 is interposed between the pair of circuit members opposingly arrange | positioned, the whole is heated and pressurized, and it consists of hardened | cured material of the said adhesive composition, and between said pair of circuit members The circuit member connection method which obtains the said circuit member and the circuit connection body provided with the said connection part by providing the connection part which affixes the said circuit member so that the circuit electrodes which each circuit member has may be electrically connected. The adhesive composition of Claim 9 or 10 is interposed between the pair of opposingly arranged circuit members, and the whole is heated and pressurized, and it consists of hardened | cured material of the said adhesive composition, and between the pair of circuit members The circuit member connection method which obtains the said circuit member and the circuit connection body provided with the said connection part by providing the connection part which affixes the said circuit member so that the circuit electrodes which each circuit member has may be electrically connected.

Images