KR101127918B1 - Apparatus for cleaning toxic and odor gas using water particle - Google Patents

Abstract

PURPOSE: An apparatus for purifying harmful gas and bad odor gas using vapor particles is provided to stably treat harmful materials and bad odor particles using vapor particles or vapor particles containing surfactant. CONSTITUTION: An apparatus for purifying harmful gas and bad odor gas includes a sucking part(100), a main spraying part(200), a main reacting part(300), an auxiliary spraying part, and an auxiliary reacting part. The sucking part sucks harmful gas and bad odor gas. The main spraying part coagulates harmful gas particles and bad odor particles sucked into the sucking part. The main spraying part includes a spraying unit which sprays vapor particles to the harmful gas and the bad odor gas. The main reacting part purifies and emits the harmful gas and the bad odor gas based on plasma. The auxiliary spraying part includes a spraying unit which sprays vapor particles containing surfactant to the harmful gas. The auxiliary reacting part purifies and emits the harmful gas and the bad odor gas through the auxiliary spraying part based on plasma.

Description

Hazardous gas and odor gas purification device using steam fine particles that aggregate harmful substances and odorous substances contained in odorous gas and odor gas {APPARATUS FOR CLEANING TOXIC AND ODOR GAS USING WATER PARTICLE}

The present invention relates to a harmful gas and odor gas purification apparatus using water vapor fine particles that aggregate the harmful substances and odorous substances contained in the odorous gas and odorous gas, more specifically in the form of very small particulates that are difficult to remove in a general process The present invention relates to an apparatus for purifying harmful gases using water vapor fine particles having excellent pollutant removal efficiency as well as excellent polar pollutant removal performance as well as nonpolar pollutant removal performance.

Exhaust gases from various factories include various toxic chemicals such as volatile organic compounds (VOCs) and odorous gases, which are major sources of air pollution. The volatile organic compounds may be of various kinds, but aromatic compounds such as benzene and phenol, hydrocarbon compounds such as alkanes and alkenes, and halogens such as chlorine. Heterogeneous hydrocarbons, including compounds, nitrogen, oxygen, and the like. Major sources of volatile organic compounds include paint, paint and plastics factories, chemical plants, refineries, refineries and laundries.

These volatile organic compounds cause tropospheric ozone pollution, stratospheric ozone depletion and global warming depending on the type and type of reaction in the atmosphere.In the short term, when humans and animals are exposed to volatile organic compounds, respiratory diseases, neurological disorders, etc. It is reported that in the long term it can cause carcinogenesis, genetic variation and the like. As such, the emissions of volatile organic compounds, which are very harmful to health by themselves, are increasing every year due to the development of the industry, and the environmental pollution is further increased accordingly.

On the other hand, odor is mainly caused by air pollution and stimulates the sense of smell. The odor causing substances include aldehydes, indole, ketones, alcohols, phenols, chlorine compounds, carbon disulfide, ammonia and organic acids in addition to hydrogen sulfide, mercaptans and amines. Around rubber manufacturing plant, chemical manufacturing plant, plastic manufacturing plant, food manufacturing plant, fertilizer plant, paper mill, etc., where agricultural and livestock industry takes place, sewage treatment plant, manure treatment plant, crematorium, garbage landfill Even in a large amount of odor is generated.

When a person smells bad, mental stress builds up and becomes psychologically disturbing, sometimes accompanied by irritation, hysteria and insomnia. Physiologically, symptoms such as an increase in blood pressure due to odor, abnormality of the reproductive system due to hormonal secretion change, olfactory deterioration, headache and vomiting may occur.

Conventional regenerative thermal oxidation (RTO) apparatus, direct regenerative catalytic oxidation (RCO) apparatus, adsorption treatment apparatus, or the like to remove these harmful chemical gases and odorous substances. Biofilters were mainly used.

The RTO apparatus is a method of recovering and reusing combustion heat after directly oxidizing and treating an exhaust gas, and thus has high treatment efficiency and is economical in treating high concentrations of volatile organic compounds. However, if the equipment cost is excessive and the concentration of volatile organic compounds is low, it is not economical because of high operating costs, and it is not suitable for the treatment of volatile organic compounds containing severe fluctuations in exhaust gas or containing halogen and sulfur compounds, and it is restricted in the installation place. This follows.

The RCO apparatus burns and activates a catalyst, reacts with the exhaust gas, and treats the combustion heat to recover and reuse heat. Thus, the RCO device has a low operating cost, low generation of nitrogen compounds (NOx), and small size. However, the facility cost is higher than that of the RTO device, the scope of application is limited according to the generation of treatment targets, and the flow rate is not suitable for treating volatile organic compounds at high concentrations, and the catalyst must be replaced periodically.

On the other hand, the adsorption treatment apparatus treats the exhaust gas by contacting the solid adsorbent to collect, collect and retain the volatile organic compounds on the surface of the adsorbent, and regenerates the adsorbent by desorption using a thermal cycle. This is advantageous in that the removal efficiency of volatile organic compounds is high and the fuel cost is low. However, a pretreatment facility that needs to filter the particulate matter contained in the exhaust gas is required in advance, and wastewater is generated when the adsorbent is regenerated. There is this.

In addition, biofilters are difficult to use in the case of materials that are not biologically decomposed. In the case of installing such a biofilter, it takes a long time to react biologically, occupies a lot of sites, it is difficult to maintain and manage the activity of microorganisms, and in particular, it is sensitive to temperature, so it is low in winter and difficult to operate. .

Furthermore, although it is widely used in the method of removing contaminants using the plasma treatment process, the contaminants in the form of extremely small particulates are very small in size, and thus there is a problem that they cannot be removed even by plasma treatment. Therefore, there is a demand for the development of an efficient and economical method for removing substances that are harmful to the human body and cause odors and environmental pollution but are not processed by the general pollutant removal process.

Accordingly, the first object of the present invention is to use the particulates of the harmful substances and odorous substances by using any one of the particulates of the harmful substances and the odorous substances and the odorous substances of the steam and the fine particles of water containing the surfactant It is to provide a harmful gas and odor gas purification apparatus using the fine particles of water vapor to provide a good, stable treatment efficiency for the harmful substances and odorous substances by agglomerating.

In addition, the second object of the present invention is to use the fine particles and the fine particles of the odorous substances and odorous substances, regardless of the type of harmful substances and odorous substances contained in the odorous gases and odorous gases and the fine particles of water vapor and surfactant It is to provide a toxic gas and odor gas purification device using water vapor fine particles to aggregate the toxic chemicals and odorous substances to provide a stable treatment efficiency.

In order to achieve the first object of the present invention described above, in one embodiment of the present invention is installed around the harmful gas discharge source for discharging the harmful gas and odor gas and the suction unit for sucking the harmful gas and odor gas, and the suction Water vapor fine particles comprising a main spraying unit is provided with a spray device for spraying water vapor particles to the harmful gas and odor gas introduced into the unit, and a main reaction unit for purifying the harmful gas and odor gas passing through the main spraying unit through a plasma Provides harmful gas and odor gas purification device.

In addition, in order to achieve the second object of the present invention, in one embodiment of the present invention is installed around the harmful gas and odor gas discharge source for discharging the toxic gas and odor gas and the suction unit for sucking the harmful gas and odor gas; A main spraying unit provided with a spraying device for spraying water vapor particles into the harmful gas and the malodorous gas introduced into the suction unit, and a main reaction unit for purifying and emitting the harmful gas and the malodorous gas passing through the main spraying unit through plasma; Water vapor fine particles comprising an auxiliary spraying unit is provided with a spray device for spraying water vapor fine particles containing a surfactant to the gas passing through the main reaction unit, and an auxiliary reaction unit for purifying the gas passing through the auxiliary spraying unit through a plasma Provides harmful gas and odor gas purification device.

According to the present invention, the detoxification treatment of particulate VOC and odor emitted from various industrial processes and living environments can be reliably performed, and generation of secondary toxic substances such as ozone or CO can be minimized.

In addition, the present invention can improve the decomposition efficiency of harmful chemicals and odorous substances by plasma by adding a means for agglomeration of very small particulates of harmful and odorous substances, which are difficult to be removed efficiently by a general purification process. have.

In addition, the present invention purifies the polar harmful chemicals using pure steam fine particles, and by treating the non-polar harmful chemicals to harm the human body or the environment by using the steam fine particles including a surfactant, to the harmful chemicals and odorous substances Provide stable processing efficiency.

1 is a block diagram illustrating a harmful gas and odor gas purification apparatus according to an embodiment of the present invention.
Figure 2 is a block diagram illustrating the electrical connection of the noxious gas and odor gas purification apparatus according to the present invention.
3 is a block diagram illustrating a harmful gas and odor gas purification apparatus according to another embodiment of the present invention.

Hereinafter, referring to the accompanying drawings, a toxic gas and odor gas purifying apparatus using steam fine particles which aggregate harmful substances (harmful chemical substances) and odor substance particles contained in harmful gases according to preferred embodiments of the present invention (hereinafter, ' Hazardous Gas Purification System 'will be explained in detail.

1 is a block diagram for explaining an embodiment of the harmful gas purification device according to the present invention, Figure 2 is a block diagram for explaining the electrical connection state of the harmful gas purification device according to the present invention.

1 and 2, the harmful gas purifying apparatus according to an embodiment of the present invention is a suction unit 100 for sucking the harmful gas and odor gas (hereinafter referred to as 'harmful gas'), and the suction Main spraying unit 200 is provided with a spray device for spraying the water vapor particles to the gas introduced into the unit 100, and the main reaction unit 300 for purifying the gas passed through the main spraying unit 200 through the plasma to discharge It includes, the sensor unit 600 for detecting information about the gas so as to operate only when the harmful gas is generated, and the information input from the sensor unit 600 to control the operation of each component The control board 700 may further include.

Hereinafter, each component will be described in more detail with reference to the drawings.

Referring to Figure 1, the harmful gas purifying apparatus according to an embodiment of the present invention includes a suction unit (100).

The suction unit 100 is installed around the harmful gas discharge source to suck harmful gas, it may be provided with a blower to suck the harmful gas. At this time, the harmful gas includes a malodor containing odorous substances, and volatile organic compounds (VOCs) such as benzene and toluene. Here, the source of harmful gases refers to individual facilities such as factories, incinerators, etc., which are likely to emit harmful gases, industrial and industrial complexes in which these facilities are concentrated, or residential areas where harmful gases may enter in close proximity to the facilities or complexes. do.

In a particular aspect, the suction unit 100 according to the present invention is a tubular housing (not shown) through which harmful gas passes, and the inlet of the housing through which harmful gas is introduced to introduce the harmful gas into the tubular housing. One or more blowers to be installed, and the filter provided to remove the foreign matter (dust, excess oil, etc.) contained in the harmful gas introduced into the housing so as to be spaced apart at a predetermined interval to the blower.

In this case, a prefilter, a demister, and the like may be used as the filter, and any one of the prefilter and the demister may be positioned at the front end.

2, the harmful gas purifying apparatus according to an embodiment of the present invention may further include a sensor unit 600.

The sensor unit 600 is installed around the harmful gas discharge source for discharging the noxious gas, and detects the information on the noxious gas in real time, and transmits the detected information to the control board 700. Here, the sensor unit 600 is composed of one or more sensors (610, 620, 630), each sensor may be installed in two or more to a single harmful gas discharge source or a harmful gas discharge source of the adjacent position.

As the sensor unit 600, any sensor may be used as long as it can detect a harmful gas, but it is preferable to use a sensor capable of detecting the occurrence of hydrogen sulfide, ammonia, VOC, etc., which causes odors. . More specifically, the sensor unit 600 may use a semiconductor sensor, an electrochemical sensor, a direct combustion sensor, UV sensor, IR sensor, and the like, specifically, TVOC sensor, H ₂ S sensor and the like can be used. have.

Further, in the sensor unit 600, it is preferable to use a sensor that can also measure whether or not the generation of harmful gas, the type of harmful gas, the amount of harmful gas, the particle size of the harmful substances contained in the harmful gas. When such a sensor is used, the control board 700 may include a surfactant, which is described later, depending on the type of harmful gas, the amount of the harmful gas, the size of the harmful substance particles, the amount of the surfactant, the type of the surfactant, the amount of water vapor, It is possible to adjust the diameter of the steam water particles to be introduced, which enables more efficient system operation.

Referring to Figure 1, the harmful gas purifying apparatus according to an embodiment of the present invention includes a main spraying unit (200).

The main spraying unit 200 is an apparatus for spraying water vapor fine particles on one side of the inside is sprayed water vapor fine particles to the harmful gas introduced into the suction unit 100 to be uniformly mixed.

In a particular embodiment, the main spray unit is provided with a spray chamber (not shown) that provides a space for contact with the harmful chemical particles and water vapor particles contained in the harmful gas, as shown in Figure 2, and is provided on one side of the spray chamber Injector 210 for spraying water vapor fine particles, supply pipe (not shown) connected to the injector 210 to supply water to the injector 210 by a signal from the control board 700 and the control board It consists of an outflow control means 220 that is electrically connected to the 700 and installed in the water supply pipe. At this time, one end of the supply pipe is connected to the injector 210 and the other end corresponding to the one end is connected to a tap (not shown) for supplying general living water or a water storage chamber (not shown) in which purified water or distilled water is stored. Here, as the outflow control means 220, an automatic control valve or a pump can be used.

Hazardous chemicals whose particles have a diameter of more than 1 μm in the harmful gas introduced into the suction part 100 are freely dropped without undergoing a plasma treatment process through agglomeration and growth by water vapor particles sprayed into the inner space. It may also be filtered. However, the harmful chemicals having a particle diameter of 0.01 to 1 μm among the harmful gases introduced into the suction part 100 are not purified through a conventional plasma treatment because the particle diameter thereof is very small, and thus, by supplying water vapor fine particles, Aggregate to have a large diameter.

As the injector, a device such as a steam generator (ultrasound generator) or a spray device using ultrasonic waves may be used as long as it is a device capable of spraying water supplied from the outside by converting it into water vapor having a particle diameter of 0.01 to 100 μm. Considering the efficiency and economic aspects of the formation of water vapor among these, it is preferable to use an ultrasonic generator. At this time, the diameter of the water particles is preferably about 0.01㎛ 100㎛.

In this case, when the diameter of the water particles is small, it is preferable that the diameter of the water particles as small as possible because the contact opportunities between the harmful substances and water particles contained in the harmful gas increases. However, when the diameter of the water particles supplied to the injector is less than 0.01 μm, which is so small that they are invisible, these water particles are difficult to exist in the state of maintaining the diameter. Cannot be grown by adsorption agglomeration. On the contrary, when the diameter of the water particles exceeds 100 µm, the particle size is large in itself, which makes it difficult to aggregate by charge.

In addition, as described above, since the smaller the diameter of the water particles is advantageous, it is preferable to generate and use water particles having a diameter of 0.01 to 10 µm, and the higher the saturation of the water vapor is, the more advantageous it is. In other words, in the same amount of water, increasing the saturation degree by making the particles of water small indicates excellent performance.

Here, the reason why water vapor is sprayed on the noxious gas is because the particles of the noxious chemicals contained in the noxious gas are too fine to be purified by the plasma. In other words, water vapor having a particle diameter of 0.01 to 100 μm aggregates fine particles of harmful chemicals contained in the harmful gas, for example, particles having a diameter of about 0.01 to 1 μm, to grow diameters, thereby forming a larger size of harmful chemical particles. do. Hazardous chemicals grown in size through this process can be smoothly removed by a plasma reaction.

In addition, as the water provided by the injector, water containing a surfactant may be used in addition to pure water.

The pure water vapor fine particles modified through the injector have polarity properties, so that they are agglomerated by adsorbing polar molecules among the harmful chemical fine particles contained in the noxious gas.

On the contrary, the water vapor fine particles containing the surfactant are agglomerated by adsorbing non-polar components among the harmful chemical fine particles contained in the noxious gas. As such surfactant, it is preferable to use nonionic surfactant, such as an oxyethylene system, cationic, anionic, and amphoteric ionic surfactant, for example.

In addition, the water vapor fine particles containing the surfactant is preferably composed of a ratio of 0.01 to 10% by weight of the surfactant and 90 to 99.99% by weight of water.

If less than 0.01% by weight of surfactant is used, since the surface modification effect is low and the property of adsorbing nonpolar hazardous substances is significantly lowered, it is difficult to remove nonpolar hazardous substances. On the contrary, even when the surfactant is used in an amount of more than 10% by weight, the adsorption effect of the nonpolar harmful substances is not further increased, and there is a problem in that the economic burden is increased.

It is also preferable that the diameter of the water vapor fine particles containing a surfactant capable of agglomerating the fine particles of the harmful chemical substance having nonpolar properties is 0.01 to 100 µm.

In this way, it is possible to change the addition of the surfactant to the water supplied to the injector of the present invention according to the nature of the harmful gas discharged from the harmful gas discharge source.

Referring to Figure 1, the harmful gas purifying apparatus according to an embodiment of the present invention includes a main reaction unit (300).

The main reaction unit 300 is connected to the rear end of the main spraying unit 200 to purify and discharge the harmful gas passing through the main spraying unit 200 through a plasma reactor, preferably used in the art. It is preferable to use a plasma reactor.

More specifically, the main reactor 300 may use a plasma reactor to which a pulsed corona discharge or a dielectric barrier discharge technology is applied to treat harmful gases.

In a particular embodiment, the main reaction unit 300 according to the present invention includes a housing providing a closed space through which harmful gas passes, a plurality of flat plate ground electrodes arranged side by side at predetermined intervals within the housing, and A plurality of discharge electrodes disposed between the ground electrodes, and a high voltage pulse supply for applying a high voltage pulse to each of the discharge electrodes to generate a plasma by corona discharge between the ground electrodes and the discharge electrodes Means may be included.

Referring to Figure 2, the harmful gas purifying apparatus according to an embodiment of the present invention may further include a control board 700.

The control board 700 is electrically connected to the sensor unit 600, the blower 110, the injection device 210 and the outflow control means 220, the plasma reactor 310, the sensor unit installed in the harmful gas discharge source By using the 600, information on the generation and emission concentration information of harmful gases, location information of the sensors constituting the sensor unit 600, information such as the presence or absence of the sensors are collected. In addition, the control board 700 collects the information provided from the sensor unit 600 and controls the operations of the blower 110, the injection apparatus 210, the outflow control means 220, and the plasma reactor 310.

3 is a block diagram for explaining another embodiment of the harmful gas purification apparatus according to the present invention.

Referring to Figure 3, the harmful gas purifying apparatus according to another embodiment of the present invention, the suction unit 100 for sucking the harmful gas, the main spraying unit 200 for spraying water vapor fine particles to the harmful gas, and the main powder Auxiliary spray for spraying water vapor fine particles containing a surfactant to the main reaction unit 300 to purify and discharge the harmful gas passing through the non-200 through the plasma, and the harmful gas passed through the main reaction unit 300 The unit 400 and the auxiliary reaction unit 500 to purify and discharge the harmful gas passing through the auxiliary spray unit 400 through the plasma. At this time, since the suction unit 100, the main spraying unit 200 and the main reaction unit 300 can determine the configuration through the above description, a more detailed description thereof will be omitted.

Referring to Figure 3, the harmful gas purifying apparatus according to another embodiment of the present invention includes an auxiliary spray unit (400).

The auxiliary spraying unit 400 is connected to the rear end of the main reaction unit 300, unlike the main spraying unit 200 sprays pure water vapor fine particles, sprays the water vapor fine particles containing a surfactant in the inner space to Water vapor fine particles containing a surfactant serves to aggregate the harmful chemical particles contained in the harmful gas. To this end, the auxiliary spraying unit 400 is provided with an injection device for spraying water vapor fine particles containing a surfactant to the harmful gas passing through the main reaction unit (300).

As said surfactant, nonionic surfactant, such as an oxyethylene system, or anionic, cationic, and amphoteric ionic surfactant can be used, for example. In addition, the water vapor fine particles containing the surfactant may be composed of 0.01 to 10% by weight of surfactant and 90 to 99.99% by weight of water.

The auxiliary spraying unit 400 is preferably formed in the same configuration as the main spraying unit 200 described above.

Here, since the water vapor fine particles containing the surfactant have a nonpolar property, the water vapor fine particles containing the surfactant adsorb and agglomerate nonpolar components among the harmful chemical particles contained in the noxious gas.

That is, even fine particles of harmful chemicals that are difficult to be purified through plasma are aggregated by the water vapor fine particles as they pass through the main spraying unit 200 and the auxiliary spraying unit 400, and thus, the main reaction unit 300 and the auxiliary reaction unit 500. Is purified from. In other words, the present invention can provide a stable treatment efficiency for harmful gases because it can purify the harmful chemicals contained in the harmful gases in the particulate state.

The auxiliary spraying unit 400 may be replaced with the main spraying unit 200 and the position.

Referring to Figure 3, the harmful gas purifying apparatus according to another embodiment of the present invention includes an auxiliary reaction unit (500).

The auxiliary reaction unit 500 is connected to the rear end of the auxiliary spraying unit 400 to purify and discharge the harmful gas passing through the auxiliary spraying unit 400 through a plasma reactor, and passes through the main reaction unit 300. Purifies non-polar hazardous chemicals remaining in a hazardous gas.

The auxiliary reaction unit 500 is preferably configured in the same manner as the main reaction unit 300 described above.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It can be understood that it is possible.

100: suction 110: blower
200: main spraying unit 210: injector
220: outflow control means 300: main reaction unit
310: plasma reactor 400: auxiliary spraying unit
500: auxiliary reaction unit 600: sensor unit
700: control board

Claims (9)

A suction unit installed around a gas discharge source for discharging toxic gas and odor gas containing harmful substance particulates to suck toxic gas and odor gas;
A main spraying unit provided with an injection device for spraying water vapor fine particles on the noxious gas and the malodorous gas so as to aggregate the noxious substance fine particles of the noxious gas and the malodorous gas introduced into the suction unit;
A main reaction part for purifying and discharging mirim harmful gas and odor gas having a harmful substance fine particle having the size of the harmful gas fine particles aggregated in the water vapor passing through the main spraying part through a plasma;
An auxiliary spraying unit provided with a spraying device for spraying water vapor fine particles containing a surfactant which gives nonpolarity to the harmful gas and the malodorous gas which have passed through the main reaction unit; And
An apparatus for purifying toxic gas and odor gas using water vapor fine particles including an auxiliary reaction unit for purifying and releasing toxic gas and odor gas passing through the auxiliary spray unit through plasma. [2] The apparatus for purifying harmful gases and odor gases using steam fine particles according to claim 1, wherein the diameters of the toxic substances particles contained in the toxic gases and odor gases are 0.01 to 1 [mu] m. The method of claim 1, wherein the water vapor fine particles
Noxious gas and odor gas purification apparatus using water vapor fine particles, characterized in that the diameter of 0.01 to 100㎛. delete delete The method of claim 1, wherein the water vapor fine particles containing the surfactant
Hazardous and odor gas purification apparatus using water vapor fine particles, characterized in that consisting of 0.01 to 10% by weight of surfactant and 90 to 99.99% by weight of water. The method of claim 1,
Further comprising a sensor unit for measuring the harmful gas state, including the type of harmful gas and odor gas, the amount of generation, the size of harmful substance particles,
Hazardous and malodorous gases using water vapor fine particles, characterized in that the input amount of the surfactant, the type of the surfactant, the amount of the water vapor fine particles or the diameter of the water vapor fine particles added are adjusted according to the measured harmful gas state. Purifier. delete delete

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