KR101121029B1 - 투영 광학계, 노광 장치 및 디바이스 제조 방법 - Google Patents

투영 광학계, 노광 장치 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR101121029B1
KR101121029B1 KR1020090059611A KR20090059611A KR101121029B1 KR 101121029 B1 KR101121029 B1 KR 101121029B1 KR 1020090059611 A KR1020090059611 A KR 1020090059611A KR 20090059611 A KR20090059611 A KR 20090059611A KR 101121029 B1 KR101121029 B1 KR 101121029B1
Authority
KR
South Korea
Prior art keywords
optical unit
refractive optical
projection
optical system
refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020090059611A
Other languages
English (en)
Korean (ko)
Other versions
KR20100006533A (ko
Inventor
료우스케 후쿠오카
키요시 후카미
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20100006533A publication Critical patent/KR20100006533A/ko
Application granted granted Critical
Publication of KR101121029B1 publication Critical patent/KR101121029B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020090059611A 2008-07-09 2009-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101121029B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-179465 2008-07-09
JP2008179465A JP5398185B2 (ja) 2008-07-09 2008-07-09 投影光学系、露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20100006533A KR20100006533A (ko) 2010-01-19
KR101121029B1 true KR101121029B1 (ko) 2012-03-19

Family

ID=41521356

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090059611A Expired - Fee Related KR101121029B1 (ko) 2008-07-09 2009-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
JP (1) JP5398185B2 (enExample)
KR (1) KR101121029B1 (enExample)
CN (1) CN101625455B (enExample)
TW (1) TWI414822B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5220136B2 (ja) * 2011-01-01 2013-06-26 キヤノン株式会社 照明光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) * 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
JP6386896B2 (ja) 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
JP2023004358A (ja) * 2021-06-25 2023-01-17 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法
JP7614962B2 (ja) * 2021-07-08 2025-01-16 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060052802A (ko) * 2003-08-29 2006-05-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR100624578B1 (ko) 2001-12-26 2006-09-18 가부시키가이샤 오크세이사쿠쇼 투영 노광 장치
KR20060120660A (ko) * 2004-01-06 2006-11-27 가부시키가이샤 니콘 노광 방법 및 장치와, 디바이스 제조 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US555629A (en) * 1896-03-03 Scourer and polisher
JPH06331932A (ja) * 1993-05-19 1994-12-02 Topcon Corp 投影光学装置
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
JP3445021B2 (ja) * 1995-04-28 2003-09-08 キヤノン株式会社 光学装置
WO1999049366A1 (en) * 1998-03-20 1999-09-30 Nikon Corporation Photomask and projection exposure system
JP2003222795A (ja) * 2001-11-21 2003-08-08 Adtec Engineeng Co Ltd 倍率補正光学系
JP2003178971A (ja) * 2002-10-24 2003-06-27 Nikon Corp 投影露光装置及び投影露光方法
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP3728301B2 (ja) * 2003-05-30 2005-12-21 株式会社オーク製作所 投影光学系
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
EP2020679A4 (en) * 2006-05-25 2011-04-13 Nikon Corp OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100624578B1 (ko) 2001-12-26 2006-09-18 가부시키가이샤 오크세이사쿠쇼 투영 노광 장치
KR20060052802A (ko) * 2003-08-29 2006-05-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20060120660A (ko) * 2004-01-06 2006-11-27 가부시키가이샤 니콘 노광 방법 및 장치와, 디바이스 제조 방법

Also Published As

Publication number Publication date
KR20100006533A (ko) 2010-01-19
CN101625455B (zh) 2011-11-02
JP2010020017A (ja) 2010-01-28
TWI414822B (zh) 2013-11-11
JP5398185B2 (ja) 2014-01-29
TW201003119A (en) 2010-01-16
CN101625455A (zh) 2010-01-13

Similar Documents

Publication Publication Date Title
KR101121029B1 (ko) 투영 광학계, 노광 장치 및 디바이스 제조 방법
EP3642674B1 (en) Magnification compensation and/or beam steering in optical systems
WO2002047130A1 (en) Observation device and its manufacturing method, exposure device, and method for manufacturing micro device
KR101605567B1 (ko) 노광방법, 노광장치 및 디바이스 제조방법
KR20080065940A (ko) 위치검출장치 및 노광장치
KR101476871B1 (ko) 투영 광학계, 노광 장치 및 디바이스 제조 방법
KR102372650B1 (ko) 투영 광학계, 노광 장치, 물품의 제조 방법, 및 조정 방법
JP2000047390A (ja) 露光装置およびその製造方法
JP6410406B2 (ja) 投影光学系、露光装置および物品の製造方法
JP2007013179A (ja) リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
KR101080144B1 (ko) 노광장치 및 디바이스 제조방법
KR20130112753A (ko) 광학계, 노광 장치 및 디바이스 제조 방법
JP2003203853A (ja) 露光装置及び方法並びにマイクロデバイスの製造方法
KR101445426B1 (ko) 노광 장치 및 디바이스 제조 방법
JPH02310912A (ja) 露光方法及びその装置
JPH07218863A (ja) 投影露光装置
TWI695231B (zh) 曝光裝置和物品製造方法
CN101114132A (zh) 投影曝光装置
JP4547714B2 (ja) 投影光学系、露光装置、および露光方法
US20140168623A1 (en) Exposure apparatus, exposure method, and method of manufacturing device
JP2016039258A (ja) 光学装置、リソグラフィ装置、および物品の製造方法
JP5391641B2 (ja) フィルタ装置、照明装置、露光装置、及びデバイス製造方法
KR20000057078A (ko) 주사형 투영노광장치 및 노광방법
JP2010014765A (ja) 投影光学系、露光装置、およびデバイス製造方法
JP2007287885A (ja) 照明光学装置、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

FPAY Annual fee payment

Payment date: 20150127

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20160121

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20170125

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20180125

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20190219

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20200211

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250222

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

H13 Ip right lapsed

Free format text: ST27 STATUS EVENT CODE: N-4-6-H10-H13-OTH-PC1903 (AS PROVIDED BY THE NATIONAL OFFICE); TERMINATION CATEGORY : DEFAULT_OF_REGISTRATION_FEE

Effective date: 20250222

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250222