KR101118196B1 - 하부 드럼 마스크가 부착된 드럼 마스크 - Google Patents
하부 드럼 마스크가 부착된 드럼 마스크 Download PDFInfo
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- KR101118196B1 KR101118196B1 KR1020110072139A KR20110072139A KR101118196B1 KR 101118196 B1 KR101118196 B1 KR 101118196B1 KR 1020110072139 A KR1020110072139 A KR 1020110072139A KR 20110072139 A KR20110072139 A KR 20110072139A KR 101118196 B1 KR101118196 B1 KR 101118196B1
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- 238000000034 method Methods 0.000 claims description 6
- 239000002245 particle Substances 0.000 abstract description 19
- 239000010408 film Substances 0.000 description 28
- 238000004804 winding Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 238000001465 metallisation Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
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Abstract
Description
도 2는 본 발명의 기술에 의한 하부 드럼 마스크가 부착된 드럼 마스크가 장착된 롤투롤 스퍼트 시스템을 도시한 단면도.
도 3은 본 발명의 기술에 의한 하부 드럼 마스크가 부착된 드럼 마스크를 도시한 단면도.
120: 리와인딩 롤 130: 와인딩 롤
140: 드럼 150: 금속증착장치
151: 캐소드 챔버 153: 캐소드
T: 타겟 155: 드럼 마스크
157: 홀 S: 내측면
R: 후면 160: 하부 드럼 마스크
161: 바디 163: 홀
165: 돌출커버
Claims (2)
- 중앙에 홀(157)이 형성된 액자 형상의 드럼마스크(155)에 있어서;
상기 드럼 마스크(155)의 후면에 부합되도록 형성되어 밀착되는 판상의 하부 드럼 마스크(160)를 포함하여 구성되고,
상기 하부 드럼 마스크(160)에는 상기 홀(157)에 대응되도록 하부 드럼 마스크(160) 상의 홀(163)이 관통되어 형성된 것을 특징으로 하는 하부 드럼 마스크가 부착된 드럼 마스크. - 제1항에 있어서,
상기 하부 드럼 마스크(160) 상의 홀(163)의 내측면에서 상기 홀(157)의 측방에 형성된 내측면(S)을 가리는 돌출커버(165)가 연장되어 형성된 것을 특징으로 하는 하부 드럼 마스크가 부착된 드럼 마스크.
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KR1020110072139A KR101118196B1 (ko) | 2011-07-20 | 2011-07-20 | 하부 드럼 마스크가 부착된 드럼 마스크 |
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KR1020110072139A KR101118196B1 (ko) | 2011-07-20 | 2011-07-20 | 하부 드럼 마스크가 부착된 드럼 마스크 |
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Publication Number | Publication Date |
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KR101118196B1 true KR101118196B1 (ko) | 2012-02-24 |
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KR1020110072139A KR101118196B1 (ko) | 2011-07-20 | 2011-07-20 | 하부 드럼 마스크가 부착된 드럼 마스크 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067656A (ja) | 1983-09-20 | 1985-04-18 | Toppan Printing Co Ltd | 真空蒸着方法 |
JPH08104979A (ja) * | 1994-10-05 | 1996-04-23 | Mitsubishi Shindoh Co Ltd | 蒸着装置 |
JPH1081959A (ja) | 1996-09-03 | 1998-03-31 | Sony Corp | テープ蒸着装置の電子銃取付け構造 |
KR20090000256U (ko) * | 2007-07-06 | 2009-01-09 | (주) 에이알티 | 이온건챔버의 가스유출 방지가 가능한 롤투롤스퍼터 시스템 |
-
2011
- 2011-07-20 KR KR1020110072139A patent/KR101118196B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067656A (ja) | 1983-09-20 | 1985-04-18 | Toppan Printing Co Ltd | 真空蒸着方法 |
JPH08104979A (ja) * | 1994-10-05 | 1996-04-23 | Mitsubishi Shindoh Co Ltd | 蒸着装置 |
JPH1081959A (ja) | 1996-09-03 | 1998-03-31 | Sony Corp | テープ蒸着装置の電子銃取付け構造 |
KR20090000256U (ko) * | 2007-07-06 | 2009-01-09 | (주) 에이알티 | 이온건챔버의 가스유출 방지가 가능한 롤투롤스퍼터 시스템 |
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