KR101100627B1 - 노광용 반사경 - Google Patents
노광용 반사경 Download PDFInfo
- Publication number
- KR101100627B1 KR101100627B1 KR1020090051584A KR20090051584A KR101100627B1 KR 101100627 B1 KR101100627 B1 KR 101100627B1 KR 1020090051584 A KR1020090051584 A KR 1020090051584A KR 20090051584 A KR20090051584 A KR 20090051584A KR 101100627 B1 KR101100627 B1 KR 101100627B1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Abstract
Description
Claims (5)
- 삭제
- 광원에서 오는 빛으로부터 선택적으로 적외선, 가시광선 및 열선을 투과시키고, 자외선을 반사하도록 다수의 유전체층으로 이루어진 코팅층; 및상기 코팅층으로부터 투과된 적외선, 가시광선 및 열선을 투과시키는 베이스미러; 를 포함하고,상기 베이스미러에는 가상의 타원체 표면 일부에 대응되는 오목한 베이스면이 있으며,상기 가상의 타원체의 제1초점에 위치한 상기 광원에서 오는 자외선을 상기 타원체의 제2초점측으로 반사시킬 수 있도록 상기 코팅층과 상기 베이스면 사이의 각을 설정하여주는 다수의 셀베이스;를 더 포함하고,상기 코팅층에서 반사된 상기 자외선을 상기 타원체의 제2초점측으로 집광시키기 위하여 상기 베이스면 상에 다수의 상기 셀베이스가 배열된 것을 특징으로 하는노광용 반사경.
- 가상의 타원체 표면 일부에 대응되는 오목한 베이스면이 있고, 적외선, 가시광선 및 열선을 투과시키는 베이스미러;상기 가상의 타원체의 제1초점에 위치한 광원에서 오는 빛으로부터 선택적으로 적외선, 가시광선 및 열선을 투과시키고, 자외선을 상기 타원체의 제2초점측으로 반사시키는 다수의 반사셀; 을 포함하고,상기 반사셀은선택적으로 적외선, 가시광선 및 열선을 투과시키고 자외선을 반사하는 코팅층; 및상기 가상의 타원체의 제1초점에 위치한 상기 광원에서 오는 자외선을 상기 타원체의 제2초점측으로 반사시킬 수 있도록 상기 코팅층과 상기 베이스면 사이의 각을 설정하여주는 다수의 셀베이스;를 포함하며,상기 코팅층에서 반사된 상기 자외선을 상기 타원체의 제2초점측으로 집광시키기 위하여 상기 베이스면 상에 다수의 상기 셀베이스가 배열된 것을 특징으로 하는노광용 반사경.
- 제 2항 또는 제 3항에 있어서,상기 셀베이스는 글라스(glass) 또는 유전체인 것을 특징으로 하는노광용 반사경.
- 제 2항 또는 제 3항에 있어서,상기 베이스면에 접하는 가상의 평면에 수직인 상기 셀베이스의 단면이 삼각형 형상인 것을 특징으로 하는노광용 반사경.
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KR1020090051584A KR101100627B1 (ko) | 2009-06-10 | 2009-06-10 | 노광용 반사경 |
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KR1020090051584A KR101100627B1 (ko) | 2009-06-10 | 2009-06-10 | 노광용 반사경 |
Publications (2)
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KR20100132806A KR20100132806A (ko) | 2010-12-20 |
KR101100627B1 true KR101100627B1 (ko) | 2012-01-03 |
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KR1020090051584A KR101100627B1 (ko) | 2009-06-10 | 2009-06-10 | 노광용 반사경 |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050150253A1 (en) * | 2004-01-12 | 2005-07-14 | Asia Optical Co., Inc. | Method and the device for making high precision coating of insert for glass molding |
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Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US20050150253A1 (en) * | 2004-01-12 | 2005-07-14 | Asia Optical Co., Inc. | Method and the device for making high precision coating of insert for glass molding |
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