KR101095539B1 - 하프톤 마스크 및 이의 제조 방법 - Google Patents
하프톤 마스크 및 이의 제조 방법 Download PDFInfo
- Publication number
- KR101095539B1 KR101095539B1 KR1020090045847A KR20090045847A KR101095539B1 KR 101095539 B1 KR101095539 B1 KR 101095539B1 KR 1020090045847 A KR1020090045847 A KR 1020090045847A KR 20090045847 A KR20090045847 A KR 20090045847A KR 101095539 B1 KR101095539 B1 KR 101095539B1
- Authority
- KR
- South Korea
- Prior art keywords
- transflective
- substrate
- semi
- photoresist
- transmissive
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Liquid Crystal (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090045847A KR101095539B1 (ko) | 2009-05-26 | 2009-05-26 | 하프톤 마스크 및 이의 제조 방법 |
PCT/KR2010/003307 WO2010137857A2 (en) | 2009-05-26 | 2010-05-26 | Half tone mask and manufacturing method of the same |
CN201080023383.4A CN102449735B (zh) | 2009-05-26 | 2010-05-26 | 半色调掩模及其制造方法 |
TW099116829A TWI434134B (zh) | 2009-05-26 | 2010-05-26 | 半調式光罩及其製造方法 |
JP2012512963A JP5654577B2 (ja) | 2009-05-26 | 2010-05-26 | ハーフトーンマスク及びその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090045847A KR101095539B1 (ko) | 2009-05-26 | 2009-05-26 | 하프톤 마스크 및 이의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100127412A KR20100127412A (ko) | 2010-12-06 |
KR101095539B1 true KR101095539B1 (ko) | 2011-12-19 |
Family
ID=43223233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090045847A KR101095539B1 (ko) | 2009-05-26 | 2009-05-26 | 하프톤 마스크 및 이의 제조 방법 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5654577B2 (ja) |
KR (1) | KR101095539B1 (ja) |
CN (1) | CN102449735B (ja) |
TW (1) | TWI434134B (ja) |
WO (1) | WO2010137857A2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6726553B2 (ja) * | 2015-09-26 | 2020-07-22 | Hoya株式会社 | フォトマスクの製造方法、及び表示装置の製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0161389B1 (ko) * | 1995-02-16 | 1999-01-15 | 윤종용 | 마스크 및 이를 사용한 패턴형성방법 |
US5914202A (en) * | 1996-06-10 | 1999-06-22 | Sharp Microeletronics Technology, Inc. | Method for forming a multi-level reticle |
KR20050104337A (ko) * | 2002-12-14 | 2005-11-02 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 액정 디스플레이 장치 제조 방법, 이 방법에 의해 제조된액정 디스플레이 장치 및 이 방법에 사용되는 마스크 |
GB0229228D0 (en) * | 2002-12-14 | 2003-01-22 | Koninkl Philips Electronics Nv | Manufacture of shaped structures in LCD cells,and masks therefor |
JP4933753B2 (ja) * | 2005-07-21 | 2012-05-16 | 信越化学工業株式会社 | 位相シフトマスクブランクおよび位相シフトマスクならびにこれらの製造方法 |
KR100787090B1 (ko) * | 2006-03-31 | 2007-12-21 | 엘지마이크론 주식회사 | 다중 반투과부를 구비한 하프톤 마스크 및 그 제조 방법 |
KR101255616B1 (ko) * | 2006-07-28 | 2013-04-16 | 삼성디스플레이 주식회사 | 다중톤 광마스크, 이의 제조방법 및 이를 이용한박막트랜지스터 기판의 제조방법 |
JP5105407B2 (ja) * | 2007-03-30 | 2012-12-26 | Hoya株式会社 | フォトマスクブランク、フォトマスク及びフォトマスクの製造方法 |
JP5239591B2 (ja) * | 2007-07-30 | 2013-07-17 | 大日本印刷株式会社 | 階調マスクおよびその製造方法 |
JP4934237B2 (ja) * | 2007-09-29 | 2012-05-16 | Hoya株式会社 | グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法 |
-
2009
- 2009-05-26 KR KR1020090045847A patent/KR101095539B1/ko active IP Right Grant
-
2010
- 2010-05-26 TW TW099116829A patent/TWI434134B/zh active
- 2010-05-26 WO PCT/KR2010/003307 patent/WO2010137857A2/en active Application Filing
- 2010-05-26 CN CN201080023383.4A patent/CN102449735B/zh active Active
- 2010-05-26 JP JP2012512963A patent/JP5654577B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012528354A (ja) | 2012-11-12 |
WO2010137857A2 (en) | 2010-12-02 |
JP5654577B2 (ja) | 2015-01-14 |
CN102449735B (zh) | 2016-01-20 |
KR20100127412A (ko) | 2010-12-06 |
WO2010137857A3 (en) | 2011-03-03 |
TW201107877A (en) | 2011-03-01 |
TWI434134B (zh) | 2014-04-11 |
CN102449735A (zh) | 2012-05-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101215742B1 (ko) | 그레이 톤 마스크의 제조 방법 및 그레이 톤 마스크 | |
US8325317B2 (en) | Liquid crystal display fabrication method | |
JP5220100B2 (ja) | 複数の半透過部を備えたハーフトーンマスク及びその製造方法 | |
JP2005024730A (ja) | グレートーンマスクの製造方法 | |
JP2013167907A (ja) | ハーフトーンマスク及びその製造方法 | |
KR20100138381A (ko) | 하프톤 마스크의 제조 방법 | |
KR101168406B1 (ko) | 하프톤 마스크 및 이의 제조 방법 | |
KR101095539B1 (ko) | 하프톤 마스크 및 이의 제조 방법 | |
KR101186890B1 (ko) | 하프톤 마스크 및 이의 제조 방법 | |
KR100802450B1 (ko) | 다중 반투과부를 구비한 하프톤 마스크 및 그 제조방법 | |
KR100787090B1 (ko) | 다중 반투과부를 구비한 하프톤 마스크 및 그 제조 방법 | |
KR101095534B1 (ko) | 하프톤마스크 | |
JP5281810B2 (ja) | 液晶装置 | |
KR20130028177A (ko) | 다중 반투과부를 구비한 하프톤 마스크 | |
KR101419224B1 (ko) | 액정표시장치용 박막 트랜지스터 어레이 기판 및 그의 제조방법 | |
KR20080061192A (ko) | 하프 톤 마스크와 이의 제조 방법 | |
KR20070099108A (ko) | 다중 반투과부를 구비한 하프톤 마스크 및 그 제조방법 | |
KR20060011160A (ko) | 박막 트랜지스터 기판의 제조 방법과, 이에 의해 제조된박막 트랜지스터 기판 | |
KR20080027812A (ko) | 하프톤마스크 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
E90F | Notification of reason for final refusal | ||
E90F | Notification of reason for final refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20141106 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20151105 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20161104 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20171107 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20181112 Year of fee payment: 8 |