KR101094468B1 - 노광 패턴 형성 방법 - Google Patents

노광 패턴 형성 방법 Download PDF

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Publication number
KR101094468B1
KR101094468B1 KR1020067022507A KR20067022507A KR101094468B1 KR 101094468 B1 KR101094468 B1 KR 101094468B1 KR 1020067022507 A KR1020067022507 A KR 1020067022507A KR 20067022507 A KR20067022507 A KR 20067022507A KR 101094468 B1 KR101094468 B1 KR 101094468B1
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KR
South Korea
Prior art keywords
pattern
exposure
laser beam
glass substrate
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067022507A
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English (en)
Korean (ko)
Other versions
KR20070001251A (ko
Inventor
미요시 이또오
Original Assignee
브이 테크놀로지 씨오. 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 브이 테크놀로지 씨오. 엘티디 filed Critical 브이 테크놀로지 씨오. 엘티디
Publication of KR20070001251A publication Critical patent/KR20070001251A/ko
Application granted granted Critical
Publication of KR101094468B1 publication Critical patent/KR101094468B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Printer (AREA)
  • Mechanical Optical Scanning Systems (AREA)
KR1020067022507A 2004-04-28 2005-04-28 노광 패턴 형성 방법 Expired - Fee Related KR101094468B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法
JPJP-P-2004-00134441 2004-04-28
PCT/JP2005/008115 WO2005106591A1 (ja) 2004-04-28 2005-04-28 露光パターン形成方法

Publications (2)

Publication Number Publication Date
KR20070001251A KR20070001251A (ko) 2007-01-03
KR101094468B1 true KR101094468B1 (ko) 2011-12-19

Family

ID=35241830

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067022507A Expired - Fee Related KR101094468B1 (ko) 2004-04-28 2005-04-28 노광 패턴 형성 방법

Country Status (5)

Country Link
JP (1) JP4253707B2 (enExample)
KR (1) KR101094468B1 (enExample)
CN (1) CN100483258C (enExample)
TW (1) TWI380134B (enExample)
WO (1) WO2005106591A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344730B2 (ja) * 2006-05-22 2013-11-20 株式会社ブイ・テクノロジー 露光装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
WO2011090057A1 (ja) * 2010-01-21 2011-07-28 シャープ株式会社 基板、基板に対する露光方法、光配向処理方法
JP5538049B2 (ja) * 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP5704315B2 (ja) * 2011-01-07 2015-04-22 株式会社ブイ・テクノロジー 露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010623A (ja) * 1983-06-29 1985-01-19 Fujitsu Ltd ホトリピ−タ
JPS62124999A (ja) * 1985-11-27 1987-06-06 株式会社ニコン 自動作図装置
JP3046697B2 (ja) * 1993-11-08 2000-05-29 シャープ株式会社 露光装置
JPH09171106A (ja) * 1995-10-19 1997-06-30 Fuji Photo Film Co Ltd カラーフィルターの作製方法
JP3169068B2 (ja) * 1997-12-04 2001-05-21 日本電気株式会社 電子線露光方法及び半導体ウエハ
KR20030033067A (ko) * 2000-09-21 2003-04-26 가부시키가이샤 니콘 결상특성의 계측방법 및 노광방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
TW200606595A (en) 2006-02-16
JP2005316167A (ja) 2005-11-10
CN1947064A (zh) 2007-04-11
CN100483258C (zh) 2009-04-29
TWI380134B (en) 2012-12-21
KR20070001251A (ko) 2007-01-03
WO2005106591A1 (ja) 2005-11-10
JP4253707B2 (ja) 2009-04-15

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