TWI380134B - Exposure pattern forming method - Google Patents

Description

1380134 V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Technical Field The present invention relates to a method of directly exposing a functional pattern on an object to be exposed to form an exposure pattern, and more specifically, is formed on the object to be exposed. On the functional pattern as a reference, the set reference position is detected by photography, and the start of the beam irradiation and the stop of the irradiation are controlled based on the reference position, so that the functional pattern coincidence accuracy is improved upwards. The cost of the device is increased by the exposure pattern forming method. / - [Prior Art] The exposure pattern forming method of the conventional exposure apparatus is to use a light mask which is formed with a mask pattern in advance and a functional pattern corresponding to the functional image, and then the light is applied to the object to be exposed The mask pattern is exposed, and the transfer exposure is, for example, a stepper, or a Micro Mirror Projection, or a Proximity device. However, - for these old exposure pattern forming methods, when forming a multi-layered functional pattern, the coincidence accuracy between the functional layers of each layer is caused. In particular, when a TFT or a color filter for a large-sized liquid crystal panel is used to form a large-sized photomask, it is absolutely required to have a high precision of the size of the mask pattern, which makes the mask expensive. Moreover, in order to achieve the above-mentioned coincidence precision, the functional pattern of the base layer must be calibrated with the mask pattern, especially the calibration accuracy of the large mask is difficult. In addition, there is an exposure that uses a _beam or a laser beam directly on the exposed object to draw a CAD data pattern on the exposed object without using a reticle.

Page 8 1380134 V. Description of invention (2) Method of light pattern. Such an exposure pattern is formed by using a laser light source; and an exposure optical system for scanning a laser beam emitted from the laser light source; and transporting the object to be exposed in a state in which the object to be exposed is loaded; The exposure device of the transport mechanism, according to the CAD data, while controlling the emission state of the laser light source, while the laser beam is scanned back and forth, the exposed body is transported in a direction perpendicular to the scanning direction of the laser beam, and A CAD data secondary element pattern corresponding to the functional pattern is formed on the exposed body. (For example, refer to Japanese Patent Publication No. 2 0 0 1 -1 4 4 4 1 5). However, this direct drawing plastic exposure pattern forming method requires absolute precision in the size of the CAD pattern. This is the same as the mask that makes the exposure unit. Further, in the case of the functional pattern manufacturing process using a plurality of exposure apparatuses, when the accuracy between the exposure apparatuses is unstable, the stacking accuracy of the organic pattern is deteriorated. Moreover, it is necessary to consider a high-precision exposure apparatus when dealing with such a problem, so that the cost of the exposure apparatus is increased. Furthermore, the calibration of the base layer functional graphics and the CAD data graphics must be performed in advance, which also has the same problems as described above using a photomask or other type of exposure device. The shape and shape of the combined system is a square diagram. The formation of the light shape can be exposed to the high light to provide exposure, and the point is raised. The cost of the problem is set. 1 That is. Cheng Rongming's Da Ningfa has the same name as Ming, which is the degree of j fine -.·-.

Page 9 1380134 V. Description of Invention (3) In the exposure pattern forming method in which the light beam of the exposure optical system is scanned relative to the object to be exposed, and the functional pattern on the object to be exposed is directly exposed, the above exposure is performed. a reference substrate on which a reference pattern of an exposure reference position is formed in advance is disposed on the lower side of the body, and the object to be exposed and the reference substrate are transported in a predetermined direction by a transport mechanism; and the side of the transport mechanism is raised by the illumination mechanism a reference pattern for illuminating the reference substrate; and then photographing the reference pattern by an imaging mechanism disposed on the upper side of the same transport mechanism; and using the optical system control unit to detect the above-described photographing mechanism The reference pattern detects a preset position; and controls the irradiation of the light beam-4 and the illumination stop based on the reference position, and finally, at the predetermined position on the exposed object, the first functional image exposure. According to this method, the exposure pattern is preliminarily formed on the reference substrate, and the reference pattern is patterned to perform exposure of the first functional pattern on the object to be exposed. According to this method, it is possible to form a highly accurate first functional pattern at a predetermined position on the object to be exposed which is not formed. Moreover, the above reference substrate can be reused, so that the cost of the reference substrate can be reduced. Further, the first functional pattern formed by exposure at a predetermined position of the object to be exposed is further photographed by a photographing mechanism, and the first function photographed by the photographing unit is controlled by the optical system a pattern that detects a predetermined reference position; and based on the reference position, controls the start of the irradiation of the beam and the stop of the illumination; further, performs other functional patterns at the predetermined position of the object to be exposed Exposure. * In this way, imitating the first functional pattern formed on the exposed body,

Page 10 1380134 V. Description of the Invention (4) Other functional patterns are formed at predetermined positions of the above-mentioned object to be exposed. Therefore, when stacking a plurality of layers of functional graphics, the coincidence accuracy of each layer of functional graphics can be improved. Further, when a plurality of exposure apparatuses are used to form a laminated pattern, the problem of low accuracy of the functional pattern superimposition due to the difference in precision between the exposure apparatuses can be eliminated, and the cost of the exposure apparatus can be controlled. Further, the reference substrate is a transparent substrate, and the illumination unit and the imaging unit are disposed below the transport mechanism, and the reference pattern formed on the reference substrate is imaged from below the transport mechanism. The reference pattern formed on the transparent reference substrate is illuminated by an illumination mechanism provided on the transport mechanism β, and is photographed by a photographing mechanism below the transport mechanism. In this way, the reference functional pattern can be formed at a predetermined position of the object to be exposed regardless of whether the exposed body is transparent or opaque. [Embodiment] Fig. 1 is a conceptual view showing a first embodiment of an exposure apparatus according to the present invention. The exposure apparatus 1 directly exposes a functional pattern on an object to be exposed, and is equipped with a laser light source 2, an exposure optical system 3, a transport mechanism 4, a photographing mechanism 5, an illumination mechanism 6, and an optical system control mechanism 7. In addition, the above-mentioned machine j-ability graphic will form a necessary part to form a pattern according to the original purpose of the finished product, for example, a color filter, and the black matrix pixel pattern will be converted into red, blue and green color filter patterns. In the semiconductor parts, there are wiring patterns and various electrode patterns. Hereinafter, a glass substrate for a color filter will be described as an example.

Page 11 1380134 --- V. Description of the invention (5) The above-mentioned laser light source 2 is a source of emitted light beams, for example, a high-output all-solid mode locked laser light source that produces 355 nm ultraviolet light output of 4 W or more. An exposure optical system 3 is provided in front of the light source 2 in the direction in which the light beam is emitted. The exposure optical system 3' is a laser beam as a light beam, and is scanned back and forth on the glass substrate 8. The optical switch 9, the polarization mechanism 10, the first mirror 11, and the polygonal mirror 12 are disposed directly in front of the emission direction of the laser beam. And ίθ lens 13 and second mirror 14. The optical switch 9 is used to switch the irradiation state of the laser beam and the irradiation stop state. For example, the first and second polarizing elements 1 5 and 15 are shown in FIG. 2, so that the polarization axes ρ of the polarizing elements 15 Α and 15 互相 are mutually The vertical crossover is arranged separately (in the same figure, the polarization axis ρ of the polarizing element 15A is set in the vertical direction, and the polarization axis ρ of the polarizing element 15A is set in the horizontal direction) is disposed between the first and second polarizing elements 15Α and 15Β. There is an electro-optical modulator 16. In the above-described electro-optical modulator 16, when a voltage is applied, the polarized surface of the polarized light (linearly polarized light) is operated at a high speed of several nsec. For example, when the applied voltage is zero, in the same figure a, the penetration selected by the polarizing element 15A of the first one is past, for example, the polarized surface of the vertical direction has a linear polarized light directly penetrating the above-mentioned electro-optical modulator 16 to reach the second pseudo Light element 15B. The polarizing surface of the second polarizing element 15B in the horizontal direction is provided with linearly polarized light that can be selectively penetrated, so that the linear polarized light of the polarizing surface in the vertical direction is penetrated by the λ method. At this time, the laser beam is irradiated. Stop state. On the other hand, as shown in the same figure (b), when the voltage is applied, the electro-optical modulator 16 'rotates the polarization plane of the linearly polarized light incident on the electro-optical modulator 16 by 90 degrees'. Electrical optical modulator 16 when linearly polarized

Page 12 1380134 V. INSTRUCTION DESCRIPTION - The horizontal, polarized surface appears in the shot, the second/second shift, and the linear polarized light will penetrate the optical element. According to this mode, the laser beam is illuminated to illuminate the polarization mechanism 1 ,, the scanning position of the laser beam and the direction of the scanning head A + life are orthogonal (the moving direction of the glass substrate 8 is 1 arrow vertical plastic / # consistent) staggered, and adjusted to the correct position and scanned, such as the first learning component (Α 0 component). The first mirror 11 is such that, in order to distort the direction of the light beam passing through the polarizer, the plane y angle mirror 12 provided in the polygon mirror 12 to be described later is a laser beam that is scanned back and forth, for example, a column having a positive angle. The sides of the rotating body form an eight-sided mirror. In this case, the laser beam reflected by the upper middle lens is scanned in the direction of the primary element along with the polygon mirror 12, and when the irradiation position of the laser beam is instantaneously transferred to the next lens, it is returned. In the return direction, the rotation of the polygon mirror 12 is started again with the scanning of the outward direction of the primary element. The ίθ lens 13 is provided so as to advance at a constant speed on the glass substrate 8 in order to make the scanning speed of the laser beam, and the focus position is substantially coincident with the mirror position of the polygon mirror 12. Therefore, the second mirror 14 is a planar lens that reflects the laser beam passing through the f 0 lens 13 and irradiates the glass plate 8 in the near-vertical direction. Further, the Θ Θ lens 13 is adjacent to the exit side of the scanning beam scanning start side portion, and the linear sensor 1 7 ′ which is perpendicular to the scanning direction is set to detect the correct timing at which the laser beam scanning starts.

1380134 V. Description of the Invention (7) The linear sensor 17 is not necessarily provided beside the lens 丨3, as long as it can detect the correct timing of the start of scanning of the laser beam, it can be set there, for example, in the glass described later. It is also possible to beside the substrate transport platform 18. A transport mechanism 4 is provided below the second mirror 14. The transport mechanism 4' is mounted on the platform 18, and the glass substrate 8 is transported at a predetermined speed in a direction in which the scanning directions of the laser beams are perpendicularly intersected, and the platform 18 is moved, for example, 'the transport roller 19 can be driven for rotation. The transport roller 9 is provided with a transport drive unit 2 such as a dedicated motor. Above the transport mechanism 4, an imaging unit 5 is provided in front of the scanning position of the j-beam in the direction of the arrow A. This camera * ^ 冓 5, which will form a black moment of the reference functional pattern on the glass substrate 8 in advance. The pixel photographing elements of the array are arranged in a line, for example, linear c c D . Here, as shown in FIG. 3, the distance D between the photographing position e of the photographing mechanism 5 and the scanning position F of the laser beam is set to the pitch P of the transport direction of the pixel 22 of the black matrix 2 1 Integer multiple (n times) ^ The glass substrate 8' is transported in this manner. When the center of the pixel 22 coincides with the scanning position of the laser beam, the laser beam can be scanned in conjunction with the scanning timing. Further, the smaller the distance D is, the better. Therefore, the movement error of the glass substrate 8 can be less and less, and the scanning position of the laser beam can determine the position of the above-mentioned pixel 22 correction. Further, in Fig. 1, an example in which three cameras are in the photographing mechanism 5 is shown, but the scanning range of the laser beam is smaller than that in the image processing field of one photographing mechanism 5, and the photographing mechanism 5 can be used. If the scanning range is wider than the image processing field of one photographing unit 5, it is preferable to provide a plurality of photographing units 5 in accordance with the situation.

INDIVIDUAL 134 V. INSTRUCTION DESCRIPTION (8) ^ θ Below the transport mechanism 4, an illumination mechanism 6 is provided. This lighting agency praised Yu Wei, illuminating the above-mentioned pixels 2 to facilitate photography by the photography agency 5. The above-mentioned μ-forming aperture 2, the optical switch 9, the polarizing mechanism 10, the polygonal mirror 12, the line register, the transport mechanism 4 and the photographing mechanism 5 are connected to the optical control unit, and the optical control unit 7 detects The reference image is preliminarily set by the graphic image of the element 22 captured by the photographing mechanism 5, and the laser beam of the laser light source 2 is controlled to start and the illumination is stopped 1 ϊ ΐ according to the linear position sensor 17 The output of the polarizing mechanism 10 is controlled to deflect the emission direction of the laser beam, and the rotation speed of the multi-angle inverse =1 is controlled to maintain the predetermined scanning speed of the laser beam, so as to control the transport speed of the glass substrate 8 at Within the established speed. Driving Ϊ =, the device of the present invention includes: a light source i for illuminating the laser light source 2, and an optical device 24' for controlling the start of the laser beam irradiation and stopping the irradiation, and controlling the polarization of the laser beam within the polarizing mechanism 1? The mechanism driving unit 2 controls the polygon mirror 12 drive-transport control: 2 movements 6 and H, and controls the conveyance speed of the conveyance mechanism 4? 7. ",,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The image information is the reference, and the image processing unit of the start position and the irradiation stop position "will irradiate the laser beam obtained by the processing of the position Ux · / # image / control unit 29 to the start position and = f" The exposure is described first, and the lookup table of the position is memorized.

Page 15

1380134 5. The memory unit 30 of the invention (9), and the modulation information of the optical switch 9 on/off is made based on the information of the exposure start position and the exposure end position read from the memory unit 30. The variable data processing unit 3 1 and the above-described overall device are provided with a control unit 32 that performs the matching control in accordance with each of the intended operations. 4 and 5 are block diagrams showing a configuration example of a part of the image processing unit 29. As shown in FIG. 4, the image processing unit 29 includes, for example, three ring buffer memories ||(Ring Buffer Memory) 33 A, 33B, 33C; and, together with these ring buffer memories (Ring Buffer) Memory ) 33A, 33B, 33C Each of the cells is juxtaposed with each other _ , three linear buffer memories (Li ne Buf er Memory ) 34A, 3 4B , 34C ; and these linear buffer memories ( Line Buf f er Memory) 34A, 34B, 34C are connected to each other to compare the gray scale threshold data, and the comparison loop 3 5 is outputted in a binary manner; and the above 9 linear buffer memories (Line Buffer Memory) The output data of 34A, 34B, and 34C and the reference pattern P obtained from the memory unit 30 shown in Fig. 1 are equivalent to the reference table of the image data of the head reference position determined by the pixels of the black matrix. Look Up Table (for the head reference position) For comparison, when the two sets of data are identical, the determination of the leading reference position result 3 6 ' and the 9 linear buffer memories 34A, 34B are outputted. 34C The output data is compared with the lookup table of the image data corresponding to the rear reference position obtained from the memory unit 30 shown in FIG. 1, and the comparison table is used when the two sets of data are identical. The result of determining the rear reference position is the determination of the rear reference position circuit 37.

1380134 V. Inventive Note (10) Further, as shown in FIG. 5, the image processing unit 29 inputs the above-described leading end position determination result, and calculates a matching number of times of the reference circuit 38A for the leading end position of the image data corresponding thereto, and the counting circuit 38A When the output is the same as the two values of the exposure start pixel number obtained by the memory unit 30 shown in FIG. 1, the exposure start signal 'allowing the start of exposure' appears and the comparison circuit outputted by the modulation data creation processing unit 31 shown in FIG. 39A, the above-mentioned calculation result count circuit 38B, the output of the count circuit 38B, and the exposure of the memory unit 30 shown in FIG. 1 " When the two values of the final pixel number are relatively consistent, the second end of the exposure signal is displayed, and the comparison circuit mb outputted by the processing unit-31 is formed in the modulation data shown in Fig. 1. The output of the above counting circuit 38A is basic. The leading graph, or the leading graph of the pixel count, or the count of the pixels back. The output of the head circuit or the counting circuit 40 of the pixel 40' is the same as that of the reference pattern P column obtained by the symbol 30 in Fig. 1, or the reference figure P column when the two values of the pixel column are compared, or In the case of the pixel sequence designation signal, the output data comparison processing unit 31 sets the output comparison circuit 41. On the other hand, when the photographing mechanism 5 starts the reading operation, the counting circuits 38A and .38B are preset in accordance with the reading start signal. The counting circuit of the leading graph or pixel 4 0 terminates the signal reset according to the exposure pattern I when the predetermined exposure pattern is formed at the end. Description of the method of forming the exposure pattern used in the exposure apparatus 1 Λ First, when the light source is applied to the exposure apparatus 1, the optical system control unit 7 is activated. The laser source 2 then activates the emission of the laser beam. At the same time, the multi-angle reflection, the mirror 12 starts to rotate, and the state in which the laser beam scanning can be started is presented. but

Page 17 1380134 V. INSTRUCTIONS (11) At this time, the light switch 9 is still in the state of 〇 f f, so the laser beam has not started to be irradiated. #: Next, the glass substrate 8A on which the pattern has not been formed is arranged on the stage 18 of the transport mechanism 4, and the reference glass substrate "as a reference substrate" which is a reference as shown in FIG. The glass substrate 8A is superimposed and loaded. On the other hand, the transport mechanism 4 is used to transport the two glass, the glass substrates 8A, 8B at a constant speed, as shown in Fig. 7, the scanning trajectory of the laser beam (arrow B), and the platform The moving direction (arrow A) of 1 8 is relatively inclined. Thus, if the two glass substrates 8A, 8B are arranged in parallel with the above-described moving direction (arrow 2), as shown in (a), the exposure position is scanned. The deviation between the initial reference pattern Pa and the scanning reference pattern Pb. At this time, as shown in Fig. (b), the two glass substrates 8A, 8β are inclined with respect to the transport direction (arrow A direction), which makes the above The alignment direction of the reference pattern p coincides with the scanning trajectory of the laser light (arrow B direction) to produce a better state. However, in the actual state, the speed of the laser beam is higher than that of the two glass substrates 8A, 8B. If the glass substrate 8A ' 8B is arranged in parallel according to the moving direction, the above-mentioned deviation amount can be calculated and determined based on the photographic data in the photographing mechanism 5, and then controlled by the polarizing mechanism 1 Q of the exposure optical system 3 . The amount of deviation is corrected. However, the following descriptions all deviate from the amount of deviation. Next, the conveyance drive unit 20 is started to move the platform 18 in the direction of the arrow A of FIG. 1. At this time, the conveyance drive unit 20 is transported in accordance with the optical system control mechanism 7. The roller 26 controls to maintain a constant speed. Next, 'the reference pattern p formed on the reference glass substrate 8B is

1380134 V. Description of Invention (12) When the photographing position of the photographing mechanism 5 is reached, the photographing mechanism 5 starts photographing, and the photographing start position and the end position of exposure are detected based on the image data of the photographed reference pattern P. The flow chart illustrates the specific shape of the exposure graphic. First, the "step S1 is" to acquire the image of the reference pattern p by the photographic imaging unit 5. This acquisition image data is three of the image processing sections 29 shown in FIG.

Ring Buffer Memory 33A, 33B, 33C are read and processed. Therefore, the latest three items of data are output from the respective Ring Buf er Memory 33A, 33B, 3 3C. In this case, the second $', for example, is composed of Ring Buffer Memory • 1丨3 3 A , and the first two data are outputted by the ring buffer memory (r i ng

Buffer Memory) 33B, output the previous data, and the ring buffer memory (Ring Buf fer Memory) 3 3C, output the latest data. Moreover, each of the generated data is arranged on the same time axis according to three Line Buffer Memory 34A, 34B, 34C, for example, 3 x 3 CCD pixels. As a result, an image as shown in Fig. 9(a) is obtained. When the image is digitized, as in the figure (b), it becomes a value corresponding to 3 X 3 . These digitized images are listed in the same time axis, compared to the critical value in the comparison loop 35, and the 2 digits are multiplied. For example, when the critical value is set to "4 5", the image of the same figure (a) is numerically converted into a graph (c). Next, step S2 is to detect the front end and the rear reference position. Specifically, the reference position is detected, and the front end reference position loop 3, 4 is described as the front end obtained by the memory unit 30 shown in FIG.

Page 19 1380134 V. INSTRUCTIONS (13) The reference position is obtained by comparing the data of the comparison table (LUT). For example, when the front end reference position is set to 'the top left corner of the reference pattern P as shown in Fig. 10(a), the front end reference position is displayed as shown in Fig. (b). When the front-end reference position uses the data of the B3 table, it will become "0 0 0 0 1 1 0 1 Γ. Therefore, the above-mentioned 2-digit 'value data is compared with the above-mentioned reference position data "0 0 0 0 1 1 〇1丨", and when the two match, it is determined that the image is acquired at the photographing mechanism 5. The data is the front end reference position, and the result of the determination of the front reference pattern P position is output from the front end reference position determination circuit 36. As shown in Fig. 11, the four bases of the figure p and the top left corner of the reference pattern Ρ are the front reference positions. -- Based on the above determination result, the counting circuit 3 8 所示 shown in Fig. 5 counts the number of coincidences. Therefore, the number of counts is compared with the comparison start pattern number obtained from the ticker portion 3 shown in Fig. 1 in the comparison loop 3 9 A, and when the values are identical, the modulation data shown in Fig. 1 is created. The processing unit 3 1' outputs a signal that allows the start of exposure. In this case, as shown in FIG. 11, for example, the ice-light start pattern and the laser beam scanning direction No. 1, No. 2, No. 3, and No. 4 each of the reference patterns P2, Ps, P4 - When set, the top left corner of each pattern is the front reference position, and the linear CCD element number of the camera 5 corresponding to the head reference position is ""1 00 0", , :) 0 0 0 " ' " 30 0 0", " 40 00" is stored in the light controller 24. On the other hand, the binary data is compared with the reference data for the rear reference position obtained from the memory unit 30 of Fig. 1 at the rear reference position determination ^ circuit 3 7 '. For example, the rear reference position is as shown in FIG. 12, " is set at the upper right corner of the reference pattern P, and the pair of the rear reference position is used.

1380134, invention description (14) The information according to the table will be changed like the reference table in Figure (b) - the same as the data in the table. The back reference position data will be the same as the above reference level. , the above 2 into "1 1 0 1 1 0 0 0 0 " for comparison use of ..., the data of the table data mix 4 @ _ remnant - a time ' & photography agency 5 m If the bellows breaks, it is judged why the 准5 has obtained the quasi-position judgment loop 3 7 rounds of $# soil^, and the rear part is the same as the upper **图U* ^ ^ In addition, the reference figure Ρ upper right corner, 祙 4 When 曰A /丞+图ΡΡ·31 columns, each α month is at the rear reference position. u ! As a result of the above determination, the count t f coincides as shown in FIG. 5 . Therefore, the number of counts is the same as that from Fig. 22: When the twilight end pattern number is compared to 31, the temperature is changed, and the modulation data is processed in the modulation data processing unit H f shown in FIG. . At this time, as shown in FIG. 11, for example, as the warm light pattern, the respective reference patterns 第ι, Ρ2, Ρ3, ρ々 of the No. 1, No. 2, No. 3, and No. 4 in the scanning direction of the laser beam are as follows. μ, "^ Fig. = the upper right corner is defined as the rear reference position, and the linear CCD element number of the photographing mechanism 5 corresponding to the rear reference position is ""1 9 9 〇", " 2 9 9 〇", " 3 9 9 0 n 4 9 0 0" Memory in the light system controller 2 4 . Therefore, after the front end and the rear reference position are measured as described above, the process proceeds to step S3^3, and the moving direction exposure position of the glass substrate 8A is detected in step S3'. Here, as shown in FIG. 3, the distance D between the scanning position F of the laser beam and the photographing position E of the photographing mechanism 5 is set to D = nVT (n is an integer, and V is the moving speed of the transport mechanism 4, T is the laser beam scanning period), since V is a certain 'laser beam scanning period T can be counted, it can be calculated

Page 21 1380134 V. Description of invention (15) Description of the exposure position. Next, in step S4, the laser beam is scanned while the exposure position is adjusted (scanning position). Specifically, as shown in FIG. 13, the adjustment of the exposure position is performed, and the linear sensor 丨7 provided by the f 0 lens 13 detects the scanning position (element number) of the current laser beam, and a preset reference. The element number = comparison, the error value is detected, so that the laser beam of the polarizing mechanism is controlled, and the scanning position is consistent with the reference element code (reference scanning position). Its - person starts exposure at step S5. At the beginning of the exposure, the light system is turned on, and the controller 24 controls the timing of the presentation (10) of the light system switch 9. In this case, the first (two, two, the laser beam scanning to the light system switch 9 shows a state of 〇N, and then the above-mentioned gentleman sensor 1 7 'one detects the scanning start time of the laser beam, The light system switch. At this time, the processing unit 31 is generated from the modulation data, ΐ% = t, and the first front end reference position of Fig. 11 corresponds to the element B of the photographing mechanism 5, and is controlled by the control unit. 3 2 Calculate the scanning start of the laser beam: the time t of the end reference position, at this time, the sweep of the laser beam = 22.2, the scan time to the element number "1" of the photographing mechanism 5 Λ & : t 〇, when the scanning speed of the laser beam is adjusted to be synchronized with the linear CfD clock CLK of the photographing mechanism 5, the scan start time tr can be easily obtained by calculating the number of clocks up to the element code 1 0 0 0, The calculation formula is 1^=t. + 1 0 0 0CLK. The following is a description of the method of exposing the pixel 2 of the black matrix 2 1 shown in Fig. 11 and Fig. (b). At this time, the applicable laser beam is applied. The system is limited to the use of a light beam corresponding to the thin-twisted portion of the reference pattern p. At this time, as shown in Figure π (b), it is thick. Enclosed inside pixel 22

Page 22 1380134 V. Description of invention (16) C A D data will be memorized by the memory unit 30. Here, the exposure system is as shown in the diagram (b), and the pixel 2 2 is based on the CAD data of the line pattern in which the scanning beam of the laser beam is read by the memory portion 30, and the exposure start position is specified. Exposure End Position 'This exposure start position and exposure end position correspond to the element number of the linear CCD of the above-described imaging mechanism 5, and manage the scanning time of the laser beam. Specifically, the exposure of the 1^ line is performed first in the same figure (b). At this time, the exposure is permitted from the first front-end reference position "1 0 0 0 ", and the exposure is started after the elapse of time 1:2. Then, after the time 1:3, the exposure ends. ::^ Next, step S6 detects the rear reference position. The rear reference position is the same as described above, for example, the laser beam scanning time t4 from the first front end reference position "1 0 0 " to the first rear reference position "1 9 9 " The control is performed, and the first reference pattern Pi at the rear reference position "1 9 9 0 " is exposed, and in the case of the h line shown in Fig. 11 (b), the exposure stop state is maintained.

J Next, step S7 determines whether or not the scanning of the laser beam is stopped. In this case, if it is determined that "NO" returns to step S2, repeat the above action. Therefore, in step S2, as shown in FIG. 11(a), for example, if the second front-end reference bit thinning and the second rear reference position "2 9 9 0 " are detected, steps S3, S4 are passed. Proceed to step S5. At this time, as in the above, from the contact to the second, the end reference position "2 0 0 0 " starts to t2 and then exposes, and then to t3, the exposure ends. As for the rear reference position 2 9 9 0 ", the end of the L-line of the second reference pattern P2 will end. In the above steps S2 to S6, the beam is repeatedly scanned until it is finished. Thus, when the exposure of the h line corresponding to the first reference pattern column is finished,

Page 23 1380134 V. Description of Invention (π) Step S7 is judged as "YES", and then proceeds to step s8. The control unit 32 exposes the predetermined area (this refers to the first reference pattern column). Whether the exposure of the graphics is all final is judged. ,: A result: When the setting/fruit is "N〇", return to step S2 and repeat the step L2 line of the reference bit V" Fig. 11 (8) for exposure. For example, the first ^ starts. After that, the exposure starts, and after the %, the second: 丄 In the rear reference position "199〇", the first reference map first P 1 exposure action will end. Column 1] The same repeated exposure action for L3, L4, the first reference pattern

' No exposure is over, it will be judged as "YES" in step S8, and I will proceed. At this time, in the glass substrate 8A of the first reference pattern row, the exposure pattern of the black matrix 2 1 indicated by the oblique line indicated in FIG. 11(b) is exposed to 0'. Next, the control unit 32 determines the direction of the transport. The baseline map's exposure formation is all over. If the result of the determination is "N0", the operation returns to step S1 and steps S1 to S8 are repeated, and the exposure operation is performed on the reference pattern column of the second 'thirdth... Each of the reference pattern columns is exposed to an exposure pattern of a black matrix 2 1 pixel 2 2 on the glass substrate 8 A. When it is judged as "YES" in step S10, the i J light pattern formation on the glass substrate 8A is all finished. Next, a red, blue or green color filter exposure pattern is formed as described above on the basis of the black matrix 21 pixel 22 on the glass substrate 8A. Hereinafter, a brief description will be given of the color filter exposure pattern. However, the term "beam" used herein refers to the use of a beam having a diameter approximately the same as the width of the pixel 22.

1380134 V. INSTRUCTION OF THE INVENTION (18) First, in Fig. 8, the step 'in the photographing apparatus' takes the image of the black matrix 21 element 22 . Then, in the step "", the predetermined front end reference position and the rear reference position are detected on the pixel 22 as shown in Fig. 14. When the oblique line-shaped exposure pattern is formed, the image display number setting of Fig. 5 is started. It is "1" However, at this time, the front end reference position set from the upper left corner of the first element 2 2 1 of the comparator 3 9 A is started at the light-system switch controller 24 to start the exposure that allows the exposure to start. On the other hand, as shown in Fig. 5, as the exposure end pixel number system, for example, it is set to "6". At this time, the rear reference position set from the upper right corner f of the sixth element 22e of the comparator 39β is set. 'The exposure stop signal for terminating the exposure is outputted at the light system switch controller 24. Then, in the same manner as described above, after the first pixel sequence is detected in step S3, 'the process proceeds to step S4, and the scanning of the laser beam is adjusted. Then, in step S5, based on the CAD data of the exposure pattern of the color filter read by the memory unit 30, the laser beam scanning time from the exposure start position to the exposure end position is calculated. Figure 4 The exposure end position coincides with the rear reference position. Next, it is determined in step S7 whether the laser beam scanning is terminated, and if it has not been terminated, steps S1 to S6 are repeated. Therefore, if the scanning has been terminated, the process proceeds to step S8. In the case of Fig. 14, the exposure of the first pixel sequence is scanned by the laser beam, and it is determined in step S8 that "YES" ". Then, it is determined whether or not the exposure patterns of the predetermined pixel columns in the transport direction are all formed. Once judged as "YES", the exposure pattern forming, for example, a red color filter on the glass substrate 8A is terminated.

Page 25 1380134 V. Inventive Description (19) According to the exposure pattern forming method of the present invention, a reference position is set in advance on the reference pattern P formed on the reference glass substrate 8B, and the photographing mechanism 5 performs photographing and detection. The light beam irradiation start and the irradiation stop based on the reference position are controlled, and an exposure pattern of the black matrix 21 element 22 is formed at a predetermined position of the glass substrate 8 A, and can be formed at a predetermined position of the glass substrate 8A where nothing is formed. High-precision pixel 22 exposure pattern. Further, in the same manner as described above, when the halogen element 22 of the black matrix 21 formed on the glass substrate 8A forms an exposure pattern at a predetermined reference position, exposure of the color filters such as red, blue, and green colors is performed on the pixel array. The accuracy of the graphics will change. In the same manner, by forming the respective exposure patterns 4 using a plurality of exposure devices, the problem that the registration accuracy is deteriorated due to the difference in precision between the respective exposure devices can be eliminated, and the cost increase of the exposure device can be suppressed. Therefore, if the arrangement pattern P and the arrangement pitch of the halogen 2 2 are the same, it is possible to use the halogen of any shape of the same reference glass substrate 8B for exposure. Further, the above-described actual application state is such that the illumination unit 6 is provided below the transport device 4, and the back illumination is used as an example. However, the illumination mechanism 6 is also preferably provided above the transport device 4. Further, as shown in FIG. 15, the illumination mechanism and the imaging unit 5 are disposed below the transport device 4, and the reference pattern P formed by the transparent reference glass substrate 8B i from the lower side of the transport device 4 can be photographed. Regardless of whether the object to be exposed is transparent or opaque, it can form a functional pattern based on the predetermined position of the object to be exposed. Therefore, the exposure pattern forming method of the present invention is not limited to the liquid application.

Page 26 1380134 V. INSTRUCTIONS (20) Large substrates such as color filters for crystal screens are also suitable for exposure of exposure patterns such as semiconductors.

IBB Page 27 1380134 Shaped application of light exposure is appropriate, the method of forming the shape of the light is exposed to the light of the statement - for the simple diagram 1 type diagram, the simple outline diagram of the diagram The positional shadow rfcor diagram of the visual structure oblique machine Mingying said that the shooting and movement. The position and the position of the construction of the sweeping light Ray Ray is for the Ming 〗 〖The picture block half of the front of the system s ^ 'v There is a part of the mt in the structuring department. The image is shown in the figure. The part of the structure is the part of the structure. The part of the structure is W1-I J1. The image is 5 map/图雷图Shape •, 13⁄4 图准明基说的例勤/^1 ^3 形移图相相相基直直向向方方上板 扫 之 之 之 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃 璃The input W-bit system 彡 开 C C C C C β β β β β β β β β β β C C C C C C C C C C C C C C C C C C C C C C C C C C 成 成 成 成 U - clearly state the state before the set of the quasi-base end of the set pre-topform; the base map is 10 Table photo and 3⁄4 light exposure of the prime painting • 1 The formation of the rectangular fish is based on the 'form map'. The base table is used as the pair 11 and the graphic pair and the image. After the base, the pre-top shape is pre-formed. The base map is in the form of a 12-table-photo-exposed light; the light map is bright and the color is in the form of a positive shape. Painting, *>c,, beam light moment; color image Rayheiming as saying 3 4 J 1 1 drawing graphics.

Page 28 1380134 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 15 is an explanatory diagram of another configuration example of the photographing apparatus. [Description of main components and symbols] 1 Exposure apparatus 2 Laser. Light source 3 Exposure optical system 4 Transport mechanism 5 Photographing mechanism 6 Zhaoming mechanism 7 Optical system control Mechanism 8 Glass substrate 9 Optical switch 10 Polarization mechanism 11 First mirror 12 Polygon mirror II 13 f 0 lens 14 First - mirror j 15A First polarizing element 15B Second polarizing element 16 Electrical optical modulator 17 Linear sensing 18 glass substrate transport platform 19 transport roller 20 transport drive unit 23 light source drive unit 24 optical switch controller 25A polarizing mechanism drive unit 25B multi-lateral drive unit 26 transport controller 27 illumination controller 28 A/D converter unit 29 image processing unit 30 Memory unit 31 modulation data creation processing unit 32 control unit 33 A > 33B 33C ring buffer memory 34A 34B, 34C; linear loop Buffer memory 36: the front end of the reference position determination circuit 38A, 38B: counting circuit 39A, 39B: Comparison circuit

Page 29

Claims (1)

Sixth, the object of the main π月丨v曰 amendments. Revision of the month/L day 1. A functional pattern on the light body by using the exposure pair scanning and then the beam of the optical system in the optical system of the optical system to directly expose the exposed body, and directly performing the exposure process: The method is characterized in that the method includes the following steps of the reference pattern which is exposed to the above, and the lower side of the arrangement is used as a reference for the exposure position, and the substrate to be exposed and the reference substrate formed by the ^^^ are sent in advance. The soil-based substrate is transported in a predetermined direction to be placed underneath the Chengpanpan machine, and the material I·:, below the 迗 mechanism, is the reference figure of the above-mentioned reference substrate: Illuminating; taking a reference pattern of the reference substrate from below the transport mechanism by an imaging mechanism disposed below the transport mechanism; and using the optical system control mechanism to obtain the reference map obtained by the photographing mechanism Formally, detecting a preset reference position, and controlling the start and end of the irradiation of the light beam based on the reference position, A first functional pattern is exposed on a predetermined position of the exposed body. 2. The exposure pattern forming method according to claim 1, wherein the first functional image is exposed at a predetermined position on the exposed object, and then photographed by a photographing mechanism, and the optical system control mechanism detects the photograph. a reference position set in advance by the first functional pattern photographed by the shadow mechanism; controlling the start of irradiation and the stop of the irradiation of the light beam based on the reference position, and performing other functions at a predetermined position of the object to be exposed The exposed person of the graphic. No., 30 pages 1380134 VI. Designation of representative drawings (1) The representative figure of this case is: Figure 11 (II), the symbol of the symbol of the representative figure of the case is simple: Exposure device Laser light source Exposure optical system Transport mechanism Photographic mechanism Lighting machine 'construction 10 11 12 13 14 17 18 19 20 23 24 25A 25B Optical system control mechanism Glass substrate Light switch Polarization mechanism First mirror Polygon mirror f 0 Lens second mirror, Linear sensor Glass substrate Transport platform Transport roller Transport drive Light source drive section Optical switch controller Polarization mechanism Drive section Multilateral Drive department Page 5 1380134 Page 6