KR101076518B1 - 화학 기상 증착을 위한 장치 및 방법 - Google Patents

화학 기상 증착을 위한 장치 및 방법 Download PDF

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Publication number
KR101076518B1
KR101076518B1 KR1020087027234A KR20087027234A KR101076518B1 KR 101076518 B1 KR101076518 B1 KR 101076518B1 KR 1020087027234 A KR1020087027234 A KR 1020087027234A KR 20087027234 A KR20087027234 A KR 20087027234A KR 101076518 B1 KR101076518 B1 KR 101076518B1
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South Korea
Prior art keywords
sintered metal
porous sintered
vessel
vapor deposition
chemical vapor
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Korean (ko)
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KR20080108350A (ko
Inventor
데이비드 케이. 칼슨
에롤 산체즈
사드이쉬 쿠푸라오
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어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020087027234A 2006-04-11 2007-04-11 화학 기상 증착을 위한 장치 및 방법 Expired - Fee Related KR101076518B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US79123006P 2006-04-11 2006-04-11
US60/791,230 2006-04-11
US11/697,937 2007-04-09
US11/697,937 US7967911B2 (en) 2006-04-11 2007-04-09 Apparatus and methods for chemical vapor deposition

Publications (2)

Publication Number Publication Date
KR20080108350A KR20080108350A (ko) 2008-12-12
KR101076518B1 true KR101076518B1 (ko) 2011-10-24

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KR1020087027234A Expired - Fee Related KR101076518B1 (ko) 2006-04-11 2007-04-11 화학 기상 증착을 위한 장치 및 방법

Country Status (6)

Country Link
US (2) US7967911B2 (enExample)
JP (2) JP5548446B2 (enExample)
KR (1) KR101076518B1 (enExample)
CN (1) CN101426953B (enExample)
DE (1) DE112007000898T5 (enExample)
WO (1) WO2007121202A1 (enExample)

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US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
US7740816B1 (en) * 2008-02-06 2010-06-22 Vapor Point, LLC Method for treating gases to be scrubbed
US7803337B1 (en) 2008-02-06 2010-09-28 Vapor Point, LLC Method for treating a fluid to be scrubbed
FR2935800B1 (fr) * 2008-09-09 2010-11-19 R & I Alliance Procede et dispositif de detection de fuites dans une conduite de liquide souterraine, notamment une conduite d'eau
US8568529B2 (en) * 2009-04-10 2013-10-29 Applied Materials, Inc. HVPE chamber hardware
JP5898624B2 (ja) * 2009-11-02 2016-04-06 シグマ−アルドリッチ・カンパニー、エルエルシー 蒸発器
KR101084997B1 (ko) * 2011-06-30 2011-11-18 (주)그랜드 텍 캐리어 기체에 의한 화합물 기화용 버블러
US8795420B1 (en) * 2011-07-27 2014-08-05 Vapor Point, LLC Apparatus for removing unwanted contaminates from gases
JP6270729B2 (ja) * 2011-11-10 2018-01-31 サン‐ゴバン、クリストー、エ、デテクトゥールＳａｉｎｔ−Ｇｏｂａｉｎ Ｃｒｉｓｔａｕｘ ＆ Ｄｅｔｅｃｔｅｕｒｓ 半導体結晶材料の形成に用いるシステム
US20130220221A1 (en) * 2012-02-23 2013-08-29 Applied Materials, Inc. Method and apparatus for precursor delivery
US20140242374A1 (en) * 2013-02-22 2014-08-28 Infineon Technologies Ag Porous Metal Coating
CN104342751B (zh) * 2013-08-02 2017-07-21 北京北方微电子基地设备工艺研究中心有限责任公司 反应腔和mocvd设备
WO2015164029A1 (en) * 2014-04-21 2015-10-29 Entegris, Inc. Solid vaporizer
US9914632B2 (en) * 2014-08-22 2018-03-13 Applied Materials, Inc. Methods and apparatus for liquid chemical delivery
US10563305B2 (en) 2015-05-13 2020-02-18 Versum Materials Us, Llc Container for chemical precursors in a deposition process
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
MY190445A (en) 2015-08-21 2022-04-21 Flisom Ag Homogeneous linear evaporation source
US10480070B2 (en) * 2016-05-12 2019-11-19 Versum Materials Us, Llc Delivery container with flow distributor
WO2018111720A1 (en) 2016-12-12 2018-06-21 Applied Materials, Inc. Precursor control system and process
KR20190112212A (ko) * 2017-03-03 2019-10-02 어플라이드 머티어리얼스, 인코포레이티드 앰풀로부터의 플럭스를 증가시키기 위한 장치
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US10947621B2 (en) * 2017-10-23 2021-03-16 Applied Materials, Inc. Low vapor pressure chemical delivery
US11166441B2 (en) 2018-07-13 2021-11-09 Versum Materials Us, Llc Vapor delivery container with flow distributor
CN118422165A (zh) * 2019-08-05 2024-08-02 Asm Ip私人控股有限公司 用于化学源容器的液位传感器
US11834740B2 (en) * 2020-11-10 2023-12-05 Applied Materials, Inc. Apparatus, system, and method for generating gas for use in a process chamber
US12054825B2 (en) * 2021-06-22 2024-08-06 Applied Materials, Inc. Bottom fed sublimation bed for high saturation efficiency in semiconductor applications
FI130131B (en) * 2021-09-07 2023-03-09 Picosun Oy Precursor container

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US4668365A (en) 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
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US5037624A (en) * 1987-03-24 1991-08-06 Advanced Technology Materials Inc. Composition, apparatus, and process, for sorption of gaseous compounds of group II-VII elements
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TW200300701A (en) * 2001-11-30 2003-06-16 Asml Us Inc High flow rate bubbler system and method
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Also Published As

Publication number Publication date
CN101426953B (zh) 2012-05-30
JP2009533556A (ja) 2009-09-17
US8313804B2 (en) 2012-11-20
KR20080108350A (ko) 2008-12-12
US7967911B2 (en) 2011-06-28
JP5726831B2 (ja) 2015-06-03
US20080014350A1 (en) 2008-01-17
WO2007121202A1 (en) 2007-10-25
JP5548446B2 (ja) 2014-07-16
US20110217466A1 (en) 2011-09-08
DE112007000898T5 (de) 2009-05-07
JP2013040410A (ja) 2013-02-28
CN101426953A (zh) 2009-05-06

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