CN101426953B - 用于化学气相沉积的装置和方法 - Google Patents

用于化学气相沉积的装置和方法 Download PDF

Info

Publication number
CN101426953B
CN101426953B CN2007800129307A CN200780012930A CN101426953B CN 101426953 B CN101426953 B CN 101426953B CN 2007800129307 A CN2007800129307 A CN 2007800129307A CN 200780012930 A CN200780012930 A CN 200780012930A CN 101426953 B CN101426953 B CN 101426953B
Authority
CN
China
Prior art keywords
sintered metal
porous plate
container
metal frit
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2007800129307A
Other languages
English (en)
Chinese (zh)
Other versions
CN101426953A (zh
Inventor
D·K·卡尔森
E·桑切斯
S·库普里奥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN101426953A publication Critical patent/CN101426953A/zh
Application granted granted Critical
Publication of CN101426953B publication Critical patent/CN101426953B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CN2007800129307A 2006-04-11 2007-04-11 用于化学气相沉积的装置和方法 Expired - Fee Related CN101426953B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US79123006P 2006-04-11 2006-04-11
US60/791,230 2006-04-11
US11/697,937 2007-04-09
US11/697,937 US7967911B2 (en) 2006-04-11 2007-04-09 Apparatus and methods for chemical vapor deposition
PCT/US2007/066366 WO2007121202A1 (en) 2006-04-11 2007-04-11 Apparatus and methods for chemical vapor deposition

Publications (2)

Publication Number Publication Date
CN101426953A CN101426953A (zh) 2009-05-06
CN101426953B true CN101426953B (zh) 2012-05-30

Family

ID=38229865

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800129307A Expired - Fee Related CN101426953B (zh) 2006-04-11 2007-04-11 用于化学气相沉积的装置和方法

Country Status (6)

Country Link
US (2) US7967911B2 (enExample)
JP (2) JP5548446B2 (enExample)
KR (1) KR101076518B1 (enExample)
CN (1) CN101426953B (enExample)
DE (1) DE112007000898T5 (enExample)
WO (1) WO2007121202A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11873558B2 (en) 2021-09-07 2024-01-16 Picosun Oy Precursor container

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
US7740816B1 (en) * 2008-02-06 2010-06-22 Vapor Point, LLC Method for treating gases to be scrubbed
US7803337B1 (en) 2008-02-06 2010-09-28 Vapor Point, LLC Method for treating a fluid to be scrubbed
FR2935800B1 (fr) * 2008-09-09 2010-11-19 R & I Alliance Procede et dispositif de detection de fuites dans une conduite de liquide souterraine, notamment une conduite d'eau
US8568529B2 (en) * 2009-04-10 2013-10-29 Applied Materials, Inc. HVPE chamber hardware
JP5898624B2 (ja) * 2009-11-02 2016-04-06 シグマ−アルドリッチ・カンパニー、エルエルシー 蒸発器
KR101084997B1 (ko) * 2011-06-30 2011-11-18 (주)그랜드 텍 캐리어 기체에 의한 화합물 기화용 버블러
US8795420B1 (en) * 2011-07-27 2014-08-05 Vapor Point, LLC Apparatus for removing unwanted contaminates from gases
JP6270729B2 (ja) * 2011-11-10 2018-01-31 サン‐ゴバン、クリストー、エ、デテクトゥールＳａｉｎｔ−Ｇｏｂａｉｎ Ｃｒｉｓｔａｕｘ ＆ Ｄｅｔｅｃｔｅｕｒｓ 半導体結晶材料の形成に用いるシステム
US20130220221A1 (en) * 2012-02-23 2013-08-29 Applied Materials, Inc. Method and apparatus for precursor delivery
US20140242374A1 (en) * 2013-02-22 2014-08-28 Infineon Technologies Ag Porous Metal Coating
CN104342751B (zh) * 2013-08-02 2017-07-21 北京北方微电子基地设备工艺研究中心有限责任公司 反应腔和mocvd设备
WO2015164029A1 (en) * 2014-04-21 2015-10-29 Entegris, Inc. Solid vaporizer
US9914632B2 (en) * 2014-08-22 2018-03-13 Applied Materials, Inc. Methods and apparatus for liquid chemical delivery
US10563305B2 (en) 2015-05-13 2020-02-18 Versum Materials Us, Llc Container for chemical precursors in a deposition process
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
MY190445A (en) 2015-08-21 2022-04-21 Flisom Ag Homogeneous linear evaporation source
US10480070B2 (en) * 2016-05-12 2019-11-19 Versum Materials Us, Llc Delivery container with flow distributor
WO2018111720A1 (en) 2016-12-12 2018-06-21 Applied Materials, Inc. Precursor control system and process
KR20190112212A (ko) * 2017-03-03 2019-10-02 어플라이드 머티어리얼스, 인코포레이티드 앰풀로부터의 플럭스를 증가시키기 위한 장치
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US10947621B2 (en) * 2017-10-23 2021-03-16 Applied Materials, Inc. Low vapor pressure chemical delivery
US11166441B2 (en) 2018-07-13 2021-11-09 Versum Materials Us, Llc Vapor delivery container with flow distributor
CN118422165A (zh) * 2019-08-05 2024-08-02 Asm Ip私人控股有限公司 用于化学源容器的液位传感器
US11834740B2 (en) * 2020-11-10 2023-12-05 Applied Materials, Inc. Apparatus, system, and method for generating gas for use in a process chamber
US12054825B2 (en) * 2021-06-22 2024-08-06 Applied Materials, Inc. Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1672247A (zh) * 2002-08-23 2005-09-21 东京毅力科创株式会社 气体供给装置及处理系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4496609A (en) 1969-10-15 1985-01-29 Applied Materials, Inc. Chemical vapor deposition coating process employing radiant heat and a susceptor
US4232063A (en) 1978-11-14 1980-11-04 Applied Materials, Inc. Chemical vapor deposition reactor and process
US4579080A (en) 1983-12-09 1986-04-01 Applied Materials, Inc. Induction heated reactor system for chemical vapor deposition
JPS60131973A (ja) 1983-12-19 1985-07-13 Matsushita Electric Ind Co Ltd 有機金属の気化方法
US4668365A (en) 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
US5000113A (en) 1986-12-19 1991-03-19 Applied Materials, Inc. Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
US5037624A (en) * 1987-03-24 1991-08-06 Advanced Technology Materials Inc. Composition, apparatus, and process, for sorption of gaseous compounds of group II-VII elements
JPH116065A (ja) * 1997-06-16 1999-01-12 Seiko Epson Corp Ｃｖｄに供する液体ソースのバブラー
US6444038B1 (en) * 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
EP1079001B1 (en) * 1999-08-20 2005-06-15 Morton International, Inc. Dual fritted bubbler
EP1160355B1 (en) * 2000-05-31 2004-10-27 Shipley Company LLC Bubbler
TW200300701A (en) * 2001-11-30 2003-06-16 Asml Us Inc High flow rate bubbler system and method
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US7132128B2 (en) 2005-03-31 2006-11-07 Tokyo Electron Limited Method and system for depositing material on a substrate using a solid precursor
US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1672247A (zh) * 2002-08-23 2005-09-21 东京毅力科创株式会社 气体供给装置及处理系统

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP昭60-131973A 1985.07.13
M.Timmons et al..A study of cylinder design for solid OMVPE sources.《Journal of Crystal Growth》.2000,第221卷635-639. *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11873558B2 (en) 2021-09-07 2024-01-16 Picosun Oy Precursor container
US12146218B2 (en) 2021-09-07 2024-11-19 Picosun Oy Precursor container

Also Published As

Publication number Publication date
JP2009533556A (ja) 2009-09-17
US8313804B2 (en) 2012-11-20
KR20080108350A (ko) 2008-12-12
US7967911B2 (en) 2011-06-28
JP5726831B2 (ja) 2015-06-03
US20080014350A1 (en) 2008-01-17
KR101076518B1 (ko) 2011-10-24
WO2007121202A1 (en) 2007-10-25
JP5548446B2 (ja) 2014-07-16
US20110217466A1 (en) 2011-09-08
DE112007000898T5 (de) 2009-05-07
JP2013040410A (ja) 2013-02-28
CN101426953A (zh) 2009-05-06

Similar Documents

Publication Publication Date Title
CN101426953B (zh) 用于化学气相沉积的装置和方法
US20240209501A1 (en) Reactant vaporizer and related systems and methods
US7584942B2 (en) Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
JP5449221B2 (ja) 有機金属前駆物質を複数のエピタキシャル・リアクター部にバルク供給するための方法
US20060065254A1 (en) Vaporizer
US20050249873A1 (en) Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US11661653B2 (en) Vapor delivery systems for solid and liquid materials
US20200131630A1 (en) Aerosol-free vessel for bubbling chemical precursors in a deposition process
TWI388688B (zh) 化學氣相沈積法及設備
CN118800694B (zh) 蒸发输送装置、设备、控制方法和半导体器件
US20250293059A1 (en) Vessel for containing precursor
CN115772658B (zh) 前驱体容器
CN121183309A (zh) 用于供应蒸发的反应物的设备及相关的反应器系统和方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C53 Correction of patent of invention or patent application
CB02 Change of applicant information

Address after: American California

Applicant after: Applied Materials Inc.

Address before: American California

Applicant before: Applied Materials Inc.

C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120530

Termination date: 20140411