KR101071454B1 - 포토마스크의 제조 방법, 패턴 전사 방법, 포토마스크 및데이터베이스 - Google Patents
포토마스크의 제조 방법, 패턴 전사 방법, 포토마스크 및데이터베이스 Download PDFInfo
- Publication number
- KR101071454B1 KR101071454B1 KR1020080071085A KR20080071085A KR101071454B1 KR 101071454 B1 KR101071454 B1 KR 101071454B1 KR 1020080071085 A KR1020080071085 A KR 1020080071085A KR 20080071085 A KR20080071085 A KR 20080071085A KR 101071454 B1 KR101071454 B1 KR 101071454B1
- Authority
- KR
- South Korea
- Prior art keywords
- photomask
- pattern
- light
- film
- exposure
- Prior art date
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70653—Metrology techniques
- G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Thin Film Transistor (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007191487 | 2007-07-23 | ||
JPJP-P-2007-00191487 | 2007-07-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090010907A KR20090010907A (ko) | 2009-01-30 |
KR101071454B1 true KR101071454B1 (ko) | 2011-10-10 |
Family
ID=40462633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080071085A KR101071454B1 (ko) | 2007-07-23 | 2008-07-22 | 포토마스크의 제조 방법, 패턴 전사 방법, 포토마스크 및데이터베이스 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5363767B2 (zh) |
KR (1) | KR101071454B1 (zh) |
CN (1) | CN101382729B (zh) |
TW (1) | TWI446105B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI428688B (zh) * | 2009-07-29 | 2014-03-01 | Hoya Corp | Method for manufacturing multi - modal mask and pattern transfer method |
JP2012047732A (ja) * | 2010-07-30 | 2012-03-08 | Hoya Corp | 透過率測定装置、フォトマスクの透過率検査装置、透過率検査方法、フォトマスク製造方法、パターン転写方法、フォトマスク製品 |
JP5866912B2 (ja) * | 2011-09-16 | 2016-02-24 | 凸版印刷株式会社 | パターンの描画条件導出方法及びパターン描画装置 |
CN102944971B (zh) * | 2012-11-21 | 2015-03-18 | 京东方科技集团股份有限公司 | 掩膜版及光刻材料的曝光检测方法 |
CN105988285B (zh) * | 2015-01-30 | 2019-09-27 | 中芯国际集成电路制造(上海)有限公司 | 测试掩模版以及测试方法 |
CN104765245A (zh) * | 2015-04-10 | 2015-07-08 | 深圳市华星光电技术有限公司 | 一种灰色调掩膜及其制作方法 |
KR20200052487A (ko) * | 2018-11-06 | 2020-05-15 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
CN111352294B (zh) * | 2020-03-23 | 2021-10-22 | 昆山国显光电有限公司 | 掩模版、显示面板及掩模版的制备方法 |
JP6993530B1 (ja) | 2020-12-25 | 2022-01-13 | 株式会社エスケーエレクトロニクス | フォトマスク、フォトマスクの製造方法、表示装置の製造方法 |
CN114488703B (zh) * | 2021-12-10 | 2024-04-12 | 武汉新芯集成电路制造有限公司 | 刻蚀方案的确定方法、测试掩模板以及刻蚀系统 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04328548A (ja) * | 1991-04-26 | 1992-11-17 | Nikon Corp | フォトマスクの検査方法および装置 |
JP2530081B2 (ja) * | 1992-01-09 | 1996-09-04 | 株式会社東芝 | マスク検査装置 |
JP3085264B2 (ja) * | 1997-11-10 | 2000-09-04 | 日本電気株式会社 | フォトマスクならびにその製造方法 |
JP2000181048A (ja) * | 1998-12-16 | 2000-06-30 | Sharp Corp | フォトマスクおよびその製造方法、並びにそれを用いた露光方法 |
JP2002174604A (ja) * | 2000-09-29 | 2002-06-21 | Hoya Corp | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 |
JP2003043665A (ja) * | 2001-08-02 | 2003-02-13 | Sony Corp | フォトマスクの製造方法 |
JP4064144B2 (ja) * | 2002-04-16 | 2008-03-19 | Hoya株式会社 | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 |
JP4021235B2 (ja) * | 2002-04-16 | 2007-12-12 | Hoya株式会社 | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 |
JP3993125B2 (ja) * | 2003-04-01 | 2007-10-17 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
JP3875648B2 (ja) * | 2003-04-08 | 2007-01-31 | Hoya株式会社 | グレートーンマスクの欠陥検査方法 |
JP4294359B2 (ja) * | 2003-04-08 | 2009-07-08 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
JP4393290B2 (ja) * | 2003-06-30 | 2010-01-06 | Hoya株式会社 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
US7524593B2 (en) * | 2005-08-12 | 2009-04-28 | Semiconductor Energy Laboratory Co., Ltd. | Exposure mask |
KR20080037702A (ko) * | 2005-09-21 | 2008-04-30 | 다이니폰 인사츠 가부시키가이샤 | 계조를 갖는 포토마스크 및 그 제조 방법 |
KR101082715B1 (ko) * | 2005-12-26 | 2011-11-15 | 호야 가부시키가이샤 | 마스크 블랭크 및 포토마스크 |
JP5064116B2 (ja) * | 2007-05-30 | 2012-10-31 | Hoya株式会社 | フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法 |
-
2008
- 2008-07-08 TW TW097125683A patent/TWI446105B/zh active
- 2008-07-22 CN CN2008101340325A patent/CN101382729B/zh active Active
- 2008-07-22 KR KR1020080071085A patent/KR101071454B1/ko not_active IP Right Cessation
- 2008-07-23 JP JP2008190353A patent/JP5363767B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TWI446105B (zh) | 2014-07-21 |
KR20090010907A (ko) | 2009-01-30 |
CN101382729B (zh) | 2011-12-07 |
TW200912520A (en) | 2009-03-16 |
JP2009048186A (ja) | 2009-03-05 |
JP5363767B2 (ja) | 2013-12-11 |
CN101382729A (zh) | 2009-03-11 |
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