KR101047946B1 - Electromagnetic shielding film having a transparent function and a near infrared ray absorption function, an optical filter comprising the same, and a plasma display panel comprising the same - Google Patents

Abstract

The present invention provides an electromagnetic wave shielding film having an adhesive transparent layer formed to fill the groove portion of the conductive pattern portion of the electromagnetic wave shielding film and including a near infrared absorbing dye, an optical filter including the electromagnetic wave shielding film, and a plasma display panel including the same. It is about.

The electromagnetic shielding film can easily perform the transparent process, and does not require a layer having a separate near infrared absorption function, so that it is possible to manufacture a thin optical filter, and the productivity is improved by simplifying the process by the breakthrough structure simplification, cost reduction Can contribute to

Electromagnetic shielding film, optical filter, plasma display panel

Description

ELECTROMAGNETIC WAVE-SHIELDING FILM HAVING NEAR INFRARED SHIELDING FUNCTION AND TRANSPARENCY FUNCTION, OPTICAL FILTER COMPRISING THE SAME, AND PLASMA DISPLAY PANEL COMP OPTICAL FILTER}

1 is a cross-sectional view of a general electromagnetic shielding film.

2A, 2B and 2C are cross-sectional views of the electromagnetic wave shielding film according to the exemplary embodiment of the present invention.

3A and 3B are cross-sectional views of an electromagnetic shielding film according to an exemplary embodiment of the present invention.

4A, 4B and 4C are cross-sectional views of an optical filter according to an exemplary embodiment of the present invention.

5A, 5B and 5C show an example in which an optical filter according to an exemplary embodiment of the present invention is applied to a PDP.

6A, 6B, 6C, 6D, and 6E are cross-sectional views of the optical filter according to the exemplary embodiment of the present invention before mounting to the PDP as a filter in which transparent glass is laminated.

7 and 9 are graphs measuring the durability of the electromagnetic wave shielding film including the pressure-sensitive adhesive layer containing a near infrared absorbing dye according to an embodiment of the present invention.

8 and 10 are graphs of the durability measurement of the electromagnetic wave shielding film including a pressure-sensitive transparent layer containing a near infrared absorbing dye and a color correction dye according to an embodiment of the present invention.

* Description of the symbols for the main parts of the drawings *

10 plasma display panel 20 adhesive transparent layer

20 'adhesion layer 30: electromagnetic shielding film

31: transparent base material 31 ': a release film or a transparent film

32: conductive pattern portion 40: antireflection film

50: clear glass

The present invention provides an electromagnetic wave shielding film including an adhesive transparent layer formed to fill the grooves of the conductive pattern portion of the electromagnetic wave shielding film and including a near infrared absorbing dye, an optical filter including the electromagnetic wave shielding film, and a plasma display panel including the same. Hereinafter, PDP).

In general, a display device is a term referring to a TV, a computer monitor, or the like, and includes a display module having a display panel for forming an image and a casing for supporting the display module.

The display module is a display panel such as a cathode ray tube (CRT), a liquid crystal display (LCD) and a plasma display panel (PDP) forming a picture, a driving circuit board for driving the display panel, and an optical device disposed in front of the display panel. Include a filter.

The PDP filter is located on the front of the PDP panel, an anti-reflection film that prevents external light incident from the outside to be reflected back to the outside, and a near-infrared shielding film that shields near infrared rays generated from the display panel to prevent malfunction of electronic devices such as a remote control. It includes a color correction film to increase the color purity, including a color correction dye, and an electromagnetic shielding film for shielding the electromagnetic waves generated in the display panel when driving the display device.

Here, the conductive pattern portion having the groove portion and the protrusion is provided on the upper portion of the electromagnetic shielding film, so that any other functional film, such as an antireflection film, a near infrared shielding film, or a color correction film, is formed on the pattern upper portion of the electromagnetic shielding film on which the pattern is formed. When bonded to each other, the electromagnetic shielding film and the other functional film is not close enough to each other, the fine air layer formed by the groove of the electromagnetic shielding film is formed by the light scattered by the fine air layer, there was a problem that it is difficult to achieve a clear image quality . In order to solve this problem, after bonding the two films with an adhesive, the micro air layer must be removed through a transparent process. In this case, the transparency means that the light is scattered by the fine air layer and thus the image quality is not clear but somewhat cloudy, by filling the fine air layer with a transparent resin to make the fine air layer transparent, thereby providing a clear image quality. do.

In addition, the conventional PDP filter is manufactured by separately manufacturing each functional film and then formed by stacking the films integrally with a pressure-sensitive adhesive, the process is difficult, the cost is increased, and there is a difficulty in manufacturing a thin PDP.

The technical problem to be achieved by the present invention is to provide an electromagnetic shielding film having a transparency function, an optical filter and a PDP using the same by using an adhesive including a near infrared absorbing dye.

The present invention has a structure in which a transparent substrate, an electromagnetic wave shielding layer including a conductive pattern portion formed on at least a portion of the transparent substrate, and a pressure-sensitive adhesive layer including a near-infrared absorbing dye are formed to fill the groove portion of the conductive pattern portion, and are sequentially stacked. Provided an electromagnetic shielding film.

The conductive pattern portion is preferably in the form of a mesh.

The electromagnetic wave shielding film of the present invention may include a release film or a transparent film or a layer provided with another function on the surface of the adhesive transparent layer.

 The electromagnetic wave shielding film of the present invention may further include a layer or an adhesive layer for imparting different functions to the opposite side of the surface provided with the electromagnetic wave shielding layer of the transparent substrate, and may include a release film on the adhesive layer. .

In addition, the present invention provides an optical filter comprising the electromagnetic shielding film.

The present invention also provides a PDP comprising the optical filter.

Hereinafter, the present invention will be described in detail.

The electromagnetic wave shielding film according to the present invention includes a transparent substrate, an electromagnetic wave shielding layer including a conductive pattern portion formed in at least a portion of the transparent substrate, and a pressure-sensitive adhesive transparent layer formed to fill the groove portion of the conductive pattern portion and containing a near infrared absorbing dye. It is characterized by consisting of a laminated structure.

As a component for imparting tackiness in the pressure-sensitive adhesive transparent layer including a near-infrared absorbing dye, any component may be used without limitation as long as it does not limit light transmission as a pressure sensitive adhesive component.

The pressure-sensitive adhesive used in the present invention is not particularly limited as long as it is used in an ordinary pressure-sensitive adhesive sheet, an adhesive film, or the like. For example, acrylic, urethane, polyisobutylene, SBR (styrene-butadiene rubber), rubber, polyvinyl ether, epoxy, melamine, polyester, phenol or silicone or copolymers thereof In particular, an acrylic adhesive is preferable.

The acrylic pressure-sensitive adhesive is preferably a glass transition temperature (Tg) is 0 ℃ or less. The acrylic pressure-sensitive adhesive is 75 to 99.89% by weight of the (meth) acrylic acid ester monomer having an alkyl group having 1 to 12 carbon atoms, 0.1 to 20% by weight of the α, β unsaturated carboxylic acid monomer which is a functional monomer, and a polymerizable monomer having a hydroxyl group. It can be obtained by copolymerizing 0.01 to 5% by weight. The copolymerization method is well known to those skilled in the art and specific conditions will be omitted.

More preferably, the acrylic pressure-sensitive adhesive, a copolymer of butyl acrylate (BA) / hydroxy ethyl methacrylate (HEMA), or butyl acrylate / acrylic acid (AA: acrylic acid) copolymer may have an excellent absorption function in the visible region and near infrared region of the film, compared to other acrylic pressure-sensitive adhesives, it is effective in stabilizing the near infrared absorbing dye.

In preparing the near-infrared absorption adhesive clearing layer according to the present invention, a solvent may be further used, and a general organic solvent may be used as the solvent, and preferably methyl ethyl ketone (MEK), tetrahydrofuran (THF), or ethyl acetate. (Ethyl Acetate) or toluene can be used. In addition, the content of the solvent is not particularly limited.

The near-infrared absorption adhesive clearing layer according to the present invention may further include a crosslinking agent and a coupling agent.

The crosslinking agent may include an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, or a metal chelate crosslinking agent as a multifunctional compound. More preferably, an isocyanate-based crosslinking agent is used, and examples thereof include, but are not limited to, tolylene diisocyanate, xylene diisocyanate, diphenylmethane diisocyanate or hexamethylene diisocyanate. The content of the crosslinking agent may be used in an amount of 0.01 to 2 parts by weight based on 100 parts by weight of the pressure sensitive adhesive component.

The coupling agent is preferably a silane coupling agent. The silane coupling agent serves to improve the adhesion reliability, especially when left for a long time under high temperature and high humidity. The silane coupling agent may be vinyl silane, epoxy silane or methacryl silane. For example, it is vinyl trimethoxysilane, vinyl triethoxysilane, (gamma)-glycidoxy propyl trimethoxysilane, (gamma)-methacryloxypropyl trimethoxysilane, etc. These can be used individually or in mixture. The content of the silane coupling agent may be used in an amount of 0.01 to 2 parts by weight based on 100 parts by weight of the pressure-sensitive adhesive component.

The near-infrared absorption adhesive transparent layer according to the present invention is an antioxidant such as phenol-based or phosphorus-based, flame retardant such as halogen-based or phosphoric-based, ultraviolet absorber such as silicic acid-based, benzophenone-based, benzotriazole-based or cyano acrylate-based or Additives, such as antistatic agents, such as an alkylene oxide type, can be used. The additive content may be used in 0.01 to 10 parts by weight based on 100 parts by weight of the pressure-sensitive adhesive component.

The near-infrared absorbing dye may be one or more selected from the group consisting of metal complexes, phthalocyanine dyes, naphthalocyanine dyes, cyanine dyes having an intermolecular metal complex complex, and dimonium dyes. have. Among them, metal-complex and phthalocyanine-based dyes are preferably used because of their excellent durability in the pressure-sensitive adhesive and the ability to absorb near infrared rays.

As the metal complex dye, a compound represented by the following Chemical Formula 1 or Chemical Formula 2 may be used.

In Formula 1, R ₁ to R ₄ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, import a hydroxy group, an alkyl group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of the, arylthio C _{6 ~ 20,} CF _3, nitro, cyano, Or a halogen atom, which may have a substituent such as a halogen, cyano group or nitro group,

Y ₁ to Y ₄ are each independently S or O,

M is preferably one selected from the group consisting of metal atoms of Ni, Cu, Pt and Pd.

In Formula 2, R ₅ and R ₆ are, each independently, an alkoxy group of a hydrogen atom, C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} In the same or different and each the aryloxy group, import a hydroxy group, an alkyl group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of the, arylthio C _{6 ~ 20,} CF _3, nitro, cyano, Or a halogen atom, which may have a substituent such as a halogen, cyano group or nitro group,

Y ₁ to Y ₄ are each independently S or O,

M is preferably one selected from the group consisting of metal atoms of Ni, Cu, Pt and Pd.

The metal complex dye has a feature of ensuring durability in the pressure-sensitive adhesive and having an absorption maximum in the near infrared region, and at the same time, light absorption in the visible region is low.

As the phthalocyanine-based dye, a compound represented by the following Formula 3 may be used.

In Formula 3, R ₇ to R ₁₀ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, come hydroxy group, C _{1 ~ 16} alkyl group, a methyl group with an aryl group, trifluoroacetic C _{6 ~ 20,} an alkylthio group of C _{1 ~ 16,} aryl T of C _{6 ~ 20,} a nitro group, a cyano Or a halogen atom, which may have a substituent such as a halogen, cyano group or nitro group,

M 'is a divalent metal atom consisting of Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And oxy metal atoms consisting of VO, MnO and TiO.

As the naphthalocyanine-based dye, a compound represented by the following Formula 4 may be used.

In Formula 4, R ₁₁ to R ₁₄ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, come hydroxy group, C _{1 ~ 16} alkyl group, a methyl group with an aryl group, trifluoroacetic C _{6 ~ 20,} an alkylthio group of C _{1 ~ 16,} aryl T of C _{6 ~ 20,} a nitro group, a cyano Or a halogen atom, which may have a substituent such as a halogen, cyano group or nitro group,

M 'is a divalent metal atom consisting of Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And oxy metal atoms consisting of VO, MnO and TiO.

As the cyanine dye having the intermolecular metal-complex form, compounds represented by the following Chemical Formulas 5, 6, and 7 may be used.

In Formula 5, the aryl group of R ₁₅ and R ₁₆ are the same or different, independently represent a hydrogen atom, C _{1 ~ 30} linear or branched alkyl group, C _{1 ~ 8} alkoxy group, or C _{6 ~ 30} of each other, and They may have a substituent such as a halogen, cyano group or nitro group,

X ₁ to X ₅ are the same or different, independently represent a halogen group, a nitro group, a carboxyl group, a phenoxycarbonyl group, a carboxylate group, an alkyl group of C _{1 ~ 8,} an alkoxy group of C _{1 ~ 8,} or C _{6 ~ 30} Aryl groups, and these may have a substituent such as halogen, cyano group or nitro group,

M is preferably one selected from the group consisting of metal atoms of Ni, Cu, Pt and Pd.

In Formula 6, R ₁₅ , R ₁₆ , X ₁ to X ₅ and M are as defined in Formula 5.

In Formula 7, R ₁₅ , R ₁₆ , X ₁ to X _5, and M are as defined in Formula 5.

As the dimonium-based dye, a compound represented by Formula 8 may be used.

In Formula 8, R ₁₇ To R ₂₄ are the same or different, each independently, an aryloxy group of a hydrogen atom, C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} alkoxy group, C _{6 ~ 20} of the group, a hydroxy group, methyl group with an aryl group, a trifluoromethyl of C _{1 ~ 16} alkyl group, C _{6 ~ 20} of, alkylthio group of C _{1 ~ 16,} arylthio C _{6 ~ 20,} a nitro group, a cyano and group, or a halogen atom, They may have a substituent such as a halogen, cyano group or nitro group,

R ₂₅ To R ₂₈ are the same as or different from each other, and independently, a hydrogen atom, a halogen atom, a cyano group, a nitro group, a carboxyl group, an alkyl group and an alkoxy group, which may have a substituent such as a halogen, cyano group or nitro group,

Z is an organic acid monovalent anion, an organic acid divalent anion, and an inorganic acid monovalent anion.

Examples of the organic intervalent monovalent anion include organic carboxylic acid ions such as acetate ions, lactate ions, trifluoroacetate ions, propionate ions, benzoate ions, oxalate ions, succinate ions and stearate ions; Organic sulfonic acid ions such as methane sulfonate ion, toluene sulfonate ion, naphthalene monosulfonate ion, chlorobenzene sulfonate ion, nitrobenzene sulfonate ion, dodecylbenzene sulfonate ion, Benzene sulfonate ions , ethane sulfonate ions and trifluoromethane sulfonate ions; And organic boric acid ions such as tetraphenylborate ion and butyltriphenylborate ion.

As the organic acid divalent anion, naphthalene-1,5-disulfonic acid, naphthalene-1,6-disulfonic acid, naphthalene disulfonic acid derivative, and the like can be used.

As the inorganic acid monovalent anion, halogenide ions such as fluoride ions, chloride ions, bromide ions, iodide ions, thiocyanate ions, hexafluoroantimonate ions, perchlorate ions, periodate ions, Nitrate ions, tetrafluoroborate ions, hexafluorophosphate ions, molybdate ions, tungstate ions, titanate ions, vanadate ions, phosphate ions or borate ions and the like.

The amount of the near-infrared absorbing dye may be used in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the pressure-sensitive adhesive.

The adhesive transparent layer of the electromagnetic wave shielding film according to the present invention may further include a neon-cut dye as a color correction dye.

The color correction dye includes at least one selected from the group consisting of porphyrin dyes having an intramolecular metal-complex form and cyanine dyes having an intermolecular metal-complex form.

As the porphyrin-based color correction dye having the intramolecular metal-complex form, a compound represented by the following Formula 9 may be used.

In the above formula 9, R ₂₉ to R ₃₆ are the same or the different and are independently a hydrogen atom, a halogen atom, C _{1 ~ 16} alkyl group, C _{1 ~ 16} alkoxy group, C _{1 ~ 16} The fluorine-substitutions of one another and ohgakhwan having an alkoxy group, an aryl group of C _{2 ~ 20,} an aryloxy group of C _{2 ~ 20,} or a nitrogen atom one or more, all of which are good which may have a substituent such as a halogen, a cyano group or a nitro group,

M '' is composed of hydrogen atom, oxygen atom, halogen atom, or Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti Divalent metal atoms; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And an oxy metal atom consisting of VO, MnO and TiO.

As the cyanine-based color correction dye having the intermolecular metal complex complex, compounds represented by the following Chemical Formulas 10 and 11 may be used.

delete

In the above formula (10), an aryl group of R ₃₇ and R ₃₈ are the same or different, independently represent a hydrogen atom, C _{1 ~ 30} linear or branched alkyl group, C _{1 ~ 8} alkoxy group, or C _{6 ~ 30} of each other, and They may have a substituent such as a halogen, cyano group or nitro group,

X ₆ to X ₁₀ are each the same or different from each other and independently represent a hydrogen atom, a halogen group, a nitro group, a carboxyl group, a phenoxycarbonyl group, a carboxylate group, an alkyl group of C _{1 ~ 8,} an alkoxy group of C _{1 ~ 8,} or an aryl group of C _{6 ~ 30,} and they are good which may have a substituent such as a halogen, a cyano group or a nitro group,

M is preferably one selected from the group consisting of metal atoms of Ni, Cu, Pt and Pd.

In the above formula (11), an aryl group of R ₃₉ and R ₄₀ are the same or different and each independently represents a hydrogen atom, a straight-chain of C _{1 ~ 30,} or side-chain alkyl group with each other, C _{1 ~ 8} alkoxy group, or C _{6 ~ 30} of and, They may have a substituent such as a halogen, cyano group or nitro group,

 M is preferably one selected from the group consisting of metal atoms of Ni, Cu, Pt and Pd.

The amount of the color correction dye may be used in an amount of 0.005 to 10 parts by weight based on 100 parts by weight of the pressure-sensitive adhesive.

The adhesive force of the near-infrared absorption adhesive transparent layer according to the present invention is 2 N / 25 mm or more at a peel angle of 180 ° and a peel rate of 300 mm / min, preferably 4 N / 25 mm or more at a peel angle of 180 ° and a peel rate of 300 mm / min. . When the adhesive force is less than 2 N / 25 mm at a peel angle of 180 ° and a peel rate of 300 mm / min, the durability may be lowered, such as bubbles between layers or peeling, in durability.

In the electromagnetic wave shielding film of the present invention, the transparent substrate may be used without limitation as long as it is a material having excellent light transmittance. For example, it may be prepared using at least one selected from polyacrylic, polyurethane, polyester, polyepoxy, polyolefin, polycarbonate and cellulose, and glass, and is provided with transparent polyethylene terephthalate (PET). desirable.

In the electromagnetic shielding film, the conductive pattern portion of the electromagnetic shielding layer is preferably provided in a mesh form having a protrusion and a groove. The conductive pattern portion may be provided with any one of copper, silver, gold, iron, nickel and aluminum and alloys thereof, and is preferably selected from copper or silver.

In the electromagnetic wave shielding film of the structure which has a transparent base material and the conductive pattern part arrange | positioned on a transparent base material, a near-infrared absorption is absorbed in the upper part of an electromagnetic wave shielding layer so that the upper part of the electromagnetic shielding layer in which the conductive pattern part was formed may be flattened by filling the groove part of a conductive pattern part. An adhesive transparent layer may be formed on the electromagnetic shielding film by applying and transparentening an adhesive including a dye. As the transparent layer is formed, the groove part is filled with transparent resin and the space inside the groove part becomes transparent, so that light is scattered by air in the groove part, so that the image quality is not clear and looks somewhat crushed, so that it is possible to provide clear image quality. do. Transparent after the pressure-sensitive adhesive is applied can be carried out by applying an appropriate pressure. The size of the pressure may be selected by those skilled in the art according to the type of adhesive, the amount of use and other process conditions.

The method of manufacturing the near-infrared absorption adhesive transparent layer which concerns on this invention is not specifically limited. After preparing the coating liquid containing the near infrared absorbing dye according to the present invention, the coating liquid is applied and dried on at least one side of the flat substrate by various methods to form a near infrared absorbent pressure-sensitive adhesive layer. The exposed surface can also be covered by a peelable sheet. Or you may apply | coat and dry to the peelable surface of a peelable sheet, and can obtain a near-infrared absorption adhesive layer.

Specifically, the added dye and the binder may be mixed, a predetermined amount of crosslinking agent and a coupling agent may be added thereto, and then a coating solution may be prepared, and the coating solution may be coated and cured on a release film and a transparent substrate. It is preferable that the thickness of the coating surface thus obtained is more than 5 micrometers, Preferably it is 10 micrometers or more. As the coating method, various methods such as spray coating, roll coating, bar coating, spin coating, gravure coating, and blade coating can be used.

The near-infrared absorption adhesive transparent layer prepared as mentioned above can be manufactured on the electromagnetic wave shielding film which concerns on this invention by adhering on the electromagnetic shielding layer which has a conductive pattern part.

Hereinafter, the present invention will be described in detail with reference to the drawings. However, the following examples are provided by way of example and not limitation of the scope of the invention, it may be implemented in a variety of different structures.

For example, the general electromagnetic wave shielding film 30 includes an electromagnetic wave shielding layer in which the conductive pattern portion 32 is formed on the transparent substrate 31 as illustrated in FIG. 1. As illustrated in FIG. 2A, the electromagnetic shielding film having a transparent function is manufactured by filling the grooves of the conductive pattern part with the adhesive layer 20 in the electromagnetic shielding film 30 and applying it to the upper surface of the protrusion to impart a transparent function. can do.

In the present invention, in the transparent step, as shown in FIG. 2B, a pressure-sensitive adhesive 20 including a near infrared absorbing dye is applied over the entire upper surface of the electromagnetic wave shielding film to apply a near infrared absorbing dye to the upper surface of the protrusion of the conductive pattern portion 32. The pressure sensitive adhesive 20 may be applied. By doing in this way, the adhesive 20 containing a near-infrared absorbing dye fills the groove part of the electroconductive pattern part 32, and can form a transparent layer in the upper part of the electromagnetic wave shielding film 30. FIG.

In addition, in the transparent step, as shown in FIG. 2C, a pressure-sensitive adhesive 20 including near-infrared absorbing dye and color correction, in particular, a neon-cut dye, is applied over the entire upper surface of the electromagnetic shielding film, so that the protrusions of the conductive pattern portion 32 are formed. The adhesive 20 including the near-infrared absorbing dye and the color correction dye may be applied to the upper surface. In this way, the pressure-sensitive adhesive 20 including near-infrared absorbing dye and color correction, in particular neon-cut dye, fills the groove of the conductive pattern portion 32 to form a transparent layer on the electromagnetic shielding film 30.

As described above, when the pressure-sensitive transparent layer 20 is formed up to the top of the protrusion of the electromagnetic wave shielding layer 30, the electromagnetic wave shielding layer may be formed of only the conductive pattern part 32 by etching over the entire area without the frame part. It may be composed of a pattern portion 32 and a frame. In this case, a ground portion may be further provided on the transparent layer.

The ground portion may be provided by attaching a conductive tape to the upper peripheral region of the transparent layer, or may be provided by applying a conductive paste to the upper peripheral region of the transparent layer. The conductive tape may be provided in the form of a fabric coated with metals such as nickel, copper, aluminum, and gold, and the conductive paste may be prepared by dispersing silver or copper powder in a polymer binder and a solvent.

When the adhesive transparent layer 20 is formed to the upper portion of the protrusion of the conductive pattern portion 32 as described above, the adhesive transparent layer 20 may be formed of the conductive pattern portion (2) for smooth energization between the ground portion and the edge region of the electromagnetic wave shielding layer. It is preferable to have a thickness of 5 to 30 μm based on the protruding surface of 32). Here, the conductive particles may be added to the pressure-sensitive adhesive layer so that the energization can be made more smoothly. As the conductive particles, metal powders such as silver or copper, carbon black, carbon nanotubes (CNT), and the like may be used.

On the near-infrared absorption adhesive transparent layer 20 of the electromagnetic wave shielding film 30 manufactured through the above-described process, as shown in FIG. 3, a release film, a transparent film, or another layer 31 'may be provided. In addition, a layer or adhesive layer 20 'provided with another function may be added to the lower surface of the transparent substrate 31 of the electromagnetic wave shielding film 30, and in this case, the adhesive layer 20' on the lower surface of the transparent substrate 31 may be added. Release films and transparent films or films imparted with other functions.

The added adhesive layer 20 ′ may be an adhesive including color correction dyes, particularly neon-cut dyes, when the adhesive layer 20 is a near infrared absorbing adhesive film as shown in FIG. 3A, and an adhesive layer as shown in FIG. 3B. When (20) is an adhesive including near-infrared absorption and color correction, it may be a general adhesive.

In another aspect, the present invention provides an optical filter comprising the electromagnetic shielding film.

The optical filter of the present invention may further include another functional film on at least one surface of the electromagnetic wave shielding film 30 described above. The functional film may be an antireflection film 40 or a color correction film for reinforcing the color correction function of the electromagnetic shielding film, or may be a shock absorbing film or a contrast ratio improving film.

The functional film may be provided on the upper surface of the adhesive transparent layer 20 of the electromagnetic wave shielding film of the present invention, or may be provided on the lower surface of the adhesive layer 20 'provided on the lower surface of the transparent substrate.

An optical filter in accordance with one embodiment of the present invention is illustrated in FIG. 4A. The optical filter further laminates an anti-reflection film 40 on the upper surface of the electromagnetic wave shielding film having the near infrared absorption adhesive transparent layer having the transparent function, and further laminates an adhesive layer 20 'including a color correction dye on the lower surface. Can be prepared. In addition, as illustrated in FIG. 4B, the optical filter laminates the antireflection film 40 on the upper surface of the electromagnetic wave shielding film having the near infrared absorption and color correction adhesive transparent layer having the transparent function, and the adhesive layer 20 'on the lower surface thereof. It can be prepared by further lamination.

In addition, as illustrated in FIG. 4C, an electromagnetic wave shielding film having an electromagnetic wave shielding layer having a conductive pattern portion and a near-infrared absorption and color correction adhesive transparent layer having a transparent function may be formed on the bottom surface of the antireflection film 40. It may be.

The present invention also provides a PDP comprising the optical filter.

PDP according to an embodiment of the present invention is further laminated on the lower surface of the transparent substrate of the electromagnetic shielding film having a transparent function of the optical filter illustrated in Figure 4a or 4b as illustrated in Figures 5a and 5b. The PDP panel 10 may be attached to the lower surface of the pressure-sensitive adhesive layer 20 'to manufacture. In addition, as illustrated in FIG. 5C, the PDP panel 10 may be attached to the adhesive transparent layer 20 including the near-infrared absorbing dye laminated on the lower surface of the electromagnetic wave shielding filter having the transparent filter function illustrated in FIG. 4C. It can also manufacture.

Alternatively, a filter manufactured by attaching a filter according to an exemplary embodiment of the present invention to transparent glass may be mounted on a PDP panel.

As illustrated in FIGS. 6A and 6B, the pressure-sensitive adhesive layer 20 ′ is further laminated on the bottom surface of the transparent substrate 31 of the electromagnetic wave shielding film having the transparency function of the optical filter illustrated in FIG. 4A or 4B. It can manufacture by attaching the transparent glass 50. FIG. In addition, as illustrated in FIG. 6C, the transparent glass 50 may be attached to the adhesive transparent layer 20 including the near-infrared absorbing dye laminated on the bottom surface of the electromagnetic wave shielding filter having the transparent function of the optical filter illustrated in FIG. 4C. I can manufacture it

In addition, as illustrated in FIGS. 6D and 6E, the functional films may be separated and laminated on the upper or lower surface of the transparent glass 50 as necessary.

The present invention is illustrated by the following examples, but the scope of the present invention is not limited thereto.

The electromagnetic wave shielding film including the near infrared absorption adhesive transparent layer according to the present invention was prepared by the following method, and the physical property test conditions for the near infrared absorption adhesive transparent layer were as follows.

<Film manufacturing method>

1. Preparation of Coating Liquid: In Examples, using a butyl acrylate (BA) / hydroxy ethyl methacrylate (HEMA) copolymer or a butyl acrylate (BA) / acrylic acid (AA) copolymer as an adhesive resin, A coating solution for preparing a near infrared absorbing pressure-sensitive adhesive film was prepared by mixing a near infrared absorbing dye or a near infrared absorbing dye with color correction and neon-cut dye.

2. Coating: The coating solution was coated on a release substrate with a dry thickness of 25 μm, dried at 120 ° C. for 3 minutes, and then coated with a release substrate.

3. Aging: Aged at room temperature for 7 days.

<Durability test condition>

After applying the prepared adhesive film to the electromagnetic wave shielding film to perform a transparent process,

-High temperature condition: The transmittance of each wavelength band before and after standing at 80 ℃ for 500 hours was compared.

-High temperature and high humidity conditions: 65 ℃, 96% RH, the transmittance of each wavelength band before and after standing for 500 hours was compared.

Example 1

69 g of butyl acrylate (BA) / hydroxy ethyl methacrylate (HEMA) copolymer solution dissolved in ethyl acetate, 0.06 g of metal complex (V-63) (epolin), phthalocyanine 906B (Japan Catalyst) 0.14 g, an isocyanate-based crosslinking agent and 0.037 g of a silane coupling agent were added to 31 g of methyl ethyl ketone (MEK), followed by mixing to prepare a coating solution.

The coating solution was coated on a release substrate film with a thickness of 25 μm, and another surface was laminated with a release substrate to prepare a near-infrared absorbent adhesive film.

After applying the prepared film to the electromagnetic wave shielding film and performing the process of transparency, the transmittance was measured after 500 hours storage under high temperature (80 ℃) and high temperature and high humidity (65 ℃, relative humidity 96%) conditions, the results are shown in Figure 6 Shown in Evaluation results before and after the durability test of the electromagnetic wave shielding film including the near-infrared absorption adhesive transparent layer according to the present invention, the change in visible region transmittance was 0.6%, the change in near infrared transmittance was 850nm 1.6%, 950nm 1.3% after high temperature storage, high temperature and high humidity storage Afterwards, the change of visible transmittance was 0.6%, the change of near infrared transmittance was 850nm 0.5% and 950nm 1.1%.

Example 2

Butyl acrylate (BA) / Hydroxyethyl methacrylate (HEMA) copolymer solution dissolved in ethyl acetate 69 g Metal complex (Metal-complex) type V-63 (epolin) 0.06 g, phthalocyanine type 906B (Japan catalyst) ) 0.14 g, porphyrin-based PD-319 (Mitsui) 0.014 g, isocyanate-based crosslinking agent 0.037 g, and silane coupling agent 0.048 g were added to 31 g of methyl ethyl ketone (MEK) and mixed to prepare a coating solution.

The coating solution was coated on a release substrate film with a thickness of 25 μm, and another surface was laminated with a release substrate to prepare a near-infrared absorbent adhesive film.

After treating the film to the electromagnetic wave shielding film to perform a transparent process, the transmittance was measured after 500 hours storage under high temperature (80 ℃) and high temperature and high humidity (65 ℃, 96% relative humidity) conditions, the results are shown in Figure 7 Shown in As a result of evaluation before and after the durability test of the electromagnetic wave shielding film including the near infrared absorption and the color correction adhesive transparent layer according to the present invention, the visible region transmittance change was 0.5%, the near infrared transmittance change was 850nm 1.7%, 950nm 0.4% after high temperature storage. After high temperature and humidity storage, the change of visible transmittance was 0.5%, the change of near infrared transmittance was 850nm 0.9% and 950nm 0.4%.

Example 3

69 g of butyl acrylate (BA) / acrylic acid (AA) copolymer solution dissolved in ethyl acetate, 0.06 g of metal complex (Metal-complex) EP4445 (epolin), 0.14 g of phthalocyanine-based 910B (Japan catalyst), isocyanate crosslinking agent 0.137 g and 0.021 g of a silane coupling agent were added to 31 g of methyl ethyl ketone (MEK), followed by mixing to prepare a coating solution.

The coating solution was coated on a release substrate film with a thickness of 25 μm, and another surface was laminated with a release substrate to prepare a near-infrared absorbent adhesive film.

After applying the prepared film to the electromagnetic wave shielding film to perform a transparent process, the transmittance was measured after 500 hours storage under high temperature (80 ℃) and high temperature and high humidity (65 ℃, relative humidity 96%) conditions, the results are shown in Figure 8 Shown in As a result of evaluation before and after the durability test of the electromagnetic wave shielding film including the near infrared absorption adhesive transparent layer according to the present invention, the change in visible region transmittance was 0.5%, the change in near infrared transmittance was 850nm 0.8%, 950nm 0.1% after high temperature storage, and high temperature and high humidity storage. Afterwards, visible light transmittance was 1.3%, near infrared transmittance was 850nm 1.9% and 950nm 0.3%.

Example 4

69 g of butyl acrylate (BA) / acrylic acid (AA) copolymer solution dissolved in ethyl acetate, 0.06 g of metal complex (Metal-complex) EP4445 (epolin), 0.14 g of phthalocyanine-based 910B (Japan catalyst), porphyrin-based 0.015 g of PD319 (Mitsui), 0.137 g of isocyanate-based crosslinking agent and 0.021 g of silane coupling agent were added to 31 g of methyl ethyl ketone (MEK), followed by mixing to prepare a coating solution.

The coating solution was coated on a release substrate film with a thickness of 25 μm, and another surface was laminated with a release substrate to prepare a near-infrared absorbent adhesive film.

After applying the prepared film to the electromagnetic wave shielding film and performing the process of transparency, the transmittance was measured after 500 hours storage under high temperature (80 ℃) and high temperature and high humidity (65 ℃, 96% relative humidity) conditions, the results are shown in Figure 9 Shown in As a result of evaluation before and after the durability test of the electromagnetic wave shielding film including the near infrared absorption adhesive transparent layer according to the present invention, the change in visible region transmittance was 1.1%, the change in near infrared transmittance was 850 nm 1.0%, 950 nm 0.3% after high temperature storage, and high temperature and high humidity storage. Afterwards, the change of visible transmittance was 1.6%, the change of near infrared transmittance was 850nm 1.6% and 950nm 0.6%.

As described above, according to the present invention, by providing a pressure-sensitive adhesive containing a near-infrared absorbing dye over at least a portion of the upper surface of the electromagnetic wave shielding film formed with the conductive pattern portion, it is possible to perform a transparent process simply, The need for a layer with near-infrared absorption is not only possible to manufacture thin optical filters, but also to simplify the process by dramatically simplifying the structure, thereby improving productivity and contributing to cost reduction.

Claims (33)

A transparent substrate, an electromagnetic wave shielding layer including a conductive pattern portion formed on at least a portion of the transparent substrate, and a pressure-sensitive transparent layer including a near-infrared absorbing dye, which is formed to fill the groove portion of the conductive pattern portion, and is sequentially stacked, The adhesive transparent layer further comprises at least one of a crosslinking agent and a coupling agent electromagnetic shielding film. The electromagnetic wave shielding film of claim 1, wherein the conductive pattern portion has a mesh shape. The electromagnetic shielding film of claim 1, wherein the conductive pattern portion is made of copper, silver, gold, iron, nickel, aluminum, or an alloy thereof. The electromagnetic wave shielding film of Claim 1 which uses a pressure-sensitive adhesive as a component which gives adhesiveness to the adhesive transparent layer containing the said near-infrared absorbing dye. The method of claim 4, wherein the pressure-sensitive adhesive is acrylic, urethane, polyisobutylene, SBR (styrene-butadiene rubber), rubber, polyvinyl ether, epoxy, melamine, polyester, phenol, silicone and these Electromagnetic shielding film is selected from the group consisting of a copolymer of. The electromagnetic wave shielding film of Claim 5 whose glass transition temperature (Tg) of the said acrylic adhesive is 0 degrees C or less. The acrylic pressure-sensitive adhesive of claim 5, wherein the acrylic pressure-sensitive adhesive is 75 to 99.89% by weight of a methacrylic ester or acrylic acid ester monomer having an alkyl group having 1 to 12 carbon atoms, 0.1 to 20% by weight of the α, β unsaturated carboxylic acid monomer which is a functional monomer and a hydroxyl group. Electromagnetic shielding film is prepared by copolymerizing 0.01 to 5% by weight of a polymerizable monomer having. delete The electromagnetic wave shielding film of claim 1, wherein the pressure-sensitive adhesive layer further comprises at least one of an antioxidant, a flame retardant, a ultraviolet absorber, and an antistatic agent. The method of claim 1, wherein the near-infrared absorbing dye is at least one dye selected from the group consisting of metal complex dyes, phthalocyanine dyes, naphthalocyanine dyes, cyanine dyes having an intermolecular metal complex complex, and dimonium dyes. The electromagnetic wave shielding film. The method of claim 10, wherein the metal complex dye is an electromagnetic shielding film represented by the following formula (1) or formula (2); [Formula 1]

In Formula 1, R ₁ to R ₄ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, import a hydroxy group, an alkyl group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of the, arylthio C _{6 ~ 20,} CF _3, nitro, cyano, Or halogen atoms, which may have a halogen, cyano group or nitro group, Y ₁ to Y ₄ are each independently S or O, M is 1 type selected from the group which consists of metal atoms of Ni, Cu, Pt, and Pd. [Formula 2]

In Formula 2, R ₅ and R ₆ are, each independently, an alkoxy group of a hydrogen atom, C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} In the same or different and each the aryloxy group, import a hydroxy group, an alkyl group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of the, arylthio C _{6 ~ 20,} CF _3, nitro, cyano, Or halogen atoms, which may have a halogen, cyano group or nitro group, Y ₁ to Y ₄ are each independently S or O, M is 1 type selected from the group which consists of metal atoms of Ni, Cu, Pt, and Pd. The method according to claim 10, The phthalocyanine-based dye is an electromagnetic shielding film represented by the following formula (3); (3)

In Formula 3, R ₇ to R ₁₀ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, come hydroxy group, C _{1 ~ 16} alkyl group, a methyl group with an aryl group, trifluoroacetic C _{6 ~ 20,} an alkylthio group of C _{1 ~ 16,} aryl T of C _{6 ~ 20,} a nitro group, a cyano No group, or halogen atom, which may have a halogen, cyano group or nitro group, M 'is a divalent metal atom consisting of Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And oxy metal atoms consisting of VO, MnO and TiO. The method of claim 10, wherein the naphthalocyanine-based dye is an electromagnetic shielding film represented by the following formula (4); [Formula 4]

In Formula 4, R ₁₁ to R ₁₄ are the same or the different and are independently of one another, a hydrogen atom, an alkoxy group of C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} the aryloxy group, come hydroxy group, C _{1 ~ 16} alkyl group, a methyl group with an aryl group, trifluoroacetic C _{6 ~ 20,} an alkylthio group of C _{1 ~ 16,} aryl T of C _{6 ~ 20,} a nitro group, a cyano No group, or halogen atom, which may have a halogen, cyano group or nitro group, M 'is a divalent metal atom consisting of Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And oxy metal atoms consisting of VO, MnO and TiO. The method according to claim 10, wherein the cyanine-based dye is an electromagnetic shielding film represented by the formula 5 to 7; [Chemical Formula 5]

In Formula 5, R ₁₅ and R ₁₆ are the same as or different from each other, and independently a hydrogen atom, a C _1-30 straight or branched alkyl group, C _1-8 alkoxy group, or C _6-30 aryl group, They may have halogen, cyano or nitro groups, X ₁ to X ₅ are the same as or different from each other, and independently a halogen group, a nitro group, a carboxyl group, a phenoxycarbonyl group, a carboxylate group, a C _1-8 alkyl group, a C _1-8 alkoxy group or C _6-30 Aryl groups of which may have a halogen, cyano group or nitro group, M is 1 type selected from the group which consists of metal atoms of Ni, Cu, Pt, and Pd. [Formula 6]

In Chemical Formula 6, R ₁₅ to R ₁₆ , X ₁ to X ₅ and M are as defined in Chemical Formula 5. [Formula 7]

In Formula 7, R ₁₅ to R ₁₆ , X ₁ to X ₅ and M are as defined in Formula 5. The method of claim 10, wherein the dimonium-based dye is an electromagnetic shielding film represented by the following formula (8); [Formula 8]

In the formula 8, R ₁₇ to R ₂₄ are, each independently, an alkoxy group of a hydrogen atom, C _{1 ~ 16} alkyl group, C _{6 ~ 20} aryl group, C _{1 ~ 16} of, C _{6 ~ 20} In the same or different and each the aryloxy group, come hydroxy group, C _{1 ~ 16} alkyl group, a methyl group with an aryl group, trifluoroacetic C _{6 ~ 20,} an alkylthio group of C _{1 ~ 16,} aryl T of C _{6 ~ 20,} a nitro group, a cyano Or a halogen group, R ₂₅ to R ₂₈ are each independently a hydrogen atom, a halogen atom, a cyano group, a nitro group, a carboxyl group, an alkyl group or an alkoxy group, which may have a halogen, cyano group or nitro group, Z is an organic acid monovalent anion, an organic acid divalent anion, or an inorganic acid monovalent anion. The electromagnetic wave shielding film of claim 1, wherein the adhesive clearing layer further comprises a color correction dye. The electromagnetic shielding film of claim 16, wherein the color correction dye is a neon-cut dye. The electromagnetic wave shielding film according to claim 16, wherein the color correction dye is at least one dye selected from the group consisting of porphyrin-based dyes having an intermolecular metal-complex form and cyanine-based dyes having an intermolecular metal-complex form. The method according to claim 18, wherein the porphyrin-based dye having an intermolecular metal complex complex is represented by the following formula (9) electromagnetic wave shielding film; [Formula 9]

In Formula 9, R ₂₉ to R ₃₆ are the same as or different from each other, and independently, a hydrogen atom, a halogen atom, a C _1-16 alkyl group, a C _1-16 alkoxy group, or a fluorine-substituted C _1-16 An alkoxy group, a C _2-20 aryl group, a C _2-20 aryloxy group, or a pentagonal ring having one or more nitrogen atoms, which may have a halogen, cyano group, or nitro group, M '' is composed of hydrogen atom, oxygen atom, halogen atom, or Cu, Zn, Fe, Co, Ni, ruthenium (Ru), rubidium (Rb), palladium (Pd), Pt, Mn, Sn, Mg and Ti Divalent metal atoms; Trivalent monosubstituted metal atoms consisting of Al-Cl, Ga-Cl, In-Cl, Fe-Cl, and Ru-Cl; Tetravalent disubstituted metal atoms consisting of SiCl ₂ , GaCl ₂ , TiCl ₂ , SnCl ₂ , Si (OH) ₂ , Ge (OH) ₂ , Mn (OH) ₂ and Sn (OH) ₂ ; And an oxy metal atom consisting of VO, MnO and TiO. The method according to claim 18, wherein the cyanine-based dye having an intermolecular metal complex complex is represented by the following formula 10 and 11 electromagnetic wave shielding film; [Formula 10]

In Formula 10, R ₃₇ and R ₃₈ are the same as or different from each other, and independently a hydrogen atom, a C _1-30 linear or branched alkyl group, C _1-8 alkoxy group, or C _6-30 aryl group, They may have halogen, cyano or nitro groups, X ₆ to X ₁₀ are the same as or different from each other independently and represent a hydrogen atom, a halogen group, a nitro group, a carboxyl group, a phenoxycarbonyl group, a carboxylate group, a C _1-8 alkyl group, a C _1-8 alkoxy group or C Aryl groups of _{6 to 30} , which may have a halogen, cyano group or nitro group, M is 1 type selected from the group which consists of metal atoms of Ni, Cu, Pt, and Pd. [Formula 11]

In Formula 11, R ₃₉ and R ₄₀ are the same as or different from each other, and are each independently a hydrogen atom, a C _1-30 straight or branched alkyl group, a C _1-8 alkoxy group, or a C _6-30 aryl group, They may have halogen, cyano or nitro groups,  M is 1 type selected from the group which consists of metal atoms of Ni, Cu, Pt, and Pd. The electromagnetic wave shielding film of claim 1, wherein when the pressure-sensitive adhesive layer is formed to an upper portion of the protrusion of the conductive pattern portion, the thickness of the pressure-sensitive adhesive layer is 5 to 30 μm based on the protrusion surface of the conductive pattern portion. The electromagnetic wave shielding film of claim 1, wherein the adhesive force of the adhesive transparent layer of the electromagnetic shielding layer is 2 N / 25 mm or more at a peel angle of 180 ° and a peel rate of 300 mm / min. The electromagnetic wave shielding film of Claim 1 provided with a release film or a transparent base material on the adhesive transparent layer of the said electromagnetic wave shielding layer. The electromagnetic wave shielding film of Claim 1 which further comprises an adhesion layer on the lower surface of the transparent base material of the said electromagnetic wave shielding film. The electromagnetic wave shielding film of Claim 24 provided with a release film in the lower surface of the adhesion layer of the lower surface of the transparent base material of the said electromagnetic wave shielding film. An optical filter comprising the electromagnetic shielding film according to any one of claims 1 to 7 and 9 to 25. The optical filter according to claim 26, further comprising a functional film on an upper surface, a lower surface, or an upper surface and a lower surface of the electromagnetic wave shielding film. The optical filter of claim 27, wherein the functional film comprises at least one of an antireflection film, a color correction film, a shock absorbing film, and a contrast ratio improving film. The optical filter according to claim 28, wherein the antireflection film, the color correction film, the shock absorbing film, or the contrast ratio enhancing film is provided by laminating on the pressure-sensitive transparent layer of the electromagnetic wave shielding film. The optical filter according to claim 28, wherein the antireflection film, color correction film, shock absorbing film, or contrast ratio enhancing film is provided on the bottom surface of the transparent substrate of the electromagnetic wave shielding film. Plasma display panel comprising an electromagnetic shielding film according to any one of claims 1 to 7 and 9 to 25. 32. The plasma display panel of claim 31, wherein the electromagnetic shielding film is directly attached to the plasma display panel. The plasma display panel of claim 31, wherein the electromagnetic shielding film is attached to the plasma display panel through a glass substrate.

Images