JP2008292745A - Front glass filter for plasma display and method for manufacturing the filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a front glass filter for a plasma display, the glass filter in a state of a finished front plate easily grounded and easily distributed in this state. <P>SOLUTION: The front glass filter to be disposed at the front of a plasma display panel is characterized in that: an electromagnetic wave shielding sheet comprising a transparent resin substrate and a conductive layer having a see-through conductive layer in at least a center portion on one surface of the substrate is layered on one surface of a glass plate via a pressure-sensitive adhesive layer, with the conductive layer of the sheet facing the glass substrate; a grounding region that is not coated with the pressure-sensitive adhesive layer is provided in at least part of the rim of the conductive layer; a conductive member in contact with the conductive layer is present between the glass plate and the conductive layer in the grounding region; and a conductive passage is formed of the conductive member, the passage routing from a face close to a viewer to a face close to the plasma display panel of the glass plate. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an electromagnetic wave shielding sheet that shields (shields) electromagnetic waves generated from a display such as a plasma display panel (PDP), and a front glass filter for a plasma display panel including the electromagnetic wave shielding sheet.

  In recent years, with the advancement of functions and increase in the use of electrical and electronic equipment, electromagnetic noise interference (EMI) has increased, and electromagnetic waves are also generated in displays such as cathode ray tubes (referred to as CRT) and plasma display panels (referred to as PDP). appear. In particular, the plasma display panel is a combination of a data electrode, a glass having a fluorescent layer, and a glass having a transparent electrode, and generates a large amount of electromagnetic waves and near infrared rays when operated.

Usually, in order to shield electromagnetic waves, a laminate of an electromagnetic wave shielding sheet and a glass plate is provided as a front plate on the front surface of the plasma display panel. The shielding property of the electromagnetic wave generated from the front of the display is a standard applied to information processing devices used in home environments and residential environments specified by VCCI (Electromagnetic Interference Regulations for Information Processing Devices, etc.) at 30 MHz to 1 GHz in Japan ( It is necessary to achieve class B). Furthermore, in order to make it easy to see the display image on the display, the metal mesh (line part) for shielding electromagnetic waves is difficult to see, the mesh pattern accuracy is good, the mesh is not disturbed, and it has moderate transparency (visible light transmission) ).
In addition, near infrared rays having a wavelength of 800 to 1,100 nm generated from the front surface of the plasma display also cause other remote control devices such as VTRs to malfunction, and thus need to be shielded. Furthermore, there is a need for a function that blocks light (neon light) near a wavelength of 590 nm emitted from a plasma display, adjusts the hue of an image to improve color reproducibility, and further suppresses unnecessary reflection of external light. .
In the present specification, among electromagnetic waves in a broad sense, in particular, an electromagnetic wave having a frequency lower than the infrared band is referred to as an “electromagnetic wave”, and is used separately from infrared rays, visible rays, and ultraviolet rays.

  In Patent Document 1, an electromagnetic wave shielding sheet and a plurality of optical filters such as a near-infrared absorption filter and an antireflection filter are laminated to shield unnecessary electromagnetic waves generated from the image display device and light of a specific wavelength, A composite filter is disclosed that uses a plate-shaped composite filter that can provide various functions required for an image display device as a front plate of a plasma display panel. Such a composite filter usually has many filters having transparent resin base materials on both front and back surfaces of a glass substrate (a glass substrate for a front protective plate of the plasma display panel itself or a glass substrate for a filter provided separately from this). Since it is manufactured by bonding (see FIGS. 5, 7, and 8 of Patent Document 1), the number of laminations and the number of lamination processes are large, and the cutting process is also performed for the filter cutting process for the glass substrate surface and for the glass substrate back surface. Two processes, a filter cutting process, were required, and there was a problem in production efficiency.

  Moreover, in the composite filter as described above, it is necessary to ground (earth) the metal mesh of the electromagnetic wave shielding sheet in order to improve the electromagnetic wave shielding property. For this purpose, the conductive mesh layer generally has a frame-shaped grounding conductive layer which is provided so as to surround the peripheral portion thereof and does not form an opening, and is generally grounded from the frame-shaped conductive layer. It is.

  Patent Document 2 discloses an electromagnetic wave shielding light-transmitting laminated film in which an electromagnetic wave shielding material, an outermost antireflection film, and a near infrared cut film are laminated and integrated, and an adhesive material layer is provided as the outermost layer. The edge of the electromagnetic shielding material protrudes from the edge of the antireflection film and is folded back along the edge of the antireflection film to the surface side of the antireflection film, and the folded portion of the electromagnetic shielding material is An electromagnetic wave shielding light-transmitting laminated film is disclosed which is secured to the surface of the antireflection film with a conductive adhesive tape. However, it is difficult to position each layer by laminating and bonding them, and it is difficult to accurately fold back the protruding portion of the conductive mesh, and the mesh may be broken.

JP 2002-311843 A JP 2001-315240 A

In view of the above circumstances, the present invention provides, as a first object, a front glass filter for a plasma display in which a conductive layer can be easily grounded in the state of a completed front plate and can be easily distributed in this state. There is to do. A second object is to provide a front glass filter for a plasma display that is excellent in production efficiency and material cost can be reduced by reducing the number of steps of bonding to a glass plate.

As a result of intensive studies, the present inventors have provided a conductive member between the glass plate and the conductive layer, the conductive member is in contact with the conductive layer, and a plasma display is provided from the viewer side of the glass plate. By forming a conduction path that wraps around the panel-side surface, the inventors have found that the conductive layer can be easily grounded from the plasma display panel-side surface of the glass plate via the conduction path. It came to complete.
That is, the present invention is a front glass filter installed on the front surface of the plasma display panel,
In the front glass filter, the conductive layer of the electromagnetic wave shielding sheet provided with a conductive layer having a transparent conductive layer at least in the central part on one side of the transparent resin base material on one side of the glass plate is made of glass. Laminating facing the plate, providing a grounding region not covered with an adhesive layer on at least a part of the peripheral edge of the conductive layer, in the grounding region, between the glass plate and the conductive layer, A conductive member in contact with the conductive layer is interposed, and the conductive member forms a conduction path that extends from the viewer side surface of the glass plate to the plasma display panel side surface. .

  According to the present invention, a conductive member in contact with the conductive layer is interposed between the glass plate and the conductive layer, and the conductive member extends from the viewer side surface of the glass plate to the plasma display panel side surface. By forming a conduction path that surrounds the conductive layer, the conductive layer can be easily grounded from the surface of the glass plate on the plasma display panel side through the conduction path.

  In the front glass filter for plasma display according to the present invention, the conductive member is preferably a metal foil, a metal plate, a metal mesh, a conductive sheet, or a conductive woven fabric.

  In the front glass filter for a plasma display according to the present invention, the conductive member is preferably bonded to the glass plate via an adhesive layer.

  In the front glass filter for plasma display according to the present invention, the pressure-sensitive adhesive layer has a general formula MxWyOz (where M element is H, He, alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P , S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, I, one or more elements, W is tungsten, O is oxygen, The composite tungsten oxide fine particles represented by 0.001 ≦ x / y ≦ 1.1, 2.2 ≦ z / y ≦ 3.0) are preferably contained.

  In the front glass filter for plasma display according to the present invention, it is preferable that the average dispersed particle size of the composite tungsten oxide fine particles is 800 nm or less from the viewpoint of high transmittance in the visible region and low haze.

  In the front glass filter for a plasma display according to the present invention, the composite tungsten oxide fine particles include one or more crystal structures of hexagonal, tetragonal, and cubic crystals to improve durability of optical characteristics. To preferred.

  In the front glass filter for plasma display according to the present invention, the M element of the composite tungsten oxide fine particles is a Cs (cesium) element, and the composite tungsten oxide fine particles have a hexagonal crystal structure. It is preferable from the viewpoint of improving the durability.

  In the front glass filter for a plasma display according to the present invention, the surface of the composite tungsten oxide fine particles is coated with an oxide containing one or more elements selected from Si, Ti, Zr, and Al. From the viewpoint of improving the durability of the optical characteristics.

  In the front glass filter for plasma display according to the present invention, the pressure-sensitive adhesive layer preferably contains a neon light absorber and / or a color correction dye.

  In the front glass filter for plasma display according to the present invention, the transparent conductive layer is a conductive mesh layer, and a blackened layer is formed on the surface of the conductive mesh layer on the transparent resin substrate side. The blackening layer is a blackening layer (Ni-Cu-O blackening layer) made of an alloy containing nickel, copper and oxygen, which has excellent adhesion and sufficient blackness to absorb external light. It is preferable from the point of having.

  The front glass filter for a plasma display according to the present invention has at least one kind selected from the group consisting of an antireflection function, an antiglare function, and an abrasion resistance function on the surface of the electromagnetic shielding sheet on the transparent resin substrate side. It is preferable that functional layers having functions are laminated.

A method for producing a front glass filter for a plasma display according to the present invention is a method for producing a front glass filter installed on the front surface of a plasma display panel,
(I) a step of disposing a conductive member on at least one side edge of one surface of the glass plate;
(Ii) a step of preparing an electromagnetic wave shielding sheet in which a conductive layer having a transparent conductive layer at least in the center is provided on one surface of the transparent resin substrate; and (iii) the conductive layer side of the electromagnetic wave shielding sheet. On the surface of the conductive layer, the adhesive layer is formed by exposing the peripheral portion of the conductive layer facing the conductive member, and the conductive layer and one surface of the glass plate are connected to the adhesive layer. The step of bonding through,
It is characterized by having.

According to the method for manufacturing a front glass filter for a plasma display according to the present invention, a conductive member that is in contact with the conductive layer of the grounding region is interposed between the glass plate and the grounding region of the periphery of the conductive layer, Since the conductive member forms a conduction path that wraps around from the viewer-side surface of the glass plate to the plasma display panel-side surface, the glass plate passes through the conduction path from the plasma display panel-side surface of the glass plate. It is possible to obtain a front glass filter for plasma display that can easily ground the conductive layer in the grounding region.
Moreover, in the manufacturing method of the front glass filter for plasma displays which concerns on the said invention, it is designed so that an adhesive layer and an electromagnetic wave shielding sheet may be laminated | stacked only on one side of a glass plate. Thereby, according to the manufacturing method of the front glass filter for plasma display according to the present invention, it is possible to reduce the number of bonding steps to the glass plate, so that the production efficiency is excellent, and the material cost can be reduced, and A front glass filter for plasma display having excellent electromagnetic shielding properties can be obtained.

  In the front glass filter for plasma display of the present invention, a conductive member in contact with the conductive layer is interposed between the glass plate and the grounding region at the periphery of the conductive layer, and the conductive member is formed of the glass plate. By forming a conduction path that extends from the viewer side surface to the plasma display panel side surface, the conductive layer can be easily grounded from the plasma display panel side surface of the glass plate through the conduction path, and The distribution in this state can be easily performed. During the grounding operation, there is no need for a step of opening a gap between the electromagnetic wave shielding sheet and the glass plate to expose the conductive layer and grounding, and it is difficult to cause breakage of the conductive layer.

According to the method for manufacturing a front glass filter for a plasma display of the present invention, a conductive member in contact with the conductive layer is interposed between the glass plate and the grounding region at the periphery of the conductive layer, and the conductive member is Since the conductive path is formed so as to wrap around from the viewer side surface of the glass plate to the plasma display panel side surface, the conductive layer can be easily formed from the plasma display panel side surface of the glass plate through the conductive path. A front glass filter for a plasma display that can be grounded can be obtained. During the grounding operation, there is no need for a step of opening a gap between the electromagnetic wave shielding sheet and the glass plate to expose the conductive layer and grounding, and it is difficult to cause breakage of the conductive layer.
Also, by laminating the pressure-sensitive adhesive layer and the electromagnetic wave shielding sheet only on one surface of the glass plate, the number of bonding steps to the glass plate can be reduced, so that the production efficiency is excellent and the material cost is also reduced. It is possible to obtain a front glass filter for a plasma display having excellent electromagnetic shielding properties.

  The present invention includes a front glass filter for a plasma display and a method for manufacturing the same. Each will be described in detail below. In the present invention, the “surface on the plasma display panel side” refers to a surface on the side facing the plasma display panel when the front glass filter for display is disposed on the front surface of the plasma display panel. The “viewer side surface” refers to a surface opposite to the “plasma display panel side surface”.

I. Front glass filter for plasma display The front glass filter for plasma display of the present invention is a front glass filter installed in front of a plasma display panel (hereinafter also referred to as PDP),
In the front glass filter, the conductive layer of the electromagnetic wave shielding sheet provided with a conductive layer having a transparent conductive layer at least in the central part on one side of the transparent resin base material on one side of the glass plate is made of glass. Laminating facing the plate, providing a grounding region not covered with an adhesive layer on at least a part of the peripheral edge of the conductive layer, in the grounding region, between the glass plate and the conductive layer, A conductive member in contact with the conductive layer is interposed, and the conductive member forms a conduction path that extends from the viewer-side surface of the glass plate to the PDP-side surface.

  In the front glass filter for plasma display of the present invention, a conductive member in contact with the conductive layer is interposed between the glass plate and the grounding region at the periphery of the conductive layer, and the conductive member is formed of the glass plate. By forming a conduction path that extends from the viewer-side surface to the PDP-side surface, the conductive layer can be easily grounded from the PDP-side surface of the glass plate through the conduction path.

The layer structure of the front glass filter for a plasma display according to the present invention and the grounding method of the conductive layer will be described with reference to the drawings.
FIG. 1 conceptually shows a cross-sectional view of an example of a front glass filter for a plasma display according to the present invention. In the cross-sectional view of FIG. 1, for ease of explanation, the scale in the thickness direction (vertical direction in the figure) is greatly enlarged and exaggerated from the scale in the plane direction (horizontal direction in the figure), and the front surface The scale in the thickness direction of the glass filter is shown greatly enlarged than the scale in the thickness direction of the PDP. In the front glass filter 1 for plasma display of the present invention, an antireflection layer 30 is laminated on the viewer-side surface of the electromagnetic wave shielding sheet 10 on the transparent resin substrate 11 side, and the other surface (PDP side) of the electromagnetic wave shielding sheet 10. The conductive layer 14 is laminated on the surface. The region facing the PDP image display region at the center of the conductive layer 14 is a conductive mesh layer that is a form of the transparent conductive layer, and the peripheral region of the conductive mesh layer is not formed with a mesh. (This region corresponds to the grounding region). The pressure-sensitive adhesive layer 20 is formed on the surface of the conductive mesh layer 14 so as to flatten the unevenness of the conductive mesh layer 14, and the other surface (the surface on the PDP side) of the pressure-sensitive adhesive layer 20 is formed. A glass plate 40 is pasted. The conductive mesh layer 14 in the electromagnetic wave shielding sheet 10 has a blackened layer 13 formed on the surface on the transparent resin base material 11 side, and the conductive layer 14 is a part of the grounding region at the peripheral portion. 15 is exposed. Further, a conductive member 16 is disposed on one side edge of the glass plate 40, and as shown in FIG. 1, the conductive member 16 comes into contact with the grounding region 15 at the periphery of the conductive layer 14, A conduction path is formed from the viewer side surface of the glass plate 40 along the PDP side surface. A gasket 17 is provided on the PDP side surface of the conductive member 16. Thereby, it is possible to easily ground the gasket 17 to the PDP main body. Note that the PDP main body can be grounded directly from the surface of the conductive member 16 on the PDP side.
Here, the gasket in the present invention refers to an earth base material in which the outside of a sponge-like or rubber-like core is covered with a conductive material such as a metal mesh. In the present invention, the conductive member 16 can be fixed by arranging the gasket as shown in FIG.
Further, in order to improve the contact between the conductive member 16 and the grounding region 15 at the periphery of the conductive layer 14, only a portion corresponding to the grounding region 15 on the surface of the antireflection layer 30 is provided with a sponge or a rubber sheet. It is desirable to install.

  Hereinafter, a front glass plate, a conductive member, an electromagnetic wave shielding sheet, a pressure-sensitive adhesive layer, and a functional layer will be sequentially described with respect to the front glass filter for plasma display used in the present invention.

1. Front glass plate The front glass plate of the present invention is a smooth glass plate placed as a front plate of a PDP. The front glass plate may be blue plate glass that is usually used for window glass or the like.

2. Conductive Member The conductive member of the present invention is a member for forming a conduction path from the conductive layer to the PDP side surface of the glass plate in the grounding region of the electromagnetic wave shielding sheet. In the present invention, the conductive member is a separate member independent of the conductive layer.
The conductive member is not particularly limited as long as it is a substance having conductivity, but a metal is preferable in terms of good conductivity. Examples of the conductive material include metals such as gold, silver, copper, aluminum, iron, nickel, and chromium, or alloys of these metals (for example, nickel-chromium alloy).
Moreover, since the electroconductive member which concerns on this invention is arrange | positioned between an electroconductive layer and a glass plate, from the point of the ease of the arrangement | positioning, metal foil, a metal plate, a metal mesh, an electroconductive sheet, or an electroconductive woven fabric In particular, a conductive sheet is preferable. Here, depending on the thickness of the metal layer, a thickness of less than 100 μm is referred to as a foil (or film), a thickness of 100 μm or more and less than 1000 μm is referred to as a sheet, and a thickness of 1000 μm or more is referred to as a plate.
Moreover, although not shown in FIG. 1, in order to fix an electroconductive member to a glass plate, it is preferable to form an adhesive bond layer (or adhesive layer) between the electroconductive member and the glass plate. The adhesive layer is not particularly limited as long as it is a layer capable of bonding the conductive member and the glass plate. Specific examples include acrylic resins, polyester resins, polyurethane resins, epoxy resins, polyurethane ester resins, and the like. In addition, for example, a commercially available double-sided adhesive tape (eg, CS-9611: trade name, manufactured by Nitto Denko Corporation) or a commercially available aluminum tape (eg, No. 8060: trade name, manufactured by Slion Tech Co., Ltd.), etc. It can also be used.
The conductive member may be a metal layer formed by depositing metal at a desired position on the glass plate. Although the formation method of the said metal layer is not specifically limited, It can form suitably by vapor phase film-forming, such as a sputtering method and a vacuum evaporation method.
In addition, the arrangement | positioning method to the glass plate of an electroconductive member is demonstrated by "II. Manufacturing method of the front glass filter for plasma displays."

3. Electromagnetic wave shielding sheet The electromagnetic wave shielding sheet according to the present invention comprises a conductive layer on one side of a transparent resin substrate. The conductive layer includes a transparent conductive layer facing the image display area of the central PDP, and a grounding area (which can be transparent or non-transparent) located at the peripheral edge thereof.
Here, the transparent conductive layer has visible light transmittance through which the display image of the plasma display panel can be viewed through the transparent conductive layer, and has conductivity that can shield electromagnetic waves generated from the plasma display panel. It means a layer. As the transparent conductive layer, a conductive mesh layer formed in a fine mesh pattern using an opaque conductive material such as a metal material such as copper described later is usually used. It is also possible to use a thin film formed using a material in a non-pattern shape (covering the entire surface without an opening, solid). When a conductive mesh layer is used, it is preferable to blacken the surface of the conductive mesh layer on the viewer side in order to suppress external light reflection. In the following description, an example in which a conductive mesh layer is used as the transparent conductive layer will be described.

(Conductive mesh layer)
The conductive mesh layer 14 is a layer that can have an electromagnetic wave shielding function by having conductivity, and is itself made of an opaque material, but by processing into a mesh-like shape having a large number of openings, It is a layer that achieves both electromagnetic shielding performance and light transmittance.
The conductive mesh layer 14 is typically formed by etching a metal foil. However, other conductive mesh layers 14 have significance in electromagnetic shielding performance. Therefore, in this invention, the material and formation method of a conductive mesh layer are not specifically limited, The various conductive mesh layers in a conventionally well-known light-transmitting electromagnetic wave shielding sheet can be employ | adopted suitably. For example, a conductive mesh layer formed in a mesh shape from the beginning on a transparent resin substrate using a printing method, a plating method, or the like, or initially, vapor deposition, sputtering on the entire surface of the transparent resin substrate After forming a non-patterned transparent conductive layer using one or more chemical forming methods such as plating or physical or electroless plating, the conductive mesh layer is formed into a mesh shape by etching or the like It does not matter even if it is.

  The conductive mesh layer is not particularly limited as long as it is a substance having sufficient conductivity to exhibit electromagnetic wave shielding performance, but usually a metal layer is preferable in terms of good conductivity, and the metal layer is as described above. It can be formed by vapor deposition, plating, metal foil lamination or the like. Examples of the metal material for the metal layer include gold, silver, copper, aluminum, iron, nickel, and chromium. The metal of the metal layer may be an alloy, and the metal layer may be a single layer or a multilayer. For example, in the case of iron, low carbon steel such as low carbon rimmed steel and low carbon aluminum killed steel, Ni-Fe alloy, Invar alloy, and the like are preferable. On the other hand, when the metal is copper, the metal material is copper or a copper alloy. There are rolled copper foil and electrolytic copper foil as the copper foil, but the thinness and uniformity thereof, the adhesion with the blackened layer, etc. Is preferably an electrolytic copper foil.

  In addition, the thickness of the electroconductive mesh layer by a metal layer is about 1-50 micrometers, Preferably it is 2-15 micrometers. If the thickness is too thin, it will be difficult to obtain sufficient electromagnetic shielding performance due to an increase in electrical resistance, and if the thickness is too thick, it will be difficult to obtain a high-definition mesh shape and the uniformity of the mesh shape will be reduced. . It is easy to flatten the conductive mesh layer, and there is less air bubbles when flattened, and the thickness of the conductive mesh layer is 2 to 10 μm because it is easy to obtain a transparent front glass filter. It is preferable that it is a grade.

[Mesh shape]
In addition, the shape of the conductive mesh layer as a mesh shape is not particularly limited, but a square shape is typical as the shape of the opening of the mesh. The plan view shape of the opening is, for example, a triangle such as a regular triangle, a square such as a square, a rectangle, a rhombus, or a trapezoid, a polygon such as a hexagon, a circle, an ellipse, or the like. The mesh has a plurality of openings having these shapes, and the openings are usually line-shaped line portions having a uniform width. Usually, the openings and the line portions have the same shape and the same size on the entire surface. As an example of a specific size, the width of the line portion between the openings is preferably 5 to 30 μm in terms of the aperture ratio and the invisibility of the mesh. The size of the opening is [line interval or line pitch] − [line width]. In terms of this [line interval or line pitch], the opening size is 100 μm to 500 μm, and the opening ratio (the total area of the openings / mesh portion) The total area) is preferably 50 to 97% from the viewpoint of compatibility between light transmittance and electromagnetic wave shielding properties. The line pitch may be random between 100 μm and 500 μm.
Note that the bias angle (the angle formed between the mesh line portion and the outer periphery of the electromagnetic wave shielding sheet) may be appropriately set to an angle at which moiré is not likely to occur in consideration of the pixel pitch of the PDP and the light emission characteristics.

[Grounding area and mesh area]
In addition, the conductive mesh layer 14 has a grounding region other than the central mesh region 141 in the planar direction, like the conductive mesh layer 14 conceptually illustrated in the plan view of FIG. The layer provided with 142 is more preferable in terms of easy grounding. The grounding area is formed on a part or all of the periphery of the image display area so as not to disturb the image display. The mesh area is an area that can cover the entire image display area of the PDP to which the front glass filter is applied. The grounding area is an area for grounding. The image display area means at least an area in which the PDP substantially displays an image (substantially image display area). When the PDP is viewed from a viewer, the entire inner side of the frame by the outer frame body of the PDP is used. An area may be included for convenience. The reason is that if a black area (border) exists inside the frame and outside the substantial image display area, it is outside the image display area, but the appearance is substantially the image display area as long as it is touched. The difference is that a sense of incongruity occurs.
The grounding region basically does not require a mesh, but a mesh composed of openings may be present for the purpose of preventing warpage of the grounding region.

[Blackening treatment]
The blackening treatment is for preventing light reflection on the surface of the conductive mesh layer, and the black level of the fluoroscopic image due to reflection of external light on the surface of the conductive mesh layer by the blackening treatment surface formed by the blackening treatment. Is reduced, and the bright room contrast of the fluoroscopic image is improved to improve the visibility of the image of the PDP. The blackening treatment surface is preferably provided on all surfaces of the line portion (linear portion) of the conductive mesh layer, but in the present invention, at least the viewer side and the surface on the outside light incident side of the front and back surfaces are provided. It is preferable to use a blackened surface. Both front and back surfaces and side surfaces (both sides or one side) may be further blackened. The blackening layer may be provided at least on the viewing side. However, when the blackening layer is provided also on the PDP surface side, stray light generated from the PDP can be suppressed, so that the visibility of the image is further improved.
The blackening treatment is performed by either roughening the metal plating layer surface of the blackening layer, imparting light absorption over the entire visible light spectrum (blackening), or using both in combination. . Specifically, as the blackening treatment, a blackening layer is additionally provided on the conductive mesh layer by plating or the like, and the layer constituting the surface itself is changed from the surface to the inside by etching or the like to the blackening layer. May be.

In the present invention, the blackened layer is not particularly limited as long as it exhibits a dark color such as black and satisfies basic physical properties such as adhesion, and a known blackened layer can be appropriately employed.
Accordingly, as the blackening layer, an inorganic material such as a metal, an organic material such as a black colored resin, or the like can be used. It is formed as a metal-based layer. As a method for forming the metal layer, various conventionally known blackening methods can be appropriately employed.

  As the blackening layer of the present invention, using a compound composed of three elements of Ni—Cu—O (hereinafter referred to as (Ni—Cu—O) compound) is excellent in adhesion and suitable for etching processing. It is preferable from the viewpoint that it is excellent and has sufficient blackness to absorb external light. In order to absorb the external light to the electromagnetic wave shielding sheet and improve the visibility of the image on the display, a blackened layer is formed on the transparent resin substrate directly or via another layer. Although the formation method of a blackening layer is not specifically limited, It can form suitably by vapor phase film-forming, such as a sputtering method and a vacuum evaporation method. Sputtering is particularly preferred because of its high deposition rate and excellent adhesion. In the sputtering method, Ni—Cu (nickel-copper alloy) is used as a target, an argon atom that is ionized by applying a high voltage while supplying a desired amount of oxygen gas is hit, and the target is ionized and blown away to form a transparent resin base. A blackened layer is formed by depositing on the material. Since the blackening layer according to the present invention has high blackness, it can absorb external light and suppress external light reflection (glare feeling).

  The reflection Y value of the blackened layer is preferably 10 or less. The reflection Y value is measured using a chromaticity meter (CM-3600d manufactured by Minolta) with an observation viewing angle of 10 degrees and an observation light source D65.

[Rust prevention layer]
As the conductive mesh layer, other layers may be appropriately formed or processed as necessary. For example, when the durability against rust is insufficient, a rust prevention layer may be provided.
The rust preventive layer is not particularly limited as long as it is less likely to rust than the conductive mesh layer covered with it, such as an inorganic material such as metal, an organic material such as resin, or a combination thereof. In some cases, the blackened layer is also covered with a rust-preventing layer, so that the particles of the blackened layer can be prevented from falling off and deformed, and the blackness of the blackened layer can be increased. Therefore, in the present invention, it is preferable to provide a rust-preventing layer on the blackened layer from the viewpoint of preventing the blackened layer from dropping or preventing alteration.

A conventionally well-known thing should just be employ | adopted for a rust prevention layer suitably, for example, is a metal thru | or alloys, such as chromium, zinc, nickel, tin, copper, or the layer of a metal compound of a metal oxide. These can be formed by a known plating method or the like.
In addition, the thickness of a rust prevention layer is about 0.001-2 micrometers normally, Preferably it is 0.01-1 micrometer.

(Transparent resin base material)
The transparent resin base material is a part of the layers constituting the electromagnetic wave shielding sheet, and is a layer serving as a base material for laminating the conductive mesh layer through an adhesive layer as necessary.
The transparent resin substrate is a layer for reinforcing the conductive mesh layer having a low mechanical strength. Therefore, as the transparent resin base material, if it has mechanical strength and light transmittance, a material that appropriately considers performance such as heat resistance may be selected according to the intended use. As a specific example of such a transparent resin base material, a sheet (or film, the same applies hereinafter) made of an organic material such as a resin can be given. The higher the transparency of the transparent resin substrate, the better. However, the light transmittance in the visible light region of 380 to 780 nm is preferably 70% or more, more preferably 80% or more. The light transmittance can be measured using a spectrophotometer (for example, UV-3100PC manufactured by Shimadzu Corporation) and a value measured in the air at room temperature.
However, when it is necessary to protect the material on the PDP side from the transparent resin base material from ultraviolet rays from sunlight or the like, an ultraviolet absorber is added to the transparent resin base material. The ultraviolet absorber is appropriately selected from those exemplified in the ultraviolet absorbing layer described later.

  Examples of the transparent resin used as the material for the transparent resin substrate include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, terephthalic acid-isophthalic acid-ethylene glycol copolymer, terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer Polyester resins such as nylon 6, polyamide resins such as nylon 6, polyolefin resins such as polypropylene, polymethylpentene and cycloolefin polymers, acrylic resins such as polymethyl methacrylate, styrene such as polystyrene and styrene-acrylonitrile copolymers Resin, cellulose resin such as triacetyl cellulose, polycarbonate resin and the like.

  These resins are used alone or as a plurality of types of mixed resins (including polymer alloys), and the layer structure of the transparent substrate is used as a single layer or a laminate of two or more layers. In the case of a resin film, a uniaxially stretched or biaxially stretched film is more preferable in terms of mechanical strength.

The thickness of the transparent resin substrate may be basically selected according to the application and is not particularly limited, but is usually 12 to 1000 μm, preferably 50 to 500 μm, more preferably 50 to 200 μm. Within such a thickness range, the mechanical strength is sufficient, warping, loosening, breakage, etc. are prevented, and it is easy to supply and process in a continuous belt shape.
In the present invention, as the transparent resin substrate, a plate (thickness of 1000 μm or more) can be used in addition to a resin sheet (thickness of 100 μm or more and less than 1000 μm) or a film (thickness of less than 100 μm).

  In this respect, the transparent resin film is preferably a transparent resin film rather than a resin plate. Among these resin films, polyester resin films such as polyethylene terephthalate and polyethylene naphthalate are preferable in terms of transparency, heat resistance, cost, and the like, and more preferably a biaxially stretched polyethylene terephthalate film.

  Further, in the resin of the transparent resin base material, a known additive, for example, a UV absorber described later, a filler, a plasticizer, an antistatic agent, and the like are appropriately added as necessary. It can be added without departing from the scope.

  The transparent resin base material is appropriately subjected to known easy adhesion treatment such as corona discharge treatment, plasma treatment, ozone treatment, flame treatment, primer treatment, preheat treatment, dust removal treatment, vapor deposition treatment, alkali treatment, etc. You may go.

(Adhesive layer)
Although the adhesive layer is not shown in the electromagnetic wave shielding sheet of FIG. 1, an adhesive layer (or a pressure-sensitive adhesive layer) may be used. The adhesive layer is not particularly limited as long as it is a layer that can bond the conductive mesh layer and the transparent resin base material, but it constitutes the conductive mesh layer. In the case where the metal foil and the transparent resin base material are bonded to each other via an adhesive layer, and then the metal foil is meshed by etching, the adhesive layer preferably has etching resistance. Specifically, polyurethane resins such as polyester urethane, acrylic urethane, polyether urethane, acrylic resin, polyester resin, polyvinyl alcohol alone or a partially saponified product thereof, vinyl chloride-vinyl acetate copolymer, ethylene-vinyl acetate copolymer , Polyimide resin, epoxy resin and the like. The adhesive layer (or pressure-sensitive adhesive layer) used in the present invention may be an ultraviolet curable type or a thermosetting type. In particular, a polyurethane resin, an acrylic resin, or a polyester resin is preferable from the viewpoint of adhesion to a transparent resin substrate.

  The transparent resin base material and the metal foil for forming the conductive mesh layer can be bonded by the dry lamination method or the like through the adhesive layer. Moreover, it is preferable that the film thickness of this adhesive bond layer is in the range of 0.5 μm to 50 μm, especially 1 μm to 20 μm. Thereby, a transparent resin base material and a conductive mesh layer can be firmly bonded, and the transparent resin base material is affected by an etching solution such as iron chloride at the time of etching to form the conductive mesh layer. This is because it can be prevented.

4). Pressure-sensitive adhesive layer The pressure-sensitive adhesive layer according to the present invention is a layer that functions as a bonding surface for bonding the transparent conductive layer and the glass plate in the front glass filter for plasma display.

  The pressure-sensitive adhesive layer according to the present invention has a general formula MxWyOz (where M element is H, He, alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, One or more elements selected from Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, I, W is tungsten, O is oxygen, 0.001 ≦ x / y ≦ 1 0.1, 2.2 ≦ z / y ≦ 3.0) is preferable from the viewpoint of ensuring a near infrared absorption function.

  In addition, the pressure-sensitive adhesive layer according to the present invention preferably contains a neon light absorber and / or a color correction dye because the neon light absorption function and / or the color correction function can be further combined in one layer. .

(1) Composite tungsten oxide fine particles The general formula MxWyOz (wherein M element is H, He, alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, One or more elements selected from Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, I, W is tungsten, O is oxygen, 0.001 ≦ x / y ≦ 1 .1, 2.2 ≦ z / y ≦ 3.0), the composite tungsten oxide fine particles function as a near infrared absorber in the present invention, and have high heat resistance, moisture resistance, and light resistance. In addition, since the composite tungsten oxide fine particles can absorb the entire near-infrared band with a wavelength of 800 to 1,100 nm generated from the front surface of the PDP only by the composite tungsten oxide fine particles, the organic near-infrared absorption that is more easily deteriorated. It is not necessary to use the agent together. Therefore, according to the front glass filter for a plasma display of the present invention, the spectral characteristic change attributable to the deterioration of the near-infrared absorber hardly occurs even when used for a long time, particularly for a long time under high temperature or high humidity. . In addition, the composite tungsten oxide fine particles are formed by sodium ions penetrating from the glass plate or heavy metal ions such as copper ions, iron ions, nickel ions, cobalt ions penetrating from the conductive layer or the blackening layer as compared with the organic dye. Little deterioration and deterioration. Therefore, as in the case of using near-infrared absorbers, there is no need to separate from the glass substrate such as the PDP surface and the conductive mesh layer, etc., in order to prevent the deterioration of the pigment. Since it can be contained, the number of lamination steps can be reduced, the production efficiency is excellent, and the thickness can be reduced with a small number of laminations.

  The composite tungsten oxide fine particles represented by the general formula MxWyOz are selected from the hexagonal, tetragonal, and cubic crystals because they have excellent durability when they have a hexagonal, tetragonal, or cubic crystal structure. Preferably it contains more than one crystal structure. For example, in the case of composite tungsten oxide fine particles having a hexagonal crystal structure, preferable M elements include Cs, Rb, K, Tl, In, Ba, Li, Ca, Sr, Fe, and Sn. Examples thereof include composite tungsten oxide fine particles containing one or more selected elements. Among them, the M element is preferably Cs (cesium) from the viewpoint of durability.

At this time, the addition amount x of M element to be added is preferably 0.001 or more and 1.0 or less, and more preferably around 0.33. This is because the value of x calculated theoretically from the hexagonal crystal structure is 0.33, and preferable optical characteristics can be obtained with the addition amount before and after this value. On the other hand, the abundance z of oxygen is preferably 2.2 or more and 3.0 or less. For example, Cs _0.33 WO ₃ , Rb _0.33 WO ₃ , K _0.33 WO ₃ , Ba _0.33 WO _{3 and the} like can be mentioned, provided that x and z fall within the above ranges. Useful near infrared absorption characteristics can be obtained.

Such composite tungsten oxide fine particles may be used alone or in combination.
In addition, coating the surface of the composite tungsten oxide fine particles with an oxide containing one or more elements of Si, Ti, Zr, and Al can further improve the weather resistance. preferable.

  Further, the average dispersed particle size of the composite tungsten oxide fine particles is preferably 800 nm or less, more preferably 200 nm or less, particularly preferably 100 nm or less, from the viewpoint of the transparency of the pressure-sensitive adhesive layer. Here, the average dispersed particle size refers to a volume average particle size, and can be measured using a particle size distribution / particle size distribution measuring device (for example, a nanotrack particle size distribution measuring device manufactured by Nikkiso Co., Ltd.).

  Although content of composite tungsten oxide microparticles | fine-particles is not specifically limited, It is preferable that it is 1-25 weight% in an adhesive layer. If the content is more than 1% by weight, a sufficient near-infrared absorbing function can be exhibited, and if it is 25% by weight or less, a sufficient amount of visible light can be transmitted.

(2) Neon light absorbing agent The neon light absorbing function is installed to absorb neon light emitted from the PDP, that is, the emission spectrum of neon atoms. When a neon light absorber is included, at least orange light emission from the PDP can be suppressed, and a bright red color can be obtained. Since the emission spectrum band of neon light has a wavelength of 550 to 640 nm, the spectral transmittance when functioning as a neon light absorbing layer is preferably designed to be 50% or less, more preferably 25% or less at a wavelength of 590 nm. As the neon light absorber, a dye having an absorption maximum in a wavelength region of at least 550 to 640 nm can be used. Specific examples of the dye include cyanine, oxonol, methine, subphthalocyanine or porphyrin. Of these, porphyrins are preferred. Among them, a tetraazaporphyrin-based dye as disclosed in Japanese Patent No. 3834479 is particularly preferable from the viewpoints of good dispersibility in the pressure-sensitive adhesive layer and good heat resistance, moisture resistance, and light resistance.
Although content of a neon light absorber is not specifically limited, It is preferable that it is 0.05 to 5 weight% in an adhesive layer. If the content is more than 0.05% by weight, a sufficient neon light absorbing function can be exhibited, and if it is 5% by weight or less, a sufficient amount of visible light can be transmitted.

(3) Color correction pigment The color correction function is used to adjust the color of the display filter to improve the color purity of the light emitted from the PDP, the color reproduction range, and the display color when the power is turned off. is there. Since each display has a different color correction function requirement, the display is appropriately adjusted and used.
Examples of known dyes that can be used as color correction dyes include the dyes described in JP 2000-275432 A, JP 2001-188121 A, JP 2001-350013 A, JP 2002-131530 A, and the like. Can be suitably used. In addition, other dyes such as anthraquinone, naphthalene, azo, phthalocyanine, pyromethene, tetraazaporphyrin, squarylium, and cyanine that absorb visible light such as yellow light, red light, and blue light. Can be used.
The content of the color correction dye is appropriately adjusted according to the color to be corrected and is not particularly limited. Usually, it contains about 0.01 to 10% by weight in the pressure-sensitive adhesive layer.

(4) Pressure-sensitive adhesive Pressure-sensitive adhesive refers to one type of adhesive, and is only moderately pressured, usually lightly pressed by hand at room temperature (for example, 15 to 40 ° C.) during bonding. According to the above, it can be adhered only by the tackiness of the surface.
When the pressure-sensitive adhesive used in the present invention contains the composite tungsten oxide fine particles and the like, the composite tungsten oxide fine particles and the like are uniformly dispersed, and film-forming properties are imparted, and further function as an affixing surface of the front glass filter. To do. The pressure-sensitive adhesive is not particularly limited as long as it achieves film formability, transparency, pressure-sensitive adhesiveness, and dispersibility of the composite tungsten oxide fine particles, and is appropriately selected depending on the layer configuration adjacent to the pressure-sensitive adhesive layer. Can be used. The higher the transparency as the pressure-sensitive adhesive layer is, the better. However, the light transmittance in the visible light region of 380 to 780 nm is preferably 70% or more, more preferably 80% or more. By optimizing the pressure-sensitive adhesive used and the thickness, the pressure-sensitive adhesive layer of the present invention also functions as an impact resistant layer.

The pressure-sensitive adhesive used in the present invention is preferably one that can favorably disperse the composite tungsten oxide fine particles.
Specifically, the composite tungsten oxide fine particles are dispersed in a resin to form a coating film having a film thickness of 25 μm, and when the haze value according to JIS K7136 is measured, the haze value is 15 or less. It is preferable that a resin is selected and used at a mixing ratio at which the haze value is 5 or less. The haze value is more preferably 3 or less, and particularly preferably 2 or less. In the case of using an additive for improving dispersion when dispersing the composite tungsten oxide fine particles, it is preferable that the resin and the additive are used in such a mixing ratio that the above haze value is obtained together with the additive. .

  Examples of the pressure-sensitive adhesive include natural rubber, synthetic rubber, acrylic resin (hereinafter also abbreviated as acrylic), polyvinyl ether, urethane resin, and silicone resin. Specific examples of synthetic rubbers include styrene-butadiene rubber, acrylonitrile-butadiene rubber, polyisobutylene rubber, isobutylene-isoprene rubber, styrene-isoprene block copolymer, styrene-butadiene block copolymer, styrene-ethylene-butylene block. A copolymer is mentioned. Specific examples of the silicone resin system include dimethylpolysiloxane. These pressure-sensitive adhesives can be used alone or in combination of two or more.

  An acrylic adhesive is mentioned as an adhesive suitably used. The acrylic pressure-sensitive adhesive is a polymer containing at least a (meth) acrylic acid alkyl ester monomer. A copolymer of a (meth) acrylic acid alkyl ester monomer having an alkyl group having about 1 to 18 carbon atoms and a monomer having a carboxyl group, or (meth) acrylic acid having an alkyl group having about 1 to 18 carbon atoms A copolymer using two or more kinds of alkyl ester monomers is generally used. In the present invention, (meth) acrylic acid means acrylic acid and / or methacrylic acid.

  Examples of (meth) acrylic acid alkyl ester monomers used herein include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, sec-propyl (meth) acrylate, N-butyl (meth) acrylate, sec-butyl (meth) acrylate, tert-butyl (meth) acrylate, isoamyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, Examples include n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, undecyl (meth) acrylate, and lauryl (meth) acrylate. Moreover, it is preferable that the said (meth) acrylic-acid alkylester is copolymerized in the quantity of 30-99.5 weight part in the acrylic adhesive.

  Moreover, as a monomer which has a carboxyl group which forms an acrylic adhesive, monomers containing a carboxyl group such as (meth) acrylic acid, itaconic acid, crotonic acid, maleic acid, monobutyl maleate and β-carboxyethyl acrylate are used. Can be mentioned.

  As a commercial item of an acrylic adhesive, for example, trade name: TU-41A (manufactured by Yodogawa Paper Mill), trade name: No. 591, no. 5915, no. 5919M, CS9621, LA-50, LA-100, HJ-9210, No. 595B (manufactured by Nitto Denko Corporation), trade name: SK Dyne SK2094 (manufactured by Soken Chemical Co., Ltd.) and the like are preferably used from the viewpoint of low haze and adhesive strength.

(5) Other components The pressure-sensitive adhesive layer in the present invention may contain a crosslinking agent such as an isocyanate compound, a tackifier, and the like as desired.
In the embodiment in which the pressure-sensitive adhesive layer is directly laminated on the conductive mesh layer of the electromagnetic wave shielding sheet, it is preferable to add an antioxidant such as benzotriazole to the pressure-sensitive adhesive layer. In this case, it is possible to prevent the conductive mesh layer from being oxidized by an acid component that can be contained in the resin at the interface with the conductive mesh layer and causing a color change.
In addition, the pressure-sensitive adhesive layer may contain various dispersants, various surfactants, silane coupling agents, and the like as dispersants for improving the dispersibility of the composite tungsten oxide fine particles. Moreover, as long as the effect of the present invention is not impaired, a near infrared absorber other than the composite tungsten oxide fine particles may be included. As near infrared absorbers other than the composite tungsten oxide fine particles, inorganic near infrared absorbers such as tungsten oxides other than those represented by the above general formula, and organic near infrared absorbers such as phthalocyanine compounds and diimonium compounds Are appropriately selected and used.

5. Functional layer The functional layer used in the present invention is a layer having one or more functions selected from the group consisting of an antireflection function, an antiglare function, and an abrasion resistance function. The functional layer may be formed as a multilayer in addition to a single layer.
As a means for reducing the reflection of the background due to the specular reflection of extraneous light on the surface of the image display device, the whitening of the image, and the reduction of the image contrast, the uppermost layer (the viewer side surface) of the front glass filter of the present invention It is preferable to impart an antireflection function and an antiglare function, and it is preferable to form a so-called antiglare layer and / or a so-called antireflection layer. For the former antiglare layer, the background image by extraneous light is scattered by scattering or diffusing light like polished glass. As the latter antireflection layer, a material with a high refractive index and a material with a low refractive index are alternately laminated and multilayered so that the outermost surface is a low refractive index layer (multi-coat), and the reflected light at the interface of each layer is reflected. This is a technique for suppressing surface reflection and obtaining a good antireflection effect by canceling out by interference, which is a so-called antireflection layer in a narrow sense.
Moreover, you may contain a ultraviolet absorber in the said functional layer from the point which brings a ultraviolet-ray shielding function to a front glass filter.

(1) Anti-glare layer Anti-glare layer (Anti Glare layer, abbreviated as AG layer) is a film formation in which an inorganic filler such as silica is added to a resin binder, or a shaping process using a shaping plate, etc. Thus, the layer surface can be formed as a layer provided with fine irregularities for irregularly reflecting external light. As the resin of the resin binder, a curable acrylic resin, an ionizing radiation curable resin, or the like is preferably used in the same manner as the hard coat layer described later because surface strength is desired as the surface layer.

(2) Antireflective layer The antireflective layer (Anti Reflection layer, abbreviated as AR layer) is a single low refractive index layer or a low refractive index layer and a high refractive index layer. A multilayer structure in which layers are alternately stacked so as to be positioned at the uppermost layer is generally used, and can be formed by a dry film formation method such as vapor deposition or sputtering, or by using a wet film formation method such as coating. Note that silicon oxide, magnesium fluoride, fluorine-containing resin, or the like is used for the low refractive index layer, and titanium oxide, zinc sulfide, zirconium oxide, niobium oxide, or the like is used for the high refractive index layer. Here, the high (low) refractive index layer means that the refractive index of the layer is relatively high (low) compared to a layer adjacent to the layer (for example, a low (high) refractive index layer). Meaning.
When the antireflection layer is further provided with a scratch resistance function, the antireflection layer is appropriately formed using a material having high hardness described in the section of the scratch resistance function (hard coat) layer described later.

(3) Scratch-resistant functional layer The scratch-resistant (hard coat) layer preferably exhibits a hardness of “H” or higher in a pencil hardness test specified by JISK5600-5-4 (1999). The material is not particularly limited as long as it can achieve the same hardness and the same transparency as the transparent resin substrate.
The scratch-resistant (hard coat) layer is, for example, a polyfunctional (meth) acrylate prepolymer such as polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, or trimethylolpropane tri (meth) acrylate. , Pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and other polyfunctional (meth) acrylate monomers having three or more functional groups, or a combination of two or more selected from these. It can be formed as a coating film using a curable resin. Further, when the ionizing radiation curable resin is used as an ultraviolet curable resin, a sensitizer can be added as a photopolymerization initiator or a photopolymerization accelerator. Here, (meth) acrylate is a composite notation meaning acrylate or methacrylate. The scratch resistance function (hard coat) can be formed by a wet film formation method such as coating on the transparent resin substrate by diluting the material with a solvent as necessary.

(4) Other layers Examples of other layers include a neon light absorption layer, a color correction layer, an ultraviolet absorption layer, and an antifouling layer. However, the neon light absorbing layer and the color correction layer are not formed as a single layer from the viewpoint of production efficiency, but as described above, the neon light absorbing layer and the color correction dye are applied to other layers such as an adhesive layer. It is preferable to contain it as a layer that also serves as a neon light absorption layer and a color correction layer. Even when it is formed as a single layer, the neon light absorber and the color correction pigment described in the above “4. Adhesive layer” can be used.
The ultraviolet absorbing layer may be an independent layer, or may be a layer that functions as an ultraviolet absorbing layer, in which another functional layer contains an ultraviolet absorber. Examples of the transparent resin base material containing an ultraviolet absorber include “Tetron Film HB Type” (trade name) manufactured by Teijin Limited.
Examples of the ultraviolet absorber include organic compounds such as benzotriazole compounds and benzophenone compounds, and inorganic compounds composed of fine zinc oxide, cerium oxide, and the like. Examples of the binder resin used in the case of an independent layer include resins such as a polyester resin, a polyurethane resin, an acrylic resin, and an epoxy resin.
The antifouling layer is generally a water-repellent or oil-repellent coat, and a siloxane-based, fluorinated alkylsilyl compound or the like can be applied. A fluorine-based or silicone-based resin used as a water-repellent paint can be preferably used. For example, when the low refractive index layer of the antireflection layer is formed of SiO ₂ , a fluorosilicate water-repellent paint is preferably used.

II. Method for Producing Front Glass Filter for Plasma Display A method for producing a front glass filter for plasma display according to the present invention is a method for producing a front glass filter installed on the front surface of a plasma display panel,
(I) a step of disposing a conductive member on at least one side edge of one surface of the glass plate;
(Ii) a step of preparing an electromagnetic wave shielding sheet in which a conductive layer having a transparent conductive layer at least in the center is provided on one surface of the transparent resin substrate; and (iii) the conductive layer side of the electromagnetic wave shielding sheet. On the surface of the conductive layer, the adhesive layer is formed by exposing the peripheral portion of the conductive layer facing the conductive member, and the conductive layer and one surface of the glass plate are connected to the adhesive layer. The step of bonding through,
It is characterized by having.

According to the method for manufacturing a front glass filter for a plasma display according to the present invention, a conductive member in contact with the conductive layer is interposed between the glass plate and the conductive layer, and the conductive member is used for viewing the glass plate. Since a conductive path is formed to wrap around from the surface on the person side to the surface on the plasma display panel side, the plasma can easily ground the conductive layer from the surface on the plasma display panel side of the glass plate through the conductive path. A front glass filter for display can be obtained.
Moreover, in the manufacturing method of the front glass filter for plasma displays which concerns on the said invention, it is designed so that an adhesive layer and an electromagnetic wave shielding sheet may be laminated | stacked only on one side of a glass plate. Thereby, according to the manufacturing method of the front glass filter for plasma display according to the present invention, it is possible to reduce the number of bonding steps to the glass plate, so that the production efficiency is excellent, and the material cost can be reduced, and A front glass filter for plasma display having excellent electromagnetic shielding properties can be obtained.

Hereinafter, each step will be described.
(I) The process of arrange | positioning a conductive member to at least one side edge of one surface of a glass plate In this process, a conductive member is arrange | positioned to at least one side edge of one surface of a glass plate.
As the conductive member, those described in “2. Conductive member” can be used.
An adhesive layer is formed on one surface of the conductive member, the surface on which the adhesive layer of the conductive member is formed is disposed on one surface of the glass plate, and is bent and pasted at the edge of the glass plate. Match. In addition, what was demonstrated in "2. Conductive member" can be used for an adhesive bond layer.
Moreover, when using the conductive sheet which has flexibility as the said electroconductive member, the said electroconductive sheet may be bend | folded according to the shape of the one side edge of a glass plate previously, and you may arrange | position to the said glass plate. An adhesive layer may be formed on the surface of the conductive sheet, or a double-sided adhesive tape may be applied, and the conductive sheet may be attached to the glass plate.
The conductive member may be a metal layer formed by depositing metal at a desired position on the glass plate. Although the formation method of the said metal layer is not specifically limited, It can form suitably by vapor phase film-forming, such as a sputtering method and a vacuum evaporation method.

(Ii) Step of preparing an electromagnetic wave shielding sheet provided with a conductive layer having a transparent conductive layer at least in the center on one surface of the transparent resin substrate In this step, first, a transparent resin substrate is prepared. A conductive layer is formed on one surface of the transparent resin substrate.
As the transparent resin substrate, those described in “3. Electromagnetic wave shielding sheet” can be used.
The method for providing the conductive layer on one surface of the transparent resin substrate is not particularly limited. For example, there are the following four methods.
(1) A method in which conductive ink is printed in a pattern on a transparent resin substrate film, and metal plating is performed on the formed conductive ink layer (for example, JP-A-2000-13088).
(2) A conductive ink or a chemical plating catalyst-containing photosensitive coating solution is applied to the entire surface of the transparent resin base film, and the formed coating layer is made into a mesh by photolithography, followed by metal plating on the mesh. (For example, Sumitomo Osaka Cement Co., Ltd., New Materials Division, New Materials Research Laboratory, New Materials Research Group, “Photoresolvable Chemical Plating Catalyst”, [online], date not listed, Sumitomo Osaka Cement Co., Ltd., [Search on January 7, 2003], Internet <URL: http://www.socnb.com/product/hproduct/display.html>).
(3) A method in which a transparent resin base film and a metal foil are laminated via an adhesive, and then the metal foil is meshed by a photolithography method (for example, Japanese Patent Application Laid-Open No. 11-145678).
(4) A transparent resin substrate film in which a metal thin film is formed on one surface of a transparent resin substrate film by sputtering or the like to form a conductive treatment layer, and a metal layer is formed thereon as a metal plating layer by electrolytic plating. And the metal plating layer and the conductive treatment layer of the metal-plated transparent resin base film are made into a mesh shape by a photolithography method (for example, Japanese Patent No. 3502979, Japanese Patent Application Laid-Open No. 2004-241761).

In the electromagnetic wave shielding sheet used in the present invention, as shown in FIG. 1, in order to produce a conductive mesh layer whose surface on the transparent resin base material side is blackened, a metal foil is laminated on the transparent resin base material. When using this method, the metal foil is blackened in advance, and the blackened surface is bonded to the transparent resin base material using an adhesive or the like as necessary. Moreover, when using a plating method, after forming the blackening layer by plating on a transparent resin base material, the method of forming a metal layer further by plating, etc. are mentioned.
From the viewpoints of image visibility when observing from an oblique direction, less bubble mixing during functional layer formation, short process, good yield, low cost, etc. When the thickness is reduced to about 5 μm or less, it is preferable to use the plating method (4).

(Iii) On the surface of the electromagnetic wave shielding sheet on the side of the conductive layer, an adhesive layer is formed by exposing a peripheral portion of the conductive layer facing the conductive member, and the conductive layer and the glass plate In this step, the surface of the electromagnetic wave shielding sheet facing the conductive member is exposed on the conductive layer side surface of the electromagnetic wave shielding sheet. Then, the pressure-sensitive adhesive layer is formed, and the conductive layer and one surface of the glass plate are bonded together via the pressure-sensitive adhesive layer.
The pressure-sensitive adhesive layer includes, for example, a pressure-sensitive adhesive layer coating liquid containing, as necessary, specific composite tungsten oxide fine particles, neon light absorbers, and color correction dyes as described above, and the conductive layer. It can be formed by a wet film-forming method such as coating on top. In addition, what was demonstrated in "4. Adhesive layer" can be used for the said adhesive.
The pressure-sensitive adhesive layer is formed at least on the transparent conductive layer (conductive mesh layer in the representative form shown in FIG. 1) facing the central image display region of the conductive layer. . Of the grounding region at the peripheral edge (in the typical form shown in FIG. 1, the non-mesh layer), at least a portion that is brought into contact with the conductive member and grounded is not formed with an adhesive and the conductive layer is exposed. .

  In addition to coating the adhesive layer directly on the conductive layer, first, the adhesive layer coating liquid is first coated and dried on a release sheet such as a PET film that has been subjected to a release treatment. Then, a so-called transfer method may be employed in which the pressure-sensitive adhesive layer is adhered onto the conductive layer and the release sheet is peeled and removed. In this case, it is preferable to protect the pressure-sensitive adhesive layer formed on the release sheet from above using the same release sheet until it is bonded to the electromagnetic wave shielding sheet.

In particular, when the transparent conductive layer of the electromagnetic wave shielding sheet is made of a conductive mesh, the conductive mesh layer is filled with an adhesive in the openings (recesses) of the mesh on the surface of the conductive mesh layer. It is necessary to provide a pressure-sensitive adhesive layer so as to flatten the unevenness and to expose a part of the peripheral edge of the conductive mesh layer. In this case, the adhesive layer is intermittently applied. In addition, intermittent coating does not form the entire surface of the adhesive layer in order to expose a part of the peripheral edge of the conductive mesh layer, but on the transparent conductive layer of the conductive layer and as necessary. The pattern is formed only on the non-use portion for the installation of the grounding region at the peripheral edge. In intermittent coating, in addition to the so-called coating method, a printing method including transfer may be used, and these can be appropriately adopted from known methods.
The pressure-sensitive adhesive layer is coated such that the surface of the pressure-sensitive adhesive layer is flattened while completely filling the uneven portion so that air does not enter the unevenness of the conductive mesh layer. It is preferable from the viewpoint of improving the transparency. In addition, the peripheral portion of the conductive layer exposes the position facing the conductive member as a grounding region.

  The electromagnetic wave shielding sheet on which the pressure-sensitive adhesive layer is formed is bonded to the glass plate via the pressure-sensitive adhesive layer. At this time, the conductive member arranged on the glass plate is in contact with the grounding region of the peripheral portion of the electromagnetic wave shielding sheet, and the conductive path goes around from the viewer side surface of the glass plate to the PDP side surface. Therefore, the conductive mesh layer can be easily grounded.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  Hereinafter, the present invention will be specifically described with reference to examples. These descriptions do not limit the present invention. In the examples, parts represent parts by weight unless otherwise specified.

<Example 1>
(1) Bonding process of conductive member to glass plate First, a blue plate glass plate (thickness 2.5 mm) made of Nippon Sheet Glass was prepared as a front glass plate for PDP. Next, in the peripheral part of the glass plate, an aluminum tape (No. 8060: trade name, manufactured by Sliontec Co., Ltd., width 50 mm) is prepared as a conductive member, arranged on one surface of the glass plate, The glass plate was bent at the edge of the glass plate, and pasted toward the other surface of the glass plate, that is, when placed on the front surface of the PDP, so as to go around from the viewer side surface toward the PDP side surface. In addition, the said aluminum tape was affixed on the surface by the side of the conductive mesh layer of the said glass plate with the same width as the part exposed as the area | region for grounding of the said conductive mesh layer.

(2) Manufacture of electromagnetic wave shielding sheet As a transparent resin base material, a continuous strip-shaped non-colored transparent biaxially stretched polyethylene terephthalate (PET) film (A4300: trade name, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm was prepared.
Next, a blackened layer (Ni—Cu—O blackened layer) made of an alloy containing nickel, copper and oxygen was formed on the PET surface by vacuum sputtering. Copper was deposited thereon to laminate a conductive layer. The sheet resistance was 0.01Ω / □.

Next, in the laminated body, the conductive layer and the blackened layer are etched into the image display area of the PDP using the transparent conductive layer composed of the mesh-shaped area including the opening and the line by etching using a photolithography method. A transparent conductive layer was formed correspondingly, and a conductive mesh layer having a frame-shaped mesh-free grounding region on the outer edge surrounding the circumference of the mesh-shaped region was formed. The mesh shape was a square lattice having square openings, the line width was 10 μm, and the opening width (side length of the square) was 300 μm. One rectangular area having the mesh shape corresponds to one screen of the PDP. Such rectangular mesh-like areas are arranged on one side at intervals of 30 mm in the form of a continuous band, and margins having a width of 15 mm are formed on both sides of the arrangement of the mesh-like areas, and the width of the grounding area at the peripheral part is increased. It was 15 mm.
Specifically, the etching was performed consistently from resist formation, masking to etching on the laminate using a production line for a color TV shadow mask. That is, after a photosensitive etching resist is applied to the entire surface of the transparent conductive layer of the laminate, a mask having a desired mesh pattern is closely exposed, developed, hardened, and baked to obtain a region corresponding to a mesh line portion. After the resist layer is processed into a pattern in which the resist layer remains on the region corresponding to the opening and there is no resist layer, the conductive layer and the black in the resist layer non-formation region are washed with an aqueous ferric chloride solution. The chemical layer was removed by etching to form a mesh-shaped opening, followed by sequential washing with water, stripping of the resist, washing and drying.

(3) Step of laminating an antiglare layer on the surface of the electromagnetic wave shielding sheet on the transparent resin substrate side An antiglare layer was formed on the surface of the electromagnetic wave shielding sheet on the transparent resin substrate side. Specifically, first, as an ionizing radiation curable resin, 70 parts by mass of pentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd., refractive index 1.49), 30 parts by mass of isocyanuric acid EO-modified diacrylate (Toa) 10.0 parts by mass of Synthetic Co., Ltd., refractive index 1.51), acrylic polymer (Mitsubishi Rayon Co., Ltd., molecular weight: 75,000), 5.0 of the trade name Irgacure 184 as a photocuring initiator In addition, 15.0 parts by mass of styrene beads (manufactured by Soken Chemical Co., Ltd., particle size 3.5 μm, refractive index) as an ultraviolet curable resin blended with parts by mass (Ciba Gaigi Co., Ltd.) 1.60), 0.01 part by mass (made by The Inktec Co., Ltd.) as a trade name “10-28” as a leveling agent, 127.5 parts by mass of toluene, and 54.6 parts by mass of cyclohexanone, And a coating solution was thoroughly mixed. This coating solution was filtered through a polypropylene filter having a pore size of 30 μm to prepare a coating solution for forming an antiglare layer. Next, the coating solution is applied on the surface of the electromagnetic shielding sheet on the transparent resin substrate side so as to have a film thickness of 7 μm, and then heated and dried in an oven at 50 ° C., and UV is applied in an N ₂ atmosphere. Using an H bulb of an irradiation apparatus (manufactured by Fusion UV System Japan Co., Ltd.) as a light source, it was cured by ultraviolet irradiation (integrated light amount 200 mj) to form an antiglare layer.
(4) Formation of pressure-sensitive adhesive layer Next, a pressure-sensitive adhesive layer to which various light absorbers were added was formed on the surface of the continuous anti-glare sheet with the antiglare layer formed and on the conductive mesh layer side. 0.25 parts by weight of a curing agent (manufactured by Soken Chemical Co., Ltd., E-5XM), 100 parts by weight of an acrylic adhesive (manufactured by Soken Chemical Co., Ltd., SK Dyne 2094), cesium-containing tungsten oxide (Cs 0.33 WO3 ) 18.5 wt% suspension (manufactured by Sumitomo Metal Mining Co., Ltd., YMF-02; average dispersed particle size 800 nm or less) 1.32 parts by weight, neon light absorber (manufactured by Yamada Chemical Co., Ltd., TAP- 2; 0.045 parts by weight of tetraazaporphyrin-based dye) and 0.3 parts by weight of color correction dye (Nippon Kayaku Co., Ltd., KAYASET RED A2G) were added and dispersed sufficiently to prepare an adhesive layer composition. .
Next, it apply | coats with respect to the surface at the side of the electroconductive mesh layer of the said laminated body so that it may become thickness 25micrometer at the time of drying with a die coater, and it is 100 degreeC for 1 minute in the oven which hits dry air with a wind speed of 5 m / sec. The pressure-sensitive adhesive layer was formed by drying, and a composite filter was obtained in a continuous belt-like state. The surface of the pressure-sensitive adhesive layer was further protected by attaching a releasable release film.
The pressure-sensitive adhesive layer was partially formed by an intermittent coating method so as not to cover the grounding region surrounding the periphery of the conductive mesh layer but to cover the mesh region.
(4) Bonding of electromagnetic wave shielding sheet and glass plate The electromagnetic wave shielding sheet was cut into sheets for each unit of one PDP screen. At this time, the grounding region of the conductive mesh layer was exposed around the adhesive portion.
Using a single wafer bonding machine (manufactured by Suntec), one surface of the glass plate and the surface on the conductive mesh layer side of the electromagnetic wave shielding sheet were bonded to obtain a front glass filter for plasma display. The grounding region of the conductive mesh layer and the aluminum tape attached to the glass plate are in surface contact.

<Example 2>
In the production of the front glass filter of Example 1, the front glass filter was prepared in the same manner as in Example 1 except that a copper foil tape (No. 8781: trade name, manufactured by Slion Tech Co., Ltd.) was used as the conductive member. Obtained.

<Comparative Example 1>
The coating solution for forming the antiglare layer prepared in the step of laminating the antiglare layer on the surface of the electromagnetic wave shielding sheet of Example 1 on the transparent resin substrate side has a film thickness of 7 μm on one surface of the transparent resin substrate. After being coated in such a manner, it is heated and dried in an oven at 50 ° C., and cured by UV irradiation using an H bulb of a UV irradiation device (Fusion UV System Japan Co., Ltd.) as a light source in an N ₂ atmosphere (accumulation). The amount of light was 200 mj) and an antiglare film was obtained.
Next, the pressure-sensitive adhesive composition prepared in Example 1 was applied to the surface of the antiglare film on the transparent resin substrate side, and the oven was exposed to dry air at a wind speed of 5 m / sec at 100 ° C. for 1 minute. It dried and the adhesive layer was formed. This was bonded to one surface of the glass plate using a single wafer bonding machine (manufactured by Suntec).
In addition, on the surface of the electromagnetic wave shielding sheet of Example 1 on the side of the transparent resin substrate, the adhesive TU-41A (manufactured by Yodogawa Paper) was laminated, and the glass plate on which the antiglare film was laminated was turned upside down. Similarly, it laminated | stacked so that the electrically conductive layer of an electromagnetic wave shielding sheet might face the outer side of a glass plate using the sheet | seat bonding machine (made by Suntec) on the other surface of the said glass plate.

〔Evaluation methods〕
The following points were evaluated with respect to the above examples and comparative examples. The results are listed in Table 1. In addition, it describes in Table 1 also about the bonding frequency | count to the glass plate and the number of main members with respect to each Example and a comparative example.
<Electromagnetic wave shielding>
Set the produced front glass filter on a 42-inch plasma TV (Matsushita TH-42PX500), and avoid contact failure in the grounding area of the conductive mesh layer on the aluminum tape attached to the four sides of the glass plate. A rubber sheet was installed on the antiglare layer side to apply pressure. It was tested whether Class B could be achieved by the VCCI 10 m method in an anechoic chamber.
In each example, the grounding work is easy via a conductive member, and in the case of a comparative example, via the grounding region of the conductive layer exposed at the peripheral edge. There was no. However, the number of times of bonding to the glass plate was one in the case of each example, and the front and back reversing process of the glass plate was not required in the middle. On the other hand, in the case of the comparative example, the bonding process required two times, and a complicated operation for reversing the front and back of the glass plate during the process was also necessary.

It is a cross-sectional schematic diagram of an example of the front glass filter for plasma displays which concerns on this invention. It is a top view of an example of the electromagnetic wave shielding sheet used for the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Front glass filter for plasma displays 10 Electromagnetic wave shielding sheet 11 Transparent resin base material 13 Blackening layer 14 Conductive layer (The center part is a conductive mesh layer as a transparent conductive layer)
15 Part of the periphery of the conductive mesh layer (grounding area)
16 Conductive member 17 Gasket 20 Adhesive layer 30 Antireflection layer 40 Glass plate 50 Plasma display panel (PDP)
141 Mesh area 142 Ground area

Claims (12)

A front glass filter installed in front of the plasma display panel,
In the front glass filter, the conductive layer of the electromagnetic wave shielding sheet provided with a conductive layer having a transparent conductive layer at least in the central part on one side of the transparent resin base material on one side of the glass plate is made of glass. Laminating facing the plate, providing a grounding region not covered with an adhesive layer on at least a part of the peripheral edge of the conductive layer, in the grounding region, between the glass plate and the conductive layer, A conductive member in contact with the conductive layer is interposed, and the conductive member forms a conduction path that extends from the viewer side surface of the glass plate to the plasma display panel side surface. Front glass filter for plasma display.   The front glass filter for a plasma display according to claim 1, wherein the conductive member is a metal foil, a metal plate, a metal mesh, a conductive sheet, or a conductive woven fabric.   The front glass filter for a plasma display according to claim 1 or 2, wherein the conductive member is bonded to the glass plate via an adhesive layer.   The pressure-sensitive adhesive layer has a general formula MxWyOz (where M element is H, He, alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni) , Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb , V, Mo, Ta, Re, Be, Hf, Os, Bi, I, one or more elements, W is tungsten, O is oxygen, 0.001 ≦ x / y ≦ 1.1, The front glass filter for a plasma display according to any one of claims 1 to 3, comprising composite tungsten oxide fine particles represented by 2.2≤z / y≤3.0).   The front glass filter for a plasma display according to any one of claims 1 to 4, wherein an average dispersed particle size of the composite tungsten oxide fine particles is 800 nm or less.   6. The front glass filter for a plasma display according to claim 1, wherein the composite tungsten oxide fine particles include one or more crystal structures of hexagonal crystal, tetragonal crystal, and cubic crystal. .   The element M of the composite tungsten oxide fine particle is a Cs (cesium) element, and the composite tungsten oxide fine particle has a hexagonal crystal structure. Front glass filter for plasma display.   The surface of the composite tungsten oxide fine particles is coated with an oxide containing one or more elements selected from Si, Ti, Zr, and Al. The front glass filter for plasma displays as described in 2.   The front glass filter for a plasma display according to any one of claims 1 to 8, wherein the pressure-sensitive adhesive layer contains a neon light absorber and / or a color correction pigment.   The transparent conductive layer is a conductive mesh layer, and a blackened layer is formed on a surface of the conductive mesh layer on the transparent resin substrate side, and the blackened layer is an alloy containing nickel, copper, and oxygen. The front glass filter for a plasma display according to any one of claims 1 to 9, wherein the front glass filter is a blackened layer (Ni-Cu-O blackened layer).   A functional layer having one or more functions selected from the group consisting of an antireflection function, an antiglare function, and an abrasion resistance function is laminated on the surface of the electromagnetic wave shielding sheet on the transparent resin substrate side. The front glass filter for a plasma display according to any one of claims 1 to 10, wherein the front glass filter is a plasma display. A method of manufacturing a front glass filter installed on the front surface of a plasma display panel,
(I) a step of disposing a conductive member on at least one side edge of one surface of the glass plate;
(Ii) a step of preparing an electromagnetic wave shielding sheet in which a conductive layer having a transparent conductive layer at least in the center is provided on one surface of the transparent resin substrate; and (iii) the conductive layer side of the electromagnetic wave shielding sheet. On the surface of the conductive layer, the adhesive layer is formed by exposing the peripheral portion of the conductive layer facing the conductive member, and the conductive layer and one surface of the glass plate are connected to the adhesive layer. The step of bonding through,
A method for producing a front glass filter for a plasma display, comprising:

Images