KR101021725B1 - 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈 및이들의 제조 방법 - Google Patents

감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈 및이들의 제조 방법 Download PDF

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KR101021725B1
KR101021725B1 KR1020040060105A KR20040060105A KR101021725B1 KR 101021725 B1 KR101021725 B1 KR 101021725B1 KR 1020040060105 A KR1020040060105 A KR 1020040060105A KR 20040060105 A KR20040060105 A KR 20040060105A KR 101021725 B1 KR101021725 B1 KR 101021725B1
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weight
resin composition
sensitive resin
radiation
microlens
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Korean (ko)
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KR20050014742A (ko
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히데끼 니시무라
다까끼 미노와
에이이찌로 우루시하라
에이지 다까모또
미찌노리 니시가와
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제이에스알 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020040060105A 2003-07-31 2004-07-30 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈 및이들의 제조 방법 Expired - Lifetime KR101021725B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00283291 2003-07-31
JP2003283291A JP4127150B2 (ja) 2003-07-31 2003-07-31 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

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KR20050014742A KR20050014742A (ko) 2005-02-07
KR101021725B1 true KR101021725B1 (ko) 2011-03-15

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KR1020040060105A Expired - Lifetime KR101021725B1 (ko) 2003-07-31 2004-07-30 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈 및이들의 제조 방법

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JP (1) JP4127150B2 (enExample)
KR (1) KR101021725B1 (enExample)
TW (1) TW200510932A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101221468B1 (ko) * 2005-01-27 2013-01-11 주식회사 동진쎄미켐 감광성 수지 조성물
KR100758879B1 (ko) * 2006-07-13 2007-09-14 제일모직주식회사 컬러필터 보호막용 일액형 열경화성 수지 조성물
KR100908694B1 (ko) * 2006-08-07 2009-07-22 도쿄 오카 고교 가부시키가이샤 층간절연막용 감광성 수지조성물 및 층간절연막의 형성방법
JP4935565B2 (ja) * 2007-08-01 2012-05-23 住友化学株式会社 感光性樹脂組成物
JP5240459B2 (ja) * 2008-02-19 2013-07-17 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法
WO2009122853A1 (ja) * 2008-03-31 2009-10-08 Jsr株式会社 ポジ型感放射線性樹脂組成物、マイクロレンズおよびマイクロレンズの形成方法
US9348224B2 (en) 2012-03-27 2016-05-24 Nissan Chemical Industries, Ltd. Photosensitive resin composition
WO2020032173A1 (ja) * 2018-08-10 2020-02-13 株式会社大阪ソーダ アクリル共重合体、及びゴム材料
JP7451270B2 (ja) * 2020-04-09 2024-03-18 Jsr株式会社 感放射線性組成物の処理方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06136239A (ja) * 1992-10-22 1994-05-17 Japan Synthetic Rubber Co Ltd マイクロレンズ用感放射線性樹脂組成物
KR19990037992A (ko) * 1997-11-01 1999-06-05 김영환 공중합체 수지와 포토레지스트 및 그 제조방법
KR20010062002A (ko) * 1999-12-01 2001-07-07 마쯔모또 에이찌 감방사선성 조성물 및 칼라 액정 표시 장치
KR20010111629A (ko) * 2000-06-12 2001-12-19 마쯔모또 에이찌 감방사선성 수지 조성물, 층간 절연막 및 마이크로 렌즈의제조 방법, 및 층간 절연막 및 마이크로 렌즈

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06136239A (ja) * 1992-10-22 1994-05-17 Japan Synthetic Rubber Co Ltd マイクロレンズ用感放射線性樹脂組成物
KR19990037992A (ko) * 1997-11-01 1999-06-05 김영환 공중합체 수지와 포토레지스트 및 그 제조방법
KR20010062002A (ko) * 1999-12-01 2001-07-07 마쯔모또 에이찌 감방사선성 조성물 및 칼라 액정 표시 장치
KR20010111629A (ko) * 2000-06-12 2001-12-19 마쯔모또 에이찌 감방사선성 수지 조성물, 층간 절연막 및 마이크로 렌즈의제조 방법, 및 층간 절연막 및 마이크로 렌즈

Also Published As

Publication number Publication date
JP4127150B2 (ja) 2008-07-30
TW200510932A (en) 2005-03-16
JP2005049720A (ja) 2005-02-24
TWI326799B (enExample) 2010-07-01
KR20050014742A (ko) 2005-02-07

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