KR101011779B1 - 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법 - Google Patents

기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법 Download PDF

Info

Publication number
KR101011779B1
KR101011779B1 KR1020080130455A KR20080130455A KR101011779B1 KR 101011779 B1 KR101011779 B1 KR 101011779B1 KR 1020080130455 A KR1020080130455 A KR 1020080130455A KR 20080130455 A KR20080130455 A KR 20080130455A KR 101011779 B1 KR101011779 B1 KR 101011779B1
Authority
KR
South Korea
Prior art keywords
image
focus
camera unit
photographed
substrate
Prior art date
Application number
KR1020080130455A
Other languages
English (en)
Korean (ko)
Other versions
KR20100071659A (ko
Inventor
정성덕
김현태
문원근
Original Assignee
에이피시스템 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이피시스템 주식회사 filed Critical 에이피시스템 주식회사
Priority to KR1020080130455A priority Critical patent/KR101011779B1/ko
Priority to TW098143385A priority patent/TWI397759B/zh
Priority to CN2009102606335A priority patent/CN101750714B/zh
Publication of KR20100071659A publication Critical patent/KR20100071659A/ko
Application granted granted Critical
Publication of KR101011779B1 publication Critical patent/KR101011779B1/ko

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00—Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G03B13/32—Means for focusing
    • G03B13/34—Power focusing
    • G03B13/36—Autofocus systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B3/00—Focusing arrangements of general interest for cameras, projectors or printers
    • G03B3/10—Power-operated focusing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Studio Devices (AREA)
KR1020080130455A 2008-12-19 2008-12-19 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법 KR101011779B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020080130455A KR101011779B1 (ko) 2008-12-19 2008-12-19 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법
TW098143385A TWI397759B (zh) 2008-12-19 2009-12-17 基板對準裝置的眼識系統以及該系統之控制對焦的方法
CN2009102606335A CN101750714B (zh) 2008-12-19 2009-12-18 用于衬底对准设备的视觉系统和用于控制其焦距的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080130455A KR101011779B1 (ko) 2008-12-19 2008-12-19 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법

Publications (2)

Publication Number Publication Date
KR20100071659A KR20100071659A (ko) 2010-06-29
KR101011779B1 true KR101011779B1 (ko) 2011-02-07

Family

ID=42369123

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080130455A KR101011779B1 (ko) 2008-12-19 2008-12-19 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법

Country Status (3)

Country Link
KR (1) KR101011779B1 (zh)
CN (1) CN101750714B (zh)
TW (1) TWI397759B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101034282B1 (ko) * 2009-07-31 2011-05-16 한국생산기술연구원 다중초점 대상체로부터 획득된 이미지에서의 초점 조절방법
KR101326107B1 (ko) * 2011-12-20 2013-11-06 삼성디스플레이 주식회사 레이저 가공장치 및 그 제어방법
KR101825091B1 (ko) * 2013-08-28 2018-02-02 에이피시스템 주식회사 마스크 기울기 보정 장치 및 기판 처리 장치
KR20160065275A (ko) 2014-11-28 2016-06-09 링크가가(주) 블루투스 신호를 이용한 통신신호 자동선택 분실방지 시스템 및 방법
KR20170041378A (ko) 2015-10-07 2017-04-17 삼성전자주식회사 기판 측정 방법 및 이를 이용한 반도체 장치 제조 방법
TWI585394B (zh) * 2015-12-09 2017-06-01 由田新技股份有限公司 動態式自動追焦系統
CN107422501B (zh) * 2017-08-31 2020-11-24 深圳市华星光电半导体显示技术有限公司 液晶母板显示影像获取方法
KR102258657B1 (ko) * 2020-03-17 2021-06-01 (주) 엠엔비젼 2d 설계 도면과 컴퓨터 비전을 이용한 제품 위치 추적 시스템

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10232343A (ja) 1996-12-18 1998-09-02 Nachi Fujikoshi Corp 自動焦点合わせ方法
KR19990048826A (ko) * 1997-12-11 1999-07-05 구자홍 고체 촬상 소자 카메라의 해상도 자동 결정장치 및 방법
KR19990070870A (ko) * 1998-02-25 1999-09-15 이종수 프로버의 자동 초점 방법
KR100784663B1 (ko) 2006-09-27 2007-12-12 주식회사 디이엔티 자동 다촛점 얼라인 장치 및 그 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
KR0174486B1 (ko) * 1995-09-28 1999-02-01 이해규 노광 장비에서 시시디 카메라를 이용한 정렬 장치
US7769219B2 (en) * 2006-12-11 2010-08-03 Cytyc Corporation Method for assessing image focus quality
WO2008071296A1 (en) * 2006-12-15 2008-06-19 Carl Zeiss Sms Gmbh Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10232343A (ja) 1996-12-18 1998-09-02 Nachi Fujikoshi Corp 自動焦点合わせ方法
KR19990048826A (ko) * 1997-12-11 1999-07-05 구자홍 고체 촬상 소자 카메라의 해상도 자동 결정장치 및 방법
KR19990070870A (ko) * 1998-02-25 1999-09-15 이종수 프로버의 자동 초점 방법
KR100784663B1 (ko) 2006-09-27 2007-12-12 주식회사 디이엔티 자동 다촛점 얼라인 장치 및 그 방법

Also Published As

Publication number Publication date
TWI397759B (zh) 2013-06-01
CN101750714B (zh) 2011-12-28
KR20100071659A (ko) 2010-06-29
TW201028785A (en) 2010-08-01
CN101750714A (zh) 2010-06-23

Similar Documents

Publication Publication Date Title
KR101011779B1 (ko) 기판 정렬 장치용 비전 시스템 및 이의 초점 조절 방법
JP7039656B2 (ja) アライメントマーク位置検出装置、蒸着装置および電子デバイスの製造方法
US9964403B2 (en) Device and method for detecting flatness of surface of display panel
CN110657946B (zh) 屏幕缺陷检测系统、屏幕检测线以及屏幕缺陷检测方法
CN103220482B (zh) 一种全自由度调整投影画面位置及尺寸的方法
US9454024B1 (en) Composite repairing apparatus for liquid crystal panel
TWI627492B (zh) 焦點調節方法及其作業裝置
JP6368766B2 (ja) 対象物の自動アライメント方法及びその自動アライメント検出装置
CN104931421B (zh) 液晶面板视觉检测系统的定位对焦方法
CN104698694B (zh) 一种液晶面板对合设备及方法
CN109507815B (zh) 一种液晶显示屏背光检测中快速定位缺陷位置的方法
KR20140146441A (ko) 박막증착장치의 자동정렬장치
JP5015552B2 (ja) パターン修正装置
JP5531883B2 (ja) 調整方法
JP2010243212A (ja) 傾斜検出方法、および傾斜検出装置
JP7092850B2 (ja) アライメント装置、成膜装置、アライメント方法、成膜方法、電子デバイスの製造方法
KR101153246B1 (ko) 기판검사방법
TW200303410A (en) Method and apparatus for measuring a line width
KR102069061B1 (ko) 플렉시블 oled 셀의 영상 획득 시스템
TW201003142A (en) Color filter defect correction method and color filter defect correction device
JP2006293387A (ja) ライトバルブの位置決め装置
KR102184620B1 (ko) 액정표시장치의 보상데이터 생성방법 및 장치
KR20140139929A (ko) 표시 패널의 검사 장치 및 검사 방법
US9164043B2 (en) Detecting method and detecting device
JP2005326471A (ja) フォーカス調整方法及びその装置並びにディスプレイの検査方法及びその装置

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20140127

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20150127

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20160126

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20161205

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20171218

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee