KR100996986B1 - 전기도금용 지그 - Google Patents
전기도금용 지그 Download PDFInfo
- Publication number
- KR100996986B1 KR100996986B1 KR1020060054988A KR20060054988A KR100996986B1 KR 100996986 B1 KR100996986 B1 KR 100996986B1 KR 1020060054988 A KR1020060054988 A KR 1020060054988A KR 20060054988 A KR20060054988 A KR 20060054988A KR 100996986 B1 KR100996986 B1 KR 100996986B1
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- KR
- South Korea
- Prior art keywords
- insulating plate
- plated object
- plate
- conductive rubber
- sealing member
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims (11)
- 개구부를 갖는 제1 절연판과,피도금물이 상기 개구부를 통해 외부로 노출되도록 그 피도금물을 상기 제1 절연판과의 사이에 끼워 지지하는 제2 절연판과,상기 제1 절연판과 상기 피도금물 사이에 개재되도록 설치되고, 상기 피도금물에 외부에서 공급되는 전기를 전도시키는 전도판을 구비한 전기도금용 지그로서,상기 전도판은, 상기 피도금물에 탄성적으로 접촉하는 도전고무를 이용하여 형성하며,상기 도전고무는, 상기 제1 절연판의 개구부를 주위로부터 둘러싸도록 배치되어 상기 피도금물에 면접촉하는 환상 또는 틀형상의 평판이며, 상기 피도금물의 둘레면에 그 피도금물의 둘레방향 전체에 걸쳐 탄성적으로 면접촉하며,상기 개구부의 둘레에 상기 제1 절연판과 상기 피도금물의 사이를 밀봉하는 내측 실링부재를 설치하고, 상기 도전고무의 주위에 상기 제1 절연판과 상기 제2 절연판의 사이를 밀봉하는 외측 실링부재를 설치하며, 상기 제1 절연판 및 상기 제2 절연판 중 적어도 어느 한쪽에는, 상기 제1 절연판, 상기 제2 절연판, 상기 내측 실링부재 및 상기 외측 실링부재에 의해 둘러싸이는 공간부를 진공압 상태로 유지하기 위한 공기흡입통로를 형성한 것을 특징으로 하는 전기도금용 지그.
- 삭제
- 제1항에 있어서,상기 제2 절연판과 상기 피도금물 사이에 상기 피도금물에 탄성적으로 접촉하는 고무소재의 탄성시트를 설치한 것을 특징으로 하는 전기도금용 지그.
- 개구부를 갖는 제1 절연판과,피도금물이 상기 개구부를 통해 외부로 노출되도록 그 피도금물을 상기 제1 절연판과의 사이에 끼워 지지하는 제2 절연판과,상기 제2 절연판과 상기 피도금물 사이에 개재되도록 설치되고, 상기 피도금물에 외부에서 공급되는 전기를 전도시키는 전도판을 구비한 전기도금용 지그로서,상기 전도판은, 상기 피도금물에 탄성적으로 접촉하는 도전고무를 이용하여 형성하며,상기 도전고무는, 상기 제1 절연판의 개구부를 주위로부터 둘러싸도록 배치되어 상기 피도금물에 면접촉하는 환상 또는 틀형상의 평판이며, 상기 피도금물의 둘레면에 그 피도금물의 둘레방향 전체에 걸쳐 탄성적으로 면접촉하며,상기 개구부의 둘레에 상기 제1 절연판과 상기 피도금물의 사이를 밀봉하는 내측 실링부재를 설치하고, 상기 도전고무의 주위에 상기 제1 절연판과 상기 제2 절연판의 사이를 밀봉하는 외측 실링부재를 설치하며, 상기 제1 절연판 및 상기 제2 절연판 중 적어도 어느 한쪽에는, 상기 제1 절연판, 상기 제2 절연판, 상기 내측 실링부재 및 상기 외측 실링부재에 의해 둘러싸이는 공간부를 진공압 상태로 유지하기 위한 공기흡입통로를 형성한 것을 특징으로 하는 전기도금용 지그.
- 제1항, 제3항 또는 제4항 중 어느 한 항에 있어서,상기 피도금물은, 반도체 웨이퍼, 유리 기판, 세라믹 기판, 프린트 기판 또는 알루미늄 기판인 것을 특징으로 하는 전기도금용 지그.
- 삭제
- 제1항, 제3항 또는 제4항 중 어느 한 항에 있어서,상기 제1 절연판 또는 상기 제2 절연판과 상기 도전고무 사이에 금속판을 설치한 것을 특징으로 하는 전기도금용 지그.
- 삭제
- 제5항에 있어서,상기 제1 절연판 또는 상기 제2 절연판과 상기 도전고무 사이에 금속판을 설치한 것을 특징으로 하는 전기도금용 지그.
- 삭제
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005179358A JP2006348373A (ja) | 2005-06-20 | 2005-06-20 | 電気めっき用治具 |
JPJP-P-2005-00179358 | 2005-06-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060133481A KR20060133481A (ko) | 2006-12-26 |
KR100996986B1 true KR100996986B1 (ko) | 2010-11-26 |
Family
ID=36754171
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060054988A KR100996986B1 (ko) | 2005-06-20 | 2006-06-19 | 전기도금용 지그 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7780824B2 (ko) |
EP (1) | EP1736569B1 (ko) |
JP (1) | JP2006348373A (ko) |
KR (1) | KR100996986B1 (ko) |
CN (1) | CN1908247B (ko) |
DE (1) | DE602006002185D1 (ko) |
TW (1) | TW200700586A (ko) |
Cited By (1)
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KR20210046986A (ko) | 2019-10-21 | 2021-04-29 | 주식회사 원테크 | 길이 및 각도 조절이 용이한 도금용 지그 |
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2005
- 2005-06-20 JP JP2005179358A patent/JP2006348373A/ja active Pending
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2006
- 2006-05-12 US US11/432,396 patent/US7780824B2/en not_active Expired - Fee Related
- 2006-05-15 TW TW095117150A patent/TW200700586A/zh unknown
- 2006-05-16 DE DE602006002185T patent/DE602006002185D1/de active Active
- 2006-05-16 EP EP06010102A patent/EP1736569B1/en active Active
- 2006-06-19 KR KR1020060054988A patent/KR100996986B1/ko active IP Right Grant
- 2006-06-20 CN CN2006101008985A patent/CN1908247B/zh active Active
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JPH10233400A (ja) | 1997-02-18 | 1998-09-02 | Casio Comput Co Ltd | 被メッキ部品固定治具およびそれを用いたメッキ方法 |
JPH11200096A (ja) | 1997-11-06 | 1999-07-27 | Ebara Corp | ウエハのメッキ用治具 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210046986A (ko) | 2019-10-21 | 2021-04-29 | 주식회사 원테크 | 길이 및 각도 조절이 용이한 도금용 지그 |
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Publication number | Publication date |
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EP1736569A1 (en) | 2006-12-27 |
US20060283704A1 (en) | 2006-12-21 |
US7780824B2 (en) | 2010-08-24 |
JP2006348373A (ja) | 2006-12-28 |
EP1736569B1 (en) | 2008-08-13 |
DE602006002185D1 (de) | 2008-09-25 |
CN1908247B (zh) | 2011-03-16 |
CN1908247A (zh) | 2007-02-07 |
TW200700586A (en) | 2007-01-01 |
KR20060133481A (ko) | 2006-12-26 |
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