KR100931712B1 - 레이저 빔 노광장치 및 그 방법 - Google Patents

레이저 빔 노광장치 및 그 방법 Download PDF

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Publication number
KR100931712B1
KR100931712B1 KR1020060108024A KR20060108024A KR100931712B1 KR 100931712 B1 KR100931712 B1 KR 100931712B1 KR 1020060108024 A KR1020060108024 A KR 1020060108024A KR 20060108024 A KR20060108024 A KR 20060108024A KR 100931712 B1 KR100931712 B1 KR 100931712B1
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South Korea
Prior art keywords
laser beam
substrate
irradiation
optical path
moving
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English (en)
Korean (ko)
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KR20070048613A (ko
Inventor
하루야스 켄모츠
히로아키 사토
야스히토 이케다
마사토 모리
Original Assignee
가부시키가이샤 오크세이사쿠쇼
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Publication of KR20070048613A publication Critical patent/KR20070048613A/ko
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Publication of KR100931712B1 publication Critical patent/KR100931712B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020060108024A 2005-11-04 2006-11-02 레이저 빔 노광장치 및 그 방법 Expired - Fee Related KR100931712B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00321256 2005-11-04
JP2005321256 2005-11-04
JPJP-P-2006-00246266 2006-09-12
JP2006246266A JP4533874B2 (ja) 2005-11-04 2006-09-12 レーザビーム露光装置

Publications (2)

Publication Number Publication Date
KR20070048613A KR20070048613A (ko) 2007-05-09
KR100931712B1 true KR100931712B1 (ko) 2009-12-14

Family

ID=38209773

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KR1020060108024A Expired - Fee Related KR100931712B1 (ko) 2005-11-04 2006-11-02 레이저 빔 노광장치 및 그 방법

Country Status (3)

Country Link
JP (1) JP4533874B2 (https=)
KR (1) KR100931712B1 (https=)
TW (1) TW200719101A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101048785B1 (ko) * 2008-09-25 2011-07-15 에이티엘(주) 디지털 노광 장치
KR102225208B1 (ko) * 2019-05-13 2021-03-09 디아이티 주식회사 반도체 표면처리 시스템 및 방법
JP2024042874A (ja) * 2022-09-16 2024-03-29 株式会社Ｓｃｒｅｅｎホールディングス 露光方法および露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10235480A (ja) 1996-12-27 1998-09-08 Omron Corp レーザビームを用いてマーキングするための方法、並びに、表示パネルの製造工程においてガラス基板に識別情報をマーキングするための方法
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
US20040241340A1 (en) * 2001-10-25 2004-12-02 Kenji Sato Method and device for marking identification code by laser beam
KR20060053045A (ko) * 2004-11-13 2006-05-19 삼성전자주식회사 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10235480A (ja) 1996-12-27 1998-09-08 Omron Corp レーザビームを用いてマーキングするための方法、並びに、表示パネルの製造工程においてガラス基板に識別情報をマーキングするための方法
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
US20040241340A1 (en) * 2001-10-25 2004-12-02 Kenji Sato Method and device for marking identification code by laser beam
KR20060053045A (ko) * 2004-11-13 2006-05-19 삼성전자주식회사 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법

Also Published As

Publication number Publication date
TW200719101A (en) 2007-05-16
TWI324283B (https=) 2010-05-01
JP2007148359A (ja) 2007-06-14
KR20070048613A (ko) 2007-05-09
JP4533874B2 (ja) 2010-09-01

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