KR100929723B1 - 착색 감광성 수지 조성물 - Google Patents

착색 감광성 수지 조성물 Download PDF

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Publication number
KR100929723B1
KR100929723B1 KR1020070110303A KR20070110303A KR100929723B1 KR 100929723 B1 KR100929723 B1 KR 100929723B1 KR 1020070110303 A KR1020070110303 A KR 1020070110303A KR 20070110303 A KR20070110303 A KR 20070110303A KR 100929723 B1 KR100929723 B1 KR 100929723B1
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South Korea
Prior art keywords
compound
photosensitive resin
resin composition
meth
monomer
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Korean (ko)
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KR20080043703A (ko
Inventor
다이 시오타
마사루 시다
야스히데 오후치
테츠야 카토
키요시 우치가와
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도쿄 오카 고교 가부시키가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020070110303A 2006-11-14 2007-10-31 착색 감광성 수지 조성물 Active KR100929723B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006308397A JP4949809B2 (ja) 2006-11-14 2006-11-14 着色感光性樹脂組成物
JPJP-P-2006-00308397 2006-11-14

Publications (2)

Publication Number Publication Date
KR20080043703A KR20080043703A (ko) 2008-05-19
KR100929723B1 true KR100929723B1 (ko) 2009-12-03

Family

ID=39448536

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070110303A Active KR100929723B1 (ko) 2006-11-14 2007-10-31 착색 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP4949809B2 (cg-RX-API-DMAC7.html)
KR (1) KR100929723B1 (cg-RX-API-DMAC7.html)
CN (1) CN101183218B (cg-RX-API-DMAC7.html)
TW (1) TW200821752A (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5173543B2 (ja) * 2008-04-08 2013-04-03 東京応化工業株式会社 ポジ型感光性樹脂組成物
US8829070B2 (en) 2009-08-31 2014-09-09 Kabushiki Kaisha Toshiba Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same
TWI570509B (zh) * 2010-10-05 2017-02-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP4988032B2 (ja) * 2010-12-08 2012-08-01 株式会社東芝 磁気記録媒体の製造方法
JP5039199B2 (ja) * 2010-12-08 2012-10-03 株式会社東芝 パターン転写に用いられる紫外線硬化性樹脂材料
JP5744528B2 (ja) * 2011-01-11 2015-07-08 東京応化工業株式会社 タッチパネル用着色感光性樹脂組成物、タッチパネル、及び表示装置
KR102344138B1 (ko) * 2014-03-31 2021-12-28 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 차광막용 감광성 수지 조성물, 이것을 경화한 차광막 및 컬러 필터

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010095268A (ko) * 2000-04-03 2001-11-03 타키모토 마사아키 포지티브 감광성 수지조성물
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
KR20040105575A (ko) * 2003-06-05 2004-12-16 신닛테츠가가쿠 가부시키가이샤 블랙 레지스트용 감광성 수지조성물 및 이것을 이용하여형성된 차광막
KR20050088119A (ko) * 2002-12-16 2005-09-01 쇼와 덴코 가부시키가이샤 컬러필터 블랙 매트릭스 레지스트 조성물

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204378A (en) * 1986-03-24 1993-04-20 Nippon Telegraph And Telephone Corporation Fluorine-containing epoxy(meth)acrylate resin adhesive cured in presence of photoinitiator
WO2004042474A1 (ja) * 2002-11-06 2004-05-21 Asahi Glass Company, Limited ネガ型感光性樹脂組成物
CN101017324A (zh) * 2003-03-12 2007-08-15 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
JP4595374B2 (ja) * 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP5177933B2 (ja) * 2003-08-12 2013-04-10 東洋インキＳｃホールディングス株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
JP4448381B2 (ja) * 2004-05-26 2010-04-07 東京応化工業株式会社 感光性組成物
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4889629B2 (ja) * 2005-07-20 2012-03-07 凸版印刷株式会社 アルカリ現像型感光性着色組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010095268A (ko) * 2000-04-03 2001-11-03 타키모토 마사아키 포지티브 감광성 수지조성물
KR20050088119A (ko) * 2002-12-16 2005-09-01 쇼와 덴코 가부시키가이샤 컬러필터 블랙 매트릭스 레지스트 조성물
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
KR20040105575A (ko) * 2003-06-05 2004-12-16 신닛테츠가가쿠 가부시키가이샤 블랙 레지스트용 감광성 수지조성물 및 이것을 이용하여형성된 차광막

Also Published As

Publication number Publication date
TW200821752A (en) 2008-05-16
CN101183218A (zh) 2008-05-21
JP2008122805A (ja) 2008-05-29
JP4949809B2 (ja) 2012-06-13
KR20080043703A (ko) 2008-05-19
TWI376569B (cg-RX-API-DMAC7.html) 2012-11-11
CN101183218B (zh) 2011-06-01

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