KR100923743B1 - 부식 방지 조성물 - Google Patents
부식 방지 조성물 Download PDFInfo
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- KR100923743B1 KR100923743B1 KR1020020051377A KR20020051377A KR100923743B1 KR 100923743 B1 KR100923743 B1 KR 100923743B1 KR 1020020051377 A KR1020020051377 A KR 1020020051377A KR 20020051377 A KR20020051377 A KR 20020051377A KR 100923743 B1 KR100923743 B1 KR 100923743B1
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- KR
- South Korea
- Prior art keywords
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- branched
- straight chain
- formula
- methyl
- Prior art date
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- 238000005260 corrosion Methods 0.000 title claims abstract description 67
- 230000007797 corrosion Effects 0.000 title claims abstract description 64
- 239000000203 mixture Substances 0.000 title abstract description 95
- 230000002401 inhibitory effect Effects 0.000 title 1
- 229920000642 polymer Polymers 0.000 claims abstract description 88
- 229910052751 metal Inorganic materials 0.000 claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 46
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 33
- 239000003112 inhibitor Substances 0.000 claims abstract description 17
- 239000003139 biocide Substances 0.000 claims abstract description 15
- 239000008096 xylene Substances 0.000 claims description 49
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 41
- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical compound [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 claims description 39
- 229910052739 hydrogen Inorganic materials 0.000 claims description 37
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 36
- -1 alkyl hydroperoxide Chemical compound 0.000 claims description 35
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 34
- 239000000178 monomer Substances 0.000 claims description 34
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 31
- 239000001257 hydrogen Substances 0.000 claims description 31
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 30
- 125000003342 alkenyl group Chemical group 0.000 claims description 24
- KFZMGEQAYNKOFK-UHFFFAOYSA-N isopropyl alcohol Natural products CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 24
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 21
- 150000003949 imides Chemical class 0.000 claims description 20
- 239000003999 initiator Substances 0.000 claims description 20
- 150000001408 amides Chemical class 0.000 claims description 18
- 150000002739 metals Chemical class 0.000 claims description 18
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 17
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 17
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 10
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 claims description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 8
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 claims description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 8
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 8
- 239000012986 chain transfer agent Substances 0.000 claims description 8
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 claims description 7
- LEHHVZLJDWFIMZ-UHFFFAOYSA-N 7a-cyclohex-3-en-1-yl-4,5-dihydro-3ah-2-benzofuran-1,3-dione Chemical compound C1=CCCC2C(=O)OC(=O)C21C1CCC=CC1 LEHHVZLJDWFIMZ-UHFFFAOYSA-N 0.000 claims description 7
- 125000005842 heteroatom Chemical group 0.000 claims description 7
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
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- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 150000003852 triazoles Chemical class 0.000 claims description 5
- JRZJOMJEPLMPRA-UHFFFAOYSA-N 1-nonene Chemical compound CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 4
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 claims description 4
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 claims description 4
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 4
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 claims description 4
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 claims description 4
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 claims description 4
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 4
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 4
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 claims description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 claims description 4
- 235000021286 stilbenes Nutrition 0.000 claims description 4
- 150000003536 tetrazoles Chemical class 0.000 claims description 4
- 229930192474 thiophene Natural products 0.000 claims description 4
- 125000002015 acyclic group Chemical group 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 125000002883 imidazolyl group Chemical group 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 150000001299 aldehydes Chemical class 0.000 claims description 2
- 150000002978 peroxides Chemical class 0.000 claims description 2
- 239000002455 scale inhibitor Substances 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 239000000539 dimer Substances 0.000 claims 3
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims 3
- 150000003217 pyrazoles Chemical class 0.000 claims 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims 1
- 125000005600 alkyl phosphonate group Chemical group 0.000 claims 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 13
- 230000001590 oxidative effect Effects 0.000 abstract description 13
- 239000010949 copper Substances 0.000 abstract description 12
- 229910052802 copper Inorganic materials 0.000 abstract description 11
- 239000003518 caustics Substances 0.000 abstract description 9
- 230000004888 barrier function Effects 0.000 abstract description 4
- 230000002035 prolonged effect Effects 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 60
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 45
- 230000015572 biosynthetic process Effects 0.000 description 37
- 230000002829 reductive effect Effects 0.000 description 37
- 238000003786 synthesis reaction Methods 0.000 description 35
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 20
- 238000007306 functionalization reaction Methods 0.000 description 18
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000000460 chlorine Substances 0.000 description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 229910052801 chlorine Inorganic materials 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 13
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 11
- 239000012964 benzotriazole Substances 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- 238000001816 cooling Methods 0.000 description 10
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 10
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- 125000004433 nitrogen atom Chemical group N* 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- UWNADWZGEHDQAB-UHFFFAOYSA-N 2,5-dimethylhexane Chemical group CC(C)CCC(C)C UWNADWZGEHDQAB-UHFFFAOYSA-N 0.000 description 7
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 229940014800 succinic anhydride Drugs 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
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- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 6
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000000571 coke Substances 0.000 description 5
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 5
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- 229910052757 nitrogen Inorganic materials 0.000 description 5
- KNCYXPMJDCCGSJ-UHFFFAOYSA-N piperidine-2,6-dione Chemical compound O=C1CCCC(=O)N1 KNCYXPMJDCCGSJ-UHFFFAOYSA-N 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 229960002317 succinimide Drugs 0.000 description 5
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
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- 239000012043 crude product Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 4
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- 239000007800 oxidant agent Substances 0.000 description 4
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- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 229910019093 NaOCl Inorganic materials 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000003158 alcohol group Chemical group 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001447 alkali salts Chemical class 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000003115 biocidal effect Effects 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
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- 239000011248 coating agent Substances 0.000 description 3
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- 125000000524 functional group Chemical group 0.000 description 3
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000005057 refrigeration Methods 0.000 description 3
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- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 3
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- XMGQYMWWDOXHJM-JTQLQIEISA-N (+)-α-limonene Chemical compound CC(=C)[C@@H]1CCC(C)=CC1 XMGQYMWWDOXHJM-JTQLQIEISA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- YZUPZGFPHUVJKC-UHFFFAOYSA-N 1-bromo-2-methoxyethane Chemical compound COCCBr YZUPZGFPHUVJKC-UHFFFAOYSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical compound CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 2
- GQEZCXVZFLOKMC-UHFFFAOYSA-N 1-hexadecene Chemical compound CCCCCCCCCCCCCCC=C GQEZCXVZFLOKMC-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical group CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
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- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- KRWWZDVIEFSIOT-UHFFFAOYSA-N ethenyl acetate;furan-2,5-dione Chemical compound CC(=O)OC=C.O=C1OC(=O)C=C1 KRWWZDVIEFSIOT-UHFFFAOYSA-N 0.000 description 1
- MKPXKNNHBMTVFM-UHFFFAOYSA-N ethenylperoxyethane Chemical class CCOOC=C MKPXKNNHBMTVFM-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ALBYIUDWACNRRB-UHFFFAOYSA-N hexanamide Chemical compound CCCCCC(N)=O ALBYIUDWACNRRB-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 239000003752 hydrotrope Substances 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical class OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- JFZUABNDWZQLIJ-UHFFFAOYSA-N methyl 2-[(2-chloroacetyl)amino]benzoate Chemical compound COC(=O)C1=CC=CC=C1NC(=O)CCl JFZUABNDWZQLIJ-UHFFFAOYSA-N 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000019645 odor Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- XTUSEBKMEQERQV-UHFFFAOYSA-N propan-2-ol;hydrate Chemical compound O.CC(C)O XTUSEBKMEQERQV-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HDOUGSFASVGDCS-UHFFFAOYSA-N pyridin-3-ylmethanamine Chemical compound NCC1=CC=CN=C1 HDOUGSFASVGDCS-UHFFFAOYSA-N 0.000 description 1
- 238000007342 radical addition reaction Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 229960001922 sodium perborate Drugs 0.000 description 1
- 229940048842 sodium xylenesulfonate Drugs 0.000 description 1
- QUCDWLYKDRVKMI-UHFFFAOYSA-M sodium;3,4-dimethylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1C QUCDWLYKDRVKMI-UHFFFAOYSA-M 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- YKLJGMBLPUQQOI-UHFFFAOYSA-M sodium;oxidooxy(oxo)borane Chemical compound [Na+].[O-]OB=O YKLJGMBLPUQQOI-UHFFFAOYSA-M 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 125000000437 thiazol-2-yl group Chemical group [H]C1=C([H])N=C(*)S1 0.000 description 1
- 125000004495 thiazol-4-yl group Chemical group S1C=NC(=C1)* 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003613 toluenes Chemical class 0.000 description 1
- 231100000440 toxicity profile Toxicity 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000004260 weight control Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 235000016804 zinc Nutrition 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/173—Macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/40—Imides, e.g. cyclic imides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Abstract
Description
실시예 | 샘플 | mpy (3ppm) | NaOCl로 처리 mpy(3ppm) |
비교예 | 무 | 3.42 | 3.09 |
비교예 | Cobratec TT-100 PMC | 0.05 | 1.24 |
비교예 | Cobratec 99 PMC | 0.02 | 2.16 |
1 | A | - | 1.70 |
2 | B | - | 1.88 |
4 | C-1 C-2 | 0.16 0.42 | 0.34 0.59 |
5 | D | - | 0.31 |
6 | E F | 0.85 1.16 | |
7 | G H | - - | 0.42 1.33 |
8 | I J | - - | 0.36 0.54 |
9 | K L | - - | 0.34 1.00 |
11 | M | - | 0.84 |
12 | N | - | 0.50 |
13 | O | - | 0.37 |
14 | P | - | 0.15 |
15 | Q | - | 2.06 |
16 | R | - | 1.16 |
17 | S | - | 0.98 |
18 | T | - | 1.14 |
19 | U | - | 1.10 |
20 | V | - | 1.95 |
21 | W | - | 2.37 |
22 | X | - | 4.83 |
24 | Y | - | 2.70 |
25 | Z | - | 2.72 |
26 | AA | - | 2.04 |
27 | BB | - | 2.27 |
28 | CC | - | 1.08 |
29 | DD | - | 2.04 |
30 | EE | - | 1.24 |
31 | FF | 0.44 | 2.36 |
32 | GG | 0.63 | 2.83 |
33 | HH | - | 2.70 |
34 | II | - | 2.61 |
35 | JJ | - | 2.49 |
36 | KK | 0.64 | 0.97 |
37 | LL | - | 4.30 |
38 | MM | - | 1.39 |
Claims (10)
- 부식 방지를 위하여 금속을 포함하는 수성 시스템을 처리하는데 있어서,최소 하나의 화학식 Ⅰa의 반복 유니트:[화학식 Ⅰa](상기 화학식 Ⅰa에서, n은 0 또는 1이고; R 및 R1은 수소, 메틸 및 C2-C4 알킬로 이루어지는 그룹으로부터 독립적으로 선택되며; R2는 C1-C8 분지 또는 직쇄 알킬기, C2-C8 분지 또는 직쇄 알케닐기, C3-C8 고리 알킬기, C2-C4 알킬렌 옥사이드기 및 폴리(C2-C4 알킬렌)m 옥사이드(m은 2-20)로 이루어지는 그룹으로부터 선택되고; 펜던트 헤테로고리는 이미다졸, 트리아졸 및 이들 각각의 이성질체, 티오펜, 피롤, 옥사졸, 티아졸 및 이들 각각의 이성질체, 피라졸, 테트라졸, 피리딘, 피리다진, 피리미딘, 피라진 및 이들의 조합으로 이루어지는 그룹으로부터 선택되고, 펜던트 헤테로고리는 헤테로고리의 일부인 헤테로 원자 또는 헤테로고리의 탄소 원자를 통해 R2에 화학적으로 결합된다); 및말레산 무수물, 이타콘산 무수물, 시클로헥스-4-에닐 테트라하이드로프탈산 무수물, 프로필렌 4합체(tetramer), 프로필렌 삼합체(trimer)의 이합체(dimer), 히드록시 스티렌, 스티렌 술폰산, 부타디엔, 비닐 아세테이트, 비닐 부티레이트, 비닐 클로라이드, 비닐리덴 클로라이드, 스틸벤(stilbene), 디비닐 벤젠, (메트)아크릴레이트 에스테르 및 하기 화학식의 단량체로 이루어지는 그룹으로부터 선택되는 최소 하나의 에틸렌계 불포화 단량체:(여기에서, R5는 수소, 페닐, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬 및 C3-C18 분지 또는 직쇄 알케닐기로 이루어지는 그룹으로부터 선택되고;R6은 수소, 메틸, 에틸, 페닐, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기, OR8 및 CH2OR8기로 이루어지는 그룹으로부터 독립적으로 선택되며, 여기서 R8은 아세테이트, 글리시딜, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기 및 식 [CH2CH(Ra)O]mRb를 갖는 기로 이루어지는 그룹으로부터 선택되고, 여기서 Ra는 수소, 메틸, 에틸 또는 페닐이며, m은 1-20의 정수이고, Rb는 독립적으로 수소, 메틸, 에틸, 페닐 또는 벤질이며;R7은 H, CH3, C2H5, CN, 및 COR9(R9는 OH, NH2 또는 OR8(R8은 상기 정의된 바와 같다)이다)로 이루어지는 그룹으로부터 독립적으로 선택된다)를 포함하는 중합체를 시스템에 첨가하는 것을 포함하는 방법.
- 부식 방지를 위하여 금속을 포함하는 수성 시스템을 처리하는데 있어서,하기 화학식 Ⅰa의 작용화된 이미드 성분 및 하기 화학식 Ⅰb의 작용화된 아미드 성분의 하나 이상의 반복 유니트:[화학식 Ⅰa] [화학식 Ⅰb](상기 화학식 Ⅰa 및 Ⅰb에서, n은 0 또는 1이고; R 및 R1은 수소, 메틸 및 C2-C4 알킬로 이루어지는 그룹으로부터 독립적으로 선택되며; R2는 C1-C8 분지 또는 직쇄 알킬기, C2-C8 분지 또는 직쇄 알케닐기, C3-C8 고리 알킬기, C6-C10 불포화 비고리, 고리 및 방향족기, C2-C4 알킬렌 옥사이드기 및 폴리(C2-C4 알킬렌)m 옥사이드(m은 2-20)로 이루어지는 그룹으로부터 선택되고; 펜던트 헤테로고리는 이미다졸, 트리아졸 및 이들 각각의 이성질체, 티오펜, 피롤, 옥사졸, 티아졸 및 이들 각각의 이성질체, 피라졸, 테트라졸, 피리딘, 피리다진, 피리미딘, 피라진 및 이들의 조합으로 이루어지는 그룹으로부터 선택되고, 펜던트 헤테로고리는 헤테로고리의 일부인 헤테로 원자 또는 헤테로고리의 탄소 원자를 통해 R2에 화학적으로 결합되며;상기 화학식 Ⅰb에서, R3는 수소, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬 및 C3-C18 분지 또는 직쇄 알케닐기로 이루어지는 그룹으로부터 선택되고; R4는 H, CH3, C2H5, C6H5, C3-C18 분지 또는 직쇄 알킬기 및 C3-C18 알케닐기로 이루어지는 그룹으로부터 선택된다); 및말레산 무수물, 이타콘산 무수물, 시클로헥스-4-에닐 테트라하이드로프탈산 무수물, 프로필렌 4합체(tetramer), 프로필렌 삼합체(trimer)의 이합체(dimer), 히드록시 스티렌, 스티렌 술폰산, 부타디엔, 비닐 아세테이트, 비닐 부티레이트, 비닐 클로라이드, 비닐리덴 클로라이드, 스틸벤(stilbene), 디비닐 벤젠, (메트)아크릴레이트 에스테르 및 하기 화학식의 단량체로 이루어지는 그룹으로부터 선택되는 최소 하나의 에틸렌계 불포화 단량체:(여기에서, R5는 수소, 페닐, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬 및 C3-C18 분지 또는 직쇄 알케닐기로 이루어지는 그룹으로부터 선택되고;R6은 수소, 메틸, 에틸, 페닐, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기, OR8 및 CH2OR8기로 이루어지는 그룹으로부터 독립적으로 선택되며, 여기서 R8은 아세테이트, 글리시딜, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기 및 식 [CH2CH(Ra)O]mRb를 갖는 기로 이루어지는 그룹으로부터 선택되고, 여기서 Ra는 수소, 메틸, 에틸 또는 페닐이며, m은 1-20의 정수이고, Rb는 독립적으로 수소, 메틸, 에틸, 페닐 또는 벤질이며;R7은 H, CH3, C2H5, CN, 및 COR9(R9는 OH, NH2 또는 OR8(R8은 상기 정의된 바와 같다)이다)로 이루어지는 그룹으로부터 독립적으로 선택된다)를 포함하는 중합체를 시스템에 첨가하는 것을 포함하는 방법.
- 부식 방지를 위하여 금속을 포함하는 수성 시스템을 처리하는데 있어서,화학성분 A, B 및 C를 포함하는 중합체를 시스템에 첨가하는 것을 포함하는 방법:여기에서, A는 개시제 분획, 사슬전달제 분획, 용매 분획 및 이들의 조합으로부터 선택된 하나 이상의 말단기를 포함하고;B는 하기 화학식 Ⅰa의 작용화된 이미드 성분, 하기 화학식 Ⅰb의 작용화된 아미드 성분, 및 Ⅰa와 Ⅰb의 조합으로부터 선택된 적어도 하나 이상의 반복 유니트를 포함하며[화학식 Ⅰa] [화학식 Ⅰb](상기 화학식 Ⅰa 및 Ⅰb에서, n은 0 또는 1이고; R 및 R1은 수소, 메틸 및 C2-C4 알킬로 이루어지는 그룹으로부터 독립적으로 선택되며; R2는 C1-C8 분지 또는 직쇄 알킬기, C2-C8 분지 또는 직쇄 알케닐기, C3-C8 고리 알킬기, C6-C10 불포화 비고리, 고리 및 방향족기, C2-C4 알킬렌 옥사이드기 및 폴리(C2-C4 알킬렌)m 옥사이드(m은 2-20)로 이루어지는 그룹으로부터 선택되고; 펜던트 헤테로고리는 이미다졸, 트리아졸 및 이들 각각의 이성질체, 티오펜, 피롤, 옥사졸, 티아졸 및 이들 각각의 이성질체, 피라졸, 테트라졸, 피리딘, 피리다진, 피리미딘, 피라진 및 이들의 조합으로 이루어지는 그룹으로부터 선택되고, 펜던트 헤테로고리는 헤테로고리의 일부인 헤테로 원자 또는 헤테로고리의 탄소 원자를 통해 R2에 화학적으로 결합되며;상기 화학식 Ⅰb에서, R3는 수소, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬 및 C3-C18 분지 또는 직쇄 알케닐기로 이루어지는 그룹으로부터 선택되고; R4는 H, CH3, C2H5, C6H5, C3-C18 분지 또는 직쇄 알킬기 및 C3-C18 알케닐기로 이루어지는 그룹으로부터 선택된다);C는 말레산 무수물, 이타콘산 무수물, 시클로헥스-4-에닐 테트라하이드로프탈산 무수물, 프로필렌 4합체(tetramer), 프로필렌 삼합체(trimer)의 이합체(dimer), 히드록시 스티렌, 스티렌 술폰산, 부타디엔, 비닐 아세테이트, 비닐 부티레이트, 비닐 클로라이드, 비닐리덴 클로라이드, 스틸벤(stilbene), 디비닐 벤젠, (메트)아크릴레이트 에스테르 및 하기 화학식의 단량체로 이루어지는 그룹으로부터 선택되는 최소 하나의 에틸렌계 불포화 단량체:(여기에서, R5는 수소, 페닐, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬, 및 C3-C18 분지 또는 직쇄 알케닐기로 이루어지는 그룹으로부터 선택되고;R6은 수소, 메틸, 에틸, 페닐, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기, OR8 및 CH2OR8기로 이루어지는 그룹으로부터 독립적으로 선택되며, 여기서 R8은 아세테이트, 글리시딜, 메틸, 에틸, C3-C18 분지 또는 직쇄 알킬기, C3-C18 분지 또는 직쇄 알케닐기 및 식 [CH2CH(Ra)O]mRb를 갖는 기로 이루어지는 그룹으로부터 선택되고, 여기서 Ra는 수소, 메틸, 에틸 또는 페닐이며, m은 1-20의 정수이고, Rb는 독립적으로 수소, 메틸, 에틸, 페닐 또는 벤질이며;R7은 H, CH3, C2H5, CN, 및 COR9(R9는 OH, NH2 또는 OR8(R8은 상기 정의된 바와 같다)이다)로 이루어지는 그룹으로부터 독립적으로 선택된다)를 나타낸다.
- 제3항에 있어서, 상기 A가 디알킬 퍼옥사이드, 알킬 하이드로퍼옥사이드, n-도데실 이소프로필 알코올, 알킬 포스포네이트, 알킬 포스파이트, 아릴 포스핀산, 알킬 포스핀산, 하이포포스파이트, 알데히드, 포르메이트, 톨루엔, 크실렌 및 C9-C10 알킬방향족으로 이루어지는 그룹으로부터 선택되는 것을 특징으로 하는 방법.
- 제1항 내지 제4항 중 어느 한 항에 있어서, 살생물제, 스케일 방지제, 부식방지제, 계면활성제, 소포제, 불활성 형광 트레이서 및 이들의 조합으로 이루어지는 그룹으로부터 선택되는 하나 이상의 첨가제를 수성 시스템에 첨가하는 것을 추가로 포함하는 방법.
- 제5항에 있어서, 중합체의 양이 0.1ppm 내지 50,000ppm인 것을 특징으로 하는 방법.
- 제6항에 있어서, 중합체의 양이 1ppm 내지 500ppm인 것을 특징으로 하는 방법.
- 제7항에 있어서, 중합체의 양이 1ppm 내지 100ppm인 것을 특징으로 하는 방법.
- 제1항 내지 제4항 중 어느 한 항에 있어서, 수성 시스템의 pH가 6 내지 10인 것을 특징으로 하는 방법.
- 삭제
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- 2002-08-22 AU AU2002300709A patent/AU2002300709B2/en not_active Ceased
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- 2002-08-29 MX MXPA02008468A patent/MXPA02008468A/es active IP Right Grant
- 2002-09-02 JP JP2002256979A patent/JP4167869B2/ja not_active Expired - Fee Related
- 2002-09-02 CN CNB021416044A patent/CN1326889C/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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KR20030020826A (ko) | 2003-03-10 |
CA2398423A1 (en) | 2003-03-04 |
CN1406988A (zh) | 2003-04-02 |
CA2398423C (en) | 2009-11-10 |
MXPA02008468A (es) | 2005-08-26 |
US6646082B2 (en) | 2003-11-11 |
JP2003176319A (ja) | 2003-06-24 |
US20030065116A1 (en) | 2003-04-03 |
JP4167869B2 (ja) | 2008-10-22 |
EP1288232A2 (en) | 2003-03-05 |
EP1288232A3 (en) | 2004-01-14 |
AU2002300709B2 (en) | 2006-12-21 |
CN1326889C (zh) | 2007-07-18 |
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