KR100867661B1 - 고주파 저유전율 저손실의 열경화성 수지 조성물 - Google Patents
고주파 저유전율 저손실의 열경화성 수지 조성물 Download PDFInfo
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- KR100867661B1 KR100867661B1 KR1020060134758A KR20060134758A KR100867661B1 KR 100867661 B1 KR100867661 B1 KR 100867661B1 KR 1020060134758 A KR1020060134758 A KR 1020060134758A KR 20060134758 A KR20060134758 A KR 20060134758A KR 100867661 B1 KR100867661 B1 KR 100867661B1
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- IPJGAEWUPXWFPL-UHFFFAOYSA-N O=C(C=CC1=O)N1c1cc(N(C(C=C2)=O)C2=O)ccc1 Chemical compound O=C(C=CC1=O)N1c1cc(N(C(C=C2)=O)C2=O)ccc1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
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- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
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Abstract
Description
모조성 | 가교제 | 개시제 | 가교제:개시제 | 유전율 | 유전손실 | ||
1㎓ | 9.4㎓ | 1㎓ | 9.4㎓ | ||||
95 | 5 | Tert-butylperoxybenzoate(TBPB) | 20:1 | 2.25 | 2.22 | 0.0016 | 0.0025 |
90 | 10 | 2.32 | 2.3 | 0.0023 | 0.0028 | ||
85 | 15 | 2.4 | 2.35 | 0.0025 | 0.0033 | ||
80 | 20 | 2.46 | 2.45 | 0.004 | 0.006 |
Claims (16)
- 폴리페닐렌옥사이드(PPO)와 폴리스티렌(PS)이 6:4 내지 8:2의 중량비율로 포함되어 이루어지는 모수지;가교제; 및개시제가 포함되어 이루어지고,상기 가교제는 열가교성 수지로써, N,N~-M-PHENYLENEDIMALEIMIDE계 가교제인 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 삭제
- 삭제
- 제1항에 있어서, 상기 가교제가 상기 모수지에 대하여 1/20 내지 1/3의 중량비율에 해당하는 양으로 포함되어 이루어지는 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제1항에 있어서, 상기 개시제가 상기 가교제에 대하여 1/20 내지 1/5의 중량비율에 해당하는 양으로 포함되어 이루어지는 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 삭제
- 제1항에 있어서, 상기 개시제는 퍼옥시 에스테르(peroxy ester)계 개시제 또는 디알킬(dialkyl)계 개시제인 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제7항에 있어서, 상기 퍼옥시 에스테르(peroxy ester)계 개시제는 TBPB(Tert-butyl peroxybenzoate)인 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제1항에 있어서, 상기 모수지에 대하여 1/10 내지 1/5의 중량비율에 해당하는 양의 SBS(styren-butadiene-styren)를 더 포함하여 이루어지는 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제1항에 있어서, 경화시킨 후에 1 내지 20㎓의 고주파 대역에서 유전율을 측정하면 유전율이 2.5 이하인 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제1항에 있어서, 경화시킨 후에 1 내지 20㎓의 고주파 대역에서 유전손실을 측정하면 유전손실이 0.006 이하인 것을 특징으로 하는 고주파 저유전율 저손실의 열경화성 수지 조성물.
- 제1항, 제4항, 제5항, 및 제7항 내지 제11항 중 어느 한 항에 따른 열경화성 수지 조성물을 사용하여 제조된 것을 특징으로 하는 프리프레그.
- 제12항에 따른 프리프레그가 여러장 적층되어 있는 것을 특징으로 하는 적층판.
- 제13항에 기재된 적층판의 한면 또는 양면에 금속층이 형성되어 있는 것을 특징으로 하는 적층판.
- 제14항에 있어서, 상기 금속층의 두께가 5 내지 200 ㎛인 것을 특징으로 하는 적층판.
- 제14항에 기재된 적층판을 회로 가공하여 이루어진 것을 특징으로 하는 프린트 배선용 기판.
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CN104725828B (zh) | 2015-03-04 | 2017-11-21 | 广东生益科技股份有限公司 | 一种树脂组合物以及使用它的预浸料和层压板 |
CN104725857B (zh) | 2015-03-05 | 2017-11-03 | 广东生益科技股份有限公司 | 一种树脂组合物以及使用它的预浸料和层压板 |
CN111925641A (zh) * | 2020-07-24 | 2020-11-13 | 深圳市艾诺信射频电路有限公司 | 一种热固性树脂组合物的制备方法及其应用 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4073830A (en) * | 1973-10-11 | 1978-02-14 | Raychem Corporation | Poly(tetramethyleneterephthalate) crosslinked by irradiation |
JP2003012710A (ja) | 2001-07-02 | 2003-01-15 | Hitachi Ltd | 低誘電正接樹脂組成物、その硬化物ならびに該組成物を用いたプリプレグ、積層板及び多層プリント基板 |
KR20050028779A (ko) * | 2003-09-19 | 2005-03-23 | 히다치 가세고교 가부시끼가이샤 | 수지조성물, 그것을 사용한 프리프레그, 적층판 및 다층프린트 배선판 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4073830A (en) * | 1973-10-11 | 1978-02-14 | Raychem Corporation | Poly(tetramethyleneterephthalate) crosslinked by irradiation |
JP2003012710A (ja) | 2001-07-02 | 2003-01-15 | Hitachi Ltd | 低誘電正接樹脂組成物、その硬化物ならびに該組成物を用いたプリプレグ、積層板及び多層プリント基板 |
KR20050028779A (ko) * | 2003-09-19 | 2005-03-23 | 히다치 가세고교 가부시끼가이샤 | 수지조성물, 그것을 사용한 프리프레그, 적층판 및 다층프린트 배선판 |
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