KR100855535B1 - Light scattering layer forming transfer film and method of forming light scattering layer using it and light scattering film and light scattering/reflecting plate - Google Patents

Abstract

Provided is a transfer film capable of manufacturing a light scattering layer having a light diffusing performance suitable for a light scattering reflector used in a reflective liquid crystal display device and the like very easily and inexpensively. Transfer the transparent resin layer of the light-scattering layer-forming transfer film formed by sequentially forming a release layer and a transparent resin layer on which the concave and convexities are sequentially transferred to the surface of the adherend, and the light scattering layer having the surface shape of the release layer transferred on the surface of the adherend. Form. Alternatively, the photosensitive resin layer and the oxygen barrier layer of the light scattering layer-forming transfer film formed by sequentially forming an oxygen barrier layer and a photosensitive resin layer on the support body are transferred onto the surface of the adherend, and the surface of the adherend is exposed and developed. A light scattering layer in which the surface shape of the oxygen barrier layer is replaced is formed. A metal thin film is formed on the light scattering layer formed in this manner to obtain a light scattering reflecting plate.

Description

LIGHT SCATTERING LAYER FORMING TRANSFER FILM AND METHOD OF FORMING LIGHT SCATTERING LAYER USING IT AND LIGHT SCATTERING FILM AND LIGHT SCATTERING / REFLECTING PLATE}

The present invention provides a light scattering layer-forming transfer film for producing a light scattering sheet or a light reflecting plate having a light scattering layer used in a reflective liquid crystal display device, and the like, and a method of forming a light scattering layer using the light scattering property produced by the method. It relates to a light scattering film having a light scattering reflector.

Conventionally, in the color liquid crystal display device (LCD: Liquid Crystal Display) which is most prevalent as a flat panel display, the transmissive-type LCD by which the light source called a backlight was arrange | positioned at the back of the liquid crystal panel was common. However, in recent years, reflective LCDs as displays for portable information terminals (hereinafter, referred to as PDAs) and also displays for portable telephones have been rapidly spreading in the market. In the reflective LCD, instead of the backlight of the transmissive LCD, a reflecting plate is also provided on the rear side of the liquid crystal panel to reflect external light (light from the surroundings) to the front side and display it as a light source. Therefore, the reflective LCD is thinner, lighter, and low power consumption, as it has no backlight compared to the transmissive LCD, and is suitable for mobile applications such as PDAs and mobile phones.

Conventionally, the reflective LCD uses two polarizing plates due to its structure, but since the brightness of the panel is insufficient due to the light loss due to light absorption of the polarizing plate, the display is generally performed with one polarizing plate and a phase difference plate. . In this case, the phase difference plate, the polarizing plate, and the light scattering plate are provided on the observer side on the front substrate (the substrate on which the color filter is formed) sandwiching the liquid crystal phase. This light scattering plate has a light scattering function, and is a member necessary for preventing projection onto a reflecting plate, which is a mirror surface, and for generating scattering appropriate to light incident on the panel to secure visibility (contrast).

However, the fact that the light scattering plate is provided on the front surface of the panel does not necessarily improve the visibility because the incident light is scattered by the surface, and the amount of the incident light is reduced, resulting in a decrease in the brightness of the panel. In addition, since the color filter is formed on the front substrate, when incident light passes through the color filter, passes through the liquid crystal layer, is reflected from the reflecting plate, passes through the liquid crystal layer and the color filter, and then exits the panel to reach the viewer. According to the position of the observer's eye, there was a problem in which color confusion and so-called image blur due to parallax were generated. These problems were inevitable in reflective LCDs with color filters on the front substrate and light scattering plates on them.

Therefore, in order to obtain a higher quality reflective LCD, a color filter is installed on the rear substrate, and a reflector and a light scattering plate are installed as close to the color filter as possible, or a light scattering plate is required by giving a light scattering performance to the color filter itself. The method of making it disappear, the method of using the reflecting plate which has light scattering property, etc. are considered.

Methods of forming the light scattering layer have been variously studied. For example, a method of providing a photosensitive polymer resin layer on a substrate and forming irregularities by photolithography, or a particulate pigment (organic pigment, inorganic pigment, or metal flake, etc.) on a transparent resin And a method of forming unevenness by applying the one containing the above, and mixing and forming two or more kinds of transparent resins in a phase separation state.

However, in the photolithography method using a photosensitive polymer resin, the photosensitive polymer resin composition is coated and dried on a substrate, and then exposed to light through a mask having a predetermined pattern, followed by developing, rinsing, and baking, onto a glass substrate. Since the pattern was formed, the work was very complicated and the number of the processes was large, resulting in a drop in yield. If the pattern to be formed is not considered in terms of quality, optical interference (rainbow shape) due to the pattern produced on the surface may occur in the performance as a final light scattering reflection layer, and the image quality may be significantly reduced. In addition, since the photosensitive polymer resin composition used in the photolithography method is expensive, or the manufacturing apparatus itself such as an exposure apparatus and a developing apparatus is also very expensive, there is a problem that the manufacturing cost is increased in the production of the light scattering plate by the photolithography method. .

In addition, in the method of incorporating the particulate pigment into the transparent resin and imparting it onto the substrate, the surface irregularities can be controlled by selecting the type, shape, and particle size of the pigment used, and random pattern formation compared to the method using photolithography. Since it is possible, optical interference of reflected light does not occur, which is an effective method for forming a high quality light scattering layer. However, when the metal thin film is formed thereon because the pigment is present on the surface of the scattering layer, the target diffuse reflectance can be obtained because the uniformity of the resin portion present on the surface and the metal thin film formed on the pigment portion is poor. There may be no.

In addition, in the case of a semi-transmissive reflection type LCD considering the use in the dark, since the display is confirmed by the backlight in the dark, the light transmittance of the panel becomes important. When the pigment is contained in the light scattering layer, the light of the backlight is blocked, and due to light absorption by the pigment itself, it is difficult to obtain a target light transmittance. If the metal thin film is formed thin in order to improve the light transmittance to the target value, there is a problem that the diffusion reflectivity is lowered because the metal thin film is thin.

In addition, in the method of imparting light scattering performance using the phase-separated state of the transparent resin, since there are almost no irregularities on the surface thereof, when the metal thin film is formed thereon, the surface becomes a mirror state so that the light scattering reflection effect hardly occurs. do. Therefore, the light-scattering reflector which is originally a target is not obtained.

Accordingly, an object of the present invention is to solve the problems of the conventional light scattering layer forming method as described above in the manufacturing method of the light scattering reflector used in a reflective liquid crystal display device and the like, to provide a light scattering layer having good light scattering performance. It is to provide a transfer film that can be easily and inexpensively manufactured.

Disclosure of the Invention

According to the invention of claim 1, the above object is achieved by a light scattering layer forming transfer film, which is formed by sequentially forming a release layer and a transparent resin layer on which an unevenness is applied.

The light scattering layer-forming transfer film can provide a transparent resin layer having a predetermined surface unevenness on the adherend, and this layer has light scattering performance due to surface unevenness.

In addition, according to the invention of claim 2, the surface shape of the release layer has a ten-point average roughness of 0.2 to 2.0 µm, and the haze degree is 30 to 60%. It is achieved by a transfer film for forming a layer.

The target light scattering performance is obtained by the transfer film having a release layer having such surface characteristics.

In addition, according to the invention of claim 3, the above object is achieved by a transfer film for forming a light scattering layer according to claim 1 or 2, wherein the release layer contains a pigment.

Thus, by containing a pigment in a mold release layer, it can form in the surface shape aiming at the surface of a mold release layer.

In addition, according to the invention of claim 4, the above object is achieved by the transfer film for forming a light scattering layer according to claim 3, wherein the average particle diameter of the pigment contained in the release layer is 0.1 to 4.0 µm. do.

The target surface release layer can be formed by containing the pigment which has such a particle diameter in a mold release layer.

In addition, according to the invention of claim 5, in the above release layer, the light scattering according to claim 3 or 4, wherein the ratio of the resin solid content and the pigment solid content is 95/5 to 50/50. It is achieved by a transfer film for forming a layer.

Thus, the target surface shape and appropriate peelability are obtained by containing a pigment in a mold release layer in a predetermined ratio.

In addition, according to the invention of claim 6, after the transparent resin layer of the light-scattering layer-forming transfer film of claim 1 is attached to the adherend under heating and pressing conditions, the support and the release layer are removed, It is achieved by a method for forming a light scattering layer, characterized in that the light-transmitting layer is formed on the surface of the adherend by transferring the transparent resin layer having the surface shape of the release layer transferred to the surface of the adherend.

In this manner, the light scattering layer having a predetermined surface shape can be easily and cheaply formed in high quality by using the transfer film for forming the light scattering layer of the present invention.

In addition, according to the invention of claim 7, the above object is achieved by the method of forming a light scattering layer according to claim 6, wherein the transparent resin layer is applied to an adherend heated to 80 to 150 ° C in advance. do.

When the adherend is heated in advance, transferability is improved, and the adhesion strength between the transparent resin layer and the adherend becomes strong, and the transparent resin layer becomes difficult to peel off from the adherend.

In addition, according to the invention of claim 8, the total light transmittance of the light scattering layer formed by the method of forming a light scattering layer according to claim 6 or claim 7, the surface shape of the ten points average roughness 1.0 micrometer or less, and haze degree is achieved by the light-scattering film characterized by 20 to 60%.

The target light scattering effect is obtained by the light scattering film having such characteristics.

In addition, according to the invention of claim 9, the above object is achieved by a light scattering reflector characterized in that a metal thin film is formed on the light scattering layer formed by the method of forming the light scattering layer according to claim 6 or 7. .

The light scattering reflector obtained by imparting a metal thin film on the light scattering layer having a predetermined surface shape according to the present invention has excellent light scattering performance, and has a markedly light scattering reflecting performance as compared with the reflecting plate obtained by the conventional method.

In addition, the subject is a light scattering layer formation transfer film formed by sequentially forming an oxygen barrier layer, a photosensitive resin layer imparted irregularities on the support according to the invention of claim 10, the surface shape of the oxygen barrier layer is ten points average roughness It is achieved by a transfer film for forming a light scattering layer, characterized in that 0.2 to 2.0㎛, haze degree is 30 to 60%.

The light-scattering layer-forming transfer film can provide a photosensitive resin layer having a predetermined surface unevenness on the adherend, and furthermore, this layer has a target light scattering performance by surface unevenness.

In addition, according to the invention of claim 11, the above object is achieved by a transfer film for forming a light scattering layer according to claim 10, characterized in that a pigment is contained in said oxygen barrier layer.                 

Thus, by containing a pigment in an oxygen barrier layer, it can form in the surface shape aimed at the surface of an oxygen barrier layer.

In addition, according to the invention of claim 12, the average particle diameter of the pigment contained in the oxygen barrier layer is 0.1 ~ 4.0㎛ by the transfer film for forming a light scattering layer according to claim 11 characterized in that Is achieved.

By containing the pigment which has such a particle diameter in an oxygen barrier layer, the target surface oxygen barrier layer can be formed.

According to the invention of claim 13, the ratio of the resin solid content and the pigment solid content in the oxygen barrier layer is 95/5 to 50/50. It is achieved by a transfer film for forming a light scattering layer.

Thus, the target surface shape is obtained by containing a pigment in an oxygen barrier layer in a predetermined ratio.

In addition, according to the invention of claim 14, the photosensitive resin layer of the light-scattering layer-forming transfer film according to claim 10 is adhered to the adherend under heating and pressing conditions, and then the support is removed, and Forming a light scattering layer, characterized in that the light-scattering layer is formed on the surface of the adherend through a process of transferring the photosensitive resin layer and the oxygen barrier layer on the surface of the complex, and subsequently exposing, the development process involving the removal of the oxygen barrier layer Is achieved by.

In this way, the light scattering layer having a predetermined surface shape can be easily and cheaply formed in high quality by using the transfer film for forming the light scattering layer of the present invention.

Further, according to the invention of claim 15, the photosensitive resin layer of the light-scattering layer-forming transfer film according to claim 10 is bonded to the adherend under heating and pressing conditions, and then the support is removed, and Transferring the photosensitive resin layer and the oxygen barrier layer to the surface of the complex, and then pattern exposure through a mask having a predetermined pattern, the development process of removing the oxygen barrier layer and the photosensitive resin layer of the unexposed portion, the surface of the adherend A light scattering layer is formed by forming a patterned light scattering layer.

When it is necessary to form a light scattering layer in a predetermined pattern in this way, it is achieved by exposing using the mask which has a predetermined pattern in an exposure process.

In addition, according to the invention according to claim 16, the photosensitive resin layer and the oxygen barrier layer are transferred to an adherend previously heated to 80 to 150 ° C. Is achieved by a method for forming a light scattering layer.

By heating the adherend in advance, the transferability is improved, uniform transfer is achieved on the entire surface of the adherend, and the adhesion strength between the photosensitive resin layer and the adherend is strengthened, so that the photosensitive resin layer is removed from the adherend during exposure and development. Falling is suppressed, and the exposure margin and image development margin at the time of forming a pattern become wider, and manufacturing stability improves.

According to the invention of claim 17, the above-mentioned problem is that the total light transmittance of the light scattering layer formed by the method of forming the light scattering layer according to any one of claims 14 to 16 is 90% or more, and the surface shape is different. It is achieved by the light-scattering film characterized by having a ten-point average roughness of 1.0 µm or less and a haze degree of 20 to 60%.

With the light scattering film having such characteristics, a surface shape necessary for obtaining a light scattering reflecting plate having a target reflection performance is obtained.

In addition, according to the invention of claim 18, a light scattering reflecting plate is formed on a light scattering layer formed by the method for forming a light scattering layer according to any one of claims 14 to 16. Is achieved by.

The light scattering reflector obtained by imparting a metal thin film on the light scattering layer having a predetermined surface shape according to the present invention is excellent in light scattering reflecting performance, and has a significantly better light scattering reflecting performance than the reflecting plate obtained by the conventional method.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic longitudinal cross-sectional view showing a first embodiment of a light-scattering layer-forming transfer film of the present invention, and Fig. 2 is a schematic longitudinal cross-sectional view showing a light scattering layer forming method in a first order of the present invention. 3 is a schematic longitudinal cross-sectional view showing a second embodiment of the light-scattering layer-forming transfer film of the present invention, and FIG. 4 is a schematic showing the process of forming the light-scattering layer in the second embodiment of the present invention in the order of steps. It is a longitudinal cross-sectional view, and FIG. 5 is a schematic longitudinal cross-sectional view which shows a part of process in the case of forming the patterned light-scattering layer in 2nd Embodiment of this invention.

Best Mode for Carrying Out the Invention

The light-scattering layer formation transfer film provided by this invention consists of a structure of FIG. 1 as an example. The biggest feature is that a transparent resin layer is formed on the release layer which has already formed a predetermined surface shape, and the transparent resin layer and the adherend are attached under heating and pressurizing conditions, and then the transparent resin layer and the release layer are formed. By peeling off layers other than the transparent resin layer between the layers, only the transparent resin layer can be transferred to the adherend, and at this time, the surface of the transparent resin layer is a release layer to which predetermined irregularities are applied (matized release layer). It is a big feature to change the surface shape of.

In short, the transfer film for forming a light scattering layer of the present invention can provide a transparent resin layer having a predetermined surface irregularity on the adherend, and furthermore, this layer does not contain a pigment, but it has light scattering performance due to surface irregularities. It is characteristic.

EMBODIMENT OF THE INVENTION Hereinafter, 1st Embodiment of the transfer film for light-scattering layer formation of this invention is described.

In Figure 1, 1 is a protective film, it was formed to protect the transparent resin layer. Since the transparent resin layer is peeled off when transferred to the adherend, it is necessary to adhere to such a degree that the transparent resin layer can be peeled off from the transparent resin layer. As a base material which can be used, films, such as polyethylene terephthalate, polyethylene, a polypropylene, and polyvinyl chloride, can be used as it is, or in some cases, can be used by carrying out a mold release process to these film base materials. Although the thickness of a protective film is not specifically limited, 10-50 micrometers thickness is preferable.

2 is a transparent resin layer, and either photosensitive resin or non-photosensitive resin can be used, and in some cases, they can be mixed and used, and can also be laminated | stacked and used. In addition, two or more kinds of photosensitive resins may be laminated and used, or non-photosensitive resins may be laminated and used.

In short, a predetermined surface shape is given to the surface of the transparent resin layer after transfer is applied to the adherend, and heat treatment (baking treatment) is performed in the subsequent step. As a result, the solvent resistance and the surface strength of the light scattering layer can be imparted. In this case, unevenness of the surface may be melted by the heat treatment to change the surface shape. In short, light scattering characteristics change. Therefore, the surface is hardened by light irradiation using a photosensitive resin, so that the surface shape is not changed by heat treatment, or the non-photosensitive resin is used in which the surface shape is not significantly changed by heat treatment. Therefore, the photosensitive resin and the non-photosensitive resin are mixed and used to harden the surface by light irradiation, or the photosensitive resin and the non-photosensitive resin are laminated so as to be exposed to the surface by using the photosensitive resin on the side exposed to the light. It is also effective to use non-photosensitive resin which hardened the surface and made contact with a to-be-adhered body focused on adhesiveness with a to-be-adhered body.

The coating amount of the transparent resin layer 2 needs a thickness capable of transferring the surface shape of the release layer, and a thickness of 0.5 to 20 µm is preferable.

The specific example of the photosensitive resin which can be used for the transparent resin layer 2 is shown below. As the water-soluble photosensitive resin

(1) A composition of water-soluble resins such as gelatin, fish glue, gum arabic, polyvinyl alcohol, and ammonium dichromate, potassium dichromate and ammonium chromate.

(2) A composition comprising a water-soluble resin such as photosensitive ferric and gelatin which impart ferrous ions by exposure, such as ferric ammonium citrate and ferric ammonium oxalate.

(3) Water-soluble resins such as gelatin, fish glue, gum arabic, polyvinyl alcohol, polyacrylamide, carboxymethyl cellulose, hydroxyethyl cellulose, p-aminodiphenylamine, benzine, dianisidine, toluisodine, etc. The composition which consists of a tetrazonium salt of the diamino compound of this, or the diazo resin which condensed p-diazo diphenylamine and paraformaldehyde.

(4) A composition comprising a diazo resin condensed with a diazo compound and paraformaldehyde like p-diazodiphenylamine.

(5) A composition comprising an azide compound and a water-soluble resin such as polyacrylamide, polyvinyl alcohol, polyvinylpyrrolidone, gelatin, such as 4,4'-diazide steel benzene and 2,2'-disulfonic acid soda.

(6) A composition comprising a cyclized rubber of an azide compound such as 4,4'-diazide steel benzene and 4,4'-diazide calcon.

(7) A composition of a quinone diazide compound such as naphthoquinone- (1,2) -diazidesulfonic acid ester and an alkali-soluble phenol formaldehyde resin.

(8) A composition comprising a polymer having a cinnamic acid group introduced into a molecule such as a cinnamic acid ester of polyvinyl alcohol, a sensitizer such as nitroacetonaphthene, 1,2-benzantraquinone, Michler's ketone, and the like.

(9) A modified polyvinyl alcohol composition in which photosensitive groups such as steel vinylium group, steel barzolium group, and steel quinolium group are added to polyvinyl alcohol.

Etc. can be used.

In the photosensitive resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent are mixed with a polymer resin obtained by copolymerizing two or more types of monomers or a polymer resin obtained from a monomer having an unsaturated double bond with a carboxylic acid group. The photosensitive resin obtained by adding surfactant is mentioned.

Specific examples of the polymer resin include monomers having an unsaturated double bond with a carboxylic acid group and an acid anhydride added to acrylic acid, methacrylic acid, and hydroxyalkyl (meth) acrylate, and methyl as another monomer forming a copolymer. (Meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, phenoxyethyl (meth) acrylate, hydroxyethyl (meth) Acrylate, methoxyethyl (meth) acrylate, etc. are mentioned, The copolymer obtained by combining these 1 type or 2 or more types is mentioned.

Specific examples of the photopolymerizable monomer include bifunctional monomers, trifunctional monomers, and polyfunctional monomers. As the bifunctional monomer, triethylene glycol dimethacrylate, propylene glycol diacrylate, tripropylene glycol diacrylate, polypropylene glycol diacrylate, polyethylene glycol diacrylate, pentaerythritol diacrylate monostearate, neo Pentyl glycol diacrylate and the like. Trifunctional monomers include trimethylolpropane triacrylate, pentaerythritol triacrylate, and the like. Examples of the polyfunctional monomers include dipentaerythritol penta and hexaacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol tetraacrylate, and the like.

Although the addition amount of a photopolymerizable monomer is not specifically limited, It is preferable that the ratio of solid content of a polymer resin and solid content of a photopolymerizable monomer is 90/10-30/70. When the amount of the polymer resin added is large, the amount of the photopolymerizable monomer is small and the photopolymerization tends to be incomplete, which necessitates the necessity of irradiating a large amount of ultraviolet light, and in some cases, the photopolymerization does not occur. In addition, when the amount of the photopolymerizable monomer is excessively large, the cohesive force of the transparent resin layer decreases, so that in the transfer process to the adherend, the transparent resin is protruded from the edge portion of the transfer film or when the support is peeled off. Trouble may occur such that the strata cause cohesive failure.

As the photopolymerization initiator, 2,4,6-tris (trichloromethyl) -s-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl)-as a triazine compound s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine , 2- (4'-methoxy-1'-naphthyl) -4,6-bis (trichloromethyl) -s-triazine and the like, and mixtures thereof can be used.

As the acetophenone-based compound, 2-methyl-2-morpholino (4-thiomethylphenyl) propane-1-one, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenyl (4-dode Sil) propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, and the like.

Examples of the benzophenone compounds include benzophenone, 4,4-diethylaminobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, methyl o-benzophenone benzoate, and the like.

As a thioxanthone type compound, 2, 4- diethyl thioxanthone, 2, 4- diisopropyl thioxanthone, 2, 4- dimethyl thioxanthone, etc. are mentioned.

Examples of the imidazole compound include 2- (2,3-dichlorophenyl) -4,5-diphenyl-imidazole dimer and 2- (2,3-dichlorophenyl) -4,5-bis (3-methoxy Phenyl) -imidazole dimer is mentioned.

When using the said photosensitive resin for the transparent resin layer 2, after giving to a to-be-adhered body, photopolymerization or photocrosslinking is fully made by ultraviolet irradiation. In some cases, after transferring to the adherend and exposing through the base film and then peeling off the base film, or after transferring, after preliminary exposure through the base film and then peeling off the base film, the light may be sufficiently irradiated. According to the characteristics of the photosensitive resin selected as the transparent resin layer, the most suitable transfer method can be selected.

In addition, as a non-photosensitive resin, resin generally used as a coating film forming resin can be used, and colorless and transparent resin after a coating film formation is preferable. For example, an acrylic resin, a polyester resin, a vinyl chloride vinyl acetate copolymer resin, a polyamide resin, an epoxy resin, a polyimide resin, a urethane resin, etc. are mentioned. In the case of the curable resin, a thermosetting system using an epoxy curing agent, a melamine curing agent, an isocyanate curing agent, or the like can be used.

Moreover, when using photosensitive resin and non-photosensitive resin together in one layer, when it uses favorable compatibility, it will not be limited to the kind.

3 is a matized release layer, and irregularities are provided on the surface. In addition, in order to control such a surface shape, it is preferable that the pigment is contained in the release layer 3. The resin used as the release layer 3 has a good adhesiveness with a support layer or a cushion layer formed on the support, and has a peeling force of 0.8 to 10.0 g / 25 mm at 180 ° peeling from the transparent resin layer (preferably 1.0 To 5.0 g / 25 mm) may be used, and examples thereof include urethane resins, melamine resins, silicone resins, copolymers thereof, and mixtures thereof. In addition, general water-soluble polymer resins such as polyvinyl alcohol, polyvinylpyrrolidone, and carboxymethyl cellulose may also be used.

Moreover, it is preferable to form so that the surface roughness of the mold release layer 3 may be set to 0.2-2.0 micrometers with a ten-point average roughness, and it may become 30 to 60% of haze degree. The surface shape of the release layer 3 determines the surface shape when the transparent resin layer 2 is transferred to the adherend as it is, that is, the surface shape of the light scattering layer. This surface shape determines the light scattering performance when a metal thin film is formed on the light scattering layer to form a light scattering reflector. If the ten-point average roughness is less than 0.2 µm, since the specular light component increases with respect to the total amount of reflected light, sufficient light scattering reflection performance cannot be obtained. In addition, if the ten-point average roughness exceeds 2.0 µm, the metal thin film is not uniformly formed because the surface irregularities are large, or the transparent electrode is disconnected because the surface of the color filter layer and the overcoating layer formed on the metal thin film is poor. have.

In addition, even if the ten-point average roughness is 0.2 to 2.0 µm, the density of the surface irregularities determines the light scattering performance. Therefore, it is necessary to manage haze degree as an index of protrusion density of surface irregularities. In order to obtain good light scattering performance, the haze degree is preferably 30 to 60%. In the state where the haze degree is less than 30%, the surface protrusion density is low, so that even if the metal thin film is formed, the specular light component increases, and sufficient light scattering reflection performance is not obtained. If the haze degree exceeds 60%, the surface naturally has denser densities, resulting in poor surface smoothness, uneven formation of the metal thin film, or uneven color filter layers, resulting in color unevenness. do.

In this invention, it is more preferable that especially the ten point average roughness of a mold release layer is 0.5 to 1.5 micrometers, and haze degree is 40 to 60% of range.

The method for measuring the ten-point average roughness is described in JIS B 0601 and the method for measuring the haze degree in JIS K 7105.

In order to produce the release layer 3 with a ten-point average roughness of 0.2 to 2.0 µm, any inorganic or organic type can be used as the pigment as long as the average particle diameter is in the range of 0.1 to 4.0 µm. Moreover, these pigments can also be used in mixture of 2 or more types. In the case of using a pigment having an average particle diameter of less than 0.1 mu m, in order to form the surface of the release layer into a predetermined surface shape, it is necessary to extremely reduce the resin component, and in this case, the surface strength becomes weak, so that the pigment is missing. (Iii) tends to occur. In addition, if the average particle diameter exceeds 4.0 µm, it is difficult to produce a release layer with a ten-point average roughness of 0.2 to 2.0 µm because the pigment is large. Although some control is possible by the increase of the resin component, since the pigment density of the surface of a mold release layer falls, the density of protrusions of a light scattering layer becomes low, and light scattering performance falls remarkably. In this invention, it is especially preferable that the said average particle diameter is 0.5-3.5 micrometers.

Specific examples of the pigment include silicon oxide, titanium oxide, aluminum oxide, magnesium oxide, barium sulfate, cerium oxide, magnesium fluoride, calcium fluoride, acrylic resin, styrene resin, benzoguanamine resin, polyethylene resin, and silicone resin. Pigments, such as these, can be used. Among them, organic-based ones are particularly preferred for obtaining very narrow particle size distribution and obtaining uniform surface properties.

In addition, the pigment addition amount in the release layer (3) is preferably a ratio of the resin solid content and the pigment solid content of the release layer is 95/5 ~ 50/50, but as described above, the kind of resin used, the kind of pigment, the particle size, etc. Therefore, it is necessary to determine the optimum amount of addition. When the amount of the pigment added increases, even if a resin having a releasability is used, the surface area in contact with the transparent resin layer increases, so that the peeling becomes heavy and the peeling force range of 0.8 to 10.0 g / 25 mm may be exceeded. In this case, the peeling force is formed on the release layer by forming a thin film such that the resin used in the release layer or the resin used in the release layer and the resin used in the release layer have good peelability to the extent that the surface shape is not impaired. Can also be controlled within the aforementioned range. Moreover, when the addition amount of a pigment increases, the case where the haze value mentioned above exceeds 60% can be considered. Moreover, in this invention, it is especially preferable that the said ratio is 90/10-60/40.

Although the thickness of the mold release layer 3 is not specifically limited, The dry weight of 0.5-5.0 g / m <2> is preferable.

In addition, 4 is a cushion layer, When the transparent resin layer is transferred to the adherend under heating and pressurization, it is preferable that the transparent resin layer is formed so that it can be reliably transferred without incorporation of air even if there are some irregularities on the surface of the adherend. In addition, although the thickness of a cushion layer depends on the material characteristic for this, 5-50 micrometers is preferable. If the thickness is less than 5 µm, transfer failure (air mixing) may occur in some cases. If the thickness is more than 50 µm, the cushion layer is thick, so that the thermal conductivity of the transfer film is poor. Since the layer cannot be softened sufficiently, it may also cause a transfer failure, and even if it is softened depending on the transfer conditions, the cushioning layer material is protruded from the edge of the transfer film and the surface of the transfer roll or the adherend is removed. It may be contaminated.

As the material of the cushion layer 4, a thermoplastic resin can be used, for example, a saponified product of ethylene and an acrylic ester copolymer, a saponified product of styrene and an acrylic ester copolymer, an ethylene vinyl acetate copolymer, a low density polyethylene, and an ethylene ethyl acrylate. Copolymers, copolymers of styrene and isoprene or butadiene, polyester resins, polyolefin resins, acrylic resins and the like. These resins may be used alone or in suitable combinations, or may be laminated and used in suitable combinations. If necessary, a plasticizer may be added.

The support of 5 can use a conventionally well-known plastic film. Examples thereof include polyethylene terephthalate, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, triacetate, and the like. In particular, a polyethylene terephthalate (PET) film which is strong in mechanical strength and excellent in heat stability is preferable. Although the thickness of a support body is not specifically limited, 150-35 micrometers is preferable. This is because the strength of the transfer film is high when the support is a film having a thickness of more than 150 μm when finished in the product form of a transfer film, that is, a roll-shaped product, so that the cover film may be applied to a roll film or a slit operation having a predetermined width. Occasional lifting may occur, or product trouble may occur such that the roll may not be completed to a predetermined length due to heavy product weight. In addition, since the thermal conductivity of the transfer film is poor, good transfer cannot be obtained unless the transfer temperature is increased or the transfer speed is decreased during transfer to the adherend, which is not preferable in view of workability and economic efficiency.

Moreover, when the thickness is less than 35 µm, wrinkles tend to occur on the film, and workability is poor, or the problem of curling at the time of applying a white layer or a cushion layer becomes remarkable, which is not preferable.

Moreover, in order to prevent the mixing of dust by peeling charging, the area specific resistance value of the plastic film is preferably 10 ^{8 to 10} Ω. Therefore, it is preferable to use an antistatic treatment film or / and to use a film provided with an antistatic layer of 6 as a support.

Next, the manufacturing method of the light-scattering layer formation transfer film of FIG. 1 by the structure mentioned above is demonstrated. First, a cushion layer is coated on the support that is antistatically treated and / or the antistatic layer is applied to the back surface. The cushion layer may be formed by coating and drying the resin coating liquid using a known coating method such as roll coating, bar coating, comma coating, die coating, gravure coating, or by melting the resin and co-extrusion with a support. Can be. When adhesiveness with a support body is bad, you may use an adhesion | attachment assistance process (anchor process) on a support body, or the support body processed so that adhesion might be easy. Moreover, although the support body itself has cushioning property in the support body in which the cushion layer was formed in this invention, in this case, it is not necessary to apply | coat a cushion layer newly.                 

The release layer is then applied to the cushion layer. The release layer is formed by applying and drying a coating liquid of a release resin containing a pigment using a known coating method such as roll coating, bar coating, comma coating, die coating, and gravure coating. Since the pigment, which is powder, is difficult to obtain a uniform dispersion even when directly added to the resin for the production of the coating liquid, the pigment is first dispersed in a disperser in a suitable solvent, or glass beads are added to disperse the disperser. Moreover, a pigment dispersion liquid is prepared by adding a dispersing agent as needed, and then a coating liquid is manufactured by adding in a resin.

Subsequently, a transparent resin layer is coated on the release layer. The transparent resin layer may also be formed by coating and drying the coating layer by using a known coating method such as roll coating, bar coating, comma coating, die coating, and gravure coating, in the same manner as the method of forming a cushion layer or a release layer.

Finally, a protective film is attached to protect the transparent resin layer. Attachment can be easily performed by attaching under appropriate conditions of temperature and pressure.

The transfer conditions in the process of providing a transparent resin layer having a predetermined surface shape on the adherend using the transfer film of FIG. 1 described above will be described with reference to FIG. 2.

First, the protective film 1 is peeled off (see Fig. 2 (a)), and the exposed transparent resin layer 2 and the surface of the adherend 7 are attached (see (b)). It is preferable practically to adhere | attach on the conditions of the roll temperature of 80-150 degreeC, the pressure of 3-10 kg / cm <2>, and the speed | rate 300-1500mm / min of a laminator using a well-known laminator.

Regarding the roll temperature at the time of adhesion | attachment, at the adhesion temperature below 80 degreeC, the adhesiveness of the transparent resin layer 2 and the to-be-adhered body 7 is inferior, and adhesion failure may arise. Also, at an attachment temperature exceeding 150 ° C., problems such as wrinkles due to thermal deformation of the transfer film, melted cushion layer resins from the edges of the transfer film protrude, and remain as residues on the adherend or contaminate the laminator roll. It is undesirable because it occurs. Regarding the pressure at the time of attachment, the adhesion force becomes weak at a pressure of less than 3 kg / cm 2, and the possibility of poor adhesion is increased, and the adhesion force is stronger at a pressure exceeding 10 kg / cm 2, but damages the laminator roll or transfer film. Problems such as the occurrence of wrinkles or damage to the adherend are likely to occur due to physical deformation. In addition, it is necessary to consider the balance between the adhesion temperature and the adhesion pressure, but it is not practical in terms of productivity at speeds below 300 mm / min, and poor driving of transfer film is likely to occur at speeds above 1500 mm / min. Since the temperature of the adherend surface does not become high enough on the surface of the adherend and the thermal conductivity of the transfer film, adhesion failure may occur. In addition, when the adherend 7 is heated to 80 to 150 ° C. in advance, the transferability is improved, and the adhesion strength between the transparent resin layer 2 and the adherend 7 becomes stronger, so that the transparent resin layer 2 is removed from the adherend 7. ) Is hard to come off and is preferable. In heating below 80 ° C., depending on the transfer rate, sufficient effect is hardly obtained, and in heating above 150 ° C., wrinkles may occur due to heat deformation at the moment when the transfer film contacts the adherend 7. In some cases, the transparent resin layer 2 foams to generate air. In this invention, it is especially preferable to heat a to-be-adhered body in 90-130 degreeC.

After the adhesion by the laminator is finished, other than the transparent resin layer 2 between the release layer 3 and the transparent resin layer 2 (support body 5, cushion layer 4, release layer 3) And the like) are peeled off (see copper (c)), and only the transparent resin layer 2 is left on the adherend 7 (see copper (d)). The surface of this transparent resin layer displaces the unevenness of the surface of the release layer 3, and has a predetermined surface shape.

Subsequently, when the transparent resin layer 2 has photosensitivity, it is irradiated with ultraviolet rays through a mask having a predetermined pattern if necessary, or irradiated with ultraviolet rays to the entire surface without passing through the mask if not necessary. Thereafter, a transparent resin layer patterned through a developing step, a rinse step, or a whole surface photocured layer is obtained. When the metal film is formed on the transparent resin layer by vapor deposition for the purpose of manufacturing the reflector, heat is applied to the transparent resin layer during deposition, so that the metal film cannot be uniformly provided by the volatile components in the transparent resin layer, In some cases, the metal film cannot be uniformly provided due to thermal deformation. Therefore, what is necessary is just to heat-process a transparent resin layer with the heat of 130-250 degreeC as a pretreatment. In the case where the transparent resin layer is non-photosensitive, the exposure and development steps are not necessary. However, in order to proceed with curing, the pretreatment may be performed after heat treatment at a temperature of 130 ° C. or lower.

As described above, the transparent resin layer 2 having a predetermined surface shape can be formed on the adherend 7 using the transfer film of FIG. 1. Moreover, the obtained transparent resin layer 2 displaced the surface shape of the matting release layer 3, and has light scattering property because of the uneven | corrugated shape of the surface.

Moreover, it is preferable that the total light transmittance of the transparent resin layer (light scattering layer) formed in this way is 90% or more, ten point average roughness is 1.0 micrometer or less, and haze degree is 20 to 60%. Low light transmittance makes it difficult to use in transflective type LCDs. In addition, since the projection density of the surface is low in the state in which haze degree is less than 20%, even if a metal thin film is formed, a specular light component will increase and sufficient light scattering performance will not be obtained. When the haze degree exceeds 60%, the surface has a dense protrusion density, so the surface smoothness is poor, the formation of the metal thin film becomes uneven, and the color unevenness occurs in the color filter layer formed on the metal thin film. The problem arises that the surface property of the overcoat layer is inferior.

Moreover, in this invention, it is especially preferable that the ten-point average roughness of a light-scattering layer is 0.5 to 1.0 micrometer, and the haze degree is 30 to 60% of range.

In addition, when the metal thin film 8 is formed so that the light scattering layer formed in this way may cover the uneven | corrugated surface, a light-scattering reflecting plate can be produced (refer copper (e)). The metal thin film may be aluminum, chromium, nickel, palladium, silver, or the like, or may be formed in the form of a composite. As the metal thin film forming method, known methods such as vapor deposition, sputtering, CVD, and ion plating may be employed. It can be adopted. In addition, the thickness of the metal thin film can be set to a thickness from which the target transmittance and the target light scattering property can be obtained in the range of 200 to 1000 Pa, preferably 300 to 500 Pa.

The light-scattering layer formation transfer film provided by this invention consists of a structure of FIG. 3 as another example. The biggest feature is that a layer containing photosensitive resin as a main component is formed on an oxygen barrier layer that has already formed a predetermined surface shape, and the photosensitive resin layer is adhered to the adherend under heating and pressing conditions, and then the photosensitive resin layer and By removing the layers other than the oxygen barrier layer, transferring the photosensitive resin layer and the oxygen barrier layer to the surface of the adherend, and performing the exposure and development steps to remove the oxygen barrier layer, only the photosensitive resin layer can be provided on the adherend. At this time, the surface of the photosensitive resin layer is characterized in that the surface shape of the oxygen barrier layer (matized oxygen barrier layer) to which predetermined irregularities are applied is shifted. In addition, the light scattering layer can be formed in a desired pattern by pattern exposure through a mask having a predetermined pattern in the exposure step.

In short, the light-scattering layer-forming transfer film of the present invention can provide a photosensitive resin layer having a predetermined surface irregularity on the entire surface or by patterning it. Furthermore, this layer does not contain a pigment, but surface irregularities It is characterized by having light scattering performance.

Hereinafter, 2nd Embodiment of such a light-scattering layer formation transfer film of this invention is demonstrated.

3 to 11 is a protective film, it was formed to protect the photosensitive resin layer. Since the photosensitive resin layer is peeled off when transferred to the adherend, it is necessary to adhere to such a degree that the photosensitive resin layer can be peeled off from the photosensitive resin layer. As a base material which can be used, the thing similar to the protective film 1 in 1st Embodiment mentioned above is mentioned.

12 is a photosensitive resin layer. In the present invention, the photosensitive resin layer is not only composed of a resin having photosensitivity, but also non-photosensitive resin may be mixed with the photosensitive resin, used and laminated, and such an embodiment is also included. In addition, two or more kinds of photosensitive resins may be laminated and used, or a photosensitive resin layer and a non-photosensitive resin layer may be laminated and used.

In short, a predetermined surface shape is given to the surface of the photosensitive resin layer after the transfer is applied to the adherend, but heat treatment (baking treatment) is performed in the subsequent step. As a result, the solvent resistance and surface strength of the light scattering layer can be imparted, but at this time, unevenness of the surface is melted by the heat treatment to change the surface shape. In short, light scattering characteristics change. Therefore, the surface is hardened by light irradiation using a photosensitive resin so that the surface shape is not changed by heat treatment, or in some cases, a photosensitive resin and a non-photosensitive resin are mixed and used as described above, To harden the surface or to laminate the photosensitive resin and the non-photosensitive resin, and to harden the surface by photoirradiation using a photosensitive resin on the side exposed to the surface, and adhering to the adherend It is also effective to use non-photosensitive resin which focused on sex. However, when the light scattering layer is to be formed on the adherend in a predetermined pattern, the resin may be used in combination with a photosensitive resin or when the non-photosensitive resin is used in combination to remove the unexposed portion. You need to choose.

The application amount of the photosensitive resin layer 12 needs the thickness which can replace the surface shape of an oxygen barrier layer, and 0.5-20 micrometers thickness is preferable.

The specific example of the photosensitive resin which can be used as the photosensitive resin layer 12 is shown below.                 

As the water-soluble photosensitive resin

(1) A composition of water-soluble resins such as gelatin, fish glue, gum arabic, polyvinyl alcohol, and ammonium dichromate, potassium dichromate and ammonium chromate.

(2) A composition comprising a water-soluble resin such as photosensitive ferric and gelatin which impart ferrous ions by exposure, such as ferric ammonium citrate and ferric ammonium oxalate.

(3) Water-soluble resins such as gelatin, fish glue, gum arabic, polyvinyl alcohol, polyacrylamide, carboxymethyl cellulose, hydroxyethyl cellulose, p-aminodiphenylamine, benzine, dianisidine, toluisodine, etc. The composition which consists of a tetrazonium salt of the diamino compound of this, or the diazo resin which condensed p-diazo diphenylamine and paraformaldehyde.

(4) A composition comprising a diazo resin condensed with a diazo compound and paraformaldehyde like p-diazodiphenylamine.

(5) A composition comprising an azide compound and a water-soluble resin such as polyacrylamide, polyvinyl alcohol, polyvinylpyrrolidone, gelatin, such as 4,4'-diazide steel benzene and 2,2'-disulfonic acid soda.

(6) A composition comprising a cyclized rubber of an azide compound such as 4,4'-diazide steel benzene and 4,4'-diazide calcon.

(7) A composition of a quinone diazide compound such as naphthoquinone- (1,2) -diazidesulfonic acid ester and an alkali-soluble phenol formaldehyde resin.                 

(8) A composition comprising a polymer having a cinnamic acid group introduced into a molecule such as a cinnamic acid ester of polyvinyl alcohol, a sensitizer such as nitroacetonaphthene, 1,2-benzantraquinone, Michler's ketone, and the like.

(9) The modified polyvinyl alcohol composition which added photosensitive groups, such as steel vinylium group, steel barzolium group, and steel quinolium group, to polyvinyl alcohol.

Etc. can be used.

In the photosensitive resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent are mixed with a polymer resin obtained by copolymerizing two or more types of monomers or a polymer resin obtained from a monomer having an unsaturated double bond with a carboxylic acid group. The photosensitive resin obtained by adding surfactant is mentioned.

Specific examples of the polymer resin include monomers having an unsaturated double bond with a carboxylic acid group and an acid anhydride added to acrylic acid, methacrylic acid, and hydroxyalkyl (meth) acrylate, and methyl as another monomer forming a copolymer. (Meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, phenoxyethyl (meth) acrylate, hydroxyethyl (meth) Acrylate, methoxyethyl (meth) acrylate, etc. are mentioned, The copolymer obtained by combining these 1 type or 2 or more types is mentioned.

Specific examples of the photopolymerizable monomer include bifunctional monomers, trifunctional monomers, and polyfunctional monomers. As the bifunctional monomer, triethylene glycol dimethacrylate, propylene glycol diacrylate, tripropylene glycol diacrylate, polypropylene glycol diacrylate, polyethylene glycol diacrylate, pentaerythritol diacrylate monostearate, Neopentyl glycol diacrylate and the like. Trifunctional monomers include trimethylolpropane triacrylate, pentaerythritol triacrylate, and the like. Examples of the polyfunctional monomers include dipentaerythritol penta and hexaacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol tetraacrylate, and the like.

Although the addition amount of a photopolymerizable monomer is not specifically limited, It is preferable that the ratio of solid content of a polymer resin and solid content of a photopolymerizable monomer is 90/10-30/70. When the amount of the polymer resin added is large, the amount of the photopolymerizable monomer is small and the photopolymerization tends to be incomplete, which necessitates the necessity of irradiating a large amount of ultraviolet light, and in some cases, the photopolymerization does not occur. In addition, when the amount of the photopolymerizable monomer added is too large, the cohesive force of the photosensitive resin layer is lowered, so that in the transfer process to the adherend, the transparent resin is protruded from the edge portion of the transfer film or the photosensitive water is removed when the support is peeled off. Trouble may occur such that the strata cause cohesive failure.

As the photopolymerization initiator, 2,4,6-tris (trichloromethyl) -s-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl)-as a triazine compound s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine , 2- (4'-methoxy-1'-naphthyl) -4,6-bis (trichloromethyl) -s-triazine and the like, and mixtures thereof can be used.

As the acetophenone-based compound, 2-methyl-2-morpholino (4-thiomethylphenyl) propane-1-one, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenyl (4-dode Sil) propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, and the like.

Examples of the benzophenone compounds include benzophenone, 4,4-diethylaminobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, methyl o-benzophenone benzoate, and the like.

As a thioxanthone type compound, 2, 4- diethyl thioxanthone, 2, 4- diisopropyl thioxanthone, 2, 4- dimethyl thioxanthone, etc. are mentioned.

Examples of the imidazole compound include 2- (2,3-dichlorophenyl) -4,5-diphenyl-imidazole dimer and 2- (2,3-dichlorophenyl) -4,5-bis (3-methoxy Phenyl) -imidazole dimer is mentioned.

When the said photosensitive resin is used for the photosensitive resin layer 12, after giving to a to-be-adhered body, photopolymerization or photocrosslinking is fully made by ultraviolet irradiation. In other words, after the photosensitive resin layer 12 and the oxygen barrier layer 13 are transferred to the adherend, the photosensitive resin layer 12 is exposed through the oxygen barrier layer 13. The optimal transfer and exposure conditions can be selected by the characteristics of the photosensitive resin selected as the photosensitive resin layer 12.

As the non-photosensitive resin in the case of using the above-described photosensitive resin and the non-photosensitive resin together, a resin generally used as a coating film forming resin can be used, and a colorless and transparent resin after the coating film formation is preferable. For example, an acrylic resin, a polyester resin, a vinyl chloride vinyl acetate copolymer resin, a polyamide resin, an epoxy resin, a polyimide resin, a urethane resin, etc. are mentioned. In the case of the curable resin, a thermosetting system using an epoxy curing agent, a melamine curing agent, an isocyanate curing agent, or the like can be used.

In addition, when using photosensitive resin and non-photosensitive resin together in one layer, when it uses favorable compatibility, it is not limited to the kind.

However, when forming a light-scattering layer on a to-be-adhered body in a predetermined pattern, it is not preferable to use non-photosensitive resin together especially when forming a pattern of a thin line.

13 is an oxygen barrier layer, and when exposing the photosensitive resin layer 12 through this oxygen barrier layer, it is necessary in order to cut off oxygen and to perform photocuring reaction efficiently. In addition, since predetermined irregularities are provided on the surface of the oxygen barrier layer 13, when the photosensitive resin layer formed thereon becomes a light scattering layer through a transfer process, an exposure process, and a development process, the surface shape of the oxygen barrier layer 13 after curing is hardened. It moves to the surface of the photosensitive resin layer, ie, the light scattering layer, and as a result, the light scattering layer has a predetermined surface shape.

In addition, in order to control such a surface shape, the oxygen barrier layer 13 needs to contain a pigment. The resin used as the oxygen barrier layer 13 has good oxygen barrier property and good peelability with a support layer or a cushion layer formed on the support, for example, a peel force measured at a peel rate of 300 mm / min in a 180 degree peel test. Resins in the range of 0.8 to 10.0 g / 25 mm (preferably 1.0 to 5.0 g / 25 mm) can be used, such as polyvinyl alcohol, polyvinylpyrrolidone, water soluble nylon, or copolymers thereof, Mixtures;

In addition, it is preferable to form the surface roughness of the oxygen barrier layer 13 so as to be 0.2 to 2.0 µm with a ten-point average roughness, and to have a haze degree of 30 to 60%. The surface shape of the oxygen barrier layer 13 determines the surface shape when the photosensitive resin layer 12 is transferred to the adherend as it is, that is, the surface shape of the light scattering layer. This surface shape determines the light reflection performance when a metal thin film is formed on the light scattering layer to form a light scattering reflector. If the ten-point average roughness is less than 0.2 µm, since the specular light component increases with respect to the total amount of reflected light, sufficient light scattering reflection performance cannot be obtained, and the projection of the light source is increased, thereby degrading the performance as a light scattering reflector. In addition, if the ten-point average roughness exceeds 2.0 µm, the surface irregularities are large, so that the metal thin film is not uniformly formed, or the color filter layer formed on the reflector is uneven, causing color irregularity, or disconnection of the transparent electrode. do.

In addition, even if the ten-point average roughness is 0.2 to 2.0 µm, the density of the surface irregularities determines the light scattering performance. Therefore, it is necessary to manage haze degree as an index of protrusion density of surface irregularities. In order to obtain good light scattering performance, the haze degree is preferably 30 to 60%. In the state where the haze degree is less than 30%, the surface protrusion density is low, so that even if the metal thin film is formed, the specular light component increases, and sufficient light scattering reflection performance is not obtained. In the situation where the haze degree exceeds 60%, the surface naturally has a denser density, so that the surface smoothness is poor, the formation of the metal thin film becomes uneven, or the color filter layer is uneven, resulting in color unevenness.

In this invention, it is especially preferable that the ten-point average roughness of an oxygen barrier layer is 0.5 to 1.5 micrometers, and haze degree is 40 to 60% of range.

In order to produce the oxygen barrier layer 13 at a ten-point average roughness of 0.2 to 2.0 µm, any inorganic or organic type may be used as the pigment as long as the average particle diameter is in the range of 0.1 to 4.0 µm. Moreover, these pigments can also be used in mixture of 2 or more types. In the case of using a pigment having an average particle diameter of less than 0.1 mu m, in order to form the surface of the oxygen barrier layer into a predetermined surface shape, the resin component needs to be extremely reduced, and in this case, the surface strength is weakened, so that the pigment may be missing. It becomes easy to do it. In addition, if the average particle diameter exceeds 4.0 μm, it is difficult to produce an oxygen barrier layer with a ten-point average roughness of 0.2 to 2.0 μm because the pigment is large. Although some control is possible due to the increase of the resin component, the density of the pigment on the surface of the oxygen barrier layer decreases, so that the projection density of the light scattering layer is lowered, and the light scattering performance is remarkably lowered. The projection of becomes large. In this invention, it is especially preferable that the said average particle diameter is in the range of 1.0-3.0 micrometers.

Specific examples of the pigment include silicon oxide, titanium oxide, aluminum oxide, magnesium oxide, barium sulfate, cerium oxide, magnesium fluoride, calcium fluoride, acrylic resin, styrene resin, benzoguanamine resin, polyethylene resin, and silicone resin. Pigments, such as these, can be used. Among them, organic-based ones are particularly preferred because they have a very narrow particle size distribution, which makes surface control easier.

In addition, the pigment addition amount in the oxygen barrier layer 13 is preferably a pigment ratio of 95/5 to 50/50 of the resin solid content and the pigment solid content of the oxygen barrier layer, but the kind of resin and the kind of pigment used as described above. It is necessary to determine the optimum amount of addition by the particle size and the like. When the addition amount of the pigment is small, it is difficult to form a predetermined surface shape, and when the addition amount of the pigment is large, the haze degree described above may exceed 60%. Moreover, in this invention, it is especially preferable that the said ratio is 90/10-60/40.

Although the thickness of the oxygen barrier layer 13 is not specifically limited, The dry film thickness of 0.5-5.0 micrometers is preferable.

Also, 14 is a cushion layer, which is preferably formed when the photosensitive resin layer and the oxygen barrier layer are transferred to the adherend under heating and pressurization, even if there are some irregularities on the surface of the adherend, the transfer can be performed without incorporation of air. Do. In addition, for this purpose, although the thickness of the cushion layer depends on the material properties thereof, 5 to 50 µm is preferable.

Thermoplastic resin can be used as a material of the cushion layer 14, For example, the same thing as the material of the cushion layer 4 in 1st Embodiment mentioned above is mentioned. If necessary, a release agent may be added to control the peeling force with the plasticizer or the oxygen barrier layer.

The support of 15 may use a conventionally known plastic film. For example, the same material as the support 5 in the above-described first embodiment may be mentioned. In particular, a polyethylene terephthalate (PET) film which is strong in mechanical strength and excellent in heat stability is preferable. Although the thickness of a support body is not specifically limited, 150-35 micrometers is preferable.

In addition, as in the case of the first embodiment described above, in order to prevent the mixing of dust due to peeling charging, the area specific resistance value of the plastic film is preferably 10 ^{8 to 10} Ω. Or / and it is preferable to use a film provided with antistatic performance (for example, antistatic layer 16) as a support.

Next, the manufacturing method of the light-scattering layer formation transfer film of FIG. 3 by the structure mentioned above is demonstrated. First, a cushion layer is coated and formed on an antistatic support or a support provided with an antistatic layer on its back surface. As described above, the cushion layer may be formed by coating and drying the resin coating liquid using a known coating method such as roll coating, bar coating, comma coating, die coating, and gravure coating, or by melting the resin together with the support. Coating can be carried out by extruding. When adhesiveness with a support body is bad, you may use an adhesion | attachment assistance process (anchor process) on a support body, or the support body processed so that adhesion might be easy.

Subsequently, an oxygen barrier layer is formed on the cushion layer. The oxygen barrier layer is formed by coating and drying a coating liquid of an oxygen barrier resin containing pigment using a known coating method such as roll coating, bar coating, comma coating, die coating, gravure coating, and the like. As mentioned above, since the pigment which is powder is hard to obtain a uniform dispersion even if added directly in resin, a pigment is first disperse | distributed with a disperser in a suitable solvent, or it is disperse | distributed with a disperser by adding glass beads. Moreover, a pigment dispersion liquid is prepared by adding a dispersing agent as needed, and then a coating liquid is manufactured by adding in a resin.

Subsequently, a photosensitive resin layer is coated on the oxygen barrier layer. The photosensitive resin layer may also be formed by coating and drying using a known coating method such as roll coating, bar coating, comma coating, die coating or gravure coating in the same manner as the coating forming method of the cushion layer or the oxygen barrier layer.                 

Finally, a protective film is attached to protect the photosensitive resin layer.

A process of providing a light scattering layer having a predetermined surface shape on the adherend using the transfer film of FIG. 3 described above will be described with reference to FIGS. 4 and 5.

First, the protective film 11 is peeled off (see FIG. 4 (a)), and the exposed photosensitive resin layer 12 and the surface of the adherend 7 are attached (see FIG. Attachment is performed using the same well-known laminator as the case of 1st Embodiment mentioned above, and performing on conditions of the roll temperature of a laminator at 80-150 degreeC, a pressure of 3-10 kg / cm <2>, and a speed | rate of 300-1500 mm / min. It is preferable in practical use.

Regarding the roll temperature at the time of adhesion | attachment, the adhesion of the photosensitive resin layer 12 and the to-be-adhered body 7 is inferior at the adhesion temperature below 80 degreeC, and adhesion failure may arise. In addition, at an attachment temperature exceeding 150 ° C., problems such as wrinkles due to thermal deformation of the transfer film, melted cushion layer resin oozing from the edge of the transfer film, and remaining as residue on the adherend or contaminating the laminator roll, etc. It is undesirable because it occurs. In addition, if the temperature of the adherend 7 is heated to 80 to 150 ° C in advance, the transferability is improved, and the adhesion strength between the photosensitive resin layer 12 and the adherend 7 becomes stronger, so that the photosensitive resin layer is removed from the adherend 7. (12) It is hard to come off, and it is preferable. In heating below 80 ° C., depending on the transfer rate, sufficient effect is hardly obtained, and in heating above 150 ° C., wrinkles may occur due to heat deformation at the moment when the transfer film contacts the adherend 7. , Air may be generated between the photosensitive resin layer 12 and the adherend. In this embodiment, it is especially preferable to heat a to-be-adhered body in 90-130 degreeC.

After adhesion by the laminator is finished, other than the photosensitive resin layer 12 and the oxygen barrier layer 13 between the oxygen barrier layer 13 and the cushion layer 14 (antistatic agent 16, support body 15) , The cushion layer 14 is peeled off (see copper (c)), and only the photosensitive resin layer 12 and the oxygen barrier layer 13 are left on the adherend 7 (see copper (d)).

Subsequently, the photosensitive resin layer 12 is irradiated with ultraviolet rays through the oxygen barrier layer 13. In this case, ultraviolet rays are irradiated to the entire surface of the transfer-imparted portion or ultraviolet rays are irradiated through the mask 9 having the patterns as shown in FIG. 5 (d) if a light scattering layer having a predetermined pattern is to be formed. . 5 shows the case of forming a light scattering layer having a predetermined pattern. Thereafter, the oxygen barrier layer and the photosensitive resin layer of the unexposed portion are removed through a developing step and a rinse step to obtain a photosensitive resin layer 12 photocured on the entire surface or photocured in a pattern (Fig. 4 ( e), see FIG. 5 (e)). When a metal film is formed on the photosensitive resin layer by vapor deposition for the production of a light scattering reflector, heat is applied to the photosensitive resin layer during deposition, so that the metal film cannot be uniformly provided by the volatile components in the photosensitive resin layer, or the surface of the photosensitive resin layer Due to thermal deformation, the metal film may not be uniformly provided. Therefore, what is necessary is just to heat-process a photosensitive resin layer by heat of 130-250 degreeC as a pretreatment.

As described above, the photosensitive resin layer 12 having a predetermined surface shape can be formed on the adherend 7 using the transfer film of FIG. 3. Moreover, the obtained photosensitive resin layer 12 replaced the surface shape of the matt oxygen barrier layer 13, and has light scattering property because of the uneven | corrugated shape of the surface.

Moreover, it is preferable that the total light transmittance of the photosensitive resin layer (light scattering layer) formed in this way is 90% or more, a 10-point average roughness is 1.0 micrometer or less, and haze degree is 20 to 60%. Low light transmittance makes it difficult to use in transflective type LCDs. In addition, since light scattering property is low in the state in which haze degree is less than 20%, even if a metal thin film is formed, a specular light component will increase and sufficient light scattering reflection performance will not be obtained. When the haze degree exceeds 60%, the surface has a large projection or a dense state, so the surface smoothness is poor, the formation of the metal thin film becomes uneven, or the color of the color filter layer formed on the metal film. Problems such as nonuniformity or poor surface smoothness of the overcoating layer occur.

Moreover, in this invention, it is especially preferable that the ten-point average roughness of a light-scattering layer is 0.5 to 1.0 micrometer, and the haze degree is 30 to 60% of range.

In the light scattering layer thus formed, the light scattering reflector can be produced by forming the metal thin film 8 so as to cover the surface irregularities (see FIGS. 4 (f) and 5 (f)). The material of the metal thin film and the method of forming the metal thin film are as described above, and the thickness of the metal thin film may be set to a thickness from which the target transmittance and the target light scattering property can be obtained in the range of 200 to 1000 GPa, preferably 300 to 500 GPa. .

Effects of the Invention

As described in detail above, according to the invention of claim 1, there is an effect that the light scattering layer having a predetermined surface shape can be manufactured very simply and inexpensively and of high quality.

Further, according to the invention of claim 2, the target light scattering is achieved by a transfer film having a release layer having a surface characteristic of 0.2 to 2.0 µm with a ten point average roughness and a haze degree of 30 to 60%. You can get performance.

In addition, according to the invention of claim 3, by containing a pigment in the release layer, the surface of the release layer can be formed into a target shape.

Further, according to the invention of claim 4, the target release mold layer can be formed by containing a pigment having an average particle diameter of 0.1 to 4.0 µm in the release layer.

Further, according to the invention of claim 5, the target surface shape and appropriate peelability are obtained by containing the pigment in the release layer at a predetermined ratio.

Further, according to the invention of claim 6, the light scattering layer having a predetermined surface shape can be easily and cheaply formed in high quality by using the transfer film for forming the light scattering layer of the present invention.

In addition, according to the invention of claim 7, the pre-heating of the adherend improves the transferability, and the adhesion strength between the transparent resin layer and the adherend becomes strong, so that peeling of the adherend and the transparent resin layer can be prevented.

In addition, according to the invention of claim 8, the light scattering layer formed has a characteristic in which the total light transmittance of the light scattering layer is 90% or more, the surface shape is 1.0 µm or less with a ten-point average roughness, and the haze degree is 20 to 60%. A light scattering effect is obtained.

Further, according to the invention of claim 9, the light scattering reflector obtained by forming a metal thin film on the light scattering layer formed by the method of forming the light scattering layer according to the present invention has excellent light scattering performance, and is remarkably superior to the reflecting plate obtained by the conventional method. It has a target light scattering reflection performance.

Further, according to the invention of claim 10, a photosensitive resin layer having predetermined surface irregularities can be provided on the adherend, and furthermore, the layer has a light scattering performance targeted by surface irregularities.

In addition, according to the invention of claim 11, the pigment may be contained in the oxygen barrier layer so that the surface of the oxygen barrier layer can be formed into a target shape.

Further, according to the invention of claim 12, a target surface-shaped oxygen barrier layer can be formed by containing a pigment having an average particle diameter of 0.1 to 4.0 mu m in the oxygen barrier layer.

Further, according to the invention of claim 13, by containing the pigment in the oxygen barrier layer at a predetermined ratio, the target surface shape and the appropriate peelability of the cushion layer are obtained.

In addition, according to the invention of claim 14, the light scattering layer having a predetermined surface shape can be easily and cheaply formed in high quality by using the transfer film for forming a light scattering layer of the present invention.

Further, according to the invention of claim 15, when it is necessary to form the light scattering layer in a predetermined pattern, it is achieved by exposing using a mask having a predetermined pattern in the exposure step.

In addition, according to the invention of claim 16, the transferability is improved by heating the adherend in advance, and uniform transfer is achieved on the entire surface of the adherend, and the adhesion strength between the photosensitive resin layer and the adherend is increased, thereby exposing exposure, The peeling of the photosensitive resin layer from the adherend in the developing step is suppressed, and the exposure margin and the developing margin in the case of forming a pattern are widened, and production stability is improved.

In addition, according to the invention of claim 17, the light scattering layer formed has a total light transmittance of 90% or more, a 10-point average roughness of 1.0 μm or less, and a haze of 20 to 60%. The surface shape necessary to obtain a light scattering reflector having a reflection performance is obtained.

Further, according to the invention of claim 18, the light scattering reflector obtained by forming a metal thin film on the light scattering layer formed by the method of forming the light scattering layer according to the present invention has excellent light scattering reflection performance and is remarkably better than the reflecting plate obtained by the conventional method. Light scattering reflection performance.

EMBODIMENT OF THE INVENTION Hereinafter, the 1st Embodiment of this invention is described further more concretely by an Example.

Example 1

(Manufacture of Transfer Film)

As a support, a 75 micrometer PET film (Antistatic layer is provided to a back surface: area specific resistance value 10 ⁸ ohms), and a cushion layer is 20 micrometers of low-density polyethylene (Mirason M11P: Mitsui-DuPont Chemical Chemicals Co., Ltd. make). Was given on the support by a molten film by a T die. At this time, the cooling roll improved the surface smoothness using the mirror roll.

The release layer was selected from Tespine 322 (melamine-based resin: manufactured by Hitachikasei Polymer Kabushiki Kaisha) as a resin having a transparent resin layer and mold release property, and as an additive pigment therefor, Eposta S12 (average particle size: 1.2 µm, melamine Formaldehyde condensate (manufactured by Nippon Shokubai Co., Ltd.) was used, and this was added to a resin in a pigment dispersion obtained by bead dispersion in a mixed solvent of toluene / ethyl acetate and mixed sufficiently to obtain a coating solution. In addition, the average particle diameter of the pigment was measured by a laser diffraction particle size distribution analyzer and was represented by a particle size value of 50% by volume.

This coating solution was applied onto the cushion layer using bar coating and dried to form a release layer. At this time, it adjusted so that the ratio of resin solid content and pigment solid content might be 85/15, and this was apply | coated and formed so that it might become 3 micrometers of dry coating thickness on a cushion layer.

As the surface shape of the obtained matized release layer, the ten-point average roughness was 1.02 μm (using a three-dimensional surface roughness measuring instrument SE-30K Kosaka Corporation). The haze degree was 51.6% (the direct haze meter manufactured by Toyo Seiki Seisakusho). Use, the same below).

The transparent resin layer is composed of benzyl methacrylate / methyl methacrylate / methacrylate copolymer (molecular weight: 15000, acid value: 98.0 mgKOH / g) and a polyfunctional acrylate (M-400: soil) as a monomer component. AGO Seika Bushi Co., Ltd.) was made into 50/50 by solid content ratio, and 2-benzyl-2- dimethylamino-1- (4-morpholinophenyl) -butanone-1 (IRGACURE369: Chibaga) which is an initiator to this Ikikabu Shiki Kaisha Co., Ltd.) was added at a solid 10%. This was melt | dissolved in polyethyleneglycol monoethyl ether acetate which is a solvent, it was set as 20% coating liquid, and it coat-formed so that the coating thickness after drying might be set to 2 micrometers on the mold release layer by the bar coating method.

The protective film was pseudo-adhered by attaching 20 µm of the double-sided untreated polypropylene film to the transparent resin layer at 60 ° C.

(Transferring to adherend)

After peeling off the cover film, the exposed transparent resin layer and the glass substrate to be adhered to each other are attached with a laminator (manufactured by Taisei Laminator), and then the base film and the release layer are peeled off at the same time, thereby having a predetermined surface irregularity on the glass substrate. A transparent resin layer was given. In addition, the transfer conditions in the laminator are shown below. At this time, the glass substrate was previously heated to 100 ° C. immediately before the transfer.

Transcription condition

Transfer temperature: 120 ℃, Transfer pressure: 6㎏f / ㎠, Transfer speed: 1m / min

After transferring to a glass substrate, UV irradiation 20mj / cm <2> (integrated amount of light at 365 nm) was applied to the whole as a pre-exposure from the back of the base film, the transparent resin layer was semi-hardened, and then the base film was peeled off from the release layer. Then, the entire transparent resin layer was completely photocured by UV irradiation 500mj / cm 2, and then heated at 240 ° C. for 40 minutes to obtain a target light scattering layer.

This light scattering layer had a ten-point average roughness of 0.83 µm, a haze of 40.5%, and a total light transmittance of 91.4%.                 

(Formation of metal thin film)

In this way, an aluminum thin film was formed on the light scattering layer formed on the glass substrate to produce a light scattering reflecting plate. The aluminum thin film was formed to a thickness of 300 kPa by the vacuum deposition method. The evaporator used a high vacuum evaporation apparatus (JEE-4X Nippon Denshi), and the target metal used 99.99% of aluminum.

The diffuse reflectance of the produced light scattering reflector was measured with a spectrophotometer (U-3310 spectrophotometer: manufactured by Hitachi Seisakusho), and was 73% (550 nm), and exhibited excellent light scattering reflection characteristics. In this case, the transmittance was 6.1%.

Example 2

(Manufacture of Transfer Film)

A 75 µm PET film (prefer an antistatic layer on the back surface: an area specific resistance value of 10 ⁸ Ω) was used as the support, and the cushion layer was an acrylic copolymer resin (Mn 127000, Tg was 35 ° C: manufactured by Mitsubishi Rayon Kabushiki Kaisha). Application | coating formation was carried out so that the application | coating thickness after drying might be set to 15 micrometers.

The release layer was made of polyvinyl alcohol (B-17: manufactured by Denki Chemical Co., Ltd.) from a transparent resin layer and a material having releasability, and dissolved in water / methanol as a solvent. X52-854 as a pigment (Average particle diameter 0.8 micrometer, a silicon powder: Shin-Etsu Chemical Co., Ltd.) was added to the pigment dispersion obtained by bead dispersion in the mixed solvent of water / methanol previously, and it fully mixed, and it was set as the coating liquid.                 

This coating liquid was applied and dried on the cushion layer by a bar coating method to form a release layer. At this time, the mold release layer coating liquid was adjusted so that the ratio of resin solid content and pigment solid content might be 60/40, and this was apply | coated and formed so that it might become 3 micrometers of dry distribution thickness on a cushion layer.

As for the surface shape of the obtained mat release mold layer, 10-point average roughness was 0.68 micrometer and haze degree was 50.8%.

The transparent resin layer is a tetrafunctional acrylate (EB140: Daicel UCB Kabuki) as a monomer component in a benzyl methacrylate / methyl methacrylate / methacrylate copolymer (molecular weight: 16000, acid value: 95.8 mgKOH · g) as a main component. Kaisha) was made into 40/60 by solid ratio, and 2,4,6- tribenzyl benzoyl phenyl phosphine oxide (Lucirin TPO: BASF make) which is an initiator was added to this solid 10%. This was melt | dissolved in the polyethyleneglycol monoethyl ether acetate which is a solvent, and it coat-formed so that the application | coating thickness after drying might be set to 2 micrometers on the mold release layer by the bar coating method as 20% coating liquid.

The protective film was pseudo-adhesive by attaching 20 µm of the double-sided untreated polypropylene film to the transparent resin layer at 30 ° C.

(Grant to an adherend)

The light-scattering layer was obtained by transferring to a glass substrate on the same process and each condition as Example 1, and also baking-processing on the conditions similar to Example 1.

This light scattering layer had a ten-point average roughness of 0.54 µm, a haze of 46.1%, and a total light transmittance of 92.9%.                 

(Formation of metal thin film)

The aluminum thin film was applied to the light scattering layer formed on the glass substrate in the same manner as in Example 1.

The diffuse reflectance of the obtained light scattering reflector was 73.6% and the transmittance was 6.2%. Thus, the light-scattering reflector which was excellent in surface smoothness and excellent in the light reflection characteristic was obtained.

Example 3

(Manufacture of Transfer Film)

As a support, a 75 micrometer PET film (prefer an antistatic layer on the back surface: area specific resistance value 10 ⁸ ohms) was used, and the cushion layer was formed by coating the same resin as Example 2 on the support in the same manner.

The resin used for the release layer was also the same as in Example 2, but the pigment was a pigment dispersion obtained by previously dispersing tospal 130 (average particle size: 3 µm, silicon powder: manufactured by TOSHIBA Silicone Co., Ltd.) in a mixed solvent of water and methanol. It was made into the coating liquid by adding in a state and mixing sufficiently.

This coating solution was applied onto the cushion layer using bar coating and dried to form a release layer. At this time, the mold release layer coating liquid was adjusted so that the ratio of resin solid content and pigment solid content might be 90/10, and this was apply | coated and formed so that it might become 5 micrometers of dry coating thickness on a cushion layer.                 

As for the surface shape of the obtained mat release mold layer, 10-point average roughness was 1.13 micrometers and haze degree was 57.5%.

As the transparent resin layer, the resin having the main component was the same as in Example 2, and as the monomer component, polyfunctional acrylate (M-400: manufactured by Toago Seika Bush Industries Co., Ltd.) and trifunctional acrylate (M-310: Toago Seika) Bushki Co., Ltd.) was made into 40/10/50 by solid content ratio, and 2,4,6-trimethylbenzoylphenyl phosphine oxide (Lucirin TPO: BASF make) which is an initiator was added to this solid 10%. This was dissolved in polyethylene glycol monoethyl ether acetate, which was a solvent, and coated to form a 20% coating solution such that the coating thickness after drying was 3 µm on the release layer by the bar coating method.

The protective film was pseudo-adhesive by attaching 20 µm of the double-sided untreated polypropylene film to the transparent resin layer at 30 ° C.

(Grant to an adherend)

A light scattering layer was obtained by transferring to a glass substrate under the same process and each condition as in Example 1 except that the preheating temperature of the substrate was 120 ° C, and baking under the same conditions as in Example 1.

The light scattering layer had an average ten point roughness of 0.94 µm, a haze of 52.3%, and a total light transmittance of 91.2%.

(Formation of metal thin film)

Thus, the aluminum thin film was provided on the light-scattering layer formed on the glass substrate on the conditions similar to Example 1.                 

The diffuse reflectance of the obtained light scattering reflector was 78.3% and the transmittance was 4.3%.

Example 4

(Manufacture of Transfer Film)

As a support, a 75 micrometer PET film (providing an antistatic layer on the back surface: area specific resistance value 10 ⁸ ohms) was used, and the cushion layer was formed by coating the same resin as Examples 2 and 3 on the support in the same manner.

The resin used for the release layer was also the same as in Example 2 and Example 3, but the pigments were the same as those in Example 1 using Eposta S12 (average particle size: 1.2 µm, melamine-formaldehyde condensate: manufactured by Nippon Shoshokubai, Kabushiki Kaisha). It was made into the coating liquid by adding in the pigment dispersion liquid state obtained by carrying out the beads dispersion | distribution in the mixed solvent of water / methanol previously, and fully mixing.

This coating solution was applied onto the cushion layer using bar coating and dried to form a release layer. At this time, the mold release layer coating liquid was adjusted so that the ratio of resin solid content and pigment solid content might be 90/10, and this was apply | coated and formed so that it might become a dry coating thickness of 3 micrometers on a cushion layer.

As for the surface shape of the obtained mat release mold layer, 10-point average roughness was 0.89 micrometer and haze degree was 43.2%.

The transparent resin layer used the same resin, monomer, and initiator as Example 2, and the compounding quantity used the same quantity. This coating solution was coated and formed on the release layer by using bar coating so that the coating thickness after drying was 2 m.                 

The protective film was pseudo-adhesive by attaching 20 µm of the double-sided untreated polypropylene film to the transparent resin layer at 30 ° C.

(Grant to an adherend)

The light-scattering layer was obtained by transferring to a glass substrate on the same process and each condition as Example 1, and also baking-processing on the conditions similar to Example 1.

The light scattering layer had a ten-point average roughness of 0.78 µm, a haze of 38.6%, and a total light transmittance of 93.1%.

(Formation of metal thin film)

Thus, the aluminum thin film was provided on the light-scattering layer formed on the glass substrate on the conditions similar to Example 1.

The diffuse reflectance of the obtained light scattering reflector was 50.1% and the transmittance was 5.1%. The light scattering reflector obtained in Example 4 was a light scattering reflector having a low diffuse reflectance but a high specular reflectance and a strong directivity.

Comparative Example 1

(Manufacture of Transfer Film)

The same support as in Example 1 was used. The release layer was formed by coating Tespine 322 alone without a pigment on the cushion layer so as to have a dry coating layer of 3 μm. In the transparent resin layer, the materials used and the mixing ratio were the same as those in Example 1, but the same mixture of toluene / ethyl acetate was added to Eposta S12 as Example 1, so that the ratio of resin solids and pigment solids was 85/15. It was made into the coating liquid by adding in the pigment dispersion liquid state obtained by bead dispersion in the solvent, and mixing sufficiently. This was apply | coated so that a dry coating thickness might be set to 3 micrometers on a release layer.

As the protective film, the same polypropylene film as in Example 1 was attached at 60 ° C for pseudoadhesion.

(Transferring to adherend)

Transferred to a glass substrate as an adherend under the same method and same conditions as in Example 1. The base film was peeled from the release layer without performing pre-exposure from the back side after the transfer, and UV irradiation 500mj / cm 2 was then applied to the entire transparent resin layer. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a target light scattering layer.

This light scattering layer had a ten-point average roughness of 0.98 µm, a haze of 46.2%, and a total light transmittance of 87.8%.

(Formation of metal thin film)

In this manner, an aluminum thin film was formed on the light scattering layer formed on the glass substrate in the same manner as in Example 1, whereby a light scattering reflecting plate was manufactured.

The diffuse reflectance of the produced light scattering reflector was 65% (550 nm), and the transmittance was 5.8%. In the case of Comparative Example 1, since the pigment is present in the light scattering layer, the total light transmittance of the light scattering layer is lower than the haze degree compared with Example 1. Therefore, in order to raise the transmittance | permeability after aluminum thin film formation to a predetermined value, it is necessary to reduce aluminum deposition amount, and therefore, a diffuse reflectance will also fall.

Comparative Example 2                 

(Manufacture of Transfer Film)

In the release layer formulation of Example 1, the transfer film was manufactured by the same method using the same material except having adjusted so that the ratio of resin solid content and pigment solid content might be 98/2.

As a surface shape of the obtained mat release mold layer, ten point average roughness was 0.48 micrometer and haze was 19.8%.

(Transferring to adherend)

Transferred to a glass substrate as an adherend under the same conditions and methods as in Example 1.

The obtained light scattering layer had a ten-point average roughness of 0.33 µm, a haze of 18.2%, and a total light transmittance of 92.9%.

(Formation of metal thin film)

An aluminum thin film was formed under the same conditions and methods as in Example 1.

The diffuse reflectance of the produced light-scattering reflector was 20.6% (550 nm) and the transmittance was 5.3%, and the amount of pigment added in the matted release layer was less than that of Example 1, so that the target haze did not reach the target haze. As specular light became stronger as a performance, the diffuse reflectance became a very low value.

Comparative Example 3

(Manufacture of Transfer Film)

In the release layer formulation of Example 1, the transfer film was manufactured by the same method using the same material except having adjusted so that the ratio of resin solid content and pigment solid content might be 45/55.

As a surface shape of the obtained mat release mold layer, 10-point average roughness was 1.51 micrometers and haze degree was 83.8%.

(Transferring to adherend)

Transferred to a glass substrate as an adherend under the same conditions and methods as in Example 1. At this time, since the pigment ratio in a mold release layer is large and the pigment which exists in the interface of a mold release layer and a cushion layer increases, there exists a tendency for adhesive force to fall. In addition, since the density of protrusions on the surface of the release layer is dense, the contact area between the transparent resin layer and the release layer is increased, and the peeling force is heavy. In addition, since the thickness of the transparent resin layer was uneven in the coating thickness due to the effect of the uneven layer, the adhesion with the glass substrate became uneven, and the transferability was very unstable, so that a transfer failure occurred easily, and a portion that could not be transferred was generated. In addition, after the baking treatment, part of the light scattering layer was peeled off the glass substrate.

The obtained light scattering layer had a ten-point average roughness of 1.27 µm, a haze degree of 79.3%, and a total light transmittance of 92.5%.

(Formation of metal thin film)

An aluminum thin film was formed under the same conditions and methods as in Example 1.

The diffuse reflectance of the produced light scattering reflector was 87.5% (550 nm) and the transmittance was 4.7%. Since the haze degree of a mat release mold layer became high, the haze degree of the light-scattering layer after transfer to a glass substrate also became high, and the diffuse reflectance rate after aluminum deposition became high. However, since the surface property deteriorates and the ten-point average roughness exceeds 1.0 µm, trouble occurs in the process of providing a functional layer (eg, a color filter layer, an overcoating layer, a transparent electrode) formed on the metal thin film.

Comparative Example 4

(Manufacture of Transfer Film)

The same support as in Example 1 was used. The release layer was added to the transparent resin testine 322 used in Example 1 by bead dispersing the pigment KMP-600 (average particle diameter: 5.0 μm, silicon powder: Shin-Etsu Chemical Co., Ltd.) in a mixed solvent of toluene / ethyl acetate. The coating liquid was obtained by adding in a pigment dispersion state and mixing sufficiently.

This was applied and dried on the cushion layer in the same manner as in Example 1 to form a release layer. Moreover, it adjusted to 85/15 so that the ratio of resin solid content and pigment solid content at this time may become the same. In addition, the coating thickness was applied in the same manner as in Example 1 in the wet state, but the coating thickness after drying was 8 µm because the pigment particle diameter was large.

The surface shape of the obtained matified release layer was 10-point average roughness of 3.60 micrometers, and haze degree was 89.8%.

The transparent resin layer was formed by coating the same prescription as in Example 1 in the same manner. Application | coating formation was carried out so that the coating thickness after drying might be set to 3 micrometers, but the coating thickness was nonuniform because the surface roughness was large.

As the protective film, the same polypropylene film as in Example 1 was attached at 80 ° C., but the transparent resin layer was poor in uniformity due to the surface irregularities of the release layer, and the adhesiveness was weak because the surface roughness was large.

(Transferring to adherend)

Transferred to a glass substrate as an adherend under the same method and same conditions as in Example 1. 20mj / cm <2> preexposure was performed from the back surface after transfer, the base film was peeled from a release layer, and UV irradiation 500mj / cm <2> was performed to the whole transparent resin layer after that. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a target light scattering layer.

The light scattering layer had a ten-point average roughness of 2.78 µm, a haze of 82.3%, and a total light transmittance of 91.8%.

(Formation of metal thin film)

In this manner, on the light scattering layer formed on the glass substrate, an aluminum thin film was formed in the same manner as in Example 1 to produce a light scattering reflector. The diffuse reflectance of the produced light scattering reflector was 85.5% (550 nm) and the transmittance was 4.3%. The light scattering property after the formation of the metal thin film was good because the surface of the light scattering layer was large, but since the surface roughness was large even after the formation of the metal thin film, the trouble occurred in the process of providing a functional layer (eg, a glass filter layer, an overcoating layer, or a transparent electrode) formed thereon. Occurs.

Hereinafter, a second embodiment of the present invention will be described in more detail by way of examples.

Example 5

(Manufacture of Transfer Film)                 

A 75 µm PET film (Antistatic layer is applied to the backside: surface specific resistance value 10 ⁸ Ω) is used as the support, and the cushion layer is made of low density polyethylene (Becut softening point 86 DEG C, Mirason M11P: Mitsui Dupont Polychemical Kabushiki) 30 micrometers) was provided on the support body by the molten film by T-die. At this time, the cooling roll improved the surface smoothness using the mirror roll.

The oxygen barrier layer was selected from polyvinyl alcohol B-17 (saponification degree 87.0 to 89.0, polymerization degree 1700, manufactured by Denki Kagaku Kogyo Co., Ltd.) as a main resin, and adjusted to a 10% aqueous solution by steaming. 20 was obtained by using Eposta MS (average particle diameter 2.0 占 퐉, benzoguanamine / formaldehyde condensate: manufactured by Nippon Shokubai Co., Ltd.) as an additive pigment, and dispersing this in a mixed solvent of water / methanol. The coating liquid was obtained by adding to a resin aqueous solution in a% pigment dispersion state and fully mixing. In addition, the average particle diameter of the pigment was measured by a laser diffraction particle size distribution analyzer and was represented by a particle size value of 50% by volume.

This coating solution was applied and dried on the cushion layer using bar coating to form an oxygen barrier layer. At this time, it adjusted so that the ratio of resin solid content and pigment solid content might be 85/15, and this was apply | coated and formed so that it might become 3 micrometers of dry coating thickness on a cushion layer.

As the surface shape of the obtained matized oxygen barrier layer, the ten-point average roughness was 0.95 µm (using a three-dimensional surface roughness measuring instrument SE-30K Kosaka Corporation). The haze degree was 58.6% (direct haze meter Toyosei Seisakusho Co., Ltd.). First use.                 

Subsequently, the photosensitive resin layer was composed of benzyl methacrylate / methyl methacrylate / methacrylate copolymer (molecular weight: 15000, acid value 98.0 mgKOH / g) and a polyfunctional acrylate (M-400: Toago Seika Bush.) As a monomer component. Kikai Co., Ltd.) was made into 40/60 by solid secretion, and Irugacure 369 (acetophenone system: Chiba Chemical Co., Ltd. make) was added as a solid 10% as an initiator. This was dissolved and mixed in polyethylene glycol monoethyl ether acetate, which is a solvent, to form a 20% coating solution, and the coating was formed on the cushion layer by bar coating so that the coating thickness after drying was 2 m.

The protective film was pseudo-adhered by attaching 20 µm of a double-side untreated polypropylene film to the photosensitive resin layer at 60 ° C.

(Transferring to adhesive)

After peeling off the cover film, the exposed photosensitive resin layer and the glass substrate to be adhered are matched with a laminator (manufactured by Taisei Laminator), and then the support is peeled off between the cushion layer and the oxygen barrier layer, whereby the photosensitive resin layer is placed on the glass substrate. And an oxygen barrier layer containing pigments was transferred. In addition, the transfer conditions in the laminator are shown below. At this time, the glass substrate was previously heated to 100 ° C. immediately before the transfer.

Transcription condition

Transfer temperature: 120 ℃, Transfer pressure: 6㎏f / ㎠, Transfer speed: 1m / min

After transferring to a glass substrate, the photosensitive resin layer was subjected to full exposure (UV irradiation) through an oxygen barrier layer. If necessary, exposure is performed through a mask having a predetermined pattern. The exposure amount was irradiated with 50mj / cm <2> (integrated light quantity in 365 nm). After exposure, the solution was developed with an aqueous alkali solution (0.5% sodium carbonate / sodium bicarbonate mixed solution), and then sufficiently washed with distilled water. As a result, a resin layer having light scattering properties having the entire surface pattern or having a predetermined pattern was produced on the glass substrate. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a target light scattering layer.

This light scattering layer had a ten-point average roughness of 0.85 µm, a haze of 57.7%, and a total light transmittance of 90.4%.

(Formation of metal thin film)

In this way, an aluminum thin film was formed on the light scattering layer formed on the glass substrate to produce a light scattering reflecting plate. The aluminum thin film was formed to a thickness of 300 kPa by the vacuum deposition method. The evaporator used a high vacuum evaporation apparatus (JEE-4X Nippon Denshi), and the target metal used 99.99% of aluminum.

The diffuse reflectance of the light scattering reflector thus produced was measured with a spectrophotometer (U-3310 type spectrophotometer: Hitachi Seisakusho Co., Ltd., below). As a result, it was 67.1% (550 nm), and exhibited excellent light scattering reflection characteristics. In addition, the transmittance | permeability was 4.5% at this time.

Example 6

(Manufacture of Transfer Film)

A 75 µm PET film (prefer an antistatic layer on the back surface: an area specific resistance value of 10 ⁸ Ω) was used as a support, and the cushion layer was an acrylic copolymer resin (Mn 127000, Tg was 35 ° C: manufactured by Mitsubishi Rayon Kabuki Co., Ltd.). ), And in order to control the peeling force with an oxygen barrier layer to this resin, the thickness of the resin after drying was added 15% of silicone solids (KF351: manufactured by Shin-Etsu Chemical Co., Ltd.) It was applied to form a coating.

The oxygen barrier layer was selected from polyvinyl alcohol B-17 (saponification degree 87.0 to 89.0, polymerization degree 1700, manufactured by Denki Kagaku Kogyo Co., Ltd.) as a main resin, and adjusted to a 10% aqueous solution with a steam. To this was added a silicone resin fine particle (Tospal 120, 2.0 μm in average particle diameter, manufactured by TOSHIBA Silicone Kabuki Kaisha Co., Ltd.) as an additive pigment, which was then dispersed in a mixed solvent of water / methanol to obtain a resin in a 20% pigment dispersion state. The coating liquid was obtained by adding to aqueous solution and fully mixing.

This coating solution was applied and dried on the cushion layer using bar coating to form an oxygen barrier layer. At this time, it adjusted so that the ratio of resin solid content and pigment solid content might be 85/15, and this was apply | coated and formed so that it might become 3 micrometers of dry coating thickness on a cushion layer.

As a surface shape of the obtained matt oxygen barrier layer, ten point average roughness was 1.09 micrometers and haze degree was 56.7%.

Subsequently, the photosensitive resin layer was composed of benzyl methacrylate / methyl methacrylate / methacrylate copolymer (molecular weight: 16000, acid value: 95.8 mgKOH / g) and tetrafunctional acrylate (EB140: Daicel UCB Kabush) as a monomer component. Kikai Co., Ltd.) was made into 40/60 by solid ratio, and 2,4, 6- trimethyl benzoyl phenyl phosphine oxide (Lucirin TPO: BASF make) was added to this as solid 10% as an initiator. This was dissolved and mixed in polyethylene glycol monoethyl ether acetate, which is a solvent, to form a 20% coating solution, and the coating was formed on the cushion layer by bar coating so that the coating thickness after drying was 2 m.

The protective film was pseudo-adhered by attaching 20 µm of a double-side untreated polypropylene film to the photosensitive resin layer at 60 ° C.

(Transferring of adherend)

Transferred to the glass substrate under the same process and each condition as in Example 5.

After transferring to a glass substrate, the photosensitive resin layer was exposed to light (UV irradiation) through an oxygen barrier layer. At this time, the exposure amount 40mj / cm <2> (integrated light quantity in 365 nm) was irradiated through the glass mask in which the standard pattern which can evaluate the resolution was formed. Thereafter, the solution was developed with an aqueous alkali solution (0.5% sodium carbonate / sodium bicarbonate mixed solution), and then sufficiently washed with distilled water. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a light scattering layer having a target pattern. This light scattering layer had a ten-point average roughness of 0.89 µm, a haze of 54.8%, and a total light transmittance of 91.0%. Moreover, as a result of evaluating the resolution from the obtained pattern, the line pattern of 20 micrometers was obtained.

(Formation of metal thin film)

Thus, the aluminum thin film was provided on the light-scattering layer formed on the glass substrate on the conditions similar to Example 5. The diffuse reflectance of the light scattering reflector thus produced was 65.7% (550 nm), and showed very good light scattering reflection characteristics. In this case, the transmittance was 4.8%.                 

Example 7

(Manufacture of Transfer Film)

As a support, a 75 micrometer PET film (prefer an antistatic layer on the back surface: area specific resistance value 10 ⁸ ohms) was used, and the cushion layer was formed by apply | coating the same material as Example 6 on the support in the same way.

The resin using an oxygen barrier layer was also the same as in Example 6, but the pigments were prepared by adding Eposta S12 (average particle diameter: 1.2 µm, melamine-formaldehyde condensate: manufactured by Nippon Shokubai Co., Ltd.) in a mixed solvent of water and methanol. The coating liquid was obtained by adding to the aqueous resin solution in the state of 20% pigment dispersion liquid obtained by dispersion, and fully mixing.

This coating solution was applied and dried on the cushion layer using bar coating to form an oxygen barrier layer. At this time, it adjusted so that the ratio of resin solid content and pigment solid content might be 85/15, and this was apply | coated and formed so that it might become 3 micrometers of dry coating thickness on a cushion layer.

As a surface shape of the obtained matt oxygen barrier layer, ten point average roughness was 0.78 micrometer and haze degree was 55.8%.

Subsequently, the photosensitive resin layer was composed of benzyl methacrylate / methyl methacrylate / methacrylate copolymer (molecular weight: 16000, acid value 95.8 mgKOH / g) and a polyfunctional acrylate (M-400: Toago Seika Bush. Manufactured by Kikai Co., Ltd. and tetrafunctional acrylate (EB140: manufactured by Daicel UCB Kabusiki Co., Ltd.) at a solid ratio of 40/10/50, and 2,4,6-trimethylbenzoylphenylphosphine oxide is used as an initiator. (Lucirin TPO: manufactured by BASF) was added at 10% solids. This was dissolved and mixed in polyethylene glycol monoethyl ether acetate, which is a solvent, to form a 20% coating solution, and the coating was formed on the cushion layer by bar coating so that the coating thickness after drying was 2 m.

The protective film was pseudo-adhered by attaching 20 µm of a double-side untreated polypropylene film to the photosensitive resin layer at 60 ° C.

(Transferring to adherend)

Transferred to the glass substrate under the same process and each condition as in Example 5. In addition, UV was irradiated with the same exposure amount through the same glass mask used in Example 6. Thereafter, the same developer was used as in Example 6, and developed under the same conditions, followed by sufficient washing with distilled water. It heat-processed 240 degreeC and 40 minutes to this, and obtained the light-scattering layer which has the target pattern. The obtained light scattering layer had a ten-point average roughness of 0.72 µm, a haze of 54.3%, and a total light transmittance of 90.3%. Moreover, as a result of evaluating the resolution from the obtained pattern, the line pattern of 15 micrometers was obtained.

(Formation of metal thin film)

Thus, the aluminum thin film was provided on the light-scattering layer formed on the glass substrate on the conditions similar to Example 5. The diffuse reflectance of the light scattering reflector thus produced was 66.0% (550 nm), and showed excellent light scattering reflection characteristics. In addition, the transmittance | permeability was 5.0% at this time.

Comparative Example 5

(Manufacture of Transfer Film)                 

The same support as in Example 5 was used. The oxygen barrier layer was formed by coating the polyvinyl alcohol resin without a pigment on the cushion layer so as to have a dry coating thickness of 3 μm.

Although the material and compounding ratio which are used for the photosensitive resin layer are the same as Example 5, the pigment used in Example 1 was disperse | distributed in the polyethyleneglycol monoethyl ether acetate solvent so that the ratio of resin solid content and pigment solid content might be 85/15. It was added in the state of the pigment dispersion obtained and mixed sufficiently to form a coating. This was applied onto the oxygen barrier layer so as to have a dry coating thickness of 3 μm.

As the protective film, the same polypropylene film as in Example 1 was attached at 60 ° C for pseudoadhesion.

(Transferring to adherend)

Transfer was carried out to the glass substrate which is a to-be-adhered body under the same method and the same conditions as Example 5. After the transfer, exposure, development, and cleaning were performed under the same method and same conditions as in Example 5. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a target light scattering layer. This light scattering layer had a ten-point average roughness of 1.03 µm, a haze of 62.3%, and a total light transmittance of 83.4%.

(Formation of metal thin film)

 In this manner, on the light scattering layer formed on the glass substrate, an aluminum thin film was formed in the same manner as in Example 5 to produce a light scattering reflector. The diffuse reflectance of the produced light scattering reflector was 72.2% (550 nm) and the transmittance was 1.7%. In the case of Comparative Example 1, since the pigment is present in the light scattering layer, the total light transmittance of the light scattering layer is lower than the haze degree compared with Example 1. Therefore, in order to raise the transmittance | permeability after aluminum formation to a predetermined value, it is necessary to reduce aluminum deposition amount, and also the diffuse reflectance becomes low.

Comparative Example 6

(Manufacture of Transfer Film)

In the oxygen barrier layer formulation of Example 5, the transfer film was produced by the same method using the same material except having adjusted so that the ratio of resin solid content and pigment solid content might be 98/2. As a surface shape of the obtained matt oxygen barrier layer, ten point average roughness was 0.83 micrometer and haze degree was 20.2%.

(Transferring to adherend)

Transferring was carried out to the glass substrate as an adherend in the same conditions and in the same manner as in Example 5, followed by full exposure, development, cleaning and heat treatment. The obtained light scattering layer had a ten-point average roughness of 0.67 µm, a haze of 18.7%, and a total light transmittance of 89.2%.

(Formation of metal thin film)

The aluminum thin film was formed by the same conditions and the same method as Example 5. The diffuse reflectance of the produced light-scattering reflector was 39.4% (550 nm) and the transmittance was 5.6%. As compared with Example 1, the amount of pigment added in the matt oxygen barrier layer was small, and thus the target haze did not reach the target haze. As the performance after thin film formation, the specular reflection light became strong and the diffusion reflectance became a very low value.                 

Comparative Example 7

(Manufacture of Transfer Film)

In the formulation of the oxygen barrier layer of Example 5, except that the ratio of the resin solid content and the pigment solid content was adjusted to 45/55, the transfer film was produced in the same manner using the same material. However, when the coating liquid of the oxygen barrier layer is applied on the cushion layer by the bar coating method, the pigment ratio in the oxygen barrier layer is increased so that the pigments are arranged along the grooves of the wire wound around the cushion layer and the bar. Streaks) tended to occur, and it was difficult to obtain a uniform coated surface. Moreover, since there was much content in an oxygen barrier layer, adhesive force with a cushion layer fell and the oxygen barrier layer was easy to peel off. As a surface shape of the obtained matt oxygen barrier layer, ten point average roughness was 1.57 micrometers and haze degree was 72.5%.

(Transferring to adherend)

Transferred to a glass substrate as an adherend in the same conditions and in the same manner as in Example 5, and then subjected to total exposure, development, cleaning, and heat treatment. The obtained light scattering layer had a ten-point average roughness of 1.35 µm, a haze of 71.2%, and a total light transmittance of 90.3%.

(Formation of metal thin film)

The aluminum thin film was formed by the same conditions and the same method as Example 5. The diffuse reflectance of the produced light scattering reflector was 87.4% (550 nm) and the transmittance was 5.2%. Since the surface roughness of the matt oxygen barrier layer was increased and the haze degree was high, the surface roughness and haze of the light scattering layer after removing the oxygen barrier layer transferred to the glass substrate were also increased, and the diffusion reflectance rate after aluminum deposition was increased. However, since the ten-point average roughness of the light scattering layer exceeded 1.0 µm, the surface property was deteriorated, and thus, a dopable occurs in the process of providing a functional layer (eg, a color filter layer, an overcoating layer, a transparent electrode, etc.) formed on the metal thin film. Or a defect occurs in the added layer.

Comparative Example 8

(Manufacture of Transfer Film)

The same support as in Example 5 was used. The oxygen barrier layer was used in the same manner as in Example 5 except that the polyvinyl alcohol resin used in Example 5 was used, and KMP-597 (average particle diameter: 5.0 µm, silicon powder: Shin-Etsu Chemical Co., Ltd.) was used as the pigment. To obtain a coating liquid.

This was applied and dried on the cushion layer in the same manner as in Example 5 to form an oxygen barrier layer. Moreover, it adjusted so that the ratio of resin solid content and pigment solid content at this time might become the same as Example 5. In addition, the coating layer was applied in the same manner as in Example 1 in the wet state, but the coating thickness after drying was 8 µm because the pigment particle diameter was large. The surface shape of the obtained matt oxygen barrier layer had a ten-point average roughness of 3.27 µm and a haze degree of 88.3%.

The photosensitive resin layer was formed by coating the same formulation as in Example 5 in the same manner. Application | coating formation was carried out so that the coating thickness after drying might be set to 3 micrometers, but the coating thickness was nonuniform because the surface roughness was large.

The polypropylene film similar to Example 5 was attached at 60 degreeC as a protective film, and was bonded pseudo.

(Transferring to adherend)

Transferring was carried out to the glass substrate which is a to-be-adhered body under the same method and the same conditions as Example 5, and it carried out similarly to Example 5, and performed exposure, image development, and washing | cleaning. Thereafter, heat treatment was performed at 240 ° C. for 40 minutes to obtain a target light scattering layer. This light scattering layer had a ten-point average roughness of 2.15 µm, a haze of 81.9%, and a total light transmittance of 90.3%.

(Formation of metal thin film)

In this manner, on the light scattering layer formed on the glass substrate, an aluminum thin film was formed in the same manner as in Example 5 to produce a light scattering reflector. The diffuse reflectance of the produced light scattering reflector was 88.5% (550 nm) and the transmittance was 5.5%. Although the light scattering property after the formation of the metal thin film was good because the surface of the light scattering layer was large, in the process of providing a functional layer (for example, a color filter layer, an overcoating layer, a transparent electrode, etc.) formed thereon because the surface roughness was large even after the formation of the metal thin film. Doable or a defect occurs in the applied layer.

Claims (18)

As a transfer film for forming a light scattering layer formed by forming a release layer, a transparent resin layer sequentially imparted irregularities on a support, Forming a light scattering layer, characterized in that the release layer comprises a pigment having an average particle diameter of 0.1 ~ 4.0㎛, the surface shape of the release layer is 0.2 ~ 2.0㎛ with a ten-point average roughness, the haze degree is 30 to 60% Dragon transfer film. delete delete delete The transfer film for forming a light scattering layer according to claim 1, wherein the ratio of the resin solid content and the pigment solid content in the release layer is 95/5 to 50/50. After the transparent resin layer of the light-scattering layer formation transfer film of Claim 1 was attached to a to-be-adhered body under heating and pressurization conditions, the transparent water which removed the support body and a release layer, and transferred the surface shape of a release layer to the surface of an adherend. A method for forming a light scattering layer, comprising transferring a layer to form a light scattering layer on the surface of the adherend. 7. The method for forming a light scattering layer according to claim 6, wherein the transparent resin layer is provided to an adherend heated to 80 to 150 캜 in advance. 8. The total light transmittance of the light scattering layer formed by the method of forming the light scattering layer according to claim 6 or 7 is 90% or more, the surface shape is 1.0 mu m or less with a ten point average roughness, and the haze is 20 to 60%. Light scattering film made with. The light-scattering reflecting plate which formed the metal thin film on the light-scattering layer formed by the formation method of the light-scattering layer of Claim 6 or 7. A light scattering layer-forming transfer film formed by sequentially forming an oxygen barrier layer and a photosensitive resin layer on which a concave and convexity is sequentially provided, the surface shape of the oxygen barrier layer having a ten point average roughness of 0.2 to 2.0 µm, and a haze degree of 30 to 60 Transfer film for forming a light scattering layer, characterized in that%. The transfer film for forming a light scattering layer according to claim 10, wherein a pigment is contained in said oxygen barrier layer. The transfer film for forming a light scattering layer according to claim 11, wherein the average particle diameter of the pigment contained in said oxygen barrier layer is 0.1 to 4.0 mu m. The transfer film for forming a light scattering layer according to claim 11 or 12, wherein a ratio of a resin solid content and a pigment solid content in the oxygen barrier layer is 95/5 to 50/50. After attaching the photosensitive resin layer of the light-scattering layer formation transfer film of Claim 10 to a to-be-adhered body under heating and pressurization conditions, a support body is removed and the photosensitive resin layer and an oxygen barrier layer are transferred to a to-be-adhered surface, and it is continued. And forming a light scattering layer on the surface of the adherend through a step of exposing and removing an oxygen barrier layer. After attaching the photosensitive resin layer of the light-scattering layer formation transfer film of Claim 10 in accordance with a to-be-adhered body under heating and pressurization conditions, a support body is removed and the photosensitive resin layer and an oxygen barrier layer are transferred to a to-be-adhered surface, and it continues. To form a patterned light scattering layer on the surface of the adherend through a process of pattern exposure through a mask having a predetermined pattern, and a developing process of removing an oxygen barrier layer and a photosensitive resin layer of an unexposed portion. Method of formation. The method for forming a light scattering layer according to claim 14 or 15, wherein the photosensitive resin layer and the oxygen barrier layer are transferred to an adherend heated to 80 to 150 ° C in advance. The light scattering layer formed by the method for forming a light scattering layer according to claim 14 or 15 has a total light transmittance of 90% or more, a surface shape of 1.0 µm or less with a ten-point average roughness, and a haze of 20 to 60%. Light scattering film. The light-scattering reflector plate which formed the metal thin film on the light-scattering layer formed by the formation method of the light-scattering layer of Claim 14 or 15.

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