JP2007133271A - Lens substrate, method for manufacturing lens substrate, transmission type screen and rear type projector - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lens substrate capable of displaying a picture excellent in contrast and made excellent in visibility angle characteristic, and to provide a manufacturing method for efficiently manufacturing the lens substrate, a transmission type screen equipped with the lens substrate and a rear type projector. <P>SOLUTION: The lens substrate is equipped with a substrate body having many lens parts, and a light shielding film having an aperture part. The light shielding film has a plurality of light shielding layers having light shielding property, and at least one light transmitting layer having light transmitting property, and is constituted by interposing the light transmitting layer between the adjacent light shielding layers. The light shielding film has the first light shielding layer and the second light shielding layer provided on an opposite surface side to the surface of the first light shielding layer opposed to the substrate body. When the area of the aperture part in the first light shielding layer is defined as S<SB>S</SB>[μm<SP>2</SP>] and the area of the aperture part in the second light shielding layer is defined as S<SB>L</SB>[μm<SP>2</SP>], they satisfy relation 0.55≤S<SB>S</SB>/S<SB>L</SB>≤0.95. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a lens substrate, a method for manufacturing the lens substrate, a transmissive screen, and a rear projector.

In recent years, the demand for rear projectors is increasing as a display suitable for home theater monitors, large-screen televisions, and the like.
A lenticular lens substrate or a microlens substrate is generally used for a transmissive screen used in a rear projector.
In such a lens substrate, a light shielding layer (black mask) is provided for the purpose of improving the contrast of an image (see, for example, Patent Document 1).

However, it has been difficult to sufficiently improve the contrast by sufficiently suppressing external light reflection and the like by the light shielding layer.
In order to improve the light shielding property and improve the contrast, it is conceivable to form a thick light shielding layer. However, if the light shielding layer is formed thick, the contrast when observed from the direction perpendicular to the lens substrate is improved. However, when the lens substrate is observed from an oblique direction, there is a problem that light for image formation is blocked by the light shielding layer (so-called “vignetting” occurs). As a result, there has been a problem that viewing angle characteristics are deteriorated.

Japanese Patent Laid-Open No. 2001-74918

  An object of the present invention is to provide a lens substrate that can display an image with excellent contrast and has excellent viewing angle characteristics, and a manufacturing method that can efficiently manufacture the lens substrate. Another object of the present invention is to provide a transmissive screen and a rear projector provided with the lens substrate.

Such an object is achieved by the present invention described below.
The lens substrate of the present invention is a lens substrate comprising a substrate body having a large number of lens portions, and a light shielding film having an opening,
The light-shielding film includes a plurality of light-shielding layers having a light-shielding property and at least one light-transmitting layer having a light-transmitting property, and the light-transmitting layer is interposed between the adjacent light-shielding layers. It is characterized by having an inserted configuration.
Accordingly, it is possible to provide a lens substrate that can display an image with excellent contrast and that has excellent viewing angle characteristics.

In the lens substrate according to the aspect of the invention, the light shielding film may include a first light shielding layer and a second light shielding layer having an opening larger than the opening provided in the first light shielding layer as the light shielding layer. And having
When the area of the opening in the first light shielding layer is S _S [μm ² ] and the area of the opening in the second light shielding layer is S _L [μm ² ], 0.55 ≦ S _S / S _L It is preferable to satisfy the relationship of ≦ 0.95.
Thereby, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent.

In the lens substrate of the present invention, it is preferable that the light transmission layer has a thickness of 2 to 35 μm.
Thereby, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent.
In the lens substrate of the present invention, it is preferable that the light shielding layer has a thickness of 0.5 to 5 μm.
As a result, it is possible to more effectively prevent the problem that light for image formation is blocked by the light-shielding layer (so-called “vignetting”), and the light-shielding property of the entire light-shielding film is particularly improved. It can be excellent. As a result, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent.

In the lens substrate of the present invention, when the refractive index of the constituent material of the substrate body is n ₁ and the refractive index of the constituent material of the light transmission layer is n ₂ , −0.18 ≦ n ₁ −n ₂ ≦ 0.18 It is preferable to satisfy this relationship.
Thereby, it is possible to make the viewing angle characteristics particularly excellent while sufficiently improving the light utilization efficiency.

In the lens substrate of the present invention, it is preferable that the aperture ratio when the lens substrate is viewed in plan is 5 to 20%.
Thereby, it is possible to display an image with more excellent contrast while having a sufficiently excellent viewing angle characteristic.
The lens substrate of the present invention is preferably a microlens substrate provided with a microlens as the lens portion.
Thereby, the viewing angle characteristic in each direction (for example, the up-down direction and the left-right direction) can be made particularly excellent.

In the lens substrate of the present invention, it is preferable that the substrate body includes a lens portion having a different size as the lens portion.
As described above, when the lens substrate is provided with a lens portion having a different size, generally, the variation in the size of each opening when the lens substrate is viewed in plan is likely to be large, and the luminance in the displayed image is increased. There has been a problem that unevenness (brightness variation in each part) becomes remarkable. In addition, when the size of the opening is uniform, luminance unevenness when observed from the front of the lens substrate is suppressed, but the light transmittance at each opening (refracted by the lens). There is a problem in that the variation in the light transmittance) is large, and the luminance unevenness when observed from an oblique direction becomes remarkable.
On the other hand, in the present invention, even when the lens portions having different sizes are provided as described above, the occurrence of the luminance unevenness as described above can be effectively prevented.

The method for producing a lens substrate of the present invention is a method for producing a lens substrate comprising a substrate body having a large number of lens portions and a light-shielding film having openings.
A first step of forming a light-transmitting layer having a light transmitting property by applying a positive photosensitive adhesive to the surface of the substrate body opposite to the surface on which the lens portion is formed;
Performing a process of irradiating the light transmitting layer with light through the substrate body, and reducing the adhesiveness of the photosensitive portion;
A third step of providing a light shielding layer forming material on a portion of the light transmission layer other than the photosensitive portion and forming a light shielding layer having an opening;
By repeating the first to third steps a plurality of times, the light shielding film in which a plurality of the light shielding layers are laminated via the light transmission layer is formed.
Accordingly, it is possible to provide a lens substrate manufacturing method that can display an image with excellent contrast and that can manufacture a lens substrate with excellent viewing angle characteristics.

In the method for manufacturing a lens substrate of the present invention, the third step is a step of bonding a light shielding layer transfer sheet having a layer composed of the light shielding layer forming material on the light transmission layer,
It is preferable to include a step of peeling the bonded light shielding layer transfer sheet and transferring the light shielding layer forming material to the non-photosensitive portion of the photosensitive adhesive.
Thereby, the light shielding film provided with the light shielding layer and the light transmission layer having a suitable thickness can be efficiently formed.

The transmission screen of the present invention is characterized by including the lens substrate of the present invention.
As a result, it is possible to provide a transmissive screen that can display an image with excellent contrast and that has excellent viewing angle characteristics.
The transmission screen of the present invention is characterized by including a lens substrate manufactured by using the method of the present invention.
As a result, it is possible to provide a transmissive screen that can display an image with excellent contrast and that has excellent viewing angle characteristics.

In the transmissive screen of the present invention, a Fresnel lens portion in which a Fresnel lens is formed on the light exit side;
It is preferable that the lens substrate is provided on the light emission side of the Fresnel lens portion.
As a result, it is possible to provide a transmissive screen that can display an image with excellent contrast and that has excellent viewing angle characteristics.
A rear projector according to the present invention includes the transmission screen according to the present invention.
Accordingly, it is possible to provide a rear projector that can display an image with excellent contrast and that has excellent viewing angle characteristics.

Hereinafter, a lens substrate, a lens substrate manufacturing method, a transmissive screen, and a rear projector of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
In the present invention, the “substrate” refers to a concept that is substantially inflexible and includes a relatively large thickness, a sheet-like material, a film-like material, and the like. . Further, in the present invention, the “opening portion” means a light transmission portion of a light shielding film (light shielding layer) as a light shielding portion when a light shielding film having a light shielding property (light shielding layer constituting the light shielding film) is viewed in plan view. This is a concept that includes a portion that is filled with a material that is not substantially colored (a material that transmits light) or the like.
The use of the lens substrate of the present invention is not particularly limited, but in the following description, the lens substrate will be described as being mainly used as a member constituting a transmissive screen and a rear projector.

First, the configuration of the lens substrate and the transmission screen of the present invention will be described.
FIG. 1 is a schematic longitudinal sectional view showing a first embodiment of the lens substrate (microlens substrate) of the present invention, FIG. 2 is a plan view of the lens substrate (microlens substrate) shown in FIG. 1, and FIG. FIG. 4 is a schematic longitudinal sectional view showing how external light incident on the microlens substrate shown in FIG. 1 is attenuated. FIG. 4 shows the transmission type of the present invention including the lens substrate (microlens substrate) shown in FIG. It is a typical longitudinal section showing a 1st embodiment of a screen. In the following description, the left side in FIGS. 1 and 4 is referred to as “(light) incident side”, and the right side is referred to as “(light) emission side”. In the present invention, unless otherwise specified, the “(light) incident side” and the “(light) output side” are the “incident side” of light for obtaining image light (video light), respectively. ”And“ outgoing side ”, not“ incident side ”or“ outgoing side ”of external light or the like.

The microlens substrate (lens substrate) 1 is a member constituting a transmission screen 10 described later, and includes a plurality of microlenses (lens portions) 21 arranged in a predetermined pattern as shown in FIG. A substrate body 2, a black matrix (light shielding film) 3, and a diffusion unit 4 having a function of diffusing incident light by irregular reflection are provided.
The substrate body 2 is usually composed mainly of a material having optical transparency.
As the constituent material of the substrate body 2, for example, various resin materials, various glass materials, and the like can be used. From the viewpoint of productivity of the substrate body 2, adhesion to the first light transmission layer 311 described later, and the like. Therefore, a resin material is preferable.

  Examples of the resin material constituting the substrate body 2 include polyolefins such as polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, and polychlorinated. Vinylidene, polystyrene, polyamide (eg, nylon 6, nylon 46, nylon 66, nylon 610, nylon 612, nylon 11, nylon 12, nylon 6-12, nylon 6-66), polyimide, polyamideimide, polycarbonate (PC), Poly- (4-methylpentene-1), ionomer, acrylic resin, acrylonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), butadiene-styrene copolymer Polyoxymethylene, polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyester such as polycyclohexane terephthalate (PCT), polyether, polyether ketone (PEK), polyether ether ketone (PEEK), polyether imide, polyacetal (POM), polyphenylene oxide, modified polyphenylene oxide, polysulfone, polyether sulfone, polyphenylene sulfide, polyarylate, aromatic polyester (liquid crystal polymer), poly Tetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurea Various polyesters, polyesters, polyamides, polybutadienes, transpolyisoprenes, fluororubbers, chlorinated polyethylenes, and other thermoplastic elastomers, epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyesters, silicones Resins, urethane-based resins, etc., or copolymers, blends, polymer alloys, etc. mainly composed of these, and combinations of one or more of these (for example, blend resins, polymer alloys, laminates) As body etc.).

  The constituent material (solidified material) of the substrate body 2 generally has an absolute refractive index greater than various gases (the atmosphere in which the microlens substrate 1 is used), but the specific value of the absolute refractive index is 1.4 to 1.58 is preferable, and 1.5 to 1.56 is more preferable. When the absolute refractive index of the constituent material of the substrate body 2 is a value within the above range, the viewing angle characteristic can be made particularly excellent while making the utilization efficiency of light (incident light) particularly excellent.

The microlens substrate 1 includes a plurality of microlenses (lens portions) 21 as convex lenses having convex surfaces on the light incident surface side.
In the present embodiment, the microlens (lens portion) 21 has a flat shape (substantially oval) in which the vertical width (vertical width) when the microlens substrate 1 is viewed in plan is smaller than the horizontal width (horizontal width). (Substantially bowl-shaped). When the microlens 21 has such a shape, it is possible to make the viewing angle characteristics particularly excellent while effectively preventing the occurrence of inconvenience such as moire. In particular, both the horizontal and vertical viewing angle characteristics can be improved.

When the length in the minor axis direction (longitudinal direction) of the microlens 21 in plan view is L ₁ [μm] and the length in the major axis direction (lateral direction) is L ₂ [μm], 0.50 ≦ It is preferable to satisfy the relationship of L ₁ / L ₂ ≦ 0.99, more preferably satisfy the relationship of 0.60 ≦ L ₁ / L ₂ ≦ 0.90, and 0.65 ≦ L ₁ / L ₂ More preferably, the relationship of ≦ 0.80 is satisfied. By satisfying the relationship as described above, the effects as described above become more remarkable.

  The length of the microlens 21 in the short axis direction (vertical width of the microlens 21) in plan view is preferably 10 to 200 μm, more preferably 30 to 150 μm, and 50 to 100 μm. Is more preferable. When the length of the microlens 21 in the short axis direction is a value within the above range, it is possible to obtain sufficient resolution in the image projected on the screen while effectively preventing the occurrence of inconvenience such as moire. The productivity of the microlens substrate 1 (transmission type screen 10) can be further increased.

  Further, the length of the microlens 21 in the major axis direction (horizontal width of the microlens 21) in plan view is preferably 15 to 250 μm, more preferably 45 to 200 μm, and 70 to 150 μm. Is more preferable. When the length of the microlens 21 in the short axis direction is a value within the above range, it is possible to obtain sufficient resolution in the image projected on the screen while effectively preventing the occurrence of inconvenience such as moire. The productivity of the microlens substrate 1 (transmission type screen 10) can be further increased.

  Further, the radius of curvature of the microlens 21 is preferably 7.5 to 375 μm, more preferably 30 to 180 μm, and further preferably 70 to 120 μm. When the radius of curvature of the microlens 21 is a value within the above range, the viewing angle characteristics can be made particularly excellent. In particular, both the horizontal and vertical viewing angle characteristics can be improved. The microlens 21 may have a different radius of curvature in the minor axis direction and a radius of curvature in the major axis direction. In such a case, the radius of curvature in the major axis direction is a value within the above range. Is preferred.

The height of the microlens 21 is preferably 7.5 to 375 μm, more preferably 30 to 180 μm, and even more preferably 70 to 120 μm. When the height of the microlens 21 is within the above range, the light utilization efficiency and viewing angle characteristics can be made particularly excellent.
The plurality of microlenses 21 are arranged in a staggered pattern (in a staggered pattern). By arranging the microlenses 21 in this way, it is possible to effectively prevent inconveniences such as moire. On the other hand, for example, if the microlenses are arranged in a square lattice shape or the like, it may be difficult to sufficiently prevent the occurrence of inconvenience such as moire depending on the size of the microlenses 21 and the like. . Further, when the microlenses are randomly arranged, depending on the size of the microlens 21 or the like, it becomes difficult to sufficiently increase the occupation ratio of the microlenses in the effective region where the microlenses are formed. It is difficult to sufficiently increase the transmittance (light utilization efficiency), and the obtained image may be dark.

  As described above, in the present embodiment, the microlenses 21 are arranged in a staggered pattern when the microlens substrate 1 is viewed in plan view. However, the first row includes a plurality of microlenses 21. 25 and the adjacent second row 26 are preferably offset by a half pitch in the vertical direction. As a result, it is possible to more effectively prevent the occurrence of moire due to light interference and to make the viewing angle characteristics particularly excellent.

The arrangement method of the microlenses 21 is not limited to the one described above. For example, even if the arrangement is a square lattice, the arrangement is optically random (from the main surface side of the microlens substrate 1 in plan view). In this case, the microlenses 21 may be arranged in a random positional relationship with each other.
Further, when the microlens substrate 1 is viewed in plan from the light incident surface side (direction shown in FIG. 2), the occupation ratio of the microlens 21 is 95 to 115 in the effective region where the microlens 21 is formed. % Is preferred. When the occupation ratio of the microlens 21 is a value within the above range, the light use efficiency can be further improved, and the brightness and contrast of the projected image can be made particularly excellent. The occupation ratio of the microlens 21 is a line segment connecting the center 211 of the microlens 21 when viewed in plan and the central portion of the portion adjacent to the microlens 21 where the microlens 21 is not formed. It can be determined as a ratio (L ₃ / L ₄ × 100 [%]) between the length L ₃ [μm] of the portion where the microlens 21 is formed and the length L ₄ [μm] of the line segment. (See FIG. 2).

  As described above, by strictly defining the shape and arrangement method of the microlenses, the viewing angle characteristics and the like can be made particularly excellent while effectively preventing the occurrence of moire due to light interference. . In particular, by strictly defining the shape and arrangement method of the microlens as described above, the microlens is formed by the effect of having the microlens having the shape and arrangement method as described above and the method described in detail later. The effects of having the black matrix 3 act synergistically, and particularly excellent effects (for example, particularly excellent viewing angle characteristics, light utilization efficiency, etc.) can be obtained.

Each microlens 21 is provided as a convex lens protruding toward the incident side, and the focal point f is located near the surface on the emission side of the substrate body 2 and near the opening 33 of the black matrix (light-shielding film) 3. Designed to be That is, parallel light La (parallel light La from a Fresnel lens unit 5 described later) incident on the microlens substrate 1 from a substantially vertical direction is condensed by each microlens 21 of the microlens substrate 1 and A focal point f is formed in the vicinity of the surface on the exit side of the main body 2 and in the vicinity of the opening 33 of the black matrix 3. As described above, the microlens 21 is focused near the surface on the emission side of the substrate body 2 and near the opening 33 of the black matrix 3, so that the light utilization efficiency can be made particularly excellent. As a result, the contrast of the image formed by the light transmitted through the microlens substrate 1 can be made particularly excellent.
A black matrix (light-shielding film) 3 is provided on the light emission side surface of the substrate body 2.

  The black matrix 3 includes a first light transmission layer 311 and a second light transmission layer 312 as light transmission layers having light transmission properties. As a light shielding layer having a light shielding property, a first light shielding layer 321 and a second light shielding layer 322 are provided. The black matrix 3 includes a first light transmission layer 311, a first light shielding layer 321, a second light transmission layer 312, and a second light shielding layer 322 on the surface on the emission side of the substrate body 2. These are stacked in this order. In other words, the black matrix (light shielding film) includes a plurality of light shielding layers and at least one light transmission layer, and has a configuration in which a light transmission layer is interposed between adjacent light shielding layers. is there. By having such a configuration, as shown in FIG. 3, even when light is reflected on the surface of the light shielding layer, the external light Lc incident on the black matrix 3 is between the two light shielding layers. Attenuation is abruptly reflected while being reflected (between the first light shielding layer 321 and the second light shielding layer 322). Thereby, more external light can be absorbed by the light shielding layer. As a result, the contrast of the displayed image can be made particularly excellent. Further, as described above, since the black matrix 3 has a configuration in which the light shielding layer is laminated via the light transmission layer, the thickness per layer of the light shielding layer can be made relatively thin. . This effectively prevents light for image formation from entering the light shielding layer (portion excluding the opening 33) and being absorbed by the light shielding layer. In particular, light refracted by the microlens (lens portion) is incident on the light shielding film (portion excluding the opening) from the opening of the light shielding film, so that emission from the lens substrate is hindered, so-called vignetting phenomenon occurs. Can be effectively prevented. Thereby, the viewing angle characteristics of the microlens substrate 1 are excellent. Further, as described above, the black matrix 3 has a configuration in which the light shielding layer 32 is laminated via the light transmission layer, so that the total thickness of the entire light shielding layer (the first light shielding layer in the configuration shown in the drawing). Even when the sum of the thickness of 321 and the thickness of the second light shielding layer 322 is made relatively small, the light shielding property of the black matrix (light shielding film) 3 can be made excellent. This is because when external light or the like is incident on the black matrix 3, the light is absorbed in each light shielding layer, and reflection of light at the interface between adjacent layers occurs. Since it attenuates rapidly, it is considered that the light once incident on the black matrix 3 is absorbed by a very high efficiency.

The above effects cannot be obtained simply by forming the light shielding layer (light shielding film) thick. That is, when the light-shielding layer (light-shielding film) is thick, the light transmittance can be made relatively low, but the contrast is reduced due to reflection on the surface of the light-shielding layer (light-shielding film) as described above. Etc. cannot be sufficiently prevented. Further, when the light shielding layer (light shielding film) is simply formed thick, vignetting is likely to occur due to the thickness of the light shielding film itself, and the viewing angle characteristics are deteriorated.
In the present invention, the light transmissive layer may be any material that can transmit light, and the light shielding layer is superior in light shielding properties (low light transmissive property) as compared to the light transmissive layer. Good. Therefore, for example, the light transmission layer may be colored with a predetermined concentration.

In the following description, the first light transmission layer 311 and the second light transmission layer 312 are collectively referred to as the light transmission layer 31, and the first light shielding layer 321 and the second light shielding layer 322 are collectively referred to as the light shielding layer. 32 may be referred to.
Such a black matrix 3 has an opening 33 on the optical path of the light transmitted through each microlens 21. That is, the first light shielding layer 321 has a first opening 331, and the second light shielding layer 322 has a second opening 332. Thereby, unnecessary light can be blocked while sufficiently transmitting the light for image formation. Note that in this specification, the first opening 331 and the second opening 332 may be collectively referred to as the opening 33.

  In addition, the size of the opening provided in each light shielding layer 32 varies depending on the degree of convergence of light by the microlens (lens unit) 21. That is, in the illustrated configuration, in the first light-shielding layer 321 with a relatively small degree of condensing by the microlens 21 (the size of the condensing spot is large), the size of the opening 331 is relatively large. On the other hand, in the second light-shielding layer 322 having a relatively high degree of light collection by the microlens 21 (the size of the light-collecting spot is small), the size of the opening 332 is relatively small. The contrast when the displayed image is observed from substantially the front of the microlens substrate 1 is made particularly excellent, so-called vignetting is effectively prevented, and the viewing angle characteristics can be made particularly excellent. In other words, even when images displayed from various directions such as the front and oblique directions are observed with respect to the microlens substrate 1, an image with excellent contrast can be viewed.

The area of the opening 331 (smaller opening) in the first light shielding layer 321 is S _S [μm ² ], and the area of the opening (larger opening) in the second light shielding layer 322 is S _L [μm ² ]. , It is preferable to satisfy the relationship of 0.55 ≦ S _S / S _L ≦ 0.95, more preferably to satisfy the relationship of 0.70 ≦ S _S / S _L ≦ 0.90, More preferably, the relationship of 80 ≦ S _S / S _L ≦ 0.90 is satisfied. By satisfying such a relationship, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent.

The thickness of the light transmission layer 31 is preferably 2 to 35 μm, and more preferably 5 to 25 μm. When the thickness of the light transmission layer 31 is within the above range, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent. It should be noted that the thickness of each light transmission layer 31 (the first light transmission layer 311 and the second light transmission layer 312) may be the same or different. Are preferably included in the above-mentioned range.
The light transmission layer 31 is made of a light transmissive material.
As the constituent material of the light transmission layer 31, for example, various resin materials, various glass materials, and the like can be used. From the viewpoint of adhesion to the substrate body 2 described above, a resin material is preferable.

  Examples of the resin material constituting the light transmission layer 31 include polyolefins such as polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, poly Vinylidene chloride, polystyrene, polyamide (eg, nylon 6, nylon 46, nylon 66, nylon 610, nylon 612, nylon 11, nylon 12, nylon 6-12, nylon 6-66), polyimide, polyamideimide, polycarbonate (PC) , Poly- (4-methylpentene-1), ionomer, acrylic resin (including acrylic adhesive), acrylonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), Polyesters such as tadiene-styrene copolymer, polyoxymethylene, polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polycyclohexane terephthalate (PCT) Resin, polyether, polyetherketone (PEK), polyetheretherketone (PEEK), polyetherimide, polyacetal (POM), polyphenylene oxide, modified polyphenylene oxide, polysulfone, polyethersulfone, polyphenylene sulfide, polyarylate, Aromatic polyester (liquid crystal polymer), polytetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin , Polyvinyl chloride, polyurethane, polyester, polyamide, polybutadiene, trans polyisoprene, fluoro rubber, chlorinated polyethylene, and other thermoplastic elastomers, epoxy resin, phenol resin, urea resin, melamine Resins, unsaturated polyesters, silicone resins, urethane resins, and the like, or copolymers, blends, polymer alloys, etc. mainly composed of these, and combinations of one or more of these (for example, , Blend resins, polymer alloys, laminates, etc.).

  The constituent material (solidified material) of the light transmission layer 31 generally has an absolute refractive index larger than various gases (the atmosphere in which the microlens substrate 1 is used), but a specific value of the absolute refractive index. Is preferably 1.40 to 1.58, more preferably 1.50 to 1.58. When the absolute refractive index of the constituent material of the light transmission layer 31 is a value within the above range, the viewing angle characteristic can be particularly excellent while the utilization efficiency of light (incident light) is particularly excellent. .

Further, when the refractive index (absolute refractive index) of the constituent material of the substrate body 2 is n ₁ and the refractive index (absolute refractive index) of the constituent material of the light transmission layer 31 is n ₂ , −0.18 ≦ n ₁ − It is preferable to satisfy the relationship of n ₂ ≦ 0.18, and it is more preferable to satisfy the relationship of −0.10 ≦ n ₁ −n ₂ ≦ 0.10. By satisfying such a relationship, it is possible to make the viewing angle characteristics particularly excellent while sufficiently improving the light utilization efficiency.

  Moreover, it is preferable that the thickness of the light shielding layer 32 is 0.3-8 micrometers, it is more preferable that it is 0.3-3 micrometers, and it is further more preferable that it is 0.3-1.5 micrometers. When the thickness of the light shielding layer 32 is a value within the above range, it is more effective to cause a problem that light for image formation is blocked by the light shielding layer 32 (so-called “vignetting” occurs). While preventing, the light-shielding property as the whole black matrix 3 can be made especially excellent. As a result, the viewing angle characteristics and the contrast of the displayed image can be made particularly excellent. The light shielding layers 32 (first light shielding layer 321 and second light shielding layer 322) may have the same thickness or different thicknesses. Is preferably included in the range described above.

The light shielding layer 32 is made of a material having a light shielding property.
Although the material which comprises the light shielding layer 32 is not specifically limited, Coloring agents (for example, ink etc.), such as various pigments and various dyes, can be used.
The light shielding layer 32 may include a resin material or the like as a constituent component. Thereby, the adhesiveness with the light transmission layer 31 can be made particularly excellent.

  Further, the area ratio (opening ratio) of the opening 33 to the black matrix 3 when viewed in plan is preferably 5 to 30%, more preferably 5 to 25%, and 5 to 20%. Is more preferable. Thus, in the present invention, it is preferable that the aperture ratio of the light shielding film is relatively small. Thus, by making the aperture ratio small, the contrast of the displayed image can be made excellent, and the light shielding film has the above-described configuration, so that the viewing angle characteristics can be improved. It can be made sufficiently excellent. That is, in the present invention, the contrast of the displayed image can be made particularly excellent while sufficiently improving the viewing angle characteristics. On the other hand, if the aperture ratio is less than the lower limit, it may be difficult to make the viewing angle characteristics sufficiently excellent. Further, if the aperture ratio exceeds the upper limit, it may be difficult to make the contrast of the displayed image sufficiently excellent. In the present invention, the “aperture ratio” refers to the aperture ratio of the entire light shielding film when the lens substrate is viewed in plan.

  The number of light shielding layers 32 is not particularly limited, but is preferably 2 to 10 layers, for example, and more preferably 2 to 3 layers. Thereby, the contrast of the displayed image can be made particularly excellent while sufficiently improving the viewing angle characteristics. On the other hand, if the number of light shielding layers 32 exceeds the upper limit, the viewing angle characteristics tend to be reduced depending on the total thickness of the black matrix 3, and the number of steps is increased during manufacturing. The process becomes complicated, which may lead to an increase in cost.

  Further, the thickness (total thickness) of the black matrix 3 as a whole is preferably 0.3 to 400 μm, more preferably 0.3 to 100 μm, and further preferably 0.3 to 30 μm. . When the total thickness of the black matrix 3 is within the above range, the viewing angle characteristics can be made sufficiently excellent, and the contrast of the displayed image can be made particularly excellent.

  Further, a diffusing portion 4 is provided on the light emitting side surface of the microlens substrate 1. The diffusion unit 4 has a function of diffusing incident light (incident light) by irregular reflection. By having such a diffusing portion 4, the viewing angle characteristics can be further improved. The diffusing portion 4 has a region formed on the light emission side from the black matrix 3. With such a configuration, the light incident on the diffusing portion 4 can be efficiently directed to the emission side (the direction opposite to the light incident side), and the viewing angle characteristics are particularly excellent. (The viewing angle at which the image projected on the screen can be suitably viewed can be made particularly large). In the present embodiment, the diffusing section 4 has a configuration in which a diffusing material is dispersed in a substantially transparent material (for example, an acrylic resin, a polycarbonate resin, or the like) excellent in light transmittance. As the diffusing material, for example, particulate (bead-shaped) silica, glass, resin, or the like can be used. The average particle size of the diffusing material is not particularly limited, but is preferably 1 to 50 μm, and more preferably 2 to 10 μm.

  Moreover, although the thickness of the spreading | diffusion part 4 is not specifically limited, It is preferable that it is 0.5-20 mm, It is more preferable that it is 0.7-10 mm, It is further more preferable that it is 1.0-5 mm. When the thickness of the diffusing portion 4 is a value within the above range, the viewing angle characteristics can be made particularly excellent while sufficiently improving the light utilization efficiency. On the other hand, if the thickness of the diffusing portion 4 is less than the lower limit, the effect of providing the diffusing portion 4 may not be sufficiently exhibited. Further, when the thickness of the diffusing portion 4 exceeds the upper limit value, the probability (frequency) that the light (photon) and the diffusing material collide with each other tends to increase rapidly, and quenching easily occurs. There is a high possibility that light (photons) incident on will return to the incident side again. As a result, it may be difficult to sufficiently increase the light use efficiency.

Next, the transmission screen 10 including the microlens substrate 1 as described above will be described.
As shown in FIG. 4, the transmission screen 10 includes a Fresnel lens portion 5 and the microlens substrate 1 described above. The Fresnel lens unit 5 is installed on the light (image light) incident side, and the light transmitted through the Fresnel lens unit 5 is incident on the microlens substrate 1.

The Fresnel lens unit 5 has a prism-shaped Fresnel lens 51 formed in a substantially concentric shape on the exit side surface. The Fresnel lens unit 5 refracts image light from a projection lens (not shown) to produce parallel light La parallel to the vertical direction of the main surface of the microlens substrate 1.
In the transmissive screen 10 configured as described above, the image light from the projection lens is refracted by the Fresnel lens unit 5 and becomes parallel light La. The parallel light La is incident from the side of the microlens substrate 1 on which the microlenses 21 are provided, is condensed by each microlens 21, is diffused after being focused. Thereby, it is observed as a planar image by the observer.

Next, an example of a manufacturing method of the above-described microlens substrate (lens substrate) will be described.
FIG. 5 is a schematic longitudinal sectional view showing a member with a recess used for manufacturing a microlens substrate, and FIG. 6 is a schematic longitudinal sectional view showing a method for manufacturing the member with a recess shown in FIG. 7, 8, and 9 are schematic longitudinal sectional views showing an example of a method for manufacturing the microlens substrate shown in FIG. In the following description, the lower side in FIGS. 7 to 9 is referred to as “(light) incident side”, and the upper side in FIGS. 7 to 9 is referred to as “(light) emission side”.
Further, in the manufacture of the member with concave portions, a large number of concave portions (recesses for microlenses) are actually formed on the substrate, and in the manufacture of the microlens substrate (substrate body), actually a large number of convex portions (convex lenses). However, in order to make the explanation easier to understand, a part thereof is highlighted.

First, prior to the description of the manufacturing method of the microlens substrate, the configuration of the member with recesses (the member with recesses for forming microlenses) used for manufacturing the microlens substrate will be described.
The member with concave portions (member with concave portions for forming microlenses) 6 may be made of any material, but is preferably made of a material that is less likely to bend and is less likely to be damaged. As a constituent material of the member 6 with a recessed part, various glass materials, various resin materials, etc. are mentioned, for example. Examples of the glass material include soda glass, crystalline glass, quartz glass, lead glass, potassium glass, borosilicate glass, and alkali-free glass. Examples of the resin material include polyethylene, polypropylene, and ethylene- Polyolefin such as propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide (eg, nylon 6, nylon 46, nylon 66, nylon 610) , Nylon 612, nylon 11, nylon 12, nylon 6-12, nylon 6-66), polyimide, polyamideimide, polycarbonate (PC), poly- (4-methylpentene-1), ionomer, acrylic resin, acryloni Ryl-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), butadiene-styrene copolymer, polyoxymethylene, polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer (EVOH) ), Polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polycyclohexane terephthalate (PCT), polyether, polyetherketone (PEK), polyetheretherketone (PEEK), polyetherimide, polyacetal (POM) ), Polyphenylene oxide, modified polyphenylene oxide, polysulfone, polyethersulfone, polyphenylene sulfide, polyarylate, aromatic polyester (liquid crystal polymer) Polytetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurethane, polyester, polyamide, polybutadiene, trans polyisoprene, fluoro rubber, chlorinated polyethylene Various thermoplastic elastomers such as epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyesters, silicone resins, urethane resins, etc., or copolymers, blends, polymer alloys, etc. mainly comprising these A resin material etc. are mentioned, Among these, it can use combining 1 type (s) or 2 or more types. Among these, as a constituent material of the member 6 with a recessed part, a glass material is preferable and soda glass, crystalline glass (for example, neo-ceram etc.), and an alkali free glass are more preferable. Such a material is generally excellent in shape stability. Therefore, the stability (reliability) of the shape of the recess 61 included in the member 6 with a recess, the dimensional accuracy of the microlens 21 formed using the recess 61, and the like can be made particularly excellent. The optical characteristics of the substrate can be made particularly reliable. In addition, since the glass material is generally excellent in shape stability, in the method for manufacturing the microlens substrate 1 described in detail later, the handleability of the manufactured substrate body 2 is improved. Further, soda glass, crystalline glass, and non-alkali glass are easy to process, are relatively inexpensive, and are advantageous from the viewpoint of manufacturing cost.

  The member with recesses (member with recesses for forming microlenses) 6 includes a plurality of recesses (recesses for forming microlenses) 61 arranged in a manner corresponding to the arrangement method of the microlenses 21 (transferred positional relationship). ing. These recesses 61 have a shape corresponding to the microlens 21 (substantially the same shape except for the transferred shape) and dimensions, except that the microlens 21 is a recess while the microlens 21 is a protrusion. have.

  More specifically, in the present embodiment, the recess (microlens formation recess) 61 has a vertical width (width in the vertical direction) smaller than the horizontal width (width in the horizontal direction) when the member 6 with recesses is viewed in plan. It has a flat shape (substantially oval or substantially bowl-shaped). The concave portion 61 having such a shape is preferably used for manufacturing the microlens substrate 1 capable of effectively preventing the occurrence of inconvenience such as moire and having particularly excellent viewing angle characteristics. Can do.

When the length in the minor axis direction (longitudinal direction) of the concave portion 61 in plan view is L ₁ [μm] and the length in the major axis direction (lateral direction) is L ₂ [μm], 0.50 ≦ L ₁ / L ₂ ≦ 0.99 is preferably satisfied, 0.60 ≦ L ₁ / L ₂ ≦ 0.90 is more preferable, and 0.65 ≦ L ₁ / L _It is more preferable to satisfy the relationship of ₂ ≦ 0.80. By satisfying the relationship as described above, the effects as described above become more remarkable.

  Further, the length of the concave portion 61 in the short axis direction when viewed in plan is preferably 10 to 200 μm, more preferably 30 to 150 μm, and further preferably 50 to 100 μm. When the length of the concave portion 61 in the minor axis direction is a value within the above range, the viewing angle characteristics of the manufactured microlens substrate 1 and the contrast and brightness of the image projected by the microlens substrate 1 are particularly excellent. However, sufficient resolution can be obtained in the projected image. Further, when the length of the concave portion 61 in the short axis direction is a value within the above range, it is possible to effectively prevent the occurrence of inconvenience such as moire when the manufactured microlens substrate 1 is used. The productivity of the microlens substrate 1 (member 6 with a recess) can be further increased.

  Further, the length in the major axis direction of the recess 61 when seen in a plan view is preferably 15 to 250 μm, more preferably 45 to 200 μm, and still more preferably 70 to 150 μm. When the length of the concave portion 61 in the major axis direction is a value within the above range, the viewing angle characteristics of the manufactured microlens substrate 1 and the contrast and brightness of the image projected by the microlens substrate 1 are particularly excellent. However, sufficient resolution can be obtained in the projected image. Further, when the length of the concave portion 61 in the major axis direction is a value within the above range, it is possible to effectively prevent the occurrence of inconvenience such as moire when the manufactured microlens substrate 1 is used. The productivity of the microlens substrate 1 (member 6 with a recess) can be further increased.

  Moreover, it is preferable that the curvature radius of the recessed part 61 is 7.5-125 micrometers, It is more preferable that it is 15-90 micrometers, It is further more preferable that it is 30-60 micrometers. When the radius of curvature of the recess 61 is a value within the above range, the viewing angle characteristics of the manufactured microlens substrate 1 can be made particularly excellent. In particular, both the horizontal and vertical viewing angle characteristics can be improved. The concave portion 61 may have a different radius of curvature in the minor axis direction and a radius of curvature in the major axis direction. In such a case, the radius of curvature in the major axis direction is a value within the above range. Preferably there is.

Moreover, it is preferable that the depth of the recessed part 61 is 7.5-125 micrometers, It is more preferable that it is 15-90 micrometers, It is further more preferable that it is 30-60 micrometers. When the depth of the recess 61 is a value within the above range, the viewing angle characteristics of the manufactured microlens substrate 1 can be made particularly excellent.
The plurality of recesses 61 are arranged in a staggered pattern (in a staggered pattern). By arranging the recesses 61 in this way, it is possible to effectively prevent inconveniences such as moire when the manufactured microlens substrate 1 is used. On the other hand, for example, if the concave portions are arranged in a square lattice shape or the like, it is difficult to sufficiently prevent the occurrence of inconvenience such as moire depending on the size of the concave portions (microlenses). In addition, when the concave portions are randomly arranged, depending on the size of the concave portion (microlens) or the like, it becomes difficult to sufficiently increase the occupancy ratio of the concave portions in the effective region where the concave portions are formed. It is difficult to sufficiently increase the transmittance (light utilization efficiency), and the obtained image may be dark.

  Further, as described above, the recesses 61 are arranged in a staggered pattern when the member 6 with recesses is viewed in plan view, but are adjacent to the first row composed of the plurality of recesses 61. The second row is preferably shifted by a half pitch in the vertical direction. As a result, when the manufactured microlens substrate 1 is used, it is possible to more effectively prevent the occurrence of moiré due to light interference and to make the viewing angle characteristics particularly excellent. it can.

  In the above description, the concave portion 61 is described as having substantially the same shape (dimension) and arrangement method as the microlens 21 except that the concave portion 61 has a concave-convex relationship. In the case where the constituent material of the substrate main body 2 is easily contracted (when the composition constituting the substrate main body 2 contracts due to solidification or the like), the microlens 21 and the recess 61 are considered in consideration of the contraction rate and the like. You may make it a shape (dimension), an occupation rate, etc. differ among these.

Next, the manufacturing method of a member with a recessed part is demonstrated, referring FIG. In practice, a large number of recesses (microlens formation recesses) are formed on the substrate. Here, in order to make the description easy to understand, a part of them is shown highlighted.
First, when manufacturing the member 6 with a recessed part, the board | substrate 7 is prepared.
The substrate 7 having a uniform thickness and having no deflection or scratches is preferably used. The substrate 7 is preferably one whose surface is cleaned by washing or the like.

<A1> First, when manufacturing the member 6 with a recess, a substrate 7 is prepared (see FIG. 6A).
The substrate 7 having a uniform thickness and having no deflection or scratches is preferably used. The substrate 7 is preferably one whose surface is cleaned by washing or the like.
<A2> A mask 8 having a large number of initial holes (openings) 81 is formed on the surface of the prepared substrate 7, and the back surface of the substrate 7 (the surface opposite to the surface on which the mask 8 is formed) A protective film 89 is formed (refer to a masking process, FIGS. 6B and 6C).

In particular, in this embodiment, first, as shown in FIG. 6B, a back surface protective film 89 is formed on the back surface of the prepared substrate 7 and a mask forming film 9 is formed on the surface of the substrate 7 (mask). Forming film forming step), and thereafter, as shown in FIG. 6C, the mask 8 is obtained by forming the initial hole 81 in the mask forming film 9 (initial hole forming step). The mask forming film 9 and the back surface protective film 89 can be formed simultaneously.
It is preferable that the mask forming film 9 can form an initial hole 81 to be described later by laser light irradiation or the like and has resistance to etching in an etching process to be described later. In other words, the mask forming film 9 (mask 8) is preferably configured so that the etching rate is substantially equal to or lower than that of the substrate 7.

From this point of view, as a material constituting the mask forming film 9 (mask 8), for example, a metal such as Cr, Au, Ni, Ti, Pt, an alloy containing two or more kinds selected from these metals, Examples thereof include oxides (metal oxides), silicon, and resins.
Further, the mask forming film 9 (mask 8) may have, for example, a substantially uniform composition, or a laminate having a plurality of different layers.

  As described above, the configuration of the mask forming film 9 (mask 8) is not particularly limited, but is a laminate having a layer mainly composed of chromium and a layer mainly composed of chromium oxide. Preferably there is. The mask forming film 9 having such a configuration can easily and surely form an initial hole (opening portion) having a desired shape by irradiation of laser light as described later. The mask 8 obtained by using the mask forming film 9 having such a configuration has excellent stability with respect to etching solutions having various compositions (more reliably protects the substrate 7 in an etching process described later). be able to). Further, when the substrate 7 is made of a glass material and the mask forming film 9 (mask 8) has the above structure, for example, in an etching process described later, one hydrogen as an etching solution is used. A liquid containing ammonium difluoride can be suitably used. Since ammonium monohydrogen difluoride is not a poisonous deleterious substance, it is possible to prevent the human body and the environment during work more reliably. Further, the mask forming film 9 (mask 8) having the above-described configuration can efficiently relieve internal stress of the mask, and is particularly excellent in adhesion with the substrate 7 (particularly, adhesion in the etching process). ing. Therefore, by using the mask forming film 9 (mask 8) having the above-described configuration, the concave portion 61 having a desired shape can be easily and reliably formed.

  The method for forming the mask forming film 9 is not particularly limited, but the mask forming film 9 (mask 8) is made of a metal material (including an alloy) such as chromium (Cr) or gold (Au) or a metal oxide (for example, chromium oxide). ), Or a composite material thereof (for example, a laminated body having a metal layer made of a metal material and a metal oxide layer made of a metal oxide, etc.) The film 9 can be suitably formed by, for example, a vapor deposition method or a sputtering method. When the mask forming film 9 (mask 8) is made of silicon, the mask forming film 9 can be suitably formed by, for example, a sputtering method or a CVD method.

  The thickness of the mask forming film 9 (mask 8) varies depending on the material constituting the mask forming film 9 (mask 8), but is preferably about 0.01 to 2.0 μm, preferably 0.01 to 0.3 μm. The degree is more preferable. If the thickness is less than the lower limit, the shape of the initial hole 81 formed in the initial hole forming process (opening forming process) described later may be distorted depending on the constituent material of the mask forming film 9 and the like. There is. In addition, when wet etching is performed in an etching process described later, the masked portion of the substrate 7 may not be sufficiently protected. On the other hand, when the upper limit is exceeded, depending on the constituent material of the mask forming film 9 and the like, it becomes difficult to form the initial hole 81 that penetrates in the initial hole forming step described later, and the mask forming film 9 (mask Due to the internal stress of 8), the mask forming film 9 (mask 8) may be easily peeled off.

  The back surface protective film 89 is for protecting the back surface of the substrate 7 in the subsequent steps. By this back surface protective film 89, erosion, deterioration, etc. of the back surface of the substrate 7 are preferably prevented. The back surface protective film 89 has the same configuration as the mask forming film 9 (mask 8), for example. Therefore, the back surface protective film 89 can be provided in the same manner as the mask forming film 9 simultaneously with the formation of the mask forming film 9.

<A3> Next, as shown in FIG. 6C, a plurality of initial holes (openings) 81 are formed in the mask forming film 9 to obtain the mask 8 (initial hole forming step). The initial hole 81 formed in this step functions as a mask opening in the later-described etching.
A method for forming the initial hole 81 is not particularly limited, but a method using laser light irradiation is preferable. Thereby, the initial holes 81 having a desired shape arranged in a desired pattern can be easily and accurately formed. As a result, the shape, arrangement method, and the like of the recesses 61 can be controlled more reliably. In addition, by forming the initial hole 81 by laser irradiation, a member with a recess can be manufactured with high productivity. In particular, the concave portion can be easily formed even on a large-area substrate. In addition, by forming the initial hole 81 in the mask forming film 9 by laser light irradiation, the opening (e.g., easier and less expensive than the case where the opening is formed in the resist film by a photolithography method as in the prior art. An initial hole 81) can be formed.

In addition, when the initial hole 81 is formed by laser light irradiation, the type of laser light to be used is not particularly limited, but a ruby laser, a semiconductor laser, a YAG laser, a femtosecond laser, a glass laser, a YVO ₄ laser, a Ne- He laser, Ar laser, CO ₂ laser, excimer laser or the like may be mentioned. Moreover, you may use wavelengths, such as SHG of each laser, THG, and FHG.

  The shape and size of the initial hole 81 formed in this step is not particularly limited, but is substantially circular and the diameter is preferably 0.5 to 30 μm, more preferably 1.0 to 10 μm. Preferably, it is 1.5-5 micrometers. When the diameter of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be reliably formed in the etching process described later. However, when the initial hole 81 has a flat shape such as a substantially elliptical shape, the length in the minor axis direction can be substituted for the value of the diameter. That is, when the initial hole 81 formed in this step has a flat shape, the width of the initial hole 81 (length in the minor axis direction) is not particularly limited, but is preferably 0.8 to 30 μm, More preferably, it is 1.0-10 micrometers, and it is still more preferable that it is 1.5-5 micrometers. When the width of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be reliably formed in the etching process described later.

  In addition, when the initial hole 81 formed in this step is a flat shape, the length of the initial hole 81 (length in the major axis direction) is preferably 0.5 to 30 μm, and 1.0 to More preferably, it is 15 micrometers, and it is still more preferable that it is 1.5-10 micrometers. When the length of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be more reliably formed in the etching process described later.

<A4> Next, as shown in FIG. 6D, the substrate 7 is etched using the mask 8 in which the initial holes 81 are formed, and a large number of recesses 61 are formed on the substrate 7 (etching step). .
The etching method is not particularly limited, and examples thereof include wet etching and dry etching. In the following description, a case where wet etching is used will be described as an example.

Etching (wet etching) is performed on the substrate 7 covered with the mask 8 in which the initial holes 81 are formed, so that the substrate 7 has a portion where the mask 8 does not exist (see FIG. 6D). A large number of recesses 61 are formed on the substrate 7 by etching from a portion corresponding to the initial hole 81 of the mask 8. As described above, since the initial holes 81 formed in the mask 8 are arranged in a staggered pattern (in a staggered pattern), the formed recesses 61 are formed in a staggered pattern (in a staggered pattern) on the surface of the substrate 7. It will be arranged.
Further, when the wet etching method is used, the concave portion 61 can be suitably formed. If, for example, an etching solution containing ammonium monohydrogen difluoride is used as the etching solution, the substrate 7 can be etched more selectively, and the recess 61 can be suitably formed.

When the mask 8 (mask forming film 9) is mainly composed of chromium or chromium oxide, a liquid containing ammonium monohydrogen difluoride is particularly suitable as the hydrofluoric acid-based etchant. Since the ammonium hydrogen difluoride solution is not a poisonous and deleterious substance, it can prevent the influence on the human body and the environment during work. When ammonium monohydrogen difluoride is used as the etching solution, the etching solution may contain, for example, hydrogen peroxide and / or sulfuric acid. Thereby, an etching speed can be made faster.
Further, according to wet etching, it is possible to perform processing with a simpler apparatus than dry etching, and it is possible to perform processing on many substrates at once. Thereby, productivity improves and the member 6 with a recessed part can be provided cheaply.

  <A5> Next, as shown in FIG. 6E, the mask 8 is removed (mask removal step). At this time, the back surface protective film 89 is also removed together with the removal of the mask 8.

When the mask 8 is a laminated body having a layer mainly composed of chromium and a layer mainly composed of chromium oxide as described above, the removal of the mask 8 is, for example, ceric ammonium nitrate and perchlorine. It can carry out suitably by etching using a mixture containing an acid.
As described above, as shown in FIG. 6E and FIG. 5, the member 6 with concave portions in which a large number of concave portions 61 are formed in a staggered pattern on the substrate 7 is obtained.

  The method for forming the plurality of recesses 61 arranged in a staggered pattern on the substrate 7 is not particularly limited, but the method as described above (the initial holes 81 in the mask forming film 9 by laser irradiation). To obtain a mask 8, and then etching using the mask 8 to form the recess 61 on the substrate 7), the following effects are obtained.

That is, by forming the initial hole 81 in the mask forming film 9 by laser light irradiation, the opening (with a predetermined pattern) can be easily and inexpensively compared with the case where the opening is formed by a conventional photolithography method. A mask having initial holes 81) can be obtained. Thereby, productivity improves and the member 6 with a recessed part can be provided cheaply.
Further, according to the method as described above, it is possible to easily perform processing on a large substrate. When manufacturing a large substrate (a member with a recess, a lens substrate), it is not necessary to bond a plurality of substrates as in the prior art, and the seam of bonding can be eliminated. As a result, a high-quality large-sized substrate (a member with a recess, a lens substrate) can be manufactured at a low cost by a simple method.
Further, when the initial holes 81 are formed by laser irradiation, the shape, size, arrangement, and the like of the formed initial holes 81 can be managed easily and reliably.

In addition, you may perform a mold release process with respect to the member 6 with a recessed part, for example in order to form the mold release process part as mentioned above. As the mold release treatment, for example, formation of a film composed of a material having releasability such as silicone resin such as alkylpolysiloxane, fluorine resin such as polytetrafluoroethylene, hexamethyldisilazane ([(CH _{3) 3 Si]} 2 NH) surface treatment with a silylating agent such as a surface treatment or the like with a fluorine gas.

Hereinafter, a method for manufacturing the microlens substrate (lens substrate) 1 using the above-described member 6 with a recess will be described.
<B1> First, as shown in FIG. 7A, on the surface of the member 6 with recesses on the side where the recesses 61 are formed, the composition 23 having fluidity (for example, a softened resin material, Polymerization (uncured resin material) is applied, and a base film 24 is placed thereon, and the composition 23 is pressed by the flat plate (pressing member) 11 through the base film 24 (pressing step). .

  The base film 24 is preferably made of a material having a refractive index comparable to that of the composition 23 (the composition 23 after solidification). More specifically, the base film 24 is an absolute constituent material of the base film 24. The absolute value of the difference between the refractive index and the absolute refractive index of the composition 23 after solidification is preferably 0.20 or less, more preferably 0.10 or less, and 0.02 or less. Further preferred. The base film 24 may be made of any material, but is preferably made of polyethylene terephthalate. In addition, the base film 24 may be a relatively thick film or a film that is not substantially flexible.

  In addition, you may perform the press by the flat plate 11 in the state which has arrange | positioned the spacer between the member 6 with a recessed part, and the base film 24, for example. Thereby, the thickness of the board | substrate body 2 formed can be controlled more reliably. Moreover, when using a spacer, when solidifying the composition 23, the spacer should just be distribute | arranged between the member 6 with a recessed part, and the base film 24, and the timing which supplies a spacer is not specifically limited. For example, the composition 23 in which spacers are dispersed in advance as a resin to be applied may be used on the surface of the member 6 with recesses where the recesses 61 are formed, or in a state where the spacers are arranged on the member 6 with recesses. The composition 23 may be applied, or a spacer may be applied after the composition 23 is supplied.

In the case of using a spacer, the spacer is preferably made of a material having a refractive index comparable to that of the solidified composition 23, and more specifically, the absolute refractive index of the constituent material of the spacer and the solidified material. The absolute value of the difference from the absolute refractive index of the composition 23 is preferably 0.20 or less, more preferably 0.10 or less, still more preferably 0.02 or less, and after solidification The composition 23 and the spacer are most preferably composed of the same material.
The shape of the spacer is not particularly limited, but is preferably substantially spherical or substantially cylindrical. When the spacer has such a shape, the diameter thereof is preferably 10 to 300 μm, more preferably 30 to 200 μm, and further preferably 30 to 170 μm.

<B2> Next, the composition 23 is solidified (including curing (polymerization)) to obtain the substrate body 2 provided with the microlenses 21 (solidification step, see FIG. 7B).
In the case where the composition 23 is solidified by curing (polymerization), examples of the method include methods such as irradiation with light such as ultraviolet rays, irradiation with electron beams, and heating.
Here, if necessary, in the composition 23 and / or the base film 24, for example, polystyrene beads, glass beads, organic cross-linked polymers, etc. are used as a diffusing material in advance in order to diffuse the incident light from the light source. May be mixed. Here, the diffusing material may be mixed in the composition 23 and / or the entire base film 24, or may be mixed only in part.

  <B3> Next, the recessed member 6 and the flat plate 11 are removed from the formed substrate body 2 (pressing member / recessed member removing step, see FIG. 7C). The member 6 with concave portions and the flat plate 11 removed in this step can be repeatedly used for manufacturing the microlens substrate 1. Thereby, the stability of the quality of the microlens substrate 1 to be manufactured can be improved, and the manufacturing cost is advantageous.

<B4> Next, a black matrix (light-shielding film) 3 is formed on the exit side surface of the substrate body 2 manufactured as described above.
In this embodiment, the black matrix is formed by applying a positive photosensitive adhesive to the substrate body to form a light-transmitting light-transmitting layer (photosensitive adhesive application process), and the substrate. A light-shielding layer is formed on a portion of the light-transmitting layer other than the photosensitive portion by performing a process of irradiating the light-transmitting layer with light through the main body 2 to reduce the adhesiveness of the photosensitive portion. This is performed through the third step (shading layer forming step) of applying the forming material.

<B4-1> First, as shown in FIG. 7 (d), on the exit side surface of the substrate main body 2, the photosensitive part has a characteristic that the adhesiveness decreases and the non-photosensitive part maintains the adhesiveness. A photosensitive adhesive is applied to form the light transmission layer 31 (first light transmission layer 311) (photosensitive adhesive application step).
As the photosensitive adhesive, for example, an adhesive resin, a photopolymerizable compound, a photopolymerization initiator, or the like can be used.

Examples of the adhesive resin include acrylic resins, rubber resins, silicone resins, urethane resins, and polyester resins, and acrylic adhesives that are excellent in terms of durability and adhesiveness are suitable. .
The acrylic adhesive resin contains, for example, an acrylic copolymer resin obtained by copolymerizing an acrylic acid alkyl ester, another monomer, and a functional monomer as a main component.

As the alkyl acrylate ester, those having 4 to 15 carbon atoms in the alkyl group are preferably used. For example, acrylic acid-n-butyl, acrylate-2-ethylhexyl, isooctyl acrylate, isononyl acrylate, etc. 1 type selected from these, or 2 or more types can be used in combination.
Examples of the other monomer include methyl acrylate, methyl methacrylate, styrene, acrylonitrile, vinyl acetate, and the like, and one or more selected from these can be used in combination.

  Examples of the functional monomer include acrylic acid, methacrylic acid, itaconic acid, hydroxylethyl acrylate, hydroxylethyl methacrylate, propylene glycol acrylate, acrylamide, methacrylamide, glycidyl acrylate, glycidyl methacrylate, methacrylic acid. Examples thereof include dimethylaminoethyl acid, tert-butylaminoethyl methacrylate and the like, and one or more selected from these can be used in combination.

Moreover, you may use the acrylic copolymer resin which has a photoreactive group, for example, an unsaturated double bond, in a side chain.
The composition ratio (% by weight) of the acrylic acid alkyl ester, the other monomer, and the functional monomer in the acrylic copolymer resin is not particularly limited, but is 70 to 99: 0 to 20: 0.01 to 20. It is preferable that it is 80-95: 0-10: 0.1-15. The weight average molecular weight of the acrylic copolymer resin is not particularly limited, but is preferably 200,000 to 1,200,000, and more preferably 400,000 to 1,000,000.
In addition to the acrylic copolymer resin, the acrylic pressure-sensitive adhesive may contain, for example, a crosslinking agent such as a room temperature crosslinking type or a heat crosslinking type crosslinking agent, a tackifier, and the like.

  Examples of the room temperature crosslinking type crosslinking agent include polyisocyanate compounds of polyisocyanates and trimers of these polyisocyanate compounds, terminal isocyanate urethane prepolymers obtained by reacting the above polyisocyanate compounds and polyol compounds, and these polyisocyanate compounds. Examples include isocyanate compounds and trimers of these polyisocyanate compounds. Specific examples of the polyvalent isocyanate include 2,4-tolylene diisocyanate, 2,5-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, Examples include 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane-4,4′-diisocyanate, dicyclohexylmethane-2,4′-diisocyanate, and lysine isocyanate. Moreover, as a crosslinking agent, you may use metal chelate compounds, such as aluminum and titanium, and a polyfunctional epoxy compound, for example.

The room temperature crosslinking type crosslinking agent is preferably added at a rate of 0.005 to 20 parts by weight, and preferably at a rate of 0.01 to 10 parts by weight with respect to 100 parts by weight of the acrylic copolymer resin. Is more preferable.
Examples of the heat-crosslinking type crosslinking agent include methylol group-containing compounds obtained by reacting formaldehyde with melamine, benzoguanamine, urea, etc., and those obtained by etherifying a part or all of those methylol groups with an aliphatic alcohol. Is mentioned.

The heat-crosslinking type crosslinking agent is preferably added at a ratio of 0.01 to 25 parts by weight, particularly 0.1 to 20 parts by weight with respect to 100 parts by weight of the acrylic copolymer resin. Is more preferable.
Examples of the tackifier include rosin resins, terpene resins, xylene resins and the like.
Photopolymerizable compounds include, for example, photoradical polymerizable compounds, photocationic polymerizable compounds, photoanionic polymerizable compounds, compounds that initiate polymerization via photodimerization, etc. A radical photopolymerizable compound is preferred in view of the range, polymerization reactivity and the like.

  Examples of the photo-radical polymerizable compound include compounds having at least one addition-polymerizable ethylenically unsaturated double bond. Examples thereof include unsaturated carboxylic acids and salts thereof, unsaturated carboxylic acids and aliphatic polyvalent compounds. Examples thereof include esters with a polyhydric alcohol compound, and amide bonds between an unsaturated carboxylic acid and an aliphatic polyvalent amine compound. As more specific examples, the following are monomers of esters of aliphatic polyhydric alcohol compounds and unsaturated carboxylic acids. Examples of acrylic acid esters include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, and trimethylolpropane triacrylate. , Trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol Tetraacrylate, dipentaerythritol diacryl Dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, 2-phenoxyethyl acrylate, 2-phenoxyethyl acrylate, phenol ethoxylate monoacrylate, 2- (p-chlorophenoxy) ethyl acrylate, p-chlorophenyl acrylate, phenyl acrylate, 2-phenylethyl acrylate, bisphenol A (2-acrylic Oxyethyl) ether, ethoxylated bisph Nord A diacrylate, 2- (1-naphthyloxy) ethyl acrylate, o-biphenyl acrylate, o-biphenyl acrylate, 9,9-bis (4-acryloxydiethoxyphenyl) fluorene, 9,9-bis (4- Acryloxytriethoxyphenyl) fluorene, 9,9-bis (4-acryloxydipropoxyphenyl) fluorene, 9,9-bis (4-acryloxyethoxy-3-methylphenyl) fluorene, 9,9-bis (4 -Acryloxyethoxy-3-ethylphenyl) fluorene, 9,9-bis (4-acryloxyethoxy-3,5-dimethyl) fluorene and the like.

  Sulfur-containing acrylic compounds can also be used, such as 4,4′-bis (β-acryloyloxyethylthio) diphenyl sulfone, 4,4′-bis (β-acryloyloxyethylthio) diphenyl ketone, 4 , 4′-bis (β-acryloyloxyethylthio) -3,3 ′, 5,5′-tetrabromodiphenyl ketone, 2,4-bis (β-acryloyloxyethylthio) diphenyl ketone, and the like can be used. .

Examples of the methacrylic acid ester include, for example, compounds in which “acrylate” is “methacrylate”, “acryloxy” is “methacryloxy”, and “acryloyl” is “methacryloyl” among the acrylate compound names above. As mentioned.
These photopolymerizable compounds can also be used as one kind or a mixture of two or more kinds.
The photopolymerizable compound is preferably added at a rate of 0.1 to 200 parts by weight, more preferably 10 to 150 parts by weight, with respect to 100 parts by weight of the acrylic copolymer resin.

As a photoinitiator, it selects suitably by the polymerization system of the said photopolymerizable compound. Examples of the photopolymerization initiator that can be used for the photoradical polymerizable compound include imidazole derivatives, bisimidazole derivatives, N-arylglycine derivatives, organic azide compounds, titanocenes, aluminate complexes, organic peroxides, N- Examples thereof include alkoxypyridinium salts and thioxanthone derivatives. More specifically, 1,3-di (t-butyldioxycarbonyl) benzophenone, 3,3 ′, 4,4′-tetrakis (t-butyldioxycarbonyl) ) Benzophenone, 3-phenyl-5-isoxazolone, 2-mercaptobenzimidazole, bis (2,4,5-triphenyl) imidazole, 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name) Irgacure 651, manufactured by Ciba Specialty Chemicals Co., Ltd., 1-Hide Roxy-cyclohexyl-phenyl-ketone (trade name Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 (trade name Irgacure) 369, manufactured by Ciba Specialty Chemicals), bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl ) Titanium (trade name Irgacure 784, manufactured by Ciba Specialty Chemicals Co., Ltd.) and the like. In addition, aromatic iodonium salts, aromatic sulfonium salts, aromatic diazonium salts, aromatic phosphonium salts, triazine compounds, and the like can also be used, and more specifically, diphenyliodonium, ditolyliodonium, bis (p-tert). -Iodonium chloride such as -butylphenyl) iodonium and bis (p-chlorophenyl) iodonium, iodonium salts such as bromide, borofluoride, hexafluorophosphate salt, hexafluoroantimonate salt, triphenylsulfonium, 4-tert-butyltri Sulfonium salts such as phenylsulfonium, tris (4-methylphenyl) sulfonium, sulfonium chloride, bromide, borofluoride, hexafluorophosphate salt, hexafluoroantimonate salt, 2, 4, 6-tris (trichloromethyl) -1,3,5-triazine, 2-phenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2-methyl-4,6-bis (trichloromethyl) And 2,4,6-substituted-1,3,5-triazine compounds such as 1,3,5-triazine.
These photopolymerization initiators are preferably blended in a proportion of 0.5 to 20 parts by weight, and in a proportion of 1 to 15 parts by weight, with respect to 100 parts by weight of the acrylic copolymer resin. More preferred.

A sensitizing dye can also be used for the purpose of improving the sensitivity to the wavelength of the exposure light source used to sensitize the photosensitive adhesive. Examples of sensitizing dyes include thiopyrylium salt dyes, merocyanine dyes, cyanine dyes, quinoline dyes, coumarin dyes, ketocoumarin dyes, xanthone dyes, thioxanthone dyes, rhodamine dyes, and cyclopentanone dyes. And cyclohexanone dyes.
These sensitizing dyes are preferably blended in a proportion of 0.01 to 15 parts by weight, and in a proportion of 0.1 to 5 parts by weight, with respect to 100 parts by weight of the acrylic copolymer resin. Is more preferable.
In addition, for example, various plasticizers, surfactants, and the like may be used for the purpose of controlling adhesiveness and improving coating suitability described later.

As the photosensitive adhesive, it is particularly preferable to use a photosensitive adhesive whose adhesiveness obtained by 180 ° peel strength measurement specified in JIS Z0237 is reduced by 50% or more with respect to the adhesiveness of the non-photosensitive part. . By using such a photosensitive adhesive, a light shielding layer having an opening at a desired site can be easily and reliably formed.
Examples of the photosensitive adhesive include acrylic copolymer resins, photopolymerizable compounds, photopolymerization initiators as described above, room temperature crosslinking type or heat crosslinking type crosslinking agent added as necessary, and tackifying An agent, a sensitizing dye, and other additives diluted with a solvent such as methyl ethyl ketone, toluene, ethyl acetate, ethanol, isopropanol (solvent adhesive) can be used. The solid content in the photosensitive adhesive is preferably 15 to 50% by weight, more preferably 20 to 35% by weight. For example, when the photosensitive adhesive is liquid, it can be used as it is without being dissolved in a solvent.

The method of applying the photosensitive adhesive on the substrate body 2 is not particularly limited, but various coating methods such as doctor blade, spin coating, brush coating, spray coating, electrostatic coating, electrodeposition coating, roll coater, etc. should be used. Can do. Further, the room temperature cross-linking type is subjected to aging treatment under room temperature conditions, and the heat cross-linking type is subjected to cross-linking treatment by heating to form the light transmission layer 31 (first light transmission layer 311). The
Moreover, the application of the photosensitive adhesive on the substrate body 2 is performed, for example, by applying an adhesive layer (light transmission layer 31 (first light transmission layer 311)) formed of the photosensitive adhesive on the support base material. It is also possible to transfer the pressure-sensitive adhesive layer (light transmission layer 31 (first light transmission layer 311)) onto the substrate body 2 using a sheet having the same.

<B4-2> Next, the substrate body 2 is irradiated with light (exposure light) from the side where the microlenses 21 are provided (light irradiation step).
The irradiated light is refracted and collected by entering the microlens 21. Then, by collecting the light, the photosensitive adhesive constituting the light transmission layer 31 (the first light transmission layer 311) in the portion irradiated with light having an increased luminous intensity (light flux) is exposed, and the others The photosensitive adhesive in the portion is not exposed to light, or the photosensitive amount decreases, and only the photosensitive adhesive in the portion irradiated with the light having the increased luminous intensity (light flux) is exposed to the photosensitive portion (the first photosensitive portion). Part) 31a (see FIG. 7E). Since this photosensitive adhesive is a positive type, this reduces the adhesiveness of the photosensitive portion 31a, and maintains the adhesiveness in other portions (non-photosensitive portion). In the following description, a photosensitive part (first photosensitive part) 319a and a photosensitive part (second photosensitive part) 319b described later may be collectively referred to as a photosensitive part 319.
The light applied to the substrate body 2 is not particularly limited, but is preferably parallel light. As a result, the size of the opening 33 to be formed can be controlled more reliably, and as a result, the viewing angle characteristics of the microlens substrate 1 can be made particularly excellent, and the display The contrast of the displayed image can be made higher.

<B4-3> Next, as shown in FIGS. 8F and 8G, the light shielding layer forming material is transferred onto the light transmission layer 31 (first light transmission layer 311) to block the light. A layer 32 (first light shielding layer 321) is formed (light shielding layer forming step (light shielding layer transfer step)).
The light shielding layer transfer sheet 13 is obtained by providing a light shielding layer forming material layer 32 ′ made of a light shielding layer forming material on a transfer sheet substrate 131. Examples of the constituent material of the transfer sheet substrate 131 include polyester resins such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, and terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer. Cellulose film, polyamide resin, polyolefin resin, acrylic resin, vinyl resin, styrene resin, polycarbonate and the like can be used. These materials are excellent in mechanical strength and excellent in heat resistance, chemical resistance, solvent resistance, flexibility and the like.

The light shielding layer forming material usually contains a colorant, and may contain a resin material as necessary. When a thermoplastic resin is used as the resin material, transferability is particularly excellent. Examples of the thermoplastic resin constituting the light shielding layer forming material include vinyl chloride resin, acrylic resin, polyester resin, urethane resin, amide resin, and cellulose resin.
As the colorant, for example, various pigments and various dyes can be used, and carbon black is preferable.

This step can be performed as follows.
That is, first, as shown in FIG. 8 (f), the light shielding layer transfer sheet 13 is placed so that the light shielding layer forming material layer 32 ′ and the light transmitting layer 31 (first light transmitting layer 311) are in contact with each other. Affixed on the transmission layer 31 (first light transmission layer 311). It is important that the light-shielding layer transfer sheet is sufficiently adhered to the light transmission layer 31 (first light transmission layer 311). For example, a method of compressing under heat can be used.

Thereafter, the transfer sheet substrate 131 is peeled off. As a result, the light-shielding layer forming material is transferred only to the portion (non-photosensitive portion) that maintains the adhesiveness in the light-transmitting layer 31 (first light-transmitting layer 311), and the photosensitive portion in which the adhesiveness is reduced. The light shielding layer forming material of 319 (first photosensitive portion 319a) is removed from the light transmitting layer 31 (first light transmitting layer 311) together with the transfer sheet base material 131. That is, this portion becomes the opening 33 (first opening 331) in the light shielding layer 32.
As described above, the first light shielding layer 321 having the first opening 331 is formed (see FIG. 8G).
By repeating the steps <B4-1> to <B4-3> as described above, a plurality of light shielding layers can be laminated via the photosensitive adhesive layer.

<B4-4> As shown in FIG. 8H, a positive photosensitive adhesive is applied on the first light-shielding layer 321 to form a second light transmission layer 312 (photosensitive adhesive). Application step). This step can be performed in the same manner as the step <B4-1>.
<B4-5> Next, the substrate body 2 is irradiated with light from the surface side on which the microlenses 21 are provided (light irradiation step).

  The irradiated light is refracted and collected by entering the microlens 21. Then, the second light transmission layer 312 in the portion irradiated with light having a greater luminous intensity (light flux) is exposed to light and thereby the photosensitive portion 31b is formed. At this time, due to the relationship with the focal position, the size of the photosensitive portion 31b in the second light transmitting layer 312 is formed larger than that of the photosensitive portion 31a in the first light transmitting layer 311 (FIG. 8 (i)). reference).

<B4-6> Next, as shown in FIGS. 9J and 9K, the second light-shielding layer 322 is formed by transferring the light-shielding layer-forming material onto the second light-transmitting layer 312. Form (light shielding layer transfer step). This step can be performed in the same manner as the step <B4-3>.
The second opening 332 formed at this time is formed larger than the first opening 331.
As a result, a black matrix 3 is formed in which the first light transmission layer 311, the first light shielding layer 321, the second light transmission layer 312, and the second light shielding layer 322 are laminated in this order (FIG. 9 ( k)).
In the above description, the case where the two light shielding layers 32 are laminated is described as an example. However, in the same manner as described above, the photosensitive adhesive application step (first step) and the light irradiation step ( By repeating the second step and the light shielding layer transfer step (third step), three or more light shielding layers 32 can be laminated via the light transmission layer 31.

As in this embodiment, by forming a black matrix (a light-shielding film having an opening) using light condensed by a microlens on a photosensitive adhesive, for example, compared to using photolithography technology. A black matrix can be formed by a simple process. In addition, the opening can be reliably formed at a portion corresponding to the light collecting portion of the microlens.
In the above description, the light shielding layer is formed by transferring the light shielding layer forming material to the portion (non-photosensitive portion) that maintains the adhesiveness in the light transmission layer composed of the photosensitive adhesive. However, the present invention is not limited to this. For example, a black powder toner is attached to a non-photosensitive portion of a light transmission layer made of a photosensitive adhesive to form a light shielding layer. May be.

<B5> Next, as shown in FIG. 9 (l), the diffusion portion 4 is formed on the surface of the substrate body 2 on which the black matrix 3 is provided to obtain the microlens substrate 1 (diffusion portion forming step). .
The diffusion part 4 is formed, for example, by previously joining a diffusion plate formed into a plate shape, or by providing a diffusion part forming material including a diffusion material and having fluidity, and then solidifying the material. can do.
Examples of the method for applying the diffusion portion forming material include various application methods such as doctor blade, spin coating, brush coating, spray coating, electrostatic coating, electrodeposition coating, and roll coater, and the substrate body 2 for forming the diffusion portion. A method such as dipping immersed in the material can be used.

Next, a lens substrate, a method for manufacturing the lens substrate, and a transmissive screen according to a second embodiment of the present invention will be described.
FIG. 10 is a schematic longitudinal sectional view showing a second embodiment of the lens substrate (microlens substrate) of the present invention, and FIG. 11 shows the lens portions having different sizes in the lens substrate (microlens substrate) of the present invention. FIG. 11A is a longitudinal sectional view and FIG. 11B is a plan view showing a state of an opening of a black matrix in the case of having a conventional lens substrate. FIG. 13 is a schematic view showing the state of the opening portion of the black matrix in the case where the lens portions having different sizes are provided. FIG. 13 is a view of the transmission screen of the present invention including the lens substrate (microlens substrate) shown in FIG. It is a typical longitudinal section showing a 2nd embodiment. In the following description, the left side in FIGS. 10 and 13 and the lower side in FIGS. 11 and 12 are the “(incident) incident side”, the right side in FIGS. 10 and 13, and in FIGS. 11 and 12. The upper side is called the “(light) emission side”.

Hereinafter, the lens substrate, the manufacturing method of the lens substrate, and the transmissive screen according to the second embodiment will be described focusing on the differences from the first embodiment described above, and descriptions of similar matters will be omitted. .
In the microlens substrate 1 of the first embodiment described above, the focal point of the microlens (lens portion) 21 is located in the vicinity of the surface on the emission side of the substrate body 2, whereas this embodiment is performed as shown in FIG. In the microlens substrate (lens substrate) 1 of the embodiment, the focal point of the microlens 21 is located near the outer surface of the black matrix 3 (surface opposite to the surface facing the substrate body 2). That is, in the microlens substrate 1 of the present embodiment, the light transmitted through the substrate body 2 is collected from the light incident side surface of the black matrix 3 toward the light emission side direction. In the black matrix 3, the opening (second opening) 332 of the second light shielding layer 322 provided on the light emission side from the first light shielding layer 321 is the same as that of the first light shielding layer 321. It is smaller than the opening (first opening) 331.
Thus, in the present invention, the focal portion of the lens unit is not particularly limited. The size of the opening of each light shielding film constituting the black matrix may have any relationship, and can be set, for example, corresponding to the focal position of the lens unit.

  Since the focal point of the microlens 21 is located in the vicinity of the outer surface of the black matrix 3 as in the present embodiment, the focal position of the microlens 21 is particularly determined when the microlens substrate 1 is designed and manufactured. It is not necessary to strictly manage the lens diameter of the microlens 21 and the thickness of the base film 24 so as to be near the surface on the emission side of the substrate body 2, and even if the thickness of the base film 24 changes, the black The opening diameter of the matrix 3 can be formed with a relatively high degree of uniformity.

Further, as in the present embodiment, the opening 332 of the second light shielding layer 322 provided on the light emission side from the first light shielding layer 321 is smaller than the opening 331 of the first light shielding layer 321. In particular, unevenness due to variation in aperture diameter is less noticeable.
Further, the microlens substrate (lens substrate) 1 may include microlenses (lens portions) 21 having different sizes as shown in FIG.

  As described above, in the case where the lens portions having different sizes are provided, in the conventional lens substrate, as shown in FIG. 12A, generally, there is a variation in the size of each opening when the lens substrate is viewed in plan view. There is a problem that the luminance unevenness (brightness variation in each part) becomes conspicuous in the displayed image. In addition, as shown in FIG. 12B, when the size of the opening is uniform, luminance unevenness when observed from the front of the lens substrate is suppressed, but at each opening, There has been a problem that the variation in light transmittance (the transmittance of light refracted by the lens portion) becomes large, and the luminance unevenness when observed from an oblique direction becomes remarkable.

On the other hand, in the present invention, as described above, even when the lens substrate (microlens substrate 1) includes the lens portions (microlenses 21) having different sizes, the plurality of light shielding layers are made transparent. By laminating through the resin layer, as shown in FIG. 11B, when viewed in plan, the variation in the opening area of the entire light-shielding film (black matrix 3) is suppressed, and image formation is performed. Since light can be emitted efficiently, the occurrence of luminance unevenness as described above can be effectively prevented, and the viewing angle characteristics can be improved. In addition, illustration of the diffusion part is omitted in FIG.
As shown in FIG. 13, the transmissive screen 10 of the present embodiment is the same as the above-described embodiment except that it includes the microlens substrate 1 as described above. Also in the transmission screen 10 having such a configuration, the same effect as described above can be obtained.

Next, an example of a method for manufacturing the microlens substrate 1 of the present embodiment will be described. In this method, similarly to the method of the first embodiment described above, the microlens substrate 1 (substrate body 2) is manufactured using the recessed member 6.
14, FIG. 15 and FIG. 16 are schematic longitudinal sectional views showing an example of a method for manufacturing the microlens substrate shown in FIG. In the following description, the lower side in FIGS. 14 to 16 is referred to as “(light) incident side” and the upper side is referred to as “(light) emission side”.

<B1 ′> Same as <B1> in the first embodiment described above (see FIG. 14A).
<B2 ′> Same as <B2> in the first embodiment described above (see FIG. 14B).
<B3 ′> Same as <B3> in the first embodiment described above (see FIG. 14C).
<B4 ′> Next, the black matrix 3 is formed in the same manner as <B4> in the first embodiment described above (FIGS. 14D, 14E, 15F, and 15). (G), FIG. 15 (h), FIG. 15 (i), FIG. 16 (j), and FIG. 16 (k)).
However, in the present embodiment, the focal point of the micro lens 21 is located near the outer surface of the black matrix 3. In the black matrix 3, an opening (second opening) 332 of the second light shielding layer 322 provided on the light emission side from the first light shielding layer 321 is an opening of the first light shielding layer 321. (First opening) smaller than 331.
<B5 ′> Thereafter, the microlens substrate 1 is obtained by forming the diffusion portion 4 in the same manner as <B5> in the first embodiment described above (see FIG. 16L).

A rear projector using the transmission screen will be described below.
FIG. 17 is a diagram schematically showing the configuration of the rear projector of the present invention.
As shown in the figure, the rear projector 400 has a configuration in which a projection optical unit 410, a light guide mirror 420, and a transmissive screen 10 are arranged in a housing 440.
Since the rear projector 400 includes the transmissive screen 10 as described above, an image with excellent contrast can be obtained, and viewing angle characteristics and the like are particularly excellent.
In particular, in the microlens substrate 1 described above, since the elliptical microlenses 21 are arranged in a staggered pattern (in a staggered pattern), problems such as moire are not particularly likely to occur in the rear projector 400.

As mentioned above, although this invention was demonstrated based on embodiment of illustration, this invention is not limited to these.
For example, each part of the lens substrate (microlens substrate), the transmission screen, and the rear projector can be replaced with any component that can exhibit the same function. Moreover, you may add arbitrary structures.

Moreover, in the manufacturing method of a lens substrate (microlens substrate), you may add arbitrary processes.
Moreover, the order of each process in the manufacturing method of a lens substrate is not limited to what was mentioned above, You may change the order as needed.
Moreover, in embodiment mentioned above, although demonstrated as what gives a composition to the surface of a member with a recessed part, for example, a composition is provided to the surface of a flat plate (or the base film mounted on the flat plate), You may manufacture a microlens board | substrate by pressing this with a member with a recessed part.

Moreover, in embodiment mentioned above, although demonstrated as what manufactures a board | substrate body using a plate-shaped member with a recessed part (board | substrate with a recessed part), a board | substrate body is manufactured using a roll-shaped member with a recessed part, for example. May be.
Further, in manufacturing the substrate main body, it is not always necessary to use a member with a recess having a recess corresponding to the convex lens of the lens substrate. For example, the substrate body may be manufactured using a method of forming a lens portion by applying a liquid droplet of a high-viscosity material on the substrate and solidifying the droplet.

  In the above-described embodiment, the black matrix (light-shielding film) is formed by irradiating light (exposure light) with the recessed member removed, but the recessed member is applied to the substrate body. You may form a black matrix in the attached state. That is, when irradiating light to the light transmission layer comprised of the photosensitive pressure-sensitive adhesive layer, light may be irradiated through the member with a recess.

Further, in the above-described embodiment, the member with the concave portion is described as being removed, but the member with the concave portion may not necessarily be removed. That is, the concave member may constitute a part of the lens substrate.
The lens substrate of the present invention is not limited to the one manufactured by the method as described above, and may be manufactured by any method. For example, in the above-described embodiment, it has been described that the black matrix is formed using the photosensitive adhesive, but the photosensitive adhesive is not necessarily used.
Further, the lens substrate of the present invention may be provided with a colored portion (stained portion) near the surface of the lens portion constituting the lens substrate, for example. Thereby, the contrast of the projected image can be further improved.

  In the above-described embodiment, the microlens substrate has been described as having a layered diffusion portion, but the shape of the diffusion portion is not limited to this. For example, the diffusion portion may be provided in a convex shape at a portion corresponding to the opening of the black matrix. Even in such a case, the effects described above can be obtained. In addition, by forming such a diffusion portion, it is possible to more effectively prevent reflection of external light at a portion other than the opening portion of the black matrix, so that the contrast of the obtained image is particularly excellent. can do. Further, the microlens substrate may not include the diffusion portion as described above.

In the above-described embodiment, the lens substrate is described as a microlens substrate including a microlens. However, in the present invention, the lens substrate may be, for example, a lenticular lens substrate.
In the above-described embodiment, the transmission screen is described as including a microlens substrate and a Fresnel lens. However, the transmission screen of the present invention does not necessarily include a Fresnel lens. For example, the transmission screen of the present invention may be substantially constituted only by the microlens substrate of the present invention.

  In the above-described embodiment, the lens substrate is described as a member constituting a transmission screen and a rear projector. However, the use of the lens substrate of the present invention is not limited to the above, It can be anything. For example, the lens substrate of the present invention is applied to a diffusion plate, a black matrix screen, a projection display device (front projector) screen (front projection screen), a liquid crystal light valve component of a projection display device (front projector), and the like. It may be done.

Example 1
The member with a recessed part provided with the recessed part for microlens formation was manufactured as follows.
First, as a substrate, a soda glass substrate having a width of 1.2 m × length of 0.7 m and a thickness of 4.8 mm was prepared.
This soda glass substrate was immersed in a cleaning solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide and etched by 6 μm to clean the surface.
Thereafter, cleaning with pure water and drying using N ₂ gas (removal of pure water) were performed.

  Next, a chromium / chromium oxide laminate (a laminate in which chromium oxide was laminated on the outer surface side of chromium) was formed on the soda glass substrate by sputtering. That is, a mask formation film and a back surface protection film composed of a chromium / chromium oxide laminate were formed on the surface of a soda glass substrate. The thickness of the chromium layer was 0.03 μm, and the thickness of the chromium oxide layer was 0.01 μm.

Next, laser processing was performed on the mask forming film to form a large number of initial holes in a range of 113 cm × 65 cm in the central portion of the mask forming film, thereby forming a mask.
The laser processing was performed using an excimer laser under the conditions of an energy density of 1.2 J / cm ² , a beam diameter of 2 μm at the processing point, and a scanning speed of 0.1 m / sec.
As a result, substantially circular initial holes were formed in a staggered pattern over the entire range of the mask forming film. The diameter of the initial hole was 2 μm.

Next, wet etching was performed on the soda glass substrate to form concave portions (recesses for forming microlenses) having a flat shape (substantially elliptical shape) when viewed in plan on the soda glass substrate. The formed many recesses had substantially the same shape as each other. The length (pitch) in the minor axis direction of the formed recess was 54 μm, the length in the major axis direction was 72 μm, the radius of curvature was 38 μm, and the depth was 38 μm. Moreover, the occupation rate of the recessed part in the effective area | region in which the recessed part was formed was 98%.
In the wet etching, an aqueous solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide was used as an etchant, and the immersion time was 2.0 hours.

Next, the mask and the back surface protective film were removed by etching using a mixture of ceric ammonium nitrate and perchloric acid.
Next, cleaning with pure water and drying (removing pure water) using N ₂ gas were performed.
Thereafter, a gas phase surface treatment (silylation treatment) with hexamethyldisilazane was performed on the surface side of the substrate where the concave portions were formed, thereby forming a release treatment portion.
Thereby, the member with a recessed part in which many recessed parts for microlens formation were arranged on the soda glass substrate in zigzag form was obtained.

Next, a composition composed of an unpolymerized (uncured) acrylic resin (PMMA resin (methacrylic resin)) is applied to the surface on which the concave portion of the member with concave portions is formed, and polyethylene is formed thereon. A substrate film (thickness: 50 mm) made of terephthalate (PET) was placed. The refractive index (absolute refractive index n ₁ ) of polyethylene terephthalate constituting the base film was 1.57.
Next, the said composition was pressed through the base film with the flat plate comprised with soda glass. At this time, air was prevented from entering between the base film and the composition.

Then, the composition was completely hardened by irradiating the composition with ultraviolet rays while being pressed with a flat plate to obtain a substrate body. The obtained substrate main body had a microlens having a shape corresponding to the concave portion of the concave member. The formed microlens had a flat shape (substantially elliptical shape), and had a length in the major axis direction of 72 μm, a radius of curvature of 38 μm, and a height of 38 μm. Further, the occupation ratio of the microlens in the effective region where the microlens is formed was 98%. Further, the refractive index (absolute refractive index n ₁ ) of the material constituting the formed cured portion was 1.56.

Next, the flat plate and the concave member were removed from the substrate body.
Next, an acrylic photosensitive adhesive as a positive photosensitive adhesive is applied to the surface of the substrate main body on the emission side (the surface opposite to the surface on which the microlenses are formed), and the light transmission layer is formed. Formed (first step).
Next, ultraviolet rays as parallel light of 10 mJ / cm ² were irradiated from the surface side of the substrate main body on which the microlenses were formed, using a MA6 aligner (Sousse Microtec) (second step).
The irradiated ultraviolet rays were collected by each microlens, and the photosensitive adhesive at the site irradiated with the collected ultraviolet rays was selectively exposed.
As a result, in the light transmission layer (first light transmission layer), the tackiness of the photosensitive portion was selectively lowered, and the non-photosensitive portion was held in a sticky state.

Next, a light-shielding layer transfer sheet composed of a transfer sheet base material and a light-shielding layer forming material layer is pressure-bonded to the surface of the partially exposed light transmission layer, and a temperature of 35 ° C. is used using a laminator. Lamination was performed under a pressure condition of 5 kg / cm ² , and then the transfer sheet substrate was peeled from the light transmission layer (third step). As a result, the light shielding layer forming material constituting the light shielding layer forming material layer is attached (transferred) only to the non-photosensitive portion of the light transmission layer, and the opening (the second portion) is formed at a portion corresponding to the light condensing portion of each microlens. A light shielding layer (first light shielding layer) having one opening) was formed. The opening (first opening) was substantially circular and had a diameter of 30 μm. The formed first light shielding layer had a thickness of 1.2 μm. In addition, as the light shielding layer transfer sheet, a transfer sheet base material provided with a light shielding layer forming material layer made of carbon black was used.
Thereafter, on the surface side of the substrate body on which the first light transmission layer and the first light shielding layer are provided, the first step to the third step are repeated in the same manner as described above to thereby obtain the light transmission layer ( A second light transmission layer) and a light shielding layer (second light shielding layer) were laminated. The opening part (second opening part) included in the second light-shielding layer was substantially circular and had a diameter of 40 μm.

Next, a microlens substrate as shown in FIG. 1 was obtained by forming a diffusion portion on the side of the substrate body on which the black matrix was formed. The diffusion portion was formed by joining a diffusion plate having a configuration in which a diffusion material (silica particles having an average particle size of 8 μm) was dispersed in an acrylic resin by heat fusion. In addition, the thickness of the diffusion part was 2.0 mm. In addition, the refractive index (absolute refractive index n ₂ ) of the light transmission layer constituting the microlens substrate was 1.56.
A transmissive screen as shown in FIG. 3 was obtained by assembling the microlens substrate manufactured as described above and the Fresnel lens portion manufactured by extrusion molding.

(Examples 2 to 5)
While changing the formation conditions of the light transmission layer (composition and application conditions of the positive photosensitive adhesive) and the formation conditions of the light shielding layer (the thickness of the material layer for forming the light shielding layer), the first step to the third step A microlens substrate and a transmissive screen were manufactured in the same manner as in Example 1 except that the number of process steps was as shown in Table 1 and the configuration of the black matrix was changed as shown in Table 1.

(Example 6)
The member with a recessed part provided with the recessed part for microlens formation was manufactured as follows.
First, as a substrate, a soda glass substrate having a width of 1.2 m × length of 0.7 m and a thickness of 4.8 mm was prepared.
This soda glass substrate was immersed in a cleaning solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide and etched by 6 μm to clean the surface.
Thereafter, cleaning with pure water and drying using N ₂ gas (removal of pure water) were performed.

  Next, a chromium / chromium oxide laminate (a laminate in which chromium oxide was laminated on the outer surface side of chromium) was formed on the soda glass substrate by sputtering. That is, a mask formation film and a back surface protection film composed of a chromium / chromium oxide laminate were formed on the surface of a soda glass substrate. The thickness of the chromium layer was 0.03 μm, and the thickness of the chromium oxide layer was 0.01 μm.

Next, laser processing was performed on the mask forming film to form a large number of initial holes in a range of 113 cm × 65 cm in the central portion of the mask forming film, thereby forming a mask.
The laser processing was performed using an excimer laser under the conditions of an energy density of 1.2 J / cm ² , a beam diameter of 2 μm at the processing point, and a scanning speed of 0.1 m / sec.
As a result, substantially circular initial holes were formed in a staggered pattern over the entire range of the mask forming film. As the initial holes, those having a diameter of 2 μm and those having a diameter of 0.5 μm were provided.

Next, the soda glass substrate was wet-etched to form a large number of recesses (microlens forming recesses) on the soda glass substrate. The formed recess has a relatively large first recess and a second recess smaller than the first recess. The first recess has a flat shape (substantially elliptical shape) when viewed in plan, the length (pitch) in the minor axis direction is 54 μm, the length in the major axis direction is 72 μm, the radius of curvature is 38 μm, the depth Was 38 μm. Further, the second recess had a substantially circular shape when viewed in plan, and had a diameter of 70.5 μm, a radius of curvature of 36.5 μm, and a depth of 36.5 μm. Moreover, the occupation rate of the recessed part in the effective area | region in which the recessed part was formed was 98%.
In the wet etching, an aqueous solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide was used as an etchant, and the immersion time was 2.0 hours.

Next, the mask and the back surface protective film were removed by etching using a mixture of ceric ammonium nitrate and perchloric acid.
Next, cleaning with pure water and drying (removing pure water) using N ₂ gas were performed.
Thereafter, a gas phase surface treatment (silylation treatment) with hexamethyldisilazane was performed on the surface side of the substrate where the concave portions were formed, thereby forming a release treatment portion.
Thereby, the member with a recessed part in which many recessed parts for microlens formation were arranged on the soda glass substrate in zigzag form was obtained.

Next, a composition composed of an unpolymerized (uncured) acrylic resin (PMMA resin (methacrylic resin)) is applied to the surface on which the concave portion of the member with concave portions is formed, and polyethylene is formed thereon. A substrate film (thickness: 50 mm) made of terephthalate (PET) was placed. The refractive index (absolute refractive index n ₁ ) of polyethylene terephthalate constituting the base film was 1.57.
Next, the said composition was pressed through the base film with the flat plate comprised with soda glass. At this time, air was prevented from entering between the base film and the composition.

Then, the composition was completely hardened by irradiating the composition with ultraviolet rays while being pressed with a flat plate to obtain a substrate body. The obtained substrate main body had a microlens having a shape corresponding to the concave portion of the concave member. The formed microlens had a relatively large first microlens and a second microlens smaller than the first microlens. The first microlens has a flat shape (substantially elliptical shape) in plan view, a short axis length (pitch) of 54 μm, a long axis length of 72 μm, a radius of curvature of 38 μm, The height was 38 μm. Further, the second microlens had a substantially circular shape when viewed in plan, a diameter of 70.5 μm, a radius of curvature of 36.5 μm, and a height of 36.5 μm. Further, the occupation ratio of the microlens in the effective region where the microlens is formed was 98%. Further, the refractive index (absolute refractive index n ₁ ) of the material constituting the formed cured portion was 1.56.

Next, the flat plate and the concave member were removed from the substrate body.
Next, an acrylic photosensitive adhesive as a positive photosensitive adhesive is applied to the surface of the substrate main body on the emission side (the surface opposite to the surface on which the microlenses are formed), and the light transmission layer is formed. Formed (first step).
Next, ultraviolet rays as parallel light of 10 mJ / cm ² were irradiated from the surface side of the substrate main body on which the microlenses were formed, using a MA6 aligner (Sousse Microtec) (second step).
The irradiated ultraviolet rays were collected by each microlens, and the photosensitive adhesive at the site irradiated with the collected ultraviolet rays was selectively exposed.
As a result, in the light transmission layer (first light transmission layer), the tackiness of the photosensitive portion was selectively lowered, and the non-photosensitive portion was held in a sticky state.

Next, a light-shielding layer transfer sheet composed of a transfer sheet base material and a light-shielding layer forming material layer is pressure-bonded to the surface of the partially exposed light transmission layer, and a temperature of 35 ° C. is used using a laminator. Lamination was performed under a pressure condition of 5 kg / cm ² , and then the transfer sheet substrate was peeled from the light transmission layer (third step). As a result, the light shielding layer forming material constituting the light shielding layer forming material layer is attached (transferred) only to the non-photosensitive portion of the light transmission layer, and the opening (the second portion) is formed at a portion corresponding to the light condensing portion of each microlens. A light shielding layer (first light shielding layer) having one opening) was formed. The opening (first opening) is substantially circular and has a diameter of 40 μm (opening provided in a portion corresponding to the first microlens) and a diameter of 38.8 μm (first 2) provided in a portion corresponding to the microlens 2). The formed first light shielding layer had a thickness of 1.2 μm. In addition, as the light shielding layer transfer sheet, a transfer sheet base material provided with a light shielding layer forming material layer made of carbon black was used.

  Thereafter, on the surface side of the substrate body on which the first light transmission layer and the first light shielding layer are provided, the first step to the third step are repeated in the same manner as described above to thereby obtain the light transmission layer ( A second light transmission layer) and a light shielding layer (second light shielding layer) were laminated. The opening (second opening) included in the second light-shielding layer is substantially circular and has a diameter of 30 μm (an opening provided in a portion corresponding to the first microlens) and a diameter of 38. .5 μm (opening provided at the portion corresponding to the second microlens).

Next, a microlens substrate as shown in FIGS. 10 and 11 was obtained by forming a diffusion portion on the surface side of the substrate body on which the black matrix was formed. The diffusion portion was formed by joining a diffusion plate having a configuration in which a diffusion material (silica particles having an average particle size of 8 μm) was dispersed in an acrylic resin by heat fusion. In addition, the thickness of the diffusion part was 2.0 mm. In addition, the refractive index (absolute refractive index n ₂ ) of the light transmission layer constituting the microlens substrate was 1.56.
A transmissive screen as shown in FIG. 13 was obtained by assembling the microlens substrate manufactured as described above and the Fresnel lens portion manufactured by extrusion molding.

(Examples 7 to 10)
While changing the formation conditions of the light transmission layer (composition and application conditions of the positive photosensitive adhesive) and the formation conditions of the light shielding layer (the thickness of the material layer for forming the light shielding layer), the first step to the third step A microlens substrate and a transmissive screen were manufactured in the same manner as in Example 6 except that the number of process steps was as shown in Table 2 and the configuration of the black matrix was changed as shown in Table 2.

(Comparative Example 1)
In the step of forming the black matrix, the microlens substrate was formed in the same manner as in Example 1 except that the second light transmission layer and the second light shielding layer were not formed after the first light shielding layer was formed. A transmission screen was produced.
(Comparative Example 2)
In the step of forming the black matrix, the microlens substrate was formed in the same manner as in Example 6 except that the second light transmission layer and the second light shielding layer were not formed after the first light shielding layer was formed. A transmission screen was produced.

(Comparative Example 3)
A microlens substrate and a transmission screen were manufactured in the same manner as in Example 1 except that the step of forming the black matrix was omitted. That is, the microlens substrate of this comparative example has the same configuration as the microlens substrate of Example 1 except that it does not have a black matrix (light shielding layer).
Tables 1 and 2 collectively show the configuration of the black matrix and the like for each of the examples and comparative examples.

[Production of rear projector]
Using the transmissive screens of the respective examples and comparative examples, rear type projectors as shown in FIG. 17 were produced.
[Evaluation of uneven brightness]
Sample images were displayed on the transmissive screens of the rear projectors of the examples and comparative examples. For the displayed image, the occurrence of luminance unevenness was evaluated according to the following four criteria.
A: No luminance unevenness is observed at all.
○: Brightness unevenness is hardly recognized.
(Triangle | delta): Brightness nonuniformity is recognized slightly.
X: Brightness unevenness is noticeable.

[Evaluation of diffracted light and moire]
Sample images were displayed on the transmissive screens of the rear projectors of the examples and comparative examples. The displayed images were evaluated for the occurrence of diffracted light and moiré according to the following four criteria.
A: Diffraction light and moire are not recognized at all.
○: Diffracted light and moire are hardly recognized.
Δ: Slightly diffracted light and moire are observed.
X: Diffracted light and moire are remarkably recognized.

[Evaluation of contrast]
Contrast evaluation was performed on the rear projectors of each of the examples and comparative examples.
As contrast (CNT), the front luminance (white luminance) LW [cd / m ² ] of white display when 373 lx all white light is incident in the bright room and the front luminance of black display when the light source is completely turned off in the bright room The ratio LW / LB with the increase amount (black luminance increase amount) LB [cd / m ² ] was obtained. The black luminance increase amount is an increase amount with respect to the black display luminance in the dark room. The measurement in the bright room was performed under an environment where the ambient light illuminance was about 82 lx. The measurement in the dark room was performed in an environment where the external light illuminance was 0.1 lx or less.

[Measurement of viewing angle]
With the sample images displayed on the transmissive screens of the rear projectors of the examples and comparative examples, the viewing angles in the vertical direction (up and down direction) and the horizontal direction (left and right direction) were measured.
The viewing angle was measured under the condition of measuring with a variable angle photometer (goniophotometer) at intervals of 1 degree.
These results are summarized in Table 3.

  As apparent from Table 3, in the present invention, the occurrence of uneven brightness was sufficiently prevented, and a high-contrast image could be displayed. Also, the viewing angle characteristics were excellent. Further, in the present invention, a bright image can be displayed, and generation of diffracted light and moire is sufficiently prevented. On the other hand, in each comparative example, a satisfactory result was not obtained.

It is a typical longitudinal section showing a 1st embodiment of a micro lens substrate (lens substrate) of the present invention. FIG. 2 is a plan view of the microlens substrate shown in FIG. 1. It is a typical longitudinal cross-sectional view which shows a mode that the external light which injected into the microlens board | substrate shown in FIG. 1 attenuate | damps. It is a typical longitudinal cross-sectional view which shows 1st Embodiment of the transmissive screen of this invention provided with the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal section showing a member with a crevice used for manufacture of a micro lens substrate. It is a typical longitudinal cross-sectional view which shows the manufacturing method of the member with a recessed part shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal section showing a microlens substrate (lens substrate) 2nd embodiment of the present invention. FIG. 11A is a schematic view showing a state of an opening of a black matrix in a case where the lens substrate (microlens substrate) of the present invention has lens portions having different sizes, and FIG. (B) is a plan view. FIG. 12A is a schematic diagram showing a state of an opening portion of a black matrix when a conventional lens substrate has lens portions having different sizes, and FIG. 12A shows an opening portion corresponding to light condensing. FIG. 12B is a longitudinal sectional view when each opening is made uniform in size. It is a typical longitudinal cross-sectional view which shows 2nd Embodiment of the transmissive screen of this invention provided with the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows an example of the manufacturing method of the micro lens board | substrate (lens board | substrate) shown in FIG. It is a figure which shows typically the rear type projector to which the transmission type screen of this invention is applied.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Micro lens board | substrate (lens board | substrate) 2 ... Board | substrate main body 21 ... Micro lens (lens part) 211 ... Center 23 ... Composition 24 ... Base film 25 ... 1st row | line 26 ... 2nd row 3 ... Black matrix ( 31... Light transmission layer 311... First light transmission layer 312... Second light transmission layer 319... Photosensitive portion 319 a .. photosensitive portion (first photosensitive portion) 319 b .. photosensitive portion (second photosensitive portion) 32 ... light shielding layer 321 ... first light shielding layer 322 ... second light shielding layer 32 '... light shielding layer forming material layer 33 ... opening 331 ... first opening (opening) 332 ... second opening ( 4) Diffusion part 5 ... Fresnel lens part 51 ... Fresnel lens 6 ... Recessed member (microlens forming recessed part) 61 ... Recessed (microlens forming recessed part) 7 ... Substrate 8 ... Mask DESCRIPTION OF SYMBOLS 81 ... Initial hole (opening) 89 ... Back surface protective film 9 ... Mask formation film 11 ... Flat plate 10 ... Transmission type screen 13 ... Light-shielding layer transfer sheet 131 ... Transfer sheet base material 400 ... Rear type projector 410 ... Projection optical unit 420 ... Light guide mirror 440 ... Case La ... Parallel light Lc ... External light

Claims (14)

A lens substrate comprising a substrate body having a large number of lens portions and a light shielding film having an opening,
The light-shielding film includes a plurality of light-shielding layers having a light-shielding property and at least one light-transmitting layer having a light-transmitting property, and the light-transmitting layer is interposed between the adjacent light-shielding layers. A lens substrate having an inserted structure. The light-shielding film has, as the light-shielding layer, a first light-shielding layer and a second light-shielding layer provided with an opening larger than the opening provided in the first light-shielding layer,
When the area of the opening in the first light shielding layer is S _S [μm ² ] and the area of the opening in the second light shielding layer is S _L [μm ² ], 0.55 ≦ S _S / S _L The lens substrate according to claim 1, wherein a relationship of ≦ 0.95 is satisfied.   The lens substrate according to claim 1, wherein the light transmission layer has a thickness of 2 to 35 μm.   The lens substrate according to claim 1, wherein a thickness of the light shielding layer is 0.5 to 5 μm. The relationship of −0.18 ≦ n ₁ −n ₂ ≦ 0.18 is satisfied, where n _{1 is} a refractive index of the constituent material of the substrate body and n ₂ is a refractive index of the constituent material of the light transmission layer. The lens substrate according to any one of 1 to 4.   6. The lens substrate according to claim 1, wherein an aperture ratio when the lens substrate is viewed in plan is 5 to 20%.   The lens substrate according to any one of claims 1 to 6, wherein the lens substrate is a microlens substrate including a microlens as the lens portion.   The lens substrate according to any one of claims 1 to 7, wherein the substrate body includes a lens portion having a different size as the lens portion. A method of manufacturing a lens substrate comprising a substrate body having a large number of lens portions and a light-shielding film having openings.
A first step of forming a light-transmitting layer having a light transmitting property by applying a positive photosensitive adhesive to the surface of the substrate body opposite to the surface on which the lens portion is formed;
Performing a process of irradiating the light transmitting layer with light through the substrate body, and reducing the adhesiveness of the photosensitive portion;
A third step of providing a light shielding layer forming material on a portion of the light transmission layer other than the photosensitive portion and forming a light shielding layer having an opening;
Manufacturing the lens substrate, wherein the light shielding film is formed by laminating a plurality of the light shielding layers through the light transmission layer by repeating the first step to the third step a plurality of times. Method. The third step is a step of bonding a light-shielding layer transfer sheet having a layer composed of the light-shielding layer forming material on the light transmission layer;
The method for producing a lens substrate according to claim 9, further comprising a step of peeling the bonded light shielding layer transfer sheet and transferring the light shielding layer forming material to a non-photosensitive portion of the photosensitive adhesive.   A transmissive screen comprising the lens substrate according to claim 1.   A transmissive screen comprising a lens substrate manufactured using the method according to claim 9. A Fresnel lens part having a Fresnel lens formed on the light exit side;
The transmissive screen according to claim 11, further comprising the lens substrate disposed on a light emission side of the Fresnel lens unit. A rear projector comprising the transmissive screen according to claim 11.

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