JP2003302639A - Resin composition for spacer and liquid crystal display element - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin composition for a spacer used suitably for forming a spacer pixel pattern disposed on a substrate in a liquid crystal display element and to provide the liquid crystal display element capable of displaying a high quality image free from liquid crystal display unevenness. <P>SOLUTION: The resin composition for the spacer for forming the spacer pixel pattern disposed on the substrate to keep the thickness of a liquid crystal layer constant in the liquid crystal display element has 0.03 to 0.3 μm plastic deformation amount per 1 gf load of a single spacer at the temperature when the liquid crystal is sealed. The liquid crystal display element is formed by using the resin composition for the spacer. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spacer resin composition used for forming a spacer pixel pattern arranged on a substrate in a liquid crystal display device and a liquid crystal display capable of displaying a high quality image without liquid crystal display unevenness. Regarding the device.

[0002]

Liquid crystal display devices are widely used to provide high quality images. Generally, in a liquid crystal display device, a liquid crystal layer having a predetermined orientation is arranged between a pair of substrates, and maintaining the distance between the substrates, that is, the thickness of the liquid crystal layer to be uniform determines image quality. . Spacers are used to keep the liquid crystal layer thickness constant.

Inorganic particles such as silica have been conventionally used for the spacer, but there is a problem that they are present on the image and impair the image quality. For example, JP-A-62-90622.
It is formed by photolithography using a resin composition for a spacer as disclosed in Japanese Patent Laid-Open Publication No. JP-A-2004-242242.

However, in the prior art, the spacer dots formed by patterning, developing and baking the resin composition for spacers have a weak compressive strength, the plastic deformation becomes large at the time of paneling, and the thickness of the liquid crystal layer is larger than the target value. There is a problem that the liquid crystal layer becomes smaller or the thickness of the liquid crystal layer cannot be kept uniform, and image unevenness in the liquid crystal display is likely to occur.

[0005]

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems in the prior art and to solve the following problems. That is, the present invention is a resin composition for a spacer capable of defining the plastic deformation amount of the spacer at a sealing temperature at the time of liquid crystal production in an appropriate range, and a target liquid crystal layer having a uniform thickness, and liquid crystal display unevenness. It is an object of the present invention to provide a liquid crystal display element capable of displaying a high quality image without a color.

[0006]

Means for solving the problems Means for solving the above problems are as follows. That is, <1> a spacer resin composition for forming a spacer pixel pattern arranged on a substrate to keep the thickness of a liquid crystal layer in a liquid crystal display device constant, in a sealing temperature at the time of liquid crystal production. Spacer load 1g
The resin composition for spacers is characterized in that the amount of plastic deformation with respect to f is 0.03 μm to 0.3 μm. <2> The spacer resin composition according to <1>, which further includes an extender pigment. <3> The content of the extender pigment is 1 to 50% by mass of the total solid content of the resin composition for a spacer, <1> or <2.
The resin composition for spacers according to the item <>. <4> Use of the alkali-soluble thermoplastic resin layer, the intermediate layer, and the photosensitive resin layer on a temporary support in this order as a photosensitive resin layer of a photosensitive transfer material <1. The resin composition for spacers according to any one of <1> to <3>. <5> In a liquid crystal display device in which liquid crystal is sealed between a pair of substrates arranged so as to face each other, a spacer pixel pattern arranged on the substrate in order to keep the thickness of the liquid crystal layer constant is <1. A liquid crystal display device, characterized in that it is formed from the resin composition for a spacer according to any one of <1> to <4>.

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in more detail below. (Resin composition for spacers) The resin composition for spacers of the present invention is used for forming a spacer pixel pattern arranged on a substrate in order to keep the thickness of a liquid crystal layer in a liquid crystal display element constant, The plastic deformation amount for a load of 1 gf of the single spacer at the sealing temperature at the time of preparation is 0.03 μm to 0.3 μm, and 0.04 μm to 0.
2 μm is preferable, and 0.05 μm to 0.15 μm is more preferable. If the amount of plastic deformation is too small, the film thickness nonuniformity of the spacer layer remains as it is, and the heights of the spacers become uneven, resulting in uneven liquid crystal display. On the other hand, if it is too large, the film thickness may deviate from the proper value, or the spacer may not be formed in some cases.

Here, the plastic deformation amount of the single spacer of the spacer image pattern is, for example, 5 using a dynamic ultra-micro hardness meter DUH-W201 manufactured by Shimadzu Corporation.
Cylindrical indenter of 0 μmφ, load speed 0.145 gf /
Second, load 1 gf, holding time 5 seconds. The measurement temperature is a sealing temperature at the time of producing the liquid crystal, specifically, 150 ° C to 200 ° C, particularly 160 ° C to
180 ° C is preferred.

The spacer resin composition of the present invention has a plastic deformation amount of 0.03 μm to 0.3 μm for a load of 1 gf of a single spacer at the sealing temperature at the time of producing the liquid crystal.
There is no particular limitation so long as it is within the range, and it can be appropriately selected and used from the components usually used in the resin composition for spacers, but in particular, containing an allyl group-containing resin, further, a polymerizable monomer, a polymerization Those containing an initiator, an extender pigment, and other components appropriately selected as necessary are preferable.

The resin composition for the spacer is 1
It is preferably a thermoplastic resin composition exhibiting softening property or tackiness at 50 ° C. or lower, and when exposed, it is a photopolymerizable resin composition having a high resist property by hardening only the exposed portion to become alkali insoluble. More preferable.

--Allyl Group-Containing Resin-- The allyl group containing resin can function as a binder in the spacer resin composition, and the allyl group containing resin is an allyl group containing resin. There is no particular limitation and it can be appropriately selected according to the purpose.

The above allyl group-containing resin may be used alone or in combination of two or more, and among them, at least an allyl group containing (meth) acrylate as a monomer unit is contained. And the like, and the allyl group-containing (meth) acrylate and (meth)
A resin containing a monomer unit selected from acrylic acid and an allyl group-free (meth) acrylate is more preferable.

Examples of the allyl group-containing (meth) acrylate include allyl (meth) acrylate, 2-methylallyl acrylate, crotyl acrylate, chloroallyl acrylate, phenylallyl acrylate,
Examples include cyanoallyl acrylate, which are 1
The seeds may be used alone or in combination of two or more. Of these, allyl (meth) acrylate is particularly preferable.

The allyl group-free (meth) acrylate is preferably benzyl (meth) acrylate or hydroxyalkyl (meth) acrylate, which may be used alone or in combination of two or more. You may.

Among the above hydroxyalkyl (meth) acrylates, hydroxyethyl (meth) acrylate, hydroxy n-propyl (meth) acrylate, hydroxy n-butyl (meth) acrylate and the like are particularly preferable.

The other monomer is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include alkyl (meth) acrylate, aryl (meth) acrylate and vinyl compounds. To be

Examples of the alkyl (meth) acrylate and the aryl (meth) acrylate include methyl.
(Meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate,
Isobutyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, octyl (meth)
Suitable examples include acrylate, phenyl (meth) acrylate, benzyl acrylate, tolyl acrylate, naphthyl acrylate, cyclohexyl acrylate, and the like.

Examples of the vinyl compound include styrene, α-methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl methacrylate, polystyrene macromonomer and polymethylmethacrylate macromonomer. Suitable examples include:

As a preferred specific example of the allyl group-containing resin, a binary copolymer resin of component: (meth) acrylic acid and component: allyl (meth) acrylate (a preferable copolymerization composition ratio is component: component = 2-80: 20-98
(Molar ratio)), component: (meth) acrylic acid, component: allyl (meth) acrylate, component: benzyl (meth) acrylate, terpolymer resin (preferable copolymerization composition ratio is component: component: Ingredient = 10-40: 20
˜80: 10 to 70 (molar ratio)) and the like.

The content of the allyl group-containing (meth) acrylate in the allyl group-containing resin is 10 mol%.
The above is preferable, preferably 10 to 100 mol%, more preferably 15 to 90%, further preferably 20 to 80%.
Is.

The mass average molecular weight of the allyl group-containing resin is gel permeation chromatography (G
PC) 5,000 to 10 in terms of polystyrene conversion of measured values
It is preferably 50,000, and preferably 8,000 to 50,000.
It is more preferably 0. The mass average molecular weight is
The film strength is good when it is 5,000 to 100,000.

The content of the allyl group-containing resin in the spacer resin composition is preferably 15 to 70% by mass of the total solid content of the spacer resin composition,
It is more preferably from 18 to 60% by mass, and from 25 to 50
More preferably, it is% by mass.

--Polymerizable Monomer-- The polymerizable monomer is not particularly limited as long as it has at least one addition-polymerizable ethylenically unsaturated group, and can be appropriately selected according to the purpose. For example, ester compounds, amide compounds, other compounds, etc. may be mentioned. These may be used alone or 2
You may use together 1 or more types.

Examples of the ester compound include monofunctional (meth) acrylic acid ester, polyfunctional (meth) acrylic acid ester, itaconic acid ester, crotonic acid ester, isocrotonic acid ester, maleic acid ester,
Other ester compounds may be mentioned. These may be used alone or in combination of two or more, and among these, monofunctional (meth) acrylic acid ester, polyfunctional (meth) acrylic acid ester and the like are preferable.

Examples of the monofunctional (meth) acrylic acid ester include polyethylene glycol mono (meth) acrylate.
Acrylate, polypropylene glycol mono (meth)
Examples thereof include acrylate and phenoxyethyl mono (meth) acrylate.

Examples of the polyfunctional (meth) acrylic acid ester include polyethylene glycol di (meth) acrylate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate,
1,3-butanediol di (meth) acrylate, tetramethylene glycol di (meth) acrylate, hexanediol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol di ( (Meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol poly (meth) acrylate, sorbitol tri (meth) acrylate, sorbitol tetra ( (Meth) acrylate,
Examples include trimethylolethane tri (meth) acrylate, neopentyl glycol di (meth) acrylate, and hexanediol di (meth) acrylate. Among these, dipentaerythritol poly (meth) acrylate is particularly preferable.

Other examples of the polyfunctional (meth) acrylic acid ester are those obtained by adding ethylene oxide or propylene oxide to a polyfunctional alcohol such as glycerin or trimethylolethane, followed by (meth) acrylate conversion. 48-41708, Japanese Patent Publication No. 50-6
No. 034, the urethane acrylates described in JP-A-51-37193, JP-A-48-64183, JP-B-49-43191, and JP-B-52-
No. 30490, polyester acrylates, epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid, JP-A-60-2585.
Examples thereof include (meth) acrylic acid ester, urethane (meth) acrylate and vinyl ester described in JP-A-39.

Examples of the other ester compounds include trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, and Journal of Adhesion Society of Japan Vol. 20,
Photocurable monomers and oligomers described in No. 7, pages 300 to 308, and the like.

Examples of the amide compound include an amide (monomer) of unsaturated carponic acid and an aliphatic polyvalent amine compound. Specifically, methylenebis-
(Meth) acrylamide, 1,6-hexamethylenebis- (meth) acrylamide, diethylenetriaminetris (meth) acrylamide, xylylenebis (meth) acrylamide, and the like, and JP-A-60-2
(Meth) acrylic acid amide described in Japanese Patent No. 58539.
And so on.

Examples of the other compounds include allyl compounds described in JP-A-60-258539,
And so on.

The content of the polymerizable monomer in the spacer resin composition is 10 to 6 of the total solid content.
0 mass% is preferable and 20 to 50 mass% is more preferable.

--Polymerization Initiator-- It is preferable that the polymerization initiator contains at least one component having a molecular extinction coefficient of about 50 or more in the wavelength region of about 300 to 500 nm. Aromatic ketones, lophine dimers, benzoin, benzoin ethers, polyhalogens, and halogenated hydrocarbons described in JP-A-2-48664, JP-A-1-152449, and JP-A-2-153353. Examples thereof include derivatives, ketone compounds, ketoxime compounds, organic peroxides, thio compounds, hexaarylbiimidazole, aromatic onium salts and ketoxime ethers.

These may be used alone, or
You may use 2 or more types together. Among these, 4,4 '
-Bis (diethylamino) benzophenone and 2- (o-
Chlorophenyl) -4,5-diphenylimidazole 2
Combination with a monomer, 4- [p-N, N'-di (ethoxycarbonylmethyl) -2,6-di (trichloromethyl)-
s-Triazine], 2,4-bis- (trichloromethyl) -6- [4- (N, N′-diethoxycarbonylmethylamino) -3-bromophenyl] -s-triazine and the like are preferable.

The amount of the polymerization initiator used is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass, based on the amount of the polymerizable monomer used.

The spacer resin composition of the present invention preferably contains an extender pigment. The extender pigment is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include silica, zinc oxide, barium sulfate, barium carbonate, alumina white, calcium carbonate and calcium stearate. These may be used alone or in combination of two or more, and among these, non-colored ones are preferable, and silica, zinc oxide and the like are particularly preferable.

Specific examples of the silica include R-97.
2, # 200 (manufactured by Nippon Aerosil Co., Ltd.), Sea Hoster K
E (manufactured by Nippon Shokubai Chemical Co., Ltd.), Snowtex (trade name: methanol silica sol, MA-ST-M, IPA)
Commercially available products such as -ST, MEK-ST, MIBK-ST, and Nissan Chemical Industries Ltd. are preferred. Specific examples of the zinc oxide include ZnO-100 and ZnO-200.
Commercial products such as (Sumitomo Cement Co., Ltd.) are suitable. Among these, colloidal silica typified by Snowtex is particularly preferable.

The extender pigment may be improved in dispersibility by subjecting it to a surface treatment or the like with an appropriately selected silane coupling agent or titanate coupling agent.

The particle size of the extender pigment is from 0.01 to
0.5 μm is preferable, and 0.02 to 0.4 μm is more preferable. If the particle size is less than 0.01 μm, the dispersion stability becomes poor, and if it exceeds 0.5 μm, the unevenness on the surface of the photosensitive resin layer becomes large, which is not preferable.

The extender pigment is added in an amount of 1 to 50% by mass of the total solid content in the spacer resin composition.
Is preferable, 5-40 mass% is more preferable, 10-3
5% by mass is particularly preferred. The amount of the extender pigment added is 1
When it is less than 50% by mass, sufficient film strength cannot be obtained, and it may not be possible to prevent a decrease in thickness at the time of transfer and brush scratches at the time of development. It is not preferable because it easily enters and the transparency of the photosensitive resin layer decreases.

The extender pigment may be used in a state of being uniformly dispersed in a dispersant selected appropriately. The dispersant is not particularly limited and may be appropriately selected depending on the intended purpose. For example, Solspers 3000, 9000,
17,000, 20000, 27,000 (Zeneca Corporation)
Manufactured), Addisper PB-711, PN-411, PA-
111 (manufactured by Ajinomoto Co., Inc.), EFKA-766,524
4, 71, 65, 64, 63, 44 (manufactured by Fuka Chemicals) and the like. Among these, Sols Perth 20000 is preferable. As the amount of the dispersant used,
From the viewpoint of obtaining a dispersion solution having good dispersibility, it is preferably 0.5 to 100 parts by mass with respect to 100 parts by mass of the extender pigment.

The dispersion stability can be improved by adding a surfactant to the dispersion solution in which the extender pigment is dispersed by the dispersant, if necessary.
The surfactant is not particularly limited and includes various surfactants, for example, alkylnaphthalene sulfonate, anionic surfactant typified by phosphoric acid ester salt and the like, typified by amine salt and the like. Examples thereof include cationic surfactants, aminocarboxylic acids, amphoteric surfactants represented by betaine type and the like.

The spacer resin composition may contain a colorant appropriately selected according to the purpose. The colorant is not particularly limited and may be appropriately selected depending on the purpose, for example, an organic pigment, an inorganic pigment,
Examples include dyes. These may be used alone or in combination of two or more, and among these, those which are decolorized by the development treatment or heat treatment described later are also preferable.

As the colorant, for example, auramine (C.I. 41000), Fat Black HB
(C.I. 26150), Monolite First Black B (C.I. Pigment Black 1), carbon, C.I. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Brown 2
3, C.I. I. Pigment Brown 25, C.I. I. Pigment Brown 26, Pigment Black 7, Permanent Carmine FBB (CI Pigment Red 146), Permanent Ruby FBH (CI Pigment Red 11), Fastel Pink B Spla (CI Pigment Red 11). Pigment Red 81), C.I. I. Pigment Red 97, C.I. I. Pigment Red 12
2, C.I. I. Pigment Red 149, C.I. I. Pigment Red 168, C.I. I. Pigment Red 1
77, C.I. I. Pigment Red 180, C.I. I. Pigment Red 192, C.I. I. Pigment Red 215, C.I. I. Pigment Red 123, C.I. I.
Pigment Red 213, C.I. I. Pigment Red 217, C.I. I. Pigment Red 220, C.I.
I. Pigment Red 223, C.I. I. Pigment
Red 224, C.I. I. Pigment Red 226,
C. I. Pigment Red 227, C.I. I. Pigment Red 228, C.I. I. Pigment Red 24
0, C.I. I. Pigment Red 48, C.I. I. Pigment Red 1, C.I. I. Pigment Red 209,
Mono Light Yellow GT (C.I. Pigment Yellow 12), Permanent Yellow GR (C.I. Pigment Yellow 17), Permanent Yellow H
R (CI Pigment Yellow 83), C.I. I. Pigment Yellow 20, C.I. I. Pigment Yellow 24, C.I. I. Pigment Yellow 83, C.I. I.
Pigment Yellow 86, C.I. I. Pigment Yellow 93, C.I. I. Pigment Yellow 109, C.I.
I. Pigment Yellow 110, C.I. I. Pigment Yellow 117, C.I. I. Pigment Yellow 12
5, C.I. I. Pigment Yellow 137, C.I. I. Pigment Yellow 138, C.I. I. Pigment Yellow 139, C.I. I. Pigment Yellow 147,
C. I. Pigment Yellow 148, C.I. I. Pigment Yellow 153, C.I. I. Pigment Yellow 154, C.I. I. Pigment Yellow 166, C.I.
I. Pigment Yellow 168, C.I. I. Pigment Yellow 185, C.I. I. Pigment Orange 3
6, C.I. I. Pigment Orange 43, C.I. I. Pigment Orange 51, C.I. I. Pigment Orange 55, C.I. I. Pigment Orange 59, C.I. I. Pigment Orange 61, Hoster Balm Red ESB
(C. I. Pigment Violet 19), Monastral First Blue (C. I. Pigment Blue 15), C.I. I. Pigment Violet 19,
C. I. Pigment Violet 23, C.I. I. Pigment Violet 29, C.I. I. Pigment Violet 30, C.I. I. Pigment Violet 3
7, C.I. I. Pigment Violet 40, C.I. I.
Pigment Violet 50, Victoria Pure Blue BO (C.I. 42595), Victoria Pure Blue BOH, Victoria Pure Blue BOH
-M, malachite green, C.I. I. Pigment Blue 15: 1, C.I. I. Pigment Blue 15: 4,
C. I. Pigment Blue 15: 6, C.I. I. Pigment Blue 22, C.I. I. Pigment Blue 60,
C. I. Pigment Blue 64, Carbon Black,
And so on.

--Other components-- The other components are appropriately selected depending on the intended purpose without any limitation, and examples thereof include allyl group-containing (meth) acrylate-free thermoplastic resins and various types. Examples include additives.

The thermoplastic resin containing no allyl group-containing (meth) acrylate is not particularly limited and may be appropriately selected depending on the intended purpose. However, the (meth) acrylic acid and the other monomer may be selected. Suitable examples thereof include copolymers with and the like.

Examples of the various additives include a polymerization inhibitor and an ultraviolet absorber.

Examples of the polymerization inhibitor include hydroquinones such as phenothiazine and hydroquinone monomethyl ether.

Examples of the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, nickel chelate-based, hindered amine-based, and the like. Specifically, phenyl salicylate, 4-t-butyl. Phenyl salicylate,
2,4-di-t-butylphenyl-3,5-di-t-
4'-hydroxybenzoate, 4-t-butylphenyl salicylate, 2,4-di-hydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2
-Hydroxy-4-n-octoxybenzophenone, 2
-(2'-hydroxy-5'-methylphenyl) benzotriazole, 2- (2'-hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, ethyl-2-cyano- 3,3'-di-phenyl acrylate, 2,2'-hydroxy-4-methoxybenzophenone, nickel dibutyl dithiocarbamate, bis (2,2 ', 6,6'-tetramethol-4-pyridine) -sebacate, 4- t-butylphenyl salicylate, phenyl salicylate, 4-hydroxy-2,
2 ', 6,6'-Tetramethylpiperidine condensate, succinic acid-bis (2,2', 6,6'-tetramethyl-4-piperidenyl) -ester, 2- [2-hydroxy-3,
5-bis (α, α-dimethylbenzyl) phenyl] -2
H-benzotriazole, 7-{[4-chloro-6-
(Diethylamino) -5-triazin-2-yl] amino} -3-phenylcoumarin, and the like.

The spacer resin composition of the present invention is suitably used for forming a spacer pixel pattern of a liquid crystal display device, and in particular, an alkali-soluble thermoplastic resin layer, an intermediate layer, and It is preferable to use the photosensitive resin layer for the photosensitive resin layer of the photosensitive transfer material having this order. Hereinafter, one embodiment of the photosensitive transfer material will be described in detail.

—Photosensitive Resin Layer— The photosensitive resin layer is formed from the resin composition for spacers of the present invention, and the thickness thereof is preferably 0.5 to 10 μm, more preferably 1 to 6 μm. If the thickness of the photosensitive resin layer is less than 0.5 μm, pinholes are likely to occur during coating, which is not preferable in terms of manufacturing suitability, and if it exceeds 10 μm, it takes time to remove the unexposed portion during development. , Not preferable.

-Intermediate Layer- The intermediate layer is provided on the photosensitive resin layer, and when the photosensitive transfer material has an alkali-soluble thermoplastic resin layer, the photosensitive resin layer and the alkali It is provided between the melted thermoplastic resin layer. Since an organic solvent is used in the formation of the photosensitive resin layer and the alkali-soluble thermoplastic resin layer, when the intermediate layer is located between them, it is possible to prevent both layers from mixing with each other.

The intermediate layer is preferably one that is dispersed or dissolved in water or an alkaline aqueous solution. As the material of the intermediate layer, known materials can be used, for example, JP-A-46-2121 and JP-B-56-40.
No. 824, polyvinyl ether / maleic anhydride polymer, water-soluble salt of carboxyalkyl cellulose, water-soluble cellulose ethers, water-soluble salt of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylamides, water-soluble polyamide ,
Examples thereof include water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, water-soluble salts of the group consisting of various starches and the like, styrene / maleic acid copolymers, maleate resins, and the like. These may be used alone or in combination of two or more. Among these, it is preferable to use a hydrophilic polymer, and it is preferable to use at least polyvinyl alcohol among the hydrophilic polymers, and it is particularly preferable to use polyvinyl alcohol and polyvinylpyrrolidone in combination.

The polyvinyl alcohol is appropriately selected depending on the intended purpose without any limitation, but the saponification rate is preferably 80% or more. When the polyvinylpyrrolidone is used, its content is preferably 1 to 75% by volume, more preferably 1 to 60% by volume, and preferably 10 to 50% by volume based on the solid content of the intermediate layer. % Is particularly preferred. If the content is less than 1% by volume, sufficient adhesiveness to the photosensitive resin layer may not be obtained, while if it exceeds 75% by volume, the oxygen barrier ability may be reduced. , Not preferable.

The intermediate layer preferably has a low oxygen permeability. When the oxygen permeability of the intermediate layer is large and the oxygen blocking ability is low, it may be necessary to increase the amount of light at the time of exposure to the photosensitive resin layer, or it may be necessary to lengthen the exposure time, and the resolution is also high. It may decrease.

The thickness of the intermediate layer is 0.1-5 μm.
It is preferably about m, and more preferably 0.5 to 2 μm. If the thickness is less than 0.1 μm, the oxygen permeability may be too high, while if it exceeds 5 μm, it takes a long time during development and removal of the intermediate layer, which is not preferable.

-Alkali-Soluble Thermoplastic Resin Layer- The alkali-soluble thermoplastic resin layer enables alkali development, and the alkali-soluble thermoplastic resin layer that is exposed during transfer prevents transfer It is necessary to be alkali-soluble from the viewpoint of being able to prevent contamination, and when transferring the photosensitive transfer material onto a transfer target, transfer that occurs due to unevenness present on the transfer target It preferably has a function as a cushioning material that effectively prevents defects, and is suitable for unevenness existing on the transferred material when the photosensitive transfer material is heated and brought into close contact with the transferred material. More preferably, it can be deformed.

The alkali-soluble thermoplastic resin is appropriately selected depending on the intended purpose without any limitation, but it is preferable that the thermoplastic resin has a substantial softening point of 80 ° C. or lower. Examples of those having a softening point of 80 ° C. or lower include saponified products of ethylene and an acrylic ester copolymer, saponified products of styrene and a (meth) acrylic ester copolymer, vinyltoluene and (meth) acrylic. Preferable examples include saponified products of acid ester copolymers, poly (meth) acrylic acid esters, and saponified products of (meth) acrylic acid ester copolymers of butyl (meth) acrylate and vinyl acetate. "Plastic Performance Handbook" (edited by Japan Plastics Industry Federation, All Japan Plastics Molding Federation, published by Industrial Research Council, 196
Among the organic polymers having a softening point of about 80 ° C. or less described in October 25, 1996), alkali-soluble ones are also included. These may be used alone or in combination of two or more.

It should be noted that, as the substance having a substantial softening point of 80 ° C. or lower, even if the organic polymer substance itself has a softening point of 80 ° C. or higher, the It is also possible to add those having a substantial softening point of 80 ° C. or lower by adding various compatible plasticizers.

The plasticizer is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate and cresol. And diphenyl diphenyl phosphate, biphenyl diphenyl phosphate, and the like.

In the alkali-soluble thermoplastic resin layer,
In addition to the thermoplastic resin, various polymers, supercooling substances, adhesion improvers, and surfactants are used in order to adjust the adhesive force with the temporary support within a range where the softening point does not substantially exceed 80 ° C. , A release agent or the like can be added.

The thickness of the alkali-soluble thermoplastic resin layer is preferably 6 to 100 μm, more preferably 6 to 50 μm. When the thickness of the alkali-soluble thermoplastic resin layer is less than 6 μm, it becomes difficult to completely absorb the unevenness on the transfer target having a thickness of 1 μm or more, and to develop sufficient cushioning properties. , 100 μm, the developability and the suitability for production may be deteriorated, and both are not preferable.

—Temporary Support— The temporary support is preferably one that has a releasability from the alkali-soluble thermoplastic resin layer to such an extent that it does not hinder transfer, and is chemically and thermally It is preferably stable and flexible. The material for the temporary support is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include polytetrafluoroethylene, polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyethylene and polypropylene. . These may be used alone,
You may use 2 or more types together. The structure of the temporary support is not particularly limited and may be appropriately selected depending on the purpose. For example, the temporary support may have a single-layer structure or a laminated structure.

From the viewpoint of ensuring good releasability between the temporary support and the alkali-soluble thermoplastic resin layer, it is preferable not to perform surface treatment such as glow discharge. It is preferable not to provide an undercoat layer such as gelatin. The thickness of the temporary support is preferably about 5 to 300 μm, and more preferably 20 to 150 μm.

The temporary support is preferably provided with a conductive layer on at least one surface thereof,
Alternatively, it is preferable that the temporary support itself has conductivity. When the temporary support is designed in this way, the temporary support is peeled off after the photosensitive transfer material having the temporary support is brought into close contact with the transfer target. And the transfer-targeted body, etc. are not charged to attract dusts and the like from the surroundings, and as a result, dusts and the like do not adhere to the alkali-soluble thermoplastic resin layer even after the temporary support is peeled off. ,
It is possible to effectively prevent an unintended pinhole from being formed due to the formation of an extra unexposed portion in the subsequent exposure process. The surface electrical resistance on the surface of the conductive layer on the temporary support or the conductive temporary support is preferably 10 ¹³ Ω or less.

To make the temporary support having the conductivity,
A conductive substance may be contained in the temporary support. The conductive substance is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include metal oxides and antistatic agents.

Examples of the metal oxide include zinc oxide, titanium oxide, tin oxide, aluminum oxide, indium oxide, silicon oxide, magnesium oxide, barium oxide,
Examples thereof include molybdenum oxide. These may be used alone or in combination of two or more. Examples of the form of the metal oxide include crystalline fine particles and composite fine particles.

Examples of the antistatic agent include, for example, Electrostripper A (manufactured by Kao Corporation), Elenon No.
19 (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and other alkyl phosphate anionic surfactants, Amogen K (Dai-ichi Kogyo Seiyaku Co., Ltd.)
Betaine-based amphoteric surfactants such as, and nonionic surfactants such as Nissan Nonion L (manufactured by NOF CORPORATION), nonionic surfactants such as polyoxyethylene fatty acid ester, Emulgen 106, 1
20, 147, 420, 220, 905, 910 (manufactured by Kao Corporation) and Nissan Nonion E (manufactured by NOF Corporation)
Other nonionic interfaces such as polyoxyethylene alkyl ether-based nonionic surfactants, polyoxyethylene alkylphenol ether-based, polyhydric alcohol fatty acid ester-based, polyoxyethylene sorbitan fatty acid ester-based, polyoxyethylene alkylamine-based Activators may be mentioned. These may be used alone or in combination of two or more.

The conductive layer can be formed by appropriately selecting and using a known conductive substance, and examples of the conductive substance include ZnO and Ti.
O ₂ , SnO ₂ , Al ₂ O ₃ , In ₂ O ₃ , SiO ₂ ,
MgO, BaO, MoO _{3 and the} like are preferable in that a stable conductive effect can be obtained without being affected by the humidity environment. They are,
They may be used alone or in combination of two or more.

The volume resistance of the metal oxide or the conductive substance is preferably 10 ⁷ Ω · cm or less.
^It is more preferably ⁵ Ω · cm or less. The particle size of the metal oxide or the conductive substance is 0.01 to 0.7 μm.
Is preferable, and 0.02-0.5 μm is more preferable.

In the conductive layer, as a binder, for example, gelatin, cellulose nitrate, cellulose triacetate, cellulose diacetate, cellulose acetate butyrate, cellulose acetate propionate or other cellulose ester, vinylidene chloride, vinyl chloride, styrene. , Acrylonitrile, vinyl acetate, alkyl acrylates having 1 to 4 carbon atoms, homopolymers or copolymers containing vinylpyrrolidone, etc., soluble polyesters, polycarbonates, soluble polyamides, etc. can be used.

-Other Layers-The other layers are appropriately selected depending on the intended purpose without any limitation, but examples thereof include a cover film.

The cover film has a function of protecting the photosensitive transfer material from dirt and damage during storage and can be formed of the same or similar material as the temporary support. The cover film may be one that can be easily peeled off from the photosensitive resin layer, and preferred examples thereof include silicone paper, polyolefin sheet, and polytetrafluoroethylene sheet. Among these, a polyethylene sheet or film and a polypropylene sheet or film are preferable. The thickness of the cover film is preferably about 5 to 100 μm, more preferably 10 to 30 μm.

In the photosensitive transfer material of the present invention, the alkali-soluble thermoplastic resin layer is formed by applying the alkali-soluble thermoplastic resin layer coating liquid on the temporary support and drying the coating solution. On the thermoplastic resin layer, an intermediate layer is provided by applying and drying an intermediate layer coating solution using a solvent that does not dissolve the thermoplastic resin layer, and a solvent that does not dissolve the intermediate layer is formed on the intermediate layer. The photosensitive resin layer can be manufactured by applying the coating solution for the photosensitive resin layer used and drying the coating solution. Further, while the photosensitive resin layer is provided on the cover film, the alkali-soluble thermoplastic resin layer and the intermediate layer are provided on the temporary support.
It can be manufactured by laminating the intermediate layer and the photosensitive resin layer so that they are in contact with each other. Further, while the photosensitive resin layer and the intermediate layer are provided on the cover film, the alkali-soluble thermoplastic resin layer is provided on the temporary support, and the intermediate layer and the photosensitive resin layer are It can be manufactured by laminating them so that they are in contact with each other.

The photosensitive transfer material containing the resin composition for spacers of the present invention can be used particularly suitably for spacer formation, image formation and the like. In this case, the transfer target is a transparent substrate in a liquid crystal element. (Glass substrate), a substrate with a transparent conductive film (for example, ITO), a substrate with a color filter, and the like.

Here, an example of formation of a liquid crystal display element member or image formation using the photosensitive transfer material of the present invention will be described. After disposing the photosensitive transfer material on the transfer target, the cover film in the photosensitive transfer material is removed, and the photosensitive resin layer is attached onto the transfer target under pressure and heating. Incidentally, for this bonding, conventionally known laminator, vacuum laminator and the like can be preferably used, and in order to further increase the productivity,
An auto cut laminator can also be used.

Next, the temporary support is peeled from the alkali-soluble thermoplastic resin layer, and using a predetermined mask,
The photosensitive resin layer is exposed and developed through the alkali-soluble thermoplastic resin layer and the intermediate layer. At this time, when the photosensitive resin layer contains the colorant in a state where the coloring is not lost, an image is formed by the photosensitive resin layer.

Conventionally, when the temporary support is peeled from the alkali-soluble thermoplastic resin layer, the temporary support and the alkali-soluble thermoplastic resin layer cannot be peeled cleanly, Although there is a problem that peeling occurs between the photosensitive resin layer and the intermediate layer, the present invention effectively eliminates this problem. This improving effect is particularly large when the resin composition for spacers contained in the photosensitive resin layer contains the extender pigment.

The above-mentioned development can be carried out in accordance with a known alkali development method. For example, a solvent or an aqueous developer, particularly an alkaline aqueous solution (alkali developer) or the like is used to form the transferred material after exposure, By immersing the developer in a developing bath containing the developer or spraying the transferred material with a spray or the like, and further rubbing the surface with a rotating brush, a wet sponge, or the like while treating with ultrasonic waves. It can be carried out. Usually, the temperature of the development is preferably around room temperature to 40 ° C. Further, it is preferable to carry out a water washing treatment after the development.

The alkaline aqueous solution used for dissolving the photosensitive resin layer and the alkali-soluble thermoplastic resin layer at the time of development or removal of unnecessary portions after the exposure is, for example, a dilute aqueous solution of an alkaline substance. Is preferable, and a solvent containing a small amount of a water-miscible organic solvent is also preferable.

The alkaline substance is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, sodium carbonate and potassium carbonate. Alkali metal carbonates, sodium hydrogen carbonate, alkali metal bicarbonates such as potassium hydrogen carbonate, sodium silicate,
Alkali metal silicates such as potassium silicate, sodium metasilicate, alkali metal metasilicates such as potassium metasilicate, triethanolamine, diethanolamine, monoethanolamine, morpholine, tetraalkylammonium hydroxy such as tetramethylammonium hydroxide Examples thereof include sodium hydroxide and trisodium phosphate. These may be used alone by one kind,
You may use 2 or more types together.

As the alkaline aqueous solution, the concentration of the alkaline substance is preferably 0.01 to 30% by mass, and the pH is preferably 8 to 14.

As the water-miscible organic solvent,
It is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol. Mono-n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam,
Examples thereof include N-methylpyrrolidone. The amount of the water-miscible organic solvent added is preferably 0.1 to 30% by mass.

Various known surfactants can be added to the alkaline aqueous solution, and the amount of the surfactant added is preferably 0.01 to 10% by mass.

(Spacer) The spacer can be preferably formed by using the resin composition for a spacer of the present invention, and can be particularly preferably formed by using the photosensitive transfer material of the present invention. In the latter case, for example, after the photosensitive resin layer of the present invention is attached to the transfer target body, the temporary support is peeled off from the alkali-soluble thermoplastic resin layer. By exposing the photosensitive resin layer to the transferred material by means of the above-mentioned method, removing the non-exposed portion of the photosensitive resin layer with the alkaline aqueous solution, and curing and exposing only the exposed portion. it can.

(Liquid Crystal Display Element) The liquid crystal display element of the present invention is a liquid crystal display element in which liquid crystal is sealed between a pair of substrates arranged to face each other, in order to keep the thickness of the liquid crystal layer constant. The spacer pixel pattern (spacer dot) arranged on the substrate is formed from the resin composition for spacers of the present invention.

As the liquid crystal in the liquid crystal display element,
STN type, TN type, GH type, ECB type, ferroelectric liquid crystal,
Antiferroelectric liquid crystal, VA type, ASM type and various other types are suitable.

The basic constitutional aspects of the liquid crystal display element of the present invention include (1) thin film transistor (hereinafter referred to as "TFT").
Say. ) And other driving elements and pixel electrodes (conductive layers) are arranged side by side, and a color filter-side substrate provided with a color filter and a counter electrode (conductive layer) are arranged to face each other with a spacer interposed therebetween. Spacer in which a liquid crystal material is sealed in the gap, and (2) a color filter integrated type drive substrate in which a color filter is directly formed on the drive side substrate, and a counter substrate provided with a counter electrode (conductive layer). And the like, which are opposed to each other with a liquid crystal material interposed therebetween and a liquid crystal material is sealed in the gap. The liquid crystal display element of the present invention can be suitably used for various liquid crystal display devices.

[0088]

The present invention will be specifically described below with reference to examples and comparative examples, but the present invention is not limited to these examples. In the following, “part” means “part by mass”.

[Example 1] A thermoplastic resin layer coating solution H1 having the following composition was applied onto a temporary support made of a polyethylene terephthalate film having a thickness of 100 µm and dried to give a thermoplastic resin having a thickness of 20 µm. A resin layer was formed.

[0090] <Coating liquid H1 for thermoplastic resin layer>   Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate Rate / methacrylic acid copolymer (molar ratio) = 55 / 28.8 / 11.7 / 4.5 (Mass average molecular weight = 90,000) ... 15 parts   Polypropylene glycol diacrylate: 6.5 parts   (Mass average molecular weight = 822)   Tetraethylene glycol dimethacrylate: 1.5 parts   p-Toluenesulfonamide: 0.5 part   Benzophenone 1.0 part   Methyl ethyl ketone ... 30 parts

Next, an intermediate layer coating liquid B1 having the following composition is applied onto the thermoplastic resin layer and dried to obtain
An intermediate layer having a thickness of 1.6 μm was formed. <Coating liquid B1 for intermediate layer> Polyvinyl alcohol: 130 parts (PVA205 (saponification rate = 80%); Kuraray Co., Ltd.) Polyvinyl Pyrrolidone ・ ・ ・ ・ ・ ・ ・ ・ 60 parts (PVP, K-90; GAF Corporation) Fluorosurfactant ・ ・ ・10 parts (Surflon S-131 manufactured by Asahi Glass Co., Ltd.) Distilled water・ ・ ・ ・ ・ ・ ・ ・ 3350 copies

Further, a photosensitive resin layer having a thickness of 5.2 μm was formed by applying a coating solution for photosensitive resin layer having the following composition and drying. On the photosensitive resin layer, a cover film made of polypropylene (thickness: 12 μm) was attached by pressure bonding to prepare a photosensitive transfer material T1.

[0093] <Coating liquid for photosensitive resin layer>   Methacrylic acid / allyl methacrylate copolymer (molar ratio) = 20/80   (Mass average molecular weight = 40,000) ... 3.0 parts   Dipentaerythritol hexaacrylate: 1.8 parts   30 mass% methyl isobutyl ketone dispersion of silica sol ... 7.1 parts   (MIBK-ST, Nissan Chemical)   Phenothiazine: 0.001 part   2,4-bis- (trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethylamino) -3-Bromophenyl] -s-triazine: 0.19 parts   Victoria Pure Blue BOHM: 0.02 copy   Megafac F780F (made by Dainippon Ink) ...   Methyl ethyl ketone: 7.4 parts   1-Methoxy-2-propylacetate ... 8.6 parts   Methanol: 0.5 part

The cover film of the produced photosensitive transfer material T1 was peeled off, and this was lined on a glass plate sputtered with ITO using a laminator (apparatus name: VP-II, manufactured by Taisei Laminator Co., Ltd.). Pressure 100N / cm, 130
Lamination was performed at a conveying speed of 1 m / min under pressure heating conditions of ℃. Then, the temporary support made of polyethylene terephthalate film was peeled from the thermoplastic resin layer and removed. Next, 40m with an ultra-high pressure mercury lamp through a specified photomask.
After J / cm ² proximity exposure, the thermoplastic resin layer and the intermediate layer were dissolved and removed using a 1% triethanolamine aqueous solution. At this time, the photosensitive resin layer was not substantially developed.

Next, the photosensitive resin layer was developed using a 1% sodium carbonate aqueous solution, and the unnecessary portion was removed through a brushing step, followed by baking at 230 ° C. for 120 minutes, and the average size was 16 μm on each side of the color filter substrate. Columnar transparent spacer image pattern (spacer dots) with a height of about 4.5 μm
Was formed. The amount of plastic deformation of the obtained spacer image pattern was measured by the following method. The results are shown in Table 1.
Shown in.

<Measurement Method of Plastic Deformation Amount> For a single spacer of the spacer image pattern, a dynamic ultrafine hardness meter DUH-W201 manufactured by Shimadzu Corporation was used.
Cylindrical indenter of μmφ, load speed 0.145 gf / sec,
A compression test was performed under the conditions of a load of 1 gf, a holding time of 5 seconds, and a measurement temperature of 180 ° C.

Example 2 In Example 1, the methacrylic acid / allyl methacrylate copolymer ((molar ratio) 2
0/80, mass average molecular weight 40,000) was changed from 3.0 parts to 2.55 parts, and benzyl methacrylate / methacrylic acid copolymer ((molar ratio) = 78/22, mass average molecular weight = 40,000). Was added in the same manner as in Example 1 except that 0.45 parts of
The test was conducted in the same manner as. The results are shown in Table 1.

Example 3 In Example 2, a 30 mass% methyl isobutyl ketone dispersion of silica sol (MIB
K-ST, manufactured by Nissan Kagaku) from 7.1 parts to 8.8
A photosensitive transfer material T3 was prepared in the same manner as in Example 1 except that the parts were changed, and the same test as in Example 1 was performed. The results are shown in Table 1.

Example 4 In Example 2, a 30 mass% methyl isobutyl ketone dispersion of silica sol (MIB
K-ST, Nissan Chemical Co., Ltd.) addition amount from 7.1 parts to 1.2
A photosensitive transfer material T4 was prepared in the same manner as in Example 1 except that the parts were changed, and the same test as in Example 1 was performed. The results are shown in Table 1.

Comparative Example 1 In Example 2, a 30 mass% methyl isobutyl ketone dispersion of silica sol (MIB
A photosensitive transfer material T5 was prepared in the same manner as in Example 1 except that (K-ST, manufactured by Nissan Kagaku Co., Ltd.) was removed, and the same test as in Example 1 was conducted. The results are shown in Table 1.

Comparative Example 2 In Example 2, a 30 mass% methyl isobutyl ketone dispersion of silica sol (MIB
K-ST, manufactured by Nissan Kagaku Co., Ltd.) and the addition amount of dipentaerythritol hexaacrylate was changed from 1.8 parts to 1.6 parts.
A photosensitive transfer material T6 was prepared in the same manner as in Example 1 except that the parts were changed, and the same test as in Example 1 was performed. The results are shown in Table 1.

Comparative Example 3 In Example 2, a 30 mass% methyl isobutyl ketone dispersion of silica sol (MIB
K-ST, Nissan Chemical Co., Ltd.) addition amount from 7.1 parts to 10.7
Parts, and except that the addition amount of dipentaerythritol hexaacrylate was changed from 1.8 parts to 2.4 parts, a photosensitive transfer material T7 was prepared in the same manner as in Example 1 and was prepared in the same manner as in Example 1. The test was conducted. The results are shown in Table 1.

[Embodiment 5] Next, a chromium metal having a thickness of 0.1 μm is formed on a glass substrate of a predetermined size by sputtering, and etching is performed using a photoresist to form a lattice-shaped black matrix of a predetermined size and shape. Obtained.
After that, a transfer type color filter described in JP-A No. 11-64621 was used to form a pattern of predetermined sizes, shapes of red, green and blue. An acrylic resin-based protective layer was formed thereon by using a spin coater and flattened, and ITO was formed thereon as a transparent electrode.

The cover films of the photosensitive transfer materials T1 to T7 obtained in Examples 1 to 4 and Comparative Examples 1 to 3 were peeled off,
The photosensitive resin layer surface is placed on the glass substrate using a laminator (apparatus name: VP-II, manufactured by Taisei Laminator Co., Ltd.), linear pressure of 100 N / cm, pressure heating condition of 130 ° C., and conveyance speed of 1 m /. Pasted in minutes. Then, the temporary support was peeled off from the thermoplastic resin layer, and the temporary support was removed.

Then, a proximity exposure of 40 mJ / cm ² was performed with an ultra-high pressure mercury lamp through a predetermined photomask,
After that, the alkali-soluble thermoplastic resin layer and the intermediate layer were dissolved and removed using a 1% triethanolamine aqueous solution.
At this time, the photosensitive resin layer was not substantially developed. Then, the photosensitive resin layer is developed using a 1% sodium carbonate aqueous solution, and the unnecessary portion is removed through a brushing process.
After baking at 0 ° C. for 120 minutes, a columnar transparent spacer pixel pattern having a side of 16 μm and an average height of about 4.5 μm was formed on the color filter substrate.

An alignment film of polyimide is formed on the color filter having the obtained spacer pixel pattern,
After rubbing with a roll of nylon cloth, the electrode substrate facing the color filter side is sealed with a sealing material at 180 ° C., liquid crystal is injected, and color liquid crystal display elements L1 to L7 having a diagonal size of 26 cm. Was produced.

With respect to each of the obtained liquid crystal display devices, color unevenness occurring on the liquid crystal screen was visually observed, and the liquid crystal contamination property was evaluated according to the following criteria. The results are shown in Table 1. <Evaluation criteria> ◎: There is considerable color unevenness ○: There is slight color unevenness △ ×: There is some color unevenness ×: There is considerable color unevenness

[0108]

[Table 1] From the results of Table 1, Example 1 in which the plastic deformation amount (dot compression amount) of the spacer is in the range of 0.03 μm to 0.3 μm
Nos. 4 to 4 show no liquid crystal display unevenness as compared with Comparative Examples 1 to 3 in which the dot compression amount is outside the range, and it is recognized that a high quality image can be provided.

[0109]

According to the present invention, the spacer resin composition capable of defining the plastic deformation amount of the spacer at the sealing temperature at the time of producing the liquid crystal in an appropriate range and the target liquid crystal layer thickness are uniform. It is possible to provide a liquid crystal display element capable of displaying a high-quality image without liquid crystal display unevenness.

Claims (5)

[Claims] 1. A resin composition for a spacer for forming a spacer pixel pattern arranged on a substrate for keeping a thickness of a liquid crystal layer in a liquid crystal display device constant, wherein a single resin is used at a sealing temperature during liquid crystal production. The amount of plastic deformation for the spacer load of 1 gf is 0.03 μm to 0.3
A resin composition for a spacer, which has a thickness of μm. 2. The resin composition for spacers according to claim 1, which contains an extender pigment. 3. The resin composition for a spacer according to claim 1, wherein the content of the extender pigment is 1 to 50 mass% of the total solid content of the resin composition for the spacer. 4. A photosensitive resin layer of a photosensitive transfer material comprising an alkali-soluble thermoplastic resin layer, an intermediate layer and a photosensitive resin layer on a temporary support in this order. Item 1
4. The resin composition for spacers according to any one of 1 to 3. 5. In a liquid crystal display device in which liquid crystal is sealed between a pair of substrates arranged to face each other, a spacer pixel pattern arranged on the substrate to keep the thickness of the liquid crystal layer constant. Item 5. A liquid crystal display device, which is formed from the resin composition for a spacer according to any one of items 1 to 4.