KR100837010B1 - 경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 - Google Patents
경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 Download PDFInfo
- Publication number
- KR100837010B1 KR100837010B1 KR1020060107324A KR20060107324A KR100837010B1 KR 100837010 B1 KR100837010 B1 KR 100837010B1 KR 1020060107324 A KR1020060107324 A KR 1020060107324A KR 20060107324 A KR20060107324 A KR 20060107324A KR 100837010 B1 KR100837010 B1 KR 100837010B1
- Authority
- KR
- South Korea
- Prior art keywords
- film
- hard
- hard film
- equation
- unit layer
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
Claims (9)
- 삭제
- 삭제
- 제 1 단위 층 및 제 2 단위 층이 합계로 2층 이상 교대로 적층된 경질 피막으로서, 상기 제 1 단위 층이 하기 경질 피막 A1 및 경질 피막 A2 중 1종 이상을 포함하고; 상기 제 2 단위 층이 하기 경질 피막 B1, 경질 피막 B2 및 경질 피막 B3으로 이루어진 군으로부터 선택된 1종 이상을 포함하며,상기 제 1 단위 층의 두께가 200nm 이하이고, 상기 제 2 단위 층의 두께가 200nm 이하이며,상기 적층된 경질 피막이 전체적으로 제 1 항의 경질 피막의 조성을 만족하는 평균 조성을 갖는 경질 피막:경질 피막 A1: (Zr1-a, Hfa)(C1-xNx)를 포함하고 하기 수학식 1d 내지 3d를 만족하는 경질 피막수학식 1d수학식 2d수학식 3d(상기 식에서, a 및 x는 각각 하프늄(Hf) 및 질소(N)의 원자비이다),경질 피막 A2: (Zr1-a-c, Hfa, Dc)(C1-xNx)를 포함하고 하기 수학식 1b 내지 3b를 만족하는 경질 피막수학식 1b수학식 2b수학식 3b(상기 식에서, D는 규소(Si) 및 붕소(B) 중 1종 이상이고; a, c 및 x는 각각 Hf, D 및 N의 원자비이다),경질 피막 B1: M(C1-xNx)를 포함하고 하기 수학식 1e를 만족하는 경질 피막수학식 1e(상기 식에서, M은 텅스텐(W) 및 몰리브덴(Mo) 중 1종 이상이고, x는 질소(N)의 원자비이다),경질 피막 B2: Si1-y-xCyNx를 포함하고 하기 수학식 1f 내지 3f를 만족하는 경질 피막수학식 1f수학식 2f수학식 3f(상기 식에서, y 및 x는 탄소(C) 및 질소(N)의 원자비이다),경질 피막 B3: B1-y-xCyNx를 포함하고 하기 수학식 1g 내지 3g를 만족하는 경질 피막수학식 1g수학식 2g수학식 3g(상기 식에서, y 및 x는 각각 탄소(C) 및 질소(N)의 원자비이다).
- 삭제
- 제 1 단위 층 및 제 2 단위 층이 합계로 2층 이상 교대로 적층된 경질 피막으로서, 상기 제 1 단위 층이 경질 피막 A1 및 경질 피막 A2 중 1종 이상을 포함하고; 상기 제 2 단위 층이 경질 피막 B1, 경질 피막 B2 및 경질 피막 B3으로 이루어진 군으로부터 선택된 1종 이상을 포함하고,상기 제 1 단위 층의 두께가 200nm 이하이고, 제 2 단위 층의 두께가 200nm 이하이며,상기 경질 피막 A1, A2, B1, B2 및 B3은 제 5 항에 기재된 것과 동일한 조성 및 조건을 갖고,상기 적층된 경질 피막이 전체적으로, (Zr1-a-c, Hfa, Dc)(C1-xNx)를 포함하고 하기 수학식 1b 내지 3b를 만족하는 경질 피막:수학식 1b수학식 2b수학식 3b(상기 식에서, D는 규소(Si) 및 붕소(B) 중 1종 이상이고; a, c 및 x는 각각 Hf, D 및 N의 원자비이다).
- 삭제
- 제 1 항, 제 3 항, 제 5 항 또는 제 7 항 중 어느 한 항의 경질 피막과 동일한 금속 원소 조성을 포함하고, 상대 밀도가 91% 이상인, 경질 피막 형성용 스퍼터링 타겟재.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00319863 | 2005-11-02 | ||
JP2005319863A JP4824989B2 (ja) | 2005-11-02 | 2005-11-02 | 硬質皮膜 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070132505A Division KR100816175B1 (ko) | 2005-11-02 | 2007-12-17 | 경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 |
Publications (2)
Publication Number | Publication Date |
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KR20070047716A KR20070047716A (ko) | 2007-05-07 |
KR100837010B1 true KR100837010B1 (ko) | 2008-06-10 |
Family
ID=36955250
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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KR1020060107324A KR100837010B1 (ko) | 2005-11-02 | 2006-11-01 | 경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 |
KR1020070132505A KR100816175B1 (ko) | 2005-11-02 | 2007-12-17 | 경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020070132505A KR100816175B1 (ko) | 2005-11-02 | 2007-12-17 | 경질 피막 및 경질 피막 형성용 스퍼터링 타겟재 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7540912B2 (ko) |
EP (2) | EP1783244B1 (ko) |
JP (1) | JP4824989B2 (ko) |
KR (2) | KR100837010B1 (ko) |
AT (2) | ATE535628T1 (ko) |
DE (1) | DE602006006388D1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5096715B2 (ja) | 2006-09-21 | 2012-12-12 | 株式会社神戸製鋼所 | 硬質皮膜および硬質皮膜被覆工具 |
JP2008279562A (ja) * | 2007-05-11 | 2008-11-20 | Sumitomo Electric Ind Ltd | 表面被覆切削工具 |
US8080324B2 (en) * | 2007-12-03 | 2011-12-20 | Kobe Steel, Ltd. | Hard coating excellent in sliding property and method for forming same |
DE102010053751A1 (de) | 2010-10-28 | 2012-05-03 | Oerlikon Trading Ag, Trübbach | Molybdänmonoxidschichten und deren Herstellung mittels PVD |
TWI414614B (zh) * | 2010-12-06 | 2013-11-11 | Hon Hai Prec Ind Co Ltd | 鍍膜件及其製備方法 |
KR20140083020A (ko) * | 2011-10-25 | 2014-07-03 | 가부시키가이샤 아이에이치아이 | 피스톤 링 |
KR101753104B1 (ko) | 2015-09-18 | 2017-07-05 | 한국야금 주식회사 | 절삭공구용 경질피막 |
CN111041481A (zh) * | 2019-11-20 | 2020-04-21 | 中南大学 | 一种含梯度及纳米多层结构的涂层刀具及制备方法 |
CN113151781A (zh) * | 2021-03-23 | 2021-07-23 | 法德(浙江)机械科技有限公司 | 一种氮化钛铝型超硬涂层及其制备方法 |
Citations (1)
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JP2004042193A (ja) * | 2002-07-11 | 2004-02-12 | Sumitomo Electric Ind Ltd | 被覆切削工具 |
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SU1128618A1 (ru) * | 1982-10-10 | 1987-03-07 | Всесоюзный Научно-Исследовательский Инструментальный Институт | Материал износостойкого покрыти металлорежущего инструмента |
GB2137655A (en) * | 1983-04-05 | 1984-10-10 | Redler Conveyors Ltd | Kiln operation |
JPH02194159A (ja) | 1988-03-24 | 1990-07-31 | Kobe Steel Ltd | 耐摩耗性皮膜形成方法 |
JP3460288B2 (ja) * | 1994-01-21 | 2003-10-27 | 住友電気工業株式会社 | 耐摩耗性に優れた表面被覆部材 |
ATE206772T1 (de) * | 1995-08-19 | 2001-10-15 | Widia Gmbh | Verbundkörper und verfahren zu dessen herstellung |
SE519108C2 (sv) | 1999-05-06 | 2003-01-14 | Sandvik Ab | Belagt skärverktyg för bearbetning av grått gjutjärn |
JP3650543B2 (ja) * | 1999-07-01 | 2005-05-18 | 株式会社リンテック | 気化装置 |
TW512181B (en) | 2000-02-03 | 2002-12-01 | Cosmos Vacuum Technology Corp | A process for covering a film on the surface of the micro cutting router by coating super micro atomized multi-elements |
JP3871491B2 (ja) * | 2000-03-30 | 2007-01-24 | 環宇真空科技股▲フン▲有限公司 | 多元素被覆薄膜の製造方法 |
US7026057B2 (en) * | 2002-01-23 | 2006-04-11 | Moen Incorporated | Corrosion and abrasion resistant decorative coating |
JP4216518B2 (ja) * | 2002-03-29 | 2009-01-28 | 株式会社神戸製鋼所 | カソード放電型アークイオンプレーティング用ターゲットおよびその製造方法 |
JP4018480B2 (ja) | 2002-08-20 | 2007-12-05 | 住友電工ハードメタル株式会社 | 被覆硬質工具 |
JP4330859B2 (ja) | 2002-09-11 | 2009-09-16 | 株式会社タンガロイ | 被覆超硬合金およびその製造方法 |
CN1552941A (zh) | 2003-05-26 | 2004-12-08 | 环宇真空科技股份有限公司 | 微型切削工具之耐磨损镀膜工艺方法 |
JP4668214B2 (ja) | 2007-01-17 | 2011-04-13 | 株式会社神戸製鋼所 | 成形用金型 |
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2005
- 2005-11-02 JP JP2005319863A patent/JP4824989B2/ja not_active Expired - Fee Related
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2006
- 2006-07-03 US US11/428,491 patent/US7540912B2/en not_active Expired - Fee Related
- 2006-07-21 DE DE602006006388T patent/DE602006006388D1/de active Active
- 2006-07-21 AT AT07006865T patent/ATE535628T1/de active
- 2006-07-21 AT AT06015259T patent/ATE429526T1/de not_active IP Right Cessation
- 2006-07-21 EP EP06015259A patent/EP1783244B1/en not_active Not-in-force
- 2006-07-21 EP EP07006865A patent/EP1820877B1/en not_active Not-in-force
- 2006-11-01 KR KR1020060107324A patent/KR100837010B1/ko active IP Right Grant
-
2007
- 2007-12-17 KR KR1020070132505A patent/KR100816175B1/ko active IP Right Grant
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2009
- 2009-02-25 US US12/392,655 patent/US7648781B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004042193A (ja) * | 2002-07-11 | 2004-02-12 | Sumitomo Electric Ind Ltd | 被覆切削工具 |
Also Published As
Publication number | Publication date |
---|---|
US20070099028A1 (en) | 2007-05-03 |
EP1783244B1 (en) | 2009-04-22 |
EP1783244A1 (en) | 2007-05-09 |
JP4824989B2 (ja) | 2011-11-30 |
US7648781B2 (en) | 2010-01-19 |
ATE429526T1 (de) | 2009-05-15 |
EP1820877B1 (en) | 2011-11-30 |
ATE535628T1 (de) | 2011-12-15 |
JP2007126705A (ja) | 2007-05-24 |
DE602006006388D1 (de) | 2009-06-04 |
US7540912B2 (en) | 2009-06-02 |
EP1820877A1 (en) | 2007-08-22 |
KR100816175B1 (ko) | 2008-03-24 |
KR20070047716A (ko) | 2007-05-07 |
KR20080002729A (ko) | 2008-01-04 |
US20090169847A1 (en) | 2009-07-02 |
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