KR100835273B1 - 서비스 수명 검출 능력의 한계를 갖는 타겟을 이용하는방법 - Google Patents

서비스 수명 검출 능력의 한계를 갖는 타겟을 이용하는방법 Download PDF

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Publication number
KR100835273B1
KR100835273B1 KR1020060093549A KR20060093549A KR100835273B1 KR 100835273 B1 KR100835273 B1 KR 100835273B1 KR 1020060093549 A KR1020060093549 A KR 1020060093549A KR 20060093549 A KR20060093549 A KR 20060093549A KR 100835273 B1 KR100835273 B1 KR 100835273B1
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KR
South Korea
Prior art keywords
consumable material
alert
material slab
value
target
Prior art date
Application number
KR1020060093549A
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English (en)
Korean (ko)
Other versions
KR20070034969A (ko
Inventor
이-리 시아오
첸-후아 유
젠 왕
로렌스 쉬유
Original Assignee
타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/427,602 external-priority patent/US8795486B2/en
Priority claimed from US11/427,618 external-priority patent/US7891536B2/en
Application filed by 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 filed Critical 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드
Publication of KR20070034969A publication Critical patent/KR20070034969A/ko
Application granted granted Critical
Publication of KR100835273B1 publication Critical patent/KR100835273B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Safety Devices In Control Systems (AREA)
KR1020060093549A 2005-09-26 2006-09-26 서비스 수명 검출 능력의 한계를 갖는 타겟을 이용하는방법 KR100835273B1 (ko)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US72039005P 2005-09-26 2005-09-26
US60/720,390 2005-09-26
US72872405P 2005-10-20 2005-10-20
US60/728,724 2005-10-20
US73638905P 2005-11-14 2005-11-14
US60/736,389 2005-11-14
US11/427,618 2006-06-29
US11/427,602 2006-06-29
US11/427,602 US8795486B2 (en) 2005-09-26 2006-06-29 PVD target with end of service life detection capability
US11/427,618 US7891536B2 (en) 2005-09-26 2006-06-29 PVD target with end of service life detection capability

Publications (2)

Publication Number Publication Date
KR20070034969A KR20070034969A (ko) 2007-03-29
KR100835273B1 true KR100835273B1 (ko) 2008-06-05

Family

ID=37978210

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060093549A KR100835273B1 (ko) 2005-09-26 2006-09-26 서비스 수명 검출 능력의 한계를 갖는 타겟을 이용하는방법

Country Status (3)

Country Link
JP (2) JP4560500B2 (zh)
KR (1) KR100835273B1 (zh)
TW (1) TWI337301B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5350162B2 (ja) * 2009-09-30 2013-11-27 株式会社ダイヘン インピーダンス整合装置
US11754691B2 (en) 2019-09-27 2023-09-12 Taiwan Semiconductor Manufacturing Company Ltd. Target measurement device and method for measuring a target

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010071334A (ko) * 1998-05-27 2001-07-28 추후제출 탄탈륨 스퍼터링 및 그의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH669609A5 (zh) * 1986-12-23 1989-03-31 Balzers Hochvakuum
JPH08176808A (ja) * 1993-04-28 1996-07-09 Japan Energy Corp 寿命警報機能を備えたスパッタリングタ−ゲット
JP2003099114A (ja) * 2001-09-21 2003-04-04 Olympus Optical Co Ltd メンテナンス一括管理装置
JP2004299134A (ja) * 2003-03-28 2004-10-28 Toshiba Mach Co Ltd 射出成形機における材料供給装置及び射出成形機

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010071334A (ko) * 1998-05-27 2001-07-28 추후제출 탄탈륨 스퍼터링 및 그의 제조 방법

Also Published As

Publication number Publication date
JP4560500B2 (ja) 2010-10-13
JP2010248631A (ja) 2010-11-04
KR20070034969A (ko) 2007-03-29
JP2007092171A (ja) 2007-04-12
JP5258834B2 (ja) 2013-08-07
TWI337301B (en) 2011-02-11
TW200715078A (en) 2007-04-16

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