KR100786237B1 - 폴리올레핀 필름 상에 먼지의 퇴적을 감소시키는 방법 - Google Patents

폴리올레핀 필름 상에 먼지의 퇴적을 감소시키는 방법 Download PDF

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Publication number
KR100786237B1
KR100786237B1 KR1020010052472A KR20010052472A KR100786237B1 KR 100786237 B1 KR100786237 B1 KR 100786237B1 KR 1020010052472 A KR1020010052472 A KR 1020010052472A KR 20010052472 A KR20010052472 A KR 20010052472A KR 100786237 B1 KR100786237 B1 KR 100786237B1
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South Korea
Prior art keywords
tert
butyl
bis
hydroxy
film
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Expired - Fee Related
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KR1020010052472A
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English (en)
Korean (ko)
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KR20020018112A (ko
Inventor
렐리니콜라
에르겐크나디
Original Assignee
시바 스폐셜티 케미칼스 홀딩 인코포레이티드
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Publication of KR20020018112A publication Critical patent/KR20020018112A/ko
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Publication of KR100786237B1 publication Critical patent/KR100786237B1/ko
Anticipated expiration legal-status Critical
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04Homopolymers or copolymers of ethene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04Homopolymers or copolymers of ethene
    • C08L23/08Copolymers of ethene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/04Antistatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/12Polyester-amides

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
KR1020010052472A 2000-08-29 2001-08-29 폴리올레핀 필름 상에 먼지의 퇴적을 감소시키는 방법 Expired - Fee Related KR100786237B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00810777.3 2000-08-29
EP00810777 2000-08-29

Publications (2)

Publication Number Publication Date
KR20020018112A KR20020018112A (ko) 2002-03-07
KR100786237B1 true KR100786237B1 (ko) 2007-12-17

Family

ID=8174881

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010052472A Expired - Fee Related KR100786237B1 (ko) 2000-08-29 2001-08-29 폴리올레핀 필름 상에 먼지의 퇴적을 감소시키는 방법

Country Status (10)

Country Link
US (1) US6656981B2 (https=)
JP (1) JP2002121297A (https=)
KR (1) KR100786237B1 (https=)
CN (1) CN1220723C (https=)
AU (1) AU778860B2 (https=)
CA (1) CA2356023A1 (https=)
CO (1) CO5200803A1 (https=)
IL (1) IL145120A (https=)
MX (1) MXPA01008573A (https=)
SA (1) SA01220282B1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050244717A1 (en) * 2004-04-30 2005-11-03 Celgard Inc. Battery separator with antistatic properties
EP1600475A1 (en) * 2004-05-28 2005-11-30 Total Petrochemicals Research Feluy Use of Thermoplastic Composition Comprising Polyether-Block Copolyamides as Additive
JP4553194B2 (ja) * 2005-02-14 2010-09-29 三井・デュポンポリケミカル株式会社 積層体
EP1854609A1 (en) * 2006-05-09 2007-11-14 Total Petrochemicals Research Feluy Coloured rotomoulded articles
JP5242077B2 (ja) * 2007-04-27 2013-07-24 日東電工株式会社 粘着シート
CN101434739B (zh) * 2008-12-08 2011-12-14 苏州贤聚新材料科技有限公司 一种导电高分子树脂以及皮芯复合结构可染色抗静电纤维
JP2013505344A (ja) * 2009-09-23 2013-02-14 ビーエーエスエフ ソシエタス・ヨーロピア 相乗的帯電防止組成物
CN111748137B (zh) * 2019-03-26 2022-12-02 杭实科技发展(杭州)有限公司 一种耐低湿度的聚烯烃专用抗静电剂
JP2025085587A (ja) * 2023-11-24 2025-06-05 東武化学株式会社 壁紙、壁紙の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303489A2 (en) * 1987-08-13 1989-02-15 Toray Industries, Inc. Polyether-ester amide and permanently antistatic resin composition
EP0476895A2 (en) * 1990-09-07 1992-03-25 W.R. Grace & Co.-Conn. Inherently antistatic thermoplastic polyamide polyether films
US5965206A (en) * 1996-09-16 1999-10-12 Ciba Specialty Chemicals Corporation Antistatic composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5348804A (en) * 1990-06-01 1994-09-20 Salomon S.A. Ski structure obtained from a polyamide based thermoplastic elastomer and grafted copolyolefin based film adapted for adhesion
US5652326A (en) * 1993-03-03 1997-07-29 Sanyo Chemical Industries, Ltd. Polyetheresteramide and antistatic resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303489A2 (en) * 1987-08-13 1989-02-15 Toray Industries, Inc. Polyether-ester amide and permanently antistatic resin composition
EP0476895A2 (en) * 1990-09-07 1992-03-25 W.R. Grace & Co.-Conn. Inherently antistatic thermoplastic polyamide polyether films
US5965206A (en) * 1996-09-16 1999-10-12 Ciba Specialty Chemicals Corporation Antistatic composition

Also Published As

Publication number Publication date
IL145120A (en) 2005-12-18
KR20020018112A (ko) 2002-03-07
SA01220282B1 (ar) 2006-12-05
CO5200803A1 (es) 2002-09-27
MXPA01008573A (es) 2002-04-10
AU778860B2 (en) 2004-12-23
JP2002121297A (ja) 2002-04-23
CA2356023A1 (en) 2002-02-28
CN1220723C (zh) 2005-09-28
AU6547601A (en) 2002-03-07
US20020043178A1 (en) 2002-04-18
IL145120A0 (en) 2002-06-30
US6656981B2 (en) 2003-12-02
CN1340559A (zh) 2002-03-20

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