KR100767296B1 - 화학기상증착장치의 소스파우더 공급장치 - Google Patents
화학기상증착장치의 소스파우더 공급장치 Download PDFInfo
- Publication number
- KR100767296B1 KR100767296B1 KR1020060004388A KR20060004388A KR100767296B1 KR 100767296 B1 KR100767296 B1 KR 100767296B1 KR 1020060004388 A KR1020060004388 A KR 1020060004388A KR 20060004388 A KR20060004388 A KR 20060004388A KR 100767296 B1 KR100767296 B1 KR 100767296B1
- Authority
- KR
- South Korea
- Prior art keywords
- source powder
- evaporation
- source
- container
- powder
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
- 기판상으로 박막을 형성하는 화학기상증착을 위해 반응챔버에 소스가스공급장치와 가스배출장치가 구비되고, 이 소스가스공급장치의 증발용기에 고체인 소스파우더가 충진되는 화학기상증착장치의 소스가스공급장치에 있어서;증발용기(9) 상방으로 투입관(14)을 통해 연결된 호퍼형 저장용기(12)로부터 연속공급밸브(16)를 통해 공정처리가 중지된 상태이고 증발용기(9)에서 소스파우더의 소진에 의한 보충이 요구되는 충진시점에서 상기 소스 파우더가 저장용기(12)에서 증발용기(9)로 투입되어 충진이 수행되게, 상기 연속공급밸브(16)는 그 구동을 제어하는 컨트롤유니트(30)와 연결되며, 컨트롤유니트(30)에는 상기 충진시점을 감지하기 위한 소스파우더 소진감지부(32)와 공정처리를 감지하기 위한 공정상태 감지부(34)가 형성된 것을 특징으로 하는 화학기상증착장치의 소스가스공급장치.
- (삭제).
- (삭제).
- (삭제).
- 제 1 항에 있어서, 투입관(14)은 평면상 증발용기로의 균일한 충진높이를 조성시키기 위하여 증발용기(9)의 평면상 이를 단위면적으로 담당하는 구역으로 나누어 이 구역당 투출구로서 복수의 투입관(14)으로 분지되어 배치되고, 그 분지부에는 상기 복수의 투입관(14)으로 균등한 분배를 수행하기 위하여 깔대기 형상의 분배구(28)가 형성되어 이 분배구(28)의 투출구측으로 분지된 투입관(14)이 연결된 것을 특징으로 하는 화학기상증착장치의 소스가스공급장치.
- (삭제).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060004388A KR100767296B1 (ko) | 2006-01-16 | 2006-01-16 | 화학기상증착장치의 소스파우더 공급장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060004388A KR100767296B1 (ko) | 2006-01-16 | 2006-01-16 | 화학기상증착장치의 소스파우더 공급장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070075767A KR20070075767A (ko) | 2007-07-24 |
KR100767296B1 true KR100767296B1 (ko) | 2007-10-17 |
Family
ID=38500804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060004388A KR100767296B1 (ko) | 2006-01-16 | 2006-01-16 | 화학기상증착장치의 소스파우더 공급장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100767296B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101371596B1 (ko) * | 2011-10-19 | 2014-03-07 | 한국과학기술연구원 | 선형 증발원이 구비된 증착 장치 |
KR20140106044A (ko) * | 2013-02-25 | 2014-09-03 | 주식회사 선익시스템 | 증발원 및 증착장치 |
KR101507532B1 (ko) | 2012-12-28 | 2015-04-07 | 주식회사 선익시스템 | 진동기가 장착된 박막증착장치 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090059523A (ko) * | 2007-12-06 | 2009-06-11 | 주성엔지니어링(주) | 원료 공급 장치와 원료 공급 방법 및 박막 증착 장치 |
KR101217518B1 (ko) * | 2008-03-27 | 2013-01-02 | (주)에이디에스 | 증착 원료 공급 장치 및 이를 구비하는 박막 증착 장치 |
KR101463897B1 (ko) * | 2008-05-23 | 2014-11-21 | 주성엔지니어링(주) | 원료 공급 장치 및 이를 구비하는 박막 증착 장치 |
KR101287113B1 (ko) * | 2010-06-30 | 2013-07-17 | 삼성디스플레이 주식회사 | 증착 장치용 캐니스터 및 이를 이용한 증착 장치 |
KR101351437B1 (ko) * | 2012-07-12 | 2014-01-15 | (주)에이디에스 | 증착 원료 공급 장치 및 이를 구비하는 박막 증착 장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58126973A (ja) | 1982-01-22 | 1983-07-28 | Hitachi Ltd | 薄膜形成用ソ−ス供給装置 |
JPS5996258A (ja) | 1982-11-26 | 1984-06-02 | Hitachi Ltd | 気体化装置 |
JPH04369833A (ja) * | 1991-06-18 | 1992-12-22 | Matsushita Electric Ind Co Ltd | 薄膜製造方法及び薄膜製造装置 |
KR19990069345A (ko) * | 1998-02-06 | 1999-09-06 | 김명수 | 기상성장 탄소섬유의 연속 제조방법 및 그 장치 |
KR20020067317A (ko) * | 2001-02-16 | 2002-08-22 | 주식회사 에버테크 | 화학 기상 증착 장치 |
-
2006
- 2006-01-16 KR KR1020060004388A patent/KR100767296B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58126973A (ja) | 1982-01-22 | 1983-07-28 | Hitachi Ltd | 薄膜形成用ソ−ス供給装置 |
JPS5996258A (ja) | 1982-11-26 | 1984-06-02 | Hitachi Ltd | 気体化装置 |
JPH04369833A (ja) * | 1991-06-18 | 1992-12-22 | Matsushita Electric Ind Co Ltd | 薄膜製造方法及び薄膜製造装置 |
KR19990069345A (ko) * | 1998-02-06 | 1999-09-06 | 김명수 | 기상성장 탄소섬유의 연속 제조방법 및 그 장치 |
KR20020067317A (ko) * | 2001-02-16 | 2002-08-22 | 주식회사 에버테크 | 화학 기상 증착 장치 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101371596B1 (ko) * | 2011-10-19 | 2014-03-07 | 한국과학기술연구원 | 선형 증발원이 구비된 증착 장치 |
KR101507532B1 (ko) | 2012-12-28 | 2015-04-07 | 주식회사 선익시스템 | 진동기가 장착된 박막증착장치 |
KR20140106044A (ko) * | 2013-02-25 | 2014-09-03 | 주식회사 선익시스템 | 증발원 및 증착장치 |
KR102073733B1 (ko) | 2013-02-25 | 2020-02-05 | 주식회사 선익시스템 | 증발원 및 증착장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20070075767A (ko) | 2007-07-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100767296B1 (ko) | 화학기상증착장치의 소스파우더 공급장치 | |
US11430674B2 (en) | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods | |
JP4397188B2 (ja) | 気化液体反応物のパルス的供給の方法および装置 | |
JP5020407B2 (ja) | アンプルのための加熱式バルブマニホールド | |
KR101225541B1 (ko) | 막형성 장치 및 막형성 방법 | |
US20080305014A1 (en) | Substrate processing apparatus | |
JP2002060947A (ja) | 原子層のcvd | |
KR20080100793A (ko) | 실리콘 및 타이타늄 질화물의 인시츄 증착 | |
US20040182316A1 (en) | Processing equipment and processing method | |
JP5305328B2 (ja) | 基板処理装置 | |
EP2536868A1 (en) | Heating system for a vapor-phase deposition source | |
JP6647202B2 (ja) | 堆積アレンジメント、堆積装置、及びこれらの操作方法 | |
KR100531555B1 (ko) | 회전가능한 1개 이상의 가스분사기가 구비된 박막증착장치 및 이를 이용한 박막 증착방법 | |
JP2004115916A (ja) | 有機物気相蒸着装置及び有機物気相の蒸着方法 | |
WO2012168924A1 (en) | Supply apparatus and method of solid material gas | |
KR101936308B1 (ko) | 박막증착장치 | |
JP2011216848A (ja) | 半導体装置の製造方法及び基板の製造方法及び基板処理装置 | |
TW202129056A (zh) | 半導體處理裝置、形成經汽化反應物之裝置及方法 | |
CN221051986U (zh) | 一种反应源输送保温结构及镀膜设备 | |
US20240133033A1 (en) | Reactant delivery system and reactor system including same | |
KR101490438B1 (ko) | 증착장비의 기화기 | |
KR101249480B1 (ko) | 화학기상증착장치 및 이의 가스공급유닛 | |
JP2013222768A (ja) | 基板処理装置および半導体装置の製造方法 | |
KR0159632B1 (ko) | 분말형 기화소스용 화학기상증착장치 및 그 방법 | |
US20230175127A1 (en) | Remote solid source reactant delivery systems for vapor deposition reactors |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
G170 | Re-publication after modification of scope of protection [patent] | ||
FPAY | Annual fee payment |
Payment date: 20121009 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20131007 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20140926 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20151006 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20160926 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20170928 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20181011 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20190128 Year of fee payment: 13 |