KR100753868B1 - Compound plasma reactor - Google Patents

Abstract

A complex plasma reactor is provided to focus a magnetic flux more intensively by covering a RF antenna with a magnetic core. A vacuum chamber(100) has a substrate support, on which a substrate is put on the substrate support. A dielectric window(130) is installed on an upper portion of the vacuum chamber, and is provided at a center thereof with an opening. A gas shower head(140) is installed in the opening of the dielectric window. A RF antenna(151) is installed on an upper portion of the dielectric window around the gas shower head. A magnetic core(150) is installed on the dielectric window to cover the RF antenna. The gas shower head and the substrate support are capacitively coupled to plasma in the vacuum chamber, while the RF antenna is inductively coupled to the plasma.

Description

Compound Plasma Reactor {COMPOUND PLASMA REACTOR}

In order to more fully understand the drawings used in the detailed description of the invention, a brief description of each drawing is provided.

1 is a cross-sectional view of a hybrid plasma reactor according to a first embodiment of the present invention.

FIG. 2 is a view illustrating an arrangement structure of a radio frequency antenna and a gas shower head installed on the plasma reactor of FIG. 1.

FIG. 3 is a view showing the magnetic flux induced inside the vacuum chamber through the dielectric window by the wireless antenna and the magnetic core.

4 is a diagram illustrating an electrical connection structure between a radio frequency antenna and a gas shower head.

5A to 5D illustrate various examples of modifications of an electrical connection structure between a radio frequency antenna and a gas shower head.

6 is a diagram illustrating an example in which a dual power supply structure by power division is adopted.

7 is a diagram illustrating an example in which a dual power supply structure using two power sources is adopted.

8A and 8B are diagrams illustrating a power control unit configured between a radio frequency antenna and ground.

9A is a cross-sectional view of a plasma reactor showing an example employing a plate-shaped magnetic core.

9B is an exploded perspective view of the plate-shaped magnetic core, the radio frequency antenna and the shower head.

10 is a cross-sectional view of a plasma reactor according to a second embodiment of the present invention.

FIG. 11 is a view illustrating an arrangement structure of a radio frequency antenna and a gas shower head installed on the plasma reactor of FIG. 10.

12 is a sectional view of a plasma reactor showing an example using a plate-shaped magnetic core.

FIG. 13 is a diagram illustrating an example in which a cylindrical radio frequency antenna and a magnetic core are also installed in the outer sidewall portion of the vacuum chamber.

* Description of the symbols for the main parts of the drawings *

100: vacuum chamber 110; Lower body

111: substrate support 112: substrate to be processed

113: vacuum pump 120: top cover

121: gas inlet 123: upper space

130: dielectric window 132: dielectric wall

140: gas shower head 150: magnetic core

151: radio frequency antenna 152: magnetic flux gateway

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a radio frequency plasma reactor, and in particular, has a complex plasma generating structure for generating inductively and capacitively coupled plasma by radio frequency. The present invention relates to a combined plasma reactor.

Plasma is a highly ionized gas containing the same number of positive ions and electrons. Plasma discharges are used for gas excitation to generate active gases containing ions, free radicals, atoms, molecules. The active gas is widely used in various fields and is typically used in a variety of semiconductor manufacturing processes such as etching, deposition, cleaning, ashing, and the like.

There are a number of plasma sources for generating plasma, and the representative examples are capacitive coupled plasma and inductive coupled plasma using radio frequency.

Capacitively coupled plasma sources have the advantage of high process productivity compared to other plasma sources due to their high capacity for precise capacitive coupling and ion control. On the other hand, since the energy of the radio frequency power supply is almost exclusively connected to the plasma through capacitive coupling, the plasma ion density can only be increased or decreased by increasing or decreasing the capacitively coupled radio frequency power. However, increasing radio frequency power increases ion bombardment energy. As a result, in order to prevent damage due to ion bombardment, radio frequency power is limited.

On the other hand, the inductively coupled plasma source can easily increase the ion density with the increase of the radio frequency power source, the ion bombardment is relatively low, it is known to be suitable for obtaining a high density plasma. Therefore, inductively coupled plasma sources are commonly used to obtain high density plasma. Inductively coupled plasma sources are typically developed using a radio frequency antenna (RF antenna) and a transformer (also called transformer coupled plasma). The development of technology to improve the characteristics of plasma, and to increase the reproducibility and control ability by adding an electromagnet or a permanent magnet or adding a capacitive coupling electrode.

As the radio frequency antenna, a spiral type antenna or a cylinder type antenna is generally used. The radio frequency antenna is disposed outside the plasma reactor and transmits induced electromotive force into the plasma reactor through a dielectric window such as quartz. Inductively coupled plasma using a radio frequency antenna can obtain a high density plasma relatively easily, but the plasma uniformity is affected by the structural characteristics of the antenna. Therefore, efforts have been made to improve the structure of the radio frequency antenna to obtain a uniform high density plasma.

However, in order to obtain a large plasma, it is limited to widen the structure of the antenna or increase the power supplied to the antenna. For example, it is known that a non-uniform plasma is generated in the radiographic state by a standing wave effect. In addition, when high power is applied to the antenna, the capacitive coupling of the radio frequency antenna increases, so that the dielectric window must be thickened, thereby increasing the distance between the radio frequency antenna and the plasma, thereby lowering power transmission efficiency. Losing problems occur.

In the recent semiconductor manufacturing industry, plasma processing technology has been further improved due to various factors such as ultra-miniaturization of semiconductor devices, the enlargement of silicon wafer substrates for manufacturing semiconductor circuits, the enlargement of glass substrates for manufacturing liquid crystal displays, and the emergence of new target materials. This is required. In particular, there is a need for improved plasma sources and plasma processing techniques that have good processing capabilities for large area workpieces.

Accordingly, the present invention has been made to solve the above-mentioned problems, and its object is to adopt both the advantages of inductively coupled plasma and capacitively coupled plasma, and to improve the flux transfer efficiency of the antenna, thereby providing high uniformity and more control over plasma ion energy. It is to provide a composite plasma reactor capable of generating a large area of high density plasma.

One aspect of the present invention for achieving the above technical problem relates to a complex plasma reactor. The hybrid plasma reactor of the present invention comprises: a vacuum chamber having a substrate support on which a substrate to be processed is placed; A dielectric window installed at an upper portion of the vacuum chamber and having an opening at a central portion thereof; A gas shower head installed in the opening of the dielectric window; A radio frequency antenna installed above the gas shower head above the dielectric window; And a magnetic core installed on top of the dielectric window to cover the radio frequency antenna, wherein the gas shower head and substrate support are capacitively coupled to the plasma inside the vacuum chamber, and the radio frequency antenna is connected to the plasma inside the vacuum chamber. Inductively coupled.

In this embodiment, the magnetic core is installed such that its vertical cross-sectional structure has a horseshoe shape and is covered along the radio frequency antenna with the magnetic flux entrance of the magnetic core facing the dielectric window.

In this embodiment, the magnetic core comprises: a flat body having an opening corresponding to the dielectric window and covering the entire top of the dielectric window; And an antenna mounting groove formed in a bottom surface of the flat body along an area where the radio frequency antenna is located.

In this embodiment, a Faraday shield is provided between the radio frequency antenna and the dielectric window.

In this embodiment, a first power supply connected to a radio frequency antenna for supplying a radio frequency; And a second power source for supplying radio frequencies to the substrate support.

In this embodiment, a third power supply source for supplying a radio frequency of a frequency different from that of the second power supply source to the substrate support is included.

In this embodiment, a first power supply for supplying a radio frequency; And a power divider that divides the radio frequency power provided from the first power supply and divides and supplies the radio frequency power to the radio frequency antenna and the substrate support.

In this embodiment, the substrate support includes a second power supply for supplying a radio frequency of a frequency different from the radio frequency of the first power supply.

In this embodiment, a power regulator is connected to at least one between the radio frequency antenna and ground or between the gas shower head and ground.

In this embodiment, the radio frequency antenna and the gas shower head are connected in series between a first power source and ground, wherein either end of the radio frequency antenna is connected to ground or the gas shower head is connected to ground. Connected with branches.

In this embodiment, a power regulator is connected between at least one of the radio frequency antenna and ground or between the gas shower head and ground.

In this embodiment, the radio frequency antenna has two or more separate structures, and the two or more separate radio frequency antennas and the gas shower head are connected in series between the first power source and the ground, and any two separate A gas shower head is connected between the radio frequency antennas.

In this embodiment, a power regulator is connected between at least one of the radio frequency antenna and ground or between the gas shower head and ground.

In this embodiment, the dielectric window, the radio frequency antenna, and the magnetic core are installed inside the vacuum chamber and include an upper cover covering the top of the vacuum chamber.

Following this embodiment, the dielectric window serves as the top cover of the vacuum chamber and includes a cover member that entirely covers the radio frequency antenna and the magnetic core on top of the dielectric window.

In this embodiment, a dielectric wall is installed along the inner wall of the vacuum chamber.

In this embodiment, the gas shower head comprises a silicon plate on the side that abuts the interior region of the vacuum chamber.

The embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Accordingly, the shape of the elements in the drawings and the like are exaggerated to emphasize a clearer description. In understanding the drawings, it should be noted that like parts are intended to be represented by the same reference numerals as much as possible. And detailed description of known functions and configurations that are determined to unnecessarily obscure the subject matter of the present invention is omitted.

(Example)

Hereinafter, with reference to the accompanying drawings by describing a preferred embodiment of the present invention, the hybrid plasma reactor of the present invention will be described in detail. In addition, in the drawings, the same reference numerals are denoted together for components that perform the same function.

1 is a cross-sectional view of a hybrid plasma reactor according to a first embodiment of the present invention. Referring to FIG. 1, the hybrid plasma reactor includes a vacuum chamber 100 including a lower body 110 and an upper cover 120. The substrate support 111 on which the substrate to be processed 112 is placed is provided in the vacuum chamber 100. The lower body 110 is provided with a gas outlet 113 for gas exhaust, the gas outlet 113 is connected to the vacuum pump 115. The substrate 112 to be processed is, for example, a silicon wafer substrate for producing a semiconductor device or a glass substrate for producing a liquid crystal display or a plasma display.

The lower body 110 is made of a metallic material such as aluminum, stainless steel, or copper. Or coated metal, for example anodized aluminum or nickel plated aluminum. Or refractory metal. Alternatively, it is possible to rewrite the lower body 110 entirely with an electrically insulating material such as quartz, ceramic, or other materials suitable for the intended plasma process to be performed. The upper cover 120 and the lower body 110 may be made of the same material or different materials.

The inner side of the vacuum chamber 100 is provided with a dielectric window 130 having a central opening. The gas shower head 140 is installed in the opening of the dielectric window 130. The gas shower head 140 includes at least one gas distribution plate 145 and is made of a conductive material. The gas shower head 140 may be provided with a silicon flat plate 146 having a plurality of gas injection holes formed at portions in contact with the inner region of the vacuum chamber 100. The gas inlet 121 connected to the gas shower head 140 is installed at the center of the upper cover 120. The radio frequency antenna 151 is installed in the upper space 123 between the upper cover 120 and the dielectric window 130.

A dielectric wall 132 may optionally be installed along the inner wall of the vacuum chamber 100. Dielectric wall 132 and dielectric window 130 preferably have an integral structure. However, they can be configured as separate structures. The dielectric wall 132 is installed to a portion slightly lower than the substrate support 111 as a whole to prevent the lower body 110 from being damaged or contaminated during the process. Dielectric window 130 and dielectric wall 132 are comprised of an insulating material, such as, for example, quartz or ceramic.

The dielectric window 130 may have a structure spanning between the upper cover 120 and the lower body 110, and each bonding surface is provided with O-rings 114 and 122, respectively, for vacuum insulation. In addition, O-rings 125 and 124 for vacuum insulation are installed on the joint surface of the dielectric window 130 and the shower head 140 and the joint surface of the shower head 140 and the upper cover 120, respectively.

FIG. 2 is a diagram illustrating an arrangement structure of a radio frequency antenna and a gas shower head installed in an upper portion of the plasma reactor of FIG. 1, and FIG. 3 illustrates a magnetic field induced inside a vacuum chamber through a dielectric window by a radio antenna and a magnetic core. It is a view showing visually. Referring to FIG. 2, the radio frequency antenna 151 is installed in a flat spiral structure around the gas shower head 140, and the radio frequency antenna 151 is covered by the magnetic core 150. The magnetic core 150 has a vertical cross-sectional structure having a horseshoe shape and is installed so that the magnetic flux entrance and exit 152 faces the dielectric window 130 so as to be covered along the radio frequency antenna 151. 3, the magnetic flux generated by the wireless antenna 151 is focused by the magnetic core 150 and guided into the vacuum chamber 100 through the dielectric window 130. Magnetic core 150 is made of ferrite material, but may be made of other alternative materials. The magnetic core 150 may be configured by assembling a plurality of pieces of horseshoe-shaped ferrite cores. Alternatively, any ferrite core having a vertical cross-sectional structure having a horseshoe shape and having a flat spiral wound structure may be used.

A Faraday shield 142 is provided between the dielectric window 130 and the radio frequency antenna 151. The Faraday shield 142 may or may not be installed in an optional configuration. The Faraday shield 142 may or may not have an electrical connection with the gas shower head 140.

Again, referring to FIG. 1, one end of the radio frequency antenna 151 is electrically connected to the first power supply 160 supplying the radio frequency through the impedance matcher 161 and the other end is grounded. The radio frequency antenna 151 is inductively coupled to the internal plasma of the vacuum chamber. The substrate support 111 is electrically connected to the second power supply 162 supplying the radio frequency through the impedance matcher 163 and the gas shower head 140 is grounded. The gas shower head 140 and the substrate support 111 constitute a pair of capacitive electrodes and are capacitively coupled to the plasma inside the vacuum chamber 100. The first and second power sources 160 and 162 may be configured using a radio frequency power source capable of controlling the output voltage without a separate impedance matcher. The phase relationship between the radio frequency signal for capacitive coupling and the radio frequency signal for inductive coupling has an appropriate relationship, for example, a phase relationship of about 180 degrees.

In the hybrid plasma reactor according to the first embodiment of the present invention, the gas shower head 140 and the substrate support 111 are capacitively coupled to the plasma inside the vacuum chamber 100, and the radio frequency antenna 151 ) Is inductively coupled to the plasma inside the vacuum chamber 100. In general, inductively coupled plasma sources using radio frequency antennas are affected by plasma density and uniformity depending on the shape of the radio frequency antenna. In this regard, the plasma reactor of the present invention includes a gas shower head 140 that is capacitively coupled to the central portion, and has a radio frequency antenna 151 arranged in a spiral shape around the plate, thereby making it more uniform in the vacuum chamber. A plasma can be obtained. In particular, the radio frequency antenna 151 is covered by the magnetic core 150 so that the magnetic flux is concentrated more strongly, and the loss of the magnetic flux can be reduced as much as possible.

This capacitive and inductive coupling facilitates the precise control of plasma generation and plasma ion energy in the vacuum chamber 100. This maximizes process productivity. In addition, since the gas shower head 140 is positioned above the substrate support 111, uniform gas injection may be performed on the substrate 112 to be processed to further improve uniform substrate processing.

4 is a diagram illustrating an electrical connection structure between a radio frequency antenna and a gas shower head. Referring to FIG. 4, the radio frequency antenna 151 and the gas shower head 140 may be electrically connected in series. That is, one end of the radio frequency antenna 151 is connected to the first power supply 160 through the impedance matcher 161, and the other end is connected to the gas shower head 140. And the gas shower head 140 is grounded. The electrical connection relationship between the gas shower head 140 and the radio frequency antenna 151 may be variously modified as follows.

5A to 5D illustrate various examples of modifications of an electrical connection structure between a radio frequency antenna and a gas shower head. 5A to 5D show the electrical connection relationship between the radio frequency antenna 151 and the gas shower head 140 and the electrical connection structure, and the diagram shown as (b) shows the electrical connection. The connection relationship is shown by a symbol.

The method of connecting the gas shower head 140 and the radio frequency antenna 151 illustrated in FIG. 5A is described with reference to FIG. 4. One end of the radio frequency antenna 151 is electrically connected to the first power supply 160 through an impedance matcher 161, and the other end is electrically connected to the gas shower head 140. The gas shower head 140 is grounded.

In the method of connecting the gas shower head 140 and the radio frequency antenna 151 illustrated in FIG. 5B, the gas shower head 140 is first electrically connected to the first power source 160, and then the radio frequency antenna 161 is connected. Is connected to the gas shower head 140 and grounded.

The connection method of the gas shower head 140 and the radio frequency antenna 151 illustrated in FIGS. 5C and 5D comprises the radio frequency antenna 151 as two separate antennas 151a and 151b and a gas shower therebetween. The head 140 is electrically connected. However, in FIG. 5C, the radio frequency antenna 151 has an arrangement structure in which two separate antennas 151a and 151b are wound in the same winding direction but positioned outside and located inside.

In the radio frequency antenna 151 illustrated in FIG. 5D, two separate antennas 151a and 151b are wound in a flat spiral around the gas shower head 140 in parallel. The outer end of one antenna 151a located at the outer side is connected to the first power supply 160 through an impedance matcher 161, and the other end is connected to the gas shower head 140. The other antenna 151b located inside the inner end is connected to the gas shower head 140, the outer end is grounded.

5A to 5D, the electrical connection between the gas shower head 140 and the radio frequency antenna 161 may have various electrical connection methods in addition to those illustrated. In addition, a power supply method of the radio frequency antenna 161 and the substrate support 111 may be adopted as described below. In addition, the number of power supplies for supplying a radio frequency may be variously modified.

6 is a diagram illustrating an example in which a dual power supply structure by power division is adopted. Referring to FIG. 6, the radio frequency supplied from the first power source 160 is distributed through the power distribution unit 164 to divide and supply the divided power supply structure to the radio frequency antenna 151 and the substrate support 111. Can be employed. The power distribution unit 164 may divide power by various methods, for example, power division using a transformer, power division using a plurality of resistors, and power division using a capacitor. The substrate support 111 is provided with a radio frequency divided from the first power source 160 and a radio frequency provided from the second power source 162, respectively. Here is the radio frequency of the different frequencies provided by the first and second power supply (160, 162).

7 is a diagram illustrating an example in which a dual power supply structure using two power sources is adopted. Referring to FIG. 7, the substrate support 111 may be provided with two radio frequencies through two power sources 162a and 162b providing different frequencies.

As such, when the substrate support 111 is provided with radio frequencies having different frequencies, various power supply structures may be adopted, such as a power split structure or an independent separate power source. The dual power supply structure of the substrate support 111 further facilitates plasma generation inside the vacuum chamber 100, further improves plasma ion energy control on the surface of the substrate 112, and further improves process productivity. You can.

The single or dual power supply structure of the substrate support 111 is mixed with the various electrical connection methods of the radio frequency antenna 151 and the gas shower head 140 described with reference to FIGS. Can be implemented.

8A and 8B are diagrams illustrating a power control unit configured between a radio frequency antenna and ground. 8A and 8B, a power control unit 170 may be configured between the radio frequency antenna 151 and the ground. The power controller 170 may be configured of, for example, a variable capacitor 171a or a variable inductor 171b. The inductive coupling energy of the radio frequency antenna 151 may be adjusted according to the variable capacitance control of the power adjusting unit 170. The power control unit 170 may be configured between the gas shower head 140 and the ground to adjust the capacitive coupling energy.

The power control unit 170 may be mixed with various power connection structures of the above-described various types of power supply structures and the gas shower head 140 and the radio frequency antenna 161 to implement more various electrical connection methods.

9A is a cross-sectional view of a plasma reactor showing an example employing a plate-shaped magnetic core, and FIG. 9B is an exploded perspective view of the plate-shaped magnetic core, the radio frequency antenna, and the shower head. 9A and 9B, a plate-shaped magnetic core 190 may alternatively be used to cover the radio frequency antenna 151. The plate-shaped magnetic core 190 has an opening 191 corresponding to the entire window 130 and has a flat body 192 covering the entire upper portion of the dielectric window 130. An antenna mounting groove 193 is formed at a bottom of the flat body 192 along an area where the radio frequency antenna 151 is located. The radio frequency antenna 151 is provided along the antenna mounting groove 193 and is entirely covered by the plate-shaped magnetic core 190. Such a plate-shaped magnetic core 190 may be used as an alternative embodiment of the magnetic core 150 of the horseshoe shape described above.

FIG. 10 is a cross-sectional view of a plasma reactor according to a second embodiment of the present invention, and FIG. 11 is a view illustrating an arrangement structure of a radio frequency antenna and a gas shower head installed on the plasma reactor of FIG. 10. 10 and 11, the plasma reactor of the second embodiment of the present invention basically has the same configuration as the first embodiment described above. Therefore, repeated description of the same configuration is omitted.

However, in the plasma reactor according to the second embodiment, the structure of the vacuum chamber 100a is slightly different from the vacuum chamber 100 of the first embodiment described above. In the vacuum chamber 100a of the plasma reactor of the second embodiment, the dielectric window 130 formed on the upper portion of the lower body 110 serves as the upper cover. The upper portion of the dielectric window 130 includes a cover member 126 covering the radio frequency antenna 151 and the magnetic core 150 as a whole. Cover member 126 may be constructed of a conductive or nonconductive material. The shower head 140 has a structure that protrudes to the substrate support 111 lower than the dielectric window 130.

12 is a sectional view of a plasma reactor showing an example using a plate-shaped magnetic core. Referring to FIG. 12, the plate-shaped magnetic core 190 may be used to cover the radio frequency antenna 151 as described in the first embodiment.

FIG. 13 is a diagram illustrating an example in which a cylindrical radio frequency antenna and a magnetic core are also installed in the outer sidewall portion of the vacuum chamber. Referring to FIG. 13, the radio frequency antenna 151 has a flat spiral structure and is installed on an upper portion of the dielectric window 130, and may be installed in a cylinder structure on an outer sidewall portion of the vacuum chamber 100 in an extended structure. . The dielectric window 130 has a structure suitable for this, and the magnetic core 150 is also installed in the same manner. In addition, the cover member also has a structure extended to cover the radio frequency antenna 151 and the magnetic core 150 provided in the side wall portion.

The hybrid plasma reactor according to the present invention may be variously modified and may take various forms. It is to be understood, however, that the present invention is not limited to the specific forms referred to in the above description, but rather includes all modifications, equivalents and substitutions within the spirit and scope of the invention as defined by the appended claims. It should be understood to do.

According to the hybrid plasma reactor of the present invention as described above, the gas shower head 140 and the substrate support 111 is capacitively coupled to the plasma inside the vacuum chamber 100, the radio frequency antenna 151 is Inductively coupled to the plasma inside the vacuum chamber 100. In particular, the radio frequency antenna 151 is covered by the magnetic core 150 so that the magnetic flux is concentrated more strongly, and the loss of the magnetic flux can be reduced as much as possible. This capacitive and inductive coupling facilitates the precise control of plasma generation and plasma ion energy in the vacuum chamber 100. This maximizes process productivity. In addition, since the gas shower head 140 is positioned above the substrate support 111, uniform gas injection may be performed on the substrate 112 to be processed to further improve uniform substrate processing.

Claims (17)

A vacuum chamber having a substrate support on which a substrate to be processed is placed; A dielectric window installed at an upper portion of the vacuum chamber and having an opening at a central portion thereof; A gas shower head installed in the opening of the dielectric window; A radio frequency antenna installed above the gas shower head above the dielectric window; And A magnetic core installed on top of the dielectric window to cover the radio frequency antenna, The gas shower head and the substrate support are capacitively coupled to the plasma inside the vacuum chamber, and the radio frequency antenna is inductively coupled to the plasma inside the vacuum chamber. The hybrid plasma reactor of claim 1, wherein the magnetic core has a vertical cross-sectional structure having a horseshoe shape and is installed such that the magnetic flux entrance of the magnetic core faces the dielectric window and is covered along the radio frequency antenna. The magnetic core of claim 1, further comprising: a flat body having an opening corresponding to the dielectric window and covering the top of the dielectric window; And an antenna mounting groove formed in a bottom surface of the flat body along an area where the radio frequency antenna is located. The hybrid plasma reactor of claim 1, comprising a faraday shield installed between the radio frequency antenna and the dielectric window. 2. The apparatus of claim 1, further comprising: a first power supply connected to a radio frequency antenna to supply radio frequency; And A hybrid plasma reactor comprising a second power source for supplying radio frequency to a substrate support. 6. The hybrid plasma reactor of claim 5, comprising a third power source for supplying a substrate support with a radio frequency of a frequency different from that of the second power source. 2. The apparatus of claim 1, further comprising: a first power supply for supplying a radio frequency; And And a power divider for dividing and supplying radio frequency power provided from a first power supply to a radio frequency antenna and a substrate support. 8. The hybrid plasma reactor of Claim 7, comprising a second power supply for supplying a radio frequency of a frequency different from the radio frequency of the first power supply as the substrate support. 9. A hybrid plasma reactor according to any one of claims 5 to 8, comprising a power regulator connected between at least one of the radio frequency antenna and ground or between the gas shower head and ground. The radio frequency antenna and the gas shower head of claim 5, wherein the radio frequency antenna and the gas shower head are connected in series between the first power source and the ground, A hybrid plasma reactor, wherein one end of the radio frequency antenna is connected to ground or the gas shower head is connected to ground. 11. The hybrid plasma reactor of claim 10, comprising a power regulator coupled to at least one of between a radio frequency antenna and ground or between a gas shower head and ground. The radio frequency antenna according to any one of claims 5 to 8, wherein the radio frequency antenna has two or more separate structures, and the two or more separate radio frequency antennas and the gas shower head are connected in series between the first power source and the ground. Connected, A hybrid plasma reactor in which a gas shower head is connected between any two separate radio frequency antennas. 13. The hybrid plasma reactor of Claim 12, comprising a power regulator coupled to at least one of a radio frequency antenna and ground or between a gas shower head and ground. The hybrid plasma reactor of claim 1, wherein the dielectric window, the radio frequency antenna, and the magnetic core are installed inside the vacuum chamber and include an upper cover covering the top of the vacuum chamber. 2. The hybrid plasma reactor of claim 1, wherein the dielectric window comprises a cover member that functions as a top cover of the vacuum chamber and covers the radio frequency antenna and the magnetic core entirely on top of the dielectric window. The hybrid plasma reactor of claim 1, further comprising a dielectric wall disposed along an inner wall of the vacuum chamber. The hybrid plasma reactor of Claim 1, wherein the gas shower head comprises a silicon plate on a surface in contact with an interior region of the vacuum chamber.

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