KR100731833B1 - 실리콘 단결정 인상용 석영 그라스 도가니 - Google Patents
실리콘 단결정 인상용 석영 그라스 도가니 Download PDFInfo
- Publication number
- KR100731833B1 KR100731833B1 KR1020057012775A KR20057012775A KR100731833B1 KR 100731833 B1 KR100731833 B1 KR 100731833B1 KR 1020057012775 A KR1020057012775 A KR 1020057012775A KR 20057012775 A KR20057012775 A KR 20057012775A KR 100731833 B1 KR100731833 B1 KR 100731833B1
- Authority
- KR
- South Korea
- Prior art keywords
- quartz glass
- single crystal
- concentration
- crucible
- glass crucible
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/08—Quartz
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
상기 0.5-1H의 평균두께 TA3에 있어서 0-0.9mm은 합성석영그라스로 이루어진 투명내층이 형성되어 있지 않거나 또는 0.9mm이하의 두께를 갖는 것을 의미한다.
Claims (6)
- 실리콘 단결정의 인상에 사용되는 석영 그라스 도가니에 있어서,석영 그라스 도가니가 합성 석영 그라스로 이루어진 투명내층, 천연 또는 천연합성 혼합 석영 그라스로 이루어진 투명 또는 불투명 중간층, 및 천연석영 그라스로 이루어진 불투명외층을 갖고,합성석영 그라스로 이루어진 투명내층은 그 Al농도 CA가 0.01-1ppm, 천연 또는 천연합성 혼합 석영 그라스로 이루어진 투명 또는 불투명 중간층은 그 Al농도 CB가 1-8ppm, 천연석영그라스로 이루어진 불투명외층은 그 Al농도 CC가 5-20ppm이고, 불투명외층의 Al농도가 중간층의 Al농도 보다 높은 농도이고,또한, 상기 합성석영 그라스로 이루어진 투명내층의 평균두께 TA가 도가니 기체의 저부 최하단에서 직동부상단면까지의 높이(H)에 대하여 저부최하단부 ∼0.25H의 범위 TA1이 0.5-3mm, 0.25-0.5H의 범위 TA2가 0.3-2mm, 0.5-1H의 범위 TA3가 합성석영그라스로 이루어진 투명층이 형성되어 있지 않거나 또는 0.9mm이하의 두께이고, TA1 >TA2 >TA3 인 것을 특징으로 하는 실리콘 단결정 인상용 석영 그라스 도가니
- 삭제
- 제1항에 있어서, 합성석영그라스로 이루어진 투명내층의 Al농도 CA가 0.01-1ppm, 중간층이 투명층이고,그 Al농도 CB가 4-8ppm, 불투명외층의 Al농도 CC가 12-20ppm인 것을 특징으로 하는 실리콘 단결정 인상용 석영 그라스 도가니
- 제1항에 있어서, 투명내층의 Al농도 CA가 0.01-1ppm, 중간층이 불투명층이고, 그 Al농도 CB가 1-3ppm, 불투명외층의 Al농도 CC가 5-10ppm인 것을 특징으로 하는 실리콘 단결정 인상용 석영 그라스 도가니
- 삭제
- 제1항, 제3항 및 제4항 중 어느 한 항에 있어서, 0.25-1H의 범위의 합성석영그라스로 이루어진 투명한 내층의 평균두께 TA가 상부로 감에 따라 서서히 얇게 되어 있는 것을 특징으로 하는 실리콘 단결정 인상용 석영 그라스 도가니
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2003-00154845 | 2003-05-30 | ||
JP2003154845 | 2003-05-30 |
Publications (2)
Publication Number | Publication Date |
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KR20050087880A KR20050087880A (ko) | 2005-08-31 |
KR100731833B1 true KR100731833B1 (ko) | 2007-06-25 |
Family
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Application Number | Title | Priority Date | Filing Date |
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KR1020057012775A KR100731833B1 (ko) | 2003-05-30 | 2004-05-21 | 실리콘 단결정 인상용 석영 그라스 도가니 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7299658B2 (ko) |
EP (1) | EP1655270B1 (ko) |
JP (1) | JP4526034B2 (ko) |
KR (1) | KR100731833B1 (ko) |
DE (1) | DE602004029057D1 (ko) |
NO (1) | NO20056184L (ko) |
TW (1) | TWI247730B (ko) |
WO (1) | WO2004106247A1 (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4086283B2 (ja) * | 2002-07-31 | 2008-05-14 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法 |
JP4678667B2 (ja) * | 2004-06-07 | 2011-04-27 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
US7497907B2 (en) * | 2004-07-23 | 2009-03-03 | Memc Electronic Materials, Inc. | Partially devitrified crucible |
US20070151504A1 (en) * | 2005-10-19 | 2007-07-05 | General Electric Company | Quartz glass crucible and method for treating surface of quartz glass crucible |
US7716948B2 (en) * | 2006-12-18 | 2010-05-18 | Heraeus Shin-Etsu America, Inc. | Crucible having a doped upper wall portion and method for making the same |
WO2009099084A1 (ja) * | 2008-02-05 | 2009-08-13 | Japan Super Quartz Corporation | 石英ガラスルツボ |
JP5058138B2 (ja) * | 2008-12-09 | 2012-10-24 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
WO2010137221A1 (ja) * | 2009-05-26 | 2010-12-02 | 信越石英株式会社 | シリカ容器及びその製造方法 |
KR101357740B1 (ko) * | 2009-07-31 | 2014-02-03 | 쟈판 스파 쿼츠 가부시키가이샤 | 실리콘 단결정 인상용 실리카 유리 도가니 |
JP4951040B2 (ja) | 2009-08-05 | 2012-06-13 | 信越石英株式会社 | シリカ容器及びその製造方法 |
KR101457504B1 (ko) * | 2009-09-09 | 2014-11-03 | 쟈판 스파 쿼츠 가부시키가이샤 | 복합 도가니, 그 제조 방법, 및 실리콘 결정의 제조 방법 |
JP5191003B2 (ja) * | 2009-09-28 | 2013-04-24 | コバレントマテリアル株式会社 | シリコン単結晶引上げ用シリカガラスルツボ |
JP5453677B2 (ja) * | 2010-06-25 | 2014-03-26 | 株式会社Sumco | シリカガラスルツボ、シリコンインゴットの製造方法 |
US9193620B2 (en) | 2011-03-31 | 2015-11-24 | Raytheon Company | Fused silica body with vitreous silica inner layer, and method for making same |
US9221709B2 (en) * | 2011-03-31 | 2015-12-29 | Raytheon Company | Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same |
JP5611904B2 (ja) * | 2011-08-10 | 2014-10-22 | コバレントマテリアル株式会社 | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
CN109563639B (zh) | 2016-09-13 | 2021-10-26 | 胜高股份有限公司 | 石英玻璃坩埚及其制造方法 |
CN108977879B (zh) * | 2018-09-13 | 2021-02-26 | 浙江美晶新材料有限公司 | 一种单晶用高纯石英坩埚及其制备方法 |
CN109467306B (zh) * | 2018-11-08 | 2021-10-19 | 锦州佑鑫石英科技有限公司 | 单晶硅生产用高强度石英坩埚的加工方法 |
JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
JP7172844B2 (ja) | 2019-05-13 | 2022-11-16 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
JP7509528B2 (ja) * | 2019-11-11 | 2024-07-02 | グローバルウェーハズ・ジャパン株式会社 | シリコン単結晶の製造方法 |
DE102020000701A1 (de) * | 2020-02-03 | 2021-08-05 | Siltronic Ag | Quarzglastiegel zur Herstellung von Siliciumkristallen und Verfahren zur Herstellung von Quarzglastiegel |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000247778A (ja) * | 1999-02-25 | 2000-09-12 | Toshiba Ceramics Co Ltd | 石英ガラスルツボおよびその製造方法ならびにこれを用いたシリコン単結晶の引上げ方法 |
JP2002284596A (ja) * | 2001-03-28 | 2002-10-03 | Japan Siper Quarts Corp | 合成石英によって内表面を部分的に被覆した石英ガラスルツボ |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2933404B2 (ja) | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
DE69508473T2 (de) * | 1994-07-06 | 1999-10-28 | Shinetsu Handotai Kk | Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür |
JP2811290B2 (ja) | 1995-04-04 | 1998-10-15 | 信越石英株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
JP3764776B2 (ja) * | 1996-03-18 | 2006-04-12 | 信越石英株式会社 | 単結晶引き上げ用石英ガラスるつぼ及びその製造方法 |
JP3986029B2 (ja) * | 1997-12-26 | 2007-10-03 | Sumco Techxiv株式会社 | シリコン単結晶引き上げ方法 |
JP2002284569A (ja) | 2001-03-27 | 2002-10-03 | Nichias Corp | 高強度低熱膨張セラミックス |
US6641663B2 (en) | 2001-12-12 | 2003-11-04 | Heracus Shin-Estu America | Silica crucible with inner layer crystallizer and method |
JP2003095678A (ja) * | 2001-07-16 | 2003-04-03 | Heraeus Shin-Etsu America | シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法 |
US7118789B2 (en) * | 2001-07-16 | 2006-10-10 | Heraeus Shin-Etsu America | Silica glass crucible |
-
2004
- 2004-05-21 DE DE602004029057T patent/DE602004029057D1/de not_active Expired - Lifetime
- 2004-05-21 JP JP2005506471A patent/JP4526034B2/ja not_active Expired - Lifetime
- 2004-05-21 EP EP04734356A patent/EP1655270B1/en not_active Expired - Lifetime
- 2004-05-21 WO PCT/JP2004/006947 patent/WO2004106247A1/ja active Application Filing
- 2004-05-21 US US10/559,086 patent/US7299658B2/en not_active Expired - Lifetime
- 2004-05-21 KR KR1020057012775A patent/KR100731833B1/ko active IP Right Grant
- 2004-05-26 TW TW093115013A patent/TWI247730B/zh active
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2005
- 2005-12-23 NO NO20056184A patent/NO20056184L/no not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000247778A (ja) * | 1999-02-25 | 2000-09-12 | Toshiba Ceramics Co Ltd | 石英ガラスルツボおよびその製造方法ならびにこれを用いたシリコン単結晶の引上げ方法 |
JP2002284596A (ja) * | 2001-03-28 | 2002-10-03 | Japan Siper Quarts Corp | 合成石英によって内表面を部分的に被覆した石英ガラスルツボ |
Non-Patent Citations (2)
Title |
---|
12247778 |
14284596 |
Also Published As
Publication number | Publication date |
---|---|
KR20050087880A (ko) | 2005-08-31 |
TW200426121A (en) | 2004-12-01 |
DE602004029057D1 (de) | 2010-10-21 |
WO2004106247A1 (ja) | 2004-12-09 |
US20060144327A1 (en) | 2006-07-06 |
EP1655270A4 (en) | 2008-07-09 |
JPWO2004106247A1 (ja) | 2006-07-20 |
NO20056184L (no) | 2006-02-07 |
JP4526034B2 (ja) | 2010-08-18 |
EP1655270B1 (en) | 2010-09-08 |
TWI247730B (en) | 2006-01-21 |
US7299658B2 (en) | 2007-11-27 |
EP1655270A1 (en) | 2006-05-10 |
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