KR100634037B1 - 옥심 유도체, 이의 제조방법 및 이를 포함하는 조성물 - Google Patents

옥심 유도체, 이의 제조방법 및 이를 포함하는 조성물 Download PDF

Info

Publication number
KR100634037B1
KR100634037B1 KR1020017005334A KR20017005334A KR100634037B1 KR 100634037 B1 KR100634037 B1 KR 100634037B1 KR 1020017005334 A KR1020017005334 A KR 1020017005334A KR 20017005334 A KR20017005334 A KR 20017005334A KR 100634037 B1 KR100634037 B1 KR 100634037B1
Authority
KR
South Korea
Prior art keywords
phenyl
alkyl
formula
substituted
sulfonyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020017005334A
Other languages
English (en)
Korean (ko)
Other versions
KR20010081100A (ko
Inventor
야마토히토시
아사쿠라도시카게
비르봉장-뤽
디틀리커쿠르트
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
Publication of KR20010081100A publication Critical patent/KR20010081100A/ko
Application granted granted Critical
Publication of KR100634037B1 publication Critical patent/KR100634037B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
KR1020017005334A 1998-10-29 1999-10-18 옥심 유도체, 이의 제조방법 및 이를 포함하는 조성물 Expired - Fee Related KR100634037B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98811084 1998-10-29
EP98811084.7 1998-10-29

Publications (2)

Publication Number Publication Date
KR20010081100A KR20010081100A (ko) 2001-08-27
KR100634037B1 true KR100634037B1 (ko) 2006-10-17

Family

ID=8236416

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017005334A Expired - Fee Related KR100634037B1 (ko) 1998-10-29 1999-10-18 옥심 유도체, 이의 제조방법 및 이를 포함하는 조성물

Country Status (8)

Country Link
US (1) US6485886B1 (https=)
EP (1) EP1124832B1 (https=)
JP (1) JP2002528550A (https=)
KR (1) KR100634037B1 (https=)
CN (2) CN1636971A (https=)
AU (1) AU6340899A (https=)
DE (1) DE69904073T2 (https=)
WO (1) WO2000026219A1 (https=)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Speciality Chemicals Holding Inc., Basel Oximderivate und ihre verwendung als latente saüre
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
KR100875612B1 (ko) * 2001-06-01 2008-12-24 시바 홀딩 인크 치환된 옥심 유도체 및 이를 포함하는 조성물
US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
JP4317870B2 (ja) * 2003-03-11 2009-08-19 フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド 新規な感光性樹脂組成物
US20070020793A1 (en) * 2004-03-01 2007-01-25 Adamovics John A Three-dimensional shaped solid dosimeter and method of use
EP1789188A2 (en) * 2004-07-21 2007-05-30 CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
WO2010112408A1 (en) 2009-03-30 2010-10-07 Basf Se Uv-dose indicator films
CN102666557B (zh) * 2009-09-18 2016-03-30 汉高知识产权控股有限责任公司 膦酸酯粘接组合物
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
WO2014025370A1 (en) 2012-08-10 2014-02-13 Hallstar Innovations Corp. Tricyclic energy quencher compounds for reducing singlet oxygen generation
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
WO2016174192A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Medizinische badevorrichtung
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
WO2018155547A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
KR102824944B1 (ko) 2018-09-07 2025-06-24 아이지엠 레진스 이탈리아 에스.알.엘. 다관능성 비스아실포스핀 옥사이드 광개시제
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
WO2020136522A1 (en) 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
US11981650B2 (en) 2019-10-11 2024-05-14 Igm Resins Italia S.R.L. Coumarin glyoxylates for LED photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
DE102022106647A1 (de) 2022-03-22 2023-09-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Niedertemperaturhärtende Massen auf Basis von Glycidylethern
JP2025514446A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、オキサゾール系増感剤及びアミン添加剤を含む光開始剤パッケージ
JP2025514405A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、クマリン系増感剤及びアミン添加剤を含む光開始剤パッケージ
EP4273200B1 (en) 2022-05-06 2026-03-25 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
JP2025533845A (ja) 2022-10-05 2025-10-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ ポリマー性（メタ）アクリレート光開始剤
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
CN120737322B (zh) * 2025-09-02 2025-11-28 西北工业大学 一种基于手性主链的液晶聚合物及其制备方法和应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
JPH04362647A (ja) * 1991-06-10 1992-12-15 Konica Corp 感光性組成物
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JPH0990627A (ja) * 1995-09-27 1997-04-04 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP3830183B2 (ja) 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3591743B2 (ja) * 1996-02-02 2004-11-24 東京応化工業株式会社 化学増幅型レジスト組成物
JP3875271B2 (ja) 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
JP3655030B2 (ja) 1996-12-10 2005-06-02 東京応化工業株式会社 ネガ型化学増幅型レジスト組成物
TW550439B (en) 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Speciality Chemicals Holding Inc., Basel Oximderivate und ihre verwendung als latente saüre
WO2000053530A1 (en) * 1999-03-05 2000-09-14 Exxon Research And Engineering Company Rare earth metal ion exchanged ferrierite

Also Published As

Publication number Publication date
DE69904073D1 (de) 2003-01-02
EP1124832B1 (en) 2002-11-20
US6485886B1 (en) 2002-11-26
AU6340899A (en) 2000-05-22
CN1205215C (zh) 2005-06-08
KR20010081100A (ko) 2001-08-27
DE69904073T2 (de) 2003-07-17
CN1325401A (zh) 2001-12-05
JP2002528550A (ja) 2002-09-03
WO2000026219A1 (en) 2000-05-11
EP1124832A1 (en) 2001-08-22
CN1636971A (zh) 2005-07-13

Similar Documents

Publication Publication Date Title
KR100634037B1 (ko) 옥심 유도체, 이의 제조방법 및 이를 포함하는 조성물
KR100740017B1 (ko) 신규한 옥심 설포네이트 및 잠재성 설폰산으로서의 이의용도
US6703182B1 (en) Unsaturated oxime derivatives and the use thereof as latent acids
JP3975411B2 (ja) オキシムスルホン酸エステルおよび潜伏性スルホン酸としてのそれらの使用
NL1014545C2 (nl) Oxim-derivaten en de toepassing daarvan als latente zuren.
CN1989455B (zh) 肟衍生物和它们作为潜伏酸的用途
KR101043905B1 (ko) 할로겐화 옥심 유도체 및 잠산으로서의 이의 용도
JP2000314956A (ja) オキシム誘導体及びその潜在酸としての使用
KR20090023720A (ko) 옥심 설포네이트 및 잠산으로서의 이의 용도
JP2011523971A (ja) スルホニウム塩及び潜在性酸としての使用
US20010037037A1 (en) Oximesulfonic acid esters and the use thereof as latent sulfonic acids

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20101006

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20111010

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20111010

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000