JP2002528550A - オキシム誘導体及び潜在性酸としてのその使用 - Google Patents

オキシム誘導体及び潜在性酸としてのその使用

Info

Publication number
JP2002528550A
JP2002528550A JP2000579607A JP2000579607A JP2002528550A JP 2002528550 A JP2002528550 A JP 2002528550A JP 2000579607 A JP2000579607 A JP 2000579607A JP 2000579607 A JP2000579607 A JP 2000579607A JP 2002528550 A JP2002528550 A JP 2002528550A
Authority
JP
Japan
Prior art keywords
phenyl
alkyl
compound
substituted
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2000579607A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002528550A5 (https=
Inventor
斉 山戸
敏景 朝倉
ビルボーム，ジャン−リュク
ディートリカー，クルト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2002528550A publication Critical patent/JP2002528550A/ja
Publication of JP2002528550A5 publication Critical patent/JP2002528550A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
JP2000579607A 1998-10-29 1999-10-18 オキシム誘導体及び潜在性酸としてのその使用 Ceased JP2002528550A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98811084.7 1998-10-29
EP98811084 1998-10-29
PCT/EP1999/007876 WO2000026219A1 (en) 1998-10-29 1999-10-18 Oxime derivatives and the use thereof as latent acids

Publications (2)

Publication Number Publication Date
JP2002528550A true JP2002528550A (ja) 2002-09-03
JP2002528550A5 JP2002528550A5 (https=) 2006-11-30

Family

ID=8236416

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000579607A Ceased JP2002528550A (ja) 1998-10-29 1999-10-18 オキシム誘導体及び潜在性酸としてのその使用

Country Status (8)

Country Link
US (1) US6485886B1 (https=)
EP (1) EP1124832B1 (https=)
JP (1) JP2002528550A (https=)
KR (1) KR100634037B1 (https=)
CN (2) CN1636971A (https=)
AU (1) AU6340899A (https=)
DE (1) DE69904073T2 (https=)
WO (1) WO2000026219A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光活性化方法及び逆転した２段階工程による触媒の使用

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Speciality Chemicals Holding Inc., Basel Oximderivate und ihre verwendung als latente saüre
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
DK1392675T3 (da) * 2001-06-01 2005-04-04 Ciba Sc Holding Ag Substituerede oximderivater og anvendelsen deraf som latente syrer
US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
JP4317870B2 (ja) * 2003-03-11 2009-08-19 フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド 新規な感光性樹脂組成物
US20070020793A1 (en) * 2004-03-01 2007-01-25 Adamovics John A Three-dimensional shaped solid dosimeter and method of use
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
EP2414894B1 (en) 2009-03-30 2014-02-12 Basf Se Uv-dose indicator films
ES2523753T3 (es) 2009-09-18 2014-12-01 Henkel IP & Holding GmbH Composiciones de unión de fosfonato
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
WO2014025370A1 (en) 2012-08-10 2014-02-13 Hallstar Innovations Corp. Tricyclic energy quencher compounds for reducing singlet oxygen generation
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
JP6599446B2 (ja) 2014-05-30 2019-10-30 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多官能性アシルホスフィンオキシド光重合開始剤
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
EP3288517B1 (de) 2015-04-29 2019-07-17 BSN Medical GmbH Medizinische badevorrichtung
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
KR102646304B1 (ko) * 2017-02-23 2024-03-11 에이치디 마이크로시스템즈 가부시키가이샤 감광성 수지 조성물, 경화 패턴의 제조 방법, 경화물, 층간절연막, 커버 코트층, 표면 보호막, 및 전자부품
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
EP4482881A1 (en) 2022-02-24 2025-01-01 IGM Resins Italia S.r.l. Photoinitiators
DE102022106647A1 (de) 2022-03-22 2023-09-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Niedertemperaturhärtende Massen auf Basis von Glycidylethern
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
EP4273200B1 (en) 2022-05-06 2026-03-25 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
US20250297109A1 (en) 2022-05-06 2025-09-25 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
KR20250088509A (ko) 2022-10-05 2025-06-17 아이지엠 레진스 이탈리아 에스.알.엘. 폴리머 (메트)아크릴레이트 광개시제
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization
CN120737322B (zh) * 2025-09-02 2025-11-28 西北工业大学 一种基于手性主链的液晶聚合物及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508774A (ja) * 1997-07-01 2002-03-19 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規なオキシムスルホナート類及び潜伏性スルホン酸としてのこれらの用途

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
JPH04362647A (ja) * 1991-06-10 1992-12-15 Konica Corp 感光性組成物
EP0571330B1 (de) 1992-05-22 1999-04-07 Ciba SC Holding AG Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JPH0990627A (ja) * 1995-09-27 1997-04-04 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP3830183B2 (ja) 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3591743B2 (ja) * 1996-02-02 2004-11-24 東京応化工業株式会社 化学増幅型レジスト組成物
JP3875271B2 (ja) * 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
JP3655030B2 (ja) * 1996-12-10 2005-06-02 東京応化工業株式会社 ネガ型化学増幅型レジスト組成物
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Speciality Chemicals Holding Inc., Basel Oximderivate und ihre verwendung als latente saüre
CA2386891A1 (en) * 1999-03-05 2000-09-14 Exxonmobil Research And Engineering Company Rare earth metal ion exchanged ferrierite

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508774A (ja) * 1997-07-01 2002-03-19 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規なオキシムスルホナート類及び潜伏性スルホン酸としてのこれらの用途

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光活性化方法及び逆転した２段階工程による触媒の使用

Also Published As

Publication number Publication date
KR20010081100A (ko) 2001-08-27
CN1325401A (zh) 2001-12-05
CN1636971A (zh) 2005-07-13
US6485886B1 (en) 2002-11-26
KR100634037B1 (ko) 2006-10-17
DE69904073D1 (de) 2003-01-02
EP1124832B1 (en) 2002-11-20
CN1205215C (zh) 2005-06-08
EP1124832A1 (en) 2001-08-22
DE69904073T2 (de) 2003-07-17
AU6340899A (en) 2000-05-22
WO2000026219A1 (en) 2000-05-11

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