KR100616125B1 - 수직 인터페이스에 적합한 개방 시스템 - Google Patents
수직 인터페이스에 적합한 개방 시스템 Download PDFInfo
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- KR100616125B1 KR100616125B1 KR1020017000570A KR20017000570A KR100616125B1 KR 100616125 B1 KR100616125 B1 KR 100616125B1 KR 1020017000570 A KR1020017000570 A KR 1020017000570A KR 20017000570 A KR20017000570 A KR 20017000570A KR 100616125 B1 KR100616125 B1 KR 100616125B1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (15)
- 삭제
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- SMIF 포드를 수용하도록 대략 900㎜의 높이에 위치된 수평 표면을 포함하고, 포드 쉘을 포드 도어로부터 떨어지게 이동시킬 수 있으며, 포드 쉘이 포드로부터 분리되는 동안 피가공물을 일정 체적의 청정 공기에서 유지시키기 위한 소환경(minienvironment)을 포함하는 로드 포트와;처리 툴 상의 박스 오프너-로더 툴 표준 인터페이스(box opener-loader tool standard interface: BOLTS 인터페이스)를 포함하고,상기 로드 포트는 상기 BOLTS 인터페이스를 통해 상기 처리 툴로 이송하기 위하여 상기 피가공물을 위치시킬 수 있는 것을 특징으로 하는, 수직으로 향한 포트를 통해 포드 도어 및 포드 쉘을 포함하는 바닥 개방 SMIF 포드와 처리 툴(processing tool) 사이에서 피가공물을 이송하기 위한 인간 편의성을 가지는 이송 시스템.
- 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템에 있어서,바닥 개방 피가공물 운반 컨테이너를 수용하고 지지하는 수평면을 포함하고, 상기 수직 개구를 통해 이송하기 위하여 상기 바닥 개방 피가공물 운반 컨테이너 내로부터 피가공물을 제공할 수 있으며, 제1 크기의 피가공물 및 상기 제1 크기와는 다른 제2 크기의 피가공물과 함께 작동될 수 있는 로드 포트와;상기 로드 포트가 상기 제1 크기의 피가공물과 작동하는지 상기 제2 크기의 피가공물과 작동하는지를 결정하기 위한 센서를 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,상기 제1 크기의 피가공물은 크기가 300mm인 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제6항에 있어서,상기 제2 크기의 피가공물은 크기가 200mm인 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제6항에 있어서,상기 제2 크기의 피가공물은 크기가 150mm인 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,상기 로드 포트는 컨테이너 내로부터 피가공물을 분리시키기 위한 기구를 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,상기 로드 포트는 상기 바닥 개방 피가공물 운반 컨테이너 및 처리 툴의 외부 환경으로부터 피가공물을 격리시키기 위한 소환경을 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,상기 바닥 개방 피가공물 운반 컨테이너는 포드 상부 및 포드 바닥을 포함하는 SMIF 포드를 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제11항에 있어서,상기 로드 포트는 상기 포드 바닥으로부터 상기 포드 상부를 분리시키기 위한 기구를 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,피가공물을 이송하기 위한 피가공물 이송 로봇을 포함하고, 상기 센서로부터의 피드백에 따라 상기 제1 크기의 피가공물 또는 상기 제2 크기의 피가공물에 접근하도록 피가공물 이송 로봇을 위치시키기 위한 제어 시스템을 추가로 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제5항에 있어서,상기 센서로부터의 피드백에 따라 상기 제1 크기의 피가공물 또는 상기 제2 크기의 피가공물을 수용하도록 로드 포트를 위치시키기 위한 제어 시스템을 추가로 포함하는 것을 특징으로 하는, 수직 개구를 통해 처리 툴 내외로 피가공물을 이송하기 위한 시스템.
- 제1 크기의 제1 피가공물을 운반하기 위한 제1 바닥 개방 컨테이너와 상기 제1 크기와는 다른 제2 크기의 제2 피가공물을 운반하기 위한 제2 바닥 개방 컨테이너를 수용하고 지지하는 로드 포트와, 로드 포트와 처리 툴 사이에서 피가공물을 이송하기 위한 피가공물 이송 로봇을 포함하는, 처리 툴 내외로 피가공물을 이송하기 위한 시스템의 작동을 제어하기 위하여 소프트웨어에 의해 구동되는 제어 시스템으로서,제1 피가공물 및 제2 피가공물의 제1 크기 및 제2 크기를 식별할 수 있는 센서와;상기 센서로부터의 피드백에 따라, 제1 바닥 개방 컨테이너와 처리 툴 사이에서 제1 피가공물을 이송하기 위한 제1 그룹의 위치에 피가공물 이송 로봇을 위치시키거나, 제2 바닥 개방 컨테이너와 처리 툴 사이에서 제2 피가공물을 이송하기 위한 제2 그룹의 위치에 피가공물 이송 로봇을 위치시키기 위한 실행가능한 소프트웨어 코드에 의하여 구동되는 수단을 포함하는 것을 특징으로 하는, 처리 툴 내외로 피가공물을 이송하기 위한 시스템의 작동을 제어하기 위하여 소프트웨어에 의해 구동되는 제어 시스템.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/115,526 US6220808B1 (en) | 1998-07-13 | 1998-07-13 | Ergonomic, variable size, bottom opening system compatible with a vertical interface |
US09/115,526 | 1998-07-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010074712A KR20010074712A (ko) | 2001-08-09 |
KR100616125B1 true KR100616125B1 (ko) | 2006-08-28 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017000570A KR100616125B1 (ko) | 1998-07-13 | 1999-07-12 | 수직 인터페이스에 적합한 개방 시스템 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6220808B1 (ko) |
EP (1) | EP1133442A4 (ko) |
JP (1) | JP2002520831A (ko) |
KR (1) | KR100616125B1 (ko) |
HK (1) | HK1040075A1 (ko) |
TW (1) | TW434167B (ko) |
WO (1) | WO2000002804A1 (ko) |
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- 1999-07-12 EP EP99933900A patent/EP1133442A4/en not_active Withdrawn
- 1999-07-12 KR KR1020017000570A patent/KR100616125B1/ko not_active IP Right Cessation
- 1999-07-12 WO PCT/US1999/015691 patent/WO2000002804A1/en active IP Right Grant
- 1999-07-12 JP JP2000559041A patent/JP2002520831A/ja active Pending
- 1999-08-13 TW TW088111892A patent/TW434167B/zh not_active IP Right Cessation
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2002
- 2002-02-25 HK HK02101411.7A patent/HK1040075A1/zh unknown
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US5628683A (en) * | 1992-03-09 | 1997-05-13 | Josef Gentischer | System for transferring substrates into clean rooms |
Also Published As
Publication number | Publication date |
---|---|
HK1040075A1 (zh) | 2002-05-24 |
KR20010074712A (ko) | 2001-08-09 |
US6220808B1 (en) | 2001-04-24 |
JP2002520831A (ja) | 2002-07-09 |
WO2000002804A9 (en) | 2000-07-27 |
EP1133442A4 (en) | 2005-01-19 |
EP1133442A1 (en) | 2001-09-19 |
WO2000002804A1 (en) | 2000-01-20 |
TW434167B (en) | 2001-05-16 |
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