KR100600470B1 - 다공성 폴리메틸메타아크릴레이트의 제조방법 - Google Patents
다공성 폴리메틸메타아크릴레이트의 제조방법 Download PDFInfo
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- KR100600470B1 KR100600470B1 KR1020040085658A KR20040085658A KR100600470B1 KR 100600470 B1 KR100600470 B1 KR 100600470B1 KR 1020040085658 A KR1020040085658 A KR 1020040085658A KR 20040085658 A KR20040085658 A KR 20040085658A KR 100600470 B1 KR100600470 B1 KR 100600470B1
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- polymethyl methacrylate
- porous
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0241—Containing particulates characterized by their shape and/or structure
- A61K8/0279—Porous; Hollow
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/81—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- A61K8/8141—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- A61K8/8152—Homopolymers or copolymers of esters, e.g. (meth)acrylic acid esters; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/16—Aqueous medium
- C08F2/18—Suspension polymerisation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
- C08F212/36—Divinylbenzene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/06—Treatment of polymer solutions
- C08F6/12—Separation of polymers from solutions
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/24—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by surface fusion and bonding of particles to form voids, e.g. sintering
Abstract
Description
흡유량(cc/g) | 입도(㎛) | 잔류모노머(ppm) | 잔류용제(ppm) | |
실시예 1 | 2.34 | 10.5 | 무검출 | 무검출 |
실시예 2 | 2.12 | 10.3 | 무검출 | 무검출 |
실시예 3 | 1.97 | 9.8 | 무검출 | 무검출 |
실시예 4 | 1.83 | 10.4 | 무검출 | 무검출 |
실시예 5 | 1.81 | 10.9 | 무검출 | 무검출 |
비교예 1 | 0.6 | 10.2 | < 10 | - |
Claims (9)
- a)ⅰ) 아크릴계 단량체 10 내지 90 중량부;ⅱ) 다관능 모노머 90 내지 10 중량부;ⅲ) 상기 ⅰ)과 ⅱ)의 합계 100 중량부에 대하여 공용매 100 내지 200 중량부; 및ⅳ) 상기 ⅰ)과 ⅱ)의 합계 100 중량부에 대하여 개시제 1 내지 5 중량부를 현탁안정제가 용해된 용매 하에서 중합반응시키는 단계; 및b) 상기 중합반응 후 세척, 건조하는 단계를 포함하며, 흡유량이 1.8 ㏄/g 내지 2.4 ㏄/g, 잔류 모노머가 10 ppm 미만, 잔류 용제가 10 ppm 미만인 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트의 제조방법.
- 삭제
- 제1항에 있어서,상기 공용매는 톨루엔(Toluene), n-헥사논(n-hexanone), MIBK(Methyl isobutyl Ketone) 및 이소아밀알콜(Isoamylalchol)로 이루어지는 군으로부터 1종 이상 선택되는 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트의 제조방법.
- 제1항에 있어서,상기 현탁안정제는 폴리비닐 피롤리돈, 폴리비닐 메틸 에테르, 폴리에틸렌이민, 폴리아클리산, 폴리비닐알콜, 비닐아세테이트 코폴리머, 에틸 셀룰로스 및 히드록시프로필 셀룰로스로 이루어지는 군으로부터 1종 이상 선택되는 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트의 제조방법.
- 제1항에 있어서,상기 세척은 증류수, 에탄올 수용액, 메탄올 수용액, MEK, IPA, Acetone, EA, MC 또는 BC 수용액으로 2 내지 3차례 세척하는 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트의 제조방법.
- 제1항 내지 제5항 중 어느 한 항에 의하여 제조되어 흡유량이 1.8 ㏄/g 내지 2.4 ㏄/g, 잔류 모노머가 10 ppm 미만, 잔류 용제가 10 ppm 미만인 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트.
- 삭제
- 삭제
- 제6항에 있어서,상기 다공성 폴리메틸메타아크릴레이트가 화장품의 캡슐레이션 재료로서 사 용되는 것을 특징으로 하는 다공성 폴리메틸메타아크릴레이트.
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KR1020040085658A KR100600470B1 (ko) | 2004-10-26 | 2004-10-26 | 다공성 폴리메틸메타아크릴레이트의 제조방법 |
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KR1020040085658A KR100600470B1 (ko) | 2004-10-26 | 2004-10-26 | 다공성 폴리메틸메타아크릴레이트의 제조방법 |
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KR20060036614A KR20060036614A (ko) | 2006-05-02 |
KR100600470B1 true KR100600470B1 (ko) | 2006-07-13 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20110062708A (ko) * | 2009-12-04 | 2011-06-10 | 주식회사 선진화학 | 화장품용 기능성 물질을 함유하는 다공성 폴리메틸메타아크릴레이트 분말, 그 제조방법 및 이를 함유하는 화장료 조성물 |
KR101470850B1 (ko) * | 2013-04-03 | 2014-12-09 | 코스맥스 주식회사 | 거대 다공성 폴리메틸메타아크릴레이트 제조방법 |
KR20160008548A (ko) | 2013-05-16 | 2016-01-22 | 디에스엠 아이피 어셋츠 비.브이. | 실리콘 오일 및 폴리메틸메타크릴레이트 입자를 포함하는 미용 조성물 |
KR20160007534A (ko) | 2013-05-16 | 2016-01-20 | 디에스엠 아이피 어셋츠 비.브이. | 피지 제어제, 각질 제거제 및/또는 콜라겐 증진제를 포함하고 가교결합된 다공질 폴리메틸메타크릴레이트 비드 입자를 추가로 포함하는 화장품 조성물 |
JP2016518426A (ja) * | 2013-05-16 | 2016-06-23 | ディーエスエム アイピー アセッツ ビー.ブイ. | 天然有機油およびポリメチルメタクリレート粒子を含む化粧料組成物 |
WO2015003987A1 (en) * | 2013-07-08 | 2015-01-15 | Dsm Ip Assets B.V. | Uv screening composition comprising a uv filter, an organopolysiloxane functionalized with a uv absorber and porous silica and/or polymethylmethacrylate particles |
KR101683995B1 (ko) * | 2014-11-06 | 2016-12-21 | 선진뷰티사이언스(주) | 다공성 소프트 비드를 함유하는 화장료 조성물 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980079388A (ko) * | 1997-03-03 | 1998-11-25 | 존휴 | 흡유성 공중합체의 제조 방법 및 그 생성물 |
KR19990070970A (ko) * | 1998-02-26 | 1999-09-15 | 김공수 | 다공성 중합체 입자의 제조방법 |
KR20000050964A (ko) * | 1999-01-16 | 2000-08-05 | 윤덕용 | 고분자 수지입자의 표면적과 세공부피의 조절방법 및 그를 이용한 표면적과 세공부피가 증가된 고분자 수지입자의 제조방법 |
KR20040071431A (ko) * | 2003-02-06 | 2004-08-12 | 제일모직주식회사 | 단분산성 다공질 입자의 제조방법 |
KR20050047693A (ko) * | 2003-11-18 | 2005-05-23 | 주식회사 태평양 | 플라보노이드/고분자 복합구형체 및 이의 제조방법, 및이를 함유하는 화장료 조성물 |
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- 2004-10-26 KR KR1020040085658A patent/KR100600470B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980079388A (ko) * | 1997-03-03 | 1998-11-25 | 존휴 | 흡유성 공중합체의 제조 방법 및 그 생성물 |
KR19990070970A (ko) * | 1998-02-26 | 1999-09-15 | 김공수 | 다공성 중합체 입자의 제조방법 |
KR20000050964A (ko) * | 1999-01-16 | 2000-08-05 | 윤덕용 | 고분자 수지입자의 표면적과 세공부피의 조절방법 및 그를 이용한 표면적과 세공부피가 증가된 고분자 수지입자의 제조방법 |
KR20040071431A (ko) * | 2003-02-06 | 2004-08-12 | 제일모직주식회사 | 단분산성 다공질 입자의 제조방법 |
KR20050047693A (ko) * | 2003-11-18 | 2005-05-23 | 주식회사 태평양 | 플라보노이드/고분자 복합구형체 및 이의 제조방법, 및이를 함유하는 화장료 조성물 |
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