KR100584734B1 - 전자파 차폐용 니켈-철 합금 코팅강판 및 그 제조방법 - Google Patents
전자파 차폐용 니켈-철 합금 코팅강판 및 그 제조방법 Download PDFInfo
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- KR100584734B1 KR100584734B1 KR1020010026405A KR20010026405A KR100584734B1 KR 100584734 B1 KR100584734 B1 KR 100584734B1 KR 1020010026405 A KR1020010026405 A KR 1020010026405A KR 20010026405 A KR20010026405 A KR 20010026405A KR 100584734 B1 KR100584734 B1 KR 100584734B1
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- South Korea
- Prior art keywords
- steel sheet
- alloy
- shielding
- shielding ability
- present
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electroplating Methods And Accessories (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
Claims (2)
- 냉연강판의 편면 또는 양면에 조성이 Ni: 20~90wt%, Fe:80~10wt%인 Ni-Fe합금 도금층을 1㎛~1mm의 두께로 형성하는 단계;및상기 Ni-Fe합금 도금층이 형성된 코팅강판을 750~1100℃에서 1분~300분간 열처리하여 강판에 전자파 차폐능을 부여하는 단계를 포함하여 이루어지는 전자파 차폐용 니켈-철 합금 코팅강판의 제조방법
- 그 편면 또는 양면에 조성이 Ni: 20~90wt%, Fe:80~10wt%인 Ni-Fe합금 도금층이 1㎛~1mm의 두께로 형성되어 있고 Ni-Fe합금 자성상(magnetic phase)이 형성되어 있으며, 10~100Hz에서 20dB 이상의 차폐능을 나타내는 전자파 차폐용 니켈-철 합금 코팅강판
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KR1020010026405A KR100584734B1 (ko) | 2001-05-15 | 2001-05-15 | 전자파 차폐용 니켈-철 합금 코팅강판 및 그 제조방법 |
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KR1020010026405A KR100584734B1 (ko) | 2001-05-15 | 2001-05-15 | 전자파 차폐용 니켈-철 합금 코팅강판 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20020087290A KR20020087290A (ko) | 2002-11-22 |
KR100584734B1 true KR100584734B1 (ko) | 2006-05-30 |
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KR1020010026405A KR100584734B1 (ko) | 2001-05-15 | 2001-05-15 | 전자파 차폐용 니켈-철 합금 코팅강판 및 그 제조방법 |
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KR (1) | KR100584734B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101710984B1 (ko) * | 2015-08-28 | 2017-03-02 | 주식회사 비에스피 | 자기장 차폐시트의 제조방법 |
KR101727959B1 (ko) | 2015-09-03 | 2017-04-19 | 주식회사 비에스피 | 자기장 차폐시트의 제조방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100579412B1 (ko) * | 2001-09-27 | 2006-05-12 | 주식회사 포스코 | 극저주파 차폐강판의 제조방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55135374A (en) * | 1979-04-04 | 1980-10-22 | Sony Corp | Tape cassette |
KR19980024779A (ko) * | 1996-09-19 | 1998-07-06 | 도미가 단지 | 자기차폐 시트 및 이의 제조방법, 이를 사용하는 케이블 |
KR19990020144A (ko) * | 1997-08-30 | 1999-03-25 | 오용탁 | 전자파 흡수 차폐체 |
KR19990020145A (ko) * | 1997-08-30 | 1999-03-25 | 오용탁 | 저임피던스 전자파 흡수 차폐체 및 제조 방법 |
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2001
- 2001-05-15 KR KR1020010026405A patent/KR100584734B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55135374A (en) * | 1979-04-04 | 1980-10-22 | Sony Corp | Tape cassette |
KR19980024779A (ko) * | 1996-09-19 | 1998-07-06 | 도미가 단지 | 자기차폐 시트 및 이의 제조방법, 이를 사용하는 케이블 |
KR19990020144A (ko) * | 1997-08-30 | 1999-03-25 | 오용탁 | 전자파 흡수 차폐체 |
KR19990020145A (ko) * | 1997-08-30 | 1999-03-25 | 오용탁 | 저임피던스 전자파 흡수 차폐체 및 제조 방법 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101710984B1 (ko) * | 2015-08-28 | 2017-03-02 | 주식회사 비에스피 | 자기장 차폐시트의 제조방법 |
KR101727959B1 (ko) | 2015-09-03 | 2017-04-19 | 주식회사 비에스피 | 자기장 차폐시트의 제조방법 |
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Publication number | Publication date |
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KR20020087290A (ko) | 2002-11-22 |
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