KR100542301B1 - 액정 표시 장치용 마스크 - Google Patents
액정 표시 장치용 마스크 Download PDFInfo
- Publication number
- KR100542301B1 KR100542301B1 KR1019980023720A KR19980023720A KR100542301B1 KR 100542301 B1 KR100542301 B1 KR 100542301B1 KR 1019980023720 A KR1019980023720 A KR 1019980023720A KR 19980023720 A KR19980023720 A KR 19980023720A KR 100542301 B1 KR100542301 B1 KR 100542301B1
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- liquid crystal
- crystal display
- unit pixels
- boundary
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
Abstract
Description
Claims (2)
- 수개의 단위 픽셀이 한정된 셀 어레이 영역의 소정 부분상에 형성되는 마스크로서,상기 마스크는 수평 및 수직 경계면이 불규칙한 톱니 형상을 가지면서 단위 픽셀 내부를 통과하면서 분할하는 것을 특징으로 하는 액정 표시 장치용 마스크.
- 제 1 항에 있어서, 상기 마스크의 수평 경계면은 상기 단위 픽셀을 수평으로 3분할하고, 마스크의 수직 경계면은 상기 단위 픽셀을 수직으로 2분할하는 것을 특징으로 하는 액정 표시 장치용 마스크.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980023720A KR100542301B1 (ko) | 1998-06-23 | 1998-06-23 | 액정 표시 장치용 마스크 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980023720A KR100542301B1 (ko) | 1998-06-23 | 1998-06-23 | 액정 표시 장치용 마스크 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000002803A KR20000002803A (ko) | 2000-01-15 |
KR100542301B1 true KR100542301B1 (ko) | 2006-04-14 |
Family
ID=19540508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980023720A KR100542301B1 (ko) | 1998-06-23 | 1998-06-23 | 액정 표시 장치용 마스크 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100542301B1 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100705614B1 (ko) * | 2000-12-29 | 2007-04-11 | 비오이 하이디스 테크놀로지 주식회사 | 마스크의 쏘우 패턴형성 방법 |
WO2003052502A1 (en) * | 2001-12-14 | 2003-06-26 | Samsung Electronics Co., Ltd. | A manufacturing method of liquid crystal display |
KR100692683B1 (ko) * | 2003-08-25 | 2007-03-14 | 비오이 하이디스 테크놀로지 주식회사 | 액정표시장치의 화소전극 형성방법 |
KR100713893B1 (ko) * | 2005-03-03 | 2007-05-04 | 비오이 하이디스 테크놀로지 주식회사 | 액정표시장치의 제조방법 |
CN107945667B (zh) * | 2017-11-24 | 2020-08-21 | 武汉天马微电子有限公司 | 显示面板及显示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02143514A (ja) * | 1988-11-25 | 1990-06-01 | Dainippon Printing Co Ltd | マスクパターンの作製方法 |
JPH02143513A (ja) * | 1988-11-25 | 1990-06-01 | Dainippon Printing Co Ltd | マスクパターンの作製方法 |
JPH06289583A (ja) * | 1993-04-02 | 1994-10-18 | Dainippon Printing Co Ltd | エンドレス柄作成システム |
JPH1012510A (ja) * | 1996-06-27 | 1998-01-16 | Nec Corp | 電子線露光装置用露光マスクデータの作成方法および電 子線露光装置用マスク |
JPH1092708A (ja) * | 1996-09-10 | 1998-04-10 | Nec Corp | 電子線の露光方法 |
-
1998
- 1998-06-23 KR KR1019980023720A patent/KR100542301B1/ko not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02143514A (ja) * | 1988-11-25 | 1990-06-01 | Dainippon Printing Co Ltd | マスクパターンの作製方法 |
JPH02143513A (ja) * | 1988-11-25 | 1990-06-01 | Dainippon Printing Co Ltd | マスクパターンの作製方法 |
JPH06289583A (ja) * | 1993-04-02 | 1994-10-18 | Dainippon Printing Co Ltd | エンドレス柄作成システム |
JPH1012510A (ja) * | 1996-06-27 | 1998-01-16 | Nec Corp | 電子線露光装置用露光マスクデータの作成方法および電 子線露光装置用マスク |
JPH1092708A (ja) * | 1996-09-10 | 1998-04-10 | Nec Corp | 電子線の露光方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20000002803A (ko) | 2000-01-15 |
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