KR100308365B1 - Manufacturing apparatus with clean function and its cleaning method - Google Patents

Abstract

A cleaning mechanism is provided inside the apparatus main body which makes the manufacturing apparatus and its processing space a cleaner atmosphere than the apparatus attaching environment. That is, the cabinet 1 is circulated as a clean atmosphere through the filter 3 by using the fan 2 as a power source, and the atmosphere in the apparatus distinguished from the general environment, and the clean filter 15 from the gas supply pipe 14. Supply clean air through the inside of the device.

According to the above configuration, the processing space in the apparatus can be kept clean at all times, and the manufacturing apparatus can be installed in a general environment. It is possible to realize inexpensive clean space that does not require maintenance cost and contribute to the improvement of product quality and cost.

Description

Manufacturing apparatus with clean function and its cleaning method

Industrial Applicability The present invention relates to a semiconductor or liquid crystal production apparatus, an optical disk, a plasma display or a multimedia component such as a television, a processing and assembling apparatus for a product, a production apparatus for mounting and processing an electronic component of an electrical circuit board, and the like. The present invention relates to a manufacturing apparatus that needs to manufacture parts or products in a clean environment. Specifically, in order to perform various processing and assembling work which dislikes dust and undesired substances in the atmosphere, the present invention is a clean space having very few dusts and undesired substances, that is, a clean environment (a clean space). The present invention relates to a manufacturing apparatus and a cleaning method including a robotic apparatus which is provided with a cleaning mechanism for forming the inside of the apparatus so as to process a to-be-processed object such as a part or a product with high quality.

In the manufacture of semiconductor, liquid crystal, electric sashimi plates and other precision products, only fine dust is present in the air, which greatly affects the quality of the product. Therefore, the manufacturing apparatus used for such manufacture is in the so-called clean room in which the dust in air was removed to the extremely high level, and various processes are performed.

Known clean rooms are configured, for example, to collect ceiling air from the high efficiency pantic ulate ain filten (HEPA filter) embedded in the ceiling, circulate it, and circulate it to perform clean each time maintenance.

Such a clean room,

(1) It requires a huge investment in the construction of a clean room that does not directly participate in its manufacture.

(2) Operation maintenance cost of clean room is enormous.

(3) There is a problem such as poor workability.

The problems of (1) and (2) described above are directly related to the manufacturing cost business. In general, the manufacturing apparatus is frequently changed in arrangement or additional removal of the manufacturing apparatus in accordance with the type of product or the manufacturing process. In particular, if a change in the manufacturing line is made, of course, the clean room must also be repaired, but every time the manufacturing line is changed slightly. Repairing the entire clean room is extremely uneconomical and designing or building a clean room in line with the manufacturing line is extremely wasteful in time.

Moreover, as a well-known cleaning apparatus, there exists an apparatus with a clean space structurally smaller than a general clean room. This connects the clay room groups each having a constant internal volume, which is an open cylindrical shape at both ends, to provide the necessary volume and layout, and also constitute a continuous long clean space passage. In this clean space furnace apparatus there are mainly two types. One is a method in which a manufacturing apparatus is installed into a clean space furnace, and the other is a manufacturing apparatus is connected to a clean space passage in a general environment, and only the to-be-processed object is conveyed in the clean space passage so that a predetermined process is performed. This is how the work is done.

If the device is used in such a clean space, even if there is a change in the manufacturing line, the arrangement of the clean room alone is changed, and the response can be relatively simple and flexible, and the economic and time burden caused by the change of the manufacturing line in the general clean room is required. I can cut it. In practice, however, when each manufacturing apparatus is installed in or connected to a clean space, a portion of the air stays or accumulates locally due to a slight change in the airflow state or pressure distribution inside the clean space. Therefore, redesign and manufacturing are made in consideration of the volume and shape of the entire clean space including an air filter for removing dust in the space, a purifying device such as a circulation fan for circulating the air flow, and an air conditioning device for reducing temperature and humidity. It is necessary to update it with what was adapted as a new clean space. As a result, it takes a long time to complete the construction, and as a result, there is a problem that the advantage of the device as a clean room space is greatly sensed, and that the various effects cannot be obtained.

In addition, in the case of a device with a clean space connected to such a general clean room or a clean room group, the above-mentioned cleansing equipment and air conditioning must be kept in a clean state than a space of a local part that truly requires a clean environment. There was a limit to the miniaturization and maintenance of the facility. In particular, since a clean atmosphere is required only when processing a target object, and when a clean environment is not required, for example, when transporting a target object, a large-scale environment such as a clean environment facility such as an apparatus such as the above clean room or a clean space is required. Further, there is a desire to secure a cheaper clean space and to reduce manufacturing costs without making facility investment by construction and installation.

In order to form an inexpensive clean space, a high performance filter such as a HEPA filter generally used in a clean room or an activated carbon adsorption filter for removing harmful components can be used to reduce the frequency of change to a clean space. It is important to reduce the maintenance cost of a clean environment that includes operation and maintenance costs, such as reducing the amount of clean gas (air, nitrogen gas, etc.) to be supplied, or miniaturizing cylindrical equipment such as blowers and saving energy. Do. However, at present, in addition to the countermeasures for dust cleaning using the above-mentioned high performance filter, for example, using a cheap neutral performance filter. There is no effective way to create an atmosphere of higher cleanliness than the high-performance filter, and technical means for more actively recovering and removing contaminants such as dust have not been put to practical use.

The present invention solves these problems, and in a manufacturing apparatus for processing and assembling parts and products in a cleaner environment than a general environment, the equipment depreciation cost and the clean maintenance cost of Darak are finally increased to the product price. It is possible to process various parts, products and the like with high quality and inexpensive price by providing a clean atmosphere only in the processing space in the local manufacturing apparatus for processing the object without installing the above clean room or clean space. It is an object to provide a manufacturing apparatus and a cleaning method having a clean function that can be assembled.

In order to achieve this object, the present invention is a manufacturing apparatus that requires a clean atmosphere in order to process a to-be-processed object such as a part or a product, and includes a cabinet that distinguishes the inside of the apparatus from a general environment. At least one of circulation means for circulating the atmosphere inside through the removal filter or supply means for supplying clean gas into the cabinet.

According to such a structure, the cleanliness in the closed space can be improved by circulating the atmosphere in the apparatus different from the general environment by the cabinet through the filter provided in the apparatus. In addition, infiltration of contaminants in the external environment of the device such as dusting, etc., ensures that the manufacturing device is sealed by the cabinet, and that the internal pressure in the device is controlled by the supply means so that the clean gas is pressurized rather than the general environment outside the device. It can be prevented by supplying. In addition, the para-life of the filter can be dramatically increased after supplying gas into the apparatus to directly clean the atmosphere of the general environment outside the apparatus. In addition, since the space inside the device is extremely small compared to the clean room, the operating conditions and the filter selection (the filter selects the HEPA filter and the neutral performance filter) of the circulating air flow amount to determine the cycle recovery of the atmosphere. As a result, the desired clean environment can be freely set in the apparatus.

In addition, since the manufacturing apparatus of the present invention can be installed in a general environment, a large-scale construction and facility investment can be performed in a clean environment facility such as a clean space furnace connecting the clean room or a clean room group. It is possible to secure a clean space without processing, and to process and assemble high quality parts and products at low cost.

BRIEF DESCRIPTION OF THE DRAWINGS The schematic diagram of the manufacturing apparatus with a cleaning mechanism in Example 1 of this invention.

Fig. 2 is a schematic diagram of one embodiment of a manufacturing apparatus with a cleaning mechanism in Embodiment 2 of the present invention.

Fig. 3 is a schematic diagram of another embodiment of a manufacturing apparatus with a cleaning mechanism in Embodiment 2 of the present invention.

4 is a schematic diagram of a manufacturing apparatus relating to a cleaning mechanism provided with a local cleaning mechanism in Embodiment 3 of the present invention.

Fig. 5 is a schematic diagram of a manufacturing apparatus relating to a cleaning mechanism provided with a means for controlling the cleaning mechanism according to the fourth embodiment of the present invention.

Fig. 6 is a schematic view of one embodiment of the structure of a local clean mechanism of a manufacturing apparatus with a clean appliance in Embodiment 5 of the present invention.

Fig. 7 is a schematic diagram of another embodiment of the structure of the local clean mechanism of the apparatus for manufacturing clean appliance according to the fifth embodiment of the present invention.

Fig. 8 is a schematic diagram of another embodiment of the structure of the local clean mechanism of the apparatus for manufacturing clean appliance according to the fifth embodiment of the present invention.

Fig. 9 is a schematic diagram of another embodiment of the structure of the local clean mechanism of the apparatus for manufacturing clean appliance according to the fifth embodiment of the present invention.

Fig. 10 is a schematic diagram of a manufacturing apparatus with a cleaning mechanism in Embodiment 6 of the present invention.

Fig. 11 is a schematic diagram of a robot device having a clean function in a seventh embodiment of the present invention.

Fig. 12 is a schematic diagram of a robot device having a clean function in a seventh embodiment of the present invention.

Fig. 13 is a schematic diagram of a robot device having a clean function in the eighth embodiment of the present invention.

Fig. 14 is a schematic diagram of a robot device having a clean function in a ninth embodiment of the present invention.

Fig. 15 is a schematic diagram of a robot device having a clean function in a tenth embodiment of the present invention.

Fig. 16 is a schematic diagram of a robot device having a clean function in the eleventh embodiment of the present invention.

Fig. 17 is a schematic diagram of a robot device having a clean function in a twelfth embodiment of the present invention.

Fig. 18 is a schematic diagram of a robot device having a clean function in a thirteenth embodiment of the present invention.

Fig. 19 is a schematic diagram of a robot device having a clean function in a fourteenth embodiment of the present invention.

20 is an improved perspective view of a wire bonding apparatus with a cleaning mechanism that actually uses the present invention.

FIG. 21 is a view showing clean performance (dust concentration measurement result) of the wire bonding apparatus with a cleaning mechanism in FIG. 20; FIG.

FIG. 22 is a diagram showing the clean performance (molecular concentration measurement result) of the outer ear bonding apparatus with a cleaning mechanism in FIG. 20; FIG.

FIG. 23 is a view showing clean performance (dust concentration measurement result) of the wire bonding apparatus with a cleaning mechanism in FIG. 20; FIG.

(Example)

Embodiments of the present invention will be described with reference to the drawings. In addition, in each Example, the same code | symbol is attached | subjected to the same structure, and description is abbreviate | omitted.

Example 1

A schematic diagram of Embodiment 1 of the present invention is shown in FIG. This manufacturing apparatus is equipped with the cleaning apparatus which makes the atmosphere inside the manufacturing apparatus clean.

That is, by the cabinet 1 of the apparatus, the inside of the apparatus and the general environment are distinguished, the atmosphere in the apparatus is a fan 2 as a power source, and the atmosphere inside the apparatus is a clean atmosphere through the filter 3, and circulation do.

Specifically, the atmosphere that is clean by the filter 3 passes through the upper space 5 of the apparatus and is rectified by the rectifying plate 6, and then the processing operation part 7 causes the object 8 to be processed. The work space 9 which performs the processing is lowered. The atmosphere processed according to the workpiece 8 is rectified by the rectifying plate 16 and then guided to the flow path 13. The atmosphere containing dust generated by the operation of the processing operation unit 7 and other device devices 10 and 11 passes through the flow path 12 and the above-described flow path 13 and returns to the filter 3. do. As a result, the processing space in the apparatus is always in a clean state. In addition, the suction position of the flow path 12 is a processing operation part so as to prevent unwanted substances such as dust generated by abrasion of the mechanical operation of the processing operation part 7 from falling onto the object 8 to be attached. It is arrange | positioned so that it may become downstream of the airflow of (7).

In addition, the inside of the apparatus is pressurized to prevent infiltration of undesired substances such as dust in a general environment, and to maintain a stable atmosphere in the apparatus at the time of treatment, and to clean the filter 15 from the gas supply pipe 14. Gas is supplied.

According to the above configuration, since the inside of the apparatus is a very small space compared with a general clean room, when the amount of circulating air in the atmosphere is large, high cleanliness can be obtained in a short time, and a desired clean state can be created by controlling the amount of circulating air. have. In addition, by arranging the structure in consideration of the state of the airflow, a clean atmosphere can be formed by the periphery of the object to be processed 8.

The worker 4 is good only to monitor the process with respect to the general environment.

Example 2

The schematic diagram of Example 2 of this invention is shown in FIG. According to the configuration of the second embodiment, when a cleaning mechanism cannot be installed in the main body of the manufacturing apparatus, or when a clean function is to be added to the existing manufacturing apparatus which does not include the cleaning mechanism in the original apparatus according to the modification. It can correspond to two cases.

In the method shown in Fig. 2, the case where one clean unit 17 is mounted on the manufacturing apparatus main body (cabinet 1) is shown with respect to the existing manufacturing apparatus that does not have a clean function. It is provided, and the function similar to FIG. 1 can be obtained. The clean unit 17 is provided with a fan 2, a filter 3, a rectifying plate 6, a gas supply pipe 14, a clean filter 15, and a rectifying plate 18. The rectifying plate 18 rectifies the atmosphere passing through the flow passage 12 and the flow passage 13 to return to the fan 2.

3 is useful when the above-mentioned clean unit 17 cannot be mounted on the main body of the manufacturing apparatus, or when a plurality of manufacturing apparatuses are to be handled by one cleaning apparatus.

The purifier 23 is provided with a fan 2, a filter 3, a gas supply pipe 14, and a clean filter 15, and is provided on the upper part of the apparatus through a gas guide pipe 21 and a vent connection 22. It is connected to the space 5, and is connected to the flow path 12 and the flow path 13 via the gas guide pipe 20 and the ventilation connection part 19. As shown in FIG.

In this way, by installing the cleaning unit 17 to the existing manufacturing apparatus in response to the modification, or by connecting the independent cleaning apparatus 23, which is centrally managed collectively, to a plurality of manufacturing apparatuses, the arrangement change according to the change of the manufacturing apparatus. However, additional removal of new equipment can be performed quickly and at low cost. Moreover, if the installation structure of the ventilation connection parts 19 and 22 of the cleaning apparatus 23 is common, the cleaning apparatus 23 used as an old manufacturing apparatus can be shared with a new apparatus.

Example 3

A schematic diagram of Embodiment 3 of the present invention is shown in FIG. In the third embodiment, in addition to the cleaning mechanism that makes the whole inside of the apparatus a clean atmosphere, and further comprising a local cleaning mechanism for making only the processing space for processing the object to be a cleaner atmosphere, the degree of cleanliness is extremely Elevated local clean space can be formed. Needless to say, the cleanliness of the part of the local workspace when the local cleansing mechanism is not operated depends on the cleansing device's ability to clean the whole of the apparatus. The manufacturing apparatus having the local cleansing mechanism can process the object to be processed in a clean space which is cheaper than a high performance clean room in order to make only a minimum required processing space into a high clean atmosphere.

In Example 3, a clean gas that is supplied into the apparatus by using gas, vapor, or fine droplets (mist) of a substance having a function of physically and chemically removing dust or unnecessary substances present in the apparatus. By mixing into the atmosphere, colliding with and contacting the atmosphere in the apparatus, and recovering the undesired substances present in the atmosphere and discharging them out of the apparatus, it is possible to more effectively remove the dust or unnecessary substances present in the apparatus.

In FIG. 4, the clean gas generated by the intake apparatus 24 and generated by the passage of the filter 25 is blown clean to make the local space near the object 8 highly clean. Most of the gas is sucked by the suction nozzle 27 and exhausted out of the device by the power of the exhaust device 28. By the curtain of the clean gas formed between the nozzle 26 and the suction nozzle 27 which started blowing, the to-be-processed object 8 is surrounded by the clean atmosphere throughout the apparatus. As a result, an atmosphere of different cleanliness is produced inside the manufacturing apparatus.

In addition, instead of the intake apparatus 24, a clean gas can also be supplied by a cylinder supply. In addition, the gas exhausted from the exhaust device 28 can be recovered and used again through the filter.

The gas, vapor, and vapor generated from the droplet generator 29, which are supplied to the intake apparatus 24 and which have a function of removing dust or unwanted substances, are supplied to the clean gas passing through the filter 25. And the fine droplets are mixed and supplied into the manufacturing apparatus from the nozzle 26 which starts to blow. This mixed gas is aspirated by the intake nozzle 27 and exhausted out of the production apparatus after contact with the dust or unnecessary substance present in the apparatus.

Compared with the use of only clean gas, an atmosphere of extremely high cleanliness can be obtained.

Example 4

A schematic diagram of Embodiment 4 of the present invention is shown in FIG. The detection sensors 31a and 31b in the manufacturing apparatus detect the state of cleanliness, concentration, temperature, humidity, and the like of each space portion in the apparatus in which these apparatuses are arranged, and are transmitted to the detector 32. The actual atmosphere detected by the detecting device 32 and the desired state to be maintained in order to process the object 8 are compared with each other by the control device 33 and based on the result of the difference The operating conditions are found so that the actual state approaches the desired state, and the flow control valves 34a, 34b, 34c which control the flow of the fan 2, the intake 24, the exhaust 28 and the gas The driving information is transmitted to).

In this manner, the control device 33 controls the fan 2, the intake device 24, the exhaust device 28, and the flow control valves 34a, 34b, 34c to bring the atmosphere in the device into the desired state. I can keep it. In addition, the detection apparatus 32 or the control apparatus 33 may be outside the manufacturing apparatus.

Example 5

6, 7, 8 and 9 are schematic views of Embodiment 5 of the present invention. In Example 5, the structure of the cleaning mechanism which raises the cleanliness of a local space is proposed.

Fig. 6 shows the basic structure of the cleaning mechanism of the manufacturing apparatus of the present invention.

The to-be-processed object 8 is enclosed by the support plate 35 and the partition plate 36 and 37, and the upper surface part of the to-be-processed object 8 starts to blow using the clean gas supplied from the supply pipe 38. It is spatially blocked by a curtain of gas generated between the nozzle 39a and the suction nozzle 40a. The clean gas sucked into the suction nozzle 40a is discharged through the discharge pipe 42. In addition, the supply amount and the discharge amount of the clean gas are controlled by the flow control valves 43a and 43b.

By the above-described configuration, a clean atmosphere is obtained in the space 41 on the workpiece 8. This structure is useful when the occurrence of unnecessary substances in the object 8 itself or in the processing operation part 7 is small.

The structure of the cleaning mechanism of the present invention shown in FIG. 7 is based on the structure of FIG. 6, and the atmosphere on the to-be-processed object 8 can be replaced as much as needed, and the supply amount and discharge amount of a clean gas are adjusted. Thus, a clean atmosphere of a stable flow can be formed. In detail, the partition plate 44 is provided, and the required amount of clean gas is supplied from the supply ports 45 and 46 between the partition plates 36 and 44, and the inside of the second partition plate 44 is provided. By discharging the atmosphere of the space 41 on the to-be-processed object 8 from the discharge port 47 installed in this way, the flow of the clean gas in the space 41 can be made a safe flow, and the inside of the space 41 is highly clean. I can do it with a stone atmosphere. In addition, the discharge amount is controlled by the flow rate regulating valves 43c, 43d, 43e, 43f, 43g by the supply amount of the clean gas.

Moreover, these structures shown in FIG. 6 and FIG. 7 block only an upper surface by a gas curtain, and are useful when carrying out operations, such as carrying in or carrying out of a to-be-processed object, processing, etc. from an upper surface side.

In addition, as in the apparatus shown in FIG. 7, the temperature can be made more uniform on the entire surface of the workpiece 8 while the space 41 is in a stable flow atmosphere, and more uniform heating occurs. Moreover, in the bonding apparatus which is an example of a manufacturing apparatus, the shape of the initial bowl (bowl which melt | dissolved the wire used for wire bonding) which generate | occur | produces when flow disruption arises by the position of the atmosphere of the space 41 became unstable, Alternatively, it is possible to prevent a phenomenon in which initial bottles are formed or not.

Further, as shown in Figs. 8 and 9 of the present invention, a method of blocking by several gas curtains, such as a structure in which side two surfaces are opened and a structure in which all three sides of both sides and top surfaces are opened. The use of the united clean structure makes it possible to process and manipulate a variety of to-be-processed objects in various aspects while forming a locally clean space by adjusting and controlling the flow of each nozzle.

In FIG. 8, clean air is supplied from the supply pipe 38 to the object 8 through the rectifying plate 48, and is supplied to the curtain of gas generated between the nozzle 39b and the suction nozzle 40b which have started blowing. As a result, the space 41 on the workpiece 8 is spatially blocked to obtain a clean atmosphere in the space 41 on the workpiece 8. In addition, the supply amount and the discharge amount of the clean gas are controlled by the flow control valves 43h, 43i, 43j.

In Fig. 9, a clean atmosphere is obtained in the space 41 on the workpiece 8 by the curtain of the gas in three directions generated between the nozzles 39c and 39d which have started to blow and the suction nozzles 40b and 40c. The discharge amount of the supply amount of the clean gas of each nozzle 39c, 39d, 40b, 40c is controlled by the flow control valve 43k, 43l, 43m, 43n.

Example 6

A schematic diagram of Embodiment 6 of the present invention is shown in FIG. In the sixth embodiment, a clean preliminary chamber is provided to remove unnecessary substances attached to the object to be processed in this clean preliminary chamber, and to prevent the entry of the undesired substances into the manufacturing apparatus, thereby keeping the inside of the manufacturing apparatus clean at all times. You can do The drawback that the to-be-processed object becomes contaminated by installing a manufacturing apparatus in a general environment, such as conveyance of the to-be-processed object between a general environment and a manufacturing apparatus, can be compensated.

In FIG. 10, in order to process the to-be-processed object 8a in the manufacturing apparatus 49, first, the cassette 51a containing the to-be-processed object 8a is introduce | transduced, and the clean gas produced | generated by the purifier 23 is introduce | transduced. The door 54a is opened and carried in to the carry-in reservation room 53a which can be made. The undesired substance adhering to the object 8a is removed in a general environment by the clean gas which has started to be blown from the nozzle 55a which has started to blow in the carry-in reserve chamber 53a. At the same time, by opening the door 54a, the atmosphere of the general environment infiltrated into the chamber 53a is exhausted from the suction nozzle 56a, thereby replacing the atmosphere and making the interior of the carry-in reserve chamber 53a a clean atmosphere. .

The exhausted atmosphere enters the cleaning device 23, passes through the filter 3 again, becomes a clean gas, circulates, and is used again. The processed object 8a 'carried into the clean preparation chamber 53a is opened and moved by the door 57a in order to carry it into the manufacturing apparatus 49 which is a clean atmosphere. The object 8a 'into the manufacturing apparatus 49 is moved one by one, and when the movement is completed, the door 57a is closed. The to-be-processed object 8 on which the support plate 58 was mounted is processed by the processing apparatus 59 in the clean atmosphere by the clean air supplied from the cleaning apparatus 23 via the rectifying plate 60. The atmosphere in the manufacturing apparatus 49 is discharged to the cleaning apparatus 23 via the rectifying plate 61, and is used again. When the processing of the to-be-processed object 8 is completed, the door 57b will open and it will move to the carry-out preservation chamber 53b which has already maintained the clean atmosphere. When the movement is completed, the door 57b is closed.

In the carrying-out spare chamber 53b, the unnecessary substance adhering to the to-be-processed object 8b 'by a process is removed by the clean gas which started blowing from the nozzle 55b which started blowing. Moreover, in order to open the door 54b when carrying out the to-be-processed object 8b 'to general environment from the carry-out reserve chamber 53b, since the inside of the carry-out reserve chamber 53b is in contact with the atmosphere of a general environment, a carry-out preparation room ( Unnecessary substances in general environment invade into 53b). In order to remove this, the atmosphere in the carry-out spare chamber 53b is aspirated by the suction nozzle 56b, and discharged out of the carry-out spare chamber 53b. The discharged atmosphere enters the purifier 23 and is again used as a purge gas through the filter 3.

Example 7

11 and 12 show schematic views of a seventh embodiment of the present invention. 11 and 12 are schematic diagrams of a robot device having a clean function in the seventh embodiment. This robot device 81 is provided in a general environment together with the object to be processed 82 and the manufacturing apparatus 83.

The robot apparatus 81 is provided with the main body 91, the arm 92, etc. On the arm 92, the holding part 94 holding the to-be-processed fire 8, the nozzle 95 which started blowing, and the suction nozzle 96 are fixed. The arm 92 is moved by the arm drive means, such as the servo motor 93, so that the to-be-processed object 8 may move to the process position 85 of the manufacturing apparatus 83 front. The holding part 94 holds the to-be-processed object 8 by holding a to-be-processed object with two or more fingers, or by vacuum suction.

The nozzle 95 which has started to be blown starts to stick the blue gas supplied through the flow path 97 from the outlet 98 which starts to blow. The outlet 98 which starts to blow is an opening larger than the object 8 and has a size to cover the object 8, for example, to have a longer diameter than the long side of the object 8 to be processed. Formed. Examples of the purge gas include those supplied from a bomb, a gas collected from a general environment as a purge gas through a filter, and a purge gas started to be blown from the nozzle 95 that has been started to be blown through the filter. Can be.

In the case of using the acoustic gas supplied from the bomb, the suction nozzle 96 may be absent, but it is better to be present.

In the case where the gas harvested in the general environment is used as a clean gas, the installation position of the suction nozzle 96 is not particularly limited.

In the apparatus of FIGS. 11 and 12, the suction nozzle 96 is provided to face the blowing outlet 99 of the nozzle 95 at which the suction port 99 starts to blow, but the nozzle 96 is moved to another position. Can be installed. However, rather than collecting the gas harvested in a general environment as a clean gas, the clean gas which has started to be blown is collected from the nozzle 95 and supplied to the nozzle 95 which starts to blow through the filter 3. It is effective to drastically increase the para life of or to increase the purity. The suction port 99 is an opening larger than the object 8, has a size to cover the object 8, and is formed to have a longer diameter than the scene of the object 8, for example. .

In the general environment, the gas or the nozzle 96 that starts to blow blows off the starting of the blown air to produce a purge gas. Therefore, the cleaning device 23 is installed in the main body 91, and the atmosphere around the object 8 to be processed. Is sucked by the suction nozzle 96 as a power source, the filter 3 is made into a clean atmosphere, and it circulates so that it may start sticking by the nozzle 95 which starts blowing. The gas sucked into the suction nozzle 96 by the action of the fan 2 is filtered by the filter 3 through the flow path 100 to become a clean gas from which dust or unnecessary substances are removed. This clean gas is supplied to the nozzle 95 which starts to blow through the flow path 97, and starts blowing at the outlet 98 which starts to blow of the nozzle 95. FIG. The clean gas which has started to blow crosses the processing position (working space) 85 which performs the processing of the object 8 held by the holding part 94. The atmosphere containing dust generated by the operation of the processing operation part 87 or the like is discharged to the general environment, or sucked in the suction nozzle 96, passes through the flow path 100, and returns to the filter 3. Or Thereby, the process space of the to-be-processed object 8 will be in a clean state at the time of the fan 2 operation | movement. If there is no need to keep the object 8 in the clean gas, the fan 2 is stopped to let the object 8 in the general environment. The area around the object 8 is extremely small compared to a general clean room. Therefore, if the amount of circulating air in the atmosphere is increased, high cleanliness can be obtained in a short time, and a desired clean state can be created by controlling the amount of circulating air. have. The circulation air volume is adjusted by controlling the opening and closing of the valves 43o and 43p, for example.

The flow paths 97 and 100 serve as fixing means for fixing the nozzles 95 and 96 to the arm 92, respectively, but the nozzles 95 and 96 are fixed to the arm 92 with fixing means provided separately from the flow path. You can do it.

Moreover, when rectifying plates 101 and 102 are provided upstream than the exit 98 of the nozzle 95, or downstream of the inlet port of the nozzle 96, the gas is rectified. It is rectified by 102 and can make a stable flow.

Although not shown, the main body 91 is provided with control means for controlling the arm drive means.

As shown in Fig. 12, the arm 92 is moved to move the holding part 94 toward the object to be processed 82, and if necessary, the holding part 94 is extended or rotated to store the holding part ( 82 to the workpiece 8, hold the workpiece 8, and then reduce or reverse the holder 94 to move the workpiece 8 to the nozzles 95, 96) in the space between. If necessary, the fan 2 is operated to suck the gas around the object 8 from the nozzle 96 and to clean it with the filter 3, and then, the nozzle 95 starts to blow out the clean gas. ) Is surrounded by clean gas and isolated from external atmosphere. In this isolation state or by moving the arm 92 while leaving the object 8 in the atmosphere of a general environment, as shown in FIG. 11, it is positioned at the processing position 85 and the manufacturing apparatus 83 is shown. The processing operation part 87 of the processing the to-be-processed object 8. In this process, the fan 2 is operated to generate an isolation state, so that the object 8 can be processed at high quality in a clean atmosphere. After the treatment, it is transferred to the next manufacturing apparatus or the processing product storage unit in the state of being enclosed in the isolation state or the atmosphere of the general environment.

In order to prevent unwanted substances such as dust generated due to abrasion of the mechanical operation of the processing operation part 87 from falling on the object 8 to be attached, the processing operation part 87 is to be downstream of the airflow. The nozzles 95 and 96 are arranged in consideration of the airflow conditions, such as the position of the outlet 98 at which the nozzle 95 starts to be blown and the suction port 99 of the suction nozzle 96, and It can form an atmosphere.

Moreover, it is preferable to supply nitrogen gas or air as a purifier supplied in order to make the local clay space which surrounds the to-be-processed object 8. When nitrogen gas is supplied as a clean gas, the local clean space surrounding the to-be-processed object 8 can be made into an inert atmosphere. In addition, when air is supplied as a clean gas, the cost can be reduced.

The nozzle structure is provided so that the atmosphere around the object (8) that is infiltrated by an undesired substance in the general environment, such as dust, does not induce the external atmosphere around the atmosphere to supply or clean the gas. It can prevent by devising or the like. For this reason, clean gas is supplied from the gas supply pipe 14 through the clean filter 15 by the intake apparatus 24. This supply amount is adjusted by controlling the opening and closing of the valve 43g and opening degree, for example. If the flow of the atmosphere surrounding the to-be-processed object 8 is a suitable state, the invasion of unnecessary substances, such as dust in a general environment, can be prevented more favorable, and the atmosphere of the process space at the time of a process can be stably maintained.

Since the space around the object 8 is extremely small compared to the clean room, the operation conditions of the circulating discharge amount and the selection of the filter to determine the cycle recovery of the atmosphere {the filter is a high performance filter (HEPA filter) and a neutral filter according to the purpose). By selecting an active filter or an activated carbon adsorption filter for removing harmful components, the surroundings of the object 8 can be freely set to a desired clean atmosphere. In addition, the frequency of filter replacement is reduced to the minimum, the amount of clean gas (air, nitrogen gas, etc.) supplied to the clean space around the object to be treated is reduced, or the miniaturization and energy saving of motive equipment such as a blower fan are reduced. Can be carried out.

In addition, there is a method that can use an inexpensive neutral performance filter to form an atmosphere of high cleanliness equal to or higher than that of a high performance filter. For example, using a gas, vapor, or fine droplets (mist) of a substance having a function of physically and chemically removing dust or undesired substances present in the atmosphere surrounding the object to be treated 8, 8) The inside of the clean gas supplied to enclose it can be mixed and discharged from the periphery of the object (8) to the outside. In this case, the dust or unnecessary substance present around the to-be-processed object 8 can be removed more effectively. In detail, in FIG. 11, FIG. 12, it is supplied from the gas supply line 14 by the intake apparatus 24, and has a function which removes dust and an unnecessary substance in the clean gas which passed the filter 15. In FIG. The gas, vapor, and minute droplets generated from the gas, vapor, and droplet generator 29 of the material are mixed and supplied to surround the object 8 at the nozzle 95 that starts to blow. The mixed gas is sucked into the suction nozzle 96 after being in contact with the dust or unnecessary constituent substances present in the vicinity of the workpiece 8 and exhausted out of the vicinity of the workpiece 8. This method is capable of obtaining an atmosphere of extremely high cleanliness compared to a method using only clean gas.

Example 8

A schematic diagram of Embodiment 8 of the present invention is shown in FIG. In the robot apparatus of the eighth embodiment, a cleaner gas curtain is provided so as to surround the space between the nozzle 95 and the suction nozzle 96, which start to blow, in a cylindrical shape.

That is, as shown in FIG. 13, the nozzle 95 which starts to blow has the nozzle 39a and 39b which start blowing for gas curtain in the seat of the exit 98 which starts to blow, and branches off from the flow path 97. FIG. The clean gas is supplied from the supply pipe 38 to the nozzles 39a and 39b to start blowing.

In addition, the suction nozzle 96 holds the gas curtain suction nozzles 40a and 40b at the edge of the suction port 99 and joins the sucked gas from the discharge pipe 42 into the flow path 100.

In the eighth embodiment, since the majority of the clean gas that has started to blow from the nozzles 39a and 39b is to be sucked from the nozzles 40a and 40b, it starts to blow from the outlet 98 which starts to blow and directly to the workpiece 8. In the surrounding clean gas, it is difficult to mix dust and undesired substances in the atmosphere of general environment, and it can form a local clean space with extremely high cleanliness in the external environment.

In Fig. 13, the supply pipe 38 is not branched from the flow path 97, but the intake apparatus is supplied to the nozzles 39a and 39b which start to blow the clean gas generated by passing gas intaken from the general environment through the filter. Alternatively, the discharge pipe 42 may be an exhaust for exhausting the gas sucked from the suction nozzles 40a and 40b to the outside from the exhaust device without joining the flow path 100.

Instead of the intake apparatus, it is also possible to supply a clean gas by supplying a cylinder. Furthermore, the gas exhausted from the exhaust device can be recovered and used again as a clean air stream through the filter.

Example 9

A schematic diagram of Embodiment 9 of the present invention is shown in FIG. The robot apparatus of Example 9 is fixed to the arm 92 so that the holding | maintenance part 94 may be covered by the hood 103 instead of the nozzle 95 and the suction nozzle 96 which start blowing in Example 7, and it will intake The purge gas which has been cleaned by the device 24 through the filter 15 from the general environment is started to blow from the opening 103a of the hood 103 toward the atmosphere of the general environment. In addition, the holding part 94 is penetrated by the rectifying plate 104.

The hood 103 has an opening 103a larger than the object 8, an accommodating space 103b for accommodating the object 8, an outlet 103c at which the clean gas starts to blow, and the like. The treatment object 8 is held by the holding part 940 in the accommodation space 103b of the hood 103. The opening part 103a has the size which covered the to-be-processed object 8, for example, It is formed so as to have a diameter longer than the long side of the to-be-processed object 8.

The holding portion 94 is extended outward in the receiving space 103b of the hood 103, and if necessary, the holding portion 94 is rotated to reach the workpiece storage portion to hold the workpiece 8 ( In the drawing, the workpiece 8 is accommodated into the accommodation space 103b of the hood by reducing or reversing the holding portion 94). This structure is useful in the case where there is little generation of dust and an unnecessary component material in the to-be-processed object 8 itself and in the process operation part 87, and a structure is simple. The supply amount of the clean gas is adjusted by controlling the opening and opening of the valves 43o and 43p, for example.

Example 10

15 is a schematic diagram of Embodiment 10 of the present invention. The robot apparatus of the tenth embodiment, in the configuration of the ninth embodiment, further provides a clean gas curtain generating means for generating a clean gas curtain so as to intercept the opening 103a of the hood, and the partition plate into the accommodation space 103b of the hood. (44) is provided to provide an outlet (103c) which starts blowing between the hood (103) and the partition plate (44), and a suction port (103d) is provided between the partition plates (44, 44).

The clean gas curtain generating means has a nozzle 39c for blowing the gas curtain and an intake nozzle 40c for the gas curtain at the edge of the opening 103a of the hood, and the filter 3 is operated by the operation of the fan 2. Is supplied to the outlet 103c from which the nozzle 39c starts to drain from the supply tank 38 and starts to blow, and the gas is sucked in from the nozzle 40c and the suction port 103d.

In the tenth embodiment, since most of the clean gas that has started to blow from the nozzle 39c is sucked from the nozzle 40c, the clean gas that starts to blow from the outlet 103c that starts blowing and directly surrounds the object 8 to be processed. It is difficult to mix dust and undesired substances in the atmosphere of general environment, and it is possible to form a local clean space with extremely high cleanliness in the external environment. From the outlet 103c which starts to blow, it starts blowing, and the clean gas which directly enclosed the to-be-processed object 8 is sucked in from the intake port 103d, This sucked gas passes through the filter 3, and becomes a clean gas, Blowing starts from the nozzle 39c or the outlet 103c starting to blow.

The supply amount of the clean gas is adjusted by controlling the opening and closing of the valves 43c, 43d, 43e, 43f and 43g, for example.

In Fig. 15, the nozzle 39c which starts to be blown does not supply the clean gas from the supply pipe 38, but the clean gas generated by passing the gas sucked in the general environment through the filter 15 through the intake device 24 is passed. It is possible to supply or exhaust the gas sucked from the suction nozzle 40c to the outside in the exhaust device without confluence with the gas sucked from the suction port 103d.

Instead of the intake apparatus, a clean gas can be supplied by bobbin supply. Moreover, the gas exhausted from the exhaust device can be recovered and reused as a clean gas through the filter.

In the tenth embodiment, compared to the ninth embodiment, the flow of the clean gas in the accommodation space 103b can be a stable flow, and the interior of the storage space 103b can be a high clean atmosphere. By making the storage space 103b the atmosphere of a stable flow, temperature can be made more uniform on the whole to-be-processed object 8, and more uniform heating can be performed. Therefore, when the bonding process is performed, for example, by the position of the atmosphere in the space 103b, it is possible to prevent the phenomenon that the shape of the initial ball caused by the difference in the flow is disturbed, or the initial ball does not occur or does not occur. can do.

Example 11

A schematic diagram of Embodiment 11 of the present invention is shown in FIG. The robot apparatus of the eleventh embodiment, in addition to the constitution of the seventh embodiment, further comprises a detecting means for detecting the concentration of dust or unnecessary powder present in the atmosphere surrounding the to-be-processed object 8 or the temperature and humidity. It is provided with a control means having a function of controlling the cleaning means of the concentration, temperature, humidity, cleanliness.

As shown in FIG. 16, the detection sensor 31a provided in the space between the nozzles 95 and 96 informs the detection device 32 of the state of cleanliness, concentration, temperature, humidity, etc. of each space portion in which they are arranged. The control device 33 compares the actual atmosphere detected by the detecting device 32 with the desired state and the like to be maintained in order to process the object 8, Based on the results, the operation conditions are found so that the actual state approaches the state of fire fighting, and the fan 2, the flow control valves 43o, 43p, 43g for controlling the flow of gas, and the intake apparatus 24 are operated. It is meant to convey information. In addition, the detector 32 or the control device 33 may be outside the main body 91.

In Example 11, the clean space of the part surrounding the to-be-processed object 8 can be approached in a desired state, and a process can be made more appropriate.

(Example 12)

A schematic diagram of Embodiment 12 of the present invention is shown in FIG. The robot apparatus of the twelfth embodiment, in addition to the configuration of the eighth embodiment, includes a detecting means for detecting the concentration of dust or undesired substances present in the atmosphere surrounding the object 8, temperature or humidity, and the like. It is provided with a control means having a function of controlling the cleaning means in concentration, temperature, humidity, cleanliness. As shown in FIG. 17, by the detection sensor 31a provided in the space between the nozzles 95 and 96, the state of the cleanliness, density | concentration, temperature, humidity, etc. of each space part which arrange | positioned them, the detection apparatus 32 The control device 33 compares the actual atmosphere detected by the detecting device 32 with the desired state and the like to be maintained in order to process the to-be-processed object 8. On the basis of the results, the operating conditions are found so that the actual state approaches the desired state, and the fan 2, flow control valves 43o, 43p, 43g for controlling the flow of gas and the intake apparatus 24 are used. It is supposed to convey driving information. In addition, the detection device 32 or the control device 33 may be outside the main body 91.

In the twelfth embodiment, the clean space of the local area surrounding the object 8 can be approached in a desired state, and the processing can be made more appropriate.

(Example 13)

18 is a schematic diagram of an embodiment (13) of the present invention. The robot apparatus of the embodiment (13), in addition to the configuration of the embodiment (9), detection means for detecting the concentration of dust or unnecessary component mass present in the atmosphere surrounding the object 8, the temperature or humidity, and the like. And control means having a function of controlling the cleaning means at a desired concentration, temperature, humidity, and cleanliness.

As shown in FIG. 18, by the detection sensor 31a provided in the accommodation space 103b of the hood 103, the state of the cleanliness, density | concentration, temperature, humidity, etc. of each space part arrange | positioned these, etc. 32 is detected. The control device 32 compares the actual atmosphere detected by the detecting device 32 with the desired state and the like to be maintained in order to process the object 8, and the difference On the basis of the result, the operating conditions are found to approach the desired state, and the operation information is transmitted to the flow control valves 43o, 43p, 43g and the intake device 24 that control the flow of gas. It is. In addition, the detection device 32 or the control device 33 may be outside the main body 91.

In Example 13, the local clean space surrounding the to-be-processed object 8 can be made accessible with a desired state, and a process can be made more suitable.

Example 4

A schematic diagram of Embodiment 14 of the present invention is shown in FIG. The robot apparatus of Example 14 has, in addition to the configuration of Example 10, detecting means for detecting the concentration of dust or unnecessary constituent substances present in the atmosphere surrounding the object 8, temperature or humidity, and the like. It is provided with a control means having a function of controlling the cleaning means in concentration, temperature, humidity, cleanliness.

As shown in FIG. 19, the detection sensor 31a provided in the accommodation space 103b of the hood 103 detects the state of cleanliness, density, temperature, humidity, etc. of each space part which arrange | positioned them. ), And the control device 33 compares the actual atmosphere detected by the detecting device 32 with a desired state and the like to be maintained in order to process the object 8, and Based on the results of the car, the flow control valves 43c, 43d, 43e, 43f, 43g, 43g which finds the operating condition so that the actual state approaches the desired state and controls the flow of the fan 2 and the gas And operating information to the intake apparatus 24. In addition, the detection device 32 or the control device 33 may be outside the main body 91.

In Example 14, the local clean space surrounding the to-be-processed object 8 can be approached in a desired state, and a process can be made more appropriate.

Experimental Example

20 is a perspective view of a wire bonding apparatus with a cleaning unit in which the present invention is actually used.

Reference numeral 62 denotes a fan for a clean unit, 63 denotes a HEPA filter for dust recovery, and the operating condition under which the fan 62 is controlled is circulated at the source to produce clean air by circulating the atmosphere of the entire apparatus.

The clean air passes through the guide portion 64 provided above the apparatus, is rectified by the rectifying plate 65, and descends the space 66 for performing the bonding process. The bonding processing space 66 includes a processing support plate 67 heated at 300 ° C. and a circular loop 68 of a workpiece to which a ger is placed. The bonding driver 69 performs a bonding process on the circuit board 68. In addition, in order to make only the atmosphere near the circuit board 68 locally more clean than the whole inside the apparatus, clean air is discharged from the nozzle 70 which starts to blow, and most of the discharged air is supplied to the suction nozzle 71. It is aspirated and recovered. The recovered air is discharged out of the unit. The atmosphere of the bonding processing space 66 is rectified by the rectifying plates 72a, 72b, and 73, passes through the deriving portions 74, 75, and the trocar is joined to form clean air by the filter 63. Circulate By the clean air curtain formed by the flow between the nozzle 70 and the suction nozzle 71 which start to blow, the local atmosphere on the circuit board 68 is in a state of higher cleanliness than in the apparatus. In addition, this manufacturing apparatus is operable to remove dust adhering to the surface of the circuit board 68 using this air curtain before performing the bonding process.

The method of claim 1, wherein the forming of the light blocking layer comprises stacking an opaque metal and then patterning the light blocking layer.

The method of manufacturing a color filter of a liquid crystal display device according to claim 1, wherein the forming of the light shielding layer is performed by laminating an opaque metal and then patterning it. The time change of the dust concentration in each atmosphere is shown in FIG. The particle size of the dust target to be measured is 0.5 micron or more and is represented by the number in the volume of 1 foot cubic. In addition, the measurement target space is a manufacturing apparatus, which is a general environment workshop (* table) in which a bonding apparatus is installed, and a center line of a processing space 66 in the apparatus shown in FIG. The first clean space in the apparatus). It can be seen that the atmosphere on the circuit board 68 surrounded by the air curtain becomes the cleanest state early.

In addition, in FIG. 22, 350 degreeC superheated steam is mixed in the clean gas discharge | emitted from the nozzle 70 which starts to blow, and it is located in the vicinity of the circuit board 68 when it is supplied on the conditions of the same flow volume ((Table :): The result of the secondary clean space in the same apparatus is displayed compared with the case where it did not mix (○ table: secondary clean space in the same apparatus). By mixing the superheated steam in the clean air, it can be seen that the time change in which the dust concentration is lowered is large, and finally the attained concentration is also good.

23 shows a comparison of the dust concentration time change of the atmosphere in the center of the clean room and the atmosphere of the bonding apparatus 68 in the bonding apparatus. The size of the clean room compared in this experiment is 20m in width X 10m in length X 5m in height. In this figure, it takes about two hours until the inside of the clean room becomes a state capable of bonding (100 pieces / ft ³ or less), and in the bonding apparatus of the present invention, about one hour from the start of operation of the cleaning mechanism. In this way, the bonding process of the circuit board became possible.

Claims (46)

In order to process the object to be processed such as parts or products in a room of a general environment, a cleaner environment than a general environment is formed in the device, and only a processing space of the object to be treated is locally clean. And a cabinet for discriminating, and at least one of circulation means for circulating the atmosphere in the cabinet through a filter or supply means for supplying clean gas into the cabinet. In order to process the object to be processed such as parts or products in a room of a general environment, a cleaner environment than a general environment is formed in the device, and only a processing space of the object to be treated is locally clean. A cabinet for distinguishing and a clean unit connected to the cabinet, wherein the clean unit includes at least one of circulation means for circulating the atmosphere in the cabinet through a filter or supply means for supplying clean gas into the cabinet; Characterized in that the manufacturing apparatus. The manufacturing apparatus according to claim 1, further comprising means for forming a clean gas in a linear or curtain shape around the object, and forming a processing space having a higher cleanness than the external environment. The apparatus according to claim 1, further comprising: detecting means for detecting cleanliness in the apparatus, and at least one of the circulation means or the supply means, based on the cleanliness data detected by the detecting means, to maintain the cleanliness of the space in the apparatus. Manufacturing apparatus characterized by having a control means. The production apparatus according to claim 1, further comprising mixing means for mixing vapor, droplets, or gas of a substance having a function of removing dust or unnecessary constituent substances into a clean gas. A manufacturing apparatus having a cleaning mechanism for increasing cleanliness of a part of local space in a device for processing a to-be-processed object such as a part or a product in a room of a general environment, comprising: a partition for distinguishing between the to-be-processed object and the general environment, And a means for forming a clean gas in a linear or curtain shape on the open surface of the partition, and forming a clean local processing space capable of processing the object. In order to process the object to be treated such as parts or products in a room of a general environment, a cleaner environment than a general environment is formed in the device, and only the processing space of the object to be treated is locally clean, and between the device external environment and the inside of the device is avoided. A manufacturing apparatus for moving a processed object, the apparatus comprising: a cabinet for distinguishing the inside of the apparatus from a general environment, and at least one of circulation means for circulating the atmosphere in the cabinet through a filter or supply means for supplying clean gas into the cabinet. And an carry-in reserve chamber for removing unnecessary components attached to the object by a clean gas outside the cabinet. 7. A manufacturing apparatus according to claim 6, comprising mixing means for mixing vapor, droplets, or gas of a substance having a function of removing dust or unnecessary constituent substances into a clean gas. A robot apparatus having an arm for holding a holding portion for holding a workpiece, and arm driving means for moving the arm to move the workpiece to a processing position, comprising: a blower having a diameter longer than a long side of the workpiece; And a first nozzle for retaining the object to be treated and blowing a clean gas from the tuyeres so as to surround the object to be isolated from the external atmosphere. 10. The robot apparatus as claimed in claim 9, wherein the tuyere is sized to cover the object. 10. The robot apparatus according to claim 9, further comprising: first nozzle fixing means for fixing the first nozzle to the arm such that the tuyeres are directed to the workpiece. 12. The apparatus of claim 11, further comprising: a second nozzle having a blower having a diameter longer than the long side, and sucking a gas surrounding the object to be treated from the suction port, and allowing the suction nozzle to face the blower. And a second nozzle fixing means fixed to said arm, said holding portion holding said object to be processed in a space between said blower opening and said suction opening. 13. The robot apparatus according to claim 12, wherein the suction port has a size covering the object to be treated. The cleaning function according to claim 12 or 13, further comprising a circulation means for removing dust or unnecessary constituent substances from the gas sucked into the second nozzle and blowing air from the first nozzle as the clean gas. Possessed robot device. The cleaning function according to claim 12 or 13, wherein the holding portion moves out of the space between the tuyeres and the suction port to hold the object to be processed, and then moves the object to be placed in the space. Robotic device that holds. The cleaning function according to any one of claims 9 to 13, comprising means for forming the cleaning gas in a linear or curtain shape so as to surround the cleaning gas blown from the tuyeres in a tubular shape. Robotic device that holds. The control means according to any one of claims 9 to 13, wherein the control means controls at least one selected from the group consisting of dust in the space between the tuyeres and the suction port or unnecessary concentrations of constituent substances, temperature, and humidity. Robot device having a clean function, characterized in that provided. The robot apparatus with a clean function according to any one of claims 9 to 13, comprising a supply means for supplying nitrogen gas or air as said clean gas. A robot apparatus having an arm having a holding portion for holding a workpiece, and a driving means for moving the arm to move the workpiece to a processing position, the robot apparatus including an opening having a diameter longer than a long side of the workpiece and A hood having a receiving space accommodating the object to be processed, a blower for blowing a clean gas so as to surround the object to be processed contained in the accommodation space and to be isolated from the external atmosphere, and hood fixing means for fixing the hood to the arm; Robot device having a clean function, characterized in that provided. 20. The robot apparatus as claimed in claim 19, wherein the opening covers the object to be covered. 20. The cleaning function according to claim 19, wherein the hood has means for forming a clean gas in a linear or curtain shape so that the hood covers the clean gas in the receiving space, and a suction port for sucking the clean gas. Possessed robot device. 22. The robot apparatus according to claim 21, wherein the suction port has a diameter longer than a long side of the workpiece. 23. The robot apparatus as claimed in claim 22, further comprising a circulation means for removing dust or unnecessary constituent substances from the gas sucked from the suction port and blowing air from the tuyeres as the clean gas. 24. The apparatus according to any one of claims 19, 20, 22 or 23, wherein the holding portion moves out of the opening to hold the object, and then moves to receive the object into the receiving space. Robot device having a clean function, characterized in that. 24. The control apparatus according to any one of claims 19, 20, 22 or 23, further comprising control means for controlling at least one selected from the group consisting of dust or unnecessary concentrations of constituent substances and humidity in the accommodation space. Robot device having a clean function, characterized in that. 24. The robot apparatus according to any one of claims 19, 20, 22 or 23, comprising supply means for supplying nitrogen gas or air as said clean gas. A to-be-processed object moving step of moving a workpiece to a position to be treated, a first nozzle moving step of moving a first nozzle toward the to-be-processed object, and blowing a clean gas from the first nozzle And a clean step of enclosing the object with the clean gas to isolate the object from the external atmosphere. 28. The method of claim 27, wherein the first nozzle is fixed to an arm that holds the workpiece so that the tuyeres face the workpiece, and the workpiece is moved together with the first nozzle in the first nozzle movement step. The cleaning method, characterized in that for moving to the processing position. 29. The cleaning method according to claim 28, wherein said first nozzle moving step and said cleaning step are performed simultaneously. 30. The cleaning method according to any one of claims 27 to 29, wherein the cleaning step is performed after finishing the movement of the workpiece. 30. The cleaning process according to any one of claims 27 to 29, wherein the cleaning gas is blown from the tuyeres in the cleaning step, and a second nozzle of the suction port sucks gas surrounding the to-be-processed object. How to clean. 32. The cleaning method according to claim 31, wherein in the cleaning process, dust or unnecessary ingredient materials are removed from the gas sucked from the suction port and blown from the tuyeres as the clean gas. 33. The cleaning method according to claim 32, wherein the cleaning gas is formed in a linear shape or a curtain shape so as to surround the clean gas blown from the tuyeres in a tubular shape in the cleaning process. 34. The method of claim 33, wherein the arm moves out of the space between the tuyeres and the suction port to hold the workpiece in the step of moving the workpiece, and then moves to position the workpiece into the space. Clean method. 30. The process according to any one of claims 27 to 29, wherein at least one selected from the group consisting of dust, undesired concentrations of components of the processing object to be treated, and temperature and humidity isolated from the external atmosphere is controlled. Clean method comprising the. The cleaning method according to any one of claims 27 to 29, wherein nitrogen gas or air is supplied as the cleaning gas in the cleaning process. A moving step of holding the object to be processed in the holding portion of the arm of the robot in the receiving space of the hood and moving the arm to move the hood to the processing position together with the object to be treated; and a clean gas into the receiving space. And a cleaning step surrounded by the clean gas to blow the air to isolate the object from the external atmosphere. 38. The method of claim 37, wherein in the cleaning process, the cleaning gas is formed in a linear or curtain shape at the opening of the hood to cover the cleaning gas in the accommodation space, and the cleaning gas in the accommodation space is discharged. Clean method. The cleaning method according to claim 38, wherein in the cleaning process, dust or unnecessary constituent substances are removed from the gas discharged from the accommodation space and blown into the accommodation space as the clean gas. 40. The method according to any one of claims 37 to 39, wherein the holding portion moves out of the opening of the hood to hold the object in the moving step and then moves to receive the object into the receiving space. Clean method characterized by. 40. The process according to any one of claims 37 to 39, wherein the step of controlling at least one selected from the group consisting of dust or undesired concentrations of components of the processing space of the workpiece to be isolated from the external atmosphere, temperature, and humidity. Clean method comprising the. 40. The cleaning method according to any one of claims 37 to 39, wherein nitrogen gas or air is supplied as the clean gas in the clean process. The manufacturing apparatus according to claim 2, further comprising means for forming a clean gas in a linear or curtain shape around the object, and forming a processing space having a higher cleanness than the external environment. 3. The control according to claim 2, wherein the detecting means for detecting the cleanliness in the apparatus is controlled, and at least one of the circulation device or the supply means is controlled by the cleanliness data detected by the force detecting means, and the cleanness of the space in the apparatus is maintained. A manufacturing apparatus comprising a means. The manufacturing apparatus according to claim 2, further comprising mixing means for mixing vapor, droplets, or gas of a substance having a function of removing dust or unnecessary constituent substances into a clean gas. 8. A manufacturing apparatus according to claim 7, characterized by comprising mixing means for mixing vapor, droplets or gases of a substance having a function of removing dust or unnecessary constituent substances into a clean gas.

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