MY120929A - Manufacturing apparatus with cleaning mechanism and cleaning method for forming locally clean processing space - Google Patents

Manufacturing apparatus with cleaning mechanism and cleaning method for forming locally clean processing space

Info

Publication number
MY120929A
MY120929A MYPI97001349A MYPI9701349A MY120929A MY 120929 A MY120929 A MY 120929A MY PI97001349 A MYPI97001349 A MY PI97001349A MY PI9701349 A MYPI9701349 A MY PI9701349A MY 120929 A MY120929 A MY 120929A
Authority
MY
Malaysia
Prior art keywords
clean
processing space
manufacturing apparatus
atmosphere
cleaning mechanism
Prior art date
Application number
MYPI97001349A
Inventor
Yuji Tsutsui
Makoto Morita
Hiroyuki Naka
Akihiro Yamamoto
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7353596A external-priority patent/JPH09264575A/en
Priority claimed from JP11597396A external-priority patent/JP3168914B2/en
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of MY120929A publication Critical patent/MY120929A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

Abstract

PROVIDED INSIDE A MANUFACTURING APPARATUS IS A CLEANING MECHANISM FOR MAKING THE MANUFACTURING -APPARATUS INTERIOR AND THE PROCESSING SPACE THEREOF INTO A CLEANER ATMOSPHERE THAN THE OUT-OF-APPARATUS ENVIRONMENT. THAT IS, THE ATMOSPHERE IN THE APPARATUS DIVIDED BY A CABINET (1) FROM A GENERAL ENVIRONMENT IS CIRCULATED THROUGH A FILTER (3) AS CLEAN ATMOSPHERE BY USING A FAN (2) AS POWER SOURCE AND A CLEAN AIR PASSED THROUGH A CLEAN FILTER (15) FROM A GAS FEED PIPE (14) IS FED TO THE APPARATUS INTERIOR. ACCORDING TO SUCH AN ARRANGEMENT, SINCE A PROCESSING SPACE IN THE APPARATUS CAN BE KEPT TO A CLEAN STATE AT ALL TIMES AND THIS MANUFACTURING APPARATUS IS PROVIDED IN A GENERAL ENVIRONMENT, AN INEXPENSIVE CLEAN SPACE IS IMPLEMENTABLE WITHOUT NEED FOR AN ENORMOUS INVESTMENT OR MAINTENANCE AND MANAGEMENT COST, UNLIKE CLEAN ENVIRONMENTAL PLANT SUCH AS GENERAL CLEAN ROOMS OR CLEAN SPATIAL PASSAGE DEVICE. THE PRESENT INVENTION IS THUS CONTRIBUTABLE TO A QUALITY IMPROVEMENT AND COST REDUCTION OF PRODUCTS.(FIG. 1)
MYPI97001349A 1996-03-28 1997-03-28 Manufacturing apparatus with cleaning mechanism and cleaning method for forming locally clean processing space MY120929A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7353596A JPH09264575A (en) 1996-03-28 1996-03-28 Manufacturing device and cleaning method
JP11597396A JP3168914B2 (en) 1996-05-10 1996-05-10 Robot device with cleaning function and cleaning method

Publications (1)

Publication Number Publication Date
MY120929A true MY120929A (en) 2005-12-30

Family

ID=30002097

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI97001349A MY120929A (en) 1996-03-28 1997-03-28 Manufacturing apparatus with cleaning mechanism and cleaning method for forming locally clean processing space

Country Status (4)

Country Link
KR (1) KR100308365B1 (en)
MY (1) MY120929A (en)
SG (2) SG98361A1 (en)
TW (1) TW353137B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100854292B1 (en) * 2007-03-09 2008-08-26 조영호 Clean booth
JP7129793B2 (en) 2018-03-06 2022-09-02 シャープ株式会社 Welding equipment

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7215945A (en) * 1972-11-24 1974-05-28
US4927438A (en) * 1987-12-01 1990-05-22 Varian Associates, Inc. Horizontal laminar air flow work station
JPH0756879B2 (en) * 1988-03-31 1995-06-14 日鉄セミコンダクター株式会社 Semiconductor dust-free manufacturing equipment
FR2659782B1 (en) * 1990-03-14 1992-06-12 Sgn Soc Gen Tech Nouvelle METHOD AND DEVICE FOR DYNAMIC SEPARATION OF TWO ZONES.
JPH04287341A (en) * 1991-03-18 1992-10-12 Fujitsu Ltd Handling equipment of wafer
JPH05205988A (en) * 1992-01-24 1993-08-13 Fujitsu Ltd Manufacturing device for dust-free room
US5316560A (en) * 1993-03-19 1994-05-31 Hughes Aircraft Company Environment control apparatus

Also Published As

Publication number Publication date
SG98361A1 (en) 2003-09-19
KR100308365B1 (en) 2001-11-30
TW353137B (en) 1999-02-21
SG114601A1 (en) 2005-09-28
KR970077092A (en) 1997-12-12

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