SG114601A1 - Robot system - Google Patents

Robot system

Info

Publication number
SG114601A1
SG114601A1 SG200300803A SG200300803A SG114601A1 SG 114601 A1 SG114601 A1 SG 114601A1 SG 200300803 A SG200300803 A SG 200300803A SG 200300803 A SG200300803 A SG 200300803A SG 114601 A1 SG114601 A1 SG 114601A1
Authority
SG
Singapore
Prior art keywords
robot system
robot
Prior art date
Application number
SG200300803A
Inventor
Tsutsui Yuji
Morita Makoto
Naka Hiroyuki
Yamamoto Akihiro
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7353596A external-priority patent/JPH09264575A/en
Priority claimed from JP11597396A external-priority patent/JP3168914B2/en
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of SG114601A1 publication Critical patent/SG114601A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
SG200300803A 1996-03-28 1997-03-27 Robot system SG114601A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7353596A JPH09264575A (en) 1996-03-28 1996-03-28 Manufacturing device and cleaning method
JP11597396A JP3168914B2 (en) 1996-05-10 1996-05-10 Robot device with cleaning function and cleaning method

Publications (1)

Publication Number Publication Date
SG114601A1 true SG114601A1 (en) 2005-09-28

Family

ID=30002097

Family Applications (2)

Application Number Title Priority Date Filing Date
SG9701006A SG98361A1 (en) 1996-03-28 1997-03-27 Manufacturing apparatus with cleaning machanism and cleaning method
SG200300803A SG114601A1 (en) 1996-03-28 1997-03-27 Robot system

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG9701006A SG98361A1 (en) 1996-03-28 1997-03-27 Manufacturing apparatus with cleaning machanism and cleaning method

Country Status (4)

Country Link
KR (1) KR100308365B1 (en)
MY (1) MY120929A (en)
SG (2) SG98361A1 (en)
TW (1) TW353137B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100854292B1 (en) * 2007-03-09 2008-08-26 조영호 Clean booth
JP7129793B2 (en) 2018-03-06 2022-09-02 シャープ株式会社 Welding equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0335752A2 (en) * 1988-03-31 1989-10-04 Kabushiki Kaisha N.M.B. Semiconductor System for manufacturing semiconductors under clean condition
JPH04287341A (en) * 1991-03-18 1992-10-12 Fujitsu Ltd Handling equipment of wafer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7215945A (en) * 1972-11-24 1974-05-28
US4927438A (en) * 1987-12-01 1990-05-22 Varian Associates, Inc. Horizontal laminar air flow work station
FR2659782B1 (en) * 1990-03-14 1992-06-12 Sgn Soc Gen Tech Nouvelle METHOD AND DEVICE FOR DYNAMIC SEPARATION OF TWO ZONES.
JPH05205988A (en) * 1992-01-24 1993-08-13 Fujitsu Ltd Manufacturing device for dust-free room
US5316560A (en) * 1993-03-19 1994-05-31 Hughes Aircraft Company Environment control apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0335752A2 (en) * 1988-03-31 1989-10-04 Kabushiki Kaisha N.M.B. Semiconductor System for manufacturing semiconductors under clean condition
JPH04287341A (en) * 1991-03-18 1992-10-12 Fujitsu Ltd Handling equipment of wafer

Also Published As

Publication number Publication date
SG98361A1 (en) 2003-09-19
KR100308365B1 (en) 2001-11-30
TW353137B (en) 1999-02-21
MY120929A (en) 2005-12-30
KR970077092A (en) 1997-12-12

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