SG98361A1 - Manufacturing apparatus with cleaning machanism and cleaning method - Google Patents

Manufacturing apparatus with cleaning machanism and cleaning method

Info

Publication number
SG98361A1
SG98361A1 SG9701006A SG1997001006A SG98361A1 SG 98361 A1 SG98361 A1 SG 98361A1 SG 9701006 A SG9701006 A SG 9701006A SG 1997001006 A SG1997001006 A SG 1997001006A SG 98361 A1 SG98361 A1 SG 98361A1
Authority
SG
Singapore
Prior art keywords
cleaning
machanism
manufacturing apparatus
cleaning method
manufacturing
Prior art date
Application number
SG9701006A
Inventor
Tsutsui Yuhi
Morita Makoto
Naka Hiroyuki
Yamamoto Akihiro
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7353596A external-priority patent/JPH09264575A/en
Priority claimed from JP11597396A external-priority patent/JP3168914B2/en
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of SG98361A1 publication Critical patent/SG98361A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
SG9701006A 1996-03-28 1997-03-27 Manufacturing apparatus with cleaning machanism and cleaning method SG98361A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7353596A JPH09264575A (en) 1996-03-28 1996-03-28 Manufacturing device and cleaning method
JP11597396A JP3168914B2 (en) 1996-05-10 1996-05-10 Robot device with cleaning function and cleaning method

Publications (1)

Publication Number Publication Date
SG98361A1 true SG98361A1 (en) 2003-09-19

Family

ID=30002097

Family Applications (2)

Application Number Title Priority Date Filing Date
SG9701006A SG98361A1 (en) 1996-03-28 1997-03-27 Manufacturing apparatus with cleaning machanism and cleaning method
SG200300803A SG114601A1 (en) 1996-03-28 1997-03-27 Robot system

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG200300803A SG114601A1 (en) 1996-03-28 1997-03-27 Robot system

Country Status (4)

Country Link
KR (1) KR100308365B1 (en)
MY (1) MY120929A (en)
SG (2) SG98361A1 (en)
TW (1) TW353137B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100854292B1 (en) * 2007-03-09 2008-08-26 조영호 Clean booth
JP7129793B2 (en) 2018-03-06 2022-09-02 シャープ株式会社 Welding equipment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944405A (en) * 1972-11-24 1976-03-16 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzook Ten Behoeve Van De Volksgezondheid Down-flow chamber
US4927438A (en) * 1987-12-01 1990-05-22 Varian Associates, Inc. Horizontal laminar air flow work station
US5145459A (en) * 1990-03-14 1992-09-08 SGN-Societe General Pour les Techniques Nouvelles Process and apparatus for the dynamic separation of two zones
US5316560A (en) * 1993-03-19 1994-05-31 Hughes Aircraft Company Environment control apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756879B2 (en) * 1988-03-31 1995-06-14 日鉄セミコンダクター株式会社 Semiconductor dust-free manufacturing equipment
JPH04287341A (en) * 1991-03-18 1992-10-12 Fujitsu Ltd Handling equipment of wafer
JPH05205988A (en) * 1992-01-24 1993-08-13 Fujitsu Ltd Manufacturing device for dust-free room

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944405A (en) * 1972-11-24 1976-03-16 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzook Ten Behoeve Van De Volksgezondheid Down-flow chamber
US4927438A (en) * 1987-12-01 1990-05-22 Varian Associates, Inc. Horizontal laminar air flow work station
US5145459A (en) * 1990-03-14 1992-09-08 SGN-Societe General Pour les Techniques Nouvelles Process and apparatus for the dynamic separation of two zones
US5316560A (en) * 1993-03-19 1994-05-31 Hughes Aircraft Company Environment control apparatus

Also Published As

Publication number Publication date
KR100308365B1 (en) 2001-11-30
TW353137B (en) 1999-02-21
MY120929A (en) 2005-12-30
SG114601A1 (en) 2005-09-28
KR970077092A (en) 1997-12-12

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