DE69804447D1 - Lithographisches system - Google Patents

Lithographisches system

Info

Publication number
DE69804447D1
DE69804447D1 DE69804447T DE69804447T DE69804447D1 DE 69804447 D1 DE69804447 D1 DE 69804447D1 DE 69804447 T DE69804447 T DE 69804447T DE 69804447 T DE69804447 T DE 69804447T DE 69804447 D1 DE69804447 D1 DE 69804447D1
Authority
DE
Germany
Prior art keywords
lithographisches
system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69804447T
Other versions
DE69804447T2 (en
Inventor
Pieter Kruit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MAPPER LITHOGRAPHY IP B.V., DELFT, NL
Original Assignee
TECHNISCHE UNIVERSITEIT DELFT DELFT
Technische Universiteit Delft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP19970201595 priority Critical patent/EP0881542A1/en
Application filed by TECHNISCHE UNIVERSITEIT DELFT DELFT, Technische Universiteit Delft filed Critical TECHNISCHE UNIVERSITEIT DELFT DELFT
Priority to PCT/NL1998/000297 priority patent/WO1998054620A1/en
Publication of DE69804447D1 publication Critical patent/DE69804447D1/en
Application granted granted Critical
Publication of DE69804447T2 publication Critical patent/DE69804447T2/en
Anticipated expiration legal-status Critical
Application status is Expired - Fee Related legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175Projection methods, i.e. transfer substantially complete pattern to substrate
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3175Lithography
    • H01J2237/31777Lithography by projection
DE1998604447 1997-05-26 1998-05-25 lithographic system Expired - Fee Related DE69804447T2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP19970201595 EP0881542A1 (en) 1997-05-26 1997-05-26 Lithography system
PCT/NL1998/000297 WO1998054620A1 (en) 1997-05-26 1998-05-25 Lithography system

Publications (2)

Publication Number Publication Date
DE69804447D1 true DE69804447D1 (en) 2002-05-02
DE69804447T2 DE69804447T2 (en) 2002-11-07

Family

ID=8228371

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998604447 Expired - Fee Related DE69804447T2 (en) 1997-05-26 1998-05-25 lithographic system

Country Status (7)

Country Link
US (1) US6335783B1 (en)
EP (2) EP0881542A1 (en)
JP (1) JP3356293B2 (en)
KR (1) KR100354158B1 (en)
AU (1) AU7677898A (en)
DE (1) DE69804447T2 (en)
WO (1) WO1998054620A1 (en)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999048129A1 (en) * 1998-03-20 1999-09-23 Etec Systems, Inc. Tandem optical scanner/stepper and photoemission converter for electron beam lithography
US6215128B1 (en) 1999-03-18 2001-04-10 Etec Systems, Inc. Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography
US7372485B1 (en) 1999-06-08 2008-05-13 Lightsurf Technologies, Inc. Digital camera device and methodology for distributed processing and wireless transmission of digital images
US7369161B2 (en) * 1999-06-08 2008-05-06 Lightsurf Technologies, Inc. Digital camera device providing improved methodology for rapidly taking successive pictures
US7103357B2 (en) * 1999-11-05 2006-09-05 Lightsurf Technologies, Inc. Media spooler system and methodology providing efficient transmission of media content from wireless devices
US7847833B2 (en) * 2001-02-07 2010-12-07 Verisign, Inc. Digital camera device providing improved methodology for rapidly taking successive pictures
US8212893B2 (en) * 1999-06-08 2012-07-03 Verisign, Inc. Digital camera device and methodology for distributed processing and wireless transmission of digital images
US6448568B1 (en) * 1999-07-30 2002-09-10 Applied Materials, Inc. Electron beam column using high numerical aperture photocathode source illumination
KR100738262B1 (en) 1999-07-30 2007-07-12 에텍 시스템즈, 인코포레이티드 A hybrid apparatus of photolithography and electron beam lithography and method of operating thereof
US6476401B1 (en) 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
US7610331B1 (en) * 2000-09-13 2009-10-27 Lightsurf Technologies, Inc. System and method for dynamic uploading and execution of applications and drivers between devices
AU7562000A (en) * 2000-09-18 2002-03-26 Mapper Lithography Ip Bv Field emission photocathode array for lithography system and lithography system provided with such an array
WO2002023576A1 (en) * 2000-09-18 2002-03-21 Mapper Lithography Ip B.V. Field emission photocathode array comprising an additional layer to improve the yield and electron optical imaging system using the same
US7305354B2 (en) 2001-03-20 2007-12-04 Lightsurf,Technologies, Inc. Media asset management system
WO2003040830A2 (en) * 2001-11-07 2003-05-15 Applied Materials, Inc. Optical spot grid array printer
JP2005533365A (en) 2001-11-07 2005-11-04 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Maskless photon - electron spot grid array printing device
US7724281B2 (en) 2002-02-04 2010-05-25 Syniverse Icx Corporation Device facilitating efficient transfer of digital content from media capture device
WO2003079116A1 (en) * 2002-03-19 2003-09-25 Mapper Lithography Ip B.V. Direct write lithography system
US7051040B2 (en) * 2002-07-23 2006-05-23 Lightsurf Technologies, Inc. Imaging system providing dynamic viewport layering
US6847164B2 (en) * 2002-12-10 2005-01-25 Applied Matrials, Inc. Current-stabilizing illumination of photocathode electron beam source
US7184137B1 (en) 2003-08-29 2007-02-27 Kla-Tencor Technologies Corporation Aerial reticle inspection with particle beam conversion
US6995830B2 (en) 2003-12-22 2006-02-07 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7227618B1 (en) 2004-03-24 2007-06-05 Baokang Bi Pattern generating systems
ES2357911T3 (en) * 2006-11-07 2011-05-03 Basf Se Laser marking of pigmented substrates.
BRPI0808446A2 (en) 2007-03-15 2014-08-05 Basf Se A coating composition, process for preparation thereof, substrate, process for preparing a marked substrate, and compound.
AT538185T (en) * 2007-08-22 2012-01-15 Datalase Ltd Laser-sensitive coating composition
WO2009059888A1 (en) * 2007-11-07 2009-05-14 Basf Se New fiber products
JP5645832B2 (en) 2008-10-27 2014-12-24 データレース リミテッドDatalase Ltd. Laser-sensitive aqueous composition for marking substrates
WO2011052060A1 (en) * 2009-10-29 2011-05-05 株式会社ブイ・テクノロジー Exposure device and photo mask
CN102597881B (en) 2009-11-12 2015-07-08 株式会社V技术 Exposure apparatus and photomask used therein
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8422895D0 (en) * 1984-09-11 1984-10-17 Texas Instruments Ltd Electron beam apparatus
DE3504714A1 (en) * 1985-02-12 1986-08-14 Siemens Ag Lithografiegeraet the generation of microstructures
US4820927A (en) * 1985-06-28 1989-04-11 Control Data Corporation Electron beam source employing a photo-emitter cathode
GB2260666B (en) * 1991-09-20 1995-12-20 Sharp Kk Time division multiplexed diode lasers
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography

Also Published As

Publication number Publication date
US6335783B1 (en) 2002-01-01
AU7677898A (en) 1998-12-30
JP2001509967A (en) 2001-07-24
KR20010013080A (en) 2001-02-26
WO1998054620A1 (en) 1998-12-03
JP3356293B2 (en) 2002-12-16
EP0986777B1 (en) 2002-03-27
KR100354158B1 (en) 2002-09-28
DE69804447T2 (en) 2002-11-07
EP0986777A1 (en) 2000-03-22
EP0881542A1 (en) 1998-12-02

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: MAPPER LITHOGRAPHY IP B.V., DELFT, NL

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee