KR100232593B1 - Etching system for plasma display panel and method thereof - Google Patents

Abstract

The present invention relates to a PDP peeling apparatus and method for removing all of the remaining photoresist on the front substrate and the remaining dry film on the rear substrate when forming the display electrode and the partition wall of the plasma display panel (PDP). The present invention relates to a stripping tank for removing residual photoresist on a front substrate, a stripping tank and a neutralization tank for removing a residual dry film on a rear substrate, and a remaining common process (pure shower, pure rinse, drying). And an air curtain mounted at the substrate inlet / outlet of the separation tank and the neutralization tank and the substrate inlet of the pure shower unit, respectively, for the remaining photoresist stripping process and the remaining dry film. Since the peeling process can be performed together, the entire PDP manufacturing line can be greatly reduced, thereby reducing the cost and installation space. It is effective.

Description

Peeling device for PDP (Plasma Display Panel) and its method

The present invention relates to a peeling apparatus for a plasma display panel (PDP) and a method thereof. In particular, both the photoresist on the front substrate and the remaining dry film on the rear substrate are formed when the display electrode and the partition wall of the PDP are formed. The present invention relates to a peeling apparatus for PDP that can be removed, and a method thereof.

In general, the PDP is a light emitting device that displays an image by using a gas discharge phenomenon occurring in each discharge cell. The manufacturing process is simple, the screen is easy to be enlarged, and the response speed is fast. BACKGROUND ART In particular, a display device of an image display device for the HDTV (High Definition TeleVision) era has been in the spotlight.

One typical PDP includes a front substrate 1 which is a display surface of an image as shown in FIG. 1, a rear substrate 2 positioned in parallel with a predetermined distance from the front substrate 1, and the front substrate. The partition wall 3 is formed between the rear substrate 2 and is arranged in a stripe form to form a discharge space, and the partition wall is formed on an opposing surface of the rear substrate 2 of the front substrate 1. A plurality of display electrodes 4 arranged in a stripe shape so as to be orthogonal to 3) to divide the entire screen into a plurality of cells in a matrix form together with the partition walls 3, and a rear substrate 2 between the partition walls 3; A plurality of address electrodes 5 formed in parallel with the barrier ribs 3 to cause discharge together with the plurality of display electrodes 4, the back substrate 2, the barrier ribs 3, and the addresses in the discharge space. Respectively formed on the electrode 5 and discharged by ultraviolet rays during discharge of each cell. And is equipped with a plurality of phosphor layers (6) for emitting visible light, inside each of the discharge space is a discharge gas is injected.

In the PDP configured as described above, the display electrode 4 is formed on the front substrate 1, and the partition 3, the address electrode 5, and the phosphor layer 6 are formed on the rear substrate 2, respectively. It is manufactured by assembling the front substrate 1 and the back substrate 2 and then filling the discharge gas therein to seal the rim.

A process of forming the display electrode 4 on the front substrate 1 during the manufacturing process as described above will be described with reference to FIG. 2.

First, the display electrode material 4a is coated on the front substrate 1 with a thickness of 0.1 to 3.0 μm (I), and the photoresist 11 is coated on the display electrode material 4a with a thickness of 0.8 to 3.0 μm ( II).

When the coating of the photoresist 11 is completed, the light 13 is selectively irradiated onto the photoresist 11 using the mask 12 (III-exposure process). At this time, the chemical composition of the portion of the photoresist 11 irradiated with the light 13 and the portion not irradiated is changed.

Thereafter, when the developer 14a is supplied onto the photoresist 11 using the developer supply nozzle 14, only the portion of the photoresist 11 to which light 13 is irradiated in the previous exposure step (III) remains. And the remaining part is removed by the developing solution 14a (IV-developing step).

When the partial removal of the photoresist 11 is completed, the etching solution 15a is supplied onto the display electrode material 4a in which the photoresist 11 remains partially by using the etching solution supply nozzle 15. At this time, the portion under the remaining photoresist 11 of the display electrode material 4a remains protected from the etching solution 15a and the remaining portion is removed by the etching solution 15a (V-etching process). .

Thereafter, when the remaining photoresist 11 on the front substrate 1 is peeled off (VI-peeling step), the display electrode shape 4a of the PDP is completed (Ⅶ).

In addition, the process of forming the partition wall 3 on the back substrate 2 during the manufacturing process as described above with reference to FIG.

First, the barrier rib material 3a is coated with a thickness of 100 to 200 μm on the back substrate 2 (I), and the dry film 21 is coated with a thickness of 15 to 100 μm on the barrier material 3a (II). .

When the coating of the dry film 21 is completed in the above, the light 23 is selectively irradiated onto the dry film 21 using the mask 22. At this time, the chemical composition of the portion of the dry film 21 to which the light 23 is irradiated and the portion not to be irradiated is changed (III-exposure process).

Thereafter, when the developer 24a is supplied onto the dry film 21 by using the developer supply nozzle 24, only the portion of the dry film 21 to which light 23 is irradiated in the previous exposure step (III) remains. And the rest are removed. Here, since the thickness of the dry film 21 is very thick and does not melt in the developing solution 24a, the surface adhesive force between the dry film 21 and the partition material 3a is reduced by using the developing solution 24a and then unnecessary dry film. (21) should be stripped off (IV-development process).

When the partial removal of the dry film 21 is completed in the above, the abrasive 25a is sprayed onto the partition material 3a in which the dry film 21 remains partially by using the abrasive spray nozzle 25. At this time, the portion under the remaining dry film 21 of the partition material 3a remains protected from the abrasive 25a and the remaining portion is removed by the abrasive 25a (V-sand blast ( sandblast process).

Thereafter, when the remaining dry film 21 on the back substrate 2 is peeled off (VI-peeling step), the partition 3a of the PDP is completed (완성).

Meanwhile, the remaining photoresist 11 on the front substrate 1 and the remaining dry film 21 on the rear substrate 2 are the processes shown in FIGS. 5 and 7 by the apparatus shown in FIGS. 4 and 6. Each is peeled off via.

That is, the remaining photoresist stripping apparatus according to the prior art is a roller (31) for transporting along the entire line when the front substrate 1 is loaded (loaded), as shown in Figure 4,

A peeling tank 32 for removing the photoresist on the front substrate 1 by spraying a peeling liquid for removing photoresist on the front substrate 1 side transported along the roller 31;

Pure water shower unit 33 for diluting the release liquid for removing photoresist on the front substrate 1 by spraying pure water along the roller 31 toward the front substrate 1 transferred through the separation tank 32; ,

Pure water rinse section 34 for completely removing the photoresist removal stripping solution on the front substrate 1 by spraying pure water along the roller 31 toward the front substrate 1 transferred through the pure shower unit 33. )Wow,

It consists of a drying unit 35 for drying the surface of the front substrate 1 by injecting air along the roller 31 toward the front substrate 1 transferred through the pure rinse unit 34.

The stripping tank 32 is made of stainless that is not affected by the stripping solution for removing photoresist.

In the above-described separation tank 32, a photoresist stripping solution spray nozzle 32a for injecting a photoresist stripping solution is mounted, and inside the pure shower unit 33 and the pure rinse section 34, 1 and 2 pure water spray nozzles 33a and 34a are mounted, respectively, and an air knife 35a for injecting air is mounted inside the drying unit 35.

In addition, between the substrate loading side on the roller 31 and the peeling tank 32 and between the peeling tank 32 and the pure shower part 33 are sprayed from the inside of the peeling tank 32 toward the front substrate 1 side. First and second spaces 36 and 37 for preventing the photoresist stripping solution from flowing over to the substrate loading side or the pure shower part 33 are respectively secured.

The remaining photoresist stripping process using the remaining photoresist stripping apparatus configured as described above will be described with reference to FIG. 5.

First, when the front substrate 1 on which the remaining photoresist is to be peeled off is loaded on the roller 31, the roller 31 passes through the loaded front substrate 1 through the first clearance space 36 through the stripping tank 32. To the side.

When the front substrate 1 is transferred into the stripping tank 32, the stripping liquid spray nozzle 32a for removing the photoresist mounted inside the stripping tank 32 is used to remove the photoresist toward the front substrate 1. A peeling liquid is sprayed to remove the remaining photoresist on the front substrate 1. Here, the stripper for removing the photoresist may be appropriately mixed with various chemical substances (amine, di propylene glycol, etc.) to NMP (Normal-Methyl-2Pyrolidone) according to the type of photoresist used.

Thereafter, the front substrate 1 is transferred to the pure shower part 33 along the roller 31 via the second clearance 37.

When the front substrate 1 is transferred into the pure shower unit 33, the first pure spray nozzle 33 a mounted in the pure shower unit 33 sprays pure water toward the front substrate 1 to the front substrate 1. The peeling liquid for removing photoresist on the substrate 1 is diluted.

Thereafter, when the front substrate 1 is transferred from the pure shower unit 33 to the pure rinse unit 34 along the roller 31, the second pure spray nozzle 34a mounted inside the pure rinse unit 34 is provided. Pure water is injected into the front substrate 1 to completely remove the photoresist stripping solution on the front substrate 1.

When the removal of the peeling liquid for removing the photoresist on the front substrate 1 is completed and the front substrate 1 is transferred to the drying unit 35 along the roller 31, the air mounted inside the drying unit 35. The knife 35a injects air toward the front substrate 1 to force the pure water remaining on the surface of the front substrate 1 to dry the surface.

Thereafter, when the front substrate 1 is discharged from the drying unit 35 along the roller 31, the worker takes out the front substrate 1 from the roller 31. Therefore, only the shape of the display electrode remains on the front substrate 1.

In addition, the remaining dry film peeling apparatus according to the prior art is a roller 41 for transferring along the entire line when the back substrate 2 is loaded as shown in Figure 6,

A peeling tank 42 for removing a dry film on the back substrate 2 by spraying a peeling liquid for removing a dry film toward the back substrate 2 transferred along the roller 41;

A first pure shower part 43 for diluting the peeling liquid for removing the dry film on the rear substrate 2 by spraying pure water along the roller 41 toward the rear substrate 2 transferred through the separation tank 42. )Wow,

Neutralization tank for neutralizing the peeling liquid for removing the dry film on the rear substrate 2 by spraying the neutralization liquid along the roller 41 toward the rear substrate 2 conveyed through the first pure shower part 43 ( 44) and,

A second pure shower part 45 for diluting the neutralized liquid on the rear substrate 2 by spraying pure water along the roller 41 toward the rear substrate 2 transferred through the neutralization tank 44;

Pure water rinse unit 46 for completely removing the neutralized liquid on the rear substrate 2 by spraying pure water along the roller 41 toward the rear substrate 2 transferred through the second pure shower unit 45; ,

It is composed of a drying unit 47 for drying the surface of the rear substrate 2 by injecting air along the roller 41 toward the rear substrate 2 transferred through the pure rinse portion 46.

The stripping tank 42 is composed of PVC (PolyVinyl Chloride) which is not affected by the stripping solution for dry film removal.

In the above-mentioned detachment tank 42, the peeling liquid injection nozzle 42a for dry film removal which injects the peeling liquid for dry film removal is attached, The 1st, 2nd pure water shower parts 43 and 45 and the pure water rinse part (46) First, second, and third pure water spray nozzles 43a, 45a, and 46a for spraying pure water are respectively mounted therein, and the neutralization liquid spray nozzle 44a for spraying neutralization liquid inside the neutralization tank 44. Is mounted, and an air knife 47a for injecting air is mounted inside the drying unit 47.

In addition, between the substrate loading side on the roller 41 and the peeling tank 42, and between the peeling tank 42 and the first pure shower part 43, the peeling tank 42 inside the back substrate 2 side. First and second clearances 48 and 49 are respectively secured to prevent the sprayed dry film removal solution from flowing over to the substrate loading side or the first pure shower part 43 side.

Between the first pure shower unit 43 and the neutralizing tank 44 and between the neutralizing tank 44 and the second pure shower unit 45 is sprayed toward the rear substrate 2 from the inside of the neutralizing tank 44. Third and fourth free spaces 50 and 51 for preventing the neutralized liquid from flowing over to the first pure shower part 43 or the second pure shower part 45 are secured, respectively.

The residual dry film peeling process using the residual dry film peeling apparatus configured as described above will be described with reference to FIG. 7.

First, when the back substrate 2 on which the residual dry film is to be peeled is loaded on the roller 41, the roller 41 passes the loaded back substrate 2 through the first clearance 48 to the stripping tank 42. To the side.

When the back substrate 2 is transferred into the peeling tank 42 in the above, the peeling liquid injection nozzle 42a for removing the dry film mounted inside the peeling tank 42 is peeled off for removing the dry film toward the back substrate 2. The liquid is sprayed to remove the remaining dry film on the rear substrate 2. Here, the stripper for removing the dry film is mainly used by mixing sodium hydroxide (NaOH) with pure water.

Thereafter, the rear substrate 2 is transferred to the first pure shower part 43 along the roller 41 via the second clearance 49.

When the back substrate 2 is transferred into the first pure shower part 43, the first pure water spray nozzle 43a mounted in the first pure shower part 43 delivers pure water toward the rear substrate 2. By spraying, the peeling liquid for removing the dry film on the rear substrate 2 is diluted.

After that, when the back substrate 2 is transferred to the neutralization tank 44 through the third clearance 50 along the roller 41, the neutralizing liquid injection nozzle 44a mounted inside the neutralization tank 44. The neutralizing liquid is sprayed to the rear substrate 2 side to neutralize the peeling liquid for removing the dry film on the rear substrate 2 to be neutral. At this time, the neutralizing liquid is mainly used by mixing sulfuric acid or hydrochloric acid with pure water.

The neutralization of the peeling liquid for removing the dry film on the rear substrate 2 is completed, and the rear substrate 2 is transferred along the roller 41 to the second pure shower part 45 via the fourth clearance 51. When the second pure water spray nozzle 45a mounted inside the second pure shower part 45 sprays pure water toward the rear substrate 2 to dilute the neutralization liquid on the rear substrate 2 as much as possible.

Thereafter, when the back substrate 2 is transferred from the second pure shower part 45 along the roller 41 to the pure rinse part 46, a third pure water spray nozzle mounted inside the pure rinse part 46 is provided. 46a sprays pure water toward the rear substrate 2 to completely remove the neutralization liquid on the rear substrate 2.

When the neutralization liquid on the rear substrate 2 is removed and the rear substrate 2 is transferred to the drying unit 47 along the roller 41, the air knife 47a mounted inside the drying unit 47. Air is blown toward the rear substrate 2 to forcibly push out the pure water remaining on the surface of the rear substrate 2 to dry the surface.

Thereafter, when the rear substrate 2 is discharged from the drying unit 47 along the roller 41, the worker takes out the rear substrate 2 from the roller 41. Therefore, only the shape of the partition wall remains on the rear substrate 2.

As described above, in the manufacture of PDP, the production line of PDP is formed because the remaining photoresist stripping device for removing the remaining photoresist on the front substrate and the remaining dry film stripping device for removing the remaining dry film on the back substrate are respectively configured. This requires a long installation space, and has a problem in that the configuration of the device is expensive.

The present invention has been made to solve the above problems, to provide a PDP peeling apparatus and method that can perform both the remaining photoresist peeling process and the remaining dry film peeling process in the manufacturing of the display electrode and the partition wall of the PDP. The purpose is.

1 is an exploded perspective view illustrating a structure of a general plasma display panel (PDP);

2 is a view illustrating a process of forming a display electrode of the PDP shown in FIG. 1;

3 is a view illustrating a process of forming a partition wall of the PDP shown in FIG. 1;

4 is a view showing a simplified configuration of a residual photoresist stripping apparatus according to the prior art;

5 is a view showing a residual photoresist stripping process using the apparatus of FIG.

6 is a view showing a simplified configuration of a residual dry film peeling apparatus according to the prior art,

7 is a view showing a residual dry film peeling process using the apparatus of FIG.

8 is a view showing a simplified configuration of a peeling apparatus for a PDP according to an embodiment of the present invention;

9A is a cross-sectional view of the air curtain shown in FIG. 8, FIG.

FIG. 9B is a perspective view of the air curtain shown in FIG. 9;

10 is an enlarged view of a portion A shown in FIG. 8, FIG.

FIG. 11 is a view illustrating a process of peeling a remaining photoresist and remaining dry film using the apparatus of FIG. 8. FIG.

<Description of the symbols for the main parts of the drawings>

1: front board 2: back board

101: roller 102: first peeling tank

103: second separation tank 104: neutralization tank

105: pure shower unit 106: pure rinse unit

107: drying unit 108: free space (neutral)

111 to 117: first to seventh air curtains

In order to achieve the above object, a peeling apparatus for a PDP according to the present invention includes a substrate transfer unit for transferring along an entire line when a front substrate or a rear substrate is loaded;

A first peeling method in which a stripping solution for removing photoresist is sprayed to the front substrate to be transported along the substrate transfer part to remove residual photoresist on the front substrate, and then pure water is sprayed to dilute the stripping solution for removing photoresist. Joe,

A second step of diluting the dry film removal stripper by spraying a dry film removal stripping solution toward the rear substrate conveyed along the substrate transfer part to remove the remaining dry film on the back substrate and then spraying pure water to dilute the stripping solution for removing the dry film A peeling tank,

A neutralization tank for neutralizing the peeling liquid for removing the dry film on the rear substrate by injecting a neutralizing liquid to the rear substrate side transferred through the second peeling tank along the substrate conveying unit;

Pure water is sprayed to the front substrate conveyed through the first peeling tank or the rear substrate conveyed through the neutralization tank along the substrate conveying part to dilute the peeling liquid for removing photoresist on the front substrate or the neutralizing liquid on the back substrate. With pure shower to let you,

Pure water rinsing unit for spraying the pure water to the front substrate or the back substrate side transported through the pure water shower portion along the substrate transfer portion to remove the photoresist removal liquid on the front substrate or the neutralizing liquid on the back substrate;

It characterized in that it comprises a drying unit for drying the surface of the front substrate or the rear substrate by spraying air (air) to the front substrate or rear substrate side transferred through the pure water rinsing unit along the substrate transfer unit.

According to a preferred embodiment of the present invention, between the substrate loading side and the first stripping tank on the substrate transfer part, the photoresist stripping solution and the pure water sprayed from the inside of the first stripping tank to the front substrate side are transferred to the substrate loading side. Free space is reserved to prevent this.

In addition, when the photoresist removing spray liquid or pure water is injected into the front substrate side, air is sprayed to both end portions of the front substrate so that the spray liquid or pure water for removing the photoresist is removed. 1 is equipped with air curtains (air curtain) to prevent leakage to the outside of the separation tank, respectively

When the spray film or the pure water for spraying the dry film is sprayed to the rear substrate, air is sprayed to both end portions of the rear substrate so that the spray film or the pure water for removing the dry film is separated from the second peeling tank. Equipped with air curtains to prevent leakage to the outside of the tank,

When the neutralizing liquid is injected into the rear substrate side, the neutralization tank is respectively equipped with an air curtain to spray the air at both ends of the rear substrate to prevent the neutralizing liquid from flowing out of the neutralization tank,

An air curtain inside the pure shower part to spray air to one end of the neutralization tank side of the front substrate or the rear substrate when the pure water is injected to the front substrate or the rear substrate side to prevent the pure water from flowing out to the neutralization tank side. It is desirable to be equipped.

Further, inside the first stripping tank, a photoresist stripping nozzle spray nozzle for spraying the photoresist stripping solution and a pure water jet nozzle for spraying pure water are respectively mounted;

It is preferable that the peeling liquid injection nozzle for dry film removal which injects the said peeling liquid for dry film removal, and the pure water injection nozzle which injects the said pure water are respectively mounted in the said 2nd peeling tank.

In order to achieve the above object, in the PDP peeling method according to the present invention, when the front substrate is transferred, the peeling liquid for removing the photoresist is sprayed to the front substrate to remove the remaining photoresist on the front substrate, and then sprayed with pure water. A first peeling step of diluting a peeling solution for removing photoresist and discharging the back substrate without treatment if the back substrate is transferred;

When the back substrate that has passed through the first peeling process is transferred, the peeling liquid for removing the dry film is sprayed to the rear substrate to remove the remaining dry film on the back substrate, and then sprayed with pure water to dilute the peeling liquid for removing the dry film, A second peeling process of discharging the front substrate without treatment if it is transferred;

Neutralizing step of spraying the neutralizing liquid toward the rear substrate when the back substrate passed through the second peeling process is neutralized to neutralize the peeling liquid for removing the dry film on the rear substrate, and discharging the front substrate without treatment;

A pure shower step of diluting the release liquid for removing the photoresist on the front substrate or the neutralization liquid on the back substrate by spraying pure water toward the front substrate or the back substrate when the front substrate or the back substrate passed through the neutralization process is transferred;

A pure rinse step of removing pure water on the front substrate or the neutralizing liquid on the back substrate by spraying pure water toward the front substrate or the back substrate when the front substrate or the back substrate passed through the pure shower process is transferred;

When the front substrate or the back substrate is passed through the pure rinse process is characterized in that the drying step of drying the surface of the front substrate or the back substrate by spraying air to the front substrate or the rear substrate side.

Hereinafter, with reference to the accompanying drawings, a preferred embodiment of the PDP peeling apparatus and the method according to the present invention will be described in detail.

The remaining photoresist and the remaining dry film peeling apparatus during PDP manufacturing according to an embodiment of the present invention are rollers for transferring along the entire line when the front substrate 1 or the back substrate 2 is loaded as shown in FIG. 8. With 101,

The photoresist stripping solution is sprayed toward the front substrate 1 transported along the roller 101 to remove the remaining photoresist on the front substrate 1, and then pure water is sprayed to remove the photoresist stripping solution. A first separation tank 102 to dilute,

The dry film removal peeling liquid is sprayed toward the rear substrate 2 transported along the roller 101 to remove the remaining dry film on the rear substrate 2, and then pure water is sprayed to remove the dry film removing peeling liquid. A second separation tank 103 to be diluted,

Neutralization tank 104 which neutralizes the peeling liquid for removing the dry film on the rear substrate 2 by spraying the neutralizing liquid along the roller 101 toward the rear substrate 2 transferred through the second peeling tank 103. )Wow,

Pure water is injected along the roller 101 to the front substrate 1 conveyed through the first separation tank 102 or the rear substrate 2 conveyed through the neutralization tank 104 to the front substrate 1. A pure shower unit 105 for diluting a release liquid for removing a photoresist on a layer) or a neutralizing solution on the rear substrate 2;

The pure water is sprayed to the front substrate 1 or the back substrate 2 transferred through the pure shower unit 105 along the roller 101 to remove the photoresist for removing the photoresist on the front substrate 1 or the rear surface. Pure water rinse section 106 for removing the neutralization liquid on the substrate 2,

The surface of the front substrate 1 or the rear substrate 2 is dried by injecting air toward the front substrate 1 or the rear substrate 2 transferred through the pure rinse unit 106 along the roller 101. It consists of a drying unit 107 to be.

Between the substrate loading side on the roller 101 and the first peeling tank 102, a peeling liquid for removing photoresist and pure water sprayed from the inside of the first peeling tank 102 toward the front substrate 1 is loaded on the substrate. A free space (neutral) 108 is provided to prevent it from going to the side.

In addition, when the injection liquid or pure water is sprayed to the front substrate 1 side, the air is sprayed to both end portions of the front substrate 1 in the first stripping tank 102 to remove the photoresist. First and second air curtains 111 and 112 are respectively mounted to prevent the injection liquid or the pure water from flowing out of the first separation tank 102.

When the spray film for removing the dry film or the pure water is sprayed to the rear substrate 2 side, air is sprayed to both end portions of the rear substrate 2 to spray the dry film removal spray liquid into the second separation tank 103. Or the third and fourth air curtains 113 and 114 are respectively installed to prevent the pure water from flowing out of the second separation tank 103,

When the neutralizing liquid is injected into the neutralization tank 104 inside the neutralization tank 104, the neutralization liquid is discharged to the outside of the neutralization tank 104 by injecting air to both end portions of the rear substrate 2, respectively. The fifth and sixth air curtains 115 and 116 to prevent

When pure water is injected into the front substrate 1 or the rear substrate 2 side, the pure shower unit 105 has air at one end of the neutralization tank 104 side of the front substrate 1 or the rear substrate 2. Equipped with a seventh air curtain (117) for preventing the outflow of the pure water to the neutralization tank 104 by spraying.

In addition, inside the first stripping tank 102, a photoresist stripping nozzle spray nozzle 102a for spraying a photoresist stripping liquid and a first pure spray nozzle 102b for spraying pure water are respectively mounted. There is;

Inside the second stripping tank 103, a dry film removal stripping liquid injection nozzle 103a for injecting a stripping solution for dry film removal and a second pure water spray nozzle 103b for injecting pure water are respectively mounted;

A neutralizing liquid spray nozzle 104a for spraying a neutralizing liquid is mounted inside the neutralizing tank 104;

Inside the pure shower unit 105 and the pure rinse unit 106, third and fourth pure spray nozzles 105a and 106a for injecting pure water are respectively mounted;

An air knife 107a for injecting air is mounted in the drying unit 107.

In the above, the first stripping tank 102 is made of stainless steel which is not affected by the stripping solution for removing the photoresist as in the prior art, and the second stripping strip 103 is also not affected by the stripping solution for removing the dry film. It consists of.

In the above, all of the first to seventh air curtains 111 to 117 are formed in the same shape. Accordingly, the shape and operation of the sixth air curtain 116 inside the neutralization tank 104 illustrated in FIGS. 9A, 9B, and 10 will be described.

As shown in FIGS. 9A and 9B, the sixth air curtain 116 is provided with an air supply pipe 116a through which air is supplied, and a slit which is an outlet of air supplied to the air supply pipe 116a on the opposite side thereof. An air supply pipe 116a of the sixth air curtains 116 and 116 'is formed when the neutralizing liquid injection nozzle 104a injects the neutralizing liquid toward the rear substrate 2 as shown in FIG. , When the air supplied to the 116a 'side passes through the slits 116b and 116b' and is injected to one end of the rear substrate 2, a kind of blocking film is formed to prevent the neutralized liquid from flowing out to the pure shower part 105 side. do.

Therefore, there is no need to secure a separate free space between the neutralization tank 104 and the pure shower unit 105 as in the prior art. In addition, the free space 108 secured between the substrate loading side on the roller 101 and the first peeling tank 102 may also be brought to a minimum (usually about 200 to 300 mm) due to the first air curtain 111. .

The remaining photoresist and remaining dry film peeling process using the PDP peeling apparatus according to an embodiment of the present invention configured as described above will be described with reference to FIG. 11.

First, when the front substrate 1 on which the remaining photoresist is to be peeled off or the back substrate 2 on which the residual dry film is to be peeled off is loaded on the roller 101, the roller 101 is the front substrate 1 or the rear surface. The substrate 2 is transferred to the first peeling tank 102 via the free space 108.

When the front substrate 1 is transferred into the first peeling tank 102, the peeling liquid injection nozzle 102a for removing the photoresist mounted inside the first peeling tank 102 is directed toward the front substrate 1. A photoresist stripping solution is sprayed to remove the remaining photoresist on the front substrate 1, and when the removal of the remaining photoresist is completed, the first photo mounted with the photoresist stripping removing nozzle 102a is removed. The pure water jet nozzle 102b injects pure water toward the front substrate 1 to dilute the photoresist stripping solution for injection. On the other hand, when the back substrate 2 is transferred into the first stripping tank 102, it is discharged to the outside by the roller 101 without the stripping liquid or the pure water treatment.

In addition, when the photoresist stripping solution and pure water are injected into the front substrate 1 side from the inside of the first stripping tank 102, the stripping solution or pure water is removed from the substrate loading side or the substrate on the roller 101. 2 In order to block the outflow to the separation tank 103 side, the first and second air curtains 111 and 112 have air at a pressure of about 0.1 to 2.0 Kg / cm ² at both ends of the front substrate 1 through the slit. Is sprayed to form a barrier film (first peeling step).

As described above, when the photoresist stripping solution is sprayed to the front substrate 1 side in the first stripping process, the pure water is sprayed to dilute the stripping solution for removing the photoresist on the front substrate 1 as much as possible. ) Is then passed through the second stripping tank 103 and the neutralization tank 104 in order to be transferred to the pure shower portion 105 side, the peeling liquid for removing the photoresist on the front substrate 1 is the second stripping tank ( 103, consisting of PVC) can be minimized.

Meanwhile, when the back substrate 2 is transferred into the second peeling tank 103 through the free space 108 and the first peeling tank 102, the dry film mounted in the second peeling tank 103 is removed. The peeling liquid injection nozzle 103a sprays the peeling liquid for removing the dry film toward the rear substrate 2 to remove the remaining dry film on the rear substrate 2, and when the removal of the remaining dry film is completed, the dry The second pure water spray nozzle 103b attached together with the film removing peeling liquid spray nozzle 103a sprays pure water toward the rear substrate 2 to dilute the dry film removing peeling liquid 103a sprayed just before. Let's do it. On the other hand, when the front substrate 1 is transferred to the inside of the second peeling tank 103, it is discharged to the outside by the roller 101 without peeling liquid and pure water treatment.

In addition, when the release film for removing the dry film and the pure water are injected into the rear substrate 2 from the inside of the second stripping tank 103 in the same manner as the first peeling process, the removal solution or the pure water for removing the dry film is first peeled off. In order to block the outflow to the tank 102 or the neutralizing tank 104, the third and fourth air curtains 113 and 114 form a blocking film by injecting air to both ends of the rear substrate 2 through the slit. (2nd peeling process).

In the second peeling process, as described above, after spraying the peeling liquid for removing the dry film toward the rear substrate 2 side, the pure water is sprayed to dilute the peeling liquid for removing the dry film on the rear substrate 2 to the maximum. ) Can be minimized to contaminate the neutralizing liquid of the neutralizing tank 104 by the peeling liquid for removing the dry film on the back substrate 2 when it is transferred into the neutralizing tank 104 and processed. 1 Pure shower part can be removed to reduce the length of the line.

Thereafter, when the back substrate 2 is transferred from the second separation tank 103 to the neutralization tank 104 along the roller 101, the neutralizing liquid injection nozzle 104a mounted inside the neutralization tank 104. The neutralizing liquid is sprayed to the rear substrate 2 side to neutralize the peeling liquid for removing the dry film on the rear substrate 2 to be neutral. On the other hand, when the front substrate 1 is transferred into the neutralization tank 104, it is discharged to the outside by the roller 101 without the neutralization liquid treatment.

In addition, when the neutralizing liquid is injected into the rear substrate 2 from the inside of the neutralizing tank 104, the neutralizing liquid is directed to the second separating tank 103 or the pure shower unit 105 as in the first and second peeling processes. In order to block outflow, the fifth and sixth air curtains 115 and 116 spray air at both ends of the rear substrate 2 through slits to form a blocking film (neutralization process).

Meanwhile, when the front substrate 1 or the rear substrate 2 is transferred to the pure shower unit 105 through the neutralization tank 104 along the roller 101, the first substrate or the rear substrate 2 may be mounted inside the pure shower unit 105. 3 The pure water spray nozzle 105a injects pure water toward the front substrate 1 or the rear substrate 2 to dilute the release liquid for removing the photoresist on the front substrate 1 or the neutralization liquid on the rear substrate 2. .

At this time, the pure water is injected into the neutralization tank 104 when the pure water is injected into the front substrate 1 or the rear substrate 2 from the inside of the pure shower unit 105 as in the first and second peeling processes and the neutralizing process. In order to block the outflow, the seventh air curtain 117 sprays air to one end of the front substrate 1 or the rear substrate 2 through the slit to form a blocking film (pure shower process).

Subsequently, when the front substrate 1 or the rear substrate 2 is transferred from the pure shower unit 105 to the pure rinse unit 106 along the roller 101, the first substrate 1 or the rear substrate 2 is mounted inside the pure rinse unit 106. 4 The pure water spray nozzle 106a sprays pure water toward the front substrate 1 or the rear substrate 2 to completely remove the photoresist stripping liquid on the front substrate 1 or the neutralization liquid on the rear substrate 2. (Pure rinse step).

The removal of the removal solution for removing the photoresist on the front substrate 1 or the neutralization liquid on the rear substrate 2 is completed, and the front substrate 1 or the rear substrate 2 is dried along the roller 101. When the air knife 107a mounted inside the drying unit 107 is injected into the front substrate 1 or the rear substrate 2, the air knife 107a is sprayed with air to the front substrate 1 or the rear substrate 2 so that the front substrate 1 or the rear substrate 2 The surface is dried by forcibly pushing out the pure water remaining on the surface (drying step).

Thereafter, when the front substrate 1 or the rear substrate 2 is discharged from the drying unit 107 along the roller 101, the operator may remove the front substrate 1 or the rear substrate 2 from the roller 101. Take out. Therefore, only the shape of the display electrode remains on the front substrate 1, and only the shape of the partition wall remains on the rear substrate 2.

As described above, the present invention provides a stripping tank for removing residual photoresist on the front substrate, a stripping tank and a neutralization tank for removing residual dry film on the back substrate, and the other common processes (pure shower, pure rinse, Drying) can be performed together with the remaining photoresist stripping process and the remaining dry film stripping process, thereby greatly reducing the overall PDP manufacturing line, thereby reducing costs and reducing installation space.

In addition, the present invention is equipped with a pure water jet nozzle with a peeling liquid jet nozzle inside the stripping tank, so that the stripping liquid on the front substrate or the back substrate is diluted in itself during the stripping process, the pure shower on the display electrode and the partition manufacturing line of the PDP The process can be reduced, thereby reducing the installation space.

In addition, the present invention is equipped with an air curtain instead of a separate free space at the substrate inlet and outlet of the separation tank and the neutralization tank and the substrate inlet of the pure shower unit, so that the separation liquid, neutralizing liquid and pure water sprayed from the inside are discharged to the outside. Since it prevents the free space on the display electrode and the barrier rib manufacturing line of the PDP can be significantly reduced, there is also an effect that can reduce the installation space.

Claims (13)

When the front substrate or the back substrate is loaded (loading) a substrate transfer unit for transferring along the entire line, A first peeling method in which a stripping solution for removing photoresist is sprayed to the front substrate to be transported along the substrate transfer part to remove residual photoresist on the front substrate, and then pure water is sprayed to dilute the stripping solution for removing photoresist. Joe, A second step of diluting the dry film removal stripper by spraying a dry film removal stripping solution toward the rear substrate conveyed along the substrate transfer part to remove the remaining dry film on the back substrate and then spraying pure water to dilute the stripping solution for removing the dry film A peeling tank, A neutralization tank for neutralizing the peeling liquid for removing the dry film on the rear substrate by injecting a neutralizing liquid to the rear substrate side transferred through the second peeling tank along the substrate conveying unit; Pure water is sprayed to the front substrate conveyed through the first peeling tank or the rear substrate conveyed through the neutralization tank along the substrate conveying part to dilute the peeling liquid for removing photoresist on the front substrate or the neutralizing liquid on the back substrate. With pure shower to let you, Pure water rinsing unit for spraying the pure water to the front substrate or the back substrate side transported through the pure water shower portion along the substrate transfer portion to remove the photoresist removal liquid on the front substrate or the neutralizing liquid on the back substrate; PDP (Plasma Display Panel) characterized in that it consists of a drying unit for drying the surface of the front substrate or the rear substrate by spraying air (air) toward the front substrate or rear substrate side transferred through the pure water rinsing unit along the substrate transfer unit Peeling device. The method of claim 1, A space between the substrate loading side and the first stripping tank on the substrate transfer unit to secure a photoresist stripping solution sprayed from the inside of the first stripping tank to the front substrate side and the pure water to prevent the water from flowing to the substrate loading side is secured. Peeling apparatus for PDP characterized in that the. The method of claim 1, When the photoresist removing spray liquid or pure water is injected into the front substrate side, air is sprayed to both end portions of the front substrate so that the photoresist removing spray liquid or pure water is separated from the first stripping tank. Peeling device for PDP, characterized in that each air curtain (air curtain) is installed to prevent leakage to the outside of the tank. The method of claim 1, When the spray film or the pure water for spraying the dry film is sprayed to the rear substrate, air is sprayed to both end portions of the rear substrate so that the spray film or the pure water for removing the dry film is separated from the second peeling tank. Peeling device for PDP, characterized in that each air curtain is installed to prevent leakage to the outside of the tank. The method of claim 1, When the neutralizing liquid is injected into the rear substrate side, the neutralization tank is respectively equipped with an air curtain to spray the air to both ends of the rear substrate to prevent the neutralizing liquid from flowing out of the neutralization tank, respectively. Peeling apparatus for PDP. The method of claim 1, An air curtain inside the pure shower part to spray air to one end of the neutralization tank side of the front substrate or the rear substrate when the pure water is injected to the front substrate or the rear substrate side to prevent the pure water from flowing out to the neutralization tank side. Peeling device for a PDP characterized in that the mounting. The method according to claim 1, 2 or 3, And a pure water spray nozzle for spraying the pure water, and a photoresist stripping liquid spray nozzle for spraying the photoresist stripping liquid, respectively, in the first stripping tank. The method according to claim 1 or 4, The peeling apparatus for a PDP, characterized in that the inside of the second peeling tank is equipped with a dry film removal peeling liquid spray nozzle for spraying the peeling liquid for removing the dry film, and a pure water spray nozzle for spraying the pure water. When the front substrate is transferred, the release liquid for removing photoresist is sprayed to the front substrate to remove the remaining photoresist on the front substrate, and then pure water is sprayed to dilute the release liquid for removing the photoresist, and when the back substrate is transferred, no treatment is performed. A first peeling step of discharging; When the back substrate that has passed through the first peeling process is transferred, the peeling liquid for removing the dry film is sprayed to the rear substrate to remove the remaining dry film on the back substrate, and then sprayed with pure water to dilute the peeling liquid for removing the dry film, A second peeling process of discharging the front substrate without treatment if it is transferred; Neutralizing step of spraying the neutralizing liquid toward the rear substrate when the back substrate passed through the second peeling process is neutralized to neutralize the peeling liquid for removing the dry film on the rear substrate, and discharging the front substrate without treatment; A pure shower step of diluting the release liquid for removing the photoresist on the front substrate or the neutralization liquid on the back substrate by spraying pure water toward the front substrate or the back substrate when the front substrate or the back substrate passed through the neutralization process is transferred; A pure rinse step of removing pure water on the front substrate or the neutralizing liquid on the back substrate by spraying pure water toward the front substrate or the back substrate when the front substrate or the back substrate passed through the pure shower process is transferred; When the front substrate or the back substrate is passed through the pure rinse process is carried out a drying process for drying the surface of the front substrate or the back substrate by spraying air toward the front substrate or the back substrate side. . The method of claim 9, The first peeling process is characterized in that when the photoresist stripping liquid or pure water is injected to the front substrate side, the air is injected to both ends of the front substrate to block the photoresist stripping liquid or outflow of pure water. Peeling method for PDP. The method of claim 9, The second peeling process is characterized in that when the release film or the pure water is injected to the rear substrate side, the air is injected to both ends of the rear substrate to block the outflow of the dry film removal stripping solution or pure water. Peeling method for PDP. The method of claim 9, The neutralizing step of the PDP peeling method characterized in that when the neutralizing liquid is injected to the rear substrate side by spraying air to both ends of the rear substrate to block the outflow of the neutralizing liquid. The method of claim 9, The pure water showering step of the PDP peeling method characterized in that when the pure water is injected to the front substrate or the rear substrate side by spraying air to one end of the front substrate or the rear substrate to block the outflow of the pure water.

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